CN114415747A - Pressure adjusting method of vacuum adjusting valve - Google Patents
Pressure adjusting method of vacuum adjusting valve Download PDFInfo
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- CN114415747A CN114415747A CN202111575625.7A CN202111575625A CN114415747A CN 114415747 A CN114415747 A CN 114415747A CN 202111575625 A CN202111575625 A CN 202111575625A CN 114415747 A CN114415747 A CN 114415747A
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- 238000000034 method Methods 0.000 title claims abstract description 20
- 230000001105 regulatory effect Effects 0.000 claims abstract description 23
- 238000004364 calculation method Methods 0.000 claims description 13
- 230000003247 decreasing effect Effects 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D16/00—Control of fluid pressure
- G05D16/20—Control of fluid pressure characterised by the use of electric means
- G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
- G05D16/2013—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
- F16K31/04—Actuating devices; Operating means; Releasing devices electric; magnetic using a motor
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Fluid Mechanics (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Mechanical Engineering (AREA)
- Control Of Fluid Pressure (AREA)
Abstract
The invention discloses a pressure regulating method of a vacuum regulating valve, which relates to the technical field of pressure regulation of vacuum regulating valves and comprises the following steps: establishing a relation table of the pressure of the vacuum regulating valve and the opening degree of the valve; the user inputs a pressure setting command to the control panel; after receiving a pressure setting command, the control panel calculates a difference value between the current pressure and the current pressure, and calculates the valve opening by inquiring a preset pressure and valve opening relation table; the control board sends out an instruction to drive the valve motor, and the valve motor drives the valve to a set opening; by establishing a relation table of pressure and valve opening after learning, the requirements of different cavities requiring different parameters configured by users are overcome, and the relation table is not limited by the volume of the cavities; a user inputs a pressure setting command to the control panel, the control panel directly calculates the position of the valve opening by inquiring a pressure and valve opening relation table mode, the control panel drives the valve motor to act, the valve is operated to the calculated position of the valve opening, and the PID repeated regulation and control process is omitted.
Description
Technical Field
The invention relates to the technical field of pressure regulation of vacuum regulating valves, in particular to a pressure regulation method of a vacuum regulating valve.
Background
The vacuum regulating valve is mainly applied to vacuum industries, such as vacuum coating: magnetron sputtering coating, evaporation coating and winding coating; production of semiconductors: film coating etching, counter ion etching, ion beam etching, etc. In general, different embodiments of vacuum valves for regulating a volume flow or a mass flow and substantially hermetically closing a flow path through an opening formed in a valve housing are known from the prior art and are used in particular in vacuum chamber systems in the field of integrated circuit processing, semiconductor processing or substrate processing, which processing must take place in a protective atmosphere without the presence of contaminating particles. Such a vacuum chamber system comprises, in particular, at least one evacuable vacuum chamber provided for accommodating a semiconductor component or substrate to be processed or manufactured, which has at least one vacuum chamber opening through which the semiconductor component or other substrate can be introduced into and removed from the vacuum chamber, and at least one vacuum pump for evacuating the vacuum chamber. For example, in a processing device for semiconductor wafers or liquid crystal substrates, highly sensitive semiconductor components or liquid crystal components are passed successively through a plurality of process vacuum chambers, in each of which the components located therein are processed by means of a processing device. Highly sensitive semiconductor components or substrates must always be in a protective atmosphere, in particular an evacuated atmosphere, not only during the processing in the process vacuum chamber, but also during the transport between the chambers.
In the prior art, to adapt to pressure regulation of vacuum chambers with different volumes, control parameters need to be changed, if manual modification is complicated, the experience requirements on a debugging worker are high, an existing pressure regulation mode adopts PID algorithm regulation, the key parameter is P, I, D, T, P is a proportional control value parameter, an I integral parameter, a D differential parameter and T is a control period, a user needs to configure PID parameters before use, different chambers need to configure different PID parameters, the adaptability is poor, if the chamber used by the user is larger, the PID parameters are difficult to configure, and the regulation time is long.
