CN114507015A

CN114507015A - Glass sheet, preparation method, shell and electronic equipment

Info

Publication number: CN114507015A
Application number: CN202011287954.7A
Authority: CN
Inventors: 高志伟; 李聪; 唐中帜
Original assignee: Guangdong Oppo Mobile Telecommunications Corp Ltd
Current assignee: Guangdong Oppo Mobile Telecommunications Corp Ltd
Priority date: 2020-11-17
Filing date: 2020-11-17
Publication date: 2022-05-17
Anticipated expiration: 2040-11-17
Also published as: WO2022105378A1; CN114507015B

Abstract

The application discloses a glass sheet, a preparation method of the glass sheet, a shell and electronic equipment. The glass plate comprises: the utility model provides a metal wire drawing machine, including base member, the surface of base member one side has mole stripe, mole stripe includes a plurality of first portions and a plurality of second portion at least, first portion has first height, the second portion has the second height, mole stripe still has boundary portion, boundary portion is located the junction area, the junction area does first portion extending direction with the junction of second portion extending direction, and be located same straight line and adjacent two pass through between the first portion the boundary portion is connected, is located same straight line and adjacent two pass through between the second portion the boundary portion is connected. The glass plate can provide dazzling mole interference patterns through the mole stripes, thereby having a good appearance effect, being durable in use, and avoiding the defect that the stripe patterns are not durable due to the aging of the polymer membrane.

Description

Glass sheet, preparation method, shell and electronic equipment

Technical Field

The application relates to the field of electronic equipment, in particular to a glass plate, a preparation method, a shell and electronic equipment.

Background

In order to adapt to the coming of the 5G era, the structures of the shell and the like designed based on 3G/4G communication in the current electronic equipment also need to be improved according to the 5G communication mode. Materials that are currently widely used in electronic device housings include mainly metals, plastics, ceramics, and glass. Although the plastic can meet the radio frequency requirement of 5G transmission, the plastic has poor texture and is not scratch-resistant; the ceramic not only meets the radio frequency requirement, but also has beautiful and unique ceramic texture, but is difficult to process at present and has high cost; in comparison, the glass can meet the radio frequency requirement, can realize bright texture, has mature processing technology and controllable cost, and the extremely high transmittance of the glass can meet the diversified design of the appearance of a product (such as CMF, color, material and finishing). However, most of the existing glass brings a cool and dazzling light and shadow effect by means of attaching a polymer membrane with micro-nano textures, the polymer membrane is difficult to avoid aging deformation in long-term use, and the micro-nano textures on the membrane deform and crack, so that the appearance effect is seriously influenced. In order to solve the problem, micro-nano textures can be etched on the surface layer of the glass to replace the micro-nano textures on the membrane so as to achieve a similar shadow effect.

However, the current glass plate and the preparation method, the housing and the electronic device still need to be improved.

Disclosure of Invention

The present application is directed to solving, at least to some extent, one of the technical problems in the related art.

In view of the above, in one aspect of the present application, a glass sheet is provided. The glass plate comprises: the base member, the surface of base member one side has mole stripe, mole stripe includes a plurality of first portions and a plurality of second portion at least, a plurality of first portions all extend along the first direction, a plurality of second portions all extend along the second direction, first direction with the second direction is crossing, first portion has first height, the second portion has the second height, mole stripe still has boundary portion, boundary portion is located the interface district, the interface district be first portion extending direction with the junction of second portion extending direction, and be located same straight line and adjacent two pass through between the first portion the boundary portion is connected, be located same straight line and adjacent two pass through between the second portion the boundary portion is connected. The glass plate can provide dazzling mole interference patterns through the mole stripes, thereby having a good appearance effect, being durable in use, and avoiding the defect that the stripe patterns are not durable due to the aging of the polymer membrane.

In another aspect of the present application, there is provided a method of making a glass sheet as described above, the method comprising forming moir e patterns on a surface of one side of a substrate, the operation of forming the moir patterns comprising: the method comprises the steps of forming the mole stripes on the surface of one side of the body through at least two times of etching treatment based on a first etching mask and a second etching mask, forming a first part of the mole stripes based on the first etching treatment, forming a second part and a boundary part of the mole stripes based on the second etching treatment, and further comprising the operation of removing the first etching mask before the second etching treatment. Thus, the glass plate material can be easily obtained.

In yet another aspect of the present application, a housing is presented. At least a portion of the housing is formed from the glass sheet material described above. Therefore, the shell has at least one of the advantages of good appearance texture effect, durability and the like.

In yet another aspect of the present application, an electronic device is presented. The electronic device includes: the shell is characterized in that the shell is used for limiting a containing space, the mole stripes are positioned on one side of the shell, which deviates from the containing space, and the shell comprises a mainboard and a display screen, wherein the mainboard is electrically connected with the display screen and positioned in the containing space. Thus, the electronic device has at least one of the following advantages: the transmission of 5G signal is convenient, and the touch screen has better appearance texture effect and is durable.

Drawings

FIG. 1 shows a schematic structural view of a glass sheet according to one example of the present application;

FIG. 2 shows a schematic cross-sectional structure of a glass sheet at various locations according to an example of the present application;

FIG. 3 shows a schematic cross-sectional structure of a glass sheet at various locations according to another example of the present application;

FIG. 4 shows a schematic flow diagram of a method of making a glass sheet according to one example of the present application;

FIGS. 5 a-5 d show a schematic flow diagram of a method of making a glass sheet according to one example of the present application;

FIGS. 6 a-6 e show schematic flow diagrams of a method of making a glass sheet according to another example of the present application;

FIGS. 7 a-7 c show a schematic flow diagram of a portion of a method of making a glass sheet according to another example of the present application;

FIG. 8 shows a schematic structural view of a housing according to an example of the present application;

FIG. 9 shows a schematic structural diagram of an electronic device according to an example of the present application;

FIG. 10 shows a schematic of a stripe pattern structure according to an example of the present application;

FIG. 11 shows a schematic representation of a coordinate system representing moir e fringes, according to one example of the present application;

fig. 12 shows a schematic of the structure of a first stripe pattern, a second stripe pattern, and moir stripes according to one example of the present application.

