CN114550979A - Transparent conductive wear-resistant corrosion-resistant intelligent wearable device external screen and preparation method thereof - Google Patents
Transparent conductive wear-resistant corrosion-resistant intelligent wearable device external screen and preparation method thereof Download PDFInfo
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- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- H—ELECTRICITY
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- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
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- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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Abstract
The invention aims to overcome the defects of the functional film of the external screen of the intelligent wearable device in the prior art, and provides the external screen of the intelligent wearable device with transparent conductivity, wear resistance and corrosion resistance and the preparation method thereof. The technical scheme adopted by the invention is as follows: the utility model provides an outer screen of device is dressed to transparent wear-resisting anticorrosive intelligence of electrically conductive is for being located on the transparent stratum basale, from inside to outside including transition priming coat and transparent electrically conductive wear-resisting resistant layer or transition priming coat, transparent conducting layer and wear-resisting resistant layer. The preparation method comprises the steps of preparing a transparent substrate, preparing a transition priming layer and preparing a transparent conducting layer and a wear-resistant and corrosion-resistant layer or a transparent conducting wear-resistant and corrosion-resistant layer. The external screen disclosed by the invention has the advantages that on the basis of ensuring the requirements of transparency and electric conductivity, the wear resistance and the long-term acid and alkali sweat corrosion resistance are enhanced.
Description
Technical Field
The invention belongs to the field of display screens, and particularly relates to a film design and a preparation method of a transparent conductive wear-resistant corrosion-resistant multifunctional intelligent wearable device external screen.
Background
Thin film materials have been the focus of research, and especially transparent conductive thin film materials have attracted much attention.
The transparent conductive oxide is a wide bandgap semiconductor material having two semiconductor types, n-type in which electrons are majority and p-type in which holes are majority. The transparent conductive oxide film has the advantages of good conductivity, high visible light transmittance, high infrared reflectivity, good chemical stability and the like, and is widely applied to the fields of solar cells, liquid crystal displays, touch screens and the like. CN 111446042A discloses a high-performance single-layer GZO transparent conductive film, the GZO film prepared by a pulse laser method has the advantages of high transmittance, low resistance and low roughness, and the preparation process is simple and does not need annealing treatment.
In addition to the transparent conductive oxide film, materials such as metal, metal nanowire, metal mesh, carbon nanotube, and graphene are also becoming mainstream in the field of transparent conductive films. CN 112037968A discloses a transparent conductive film of a touch panel, in which a coloring agent is added into a transparent substrate film or a protective layer as a blue compensation layer to adjust a yellowish nano silver wire layer to make it exhibit a neutral color, and a protective layer is prepared on a top layer to effectively inhibit the yellowing of the nano silver wire, and the light transmittance is as high as more than 90%. CN 112941464A discloses a TiO2/Cu/TiO2Transparent conductive film, Ar as plasma gas source and O as carrier2Sequentially sputtering TiO on the surface of the substrate as reaction gas2Film, Cu film and TiO2Film at relatively low sputtering power and O2Under the condition of flow rate, by controllingThe thickness of the intermediate layer Cu film is used for regulating and controlling the photoelectric property of the transparent conductive film. CN 111627597A discloses a flexible transparent conductive film with a composite structure, wherein a composite light-adding layer is prepared on the surface of a ZnO-Cu/graphene composite film, the refractive index of each layer of the light-adding layer is increased from an inner layer to an outer layer in sequence, the light-adding layer can protect copper from being oxidized and also has a light-gathering effect, and all the films have higher transmittance and low sheet resistance in a visible light range. CN 11446024 a discloses a transparent conductive film and a touch screen with a multilayer structure, which changes the original metal into a doped layer of metal and nitrogen/oxide metal, thereby improving the electrical properties; the film is divided into a plurality of layers, so that the integral refractive index of the conductive layer is improved, and further the light transmittance is improved; the transparent conductive film is composed of at least 6 layers of films, on one hand, the complexity of the preparation process is increased, and on the other hand, more interfaces exist between each layer.
