CN114415747B - Pressure regulating method of vacuum regulating valve - Google Patents
Pressure regulating method of vacuum regulating valve Download PDFInfo
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- CN114415747B CN114415747B CN202111575625.7A CN202111575625A CN114415747B CN 114415747 B CN114415747 B CN 114415747B CN 202111575625 A CN202111575625 A CN 202111575625A CN 114415747 B CN114415747 B CN 114415747B
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- 230000001105 regulatory effect Effects 0.000 title claims abstract description 33
- 238000000034 method Methods 0.000 title claims abstract description 24
- 238000004364 calculation method Methods 0.000 claims description 13
- 230000003247 decreasing effect Effects 0.000 claims description 3
- 230000006641 stabilisation Effects 0.000 claims description 3
- 238000011105 stabilization Methods 0.000 claims description 3
- 230000033228 biological regulation Effects 0.000 abstract description 9
- 239000004065 semiconductor Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D16/00—Control of fluid pressure
- G05D16/20—Control of fluid pressure characterised by the use of electric means
- G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
- G05D16/2013—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
- F16K31/04—Actuating devices; Operating means; Releasing devices electric; magnetic using a motor
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Fluid Mechanics (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Mechanical Engineering (AREA)
- Control Of Fluid Pressure (AREA)
Abstract
The invention discloses a pressure regulating method of a vacuum regulating valve, which relates to the technical field of pressure regulation of the vacuum regulating valve and comprises the following steps: establishing a relation table of the pressure and the valve opening of the vacuum regulating valve; the user inputs a pressure setting command to the control panel; after receiving the pressure setting command, the control board calculates the difference value with the current pressure, and calculates the valve opening by inquiring a preset pressure and valve opening relation table; the control board sends out an instruction to drive the valve motor, and the valve motor drives the valve to a set opening; by establishing a relation table of the pressure and the valve opening after learning, the requirements that different cavities are required to be configured by users are overcome, and the method is not limited by the volume of a cavity pool; the user inputs a pressure setting command to the control board, the control board directly calculates the position of the valve opening by inquiring the relation between the pressure and the valve opening, the control board drives the valve motor to act, and the valve is operated to the calculated position of the valve opening, so that the PID repeated regulation and control process is omitted.
Description
Technical Field
The invention relates to the technical field of pressure regulation of vacuum regulating valves, in particular to a pressure regulating method of a vacuum regulating valve.
Background
The vacuum regulating valve is mainly applied to vacuum industries, such as vacuum coating: magnetron sputtering coating, evaporation coating and winding coating; semiconductor production: film plating etching, counter ion etching, ion beam etching, and the like. In general, different embodiments of vacuum valves for regulating the volumetric or mass flow and substantially hermetically closing the flow path through an opening formed in a valve housing are disclosed by the prior art and are particularly applied in vacuum chamber systems in the field of integrated circuit processing, semiconductor processing or substrate processing, which must take place in a protective atmosphere without the presence of contaminating particles. Such a vacuum chamber system comprises, inter alia, at least one evacuable vacuum chamber provided for receiving a semiconductor component or substrate to be processed or manufactured, which has at least one vacuum chamber opening through which the semiconductor component or other substrate can be introduced into and removed from the vacuum chamber, and at least one vacuum pump for evacuating the vacuum chamber. For example, in a processing apparatus for semiconductor wafers or liquid crystal substrates, highly sensitive semiconductor elements or liquid crystal elements are passed through a plurality of process vacuum chambers in sequence, in which the elements located in the process vacuum chambers are processed by means of processing devices, respectively. The highly sensitive semiconductor elements or substrates must always be in a protective atmosphere, in particular in an air-evacuated environment, not only during the processing in the process vacuum chamber, but also during the transport between the chambers.
In the prior art, to adapt to the pressure regulation of vacuum chambers with different volumes, the control parameters need to be changed, if manual modification is complicated, the experience requirements of the personnel to be regulated are also high, the current pressure regulation mode adopts PID algorithm regulation, the key parameters are P, I, D, T, P is proportional control value parameter, I integral parameter, D differential parameter and T are control period, the user is required to configure PID parameters before using, different chambers need to configure different PID parameters, the adaptability is poor, if the chamber pool used by the user is larger, the PID parameters are difficult to configure, and the regulation time is long.