Description of reference numerals:

100: a substrate; 110: mole stripes; 10: a first part; 20: a second section; 50: a boundary portion; 30: a third section; 40: a fourth section; 200: a first etching mask; 300: a second etching mask; 1100: a housing; 1000: an electronic device.

Detailed Description

Reference will now be made in detail to embodiments of the present application, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are exemplary only for the purpose of explaining the present application and are not to be construed as limiting the present application.

In this application, unless otherwise expressly stated or limited, the terms "connected," "connected," and "communicating," and the like are to be construed broadly, e.g., as meaning directly connected or indirectly connected through intervening media or elements. Specific meanings of the above terms in the present application can be understood by those of ordinary skill in the art as specific cases as long as structural relationships according to the embodiments of the present application are satisfied.

In one aspect of the present application, a glass sheet is presented. Referring to fig. 1, the glass sheet includes a substrate 100, and moir e patterns 110 on one side of the substrate 100. The moire fringes 110 include at least a plurality of first portions 10 (10A and 10B shown in the figure) and a plurality of second portions 20 (20A and 20B shown in the figure). The first portions 10 each extend in a first direction and the second portions each extend in a second direction, as indicated by the arrows in the figure. The first direction and the second direction intersect, i.e. the first portion 10 and the second portion 20 are not arranged in parallel. Wherein the first portion has a first height and the second portion has a second height. The moire pattern also has an interface 50, wherein the interface 50 is located in an interface region, and the interface region is a boundary between the first extending direction and the second extending direction, as shown by the dashed line frame in the figure. Two adjacent first portions 10 on the same straight line are connected by a boundary portion 50, and two adjacent second portions 20 on the same straight line are also connected by a boundary portion 50.

The surface of one side of the glass plate is provided with the mole fringes capable of obtaining the visual effect of the interference mole fringes, so that the visual effect of the glass plate can be improved, and the defects of peeling, wire breakage and the like caused by the short service life of the film due to the adoption of the appearance film are avoided. Moreover, the molar stripes directly formed on the surface of the glass can provide texture hand feeling for the glass plate, so that the appearance and the using effect of the glass plate as a shell of the electronic equipment are further improved.

According to an example of the present application, the first portion and the second portion may be straight lines extending in a fixed direction (the first direction and the second direction as described above), or may have a shape such as a wavy line or a broken line having an axis of symmetry extending in the first direction or the second direction. In the drawings of the present application, only the first and second portions are illustrated as linear stripes, and the shapes shown in the drawings are merely for convenience of understanding and cannot be understood as a limitation of the moire shapes according to the examples of the present application.

According to some examples of the present application, the moire fringes may be protrusions or depressions on the surface of the substrate. The moire fringes can be integrally formed with the substrate, and can be formed, for example, by removing a portion of the glass material on one side surface of the substrate except for the moire fringes by a process including, but not limited to, etching. According to examples of the present application, moir e can be decomposed into a superposition of a first fringe pattern having a first height and a second fringe pattern having a second height with an overlap region between the first and second fringe patterns. The overlapping region between the first stripe pattern and the second stripe pattern constitutes a boundary portion of the moire pattern. For example, the moire may be formed by forming a first moire pattern on a surface of the substrate by etching and then forming a second moire pattern, and the two moire patterns may constitute the moire. Specifically, the first stripe pattern extends in a first direction and the second stripe pattern extends in a second direction. The portions of the first stripe pattern that do not intersect the second stripe pattern constitute the first portions, and the portions of the second stripe pattern that do not intersect the first stripe pattern constitute the second portions. The overlapped area between the first stripe pattern and the second stripe pattern forms a boundary part. More specifically, when the first and second directions are not perpendicular to each other, the interface 50 may include the third and

fourth portions

30 and 40. The fourth portion has a fourth height, and the fourth height may be greater than or equal to the greater of the first height and the second height. The third portion 30 and the fourth portion 40 are both located in a junction area (shown as a dashed line) where the first portion extends and the second portion extends. And the two adjacent first parts which are positioned on the same straight line are connected through at least one of the third part and the fourth part, and the two adjacent second parts which are positioned on the same straight line are connected through at least one of the third part and the fourth part. In other words, one or two of the third portion and the fourth portion are separated between two first portions which are positioned on the same straight line, and the two first portions which are positioned on the same straight line are connected through at least one of the third portion and the fourth portion; one or two of the third part and the fourth part are arranged between the two second parts which are positioned on the same straight line at intervals, and the two second parts which are positioned on the same straight line are connected through at least one of the third part and the fourth part.

Specifically, referring to fig. 2, (a) in fig. 2 may be a schematic sectional view along a-a ' direction in fig. 1, (B) may be a schematic sectional view along B-B ' direction in fig. 1, and (C) may be a schematic sectional view along C-C ' direction in fig. 1, when the moire is a protrusion. In this case, the heights of the first portion, the second portion, the third portion, and the fourth portion are the distances between the surface of each portion away from the base 100 and the base 100, that is, the heights of the portions protruding from the base. The second portion 20 is formed by a second stripe pattern. The interface is formed by the intersection of the first stripe pattern and the second stripe pattern, namely: the portions where the first stripe pattern and the second stripe pattern intersect are first subjected to a first etching treatment when the first stripe pattern is formed, and then the glass material at the positions is also subjected to a second etching treatment when the second stripe pattern is formed. Taking the example shown in fig. 1 when the angle between the first direction and the second direction is not 90 degrees, referring to (b) and (c) in fig. 2, the interface further includes a third portion 30 and a fourth portion 40. Thus, at least a portion of the height of the interface will be greater than the first height, such as the height h3 of third portion 30, and the height h4 of fourth portion 40 may be greater than or equal to the second height h 2.

