CN114472089B - Photoetching uniform-glue machine of integrated circuit production line capable of vertically conveying - Google Patents
Photoetching uniform-glue machine of integrated circuit production line capable of vertically conveying Download PDFInfo
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- CN114472089B CN114472089B CN202210082848.8A CN202210082848A CN114472089B CN 114472089 B CN114472089 B CN 114472089B CN 202210082848 A CN202210082848 A CN 202210082848A CN 114472089 B CN114472089 B CN 114472089B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
- B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C13/00—Means for manipulating or holding work, e.g. for separate articles
- B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- Microelectronics & Electronic Packaging (AREA)
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention relates to the technical field of photoresist homogenizers, in particular to a photoresist homogenizers of a vertically conveyable integrated circuit production line, which comprises a control console, a platen, a photoresist feeding mechanism and a control wafer mechanism, wherein the platen is connected above the control console, the photoresist feeding mechanism and the control wafer mechanism are connected above the platen, the control wafer mechanism comprises a main L-shaped plate, a middle control frame, an auxiliary control frame, a half cover body and an adsorption seat, the main L-shaped plate is fixed on the platen, and the middle control frame is connected to one side of the main L-shaped plate.
Description
Technical Field
The invention relates to the technical field of photoresist homogenizers, in particular to a photoresist homogenizer of an integrated circuit production line capable of being vertically conveyed.
Background
The wafer is a silicon wafer used for manufacturing a silicon semiconductor integrated circuit, silicon dioxide ore is refined through an electric arc furnace, chloridized through hydrochloric acid, and distilled to prepare high-purity polycrystalline silicon, the polycrystalline silicon is melted again, seed crystals are planted in a melting liquid, and then the polycrystalline silicon is slowly pulled out to form a cylindrical monocrystalline silicon rod, the process is called as 'crystal growth', the silicon rod is processed through a series of processes and finally packaged to form a 'wafer', the processing process relates to a gluing process, a photoetching glue homogenizer on an integrated circuit production line in the prior art can realize rapid gluing work, a production line gluing process in the traditional technology has certain defects, after the silicon wafer gluing process is finished, the silicon wafer needs to be extracted and then conveyed to the next process, the problem that an extracting clamp is in contact with a glue surface on the silicon wafer inevitably exists in the process, production quality of a circuit is improved to the greatest extent along with enhancement of electronic power, production management and control of lean refinement of each process are needed, and a photoetching glue homogenizer of the integrated circuit production line capable of vertical conveying is provided for ensuring that the silicon wafer is not in the silicon wafer extraction process, and the whole technological control of the glue surface of the silicon wafer extraction and the silicon wafer extraction process can not be automatically controlled.
Disclosure of Invention
The present invention is directed to a photoresist homogenizer for integrated circuit production line capable of vertical transportation, so as to solve the problems mentioned in the background art.
In order to achieve the purpose, the invention provides the following technical scheme: the utility model provides a but photoetching of integrated circuit production line of vertical type transport is all glued, includes control cabinet, platen, for gluey mechanism and accuse piece mechanism, the control cabinet top is connected with the platen, and the top of platen is connected with for gluey mechanism and accuse piece mechanism, accuse piece mechanism includes main L template, well accuse frame, assists the accuse frame, half cover body and adsorption seat, main L template is fixed on the platen, and one side of main L template is connected with well accuse frame, is connected with two symmetric distribution's the accuse frame of assisting around the well accuse frame, assists bottom one side of accuse frame and is connected with half cover body, is provided with the adsorption seat between two symmetric distribution's the half cover body on the platen, and the adsorption seat runs through the plate body of platen, has seted up the collecting vat on the upper surface of platen, and the adsorption seat sets up in the collecting vat, and the whole cover that two half cover bodies of buckling is constituteed covers on the collecting vat.