Disclosure of Invention
The invention aims to: in order to solve the technical problem, the invention provides a pressure regulating method of a vacuum regulating valve.
The invention specifically adopts the following technical scheme for realizing the purpose:
a pressure regulating method of a vacuum regulator valve, comprising the steps of:
s1: establishing a relation table of the pressure of the vacuum regulating valve and the opening degree of the valve;
s2: the user inputs a pressure setting command to the control panel;
s3: after receiving a pressure setting command, the control panel calculates a difference value between the current pressure and the current pressure, and calculates the valve opening by inquiring a preset pressure and valve opening relation table;
s4: the control panel sends out the instruction and drives valve motor, and valve motor drives the valve to the settlement aperture for control pressure is unanimous with the settlement pressure.
Further, the establishment of the pressure and valve opening relation table comprises the following steps:
s101: after entering the learning state, setting the valve to a full-open state;
s102: introducing gas, and recording a pressure value TestMinPresure when the valve is fully opened after the gas flow and the cavity pressure are balanced;
s103: sequentially setting the valve positions by preset decreasing amount;
s104: after waiting for the position and the pressure to be stable each time, calculating the ratio PressurePress of the current pressure Current pressure and the pressure value TestMinPresure when the valve is fully opened, wherein the calculation formula is as follows:
s105: repeating the step S103 and the step S104, and recording each position and the corresponding ratio PressurePeer;
s106: and when the position is less than or equal to the preset position value, establishing a relation table of pressure and valve opening according to the position and the corresponding ratio PressurePeer after learning is finished.
Further, the decrement is 10% of the fully open position of the valve.
Further, the preset position value is 100.
Further, after receiving the pressure setting command, the control board calculates a difference value between the current pressure and the current pressure, and calculates the valve opening by inquiring a preset pressure and valve opening relation table, including the following steps:
s301: calculating whether the difference between the current pressure value and the set pressure value is less than or equal to an allowable tolerance, if so, stopping running and returning;
s302: if not, inquiring a pressure and valve opening relation table through the current position CurrentPosition to calculate the pressure ratio CurrentPressurePer corresponding to the current position, wherein the calculation formula is as follows:
wherein ListPressurePer0 and ListPressurePer1 are the adjacent 2 pressure ratios in the table; listposition0, Listposition1 is the corresponding 2 adjacent position values, and the current position is between them, i.e., Listposition1 is not more than Current position < Listposition 0;
s303: and calculating the pressure value TestMinPresure when the valve is fully opened according to the pressure ratio CurrentPressurePeer corresponding to the current position, wherein the calculation formula is as follows:
s304: the ratio setpresssureper of the set pressure and TestMinPressure is calculated as follows:
s305: calculating the position SetPosition corresponding to the valve opening by querying a pressure and valve opening relation table through setpressuere, wherein the calculation formula is as follows:
ListPosition0, ListPosition1, are 2 adjacent position values; ListPressurePer0, ListPressurePer1 are the corresponding adjacent 2 pressure ratios in the table, and the set pressure ratio is between them, i.e., ListPressurePer0 ≦ SetPressurePer < ListPressurePer 1.
The invention has the following beneficial effects:
according to the pressure adjusting method of the vacuum adjusting valve, the relation table of pressure and valve opening degree is established after learning, the problems that different cavities need different parameter configuration requirements of users and are not limited by the volume of the cavities are solved; a user inputs a pressure setting command to the control panel, the control panel directly calculates the position of the valve opening by inquiring a pressure and valve opening relation table mode, the control panel drives the valve motor to act, the valve is operated to the calculated position of the valve opening, and the PID repeated regulation and control process is omitted.