If the fourth portion 40 having the fourth height h4 is formed by etching twice at the portion where the first stripe pattern and the second stripe pattern completely overlap, h4 may be greater than h1 and greater than h2, and at least greater than or equal to the larger of h1 and h 2. In the case where the first direction and the second direction are not perpendicular to each other, a part of the first stripe pattern does not intersect the second stripe pattern in a direction perpendicular to the first direction (i.e., a direction in which the first portion or the first stripe pattern extends), and this part of the glass material is subjected to the etching process only once, while the other part of the first stripe pattern intersects the second stripe pattern, and this position is subjected to the etching process 2 times. That is, as shown in fig. 2 (b), the glass material of the portion constitutes the third portion 30, the third portion 30 has a third height h3, the third portion 30 is disposed adjacent to at least one of the first portion 10 and the second portion 20, and the third height h3 may further constitute a step structure with the third portion, specifically, may constitute a step structure with at least one of the first portion 10 and the second portion 20. It should be particularly noted that the drawings only show the case where the third portion and the first portion constitute a step structure, and the present application is not limited thereto. As described above, the first portion and the second portion are only for distinguishing the two structures forming the moire pattern, and therefore the third portion and the second portion may form a step structure. Specifically, taking the glass plate as a rectangle, the rectangle has two pairs of edges perpendicular to each other, one of which is taken as the x direction and the other is taken as the y direction, taking the acute angle between the first direction and the y direction as an example, referring to fig. 1 and 2, the left half (the portion near the mark B in fig. 1) of the first texture at B-B 'shown in fig. 1 and 2 (B) is subjected to only the etching process for forming the first texture pattern, and the portion at the frame of the broken line along the B-B' direction is subjected to both the first etching process for forming the first texture pattern and the second etching process for forming the second texture, where the height of the first portion 10 adjacent to the frame of the broken line is h1, and the glass material is removed more in the portion in the direction B-B' as indicated by the dotted line frame, and the third portion 30 at (B) in fig. 2 can be formed. It can be understood by those skilled in the art that (B) in fig. 2 does not fully show a portion of the second portion 20A along the B-B' direction. Similarly, when the above moir e is a depression of the base surface, referring to (a) to (c) in fig. 3, a depressed streak may be formed at a specific portion of the base surface by, for example, removing the glass material at the first streak pattern and the second streak pattern by etching. The non-intersecting portions of the first and second stripe patterns of the depressions form first and second recessed

portions

10 and 20, and the depth of the depressions is the corresponding height of the first and second portions. Similarly, in fig. 2, (c) is etched twice, and a fourth portion 40 with a deeper depth is formed. In fig. 2, (b) is a portion which is subjected to only the etching process for forming the first stripe pattern and is the first portion 10, and another portion which is subjected to the etching process twice and forms the third portion 30 having a deeper depth.

It should be particularly noted that the heights of the first portion and the third portion shown in fig. 2 and 3 are merely for illustration purposes to facilitate understanding of the positions of the first portion and the third portion, and are not to be construed as limiting the relative heights of the first portion and the third portion. That is, the first portion and the third portion may have different heights, and the first portion may have a high height or the third portion may have a high height. Similarly, h1-h4 shown in FIG. 2 are also intended only to distinguish the heights of the different portions that make up the moir e fringes, and are not to be construed as limiting the specific heights of the first, second, third and fourth portions. In particular, the first and second portions may have the same height, i.e. h1 may be equal to h 2. Alternatively, the first section may have a greater height than the second section, i.e., h1 may be greater than h 2. h4 is the height of the fourth portion, and since the fourth portion has been etched twice, the height of the fourth portion may be equal to or greater than the larger of h1 and h2, or may be greater than both the height of the first portion, h1, and the height of the second portion, h 2.

According to some examples of the application, the third portion may also form a step structure with the first portion and the second portion, i.e. the third portion may be located between the first portion 10 and the second portion 20, three of which form two step structures. As described above, the first stripe pattern and the second stripe pattern may be recesses formed on the surface of the substrate by etching and removing the glass material at corresponding positions, and referring to fig. 6a to 6e, after the first stripe pattern is formed using the first etching mask 200, referring to fig. 6c, the second etching mask 300 may be disposed on the substrate having the first stripe pattern. Referring to (B) of fig. 6d, only a portion of the recess portion located in the direction of B-B' in fig. 6c is covered by the second etch mask 300. In other words, therefore, when the etching is continued to form the second stripe pattern, the portion exposed to the outside at the position in the B-B' direction in fig. 6c is a structure having a step as shown in (B) in fig. 6 d. Therefore, the depth of the structure of the partial step is continuously deepened when the second stripe pattern is formed by the second etching, and a third part and a second part are further formed. At this time, the third portion 30 is located between the first portion (the recess portion covered by the second etching mask 300 in fig. 6 e) and the second portion 20, and the three portions may form a two-step structure.

According to some examples of the present application, the maximum height of the moire fringes may not exceed 100 microns. That is, the height of the portion having the largest height h among the first, second, third, and fourth portions is not more than 100 μm. Preferably no more than 10 microns, more preferably no more than 6 microns. As described above, the above-described moire may be formed by etching a glass material. Therefore, controlling the height of the moire not to exceed the above value, particularly not to exceed 6 μm, ensures that the glass material after the etching treatment still has sufficient mechanical strength. Moreover, since the moire pattern proposed by the present application is formed by overlapping a plurality of patterns (such as the aforementioned fringe patterns), it is necessary to perform a plurality of (at least two) etching processes on the same side surface of the glass material. Therefore, the height of the mole fringes is reasonably controlled, so that the mole fringes can be ensured to have a good interference fringe visual effect and can provide a certain uneven touch, and the influence on the strength of the formed glass plate due to the excessively large height of the mole fringes and the excessively harsh etching process can be prevented.