Preferably, the auxiliary control frame comprises a first guide rod, an L-shaped auxiliary plate, an upright column, a pad piece, a second guide rod, a variable-pressure top body, an L-shaped bottom plate, an inclined seat and a first spring, one end of the L-shaped auxiliary plate is connected with the central control frame, the other end of the L-shaped auxiliary plate is connected with the pad piece, one side of the pad piece is provided with the upright column, the top of the upright column penetrates through a square hole formed in the L-shaped auxiliary plate, the upper end of the upright column is connected with the central control frame, the bottom end of the upright column is provided with the L-shaped bottom plate, the upright column penetrates through the square hole formed in the L-shaped bottom plate, one side of the bottom of the upright column is fixedly connected with the second guide rod, the second guide rod penetrates through a round hole formed in the L-shaped bottom plate, the top of one end of the inclined seat is fixedly connected with the variable-pressure top body, the other end of the inclined seat is contacted with the first spring, the first spring is filled between the L-shaped bottom plate and the inclined seat, the middle of the first spring penetrates through the first guide rod, the through hole formed in the L-shaped bottom plate, the L-shaped bottom plate is fixed on the cover body, and the semi-fixed connection bedplate.
Preferably, the inclined seat is in the shape that a transverse plate is integrally connected to one side of the sliding block, an inclined plane is arranged at the top of the sliding block, one end of the transverse plate of the inclined seat is fixed to the half cover body, the half cover body is in a semi-ring cylindrical shape, and the section of the ring body is an L-shaped surface.
Preferably, well accuse frame includes vertical scroll, top accuse frame, second spring, interior pole, brake block and L type die-pin, the vertical scroll runs through the through-hole of seting up on the main L template, and the bottom fixedly connected with top of vertical scroll accuse frame, and the through-hole has all been seted up at the both ends of top accuse frame, and the activity has cup jointed interior pole in the through-hole, and the one end of interior pole extends to the top accuse frame outside, and interior pole tip fixedly connected with brake block, sets up the square hole on the brake block, and the stand activity cup joints in the square hole of brake block, the other end fixedly connected with L type die-pin of interior pole, has cushioned the second spring between L type die-pin and the top accuse frame, and the second spring overlaps on the pole, and the one end of L type subplate is fixed on the top accuse frame.
Preferably, the pad piece comprises a limiting slide block, an inner guide sliding column, a third spring and a lower jacking body, wherein the lower jacking body is in a U-shaped plate shape, the lower end of the L-shaped auxiliary plate extends into an inner cavity of the lower jacking body, the inner guide sliding column is fixed inside the lower jacking body, one end of the inner guide sliding column extends into a cylindrical groove formed in the L-shaped auxiliary plate, the third spring is sleeved on the inner guide sliding column, the third spring is padded between the L-shaped auxiliary plate and the lower jacking body, the lower jacking body is fixed with the limiting slide block, and the limiting slide block partially protrudes into a sliding groove formed in the outer wall of the L-shaped auxiliary plate.
Preferably, the vary voltage roof body includes brake slider, flexible post, fourth spring, sleeve and board subassembly, telescopic one end fixedly connected with board subassembly, telescopic post has been cup jointed in the inside activity of telescopic other end, has filled up the fourth spring between flexible post and the board subassembly, and the fourth spring setting is in the sleeve, and flexible post is equipped with the spout for fitting with a contraceptive ring of cylindric and cylinder's lateral wall, is provided with brake slider in the spout of flexible post, and brake slider fixes on telescopic inner wall, and the bottom mounting of board subassembly is on the seat to one side.
Preferably, the board subassembly includes rubber disc, tubule and L type closure plate, L type closure plate is L type platelike, and L type closure plate shutoff has seted up the disc groove on the lateral wall of the last orientation sleeve inner chamber of L type closure plate in telescopic one side, and is provided with the rubber disc in the disc groove, and the middle part of rubber disc runs through there is the tubule, and the tubule runs through the plate body of L type closure plate, and L type closure plate around the tubule is fitted with a contraceptive ring and is equipped with a plurality of evenly distributed's through-hole, and the one side of through-hole is gone up to the rubber disc shutoff on L type closure plate.
