CN114527523A - Processing method of lens with real-time temperature measurement function - Google Patents

Processing method of lens with real-time temperature measurement function Download PDF

Info

Publication number
CN114527523A
CN114527523A CN202210024885.3A CN202210024885A CN114527523A CN 114527523 A CN114527523 A CN 114527523A CN 202210024885 A CN202210024885 A CN 202210024885A CN 114527523 A CN114527523 A CN 114527523A
Authority
CN
China
Prior art keywords
lens
temperature measurement
temperature
real
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202210024885.3A
Other languages
Chinese (zh)
Inventor
张博尧
冷雁冰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changchun University of Science and Technology
Original Assignee
Changchun University of Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changchun University of Science and Technology filed Critical Changchun University of Science and Technology
Priority to CN202210024885.3A priority Critical patent/CN114527523A/en
Publication of CN114527523A publication Critical patent/CN114527523A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C03C17/09—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
    • G01K7/00—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements
    • G01K7/16—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using resistive elements
    • G01K7/18—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using resistive elements the element being a linear resistance, e.g. platinum resistance thermometer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/251—Al, Cu, Mg or noble metals
    • C03C2217/253—Cu
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/251—Al, Cu, Mg or noble metals
    • C03C2217/254—Noble metals
    • C03C2217/255—Au
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/251—Al, Cu, Mg or noble metals
    • C03C2217/254—Noble metals
    • C03C2217/256—Ag
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering

Abstract

A processing method of a lens with a real-time temperature measurement function relates to the field of transmission type optical systems, in particular to a lens real-time temperature measurement technology. The technical scheme is as follows: s1, carrying out pretreatment of cleaning and drying the lens; s2, plating a metal temperature measuring unit lead layer by using ultraviolet overlay and magnetron sputtering technology; s3, soaking in an acetone solution for demoulding to obtain a lens with a temperature measurement lead structure; s4, performing cleaning and drying pretreatment; s5, plating a Pt temperature measuring unit layer; and S6, soaking the lens plated with the temperature measuring unit layer in an acetone solution for demoulding to obtain the lens with the real-time temperature measuring function. The invention fills the blank of the lens contact type real-time temperature measurement technology, has high temperature measurement accuracy and is suitable for the real-time temperature measurement of the lens in the optical system.