Drawings
FIG. 1 is a schematic overall flow diagram of the present invention;
FIG. 2 is a schematic diagram of the process for establishing a pressure versus valve opening table according to the present invention;
fig. 3 is a schematic flow chart of calculating the valve opening according to the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. The components of embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example 1
As shown in fig. 1, the present embodiment provides a pressure regulating method of a vacuum regulator valve, including the following steps:
s1: establishing a relation table of the pressure of the vacuum regulating valve and the opening degree of the valve;
s2: the user inputs a pressure setting command to the control panel;
s3: after receiving a pressure setting command, the control panel calculates a difference value between the current pressure and the current pressure, and calculates the valve opening by inquiring a preset pressure and valve opening relation table;
s4: the control panel sends out the instruction and drives valve motor, and valve motor drives the valve to the settlement aperture for control pressure is unanimous with the settlement pressure.
In the embodiment, a relation table of pressure and valve opening degree is established after learning, so that the requirements of different cavities that users need to configure different parameters are overcome, and the cavity is not limited by the volume of the cavity; a user inputs a pressure setting command to the control panel, the control panel directly calculates the position of the valve opening by inquiring a pressure and valve opening relation table mode, the control panel drives the valve motor to act, the valve is operated to the calculated position of the valve opening, and the PID repeated regulation and control process is omitted.
Example 2
The embodiment provides a pressure regulating method of a vacuum regulating valve, which comprises the following steps:
s1: establishing a relation table of the pressure of the vacuum regulating valve and the opening degree of the valve;
as shown in fig. 2, the establishment of the pressure and valve opening relation table includes the following steps:
s101: after entering the learning state, setting the valve to a full-open state;
s102: introducing gas, and recording a pressure value TestMinPresure when the valve is fully opened after the gas flow and the cavity pressure are balanced;
s103: sequentially setting the valve positions by preset decreasing amount;
the decrement is 10 per mill of the full-open position of the valve; for example, the valve is fully opened to 1000 and is sequentially decreased, and the positions of the valve are 990, 980 … … 120 and 110 … ….
S104: after waiting for the position and the pressure to be stable each time, calculating the ratio PressurePress of the current pressure Current pressure and the pressure value TestMinPresure when the valve is fully opened, wherein the calculation formula is as follows:
s105: repeating the step S103 and the step S104, and recording each position and the corresponding ratio PressurePeer;
s106: when the position is smaller than or equal to the preset position value, establishing a relation table of pressure and valve opening according to the position and the corresponding ratio PressurePeer after learning is finished;
the preset position value is 100; if the position of the valve is 100, the learning is stopped.
S2: the user inputs a pressure setting command to the control panel;
s3: after receiving a pressure setting command, the control panel calculates a difference value between the current pressure and the current pressure, and calculates the valve opening by inquiring a preset pressure and valve opening relation table;
as shown in fig. 3, after receiving the pressure setting command, the control board calculates a difference value between the current pressure and the current pressure, and calculates the valve opening by querying a preset relationship table between the pressure and the valve opening, including the following steps:
s301: calculating whether the difference between the current pressure value and the set pressure value is less than or equal to an allowable tolerance, if so, stopping running and returning; in practice, the allowable tolerance is 1.3/1000.
S302: if not, inquiring a pressure and valve opening relation table through the current position CurrentPosition to calculate the pressure ratio CurrentPressurePer corresponding to the current position, wherein the calculation formula is as follows:
wherein ListPressurePer0 and ListPressurePer1 are the adjacent 2 pressure ratios in the table; listposition0, Listposition1 is the corresponding 2 adjacent position values, and the current position is between them, i.e., Listposition1 is not more than Current position < Listposition 0;
s303: and calculating the pressure value TestMinPresure when the valve is fully opened according to the pressure ratio CurrentPressurePeer corresponding to the current position, wherein the calculation formula is as follows:
s304: the ratio setpresssureper of the set pressure and TestMinPressure is calculated as follows:
s305: calculating the position SetPosition corresponding to the valve opening by querying a pressure and valve opening relation table through setpressuere, wherein the calculation formula is as follows:
ListPosition0, ListPosition1, are 2 adjacent position values; ListPressurePer0, ListPressurePer1 is the corresponding adjacent 2 pressure ratios in the table, and the set pressure ratio is between them, i.e., ListPressurePer0 is less than SetPressurePer < ListPressurePer 1;
s4: the control panel sends out the instruction and drives valve motor, and valve motor drives the valve to the settlement aperture for control pressure is unanimous with the settlement pressure.