Of course, the transparent conductive film is not limited to a glass substrate, and the film prepared on the surface of the flexible substrate also shows excellent photoelectric properties. CN 113299436A discloses an MXene/ITO composite transparent conductive film, which is prepared by depositing an MXene thin layer on the surface of a substrate by a deposition floating coating method and preparing an ITO film on the surface of the MXene thin layer by a magnetron sputtering method. CN 113204146A discloses a repairable inorganic full-film electrochromic device using water vapor as electrolyte, wherein a bottom transparent conductive layer/an ion storage layer/an ion conductive layer/an electrochromic layer/a top transparent conductive layer are sequentially deposited on the surface of a flexible substrate polyethylene terephthalate (PET), Polydimethylsiloxane (PDMS) or Polyimide (PI), each layer has different functions, and the interaction between the layers realizes the functions of transparent conduction and the coloring and fading of the device through special treatment; however, the film prepared by the vacuum evaporation method is uneven, thick in the middle and thin at the periphery, and the film layer prepared by the method is easy to fall off. CN 113862614A discloses an electrochromic film structure and a preparation method and application thereof, wherein an electrochromic film is deposited on the surface of Polydimethylsiloxane (PVC), polyethylene terephthalate (PET) or Polycarbonate (PC) on a flexible substrate, and the prepared film structure can improve light transmittance and coloring efficiency; meanwhile, the prepared film structure can ensure the stability of electrochromic circulation.
The above patents, whether applied to hard substrates such as glass, or flexible substrates such as polyimide, all have the functionality of realizing light transmission, anti-reflection, color change or electrical conduction for the substrate.
The existing functional film for the intelligent wearable device has a plurality of products, including a thermocouple, a temperature sensor type film, a blue light attenuation film, an antireflection film and the like. Such films are all somewhat satisfactory for their optical and electrical requirements. Since it is an internal functional film, abrasion of the film and the ability to resist sweat corrosion are not considered. The functional film for the external intelligent wearable device needs to consider the problems of abrasion and scratch commonly seen in daily life. Therefore, in addition to imparting optical and electrical properties to the substrate, it is necessary to consider the erosion behavior of the film by acidic and alkaline sweat upon contact with the human body, and the scratch resistance behavior against external impact and the like.
In summary, the external screen of the intelligent wearable device with the performances of abrasion resistance and long-time acid-base sweat corrosion needs to be developed on the premise of meeting the requirements of high light transmission and good electric conductivity in a visible light region.
Disclosure of Invention
The invention aims to overcome the defects of a functional film of an intelligent wearable device external screen in the prior art, and provides a transparent conductive wear-resistant corrosion-resistant intelligent wearable device external screen and a preparation method thereof. The external screen disclosed by the invention has the advantages that on the basis of ensuring the requirements of transparency and electric conductivity, the wear resistance and the long-term acid and alkali sweat corrosion resistance are enhanced.
The invention adopts the following technical scheme:
the utility model provides a wear-resisting anticorrosive intelligent of transparent electrically conductive dresses device external screen, for being located on transparent stratum basale, from inside to outside including transition priming coat and transparent electrically conductive wear-resisting corrosion resistant layer or transition priming coat, transparent conducting layer and wear-resisting corrosion resistant layer, wherein:
the transparent substrate layer is one of quartz glass, sapphire glass, synthetic glass, mineral crystal glass, polyimide, polyvinyl alcohol, polyester and polyethylene naphthalate; the thickness of the material is 0.5-5.0 mm;
the transition bottom layer is SiO2、Al2O3A film formed of one of SiCO and SiCO; the thickness is 5-100 nm;
the transparent conductive layer is In2O3ITO (tin-doped indium oxide), SnO2A thin film formed of a mixture of one or more of FTO (fluorine-doped tin oxide); the thickness of the material is 50-400 nm;
the wear-resistant and corrosion-resistant layer is SiO2、Al2O3And SiCO film; the thickness of the material is 30-400 nm;
the transparent conductive wear-resistant corrosion-resistant layer is SiO2+In2O3、SiO2+SnO2、SiO2+ITO、SiO2+FTO、Al2O3+In2O3、Al2O3+SnO2、Al2O3+ITO、Al2O3+FTO、SiCO+In2O3、SiCO+SnO2A film formed by one or a mixture of more of SiCO + ITO and SiCO + FTO; the thickness is 50-400 nm.
