CN114397751A - Guidance self-checking division photoelectric imaging detection microscope objective - Google Patents
Guidance self-checking division photoelectric imaging detection microscope objective Download PDFInfo
- Publication number
- CN114397751A CN114397751A CN202111679614.3A CN202111679614A CN114397751A CN 114397751 A CN114397751 A CN 114397751A CN 202111679614 A CN202111679614 A CN 202111679614A CN 114397751 A CN114397751 A CN 114397751A
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- microscope objective
- imaging detection
- photoelectric imaging
- microscope
- self
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/02—Objectives
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
- G02B13/0055—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras employing a special optical element
- G02B13/006—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras employing a special optical element at least one element being a compound optical element, e.g. cemented elements
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
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Abstract
The invention discloses a manufacturing-guide self-checking division photoelectric imaging detection microscope objective, which comprises a microscope objective front group and a microscope objective rear group, wherein the microscope objective front group consists of two single lenses and a double cemented lens, and the whole microscope objective has positive focal power; the rear group of the microscope consists of two single lenses and a double cemented lens, the whole microscope has negative focal power, the working wavelength of the photoelectric imaging detection microscope objective is 618-678 nm, the numerical aperture is 0.4, the working distance is 30mm, the object space line field of view of the photoelectric imaging detection microscope objective is 0.98mm, and the magnification is-6.27. The invention provides a guidance self-check division photoelectric imaging detection microscope objective which is matched with an industrial camera to realize real-time and accurate detection of guidance self-check division.
Description
Technical Field
The invention belongs to the technical field of photoelectricity, and relates to a system-guided self-detection division photoelectric imaging detection microscope objective.
Background
The shape and size of the guidance self-check division are important performance indexes of the guidance instrument. In the traditional detection method, human eyes observe the shape and size of the guidance self-check division through a microscope with division lines, and the measurement result is influenced by the parallax of the microscope, the technical experience of a measurer, the subjective feeling difference of human eyes and the like, so that the real-time and accurate detection of the guidance self-check division is necessarily realized in a photoelectric imaging mode.
The traditional microscope objective realizes the vertical axis amplification of a target, is combined with an ocular to form a microscope for observation of human eyes, but because the visual resolution of the human eyes is limited, the imaging quality of the microscope objective cannot be matched with a photoelectric imaging device, so the microscope objective needs to be redesigned according to the actual use requirement; on the other hand, the traditional microscope objective has short working distance and cannot meet the detection requirement of guidance self-checking division.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention provides a guidance self-checking division photoelectric imaging detection microscope objective which is matched with an industrial camera to realize real-time and accurate detection of guidance self-checking division.
The technical solution for realizing the purpose of the invention is as follows:
a manufacturing-guide self-detection division photoelectric imaging detection microscope objective comprises a microscope objective front group and a microscope objective rear group, wherein the microscope objective front group consists of two single lenses and a double cemented lens, and the whole microscope objective has positive focal power; the rear group of the microscope consists of two single lenses and a double cemented lens, and the whole microscope has negative focal power.
Furthermore, the photoelectric imaging detection microscope objective has a working wavelength of 618-678 nm, a numerical aperture of 0.4 and a working distance of 30 mm.
Further, the object space line field of view of the photoelectric imaging detection microscope objective is 0.98mm, and the magnification is-6.27.
Compared with the prior art, the invention has the remarkable advantages that:
the invention designs a microscope objective with working wavelength of 618-678 nm, numerical aperture of 0.4, working distance of 30mm, object space line field of view of 0.98mm and magnification of-6.27. At 80lp/mm, the full-field MTF of the lens is larger than 0.4, the RMS values of full-field point arrays are all smaller than 5.7 μm, and the image quality is good. The invention can be matched with an industrial camera to realize real-time and accurate detection of guidance self-checking division.
Drawings
FIG. 1 is a diagram of an optical system of the present invention.
FIG. 2 is a graph of MTF according to the present invention.
FIG. 3 is a dot diagram of the present invention.
