CN113568282A - Preparation method of transfer mold, shell assembly and preparation method thereof, and electronic equipment - Google Patents
Preparation method of transfer mold, shell assembly and preparation method thereof, and electronic equipment Download PDFInfo
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- CN113568282A CN113568282A CN202110864574.3A CN202110864574A CN113568282A CN 113568282 A CN113568282 A CN 113568282A CN 202110864574 A CN202110864574 A CN 202110864574A CN 113568282 A CN113568282 A CN 113568282A
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- 238000002360 preparation method Methods 0.000 title claims abstract description 17
- 238000012546 transfer Methods 0.000 title claims description 76
- 238000010023 transfer printing Methods 0.000 claims abstract description 50
- 230000008859 change Effects 0.000 claims abstract description 43
- 238000001259 photo etching Methods 0.000 claims abstract description 31
- 239000000758 substrate Substances 0.000 claims abstract description 28
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- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims description 18
- 239000003292 glue Substances 0.000 claims description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 15
- 229910052681 coesite Inorganic materials 0.000 claims description 14
- 229910052906 cristobalite Inorganic materials 0.000 claims description 14
- 229910052682 stishovite Inorganic materials 0.000 claims description 14
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Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K5/00—Casings, cabinets or drawers for electric apparatus
- H05K5/02—Details
- H05K5/0217—Mechanical details of casings
- H05K5/0243—Mechanical details of casings for decorative purposes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Injection Moulding Of Plastics Or The Like (AREA)
Abstract
The application relates to the technical field of electronic equipment, and particularly discloses a preparation method of a texture transfer printing mold, a shell assembly and a preparation method of the shell assembly, wherein the method comprises the following steps: designing a gradual change graph; processing the gradient graph into gray data with graph information; converting the gray data into exposure energy of a photoetching machine, wherein when photoetching is carried out according to a specific processing path, a change curve of the exposure energy is in smooth transition; and photoetching the master mold substrate by using exposure energy through a photoetching machine to form a gradually changed texture pattern on the master mold substrate to obtain the texture transfer printing mold. Through the mode, the change curve of the exposure energy designed by the embodiment of the application can be in smooth transition from large to small, so that the gradually-changed texture pattern can be visually perceived to have the appearance of transition from a matte surface to a mirror surface.
Description
Technical Field
The application relates to the technical field of electronic equipment preparation, in particular to a preparation method of a texture transfer printing mold, a shell assembly, a preparation method of the shell assembly and electronic equipment.
Background
With the continuous development of the preparation technology in the field of electronic products and the continuous improvement of the consumption level, consumers pursue not only the diversification of functions but also the higher and higher requirements on the appearance, texture and the like of the electronic products. The current electronic equipment shell needs to have certain mechanical strength to protect the electronic equipment, and also needs to be capable of forming decorative effects such as various colors, textures and gloss to enrich the appearance of the electronic equipment and improve the expressive force of products.
However, the current texture transfer molds still need to be improved.
Disclosure of Invention
The present application is directed to solving, at least to some extent, one of the technical problems in the related art.
In a second aspect of the present application, there is provided a method of manufacturing a texture transfer mold, comprising the steps of: designing a gradual change graph; processing the gradient graph into gray data with graph information; converting the gray data into exposure energy of a photoetching machine, wherein when photoetching is carried out according to a specific processing path, a change curve of the exposure energy is in smooth transition; and photoetching the master mold substrate by using exposure energy through a photoetching machine to form a gradually changed texture pattern on the master mold substrate to obtain the texture transfer printing mold.
In a second aspect of the present application, a method of making a housing assembly is provided, comprising the steps of: providing a texture transfer mold, the texture transfer mold comprising: a master substrate and a gradient texture pattern formed on the master substrate, wherein the gradient texture pattern is visually perceptible as having an appearance of a matte transition to a mirror surface along a particular processing path; filling UV glue in the gradually-changed texture pattern of the texture transfer printing mold; transferring the UV glue in the gradient texture pattern to one side of the first sheet, and performing UV curing to form a gradient transfer printing layer; and forming a protective layer on the side of the gradual change transfer printing layer, which is far away from the first sheet.