Furthermore, the square resistance of the external screen is less than or equal to 400 omega/sq, the transparency is more than or equal to 85%, the screen is free from abnormality after being corroded by acid and alkali sweat for 72 hours, free from heterochrosis and cracking, and the vibration friction is more than or equal to 12 hours.
The preparation method of the transparent conductive wear-resistant corrosion-resistant intelligent wearable device external screen comprises the following steps:
(1) preparing a transparent substrate: conventionally cleaning a transparent substrate, and then placing the transparent substrate in a vacuum cavity of a magnetron sputtering system for plasma etching and cleaning for 5-25 min;
(2) preparing a transition base coat: at Ar or Ar + O2In the atmosphere, magnetron sputtering deposition is carried out on a transition bottom layer;
(3) preparing a transparent conductive layer and a wear-resistant and corrosion-resistant layer or a transparent conductive wear-resistant and corrosion-resistant layer: at Ar or Ar + O2Under the atmosphere, a transparent conducting layer and a refractory layer are sequentially deposited on the surface of the transition priming layer by magnetron sputteringAnd (3) grinding the corrosion-resistant layer, or carrying out magnetron sputtering on the surface of the transition priming coat to form a transparent conductive wear-resistant corrosion-resistant layer, and cooling to room temperature along with the furnace to obtain the wear-resistant corrosion-resistant coating.
Compared with the prior art, the invention has the advantages that:
(1) respectively or continuously sputtering oxide or metal target material by magnetron sputtering to obtain multilayer functional film, i.e. external screen. The preparation process does not need reactive sputtering, and the process window is wide and simple.
(2) By adopting a magnetron sputtering technology and introducing a transition priming layer with a structure similar to that of the substrate, the bonding strength of the multilayer functional film and the substrate is favorably improved.
(3) One or two functional thin film layers are deposited on the transition layer by adopting a magnetron sputtering technology, so that the regulation and control of the transparent conductivity and the wear resistance, acid resistance and alkali sweat corrosion resistance are facilitated.
(4) The square resistance of the external screen is less than or equal to 400 omega/sq, the transparency is more than or equal to 85 percent, no abnormity is caused after acid and alkali sweat erodes for 72 hours, no heterochrosis and no cracking are caused, and the vibration friction is more than or equal to 12 hours.
Drawings
FIG. 1 is a film structure of a three-layer thin film external screen;
fig. 2 is a film layer structure of a two-layer film external screen.
Detailed Description
Specific embodiments of the present invention will now be described in detail with clarity. The following examples and comparative examples are only a part of the present invention and are intended to more clearly illustrate the technical aspects of the present invention.
Example 1
A transparent conductive wear-resistant corrosion-resistant intelligent wearable external screen for devices is a transitional bottom layer SiO on a quartz glass sheet on a transparent substrate layer from inside to outside2Thin film, transparent conductive layer SnO2Film and wear-resistant and corrosion-resistant layer SiO2The film is composed and the structure is shown in figure 1.