Disclosure of Invention
The invention aims at: in order to solve the technical problems, the invention provides a pressure regulating method of a vacuum regulating valve.
The invention adopts the following technical scheme for realizing the purposes:
a pressure regulating method of a vacuum regulating valve, comprising the steps of:
s1: establishing a relation table of the pressure and the valve opening of the vacuum regulating valve;
s2: the user inputs a pressure setting command to the control panel;
s3: after receiving the pressure setting command, the control board calculates the difference value with the current pressure, and calculates the valve opening by inquiring a preset pressure and valve opening relation table;
s4: the control board sends out instructions to drive the valve motor, and the valve motor drives the valve to a set opening degree, so that the control pressure is consistent with the set pressure.
Further, the establishment of the pressure and valve opening relation table comprises the following steps:
s101: after entering a learning state, setting the valve to a full-open state;
s102: introducing gas, and recording a pressure value TestMinPressare when the valve is fully opened after the gas flow and the cavity pressure are balanced;
s103: setting the valve positions according to preset decreasing amounts in sequence;
s104: after each waiting position and pressure stabilization, calculating the ratio Pressareter of the current pressure CurrentPressare and the pressure value TestMinPressare when the valve is fully opened, wherein the calculation formula is as follows:
s105: repeating the step S103 and the step S104, and recording each position and the corresponding ratio PressurePoint;
s106: and when the position is smaller than or equal to a preset position value, after learning is finished, building a pressure and valve opening relation table according to the position and the corresponding ratio Pressureter.
Further, the increment is 10 per mill of the fully open position of the valve.
Further, the preset position value is 100.
Further, after receiving the pressure setting command, the control board calculates the difference value with the current pressure, and calculates the valve opening by inquiring a preset pressure and valve opening relation table, wherein the method comprises the following steps:
s301: calculating whether the difference between the current pressure value and the set pressure value is smaller than or equal to an allowable tolerance, if so, stopping operation and returning;
s302: if not, the corresponding pressure ratio CurrentPressurePoint of the current position is calculated by inquiring a relation table of pressure and valve opening, and the calculation formula is as follows:
wherein ListPressaureER 0, listPressaureER 1 is the ratio of the adjacent 2 pressures in the table; littPosition 0, littPosition 1 is the corresponding 2 adjacent position values, and the current position is in between, i.e. LittPosition 1. Ltoreq.CurrentPosition < LittPosition 0;
s303: and calculating a valve full-open pressure value TestMinPressage according to the corresponding pressure ratio CurrentPressureber of the current position, wherein the calculation formula is as follows:
s304: the ratio setpressure of the set pressure and TestMinPressure is calculated as follows:
s305: and (3) calculating the position SetPosition of the corresponding valve opening by inquiring the relation table of the pressure and the valve opening through setPressureber, wherein the calculation formula is as follows:
LittPosition 0, littPosition 1, is 2 adjacent position values; listPressaurePeer 0, listPressaurePeer 1 is the corresponding adjacent 2 pressure ratios within the table, with the set pressure ratio being between the two, i.e., listPressaurePeer 0. Ltoreq.SetPressaurePeer < ListPressaurePeer 1.
The beneficial effects of the invention are as follows:
according to the pressure regulating method of the vacuum regulating valve, through establishing the relation table of the outlet pressure and the valve opening after learning, the requirements that different cavities are required to be configured by users are overcome, and the pressure regulating method is not limited by the volume of a cavity pool; the user inputs a pressure setting command to the control board, the control board directly calculates the position of the valve opening by inquiring the relation between the pressure and the valve opening, the control board drives the valve motor to act, and the valve is operated to the calculated position of the valve opening, so that the PID repeated regulation and control process is omitted.