According to an embodiment of the present application, the moire, the first fringe pattern, and the second fringe pattern have a frequency vector f and a frequency vector modulo f, respectively, independently, the frequency vector modulo f being the number of fringes within a length range of 1000 μm in a direction perpendicular to the fringe vector, the moire having a vector f_{Massage device}And in a polar coordinate system has f_{Massage device}＝(f_{Massage device},θ_{Massage device}) The first stripe pattern has a vector f₁And in a polar coordinate system has f₁＝(f₁,θ₁)，θ₁0, the second stripe pattern has a vector f₂And in a polar coordinate system has f₂＝(f₂,θ₂)，0＜θ₂Not more than 90, and eta ═ f₁/f₂Theta is f₁And f₂The Moire fringe, the first fringe pattern and the second fringe pattern satisfy the following conditions:

(1)f₁and f₂Are each independently in the range of 5 to 1000;

(2)0.1≤f_{moire pattern}≤1000；

(3)0°≤θ_{Moire pattern}≤90°；

(4)0.005≤η≤200；

(5)θ_{Massage device}＝arctan(sinθ/(cosθ-η))，

Or theta_{Massage device}＝arctan(sinθ/(cosθ+η))，

The Moire fringes meeting the conditions have a good dazzling Moire fringe effect, so that people cannot feel dizzy due to excessively dense or messy fringes, and a visual effect that precise interference Moire fringes cannot be formed due to improper setting of fringe intervals is avoided. In addition, the moire patterns satisfying the above conditions may be formed by the first and second moire patterns having appropriate pitches and widths, so that the base material of the glass plate material after etching may still maintain a certain mechanical strength.

According to some specific embodiments of the present application, the moire pattern, the first fringe pattern, and the second fringe pattern may further satisfy the following condition:

0.25≤f_{moire pattern}≤50；

0°≤θ_{Moire pattern}≤90°；

f₁And f₂Are each independently in the range of 7 to 50;

0.5≤η≤2；

and theta₂Satisfies the condition that theta is less than 0 DEG₂≤(arccosη/2)*180/π。

Therefore, the visual effect of the Moire fringes can be further improved, and the integral mechanical strength of the glass plate is ensured not to be obviously reduced.

For convenience of understanding, the above parameters of the first stripe pattern, the second stripe pattern, and the moire stripes are explained in detail below. As mentioned above, the moire fringes can bring the visual effect of the glare texture to the glass plate, so that the moire fringes on the glass plate need to be realThe interference fringes are now visible to the naked eye. Therefore, the shape, frequency, and the like of the moire according to the present application need to satisfy certain conditions. Referring to fig. 11, in order to distinguish moire fringes caused by aliasing interference with a general waveform, a moire generation process is simulated by using the simplest cosine grating in spectrum information. Now, an angle between the vector direction of each frequency vector and the u-axis is defined as θ, which is an angle of the frequency vector. Since the number of streaks within a length of 1000 μm perpendicular to the vector direction is modulo f of the frequency vector, the polar coordinates of the frequency vector f are (f, θ), converted into cartesian coordinates (f × cos θ, f × sin θ), and the width of the streaks is L, that is, f is 1000 μm/L. For example, the two stripe patterns mentioned above are superimposed, and the first stripe pattern can be represented as f₁＝(f₁,θ₁) The second stripe pattern can be expressed as f₂＝(f₂,θ₂). For simplicity of description, let's f₁Is oriented as the y-axis as shown in fig. 11, whereby the vectors of the two fringe patterns can be simply represented as:

f₁＝(f₁,0°)，

f₂＝(f₂,θ₂)，

definition of θ as f₁And f₂The included angle between the first stripe pattern and the second stripe pattern is the superposition angle of the first stripe pattern and the second stripe pattern. Eta is f₁And f₂I.e. η ═ f₁/f₂＝L₂/L₁. Wherein L is₁Is the stripe width of the first stripe pattern, L₂Is the stripe width of the second stripe pattern. Thus f₂-f₁(f₁-f₂Similarly, it is not described herein) can be obtained by simple calculation, and the cartesian coordinates thereof are:

(f₂cosθ-f₁,f₂sinθ)，

the polar coordinates are:

i.e. Moire pattern satisfies theta_{Massage device}＝arctan(sinθ/(cosθ-η))，

The intensity of the moir e pattern is 1/4 times the intensity of the original texture (i.e., the first and second stripe patterns).

Same principle f₁+f₂Or-f₁-f₂The Moire pattern satisfies:

θ_{massage device}＝arctan(sinθ/(cosθ+η))，

The intensity of the moir e now is also 1/4 of the intensity of the original texture.

According to an embodiment of the present application, referring to fig. 10, the moire patterns may also be formed by stacking 3 patterns. Specifically, a plurality of patterns including, but not limited to, dot patterns (such as dot patterns M, K and C shown in the figure) may be rotated at different angles and superimposed, so that different moire patterns may be formed. The stripe patterns of the superimposed part can be different according to the rotation angle of the dot matrix patterns, and have different visual effects. That is, the moire pattern may further include a fifth portion having a fifth height, the fifth portion being formed by overlapping at least 3 patterns. It will be understood by those skilled in the art that when the moire pattern has a fifth portion, the fifth portion may be located in a region where the 3 patterns overlap, i.e., the fifth portion may be formed by 3 times etching of the glass material.

It should be particularly noted that moire is to be understood broadly in this application and represents a pattern capable of providing an interference moire effect, rather than specifically a pattern made up of a plurality of parallel fringes. For example, the moire patterns on the surface of the glass sheets proposed in the present application may have a structure as shown in fig. 10.

According to some examples of the present application, in order to further improve the appearance effect of the glass plate, at least one of a color layer, a coating layer and a base ink layer may be further included on the side of the substrate where the moire fringes are not provided. That is, the glass sheet may further have one, two or three of a color layer, a coating layer and a cover bottom ink layer. When a plurality of color layers, coating layers and cover bottom ink layers are arranged, the color layers can be arranged on one side closest to the base body, and the cover bottom ink layers are arranged on one side farthest from the base body. When the glass plate has all of the color layer, the coating layer and the cover bottom ink layer, the color layer can be in contact with the base body, the coating layer is located on one side, far away from the base body, of the color layer, and the cover bottom ink layer is located on one side, far away from the color layer, of the coating layer. According to some examples of the present application, the material forming the color layer may include an optical glue, for example, an OC0 glue, and the thickness of the color layer may be 1-3 microns. The color layer can have a certain color, and then the appearance effect of the glass plate can be improved. The coating may be formed by means including but not limited to PVD (physical vapor deposition), and may specifically include a plurality of sub-layers stacked in sequence and providing a metallic luster to the glass sheet. Specifically, the material for forming the plating layer may include metals and metal oxides, and inorganic oxides such as silicon dioxide. The bottom ink layer can be a layer of opaque ink, so that the glass plate has an opaque effect, and further can be used for forming a shell of electronic equipment to prevent structures such as a main board, a circuit or a battery and the like in the electronic equipment from being directly observed by a user. Specifically, the transmittance of the under-cover ink layer may be not higher than 10%.