The preparation method comprises the following concrete implementation steps:
1. preparation of transition base coat
(1) Preparation of SiO2Target material: SiO 22The powder is directly used as a target material, placed on a copper disc of a magnetron target of a magnetron sputtering system and uniformly compacted until the surface is flat and uniform; closing the magnetron sputtering cavity door, and starting a mechanical pump for rough pumping; when the pressure of the vacuum cavity is less than 5.0Pa, starting the molecular pump to perform fine pumping until the vacuum pressure is less than 3.0x10-3Pa; introducing Ar to increase the vacuum pressure to 0.14 Pa; starting a power supply, adjusting sputtering power, sputtering for 30min, and ensuring the stability of later experimental conditions;
(2) putting a quartz glass sheet with the thickness of 1mm into a glass cleaning solution, an acetone solution, an ethanol solution and deionized water, ultrasonically cleaning for 30min, and then, using pure N2Drying;
(3) internal cleaning and priming coat preparation: opening the vacuum cavity, placing the transparent substrate on a workpiece rotating frame, and adjusting the distance between the substrate and the target to be 13 cm; closing the magnetron sputtering cavity door, and starting a mechanical pump for rough pumping; when the pressure of the vacuum cavity is less than 5.0Pa, the molecular pump is started to perform fine pumping until the vacuum pressure is less than 3.0 multiplied by 10-3Pa; introducing Ar to increase the vacuum pressure to 0.14 Pa; turning on a power supply, setting the sputtering power to be 50W, and carrying out ion etching cleaning for 20min under the bias voltage of 150V of the direct current substrate; adjusting the sputtering power to 300W, the DC substrate bias voltage to 40V, sputtering for 5min, and preparing a layer of transition base SiO with the thickness of 20nm2A film.
2. Preparation of transparent conductive layer
(1) Preparation of SnO2Target material: in SnO2The powder is used as a target material, and the method is the same as the step 1 (1);
(2) adjusting the sputtering power to 300W, the DC matrix bias voltage to 40V, sputtering for 40min under the vacuum pressure of 0.12Pa, and depositing on the substrate/SiO2Preparing a layer of transparent conductive SnO with the thickness of 400nm on the layer2A film.
3. Preparation of wear-resistant and corrosion-resistant layer
(1) Regulating sputtering power to 300W, matrix bias voltage to 40V, vacuum pressure to 0.14Pa, sputtering time to 20min, and sputtering on the substrate/SiO2/SnO2Preparing wear-resistant and corrosion-resistant SiO with thickness of 100nm on the layer2A film. Cooling to room temperature along with the furnace, and taking out the sample.
4. The film of this example was tested for properties as follows:
(1) light transmission properties of the film: and measuring the transmittance of the film in the wavelength range of 200-800 nm by using a spectrophotometer.
(2) Conductivity of the film: the sheet resistance, resistivity, carrier concentration, mobility and the like of the thin film are measured by using a Hall effect tester.
(3) Acid and sweat resistance of the film: preparing artificial acid-base sweat according to the following requirements:
A. acid artificial sweat: sodium chloride (NaCl): 20 g/L; ammonium chloride (NH)4Cl): 17.5 g/L; urea (CH)4N2O): 5 g/L; acetic acid (CH)3COOH): 2.5 g/L; lactic acid (C)3H6O3): 15 g/L; sodium hydroxide (NaOH): adjusting the pH value of the solution to 4.7;
B. alkaline artificial sweat: sodium hydroxide (NaOH) is continuously added into the acidic artificial sweat solution, and the pH value is adjusted to 9.5, so that the required alkaline artificial sweat solution is obtained.
Respectively soaking the dust-free cloth with acid sweat and alkaline sweat, taking out the dust-free cloth to respectively wrap the samples after complete soaking, and respectively placing the wrapped samples in sealed plastic bags; standing at 55 deg.C and 95% RH for 72 h; and after the test is finished, taking out the sample, naturally drying for 2h, then slightly washing with clean flowing water at the temperature of not higher than 40 ℃ to remove residues of the artificial sweat solution on the surface of the sample, then immediately drying the sample, observing the surface appearance of the sample and measuring the photoelectric property of the sample.
(4) Abrasion resistance of the film: the film was placed in a vibrating pan and a roller, respectively.
The vibration disc is worn: observing the surface abrasion condition of the film every 6h, and testing the surface resistance of the film;
roller abrasion: and observing the surface abrasion condition of the film every 15min, and testing the surface resistance of the film.
The test results are shown in Table 1.