Description

Processing method of lens with real-time temperature measurement function
Technical Field
The invention relates to the field of transmission type optical systems, in particular to a lens real-time temperature measurement technology.
Background
The transmission type optical system is widely applied to the civil, military and aerospace fields in China, and the imaging quality of the transmission type optical system is greatly influenced by the change of the environmental temperature. For example, a star sensor, the change of the ambient temperature can cause the change of the refractive index of a lens material, so that an optical system is out of focus; the attitude of the external connecting flange, the detector and the lens can drift, so that the optical axis pointing deviation and the wavefront distortion of the external connecting flange, the detector and the lens can be caused, additional aberration can be generated, and the heading deviation of the carried satellite can be influenced. Aiming at the problems, if the real-time working temperature of the lens can be obtained, the real-time working temperature can be used as the reference for the temperature field recovery or the imaging adjustment of the lens, and the imaging quality of the transmission type optical system is greatly improved. Therefore, real-time measurement of the operating temperature of the lens in the optical system is a problem which is desired to be solved in the field of transmission-type optical systems.
At present, a real-time temperature measuring unit for an optical system can be classified into a non-contact type and a contact type according to the relationship between the real-time temperature measuring unit and a measured object. On one hand, the non-contact temperature measurement method is more easily influenced by media and environmental noise, so that the temperature measurement accuracy is low, the response time is long, and the method is also limited by factors such as large volume, weight and power consumption of a test end; on the other hand, for example, in temperature measuring units such as thermocouples, required cold end compensation is difficult to realize during on-orbit operation of the spacecraft, is generally used in ground experiments, and cannot be directly used for temperature measuring application of optical systems with higher requirements. The installation modes of the temperature measuring unit in the contact type temperature measuring method are mainly two, namely an embedded type and a surface pasting type. The embedded installation mode is not suitable for temperature measurement of the transmission type optical system, the surface pasting mode is to paste the temperature measurement module on the back of the reflector for real-time temperature measurement, the corresponding time is long, and the temperature measurement effect is poor. In summary, in the prior art, a real-time temperature measurement technology for a reflector is studied, but a good effect is not obtained all the time, that is: the problem of real-time temperature measurement by an optical element is still not solved effectively. Further, no technical means for measuring the temperature of the lens has been studied in the prior art, and the technique is still in a blank state.
Disclosure of Invention
In order to realize contact type real-time temperature measurement of the lens, the invention provides a lens real-time temperature measurement unit and a preparation method of a lead structure thereof.
The technical scheme of the invention is as follows:
a method for processing a lens with a real-time temperature measurement function preferably comprises the following steps:
s1, preprocessing the lens;
s2, coating and prebaking a photoresist, and plating a layer of metal film as a lead layer by using ultraviolet overlay and magnetron sputtering technologies;
s3, soaking the lens plated with the lead wire layer in an acetone solution for 30-90S for demoulding to obtain a lens with a temperature measurement lead wire structure;
s4, preprocessing the lens with the temperature measurement lead structure;
s5, coating and prebaking a photoresist, and plating a Pt film as a temperature measuring unit layer by using ultraviolet alignment and magnetron sputtering technologies;
s6, demolding of temperature measurement unit layers: and soaking the lens plated with the temperature measuring unit layer in an acetone solution for 30-90 s for demoulding to obtain the lens with the real-time temperature measuring function.
Preferably, the specific operation method of the preprocessing in steps S1 and S4 is as follows: and respectively cleaning the lens for 20-30 min by using cleaning liquid and deionized water in an ultrasonic cleaning machine, and then drying by using dry and pure high-pressure nitrogen.
Preferably, the step S2 includes the steps of:
s21, ultraviolet alignment: a flexible mask with a temperature measuring lead structure or a plane mask after pattern compensation is aligned to a lens, and is exposed for 40-90 s under ultraviolet light for ultraviolet alignment;
s22, fully developing and post-baking: immersing the lens subjected to ultraviolet alignment in 5 per mill of NaOH developing solution for full development, taking out to obtain a pattern structure consisting of a photoresist, and then putting the pattern structure into a constant-temperature drying box to heat to 120-140 ℃, and keeping the temperature for 20-30 min;