In another aspect of the invention, a method of making the glass sheet described above is provided. The method includes the step of forming a moire pattern on a surface of one side of the substrate. The method will be described in detail below in the case where the moire pattern may be formed by superimposing a first moire pattern and a second moire pattern. Referring to fig. 4, the operation of forming the moire specifically may include:

s100: forming a first portion of the Moire fringe based on a first etch mask

In this step, a first portion of the moire is formed on the surface of one side of the substrate based on the first etching mask. As mentioned above, the first moire portions may be formed based on a first etching mask, and the first etching mask may be formed in a pattern corresponding to the first moire patterns, that is, a partial region of the first moire patterns may constitute the first moire portions, and a portion of the first moire patterns overlapping the second moire patterns in the subsequent step may constitute the boundary portion. The kind and specific position of the etching mask are not particularly limited, and for example, the etching mask may be formed of a photoresist, and the first etching mask covers a part of the region of the substrate surface and exposes the remaining region. The portion covered by the first etching mask may be a portion corresponding to the first stripe pattern, or the first etching mask may expose a portion of the substrate surface corresponding to the first stripe pattern. When the etching mask covers the area where the mole stripes are located, the glass material uncovered by the etching mask can be removed through etching, and then the raised mole stripes are formed. Recessed moire is formed when the etch mask is exposed and the moire pattern is located.

S200: forming a second portion of the Moire fringe based on a second etch mask

In this step, a second portion of the moire is formed on the surface of the one side of the base based on the second etching mask. Similar to the first exemplary ophthalmic film, a second etch mask may be used to form a second stripe pattern that forms a Moir stripe. Therefore, the part of the second etching mask which is not overlapped with the first etching mask can form a second part of the mole stripe, and the overlapped part of the second etching mask and the first etching mask can form a boundary part at the same time of forming the second part.

The process of forming moir e fringes is described in detail below according to some specific examples of the present application:

referring to fig. 5a to 5d, a first etch mask 200 and a second etch mask 300 may be simultaneously formed on the surface of a substrate 100 first. Taking the area where the etching mask covers and the molar stripe are consistent as an example, fig. 5B shows schematic cross-sectional structure diagrams of the etching mask at different positions in fig. 5a, fig. 5B (a) is a schematic cross-sectional structure diagram of the etching mask in the area a-a ' in fig. 5a, fig. 5B (B) is a schematic cross-sectional structure diagram of the etching mask in the area B-B ' in fig. 5a, and fig. 5B (C) is a schematic cross-sectional structure diagram of the etching mask in the area C-C ' in fig. 5 a. The material forming the first etch mask and the second etch mask is configured to remove the first etch mask and the second etch mask from the substrate in steps. That is, the second etch mask on the substrate may be left undissolved or removed while the first etch mask is removed, and similarly, the first etch mask on the substrate may be left undissolved or removed while the second etch mask is removed.

Subsequently, the substrate 100 may be etched based on the first and second etch masks, and then one of the first and second etch masks may be removed, e.g. as shown in fig. 5c, the second etch mask may be removed leaving the first etch mask 200. At this time, the etching treatment is performed, and the area of the substrate surface not covered by the etching mask is removed, thereby forming a protrusion having a shape identical to that of the first etching mask and the second etching mask. After removing the second etching mask, referring to (b) of fig. 5c, a portion of the area for forming the interface is still covered by the first etching mask 200, and another portion is exposed. Subsequently, referring to fig. 5d, the substrate 100 is again subjected to an etching process based on the remaining first etching mask 200. At this time, the entire base 100 not covered by the first etching mask 200 in fig. 5d is etched to form the first, second and

fourth portions

10, 20 and 40, and the protrusion at (b) in fig. 5d has a stepped structure, i.e., a stepped structure of the first and

third portions

10 and 30, since only a partial region is covered by the first etching mask 200. After the etching is completed, the first etching mask 200 is removed to form the glass plate.

According to an embodiment of the present application, the first etching mask and the second etching mask may both be formed of photoresist, but since both need to be removed step by step, the material forming the second etching mask is required to be insoluble in the first deplating solution, and the material forming the first etching mask is required to be soluble in the first deplating solution. Thus, the first etching mask can be removed by using the first deplating solution, and the second etching mask is kept. Similarly, the material forming the second etch mask may also be dissolved in a second stripping solution in which the material forming the first etch mask is insoluble. Therefore, the second etching mask can be removed by utilizing the second deplating solution, and the first etching mask is reserved at the same time. Alternatively, the first etch mask may be formed of a positive photoresist and the second etch mask may be formed of a negative photoresist. Therefore, two etching masks with different textures can be formed on the surface of the glass by utilizing the negative photoresist and the positive photoresist, then the positive photoresist is removed through exposure and development after the first etching treatment, the negative photoresist is reserved, and the second etching treatment is carried out. And then deplating to obtain the glass plate with the molar stripes formed on one side.

It should be noted that the first etching mask and the second etching mask are only used to distinguish the mask for forming the first stripe pattern from the mask for forming the second stripe pattern, the up-down position relationship of the two etching masks on the substrate is not particularly limited, and the overlapping sequence of the first etching mask and the second etching mask shown in the drawings shown in the present application is only exemplary. It will be appreciated by those skilled in the art that in order to preserve the integrity of the etch mask that is removed thereafter, the etch mask that is positioned above (i.e., away from the substrate side) in the stacked relationship may be removed first.