TABLE 1 SiO of the surface of a Quartz substrate2/SnO2/SiO2Performance of multilayer functional film
Example 2
A transparent conductive wear-resistant corrosion-resistant intelligent wearable external screen for devices is a transitional bottom layer SiO on a quartz glass sheet on a transparent substrate layer from inside to outside2Thin film, transparent conductive layer In2O3Film and wear-resistant and corrosion-resistant layer SiO2A film.
The preparation method comprises the following concrete implementation steps:
1. preparation of transition base coat
The procedure is as in example 1, step 1. preparation of transition primer layer.
2. Preparation of transparent conductive layer
(1) In is formed by2O3The method is the same as example 1, step 2, preparation of the transparent conductive layer. Wherein the sputtering technological parameters are as follows: sputtering power 300W, substrate bias 30V, vacuum pressure 0.14Pa, sputtering time 8min, In2O3The film thickness was 112 nm.
3. Preparation of wear-resistant and corrosion-resistant layer
(1) The procedure is as in example 1, step 3. preparation of the abrasion and corrosion resistant layer. Wherein the sputtering parameters are as follows: the sputtering power is 300W, the substrate bias voltage is 30V, the air pressure is 0.14Pa, the sputtering time is 12min and 30s, and the wear-resistant and corrosion-resistant SiO with the thickness of 65nm is prepared2A film.
The film sample test method of example 1 was followed and the test results are shown in Table 2.
TABLE 2 SiO of the surface of the Quartz substrate2/In2O3/SiO2Performance of multilayer functional film
Example 3
A transparent conductive wear-resistant corrosion-resistant intelligent wearable external screen for devices is a transitional bottom layer SiO on a quartz glass sheet on a transparent substrate layer from inside to outside2Thin film, transparent conductive layer In2O3Film and wear-resistant and corrosion-resistant layer SiO2A film.
The preparation method comprises the following concrete implementation steps:
the same procedure as In example 2, wherein2O3Sputtering time of 11min30s, and the prepared transparent conductive layer In2O3The thickness of the film is 150 nm; SiO 22The sputtering time of (3) is 15min, and the prepared wear-resistant layer SiO2The thickness of the film was 90 nm.
The film sample test method of example 1 was followed and the test results are shown in Table 3.
TABLE 3 SiO of the surface of the Quartz substrate2/In2O3/SiO2Performance of multilayer functional film
Example 4
A transparent conductive wear-resistant corrosion-resistant intelligent wearable external screen for devices is a transitional bottom layer SiO on a quartz glass sheet on a transparent substrate layer from inside to outside2Film and transparent conductive wear-resistant and corrosion-resistant layer In2O3+SiO2The film is shown in FIG. 2.
The preparation method comprises the following concrete implementation steps:
1. preparation of transition base coat
The procedure is as in step 1 of example 1.
2. Preparation of transparent conductive wear-resistant corrosion-resistant layer
substrate/SiO2The film was placed on a rotating stand In2O3The powder is doped with SiO in a molar ratio of 10%2Powder; adjusting the target base distance to 13 cm; closing the cavity door, opening the mechanical pump for rough pumping, opening the molecular pump for fine pumping when the pressure of the vacuum chamber is less than 5.0Pa, and opening the molecular pump for fine pumping when the pressure of the vacuum chamber reaches 3.0 multiplied by 10-3Pa; regulating sputtering power to 300W and DC voltage to 30V, charging 15sccm Ar, ensuring that the air pressure in the vacuum chamber is 0.14Pa, sputtering for 10min, and preparing a layer of mixed transparent conductive material with thickness of 150nmWear-resistant layer In2O3+SiO2A film;
the film sample test method of example 1 was followed and the test results are shown in Table 4.
TABLE 4 SiO of the surface of the Quartz substrate2/(In2O3+SiO2) Performance of double-layer functional film
Comparative example 1
SiO abrasion and corrosion resistant layer in example 22The film was replaced with a film of 100nmTiO2The film was prepared in the same manner as in step 3 of example 2.
The film sample test method of example 1 was followed and the test results are shown in Table 5.