Drawings
FIG. 1 is a schematic overall flow diagram of the present invention;
FIG. 2 is a schematic diagram of the flow chart for establishing a pressure and valve opening relationship table according to the present invention;
FIG. 3 is a schematic diagram of a calculation process of valve opening according to the present invention.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments of the present invention. The components of the embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the invention, as presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Example 1
As shown in fig. 1, the present embodiment provides a pressure adjusting method of a vacuum adjusting valve, including the steps of:
s1: establishing a relation table of the pressure and the valve opening of the vacuum regulating valve;
s2: the user inputs a pressure setting command to the control panel;
s3: after receiving the pressure setting command, the control board calculates the difference value with the current pressure, and calculates the valve opening by inquiring a preset pressure and valve opening relation table;
s4: the control board sends out instructions to drive the valve motor, and the valve motor drives the valve to a set opening degree, so that the control pressure is consistent with the set pressure.
In the embodiment, the relation table of the outlet pressure and the valve opening degree is established after learning, so that the requirements that different cavities are required to be configured by users and different parameters are overcome, and the limitation of the volume of a cavity pool is avoided; the user inputs a pressure setting command to the control board, the control board directly calculates the position of the valve opening by inquiring the relation between the pressure and the valve opening, the control board drives the valve motor to act, and the valve is operated to the calculated position of the valve opening, so that the PID repeated regulation and control process is omitted.
Example 2
The embodiment provides a pressure regulating method of a vacuum regulating valve, which comprises the following steps:
s1: establishing a relation table of the pressure and the valve opening of the vacuum regulating valve;
as shown in fig. 2, the establishment of the pressure and valve opening relation table includes the following steps:
s101: after entering a learning state, setting the valve to a full-open state;
s102: introducing gas, and recording a pressure value TestMinPressare when the valve is fully opened after the gas flow and the cavity pressure are balanced;
s103: setting the valve positions according to preset decreasing amounts in sequence;
the increment is 10 per mill of the full open position of the valve; for example, the valve is opened at 1000 degrees and gradually decreases, and the positions of the valves are 990, 980, … …, 120 and 110 … ….
S104: after each waiting position and pressure stabilization, calculating the ratio Pressareter of the current pressure CurrentPressare and the pressure value TestMinPressare when the valve is fully opened, wherein the calculation formula is as follows:
s105: repeating the step S103 and the step S104, and recording each position and the corresponding ratio PressurePoint;
s106: when the position is smaller than or equal to a preset position value, after learning is finished, a pressure and valve opening relation table is established according to the position and the corresponding ratio Pressureter;
the preset position value is 100; if the valve position is 100, the learning is stopped.
S2: the user inputs a pressure setting command to the control panel;
s3: after receiving the pressure setting command, the control board calculates the difference value with the current pressure, and calculates the valve opening by inquiring a preset pressure and valve opening relation table;
as shown in fig. 3, after receiving the pressure setting command, the control board calculates the difference value with the current pressure, and calculates the valve opening by inquiring a preset pressure and valve opening relation table, which includes the following steps:
s301: calculating whether the difference between the current pressure value and the set pressure value is smaller than or equal to an allowable tolerance, if so, stopping operation and returning; in practice, the allowable tolerance is 1.3/1000.
S302: if not, the corresponding pressure ratio CurrentPressurePoint of the current position is calculated by inquiring a relation table of pressure and valve opening, and the calculation formula is as follows:
wherein ListPressaureER 0, listPressaureER 1 is the ratio of the adjacent 2 pressures in the table; littPosition 0, littPosition 1 is the corresponding 2 adjacent position values, and the current position is in between, i.e. LittPosition 1. Ltoreq.CurrentPosition < LittPosition 0;
s303: and calculating a valve full-open pressure value TestMinPressage according to the corresponding pressure ratio CurrentPressureber of the current position, wherein the calculation formula is as follows:
s304: the ratio setpressure of the set pressure and TestMinPressure is calculated as follows:
s305: and (3) calculating the position SetPosition of the corresponding valve opening by inquiring the relation table of the pressure and the valve opening through setPressureber, wherein the calculation formula is as follows:
LittPosition 0, littPosition 1, is 2 adjacent position values; listPressaureER 0, listPressaureER 1 is the corresponding adjacent 2 pressure ratios in the table, with the set pressure ratio between the two, i.e. ListPressaureER 0.ltoreq.SetPressaureER < ListPressaureER 1;
s4: the control board sends out instructions to drive the valve motor, and the valve motor drives the valve to a set opening degree, so that the control pressure is consistent with the set pressure.