s23, plating a lead layer: the lens is placed in a magnetron sputtering device, a high-purity metal target material is adopted, the lens is heated to 100-300 ℃, and meanwhile, pre-vacuum is pumped to 2 multiplied by 10-4Pa～5×10-4After Pa, argon is filled, and the sputtering pressure is 1 multiplied by 100Pa～3×100Pa, sputtering current of 40 mA-120 mA, sputtering time of 15 min-45 min, sample rack rotating at 20 r/min-40 r/min, and plating a layer of metal film of 100nm as lead layer on the lens.
Preferably, the step S2 includes the steps of:
s21, ultraviolet alignment: aligning a planar mask with a temperature measuring lead structure after pattern compensation with a lens, and exposing for 60s under ultraviolet light to carry out ultraviolet alignment;
s22, fully developing and post-baking: immersing the lens subjected to ultraviolet alignment in 5 per mill of NaOH developing solution for full development, taking out to obtain a pattern structure consisting of a photoresist, and then putting the pattern structure into a constant-temperature drying box to heat to 120 ℃, and keeping the temperature constant for 30 min;
s23, plating a lead layer: placing the lens in a magnetron sputtering device, heating the lens to 200 ℃ by adopting a high-purity metal target material, and meanwhile, pre-vacuumizing to 5 multiplied by 10-4After Pa, argon is filled, and the sputtering pressure is 3 multiplied by 100Pa, sputtering current 20mA, sputtering time 15min, sample holder rotating at 20r/min, and plating a layer of 100nm metal film as lead layer on the lens.
Preferably, the high-purity metal target in step S23 is a high-purity metal Ag target, a high-purity metal Cu target, or a high-purity metal Au target.
Preferably, the step S5 includes the steps of:
s51, ultraviolet alignment: aligning a flexible mask of the temperature measuring unit or a plane mask after pattern compensation with a lens, and exposing for 40-90 s under ultraviolet light for ultraviolet alignment;
s52, fully developing and post-baking: immersing the lens subjected to secondary exposure into 5 per mill NaOH developing solution for full development, taking out the lens to obtain a pattern structure formed by covering a part of lead structure with photoresist, and then putting the pattern structure into a constant-temperature drying box to heat to 120-140 ℃, and keeping the temperature for 20-30 min;
s53, plating a temperature measuring unit layer: the lens is placed in a magnetron sputtering device, a high-purity metal Pt target material is adopted, the lens is heated to 100-300 ℃, and meanwhile, the lens is pre-vacuumized to 2 multiplied by 10-4Pa～5×10-4After Pa, argon is filled, and the sputtering pressure is 1 multiplied by 100Pa～3×100Pa, sputtering current of 100 mA-150 mA, sputtering time of 15 min-45 min, sample rack rotating at 20 r/min-40 r/min, and plating a 200nm Pt film on the lens as temperature measuring unit layer.
Preferably, the step S5 includes the steps of:
s51, ultraviolet alignment: aligning the flexible mask or the plane mask after the pattern compensation with the lens, exposing for 60s under ultraviolet light, and carrying out ultraviolet alignment;
s52, fully developing and post-baking: immersing the lens subjected to secondary exposure into 5 per mill of NaOH developing solution for full development, taking out the lens to obtain a pattern structure formed by covering a part of lead structure with photoresist, and then putting the pattern structure into a constant-temperature drying box to heat to 120 ℃, and keeping the temperature for 30 min;
s53, plating a temperature measuring unit layer: the lens is placed in a magnetron sputtering device, a high-purity metal Pt target material is adopted, the lens is heated to 200 ℃, and meanwhile, the lens is pre-vacuumized to 5 multiplied by 10-4After Pa, argon is filled, and the sputtering pressure is 3 multiplied by 100Pa, sputtering current 150mA, sputtering time 20min, sample holder rotating at 20r/min, and plating a 200nm Pt film on the lens as temperature measuring unit layer.
Preferably, the coating of the photoresist in steps S2 and S5 is performed by a lift-off coating method; the pre-baking operation conditions are as follows: and (3) putting the lens into a constant-temperature drying box, heating to 90-105 ℃, and keeping the temperature for 15-25 min.
The invention also provides a lens with a temperature measuring function, which comprises a lens body, a metal lead structure attached to the surface of the lens body and a Pt temperature measuring unit. Preferably, the lens is processed according to the processing method in the technical scheme.
The invention solves the problem of real-time temperature measurement of the lens which is always desired to be solved in an optical system, and has the following specific beneficial effects:
1. the lens with the real-time temperature measurement function is simple in preparation process, short in preparation period and low in cost;
2. the invention uses the technology of combining ultraviolet overlay with magnetron sputtering, the temperature of the substrate is low, the film forming speed is high, the combination firmness of the prepared lead and the temperature measuring unit with the lens is high, the high-precision preparation of the temperature measuring unit and the lead structure can be directly carried out on the working surface of the lens, and the effective light transmission area of the lens of an optical system is ensured;