TABLE 5 SiO of the surface of the Quartz substrate2/In2O3/TiO2Performance of multilayer functional film
Example 5
A transparent conductive wear-resistant corrosion-resistant intelligent wearable external screen for devices is a 100 nm-thick transition priming layer Al located on a 5.0 mm-thick transparent basal layer sapphire glass sheet from inside to outside2O3Film, transparent conductive layer ITO film with thickness of 400nm and wear-resistant and corrosion-resistant layer Al with thickness of 400nm2O3A film.
Example 6
A transparent conductive wear-resistant corrosion-resistant intelligent wearable device external screen is a 5 nm-thick transition priming layer SiCO film, a 50 nm-thick transparent conductive layer FTO film and a 30 nm-thick wear-resistant corrosion-resistant layer SiCO film which are arranged on a 0.5 mm-thick transparent base layer polyvinyl alcohol membrane from inside to outside.
Example 7
A transparent conductive wear-resistant corrosion-resistant intelligent wearable external screen for a device with a thickness of 3mmSiO (silicon dioxide) bottom layer with thickness of 50nm transition on synthetic glass sheet of basal layer from inside to outside2Film, transparent conductive wear-resistant and corrosion-resistant layer SiO with thickness of 200nm2+SnO2A film.
Example 8
A transparent conductive wear-resistant corrosion-resistant intelligent wearable external screen for devices is a 50 nm-thick transition priming layer SiO (silicon dioxide) positioned on a 3 mm-thick transparent basal layer mineral crystal glass sheet and from inside to outside2Thin film, 50nm thick transparent conductive wear-resistant corrosion-resistant layer SiO2+ ITO film.
Example 9
A transparent conductive wear-resistant corrosion-resistant intelligent wearable external screen for devices is a 50 nm-thick transition priming layer SiO (silicon dioxide) positioned on a polyimide film with a transparent substrate layer with the thickness of 3mm from inside to outside2Thin film, transparent conductive wear-resistant and corrosion-resistant SiO layer with thickness of 400nm2+ FTO film.
Example 10
A transparent conductive wear-resistant corrosion-resistant intelligent wearable external screen for devices is a 50 nm-thick transition priming layer Al located on a 1 mm-thick transparent basal layer polyester membrane and from inside to outside2O3Film, 200nm thick transparent conductive wear-resistant corrosion-resistant layer Al2O3+In2O3A film.
Example 11
A transparent conductive wear-resistant corrosion-resistant intelligent wearable external screen for devices is a 50 nm-thick transition priming layer Al located on a 1 mm-thick transparent substrate layer polyethylene naphthalate (PEN) membrane and from inside to outside2O3Film, 200nm thick transparent conductive wear-resistant corrosion-resistant layer Al2O3+SnO2A film.
Example 12
A transparent conductive wear-resistant corrosion-resistant intelligent wearable external screen for devices is a 50 nm-thick transition priming layer Al located on a 2 mm-thick transparent basal layer sapphire glass sheet from inside to outside2O3Film, 200nm thick transparent conductive wear-resistant corrosion-resistant layer Al2O3+ ITO film.
Example 13
A transparent conductive wear-resistant corrosion-resistant intelligent wearable external screen for devices is a 50 nm-thick transition priming layer Al located on a 2 mm-thick transparent basal layer sapphire glass sheet from inside to outside2O3Film, 200nm thick transparent conductive wear-resistant corrosion-resistant layer Al2O3+ FTO film.
Example 14
A transparent conductive wear-resistant corrosion-resistant intelligent wearable device external screen is a 50 nm-thick transition priming layer SiCO film and a 200 nm-thick transparent conductive wear-resistant corrosion-resistant layer SiCO + In which are arranged on a 2 mm-thick transparent basal layer sapphire glass sheet from inside to outside2O3A film.
Example 15
A transparent conductive wear-resistant corrosion-resistant intelligent wearable device external screen is a 50 nm-thick transition priming layer SiCO film and a 200 nm-thick transparent conductive wear-resistant corrosion-resistant layer SiCO + SnO which are positioned on a 2 mm-thick transparent basal layer sapphire glass sheet from inside to outside2A film.