When the method is implemented, the control board receives a user setting command through the serial port; after receiving the pressure setting command, calculating the difference value with the current pressure, and obtaining the valve opening through inquiring and calculating; the valve motor is driven to drive the valve to a set opening degree, so that the control pressure is consistent with the set pressure, and the purpose of controlling the pressure is achieved.
Claims (4)
1. A pressure regulating method of a vacuum regulating valve, comprising the steps of:
s1: establishing a relation table of the pressure and the valve opening of the vacuum regulating valve;
s2: the user inputs a pressure setting command to the control panel;
s3: after receiving the pressure setting command, the control board calculates the difference value with the current pressure, and calculates the valve opening by inquiring a preset pressure and valve opening relation table;
s4: the control board sends out an instruction to drive the valve motor, and the valve motor drives the valve to a set opening degree, so that the control pressure is consistent with the set pressure;
in step S3, after receiving the pressure setting command, the control board calculates a difference value from the current pressure, and calculates a valve opening by querying a preset pressure and valve opening relation table, where the calculating includes the following steps:
s301: calculating whether the difference between the current pressure value and the set pressure value is smaller than or equal to an allowable tolerance, if so, stopping operation and returning;
s302: if not, the corresponding pressure ratio CurrentPressurePoint of the current position is calculated by inquiring a relation table of pressure and valve opening, and the calculation formula is as follows:
wherein ListPressaureER 0, listPressaureER 1 is the ratio of the adjacent 2 pressures in the table; littPosition 0, littPosition 1 is the corresponding 2 adjacent position values, and the current position is in between, i.e. LittPosition 1. Ltoreq.CurrentPosition < LittPosition 0;
s303: and calculating a valve full-open pressure value TestMinPressage according to the corresponding pressure ratio CurrentPressureber of the current position, wherein the calculation formula is as follows:
s304: the ratio setpressure of the set pressure and TestMinPressure is calculated as follows:
s305: and (3) calculating the position SetPosition of the corresponding valve opening by inquiring the relation table of the pressure and the valve opening through setPressureber, wherein the calculation formula is as follows:
LittPosition 0, littPosition 1, is 2 adjacent position values; listPressaurePeer 0, listPressaurePeer 1 is the corresponding adjacent 2 pressure ratios within the table, with the set pressure ratio being between the two, i.e., listPressaurePeer 0. Ltoreq.SetPressaurePeer < ListPressaurePeer 1.
2. The method for regulating the pressure of a vacuum regulating valve according to claim 1, wherein the establishment of the pressure and valve opening degree relation table comprises the steps of:
s101: after entering a learning state, setting the valve to a full-open state;
s102: introducing gas, and recording a pressure value TestMinPressare when the valve is fully opened after the gas flow and the cavity pressure are balanced;
s103: setting the valve positions according to preset decreasing amounts in sequence;
s104: after each waiting position and pressure stabilization, calculating the ratio Pressareter of the current pressure CurrentPressare and the pressure value TestMinPressare when the valve is fully opened, wherein the calculation formula is as follows:；
s105: repeating the step S103 and the step S104, and recording each position and the corresponding ratio PressurePoint;
s106: and when the position is smaller than or equal to a preset position value, after learning is finished, building a pressure and valve opening relation table according to the position and the corresponding ratio Pressureter.
3. A method of regulating the pressure of a vacuum regulator valve according to claim 2, wherein the increment is 10% of the fully open position of the valve.
4. A method of regulating the pressure of a vacuum regulator valve according to claim 2, wherein the predetermined position value is 100.
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| CN202111575625.7A CN114415747B (en) | 2021-12-21 | 2021-12-21 | Pressure regulating method of vacuum regulating valve |
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| CN202111575625.7A CN114415747B (en) | 2021-12-21 | 2021-12-21 | Pressure regulating method of vacuum regulating valve |
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