In a third aspect of the present application, the present application provides a housing assembly comprising: a first sheet material; gradual change rendition layer sets up the one side at first sheet, and wherein, the gradual change rendition layer obtains through texture transfer mold with UV glue rendition to one side of first sheet, and texture transfer mold includes: a master substrate and a gradient texture pattern formed on the master substrate, wherein the gradient texture pattern is visually perceptible as having an appearance of a matte transition to a mirror surface along a particular processing path; and the protective layer is arranged on one side of the gradual change transfer printing layer, which is far away from the first sheet.
In a fourth aspect of the present application, the present application provides an electronic device comprising: a housing assembly as described above, or a housing assembly prepared as described above, the housing assembly defining a receiving space, the appearance membrane of the housing assembly being disposed toward an interior of the electronic device; the main board and the memory are positioned in the accommodating space; and the screen is arranged at the top of the shell component and is connected with the main board.
The technical scheme provided by the embodiment of the application can bring the following beneficial effects:
different from the prior art, the embodiment of the application provides a preparation method of a texture transfer printing mold, a shell assembly and a preparation method of the shell assembly. And photoetching the master mold substrate by using exposure energy through a photoetching machine to form a gradient texture pattern on the master mold substrate to obtain the texture transfer mold with the gradient texture, namely realizing gradient color by changing the gradient of the texture and embodying the gradient color and texture change effect. Further, the change curve of the exposure energy designed in the embodiment of the present application may be in smooth transition from large to small, so that the gradient texture pattern can be visually perceived as having an appearance that the matte surface is transitioned to the mirror surface, and it can be understood that, because different areas of the texture transfer mold have gradient texture patterns with different distribution densities, a scheme of transfer image haze gradient with different haze is formed after being transferred to a sheet, and the scheme is suitable for gradient of different colors, and the shell assembly can embody a gradient color texture change effect.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts. Wherein:
FIG. 1 illustrates a flow chart of a method of making a texture transfer mold provided in a first embodiment of the present application;
FIG. 2 illustrates a flow chart of a method of making a housing assembly provided by a second embodiment of the present application;
FIG. 3 illustrates a flow chart of a method of making a housing assembly provided by a third embodiment of the present application;
FIG. 4 illustrates a flow chart of a method of making a housing assembly provided by a fourth embodiment of the present application;
FIG. 5 illustrates a schematic structural view of a housing assembly provided in a fifth embodiment of the present application;
FIG. 6 shows a design of a variation curve of exposure energy with black lines;
FIG. 7 shows a design of the variation curve of the exposure energy to eliminate the black line;
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
In the long-term research and development process, the inventor finds that the gradient color effect of the existing shell is usually realized by coating or printing ink, and the effect has certain limitation and cannot reflect the gradient texture change effect. Different from the prior art, the mold and the preparation method thereof provided by the embodiment of the application process the gradient graph into the exposure energy of the photoetching machine, wherein when photoetching is carried out according to a specific processing path, the change curve of the exposure energy is in smooth transition. And photoetching the master mold substrate by using exposure energy through a photoetching machine to form a gradient texture pattern on the master mold substrate to obtain the texture transfer mold with the gradient texture, namely realizing gradient color by changing the gradient of the texture and embodying the gradient color and texture change effect. Further, the change curve of the exposure energy designed in the embodiment of the present application may be in a smooth transition from large to small, so that the gradual texture pattern can be visually perceived as having an appearance of transition from a matte surface to a mirror surface.
Specific implementations of the present application are described in detail below with reference to specific embodiments.
As shown in fig. 1, the present application provides a method for preparing a texture transfer mold, comprising the steps of:
s101: and designing a gradient graph.
The outline of the gradient graph can be a pentagon, a rhombus, a LOGO, an icon or other graphs.
S102: the gradation pattern is processed into gradation data with pattern information.
Firstly, rasterizing the gradient graph into bitmap data with graph information, and then performing edge gray processing to obtain gray data.
S103: and converting the gray data into exposure energy of the photoetching machine, wherein when photoetching is carried out according to a specific processing path, a change curve of the exposure energy is in smooth transition.
And converting the gray data into the exposure energy of the photoetching machine through the query of a gray-energy lookup table. In contrast to the design of the variation curve of the exposure energy with black lines as shown in fig. 6, the embodiment of the present application proposes that the variation curve of the exposure energy is smoothly transited when performing the photolithography according to the specific processing path as shown in fig. 7, wherein the specific processing path includes, but is not limited to, top to bottom, left to right, bevel processing, etc.
S104: and photoetching the master mold substrate by using exposure energy through a photoetching machine to form a gradually changed texture pattern on the master mold substrate to obtain the texture transfer printing mold.