3. the invention fills the blank of lens contact type real-time temperature measurement work, the accuracy of the temperature measurement result is high, the obtained temperature parameter can be used as an important reference for lens temperature field recovery or imaging adjustment, the influence of temperature change on the lens work is effectively avoided, and the invention has important significance for improving the imaging quality of a transmission type optical system and guiding the development progress of the optical system.
The invention discloses a processing method of a lens with a real-time temperature measurement function, which is suitable for real-time temperature measurement work of each lens in a transmission type optical system in on-orbit operation of a spacecraft and ground experiments.
Drawings
FIG. 1 is a flow chart of a method for processing a lens with a real-time temperature measurement function according to the present invention;
FIG. 2 is a schematic view of a planar mask after pattern compensation of a temperature measurement lead structure according to example 10;
FIG. 3 is a schematic view of a planar mask after pattern compensation of a temperature measuring unit in example 10;
fig. 4 is a schematic diagram showing a comparison between a real-time temperature measurement result of the lens and an actual temperature during the temperature raising process in example 11.
Detailed Description
The technical solutions of the present invention are further described below with reference to the accompanying drawings and specific examples, and it should be noted that the following examples are only for better understanding of the technical solutions of the present invention, and should not be construed as limiting the scope of the present invention.
Fig. 1 is a flow chart of a method for processing a lens with a real-time temperature measurement function according to the present invention, and the following embodiments of the present invention can be better understood with reference to the flow chart.
Example 1.
The embodiment provides a method for processing a lens with a real-time temperature measurement function, which specifically comprises the following steps:
s1, preprocessing the lens;
s2, coating and prebaking a photoresist, and plating a layer of metal film as a lead layer by using ultraviolet overlay and magnetron sputtering technologies;
s3, soaking the lens plated with the lead layer in an acetone solution for 30-90S for demoulding to obtain the lens with the temperature measurement lead structure;
s4, preprocessing the lens with the temperature measurement lead structure;
s5, coating and prebaking a photoresist, and plating a Pt film as a temperature measuring unit layer by using ultraviolet alignment and magnetron sputtering technologies;
s6, demolding of temperature measurement unit layers: and soaking the lens plated with the temperature measuring unit layer in an acetone solution for 30-90 s for demoulding to obtain the lens with the real-time temperature measuring function.
The resistance value of the metal changes along with the temperature change, wherein the measurement accuracy of the metal Pt used in the embodiment is the highest, and the display instrument indicates the temperature value corresponding to the resistance value of the Pt film temperature measuring unit during temperature measurement. The embodiment provides a lens real-time temperature measurement unit and a manufacturing process of a lead structure thereof, which make up the blank of a lens contact type real-time temperature measurement technology, and have important significance for guiding the recovery of a lens temperature field and ensuring the working precision of a transmission type optical system for the real-time temperature measurement work of a lens.
Example 2.
This embodiment is an illustration of the pretreatment in steps S1 and S4 in embodiment 1, and the specific operation method of the pretreatment is as follows: and respectively cleaning the lens for 20-30 min by using cleaning liquid and deionized water in an ultrasonic cleaning machine, and then drying by using dry and pure high-pressure nitrogen.
The pretreatment of the lens is directly related to the bonding strength and the film quality of the coating, and the lens is cleaned and dried before coating, so that the bonding firmness between the lead structure and the temperature measuring unit and the lens is ensured.
Example 3.
This example is an illustration of step S2 in example 1, wherein the specific operation flow of step S2 of plating a metal film as a temperature measuring lead layer is as follows;
s21, ultraviolet alignment: a flexible mask with a temperature measuring lead structure or a plane mask after pattern compensation is aligned to a lens, and is exposed for 40-90 s under ultraviolet light for ultraviolet alignment;
s22, fully developing and post-baking: immersing the lens subjected to ultraviolet alignment in 5 per mill of NaOH developing solution for full development, taking out to obtain a pattern structure consisting of a photoresist, and then putting the pattern structure into a constant-temperature drying box to heat to 120-140 ℃, and keeping the temperature for 20-30 min;
s23, plating a lead layer: the lens is placed in a magnetron sputtering device, a high-purity metal target material is adopted, the lens is heated to 100-300 ℃, and meanwhile, the lens is pre-vacuumized to 2 multiplied by 10-4Pa～5×10-4After Pa, argon is filled, and the sputtering pressure is 1 multiplied by 100Pa～3×100Pa, sputtering current of 40 mA-120 mA, sputtering time of 15 min-45 min, sample rack rotating at 20 r/min-40 r/min, and plating a layer of metal film of 100nm as lead layer on the lens.
Example 4.
This embodiment is another example of the step S2 in embodiment 1, wherein the specific operation flow of the step "S2, plating a metal film as a temperature measuring lead layer" is as follows;