Alternatively, referring to fig. 6a to 6e, the first etching mask and the second etching mask may be formed on the substrate 100 in sequence, that is, one of the first etching mask and the second etching mask may be formed on the substrate 100 first, and the other of the first etching mask and the second etching mask may be formed after removing the mask. Referring specifically to fig. 6a, a first etching mask 200 may be first formed on the substrate 100, and the first etching mask 200 may expose the substrate 100 at a region where the first stripe pattern is to be formed. An etching process is then performed based on the first etch mask 200 to form a cross-sectional structure such as that shown in fig. 6 b. The first etch mask 200 on the substrate 100 may then be removed, a second etch mask 300 may be formed to expose the substrate in the areas where the second stripe pattern is to be formed, and a second etch process may be performed. The schematic cross-sectional structure of the second etching mask at different positions of the substrate is shown in fig. 6d, and the cross-sectional structure of the partial area of the substrate surface after the second etching treatment is shown in fig. 6 e. Wherein (a) in fig. 6d and 6e are both schematic cross-sectional structures of the region a-a ' in fig. 6C, (B) in fig. 6d and 6e are both schematic cross-sectional structures of the region B-B ' in fig. 6C, and (C) in fig. 6d and 6e are both schematic cross-sectional structures of the region C-C ' in fig. 6C. Thus, after removing the second etching mask 300, the glass plate can be obtained.

Similarly, when neither the first stripe pattern nor the second stripe pattern is raised, the first etching mask and the second etching mask may be formed on the substrate 100 sequentially. Specifically, referring to fig. 7 a-7 c, a first etching mask 200 may be formed first, and the glass material uncovered by the first etching mask is etched to remove the first etching mask to form a first stripe pattern (not shown), and then a second etching mask 300 is formed, at this time, as shown in (a) of fig. 7b, the cross-sectional structure along a-a' in fig. 7a is shown, and at this time, although the first portion 10 is exposed, when etching is performed by means of the second etching mask 300, the first portion 10 and the substrate 100 of the glass around the first portion 10 are exposed, so that the height of the first portion 10 may be regarded as being substantially constant after the second etching process. And (c) in fig. 7b, the height of the protrusion covered by the second etch mask 300 is increased after the second etch to form the fourth portion 40 as shown in fig. 7c, whereby the height of the fourth portion 40 is greater than the height of the first portion 10, and since the top of the fourth portion 40 is covered by the second etch mask 300 during the second etch, the height of the portion is the sum of the depths of the first etch and the second etch, so that the height of the fourth portion 40 can be greater than that of the first portion 10 and also greater than that of the second portion 20.

According to an example of the present application, in the case where a moire pattern is formed of the first and second fringe patterns, the method needs to undergo two etching processes to obtain the moire pattern. For convenience of understanding, the first etching process is defined as a first etching process, the second etching process is defined as a second etching process, and specific parameters of the etching processes are described below. Specifically, the first etching process and the second etching process may be wet etching, respectively and independently. The immersion time of the wet etching may be not less than 30 s. Therefore, the problem that the etching stripes of the wet etching treatment are broken or etched not in place can be avoided to a great extent. The inventors have found that the above-mentioned problem of poor etching after wet etching treatment is mainly due to an increase in the contact area between the exposed developing resist (material forming the etching mask) and the etchant (mostly aqueous solution), and insufficient wetting may occur. Thus, the above-mentioned disadvantages can be prevented or even avoided by appropriately extending the immersion time of etching.

In order to further enhance the effect of the etching treatment, a pretreatment step may be further included before the wet etching is performed. Specifically, the pretreatment may include at least one of an immersion treatment and a plasma activation treatment. The soaking treatment can be carried out by placing the substrate in an aqueous solution for pre-soaking, wherein the soaking treatment time is not less than 1 minute. The time of the plasma activation treatment may be 2-10s, and those skilled in the art can adjust the time of the activation treatment according to the power of the plasma treatment.

The etching solution used in the first etching treatment and the second etching treatment is not particularly limited, and for example, an acidic glass etching solution may be used. The time of the etching treatment is not particularly limited, and the times of the first etching treatment and the second etching treatment may be the same or different. The etching time affects the heights of the first and second striation patterns formed, and those skilled in the art can adjust the heights according to the actual design and the thickness of the substrate 100, as long as the thickness of the overlapping portion of the first and second striation patterns formed is not too thick, thereby affecting the overall mechanical strength of the glass plate.

According to some examples of the present application, after the moire fringes are formed, the method may further include an operation of forming at least one of a color layer, a coating layer and a base ink layer on a side of the substrate 100 where the moire fringes are not formed. The arrangement position and the forming mode of the structure are explained in detail in the foregoing, and are not described in detail herein.

In another aspect of the present application, a housing is presented. Referring to fig. 8, at least a portion of the housing 1100 is formed from the glass sheets previously described. Therefore, the shell has at least one of the advantages of good appearance texture effect, durability and the like. Specifically, the moire pattern of one side surface of the glass plate may be located at a side away from the receiving space defined by the case 1100.

In another aspect of the present application, an electronic device is presented. Referring to fig. 9, the electronic device includes the housing 1100 as described above, the housing 1100 defines a receiving space to receive the main board and the display screen (not shown), and the moire fringes are located on a side of the housing 1100 facing away from the receiving space, i.e., on a side that can be touched by a user. Therefore, the electronic equipment can be provided with better visual effect and hand-held touch.

According to an embodiment of the present application, the electronic device described above may be any of various types of computer system devices that are mobile or portable and perform wireless communication. In particular, the electronic device may be a mobile or smart phone (e.g., an iPhone (TM) based phone), a Portable gaming device (e.g., Nintendo DS (TM), PlayStation Portable (TM), Gameboy Advance (TM), iPhone (TM)), a laptop, a PDA, a Portable internet device, a music player, and a data storage device, other handheld devices, and a head-mounted device such as a watch, an in-ear headphone, a pendant, a headset, etc., and other wearable devices (e.g., a head-mounted device (HMD) such as an electronic necklace, an electronic garment, an electronic bracelet, an electronic tattoo, or a smart watch).

The present application is described below by way of specific examples, and those skilled in the art will appreciate that the following specific examples are for illustrative purposes only and do not limit the scope of the present application in any way. In addition, in the following examples, materials and equipment used are commercially available unless otherwise specified. If in the examples that follow, specific processing conditions and processing methods are not explicitly described, processing may be performed using conditions and methods known in the art.