Preferably, the top control frame is in a door-shaped bent plate shape, a beam column is fixedly connected between the end parts of the two ends of the top control frame, and the beam column penetrates through a plate hole formed in the L-shaped supporting rod.
Compared with the prior art, the invention has the beneficial effects that:
1. the structure design of the invention realizes the effect of controlling the silicon wafer without vertically contacting with a glue surface, after the gluing work of the silicon wafer is finished, the stable extraction work of the silicon wafer can be realized only by providing lifting driving force for the vertical shaft, and the safe lifting work of the silicon wafer is realized by gathering two L-shaped supporting rods to drag the bottom of the silicon wafer in the process, and the polymorphic change in the silicon wafer control mechanism can be realized only by providing single lifting control for the silicon wafer control mechanism;
2. according to the invention, the half cover bodies on the two sides are matched to form the annular cylinder, so that glue solution generated in the spin coating process of the silicon wafer is collected, the production work of the whole photoresist spinner is ensured to be clean and sanitary, and a series of exquisite control parts are arranged in the auxiliary control frame, so that the stable driving of the half cover bodies is realized.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a diagram of a position profile of a wafer control mechanism;
FIG. 3 is a schematic structural view of a wafer control mechanism;
FIG. 4 is a schematic structural view of a half-cover;
FIG. 5 is a schematic view of a structure of a central control rack;
FIG. 6 is a schematic view of the structure at A in FIG. 5;
FIG. 7 is a schematic view of a top control frame structure;
FIG. 8 is a schematic view of a transformer dome;
FIG. 9 is a schematic view of the structure at B in FIG. 3;
fig. 10 is a schematic structural diagram at C in fig. 8.
In the figure: the device comprises a control console 1, a bedplate 2, a glue feeding mechanism 3, a control sheet mechanism 4, a main L-shaped plate 5, a middle control frame 6, an auxiliary control frame 7, a half-cover body 8, an adsorption seat 9, a collecting tank 10, a first guide rod 11, an L-shaped auxiliary plate 12, a stand column 13, a pad piece 14, a second guide rod 15, a variable pressure top body 16, an L-shaped bottom plate 17, an inclined seat 18, a first spring 19, a silicon wafer 20, a vertical shaft 21, a top control frame 22, a second spring 23, an inner rod 24, a brake block 25, an L-shaped support rod 26, a limit slide block 27, an inner guide slide column 28, a third spring 29, a lower top body 30, a brake slide block 31, a telescopic column 32, a fourth spring 33, a sleeve 34, a plate component 35, a rubber disc 36, a thin tube 37, an L-shaped blocking plate 38, a rubber ring piece 39 and a cross beam column 40.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments obtained by those skilled in the art without creative efforts based on the technical solutions of the present invention belong to the protection scope of the present invention.
Referring to fig. 1 to 10, the present invention provides a technical solution: the utility model provides a but photoetching of integrated circuit production line of vertical type transport is all glued machine, including control cabinet 1, platen 2, give gluey mechanism 3 and accuse piece mechanism 4, 1 top of control cabinet is connected with platen 2, the top of platen 2 is connected with gives gluey mechanism 3 and accuse piece mechanism 4, accuse piece mechanism 4 includes main L template 5, well accuse frame 6, assist accuse frame 7, half cover body 8 and absorption seat 9, main L template 5 is fixed on platen 2, one side of main L template 5 is connected with well accuse frame 6, be connected with two symmetric distribution's auxiliary control frame 7 around well accuse frame 6, bottom one side of auxiliary control frame 7 is connected with half cover body 8, be provided with between two symmetric distribution's the half cover body 8 on platen 2 and adsorb the seat 9, the plate body that adsorbs seat 9 runs through platen 2 has been seted up on the upper surface of platen 2, adsorb the seat 9 and set up in collecting vat 10, the whole cover that two half cover body 8 make up is detained on collecting vat 10.