s21, ultraviolet alignment: aligning a planar mask with a temperature measuring lead structure after pattern compensation with a lens, and exposing for 60s under ultraviolet light to carry out ultraviolet alignment;
s22, fully developing and post-baking: immersing the lens subjected to ultraviolet alignment in 5 per mill of NaOH developing solution for full development, taking out to obtain a pattern structure consisting of a photoresist, and then putting the pattern structure into a constant-temperature drying box to heat to 120 ℃, and keeping the temperature constant for 30 min;
s23, plating a lead layer: the lens is placed in a magnetron sputtering device, a high-purity metal target material is adopted, and the lens is heated to 2 DEGAt 00 deg.C, pre-vacuum to 5X 10-4After Pa, argon is filled, and the sputtering pressure is 3 multiplied by 100Pa, sputtering current 20mA, sputtering time 15min, sample holder rotating at 20r/min, and plating a layer of 100nm metal film as lead layer on the lens.
The uv overlay may use a flexible mask or a pattern compensated flat mask. The flexible mask has good fitting degree with the surface of the lens, but is easy to cause exposure result errors due to deformation; since errors are easily caused by diffraction or the like even during exposure using a mask, it is most preferable to perform ultraviolet alignment using a pattern-compensated flat mask.
The embodiment uses the ultraviolet overlay to combine with the magnetron sputtering technology, can directly carry out the high-precision preparation of the lead structure on the working surface of the lens, ensures the effective light passing area of the lens of the optical system, and has high combination firmness of the prepared lead structure and the lens.
Example 5.
This example further illustrates step S3 in examples 3 and 4, wherein the high-purity metal target in step S23 is a high-purity metal Ag target, a high-purity metal Cu target, or a high-purity metal Au target.
Since the lead structure of the temperature measuring unit needs to have good conductivity, should not cause impedance with the Pt film of the temperature measuring unit layer, and has good bonding property, the lead layer is plated with a high-purity metal Ag target, a high-purity metal Cu target, or a high-purity metal Au target.
Example 6.
This example is an illustration of step S5 in example 1, and the specific operation flow of step S5, plating a Pt film as the temperature measurement unit layer, is as follows:
s51, ultraviolet alignment: aligning a flexible mask of the temperature measuring unit or a plane mask after pattern compensation with a lens, and exposing for 40-90 s under ultraviolet light for ultraviolet alignment;
s52, fully developing and post-baking: immersing the lens subjected to secondary exposure into 5 per mill NaOH developing solution for full development, taking out the lens to obtain a pattern structure formed by covering a part of lead structure with photoresist, and then putting the pattern structure into a constant-temperature drying box to heat to 120-140 ℃, and keeping the temperature for 20-30 min;
s53, plating a temperature measuring unit layer: the lens is placed in a magnetron sputtering device, a high-purity metal Pt target material is adopted, the lens is heated to 100-300 ℃, and meanwhile, the lens is pre-vacuumized to 2 multiplied by 10-4Pa～5×10-4After Pa, argon is filled, and the sputtering pressure is 1 multiplied by 100Pa～3×100Pa, sputtering current of 100 mA-150 mA, sputtering time of 15 min-45 min, sample rack rotating at 20 r/min-40 r/min, and plating a 200nm Pt film on the lens as temperature measuring unit layer.
Example 7.
This example is another example of the step S5 in example 1, and the specific operation flow of the step "S5, plating a Pt film as a temperature measurement unit layer" includes:
s51, ultraviolet alignment: aligning the flexible mask or the plane mask after the pattern compensation with the lens, exposing for 60s under ultraviolet light, and carrying out ultraviolet alignment;
s52, fully developing and post-baking: immersing the lens subjected to secondary exposure into 5 per mill of NaOH developing solution for full development, taking out the lens to obtain a pattern structure formed by covering a part of lead structure with photoresist, and then putting the pattern structure into a constant-temperature drying box to heat to 120 ℃, and keeping the temperature for 30 min;
s53, plating a temperature measuring unit layer: the lens is placed in a magnetron sputtering device, a high-purity metal Pt target material is adopted, the lens is heated to 200 ℃, and meanwhile, the lens is pre-vacuumized to 5 multiplied by 10-4After Pa, argon is filled, and the sputtering pressure is 3 multiplied by 100Pa, sputtering current 150mA, sputtering time 20min, sample holder rotating at 20r/min, and plating a 200nm Pt film on the lens as temperature measuring unit layer.
The uv overlay may use a flexible mask or a pattern compensated flat mask. The flexible mask has good fitting degree with the surface of the lens, but is easy to cause exposure result errors due to deformation; since errors are easily caused by diffraction and the like even during exposure using a mask, it is most preferable to perform ultraviolet alignment using a pattern-compensated flat mask.