Example 1

Preparing materials: two kinds of acid-resistant photoresists with different solubilities in deplating solution are selected to form a first etching mask(hereinafter referred to as etching mask α) and a second etching mask (hereinafter referred to as etching mask β), and selecting a first deplating solution (hereinafter referred to as deplating solution a) and a second deplating solution (hereinafter referred to as deplating solution b), wherein the second etching mask cannot be removed by the first deplating solution. AG glass is selected as a base material. The texture of the first etching mask is shown in (d) of FIG. 12, in which the frequency vector f of the fringes₁Not (8.9,0 °). The texture of the second etching mask is shown in (e) of FIG. 12, in which the frequency vector f of the stripes₂Not (8.8,17.5 °). The frequency vector f of the formed moire can be expressed as f₁-f₂As shown in (f) of fig. 12. Wherein the angles are all included angles with the y axis.

Etching treatment: firstly, obtaining a first etching mask on a substrate through photoetching, then forming a second etching mask, stacking two etching surfaces on a single surface of a surface layer of glass to obtain a superposed texture with two photoresists, then placing the glass in an etching solution for etching, wherein the etching thickness reaches t₁Taking out and cleaning, placing the glass in a deplating solution b, deplating a second etching mask, placing the glass in an etching solution again for etching until the total etching thickness reaches t₂Then taking out and cleaning the substrate, and placing the substrate in a deplating solution a to remove the first etching mask.

Wherein t is₂>t₁,t₁About 2 μm, t₂About 5 microns.

Forming a decorative layer: and C, spraying OC0 glue with color on the side of the substrate without texture, and controlling the thickness to be about 2 mu m to form a color layer. And then forming a coating layer on the color layer, and printing the bottom ink.

Example 2:

preparing materials: the photoresist A, B, C and the deplating solutions a, b, and c are prepared, respectively, to form the etching masks α, β, and γ having three texture patterns. Wherein the photoresist A is dissolved in the deplating solution a and is not dissolved in the deplating solutions b and c; the photoresist B is dissolved in the deplating solution B and is not dissolved in the deplating solutions a and c; the photoresist C is dissolved in the deplating solution C and is not dissolved in the deplating solutions a and b; both the photoresist A, B and C can resist corrosion of etching solution without falling off and dissolving. The etching texture is shown in (a) of fig. 10.

Etching treatment: on the substrateThree texture patterns of etching masks alpha, beta and gamma are formed on the single-side surface layer, namely three textures are stacked on the single side of the glass surface layer. The glass is put into the etching solution for etching until the etching thickness reaches t₁Taking out, cleaning, placing in deplating solution C, deplating photoresist C, placing glass in etching solution for etching until total etching thickness reaches t₂Taking out, cleaning, placing in stripping solution B, removing photoresist B, placing the glass in etching solution again for etching until the total etching thickness reaches t₃And taking out, cleaning, placing in a deplating solution a, and finally removing the photoresist C to obtain three layers of textures with Moire patterns on the single surface of the glass. Wherein t is₃>t₂>t₁. Wherein t is₁≤2μm,t₂≤3μm，t₃≤6μm。

Forming a decorative layer: the operation of this step is the same as example 1, and is not described herein again.

Example 3:

preparing materials: the procedure is as in example 1.

Etching treatment: firstly, forming an etching mask alpha on the single-side surface layer of a glass product, placing the glass in etching solution for etching until the etching thickness reaches t₁Then taking out and cleaning the substrate, placing the substrate in a deplating solution, and removing the etching mask alpha. Then forming an etching mask beta, placing the glass product in the etching solution again, wherein the total etching thickness is t₂And taking out the product. Wherein t is₁And t₂Same as in example 1.

Example 4:

preparing materials: negative photoresist a and positive photoresist B were prepared, respectively, and two kinds of lithography masks formed were α and β. The remaining parameters were the same as in example 1.

Etching treatment: an etching mask alpha is obtained on the single-side surface layer of the glass product by adopting a negative photoresist A through photoetching, a texture beta is obtained by adopting a positive photoresist B through photoetching, and the two textures are stacked on the single side of the glass surface layer. Then the glass is put into an etching solution for etching until the etching thickness reaches t₁Taking out, cleaning, exposing and developing again, removing positive photoresist B, etching glass in the etching solution again to obtain final product with thick total etchingDegree reaches t₂Then taking out and cleaning the photoresist, placing the photoresist in a deplating solution, and removing the photoresist A. Wherein t is₁And t₂Same as in example 1.

The scheme shown in examples 1-4 is adopted to repeatedly prepare 100 glass plates, wherein the glass plates in examples 1-4 can obtain better molar fringe interference effect, the surface of the glass plate is observed by an optical microscope, the residual glue area of the average etching mask of the product is less than 6% of the whole area of the plate, and the residual glue can not be seen by naked eyes. The average breaking rate of 100 pieces of the samples was less than 11% when the streak breaking rate of the moire fringes obtained in examples 1 to 4 was observed under an optical microscope.

According to embodiments of the present application, the electronic device may also be any one of a number of electronic devices including, but not limited to, cellular phones, smart phones, other wireless communication devices, personal digital assistants, audio players, other media players, music recorders, video recorders, cameras, other media recorders, radios, medical devices, vehicle transportation equipment, calculators, programmable remote controllers, pagers, laptop computers, desktop computers, printers, netbooks, Personal Digital Assistants (PDAs), Portable Multimedia Players (PMPs), moving Picture experts group (MPEG-1 or MPEG-2) Audio layer 3(MP3) players, portable medical devices, and digital cameras, and combinations thereof.

According to embodiments of the present application, in some cases, an electronic device may perform a variety of functions (e.g., playing music, displaying videos, storing pictures, and receiving and sending telephone calls). If desired, the electronic device may be a portable device such as a cellular telephone, media player, other handheld device, wristwatch device, pendant device, earpiece device, or other compact portable device.