The auxiliary control frame 7 comprises a first guide rod 11, an L-shaped auxiliary plate 12, an upright column 13, a pad piece 14, a second guide rod 15, a variable pressure top body 16, an L-shaped bottom plate 17, an inclined seat 18 and a first spring 19, one end of the L-shaped auxiliary plate 12 is connected with the middle control frame 6, the other end of the L-shaped auxiliary plate 12 is connected with the pad piece 14, one side of the pad piece 14 is provided with the upright column 13, the top of the upright column 13 penetrates through a square hole formed in the L-shaped auxiliary plate 12, the upper end of the upright column 13 is connected with the middle control frame 6, the bottom end of the upright column 13 is provided with the L-shaped bottom plate 17, the upright column 13 penetrates through a square hole formed in the L-shaped bottom plate 17, one side of the bottom of the upright column 13 is fixedly connected with the second guide rod 15, the second guide rod 15 penetrates through a round hole formed in the L-shaped bottom plate 17, the inclined seat 18 is arranged below the L-shaped bottom plate 17, the top of one end of the inclined seat 18 is fixedly connected with the variable pressure top body 16, the other end of the inclined seat 18 is in contact with the first spring 19, the first spring 19 is arranged between the L-shaped bottom plate 17, the first spring 19 and the first spring 19, and the first spring 17, and the first spring 11 are connected with the L-shaped guide plate 17, and the L-shaped guide plate 11, and the first spring 17, and the second spring 17.
The shape of the inclined seat 18 is that a transverse plate is integrally connected to one side of the sliding block, an inclined plane is arranged at the top of the sliding block, one end of the transverse plate of the inclined seat 18 is fixed to the half cover body 8, the half cover body 8 is in a semi-ring cylinder shape, the section of the ring body is an L-shaped surface, and the inclined seat is understood by referring to fig. 3 and 4, if the silicon wafer 20 falls to the top of the adsorption seat 9, the silicon wafer 20 is caught in the matching of the half cover bodies 8 on the two sides at the moment, the silicon wafer 20 drips and gets rid of the glue process, the glue solution smoothly flows along the inner inclined wall of the half cover body 8, and then falls to the collection groove 10.
The middle control frame 6 comprises a vertical shaft 21, a top control frame 22, a second spring 23, an inner rod 24, a brake block 25 and an L-shaped support rod 26, the vertical shaft 21 penetrates through a through hole formed in the main L-shaped plate 5, the bottom end of the vertical shaft 21 is fixedly connected with the top control frame 22, through holes are formed in two ends of the top control frame 22, the inner rod 24 is movably sleeved in the through hole, one end of the inner rod 24 extends to the outside of the top control frame 22, the brake block 25 is fixedly connected to the end portion of the inner rod 24, a square hole is formed in the brake block 25, the stand column 13 is movably sleeved in the square hole of the brake block 25, the L-shaped support rod 26 is fixedly connected to the other end of the inner rod 24, the second spring 23 is padded between the L-shaped support rod 26 and the top control frame 22, the second spring 23 is sleeved on the inner rod 24, and one end of the L-shaped auxiliary plate 12 is fixed to the top control frame 22.
The pad 14 comprises a limiting slide block 27, an inner guide sliding column 28, a third spring 29 and a lower top body 30, wherein the lower top body 30 is in a U-shaped plate shape, the lower end of the L-shaped auxiliary plate 12 extends into an inner cavity of the lower top body 30, the inner guide sliding column 28 is fixed inside the lower top body 30, one end of the inner guide sliding column 28 extends into a cylindrical groove formed in the L-shaped auxiliary plate 12, the third spring 29 is sleeved on the inner guide sliding column 28, the third spring 29 is padded between the L-shaped auxiliary plate 12 and the lower top body 30, the limiting slide block 27 is fixed on the lower top body 30, and part of the limiting slide block 27 protrudes into a sliding groove formed in the outer wall of the L-shaped auxiliary plate 12.