The embodiment uses the ultraviolet overlay combined with the magnetron sputtering technology, can directly carry out the high-precision preparation of the temperature measuring unit on the working surface of the lens, ensures the effective light transmission area of the lens of the optical system, and has high combination firmness of the prepared temperature measuring unit and the lens. In addition, the single temperature measuring unit can be manufactured, and a plurality of groups of temperature measuring units arranged in an array and corresponding lead structures can be manufactured according to the size of the lens and the required test precision requirement.
Example 8.
This example is a further illustration of steps S2 and S5 of example 1, wherein the coating of the photoresist is accomplished using a lift-off coating process; the pre-baking operation conditions are as follows: and (3) placing the lens into a constant-temperature drying box, heating to 90-105 ℃, and keeping the temperature for 15-25 min.
The embodiment adopts a lifting coating method to coat the photoresist on the surface of the lens, the thickness of a coated film layer can be controlled by presetting the dipping time and the lifting speed, and the method has no special requirements on the shape of the lens, has stable operation and no vibration of the liquid level during working, and can improve the coating precision and efficiency.
Example 9.
The embodiment provides a lens with a real-time temperature measurement function, which comprises a lens body, a metal lead structure attached to the surface of the lens body and a Pt temperature measurement unit.
Example 10.
This example is a further illustration of example 9, wherein the lens with real-time temperature measurement function is processed according to the processing method of examples 1-8.
Example 11.
Preparing an Ag lead structure on the surface of the lens: cleaning the lens with cleaning solution and deionized water in an ultrasonic cleaning machine for 20 minutes respectively, and then drying the lens with dry and pure high-pressure nitrogen; coating a layer of positive photoresist on the surface of the lens, placing the lens in a constant temperature drying oven, heating to 95 ℃, keeping the temperature for 20min, aligning the lens with a plane mask after pattern compensation of a temperature measurement lead structure, and showing the temperature measurement lead structure in figure 2Exposing the compensated planar mask pattern under ultraviolet light for 60s, soaking in 5 ‰ NaOH developer solution, developing, taking out, heating to 120 deg.C in a constant temperature drying oven, keeping the temperature for 30min, placing the lens in a magnetron sputtering device, heating to 200 deg.C with high purity Ag metal target, and pre-vacuumizing to 5 × 10-4After Pa, argon is filled, and the sputtering pressure is 3 multiplied by 100Pa, sputtering current of 20mA, sputtering time of 15min, rotating the sample rack at the speed of 20r/min, plating a layer of 100nm Ag film on the lens as a lead layer, soaking in acetone solution for 60s for demoulding to obtain a silver lead structure of the temperature measuring unit;
preparing a Pt film temperature measuring unit: cleaning the lens with the temperature measuring unit silver lead structure for 20 minutes by respectively using cleaning solution and deionized water in an ultrasonic cleaning machine, drying by using dry and pure high-pressure nitrogen, coating a layer of positive photoresist on the surface of the lens again, and then putting the lens into a constant-temperature drying box to heat to 95 ℃ and keeping the temperature for 20 minutes; aligning a planar mask after the graph compensation of a temperature measurement unit with a lens, wherein a schematic diagram of the planar mask after the graph compensation of the temperature measurement unit is shown in figure 3, exposing for 60s under ultraviolet light, immersing in 5 per mill NaOH developing solution for full development, taking out, then putting into a constant-temperature drying oven, heating to 120 ℃, keeping the temperature for 30min, placing the lens into a magnetron sputtering device, heating the lens to 200 ℃ by adopting a high-purity metal Pt target material, and meanwhile, pre-vacuumizing to 5 multiplied by 10-4After Pa, argon is filled, and the sputtering pressure is 3 multiplied by 100Pa, sputtering current 150mA, sputtering time 20min, sample frame rotating at 20r/min, plating a 200nm Pt film on the lens as temperature measuring unit layer, soaking the lens plated with temperature measuring unit layer in acetone solution for 60s to remove the film, forming the Pt film temperature measuring unit.
The lead structure on the lens is well connected with a power supply and a display instrument, the lens is placed in a digital display air-blowing drying box, after the temperature is kept for 30min at 20 ℃, the target temperature is set to be 50 ℃, the temperature of the lens is measured in real time in the temperature rising process, the test result is shown in figure 4, as can be seen from the figure, the temperature result obtained by applying the lead structure and the temperature measurement unit prepared in the embodiment is good in fitting performance with the displayed actual temperature of the digital display air-blowing drying box, the digital display air-blowing drying box used in the embodiment is a Korean digital display DAIHAN-WOF air-blowing drying box, and the control precision of the equipment temperature is +/-0.3 ℃ when the temperature is below 70 ℃. The above proves that the lens with the temperature measurement function processed by the method has high temperature measurement accuracy, and can be applied to an optical system needing real-time temperature measurement.