In particular, the material forming the master substrate can include metal or glass. Therefore, the master die substrate can be conveniently processed for a plurality of times in the subsequent steps, such as laser etching treatment, mechanical processing treatment and the like, so as to form the gradually-changed texture pattern.
It can be understood that, when the photoetching machine carries out photoetching processing on the master model substrate, the higher the distribution density of the gradient texture patterns on the texture transfer mould corresponding to high exposure energy is, the higher the density of the gradient texture patterns can be visually perceived as having a matte appearance; the lower the distribution density of the gradation texture pattern on the texture transfer mold corresponding to the low exposure energy, the lower density gradation texture pattern can be visually perceived as having the appearance of a mirror surface.
In order to represent the gradual density of the exposure energy, an illumination part with large exposure energy needs to be selected, for example, the wavelength of light generated by the illumination part of a lithography machine can be 600-1800 nm.
In one embodiment, when the photolithography is performed according to a specific processing path, the variation curve of the exposure energy is in a smooth transition from large to small, so that the gradual texture pattern can be visually perceived as having the appearance of a fog surface transition to a mirror surface.
It is understood that different areas of the texture transfer mold have gradient texture patterns with different distribution densities, and transfer patterns with different haze values are formed after the patterns are transferred to the sheet, for example, a matte effect with the haze values continuously changing in different areas can be formed, or a matte effect with the haze values continuously changing along the direction from the center of the sheet to the edge of the sheet can be formed, or a matte effect with the haze values continuously changing along the direction from one side of the outer surface to the other side can be formed.
The specific processing path is vertical to the change curve of the exposure energy, the specific processing path and the texture gradual change trend are prevented from being in the same direction, and the phenomena of fogging and misting of transfer printing patterns caused by overlapping of the specific processing path and the texture gradual change trend are avoided.
The application provides a texture transfer mold, and texture transfer mold is prepared by the texture transfer mold preparation method of the embodiment, and texture transfer mold includes: a master substrate and a gradient texture pattern formed on the master substrate. Wherein the gradient texture pattern is visually perceptible as having an appearance of a matte transition to a mirror surface in a particular processing path.
It can be understood that, when the photoetching machine carries out photoetching processing on the master model substrate, the higher the distribution density of the gradient texture patterns on the texture transfer mould corresponding to high exposure energy is, the higher the density of the gradient texture patterns can be visually perceived as having a matte appearance; the lower the distribution density of the gradation texture pattern on the texture transfer mold corresponding to the low exposure energy, the lower density gradation texture pattern can be visually perceived as having the appearance of a mirror surface.
The application provides a transfer device of decorative board, this transfer device includes pressfitting tool, decorative board sheet and texture transfer mould from top to bottom in proper order, and texture transfer mould is the texture transfer mould that is prepared by aforementioned method, and wherein, the texture transfer mould is provided with the gradual change texture pattern for the position of decorative board sheet, and the gradual change texture pattern can be perceived as having the outward appearance that the matte transited to the mirror surface in the vision.
Specifically, the UV transfer printing device comprises a pressing fixture, a decorative plate sheet and a texture transfer printing mold from top to bottom in sequence. The bottom of the texture transfer mold is provided with matte texture or bright texture corresponding to the decorative sheet, the decorative sheet is an arc-shaped sheet which is subjected to silk-screen printing, offset printing, laser etching or true plating, and the pressing jig and the texture transfer mold are both arc-shaped at positions corresponding to the decorative sheet and have consistent radians.
As shown in fig. 2, the present application provides a method of preparing a housing assembly, the method comprising the steps of:
s201: a texture transfer mold is provided.
The texture transfer mold is the texture transfer mold prepared by the method of the above embodiment.
S202: and filling UV glue in the gradually-changed texture pattern of the texture transfer printing mold.
And UV transfer printing glue is arranged on the texture transfer printing mould and is of a high scratch resistance type, a high hardness type, a high elasticity type or a TPU type. The UV transfer printing glue is a photocuring single-component forming glue, is mainly formed on the surfaces of other polyester films such as PC (polycarbonate), TPU (thermoplastic polyurethane) and the like through a mould, and can also be independently formed on the surfaces of the films; the main models comprise a high scratch resistance type, a high hardness type, a high elasticity type, a TPU type and the like. The effects of various matte or bright surface grains and the like can be realized on the UV transfer printing mold, and the manufacturing process is simple and stable.