The variable pressure top body 16 includes brake sliding block 31, flexible post 32, fourth spring 33, sleeve 34 and board subassembly 35, sleeve 34's one end fixedly connected with board subassembly 35, flexible post 32 has been cup jointed in the inside activity of the other end of sleeve 34, it has fourth spring 33 to fill up between flexible post 32 and the board subassembly 35, fourth spring 33 sets up in sleeve 34, flexible post 32 is equipped with the spout for the lateral wall of cylindric and cylinder is fitted with a contraceptive ring, be provided with brake sliding block 31 in the spout of flexible post 32, brake sliding block 31 fixes on sleeve 34's inner wall, the bottom mounting of board subassembly 35 is on sloping seat 18.
The plate component 35 comprises a rubber disc 36, a thin tube 37 and an L-shaped blocking plate 38, the L-shaped blocking plate 38 is in an L-shaped plate shape, the L-shaped blocking plate 38 is blocked on one side of the sleeve 34, a circular plate groove is formed in the side wall, facing the inner cavity of the sleeve 34, of the L-shaped blocking plate 38, the rubber disc 36 is arranged in the circular plate groove, the thin tube 37 penetrates through the middle of the rubber disc 36, the thin tube 37 penetrates through the plate body of the L-shaped blocking plate 38, a plurality of uniformly distributed through holes are annularly arranged on the L-shaped blocking plate 38 around the thin tube 37, and the rubber disc 36 is blocked on one side of the through holes in the L-shaped blocking plate 38.
The top control frame 22 is in a door-shaped bent plate shape, a beam column 40 is fixedly connected between the end parts of the two ends of the top control frame 22, and the beam column 40 penetrates through a plate hole formed in the L-shaped supporting rod 26.
Referring to fig. 7, it can be understood that the upper end of the vertical shaft 21 is connected to a lifting driving mechanism in the prior art to control the lifting of the vertical shaft 21, the whole photoresist homogenizer is arranged on an integrated circuit production line, a silicon wafer 20 to be processed is placed on the central control frame 6 by a conveying mechanism on the production line, two L-shaped support rods 26 cooperate to lift the silicon wafer 20, the vertical shaft 21 is controlled to fall to drive the top control frame 22, and then the L-shaped support rods 26 fall to control the L-shaped support rods 26 to fall, so that the silicon wafer 20 falls toward the adsorption base 9, the silicon wafer 20 falls and the half-cover bodies 8 on both sides move apart before the half-cover bodies 8 contact, so that the silicon wafer 20 smoothly falls through the half-cover bodies 8, and then the L-shaped support rods 26 on both sides are far apart from each other, so that the silicon wafer 20 without support falls onto the adsorption base 9 with the same force, because the auxiliary control frame 7 laterally controls the central control frame 6 and the half-cover bodies 8, specifically the falling process of the top control frame 22 to drive the L-shaped auxiliary plate 12, and control the falling of the pad 14, the pad 14 penetrates through the L-shaped bottom plate 17 and then abuts against the inclined seat 18 to force the two inclined seats 18 to be away from each other, the inclined seat 18 drives the half-cover bodies 8 to control the two half-cover bodies 8 to be separated, then the silicon wafer 20 suddenly falls before contacting with the adsorption seat 9, because the inclined seats 18 on the two sides drive the L-shaped bottom plate 17 and the L-shaped bottom plate 17 to move to abut against the upright posts 13 in the separation process of the inclined seats 18 on the two sides, the upright posts 13 on the two sides of the central control frame 6 are away from each other, the upright posts 13 pull the brake blocks 25 and further drive the L-shaped support rods 26 through the inner rod 24, so that the L-shaped support rods 26 on the two sides are away from each other, the silicon wafer 20 smoothly falls off from between the two L-shaped support rods 26 in the process that the silicon wafer 20 falls on the adsorption seat 9, then the upright posts 21 are controlled to rise, each mechanical reverse deformation is controlled, the two L-shaped support rods 26 rise through transmission control, and the half-cover bodies 8 on the two sides are buckled together under the elastic support of the first spring 