Claims (10)

1. A processing method of a lens with a real-time temperature measurement function is characterized by comprising the following steps:
s1, preprocessing the lens;
s2, coating photoresist and prebaking, and plating a layer of metal film as a lead layer by using ultraviolet overlay and magnetron sputtering technology;
s3, soaking the lens plated with the lead layer in an acetone solution for 30-90S for demoulding to obtain the lens with the temperature measurement lead structure;
s4, preprocessing the lens with the temperature measurement lead structure;
s5, coating and prebaking a photoresist, and plating a Pt film as a temperature measuring unit layer by using ultraviolet alignment and magnetron sputtering technologies;
s6, demolding of temperature measurement unit layers: and soaking the lens plated with the temperature measuring unit layer in an acetone solution for 30-90 s for demoulding to obtain the lens with the real-time temperature measuring function.
2. The method for processing a lens with a real-time temperature measurement function according to claim 1, wherein the pre-processing in steps S1 and S4 comprises the following steps: and respectively cleaning the lens for 20-30 min by using cleaning liquid and deionized water in an ultrasonic cleaning machine, and then drying by using dry and pure high-pressure nitrogen.
3. The method for processing a lens with a real-time temperature measurement function according to claim 1, wherein the step S2 includes the steps of:
s21, ultraviolet alignment: a flexible mask with a temperature measuring lead structure or a plane mask after pattern compensation is aligned to a lens, and is exposed for 40-90 s under ultraviolet light for ultraviolet alignment;
s22, fully developing and post-baking: immersing the lens subjected to ultraviolet alignment in 5 per mill of NaOH developing solution for full development, taking out to obtain a pattern structure consisting of a photoresist, and then putting the pattern structure into a constant-temperature drying box to heat to 120-140 ℃, and keeping the temperature for 20-30 min;
s23, plating a lead layer: the lens is placed in a magnetron sputtering device, a high-purity metal target material is adopted, the lens is heated to 100-300 ℃, and meanwhile, the lens is pre-vacuumized to 2 multiplied by 10-4Pa～5×10-4After Pa, argon is filled, and the sputtering pressure is 1 multiplied by 100Pa～3×100Pa, sputtering current of 40 mA-120 mA, sputtering time of 15 min-45 min, sample rack rotating at 20 r/min-40 r/min, and plating a layer of metal film of 100nm as lead layer on the lens.
4. The method for processing a lens with a real-time temperature measurement function according to claim 1, wherein the step S2 includes the steps of:
s21, ultraviolet alignment: aligning a planar mask with a temperature measuring lead structure after pattern compensation with a lens, and exposing for 60s under ultraviolet light to carry out ultraviolet alignment;
s22, fully developing and post-baking: immersing the lens subjected to ultraviolet alignment in 5 per mill of NaOH developing solution for full development, taking out to obtain a pattern structure consisting of a photoresist, and then putting the pattern structure into a constant-temperature drying box to heat to 120 ℃, and keeping the temperature constant for 30 min;
s23, plating a lead layer: placing the lens in a magnetron sputtering device, heating the lens to 200 ℃ by adopting a high-purity metal target material, and meanwhile, pre-vacuumizing to 5 multiplied by 10-4After Pa, argon is filled, and the sputtering pressure is 3 multiplied by 100Pa, sputtering current 20mA, sputtering time 15min, sample holder rotating at 20r/min, and plating a layer of 100nm metal film as lead layer on the lens.
5. The method for processing the lens with the real-time temperature measurement function according to claim 3 or 4, wherein the high-purity metal target in the step S23 is a high-purity metal Ag target, a high-purity metal Cu target, or a high-purity metal Au target.
6. The method for processing the lens with the real-time temperature measurement function according to claim 1, wherein the step S5 includes the steps of:
s51, ultraviolet alignment: aligning a flexible mask of the temperature measuring unit or a plane mask after pattern compensation with a lens, and exposing for 40-90 s under ultraviolet light for ultraviolet alignment;
s52, fully developing and post-baking: immersing the lens subjected to secondary exposure into 5 per mill NaOH developing solution for full development, taking out the lens to obtain a pattern structure formed by covering a part of lead structure with photoresist, and then putting the pattern structure into a constant-temperature drying box to heat to 120-140 ℃, and keeping the temperature for 20-30 min;
s53, plating a temperature measuring unit layer: the lens is placed in a magnetron sputtering device, a high-purity metal Pt target material is adopted, the lens is heated to 100-300 ℃, and meanwhile, the lens is pre-vacuumized to 2 multiplied by 10-4Pa～5×10-4After Pa, argon is filled, and the sputtering pressure is 1 multiplied by 100Pa～3×100Pa, sputtering current of 100 mA-150 mA, sputtering time of 15 min-45 min, sample rack rotating at 20 r/min-40 r/min, and plating a 200nm Pt film on the lens as temperature measuring unit layer.
7. The method for processing a lens with a real-time temperature measurement function according to claim 1, wherein the step S5 includes the steps of:
s51, ultraviolet alignment: aligning the flexible mask or the pattern-compensated planar mask with the lens, exposing for 60s under ultraviolet light, and carrying out ultraviolet alignment;
s52, fully developing and post-baking: immersing the lens subjected to secondary exposure into 5 per mill of NaOH developing solution for full development, taking out the lens to obtain a pattern structure formed by covering a part of lead structure with photoresist, and then putting the pattern structure into a constant-temperature drying box to heat to 120 ℃, and keeping the temperature for 30 min;
s53, plating temperature measurementUnit layer: the lens is placed in a magnetron sputtering device, a high-purity metal Pt target material is adopted, the lens is heated to 200 ℃, and meanwhile, the lens is pre-vacuumized to 5 multiplied by 10-4After Pa, argon is filled, and the sputtering pressure is 3 multiplied by 100Pa, sputtering current 150mA, sputtering time 20min, sample holder rotating at 20r/min, and plating a 200nm Pt film on the lens as temperature measuring unit layer.
8. The method for processing a lens with real-time temperature measurement function as claimed in claim 1, wherein said coating of photoresist in steps S2 and S5 is performed by a lift coating method; the pre-baking operation conditions are as follows: and (3) putting the lens into a constant-temperature drying box, heating to 90-105 ℃, and keeping the temperature for 15-25 min.
9. The lens with the real-time temperature measurement function is characterized by comprising a lens body, a metal lead structure attached to the surface of the lens body and a Pt temperature measurement unit.
10. The lens with real-time temperature measurement function according to claim 9, wherein the lens is processed according to the processing method of any one of claims 1 to 8.
CN202210024885.3A 2022-01-11 2022-01-11 Processing method of lens with real-time temperature measurement function Pending CN114527523A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202210024885.3A CN114527523A (en) 2022-01-11 2022-01-11 Processing method of lens with real-time temperature measurement function