S203: and transferring the UV glue in the gradient texture pattern to one side of the first sheet, and performing UV curing to form a gradient transfer printing layer.
The material forming the first sheet may include at least one of glass, polyethylene terephthalate, polycarbonate, polymethyl methacrylate.
It should be noted that the gradient transfer layer may be formed by a single UV transfer process using the texture transfer mold as described above, so that the gradient texture pattern in the gradient transfer layer corresponds to the gradient texture pattern in the texture transfer mold as described above ("corresponds", i.e., the texture is the same in shape, and the protrusions and the depressions of the texture are opposite, i.e., the protrusions of the texture on the texture transfer mold correspond to the depressions of the texture in the gradient transfer layer, and the depressions of the texture on the texture transfer mold correspond to the protrusions of the texture in the gradient transfer layer.
It is understood that different areas of the texture transfer mold have gradient texture patterns with different distribution densities, and transfer patterns with different haze values are formed after the patterns are transferred to the sheet, for example, a matte effect with the haze values continuously changing in different areas can be formed, or a matte effect with the haze values continuously changing along the direction from the center of the sheet to the edge of the sheet can be formed, or a matte effect with the haze values continuously changing along the direction from one side of the outer surface to the other side can be formed. Wherein the greater the density of the distribution of the gradient texture pattern on the texture transfer mold, the visually perceptible gradient transfer layer has a matte appearance; the smaller the gradient texture pattern distribution density on the texture transfer mold, the gradient transfer layer can be visually perceived as having a mirror-like appearance.
S204: and forming a protective layer on the side of the gradual change transfer printing layer, which is far away from the first sheet.
The haze of the gradient texture patterns of different areas is changed on the gradient transfer printing layer, so that the gradient effect from the haze to the mirror surface effect can be brought under the condition that the protective layer is kept, and the shell assembly with the gradient effect is obtained.
In one embodiment, the protective layer includes a plurality of NCVM (Non-Conductive Vapor deposition) layers stacked on a side of the graded transfer layer facing away from the first sheet, and the refractive index of two adjacent NCVM layers is distributed in high and low.
Specifically, the NCVM layer is a film layer which has metal texture and does not influence the wireless communication transmission effect by adopting a mode of plating films of metal, insulating compounds and the like and utilizing the characteristic of mutual discontinuity, and the brightness of the gradient transfer printing layer can be improved. The method of forming the NCVM layer is not particularly limited, and may be, for example, one formed by Physical Vapor Deposition (PVD) or one formed by vacuum plating such as vacuum non-conductive plating (NVCM). The material for forming the NCVM layer is not particularly limited, and may include, for example, In/Sn, TiO2、NbO2、Nb2O3、Nb2O2、Nb2O5、SiO2、ZrO2At least one of (1).
In one embodiment, the multiple layers of the NCVM layer include: a first SiO layer sequentially laminated on one side of the gradual change transfer printing layer, which is far away from the first sheet material2Layer, first Nb2O5Layer, In layer, second SiO2Layer, second Nb2O5And (3) a layer.
Wherein, the first SiO2The thickness of the layer is 10 nm;
first Nb2O5The thickness of the layer is 20 nm;
the thickness of the In layer is 10 nm;
second SiO2The thickness of the layer is 10 nm;
second Nb2O5The thickness of the layer was 20 nm.
As shown in fig. 3, the present application provides a method of preparing a housing assembly, the method comprising the steps of:
s201: a texture transfer mold is provided.
S202: and filling UV glue in the gradually-changed texture pattern of the texture transfer printing mold.
S203: and transferring the UV glue in the gradient texture pattern to one side of the first sheet, and performing UV curing to form a gradient transfer printing layer.
In this step, a gradation transfer layer is formed on one side of the front first sheet by a UV transfer process using the texture transfer mold described above. According to some examples of the present application, the gradient transfer layer formed in this step may correspond to the texture effect of the texture transfer mold described above, and will not be described herein again.
S204: and forming a protective layer on the side of the gradual change transfer printing layer, which is far away from the first sheet.
S205: printing ink on the side, away from the gradual change transfer printing layer, of the protective layer to form a color layer.
From this, this colour layer can further richen shell assembly's outward appearance effect, promotes the product expressive force.
As shown in fig. 4, the present application provides a method of manufacturing a housing assembly, the method comprising the steps of:
s201: a texture transfer mold is provided.
S202: and filling UV glue in the gradually-changed texture pattern of the texture transfer printing mold.
S203: and transferring the UV glue in the gradient texture pattern to one side of the first sheet, and performing UV curing to form a gradient transfer printing layer.
S204: and forming a protective layer on the side of the gradual change transfer printing layer, which is far away from the first sheet.
S205: printing ink on the side, away from the gradual change transfer printing layer, of the protective layer to form a color layer.
S206: a second sheet is provided.
S207: and attaching one side of the first sheet, which is far away from the gradient transfer printing layer, to the second sheet.
Specifically, the material of the second sheet may include at least one of glass and plastic, and the first sheet is attached to one side of the second sheet. As mentioned above, after forming a decorative layer such as a texture layer and a film coating layer on the first sheet, a decorative film is obtained, and then the decorative film can be adhered to the second sheet by OCA glue so as to form the housing assembly.
The application provides a shell assembly, which is prepared by the preparation method of the shell assembly of the embodiment.
As shown in fig. 5, the present application provides a housing assembly 200 comprising: a first sheet 202, a graded transfer layer 203, and a protective layer 204.
The gradation transfer layer 203 is provided on one side of the first sheet 202, wherein the gradation transfer layer 203 is obtained by transferring UV glue to one side of the first sheet 202 by a texture transfer mold prepared by the method of preparing the texture transfer mold of the above embodiment.
The protective layer 204 is disposed on a side of the graded transfer layer 203 facing away from the first sheet 202.
In one embodiment, protective layer 204 includes a plurality of NCVM layers 204 stacked on a side of graded transfer layer 203 facing away from first sheet 202, and the refractive index of two adjacent NCVM layers exhibits a high-low profile.
In one embodiment, the multiple layers of the NCVM layer 204 include: a first SiO layer sequentially laminated on one side of the gradual change transfer printing layer, which is far away from the first sheet material2Layer, first Nb2O5Layer, In layer, second SiO2Layer, second Nb2O5And (3) a layer.
Wherein, the first SiO2The thickness of the layer is 10 nm;
first Nb2O5The thickness of the layer is 20 nm;
the thickness of the In layer is 10 nm;
second SiO2The thickness of the layer is 10 nm;
second Nb2O5The thickness of the layer was 20 nm.
In one embodiment, the housing assembly 200 further comprises: a color layer 205 provided on the side of the protective layer (the multi-layer NCVM layer 204) facing away from the gradation transfer layer 203.
In one embodiment, the housing assembly 200 further comprises: and a second sheet 201 disposed on a side of the first sheet 202 facing away from the graded transfer layer 203.
The application provides an electronic device, this electronic device includes: the housing assembly defines an accommodating space (not shown), the main board and the memory are located in the accommodating space, and the screen is disposed in the accommodating space and connected to the main board. Thus, the electronic device has all the features and advantages of the housing assembly described above, and thus, the description thereof is omitted. Generally, the electronic equipment has rich appearance effect and lower production cost.
For example, the electronic device may be any of various types of computer system devices that are mobile or portable and that perform wireless communications. In particular, the electronic device may be a mobile or smart phone (e.g., an iPhone (TM) based phone), a Portable gaming device (e.g., Nintendo DS (TM), PlayStation Portable (TM), Gameboy Advance (TM), iPhone (TM)), a laptop, a PDA, a Portable internet device, a music player, and a data storage device, other handheld devices, and a headset such as a watch, an in-ear headphone, a pendant, a headset, etc., and other wearable devices (e.g., a Head Mounted Device (HMD) such as an electronic necklace, an electronic garment, an electronic bracelet, an electronic necklace, an electronic tattoo, an electronic device, or a smart watch).
Different from the prior art, in the preparation process of the texture transfer printing mold used in the method, the gradient pattern is processed into the exposure energy of the photoetching machine, wherein when photoetching is carried out according to a specific processing path, the change curve of the exposure energy is in smooth transition. And photoetching the master mold substrate by using exposure energy through a photoetching machine to form a gradient texture pattern on the master mold substrate to obtain the texture transfer mold with the gradient texture, namely realizing gradient color by changing the gradient of the texture and embodying the gradient color and texture change effect. Further, the change curve of the exposure energy designed in the embodiment of the present application may be in smooth transition from large to small, so that the gradient texture pattern can be visually perceived as having an appearance that the matte surface is transitioned to the mirror surface, and it can be understood that, because different areas of the texture transfer mold have gradient texture patterns with different distribution densities, a scheme of transfer image haze gradient with different haze is formed after being transferred to a sheet, and the scheme is suitable for gradient of different colors, and the shell assembly can embody a gradient color texture change effect.
In the description of the present application, the terms "upper", "lower", and the like indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of describing the present application but do not require that the present application must be constructed and operated in a specific orientation, and thus, cannot be construed as limiting the present application.
Various examples and features of different examples described in this specification can be combined and combined by one skilled in the art without contradiction. In addition, it should be noted that the terms "first" and "second" in this specification are used for descriptive purposes only and are used for visually distinguishing the first region from the second region, as well as the first coating layer from the second coating layer, and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated.
Although embodiments of the present application have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present application, and that variations, modifications, substitutions and alterations may be made to the above embodiments by those of ordinary skill in the art within the scope of the present application.
Claims (11)
1. The preparation method of the texture transfer printing mold is characterized by comprising the following steps of:
designing a gradual change graph;
processing the gradient graph into gray data with graph information;
converting the gray data into exposure energy of a photoetching machine, wherein when photoetching is carried out according to a specific processing path, a change curve of the exposure energy is in smooth transition;
and photoetching the master mold substrate by the photoetching machine with the exposure energy to form a gradient texture pattern on the master mold substrate, so as to obtain the texture transfer mold.
2. A method of making a housing assembly, comprising the steps of:
providing a texture transfer mold, the texture transfer mold comprising: a master substrate and a gradient texture pattern formed on the master substrate, wherein the gradient texture pattern is visually perceptible as having an appearance of a matte transition to a mirror surface along a particular processing path;
filling UV glue in the gradually-changed texture pattern of the texture transfer printing mold;
transferring the UV glue in the gradient texture pattern to one side of a first sheet, and performing UV curing to form a gradient transfer printing layer;
and forming a protective layer on one side of the gradual change transfer printing layer, which is far away from the first sheet.
3. The method of claim 2, wherein the protective layer comprises a plurality of NCVM layers stacked on a side of the graded transfer layer facing away from the first sheet, and the refractive index of two adjacent NCVM layers is distributed in high and low directions.
4. The method of claim 3, wherein the multiple layers of NCVM layers comprise: a first SiO layer sequentially laminated on one side of the gradual change transfer printing layer, which is far away from the first sheet material2Layer, first Nb2O5Layer, In layer, second SiO2Layer, second Nb2O5A layer;
the first SiO2The thickness of the layer is 10 nm;
the first Nb2O5The thickness of the layer is 20 nm;
the thickness of the In layer is 10 nm;
the second SiO2The thickness of the layer is 10 nm;
the first mentionedTwo Nb2O5The thickness of the layer was 20 nm.
5. The method according to claim 3, wherein after the step of forming a protective layer on a side of the graded transfer layer facing away from the first sheet, the method further comprises:
printing ink on one side of the protective layer, which is far away from the gradual change transfer printing layer, so as to form a color layer.
6. The method of claim 2, further comprising:
providing a second sheet;
and attaching one side of the first sheet, which is far away from the gradient transfer printing layer, to the second sheet.
7. A housing assembly, comprising:
a first sheet material;
the gradual change transfer printing layer sets up in one side of first sheet material, wherein, the gradual change transfer printing layer is got through texture transfer printing mould with UV glue transfer printing to one side of first sheet material, texture transfer printing mould includes: a master substrate and a gradient texture pattern formed on the master substrate, wherein the gradient texture pattern is visually perceptible as having an appearance of a matte transition to a mirror surface along a particular processing path;
and the protective layer is arranged on one side of the gradual change transfer printing layer, which is far away from the first sheet.
8. The housing assembly of claim 7, wherein the protective layer comprises a plurality of NCVM layers stacked on a side of the transfer layer facing away from the first sheet, and the refractive index of two adjacent NCVM layers exhibits a high-low profile.
9. The housing assembly of claim 8, wherein the multiple layers of NCVM layers comprise: sequentially laminating the gradient transfer printing layer away from the first sheetFirst SiO of one side2Layer, first Nb2O5Layer, In layer, second SiO2Layer, second Nb2O5A layer;
the first SiO2The thickness of the layer is 10 nm;
the first Nb2O5The thickness of the layer is 20 nm;
the thickness of the In layer is 10 nm;
the second SiO2The thickness of the layer is 10 nm;
the second Nb2O5The thickness of the layer was 20 nm.
10. The housing assembly of claim 7, further comprising: a color layer and/or a second sheet;
the color layer is arranged on one side, deviating from the gradual change transfer printing layer, of the protective layer, and the second sheet is arranged on one side, deviating from the gradual change transfer printing layer, of the first sheet.
11. An electronic device, comprising:
the housing assembly of any one of claims 7 to 10, or the housing assembly prepared by the method of any one of claims 2 to 6, defining a receiving space, the exterior membrane of the housing assembly being disposed towards the interior of the electronic device;
the main board and the memory are positioned in the accommodating space; and the screen is arranged at the top of the shell component and is connected with the main board.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202110864574.3A CN113568282A (en) | 2021-07-29 | 2021-07-29 | Preparation method of transfer mold, shell assembly and preparation method thereof, and electronic equipment |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202110864574.3A CN113568282A (en) | 2021-07-29 | 2021-07-29 | Preparation method of transfer mold, shell assembly and preparation method thereof, and electronic equipment |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115213633A (en) * | 2022-05-31 | 2022-10-21 | 东莞正广精密科技有限公司 | Preparation method of AG effect texture |
| CN118596739A (en) * | 2024-08-09 | 2024-09-06 | 比亚迪股份有限公司 | Texture structure, preparation method thereof, decoration and terminal |
| CN118636597A (en) * | 2024-08-15 | 2024-09-13 | 比亚迪股份有限公司 | Texture structure, preparation method thereof, decoration and terminal |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1698014A (en) * | 2003-01-28 | 2005-11-16 | 索尼株式会社 | Exposing mask and production metod therefor and exposing method |
| CN110493987A (en) * | 2019-08-12 | 2019-11-22 | Oppo广东移动通信有限公司 | Housing unit, the method and electronic equipment for preparing housing unit |
| CN110744942A (en) * | 2019-11-15 | 2020-02-04 | Oppo广东移动通信有限公司 | Manufacturing method of gradient shell, gradient shell and electronic equipment |
| WO2020098416A1 (en) * | 2018-11-16 | 2020-05-22 | 昇印光电（昆山）股份有限公司 | Decorative thin film and consumer electronic product cover plate |
| CN111295062A (en) * | 2020-03-13 | 2020-06-16 | Oppo广东移动通信有限公司 | Shell assembly, preparation method thereof and electronic equipment |
| CN113068347A (en) * | 2021-03-29 | 2021-07-02 | 维沃移动通信有限公司 | Cover plate, electronic equipment and preparation method of cover plate |
-
2021
- 2021-07-29 CN CN202110864574.3A patent/CN113568282A/en not_active Withdrawn
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1698014A (en) * | 2003-01-28 | 2005-11-16 | 索尼株式会社 | Exposing mask and production metod therefor and exposing method |
| WO2020098416A1 (en) * | 2018-11-16 | 2020-05-22 | 昇印光电（昆山）股份有限公司 | Decorative thin film and consumer electronic product cover plate |
| CN110493987A (en) * | 2019-08-12 | 2019-11-22 | Oppo广东移动通信有限公司 | Housing unit, the method and electronic equipment for preparing housing unit |
| CN110744942A (en) * | 2019-11-15 | 2020-02-04 | Oppo广东移动通信有限公司 | Manufacturing method of gradient shell, gradient shell and electronic equipment |
| CN111295062A (en) * | 2020-03-13 | 2020-06-16 | Oppo广东移动通信有限公司 | Shell assembly, preparation method thereof and electronic equipment |
| CN113068347A (en) * | 2021-03-29 | 2021-07-02 | 维沃移动通信有限公司 | Cover plate, electronic equipment and preparation method of cover plate |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115213633A (en) * | 2022-05-31 | 2022-10-21 | 东莞正广精密科技有限公司 | Preparation method of AG effect texture |
| CN115213633B (en) * | 2022-05-31 | 2024-01-30 | 东莞正广精密科技有限公司 | AG effect texture preparation method |
| CN118596739A (en) * | 2024-08-09 | 2024-09-06 | 比亚迪股份有限公司 | Texture structure, preparation method thereof, decoration and terminal |
| CN118636597A (en) * | 2024-08-15 | 2024-09-13 | 比亚迪股份有限公司 | Texture structure, preparation method thereof, decoration and terminal |
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Application publication date: 20211029 |