In the description herein, references to the description of "one embodiment," "another embodiment," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment is included in at least one embodiment of the application. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.

Although embodiments of the present application have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present application, and that variations, modifications, substitutions and alterations may be made to the above embodiments by those of ordinary skill in the art within the scope of the present application.

Claims

1. A glass sheet, comprising:

a substrate having a surface on one side thereof with moire fringes,

the moire pattern includes at least a plurality of first portions and a plurality of second portions, the first portions each extending in a first direction, the second portions each extending in a second direction, the first direction and the second direction intersecting, the first portions having a first height, the second portions having a second height, the moire pattern further having an interface portion located at an interface area, the interface area being a boundary of the extending directions of the first portions and the second portions,

and the two adjacent first parts which are positioned on the same straight line are connected through the boundary part, and the two adjacent second parts which are positioned on the same straight line are connected through the boundary part.

2. The glass web according to claim 1, wherein the moir e patterns are protrusions or depressions, the moir patterns being decomposed into a superposition of a first and a second moir pattern,

the first stripe pattern has a first height, the second stripe pattern has a second height,

the first stripe pattern and the second stripe pattern have an overlapping area therebetween.

3. The glass web according to claim 2, wherein the Moire fringes, the first fringe pattern, and the second fringe pattern each independently have a frequency vector f and a frequency vector mode f, the frequency vector mode f being the number of fringes over a length of 1000 μm in a direction perpendicular to the fringe vector,

the moir e fringes have a vector f_{Massage device}And in a polar coordinate system has f_{Massage device}＝(f_{Massage device},θ_{Massage device})

The first stripe pattern has a vector f₁And in a polar coordinate system has f₁＝(f₁,θ₁)，θ₁＝0；

The second stripe pattern has a vector f₂And in a polar coordinate system has f₂＝(f₂,θ₂)，0＜θ₂≤90；

And η ═ f₁/f₂Theta is f₁And f₂The Moire fringe, the first fringe pattern, and the second fringe pattern satisfy the following conditions:

f₁and f₂Are each independently in the range of 5 to 1000;

0.1≤f_{moire pattern}≤1000；

0°≤θ_{Moire pattern}≤90°；

0.005≤η≤200；

θ_{Massage device}＝arctan(sinθ/(cosθ-η))，

Or theta_{Massage device}＝arctan(sinθ/(cosθ+η))，

4. The glass web according to claim 5, wherein the Moire fringe, the first fringe pattern, and the second fringe pattern satisfy the following condition:

0.25≤f_{moire pattern}≤50；

0°≤θ_{Moire pattern}≤90°；

f₁And f₂Are each independently in the range of 7 to 50;

0.5≤η≤2；

5. The glass web of claim 1, wherein the interface includes a third portion and a fourth portion, at least one of the first portion and the second portion and the third portion forming a stepped configuration, the fourth portion having a fourth height, the fourth height being greater than or equal to the greater of the first height and the second height,

and two adjacent first parts which are positioned on the same straight line are connected through at least one of the third part and the fourth part, and two adjacent second parts which are positioned on the same straight line are connected through at least one of the third part and the fourth part.

6. The glass web of any one of claims 1-5, further comprising a fifth portion, the fifth portion having a fifth height.

7. The glass web of claim 1, wherein the maximum height of the moir e fringes does not exceed 100 μm;

preferably, no more than 10 microns;

preferably, no more than 6 microns.

8. The glass web of claim 1, wherein the side of the substrate not provided with the moir e fringes further comprises at least one of the following structures:

a color layer;

coating a film layer; and

and covering the bottom ink layer.

9. The glass web according to claim 8, wherein the glass web satisfies at least one of the following conditions:

the material for forming the color layer comprises optical cement;

the thickness of the color layer is 1-3 microns;

the coating layer comprises a plurality of sequentially laminated sub-layers;

and the transmittance of the bottom ink covering layer is not higher than 10%.

10. A method of making the glass web of any one of claims 1-9, the method comprising forming a moir e pattern on a surface of one side of the substrate, the act of forming the moir pattern comprising:

forming the moire fringes on the surface of one side of the body by at least two etching treatments based on the first etching mask and the second etching mask,

and forming a first portion of the moire pattern based on a first etching process, forming a second portion and an interface portion of the moire pattern based on a second etching process,

and further comprising an operation of removing the first etching mask before the second etching process is performed.

11. The method of claim 10, comprising:

sequentially forming the first etching mask and the second etching mask on the substrate;

performing the first etching treatment on the substrate with the first etching mask and the second etching mask;

removing the first etching mask and reserving the second etching mask;

and carrying out the second etching treatment on the substrate with the second etching mask.

12. The method of claim 10, comprising:

forming the first etching mask on the substrate and performing the first etching treatment;

and forming the second etching mask on the substrate subjected to the first etching treatment and performing the second etching treatment.

13. The method according to claim 11 or 12, characterized in that the material forming the first and second etch masks is configured to stepwise remove the first and second etch masks from the substrate.

14. The method according to claim 13, wherein the material forming the first etching mask and the second etching mask is a photoresist, and wherein the material forming the second etching mask is insoluble in a first deplating solution, and the material forming the first etching mask is soluble in the first deplating solution.

15. The method of claim 13, wherein the first etch mask is formed from a positive photoresist and the second etch mask is formed from a negative photoresist.

16. The method according to claim 13, wherein the first etching process and the second etching process are each independently a wet etching, and an immersion time of the wet etching is not less than 30 s.

17. The method of claim 16, wherein performing the wet etch further comprises a pre-treatment, the pre-treatment comprising at least one of:

soaking, namely placing the matrix in an aqueous solution, wherein the soaking time is not less than 1 minute;

and (3) performing plasma activation treatment, wherein the time of the plasma activation treatment is 2-10 s.

18. A housing, characterized in that at least a part of the housing is formed from a glass plate according to any one of claims 1-9.

19. An electronic device, comprising:

the housing of claim 18, defining a containment space, and the moir e stripes being located on a side of the housing facing away from the containment space,

mainboard and display screen, the mainboard with the display screen electricity is connected, and is located inside the accommodation space.