When the system is implemented, the control panel receives a user setting command through the serial port; after receiving a pressure setting command, calculating a difference value between the current pressure and the current pressure, and obtaining the valve opening through inquiry calculation; the valve is driven to the set opening degree by driving the valve motor, so that the control pressure is consistent with the set pressure, and the purpose of controlling the pressure is achieved.
Claims (5)
1. A pressure regulating method of a vacuum regulating valve is characterized by comprising the following steps:
s1: establishing a relation table of the pressure of the vacuum regulating valve and the opening degree of the valve;
s2: the user inputs a pressure setting command to the control panel;
s3: after receiving a pressure setting command, the control panel calculates a difference value between the current pressure and the current pressure, and calculates the valve opening by inquiring a preset pressure and valve opening relation table;
s4: the control panel sends out the instruction and drives valve motor, and valve motor drives the valve to the settlement aperture for control pressure is unanimous with the settlement pressure.
2. The pressure regulating method of a vacuum regulator valve according to claim 1, wherein said building of said pressure and valve opening relation table comprises the steps of:
s101: after entering the learning state, setting the valve to a full-open state;
s102: introducing gas, and recording a pressure value TestMinPresure when the valve is fully opened after the gas flow and the cavity pressure are balanced;
s103: sequentially setting the valve positions by preset decreasing amount;
s104: after waiting for the position and the pressure to be stable each time, calculating the ratio PressurePress of the current pressure Current pressure and the pressure value TestMinPresure when the valve is fully opened, wherein the calculation formula is as follows:
s105: repeating the step S103 and the step S104, and recording each position and the corresponding ratio PressurePeer;
s106: and when the position is less than or equal to the preset position value, establishing a relation table of pressure and valve opening according to the position and the corresponding ratio PressurePeer after learning is finished.
3. The method as claimed in claim 2, wherein the decrement is 10 ‰ of a full open position of the valve.
4. The pressure regulating method of a vacuum regulator valve according to claim 2, wherein said preset position value is 100.
5. The pressure regulating method of claim 2, wherein the control board calculates a difference value with the current pressure after receiving the pressure setting command, and the valve opening is calculated by querying a preset pressure and valve opening relation table, comprising the steps of:
s301: calculating whether the difference between the current pressure value and the set pressure value is less than or equal to an allowable tolerance, if so, stopping running and returning;
s302: if not, inquiring a pressure and valve opening relation table through the current position CurrentPosition to calculate the pressure ratio CurrentPressurePer corresponding to the current position, wherein the calculation formula is as follows:
wherein ListPressurePer0 and ListPressurePer1 are the adjacent 2 pressure ratios in the table; listposition0, Listposition1 is the corresponding 2 adjacent position values, and the current position is between them, i.e., Listposition1 is not more than Current position < Listposition 0;
s303: and calculating the pressure value TestMinPresure when the valve is fully opened according to the pressure ratio CurrentPressurePeer corresponding to the current position, wherein the calculation formula is as follows:
s304: the ratio setpresssureper of the set pressure and TestMinPressure is calculated as follows:
s305: calculating the position SetPosition corresponding to the valve opening by querying a pressure and valve opening relation table through setpressuere, wherein the calculation formula is as follows:
ListPosition0, ListPosition1, are 2 adjacent position values; ListPressurePer0, ListPressurePer1 are the corresponding adjacent 2 pressure ratios in the table, and the set pressure ratio is between them, i.e., ListPressurePer0 ≦ SetPressurePer < ListPressurePer 1.
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| CN202111575625.7A CN114415747B (en) | 2021-12-21 | 2021-12-21 | Pressure regulating method of vacuum regulating valve |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115826636A (en) * | 2023-02-16 | 2023-03-21 | 广州志橙半导体有限公司 | Pressure control method and system of CVD (chemical vapor deposition) equipment |
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2021
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