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202210024885.3A CN114527523A (en) 2022-01-11 2022-01-11 Processing method of lens with real-time temperature measurement function

Publications (1)

Publication Number Publication Date
CN114527523A true CN114527523A (en) 2022-05-24

Family

ID=81620276

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202210024885.3A Pending CN114527523A (en) 2022-01-11 2022-01-11 Processing method of lens with real-time temperature measurement function

Country Status (1)

Country Link
CN (1) CN114527523A (en)

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09292285A (en) * 1996-04-30 1997-11-11 Yamaha Corp Measuring method of substrate temperature
US6022749A (en) * 1998-02-25 2000-02-08 Advanced Micro Devices, Inc. Using a superlattice to determine the temperature of a semiconductor fabrication process
JP2002096502A (en) * 2000-09-25 2002-04-02 Ricoh Co Ltd Imaging apparatus
JP2003290944A (en) * 2002-04-04 2003-10-14 Mitsubishi Electric Corp Laser beam machining apparatus
JP2006078478A (en) * 2004-08-12 2006-03-23 Komatsu Ltd Film temperature sensor and substrate for temperature measurement
CN102175757A (en) * 2011-02-16 2011-09-07 西安交通大学 Carbon nanotube film three-electrode sensor and manufacturing method thereof
CN103128439A (en) * 2011-11-24 2013-06-05 三菱电机株式会社 Lens unit and laser processing device
CN107340074A (en) * 2017-08-28 2017-11-10 无锡北斗星通信息科技有限公司 A kind of image capture analysis method
WO2020162235A1 (en) * 2019-02-06 2020-08-13 日東電工株式会社 Temperature sensor film, electrically conductive film, and method for producing same
US20210318177A1 (en) * 2020-04-08 2021-10-14 Watlow Electric Manufacturing Company Resistance calibration and monitoring of thermal systems

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09292285A (en) * 1996-04-30 1997-11-11 Yamaha Corp Measuring method of substrate temperature
US6022749A (en) * 1998-02-25 2000-02-08 Advanced Micro Devices, Inc. Using a superlattice to determine the temperature of a semiconductor fabrication process
JP2002096502A (en) * 2000-09-25 2002-04-02 Ricoh Co Ltd Imaging apparatus
JP2003290944A (en) * 2002-04-04 2003-10-14 Mitsubishi Electric Corp Laser beam machining apparatus
JP2006078478A (en) * 2004-08-12 2006-03-23 Komatsu Ltd Film temperature sensor and substrate for temperature measurement
CN102175757A (en) * 2011-02-16 2011-09-07 西安交通大学 Carbon nanotube film three-electrode sensor and manufacturing method thereof
CN103128439A (en) * 2011-11-24 2013-06-05 三菱电机株式会社 Lens unit and laser processing device
CN107340074A (en) * 2017-08-28 2017-11-10 无锡北斗星通信息科技有限公司 A kind of image capture analysis method
WO2020162235A1 (en) * 2019-02-06 2020-08-13 日東電工株式会社 Temperature sensor film, electrically conductive film, and method for producing same
US20210318177A1 (en) * 2020-04-08 2021-10-14 Watlow Electric Manufacturing Company Resistance calibration and monitoring of thermal systems

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
YANBING LENG: "Influence of Processing Parameter on Nanoscale Anodic Oxidation by AFM", IEEE, pages 420 - 424 *
冯伟: "基于非平、屈曲结构的铂薄膜温度传感器制备与测试", CNKI, no. 2021, pages 1 - 69 *

Similar Documents

Publication Publication Date Title
Sim et al. Three-dimensional curvy electronics created using conformal additive stamp printing
CN100592038C (en) Preparation method of flexible thin film Ni resistance sensor
CN111584672B (en) Indium column of infrared focal plane detector and preparation method thereof
CN109748238B (en) Preparation method of large-area and uniform nano dimer array
CN108007595B (en) Probe type film thermocouple temperature sensor and manufacturing method thereof
JP2010267395A (en) Transparent conductive film and method for manufacturing transparent conductive film and transparent electrode for electronic device
CN106403804A (en) High temperature synchronous compensation film strain gauge and its preparation method
CN104849783A (en) Visible and near infrared light absorber based on nanoimprint lithography process and processing method thereof
CN114527523A (en) Processing method of lens with real-time temperature measurement function
CN105021308B (en) A kind of aluminium modifies enhanced fiber grating temperature sensor manufacture method
CN111517274A (en) High-precision etching transfer method for micro-nano structure pattern on curved surface substrate
US11703448B2 (en) Sample signal amplification method using terahertz band graphene absorber
GB2615393A (en) Composite film strain gauge based on magnetron sputtering and method for preparing the same
CN204575880U (en) A kind of based on the visible of nano-imprint process and near-infrared absorption body
TWI682481B (en) Vacuum drying device, substrate processing device and vacuum drying method
US3022570A (en) Vacuum deposited strain gage and method of making same
TW201939791A (en) Producing method of mask integrated frame
KR102625102B1 (en) Substrate processing apparatus, substrate processing system, and substrate processing method
Kassaei et al. Inflexible silicon solar cell encapsulation process on curved surfaces: Experimental investigation
CN109141663A (en) A kind of production method of integrated form coaxial thermocouple
CN108594347A (en) A kind of low cost terahertz polarization slice processing method
CN109786495B (en) Super-large scale staring type infrared detector splicing substrate and preparation method thereof
CN100349047C (en) Passivation protection method for silicon-based liquid crystal aluminium reflection electrode
KR102303529B1 (en) Measuring apparatus
CN109546011B (en) Film layer manufacturing method, display substrate and manufacturing method and device thereof

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination