CN114481009B - Anode high-pressure low-temperature nitriding device - Google Patents
Anode high-pressure low-temperature nitriding device Download PDFInfo
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- CN114481009B CN114481009B CN202210135362.6A CN202210135362A CN114481009B CN 114481009 B CN114481009 B CN 114481009B CN 202210135362 A CN202210135362 A CN 202210135362A CN 114481009 B CN114481009 B CN 114481009B
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- workpiece table
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- 238000005121 nitriding Methods 0.000 title claims abstract description 29
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052751 metal Inorganic materials 0.000 claims abstract description 11
- 229910052742 iron Inorganic materials 0.000 claims abstract description 8
- 239000002184 metal Substances 0.000 claims abstract description 8
- 238000010438 heat treatment Methods 0.000 claims description 5
- 238000007789 sealing Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 4
- 238000004381 surface treatment Methods 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 11
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 5
- 239000010410 layer Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Abstract
The invention relates to the technical field of metal surface treatment, in particular to an anode high-pressure low-temperature nitriding device, which comprises a body, wherein a working cavity is formed in the body in a hollow mode, a workpiece table is placed in the working cavity, iron pieces are embedded in the working table, and permanent magnets capable of driving the working table to rotate are arranged at the upper end and the lower end of the working cavity; be provided with vacuum assembly, heater, inflation component, adjustable power supply and adjustable source on the body, inflation component, adjustable source all are located the working chamber top, and vacuum assembly is located the below of body, and the heater is located the working chamber, and the both ends of adjustable power supply link to each other with body and adjustable source respectively, have solved the problem that is difficult to realize the processing of hole and complicated part and special material part among the prior art.
Description
Technical Field
The invention relates to the technical field of metal surface treatment, in particular to an anode high-pressure low-temperature nitriding device.
Background
In the prior art, a plurality of methods for treating gold on the surface of the plasma are adopted, wherein glow ion nitriding is carried out by utilizing a glow discharge principle, when gas passes over a corona discharge zone, if the resistance of an external circuit is reduced, or the voltage of a full circuit is increased,
The discharge power is continuously increased, the discharge current is continuously increased, and the glow is gradually spread to the whole area between the two electrodes
The discharge space, the luminescence is also increasingly brighter, as the electron energy increases, i.e. the operating parameters of the electric field are enhanced,
The corona discharge can be transited to glow discharge, and the method has the defects of poor ion diffraction, difficult realization of inner hole and complex part treatment and the like.
Disclosure of Invention
The invention aims to provide an anode high-pressure low-temperature nitriding device, which solves the problem that the treatment of complex parts and parts made of special materials is difficult to realize in the prior art.
The invention aims at realizing the technical scheme that the anode high-pressure low-temperature nitriding device comprises a body, wherein a working cavity is formed in the body in a hollow mode, a deformable workpiece table is placed in the working cavity, iron pieces are embedded in the deformable workpiece table, and permanent magnets capable of driving the deformable workpiece table to rotate are detachably arranged at the upper end and the lower end of the working cavity; the vacuum source is characterized in that a vacuum component, a heater, an inflation component, an adjustable power supply and an adjustable source are arranged on the body, the inflation component and the adjustable source are both located above the working cavity, the vacuum component is located below the body, the heater is located in the working cavity, and two ends of the adjustable power supply are respectively connected with the body and the adjustable source.
The rotation of the workpiece is realized through the permanent magnet and the iron piece, and the placement of the special-shaped workpiece is realized through the deformable workpiece table.
The deformable workpiece table is provided with a plurality of lifting rings, and the lifting rings are different in diameter and are coaxially arranged; the excircle of the deformable workpiece table is provided with a plurality of telescopic propping devices which are in sliding connection with the workbench.
The workpiece is stabilized by the telescopic puller.
The lifting ring comprises a plurality of lifting rods, the lifting rods are arranged at intervals, and the telescopic lifting rods can work independently.
The nitriding treatment of the bottom of the workpiece is realized by the lifting rods arranged at intervals.
The bottom of the body is provided with a mounting opening, the diameter of the mounting opening is larger than that of the deformable workpiece table, and the mounting opening is provided with a sealing cover.
The disassembly and the assembly of the workpiece are realized through the mounting port.
One end of the adjustable source electrode is positioned outside the body, and the other end of the adjustable source electrode extends to the lower part of the working cavity; one end of the inflation component is positioned outside the body, and the other end of the inflation component extends to the middle part of the working cavity.
It should be noted that, through the setting of the inflation subassembly, guarantee the even distribution of gas in the working chamber. A rotating assembly is arranged below the deformable workpiece table and is connected with the body shell through a negative bias power supply; the body shell is connected with a grounding component in the Shanghai, and an insulating layer is attached to the outside of the rotating component; the adjustable source electrode is an anode, and the adjustable power supply is an auxiliary anode high-voltage power supply; the top of the working cavity is provided with a vacuum detector, and a temperature detector is arranged in the working cavity.
The temperature detector is used for ensuring proper working temperature, and the vacuum detector is used for realizing proper air pressure and vacuum degree.
The heating temperature of the heater is 0-300 ℃; the adjustable power supply is 0-3000 v, 0-1A; the negative bias power supply is 0-1200V; the vacuum degree of the working cavity is 5E-3Pa; the gas filled in the working cavity is Ar and N2; the air pressure of the working cavity is 5E-1 Pa-10 Pa during working.
The efficiency of the nitriding treatment is ensured by setting the voltage, the current and the temperature.
The adjustable sources are made of any metal or any proportion of metal element composition, and the adjustable sources are distributed uniformly at intervals.
The uniformity of nitridation is ensured by uniformly distributing the intervals of the plurality of adjustable sources.
Compared with the prior art, the invention has the following advantages and beneficial effects:
1. Setting a variable deformable workpiece table to realize the installation and treatment of the special-shaped workpiece;
2. A plurality of lifting rods are arranged at intervals to realize the treatment of the porous workpiece;
3. The rotary assembly is used for realizing the rotation diversification of the deformable workpiece table.
Drawings
FIG. 1 is one of the structural schematic diagrams of the present invention;
FIG. 2 is a second schematic diagram of the structure of the present invention;
FIG. 3 is a third schematic diagram of the structure of the present invention.
Reference numerals: 1-a body; 2-a working chamber; 3-a deformable workpiece stage; 4-iron parts; 5-permanent magnet; 6-a vacuum assembly; 7-a heater; 8-an inflation assembly; 9-an adjustable power supply; 10-an adjustable source; 11-lifting rod; 12-a telescopic puller; 13-a vacuum detector; 14-a temperature detector; 15-a grounding assembly; 16-a negative bias power supply; 17-a rotating assembly.
Detailed Description
Referring to fig. 1-3 together, the present embodiment provides an anode high-pressure low-temperature nitriding apparatus, which is mainly used for solving the problem that the prior art is difficult to implement the treatment of inner holes and complex parts, and the anode high-pressure low-temperature nitriding apparatus is already in a practical use stage.
It should be noted that the apparatus of the present application corresponds to the nitridation process performed by the applicant, and may be applied to similar nitridation operations, including but not limited to low temperature nitridation, vacuum nitridation, and the like.
The application is carried out by the following embodiment, an anode high-pressure low-temperature nitriding device comprises a body 1, wherein a working cavity 2 is formed in the body 1 in a hollow mode, a deformable workpiece table 3 is placed in the working cavity 2, iron pieces 4 are embedded in the deformable workpiece table 3, and permanent magnets 5 capable of driving the deformable workpiece table to rotate are detachably arranged at the upper end and the lower end of the working cavity 2; the body 1 is provided with a vacuum component 6, a heater 7, an air charging component 8, an adjustable power supply 9 and an adjustable source electrode 10, the air charging component 8 and the adjustable source electrode 10 are all positioned above the working cavity 2, the vacuum component 6 is positioned below the body 1, the heater 7 is positioned in the working cavity 2, and two ends of the adjustable power supply 9 are respectively connected with the body 1 and the adjustable source electrode 10.
The workpiece to be processed is placed on a deformable workpiece table, then air in the working cavity 2 is pumped out through the vacuum component 6, then the required inert gas is filled into the working cavity 2 through the air charging component 8, the environment in the working cavity 2 is heated through the heater 7 arranged in the working cavity 2, nitriding treatment of the workpiece to be processed is achieved by combining the adjustable source electrode 10 arranged in the working cavity 2, in detail, rotation of the workpiece to be processed is achieved through the iron piece 4 embedded in the deformable workpiece table 3 and the permanent magnet 5 arranged at the upper end and the lower end of the working cavity 2, specifically, the workpiece to be processed is firstly arranged on the deformable workpiece table, the deformable workpiece table is placed in the working cavity 2, then the permanent magnet 5 is installed, at the moment, under the action of the iron piece 4 and the permanent magnet 5, the deformable workpiece table is continuously rotated, and stable magnetic force action is generated between the iron piece 4 and the permanent magnet 5, at the moment, vacuum operation, the heating operation and the restarting operation are achieved in the working cavity 2, and the workpiece to be processed can be realized under the action of the adjustable source electrode 10, and the deformed workpiece table can be processed in detail according to the actual shape of the workpiece to be processed, and the deformed workpiece table can be deformed, and the deformed workpiece table can be processed according to the actual shape of the workpiece to the requirements. By using the permanent magnet 5, rotation on the working day can be realized under the condition that electricity is not applicable, and electric energy saving can be effectively realized. The application provides an anode high-pressure low-temperature nitriding device, which solves the problem that complex parts are difficult to treat in the prior art.
A plurality of lifting rings are arranged on the deformable workpiece table 3, and the lifting rings are different in diameter and are coaxially arranged; the excircle of the deformable workpiece table is provided with a plurality of telescopic lifters 12, and the telescopic lifters 12 are in sliding connection with the deformable workpiece table.
As shown in fig. 2 and 3, the deformable workpiece table 3 is provided with a plurality of lifting rings, and the height of the lifting rings is adjusted according to workpieces to be processed with different shapes, so that nitriding treatment of complex workpieces is realized. On the other hand, the workpiece is supported by the telescopic puller 12, so that the workpiece can be kept stable all the time in the rotating process, and the contact end diameter of the telescopic puller 12 and the workpiece is smaller, so that the contact area can be reduced as much as possible, and meanwhile, the workpiece with different heights can be stably supported by arranging the telescopic puller 12 into a telescopic structure, preferably, the number of the telescopic puller 12 is three or four, and other numbers can be selected.
The lifting ring comprises a plurality of lifting rods 11, the lifting rods 11 are arranged at intervals, and the plurality of telescopic lifting rods 11 can work independently.
It should be noted that, realize the arrangement of lift ring through a plurality of lifter 11, in detail, each lifter 11 of every lift ring can be solitary go up and down, simultaneously, the interval is arranged between two adjacent lifter 11, have the clearance between two adjacent lifter 11 promptly, then can guarantee that the gas that fills in the working chamber 2 can follow the bottom motion of work piece, then to the work piece that has hole or aperture more, can effectually realize the nitridation processing of the interior circular surface of each aperture, solve the problem that the aperture that sets up on the work piece can't be effective to carry out nitridation among the prior art.
The bottom of the body 1 is provided with a mounting opening, the diameter of the mounting opening is larger than that of the deformable workpiece table, and the mounting opening is provided with a sealing cover.
It should be noted that, realize the installation in dismantling of deformable work piece platform through setting up the mounting hole, and then realize the installation and dismantling to the work piece, the diameter of mounting hole is slightly less than the diameter in the interior circle of working chamber 2, in detail opens the mounting hole, places the work piece on a plurality of lifter 11, adjusts the height of each lifter 11 in order to guarantee that the work piece can place steadily, then removes deformable work piece platform to the working chamber 2 in, then installs sealed lid assurance nitriding process in-process working chamber 2 gaseous purity and stability.
One end of the adjustable source electrode 10 is positioned outside the body 1, and the other end extends to the lower part of the working cavity 2; one end of the inflation assembly 8 is located outside the body 1 and the other end extends to the middle of the working chamber 2.
It should be noted that, the positions of the adjustable source 10 and the inflatable module 8 in the working chamber 2 are set so as to ensure that the adjustable source 10 can achieve the best effect, and ensure that the gas inflated into the working chamber 2 by the inflatable module 8 can be uniformly distributed in the working chamber 2.
A rotating assembly 17 is arranged below the deformable workpiece table, and the rotating assembly 17 is connected with the shell of the body 1 through a negative bias power supply 16; the upper sea of the shell of the body 1 is connected with a grounding component 15, and an insulating layer is attached outside the rotating component 17; the adjustable source electrode 10 is an anode, and the adjustable power supply 9 is an auxiliary anode high-voltage power supply; the top of the working cavity 2 is provided with a vacuum detector 13, and the working cavity 2 is internally provided with a temperature detector 14.
In another embodiment of the present embodiment, the rotation of the deformable workpiece stage is achieved by replacing the permanent magnet 5 with the rotation unit 17, and the nitriding treatment of the workpiece is achieved by providing a plurality of rotation modes. In detail, the invention belongs to the field of metal surface treatment, and utilizes the phenomenon that the thin gas in a working cavity 2 enhances glow through the high pressure of an auxiliary anode, an auxiliary anode high pressure source is arranged at the periphery of a workpiece, the auxiliary anode high pressure source is connected to the periphery of the inner wall of the working cavity 2, a negative bias voltage is applied above a deformable workpiece table, under the action, the workpiece cavity is raised to 250 ℃, and the workpiece surface achieves special physical, chemical and mechanical properties through bombardment and diffusion of ions to be permeated, and finally the purpose of optimizing the workpiece surface property is achieved.
The heating temperature of the heater 7 is 0-300 ℃; the adjustable power supply 9 is 0-3000 v, 0-1A; the negative bias power supply 16 is 0-1200V; the vacuum degree of the working cavity 2 is 5E-3Pa; the inflation component 8 is used for inflating Ar and N2 into the working cavity 2; the air pressure of the working cavity 2 is 5E-1 Pa-10 Pa during working.
It should be noted that the efficiency of the nitriding treatment of the device is maximized by limiting the heating temperature, the voltage and current of the adjustable power supply 9, the voltage range of the negative bias power supply 16, the vacuum degree of the working chamber 2, the gas filled in, and the gas pressure of the working chamber 2 during operation.
The adjustable sources 10 are made of any metal or a combination of metal elements in any proportion, and the adjustable sources 10 are distributed in a plurality of uniformly spaced mode.
It should be noted that, the adjustable source 10 of this embodiment does not need any specific material, any metal or any composition of metal elements in any proportion can be used to manufacture the anode auxiliary source, which has no specific requirement on the adjustable source 10, has strong practicability, and can improve the film-based binding force of the later vacuum coating for the purpose of surface modification suitable for various materials or parts. On the other hand, by providing a plurality of adjustable sources 10 and uniformly distributing the intervals, the uniformity of nitriding treatment on the surface of the workpiece is ensured to be the best.
In the application, a sealed container with certain gas is formed by the body 1, the vacuum component 6 and the inflation component 8, the ultimate vacuum degree in the working cavity 2 is not lower than 6E-4Pa, and the vacuum degree in the working cavity 2 in the working state is changed within the range of 5E-1 to 10Pa by filling inert gases Ar, ne, reaction gas N2 and the like. An auxiliary anode source is arranged in the working cavity 2, a deformable workpiece table rotates at a certain speed under the drive of a connected rotating assembly 17, the workpiece is placed on the deformable workpiece table insulated from the working cavity 2, an adjustable power supply 9 is connected between the rotating assembly 17 and the working cavity 2, the adjustable power supply 9 is a direct-current adjustable voltage power supply and controls the voltage of the direct-current adjustable voltage power supply to be 0-1200V, an auxiliary anode source with a certain distance from the workpiece is arranged around the workpiece, a high-voltage pulse adjustable power supply 9 is connected between the auxiliary anode source and the working cavity 2 and controls the voltage of the high-voltage pulse adjustable power supply to be 0-3000V, one or more auxiliary anode sources are directly arranged on the inner wall of the working cavity 2 by utilizing the discharge phenomenon of vacuum high voltage, high-energy and high-density ion flows are continuously generated, active atoms or ions which are all diffused into the surface of the workpiece are in an infiltration mode into the surface layer of the workpiece to form a nitriding layer under the negative bias effect of the workpiece, and the auxiliary anode source voltage reaches over ten thousand volts can also be used as ion implantation.
The device according to the invention compared with the prior art, the following data were obtained:
According to the table, the anode high-pressure low-temperature nitriding device disclosed by the application has the advantages that the auxiliary anode source is used for applying 0-3000v of high-pressure excitation ionized gas, meanwhile, a negative bias voltage is applied to the rotating component 17, the working cavity 2 is heated and warmed up in the day, the ionized concentration and energy of the gas to be permeated are increased, the device has good diffraction property, a workpiece with low temperature is not easy to deform, the cooling water temperature requirement is low, the device can be arranged at any position of the working cavity 2, and the workpiece rotates along with the deformable workpiece table at a constant speed, so that the device can treat various parts with complex shapes, concave surfaces and large areas to obtain a uniform nitriding layer, the device can be ensured to be an ionization system without evaporation and cleaning by low-pressure excitation, and meanwhile, the device also has the advantages of simple structure, convenience in maintenance, continuous long-time working and the like.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (7)
1. An anode high pressure low temperature nitriding apparatus, comprising: the device comprises a body (1), wherein a working cavity (2) is formed in the body (1), a deformable workpiece table (3) is arranged in the working cavity (2), iron pieces (4) are embedded in the deformable workpiece table (3), and permanent magnets (5) capable of driving the deformable workpiece table (3) to rotate are detachably arranged at the upper end and the lower end of the working cavity (2); the vacuum source comprises a body (1), and is characterized in that a vacuum component (6), a heater (7), an inflation component (8), an adjustable power supply (9) and an adjustable source electrode (10) are arranged on the body (1), the inflation component (8) and the adjustable source electrode (10) are both positioned above the working cavity (2), the vacuum component (6) is positioned below the body (1), the heater (7) is positioned in the working cavity (2), and two ends of the adjustable power supply (9) are respectively connected with the body (1) and the adjustable source electrode (10); a plurality of lifting rings are arranged on the deformable workpiece table (3), and the lifting rings are different in diameter and are coaxially arranged; the excircle of the deformable workpiece table (3) is provided with telescopic propping devices (12), and the number of the telescopic propping devices (12) is multiple and the telescopic propping devices are in sliding connection with the deformable workpiece table (3).
2. An anode high pressure low temperature nitriding apparatus according to claim 1, comprising: the lifting ring comprises a plurality of lifting rods (11), the lifting rods (11) are arranged at intervals, and the telescopic lifting rods (11) can work independently.
3. An anode high pressure low temperature nitriding apparatus according to claim 2, comprising: the bottom of the body (1) is provided with a mounting opening, the diameter of the mounting opening is larger than that of the deformable workpiece table (3), and the mounting opening is provided with a sealing cover.
4. An anode high pressure low temperature nitriding apparatus according to claim 1, comprising: one end of the adjustable source electrode (10) is positioned outside the body (1), and the other end of the adjustable source electrode extends to the lower part of the working cavity (2); one end of the inflation component (8) is positioned outside the body (1), and the other end extends to the middle part of the working cavity (2).
5. An anode high pressure low temperature nitriding apparatus according to claim 1, comprising: a rotating assembly (17) is arranged below the deformable workpiece table (3), and the rotating assembly (17) is connected with the shell of the body (1) through a negative bias power supply (16); the body (1) is characterized in that a grounding assembly (15) is connected to the upper sea of the shell of the body (1), and an insulating layer is attached to the outer side of the rotating assembly (17); the adjustable source electrode (10) is an anode, and the adjustable power supply (9) is an auxiliary anode high-voltage power supply; the top of the working cavity (2) is provided with a vacuum detector (13), and a temperature detector (14) is arranged in the working cavity (2).
6. The anode high-pressure low-temperature nitriding apparatus according to claim 5, comprising: the heating temperature of the heater (7) is 0-300 ℃; the adjustable power supply (9) is 0-3000 v and 0-1A; the negative bias power supply (16) is 0-1200V; the vacuum degree of the working cavity (2) is 5E-3Pa; the inflation component (8) is used for inflating Ar and N2 into the working cavity (2); the air pressure of the working cavity (2) is 5E-1 Pa-10 Pa when working.
7. An anode high pressure low temperature nitriding apparatus as claimed in claim 4, wherein said adjustable sources (10) are made of any metal or combination of metal elements in any proportion, and said adjustable sources (10) are plural in number and uniformly arranged at intervals.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210135362.6A CN114481009B (en) | 2022-02-14 | 2022-02-14 | Anode high-pressure low-temperature nitriding device |
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| CN202210135362.6A CN114481009B (en) | 2022-02-14 | 2022-02-14 | Anode high-pressure low-temperature nitriding device |
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| CN114481009B true CN114481009B (en) | 2024-04-30 |
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1057073A (en) * | 1990-06-01 | 1991-12-18 | 太原工业大学 | Arc-added glow ion implantation technique and equipment |
| KR20000015197U (en) * | 1998-12-31 | 2000-07-25 | 김덕중 | Nitriding treatment apparatus using high frequency induction discharge plasma |
| CN1412343A (en) * | 2002-03-18 | 2003-04-23 | 太原理工大学 | Bicathode-high frequency glow ion diffusion coating equipment and its process |
| TW200616497A (en) * | 2004-11-12 | 2006-05-16 | Atomic Energy Council | Apparatus for nitrifying inner and outer walls of metal tubes |
| CN108878249A (en) * | 2018-06-19 | 2018-11-23 | 大连理工大学 | A kind of pulse Penning discharge plasma producing apparatus |
| CN109797363A (en) * | 2019-02-21 | 2019-05-24 | 东莞市汇成真空科技有限公司 | A kind of arc light electron source assisting ion nitriding process |
| CN209873076U (en) * | 2019-02-21 | 2019-12-31 | 东莞市汇成真空科技有限公司 | High vacuum ion nitriding device based on arc light electron source is supplementary |
| CN210030866U (en) * | 2019-04-30 | 2020-02-07 | 泰安东大新材表面技术有限公司 | Gas arc discharge device and coupling system with vacuum cavity |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6990162B2 (en) * | 2018-10-15 | 2022-01-12 | 株式会社神戸製鋼所 | Nitriding processing equipment and nitriding processing method |
-
2022
- 2022-02-14 CN CN202210135362.6A patent/CN114481009B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1057073A (en) * | 1990-06-01 | 1991-12-18 | 太原工业大学 | Arc-added glow ion implantation technique and equipment |
| KR20000015197U (en) * | 1998-12-31 | 2000-07-25 | 김덕중 | Nitriding treatment apparatus using high frequency induction discharge plasma |
| CN1412343A (en) * | 2002-03-18 | 2003-04-23 | 太原理工大学 | Bicathode-high frequency glow ion diffusion coating equipment and its process |
| TW200616497A (en) * | 2004-11-12 | 2006-05-16 | Atomic Energy Council | Apparatus for nitrifying inner and outer walls of metal tubes |
| CN108878249A (en) * | 2018-06-19 | 2018-11-23 | 大连理工大学 | A kind of pulse Penning discharge plasma producing apparatus |
| CN109797363A (en) * | 2019-02-21 | 2019-05-24 | 东莞市汇成真空科技有限公司 | A kind of arc light electron source assisting ion nitriding process |
| CN209873076U (en) * | 2019-02-21 | 2019-12-31 | 东莞市汇成真空科技有限公司 | High vacuum ion nitriding device based on arc light electron source is supplementary |
| CN210030866U (en) * | 2019-04-30 | 2020-02-07 | 泰安东大新材表面技术有限公司 | Gas arc discharge device and coupling system with vacuum cavity |
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