19, in the prior art, the lower end of the adsorption seat 9 is connected with an air extraction mechanism in the prior art, so that the silicon wafer 20 is adsorbed on the adsorption seat 9, meanwhile, the adsorption seat 9 is controlled to rotate by a driving mechanism in the prior art, the glue feeding mechanism 3 moves to the position above the silicon wafer 20 to perform glue dripping work, then the adsorption seat 9 rotates to spin glue, after the gluing work of the silicon wafer 20 is finished, the silicon wafer 20 needs to be taken out, at the moment, the vertical shaft 21 is controlled to fall, the falling depth of the vertical shaft 21 is deeper compared with the falling depth of the vertical shaft 21 at the last time, the cross rod part of the L-shaped support rod 26 is ensured to be positioned below the silicon wafer 20, at the moment, the L-shaped support rods 26 at two sides are positioned at two sides below the silicon wafer 20, at the moment, the vertical shaft 21 is continuously controlled to be stationary, so that the L-shaped support rods 26 at two sides gradually approach to move to the position below the silicon wafer 20, and therefore, the variable pressure ejector 16 is formed by the original support length reduction part, originally, the fourth spring 33 elastically supports the telescopic column 32, the telescopic column 32 extends to the maximum length outside the sleeve 34, at this time, the telescopic column 32 supports the upright column 13, the upright column 13 pulls the inner rod 24 to move to the maximum length, namely, the L-shaped support rods 26 on the two sides are separated by the maximum distance, as time passes, the reverse pressure of the upright column 13 on the telescopic column 32 forces the telescopic column 32 to retract into the sleeve 34, the fourth spring 33 plays a role in resetting the telescopic column 32 in the later period, the telescopic column 32 really has the supporting force which is the air pressure in the sleeve 34, the outer exhaust of the held air in the sleeve 34 is realized through the thin pipe 37, the process needs time, as long as the moving speed of the inclined seat 18 is enough, the support effect of the maximum length can be realized by the variable pressure top body 16, the automatic recovery process in the later period of the variable pressure top body 16 is realized, and the outside air is quickly sucked into the inner cavity of the sleeve 34 through the rubber disc 36, namely, the transformation top body 16 can be quickly restored to a full shape, so that the silicon wafer 20 can be quickly released from the L-shaped support rod 26, the telescopic column 32 cannot be retracted, the vertical shaft 21 is quickly driven, the L-shaped support rod 26 is finally controlled to be positioned below the silicon wafer 20, at the moment, the whole pad 14 is in a retracted state, namely, the inner guide sliding column 28 relatively moves and retracts into the L-shaped auxiliary plate 12 for a certain distance, the silicon wafer 20 is extracted and the silicon wafer 20 is put down, the vertical shaft 21 descends at different heights, the maximum distance between the two half cover bodies 8 is the same, the pad 14 has a compensation effect of descending height, namely, the L-shaped auxiliary plate 12 descends at different heights, the inclined seats 18 at two sides can be far away to the maximum degree, the L-shaped support rods 26 at the two sides are finally close to the lower part of the silicon wafer 20, then the vertical shaft 21 is controlled to ascend, the edges at two sides of the silicon wafer 20 are smoothly held, and the silicon wafer 20 is lifted up no matter the silicon wafer 20 is controlled to fall process or the silicon wafer 20 is required to be lifted up.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (2)