Example 14
A transparent conductive wear-resistant corrosion-resistant intelligent wearable device external screen is a 50 nm-thick transition priming layer SiCO film and a 200 nm-thick transparent conductive wear-resistant corrosion-resistant layer SiCO + ITO film which are positioned on a 2 mm-thick transparent basal layer sapphire glass sheet and from inside to outside.
Example 15
A transparent conductive wear-resistant corrosion-resistant intelligent wearable device external screen is a 50 nm-thick transition priming layer SiCO film and a 200 nm-thick transparent conductive wear-resistant corrosion-resistant layer SiCO + FTO film which are positioned on a 2 mm-thick transparent basal layer sapphire glass sheet from inside to outside.
Claims (4)
1. The utility model provides a device is outer to be shielded to wear resistant corrosion-resistant intelligence of transparent electrically conductive, its characterized in that, for being located transparent stratum basale supreme, including from inside to outside transition priming coat and transparent electrically conductive wear-resisting resistant layer or transition priming coat, transparent conducting layer and wear-resisting resistant layer, wherein:
the transparent substrate layer is one of quartz glass, sapphire glass, synthetic glass, mineral crystal glass, polyimide, polyvinyl alcohol, polyester and polyethylene naphthalate;
the transition bottom layer is SiO2、Al2O3A film formed of one of SiCO and SiCO;
the transparent conductive layer is In2O3、ITO、SnO2A film formed by one or a mixture of more of FTO;
the wear-resistant and corrosion-resistant layer is SiO2、Al2O3And SiCO film;
the transparent conductive wear-resistant corrosion-resistant layer is SiO2+In2O3、SiO2+SnO2、SiO2+ITO、SiO2+FTO、Al2O3+In2O3、Al2O3+SnO2、Al2O3+ITO、Al2O3+FTO、SiCO+In2O3、SiCO+SnO2A film formed by one or a mixture of more of SiCO + ITO and SiCO + FTO.
2. The transparent conductive wear-resistant and corrosion-resistant intelligent wearable device external screen as claimed in claim 1, wherein the thickness of the transparent substrate layer is 0.5-5.0 mm; the thickness of the transition priming layer is 5-100 nm; the thickness of the transparent conductive layer is 50-400 nm; the thickness of the wear-resistant and corrosion-resistant layer is 30-400 nm; the thickness of the transparent conductive wear-resistant corrosion-resistant layer is 50-400 nm.
3. The transparent conductive wear-resistant and corrosion-resistant external screen for intelligent wearable devices as claimed in claim 1, wherein the square resistance of the external screen is not more than 400 Ω/sq, the transparency is not less than 85%, the screen is free from abnormality after being eroded by acid and alkali sweat for 72 hours, is free from heterochromous and cracking, and has vibration friction not less than 12 hours.
4. The preparation method of the transparent conductive wear-resistant corrosion-resistant intelligent wearable device external screen as claimed in any one of claims 1 to 3, characterized by comprising the following steps:
(1) preparing a transparent substrate: conventionally cleaning a transparent substrate, and then placing the transparent substrate in a vacuum cavity of a magnetron sputtering system for plasma etching cleaning;
(2) preparing a transition base coat: at Ar or Ar + O2In the atmosphere, magnetron sputtering deposition is carried out on a transition bottom layer;
(3) preparing a transparent conductive layer and a wear-resistant and corrosion-resistant layer or a transparent conductive wear-resistant and corrosion-resistant layer: at Ar or Ar + O2And under the atmosphere, sequentially depositing a transparent conducting layer and a wear-resistant and corrosion-resistant layer on the surface of the transition priming layer by magnetron sputtering, or magnetron sputtering a transparent conducting wear-resistant and corrosion-resistant layer on the surface of the transition priming layer, and cooling to room temperature along with the furnace to obtain the composite material.
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