1. The utility model provides a but photoetching of integrated circuit production line of vertical type transport is all glued machine, includes control cabinet (1), platen (2), gives gluey mechanism (3) and accuse piece mechanism (4), control cabinet (1) top is connected with platen (2), and the top of platen (2) is connected with gives gluey mechanism (3) and accuse piece mechanism (4), its characterized in that: the silicon wafer adsorption device is characterized in that the wafer control mechanism (4) comprises a main L-shaped plate (5), a middle control frame (6), an auxiliary control frame (7), half cover bodies (8) and an adsorption seat (9), the main L-shaped plate (5) is fixed on the bedplate (2), one side of the main L-shaped plate (5) is connected with the middle control frame (6), the auxiliary control frame (7) is connected with the middle control frame (6) in a symmetrical mode, one side of the bottom of the auxiliary control frame (7) is connected with the half cover bodies (8), the adsorption seat (9) is arranged between the two half cover bodies (8) in a symmetrical mode on the bedplate (2), the adsorption seat (9) penetrates through the plate bodies of the bedplate (2), a collecting groove (10) is formed in the upper surface of the bedplate (2), the adsorption seat (9) is arranged in the collecting groove (10), the whole body formed by buckling of the two half cover bodies (8) is covered on the collecting groove (10), a silicon wafer (20) is placed on the middle control frame (6), the silicon wafer (20) falls onto the adsorption seat (9), and the adsorption seat (20) is lifted from the auxiliary control frame (7), a second guide rod (12), an auxiliary guide rod (13), a pressure-changing guide rod (17), an auxiliary control rod (13), a second guide plate (13), a pressure-type guide plate (17), a pressure-type guide plate (12) and an auxiliary control plate (12) are arranged on the adsorption seat (12), an inclined seat (18) and a first spring (19), one end of the L-shaped auxiliary plate (12) is connected with the central control frame (6), the end part of the other end of the L-shaped auxiliary plate (12) is connected with a pad piece (14), one side of the pad piece (14) is provided with an upright post (13), the top of the upright post (13) penetrates through a square hole formed in the L-shaped auxiliary plate (12), the upper end of the upright post (13) is connected with the central control frame (6), the bottom end of the upright post (13) is provided with an L-shaped bottom plate (17), the upright post (13) penetrates through the square hole formed in the L-shaped bottom plate (17), one side of the bottom of the upright post (13) is fixedly connected with a second guide rod (15), the second guide rod (15) penetrates through a round hole formed in the L-shaped bottom plate (17), the inclined seat (18) is arranged below the L-shaped bottom plate (17), the top of one end of the inclined seat (18) is fixedly connected with a transformation top body (16), the other end of the inclined seat (18) is in contact with the first spring (19), the first spring (19) is arranged between the L-shaped bottom plate (17), the L-shaped auxiliary plate (17), the first spring (18) and the first spring (11) penetrates through hole (11), the L-shaped guide rod (17), the first spring (11) and the first guide rod (11) and the L-shaped guide plate (11), the inclined seat (18) is in a shape that a transverse plate is integrally connected to one side of a sliding block, an inclined plane is arranged at the top of the sliding block, one end of the transverse plate of the inclined seat (18) is fixed to a half cover body (8), the half cover body (8) is in a semi-ring cylindrical shape, the section of a ring body is an L-shaped surface, the middle control frame (6) comprises a vertical shaft (21), a top control frame (22), a second spring (23), an inner rod (24), a brake block (25) and an L-shaped support rod (26), the vertical shaft (21) penetrates through a through hole formed in a main L-shaped plate (5), the bottom end of the vertical shaft (21) is fixedly connected with the top control frame (22), through holes are formed in two ends of the top control frame (22), the inner rod (24) is movably sleeved in the through hole, one end of the inner rod (24) extends to the outside of the top control frame (22), the brake block (25) is fixedly connected to the end of the inner rod (24), a square hole is formed in the brake block (25), the upright column (13) is movably sleeved in the square hole of the inner rod (25), the L-shaped support rod (26) is fixedly connected between one end of the L-shaped support rod (23), the second spring (14), and the top control frame (14) is fixed between the top control frame (14), the upper end of the second spring (14), the upper end of the upper limit pad (14), the pressure-variable top body (16) comprises an inner guide sliding column (28), a third spring (29) and a lower top body (30), the lower top body (30) is in a U-shaped plate shape, the lower end of an L-shaped auxiliary plate (12) extends into an inner cavity of the lower top body (30), the inner guide sliding column (28) is fixed inside the lower top body (30), one end of the inner guide sliding column (28) extends into a cylindrical groove formed in the L-shaped auxiliary plate (12), the third spring (29) is sleeved on the inner guide sliding column (28), the third spring (29) is padded between the L-shaped auxiliary plate (12) and the lower top body (30), a limit sliding block (27) is fixed on the lower top body (30), part of the limit sliding block (27) protrudes into a sliding groove formed in the outer wall of the L-shaped auxiliary plate (12), the pressure-variable top body (16) comprises a brake sliding block (31), a telescopic column (32), a fourth spring (33), a sleeve (34) and a plate assembly (35), one end of the sleeve assembly (34) is fixedly connected with the sleeve assembly (35), the movable sleeve (34), the inner sleeve (32) is sleeved with the telescopic column (32), the middle sliding groove (32) and the outer side wall of the telescopic column (32) is provided with the telescopic column (32), braking slider (31) are fixed on the inner wall of sleeve (34), and the bottom mounting of board subassembly (35) is on sloping seat (18), board subassembly (35) include rubber disc (36), tubule (37) and L type closure plate (38), L type closure plate (38) are L type platelike, and L type closure plate (38) shutoff is in one side of sleeve (34), has seted up the disc groove on the lateral wall of sleeve (34) inner chamber on L type closure plate (38), and is provided with rubber disc (36) in the disc groove, and tubule (37) have been run through in the middle part of rubber disc (36), and tubule (37) run through the plate body of L type closure plate (38), and L type closure plate (38) around tubule (37) are fitted with on the ring and are equipped with a plurality of evenly distributed's through-hole, and one side of through-hole on L type closure plate (38) is sealed to rubber disc (36).
2. The photoresist homogenizer for integrated circuit production lines capable of vertical conveying according to claim 1, wherein: the top control frame (22) is in a door-shaped bent plate shape, a beam column (40) is fixedly connected between the end parts of the two ends of the top control frame (22), and the beam column (40) penetrates through a plate hole formed in the L-shaped supporting rod (26).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210082848.8A CN114472089B (en) | 2022-01-24 | 2022-01-24 | Photoetching uniform-glue machine of integrated circuit production line capable of vertically conveying |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210082848.8A CN114472089B (en) | 2022-01-24 | 2022-01-24 | Photoetching uniform-glue machine of integrated circuit production line capable of vertically conveying |
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| Publication Number | Publication Date |
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| CN114472089A CN114472089A (en) | 2022-05-13 |
| CN114472089B true CN114472089B (en) | 2022-11-29 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108393236A (en) * | 2018-04-04 | 2018-08-14 | 长兴水木机电有限公司 | A kind of fixture automatic plastics soaking equipment |
| CN212313627U (en) * | 2020-06-01 | 2021-01-08 | 宿州市胜辉塑业有限公司 | Transport vehicle for double-wall corrugated pipe |
| CN112197105A (en) * | 2020-10-09 | 2021-01-08 | 广州一讯科技有限公司 | Semiconductor silicon wafer spin coater |
| CN213889646U (en) * | 2020-07-17 | 2021-08-06 | 青岛武晓制管有限公司 | A appurtenance for ring flange installation |
| WO2022007493A1 (en) * | 2020-07-10 | 2022-01-13 | 金溪斯普瑞药业有限公司 | Mixing device for antihypertensive captopril capsule |
-
2022
- 2022-01-24 CN CN202210082848.8A patent/CN114472089B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108393236A (en) * | 2018-04-04 | 2018-08-14 | 长兴水木机电有限公司 | A kind of fixture automatic plastics soaking equipment |
| CN212313627U (en) * | 2020-06-01 | 2021-01-08 | 宿州市胜辉塑业有限公司 | Transport vehicle for double-wall corrugated pipe |
| WO2022007493A1 (en) * | 2020-07-10 | 2022-01-13 | 金溪斯普瑞药业有限公司 | Mixing device for antihypertensive captopril capsule |
| CN213889646U (en) * | 2020-07-17 | 2021-08-06 | 青岛武晓制管有限公司 | A appurtenance for ring flange installation |
| CN112197105A (en) * | 2020-10-09 | 2021-01-08 | 广州一讯科技有限公司 | Semiconductor silicon wafer spin coater |
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| CN114472089A (en) | 2022-05-13 |
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