Detailed Description
With reference to fig. 1, a method for manufacturing a self-guided, split-photoelectric imaging detection microscope objective, which adopts a double-gauss structure for optimization design to realize correction of spherical aberration and vertical axis aberration, comprises a microscope objective front group and a microscope objective rear group, wherein the microscope objective front group consists of two single lenses and a double cemented lens, and has positive focal power as a whole; the rear group of the microscope consists of two single lenses and a double cemented lens, and the whole microscope has negative focal power.
Furthermore, the photoelectric imaging detection microscope objective has a working wavelength of 618-678 nm, a numerical aperture of 0.4 and a working distance of 30 mm.
Further, the object space line field of view of the photoelectric imaging detection microscope objective is 0.98mm, and the magnification is-6.27.
An industrial camera with the pixel size of 6.5 micrometers (H) multiplied by 6.25 micrometers (V) and the effective pixel of 752(H) multiplied by 582(V) is selected, the guidance self-checking dividing side length is about 0.25mm, and the magnification of the microscope objective obtained through calculation is about-6.5. The MTF (modulation transfer function) can comprehensively and quantitatively obtain the comprehensive effect caused by diffraction and aberration of the optical system, the imaging quality of the optical system is fully reflected, and the MTF (modulation transfer function) in the full field of view at 80lp/mm is required to be not less than 0.4 in order to ensure the final good image quality; the point array diagram can reflect the energy distribution of image points, and in order to ensure the final image quality to be good, the RMS value of the full-field point array diagram is required to be not more than the size of the pixel. In order to reserve a sufficient adjustment range, the working distance is required to be not less than 25 mm.
FIG. 2 shows MTF curves of the present invention, which satisfy the operating requirements, with the full field MTF being greater than 0.4. FIG. 3 is a dot array chart of the present invention, wherein the RMS values of the full field of view dot array chart are all less than 5.7 μm, which meets the use requirements.
The foregoing illustrates and describes the principles, general features, and advantages of the present invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are described in the specification and illustrated only to illustrate the principle of the present invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the present invention, which fall within the scope of the invention as claimed. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (3)
1. A manufacturing-guide self-detection division photoelectric imaging detection microscope objective is characterized in that,
the micro-objective front group consists of two single lenses and a double cemented lens, and the whole micro-objective front group has positive focal power; the rear group of the microscope consists of two single lenses and a double cemented lens, and the whole microscope has negative focal power.
2. The guided self-detecting division optoelectronic imaging inspection microobjective of claim 1,
the photoelectric imaging detection microscope objective has the working wavelength of 618-678 nm, the numerical aperture of 0.4 and the working distance of 30 mm.
3. The guided self-detecting division optoelectronic imaging detection microscope objective of claim 1, wherein the object space line field of view of the optoelectronic imaging detection microscope objective is 0.98mm and the magnification is-6.27.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111679614.3A CN114397751A (en) | 2021-12-31 | 2021-12-31 | Guidance self-checking division photoelectric imaging detection microscope objective |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111679614.3A CN114397751A (en) | 2021-12-31 | 2021-12-31 | Guidance self-checking division photoelectric imaging detection microscope objective |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114397751A true CN114397751A (en) | 2022-04-26 |
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|---|---|---|---|
| CN202111679614.3A Pending CN114397751A (en) | 2021-12-31 | 2021-12-31 | Guidance self-checking division photoelectric imaging detection microscope objective |
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Citations (13)
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| JPH1031162A (en) * | 1996-05-13 | 1998-02-03 | Nikon Corp | Microscope |
| CN1725054A (en) * | 2005-07-11 | 2006-01-25 | 中国科学院上海技术物理研究所 | The small-size long working distance micro optical system that use in a kind of suitable space |
| JP2010060920A (en) * | 2008-09-04 | 2010-03-18 | Olympus Corp | Objective optical system and microscope with the same |
| JP2014006291A (en) * | 2012-06-21 | 2014-01-16 | Olympus Corp | Microscope, microscope system and image synthesis method |
| CN104570309A (en) * | 2014-12-31 | 2015-04-29 | 广西师范大学 | Long-work-distance flat-field apochromatic metallographic microscope objective with magnification power being 10 and without CaF2 |
| CN104570310A (en) * | 2014-12-31 | 2015-04-29 | 桂林电子科技大学 | Flat-field apochromatic metallographic microscope objective with magnification power being 40 and without CaF2 |
| CN108732738A (en) * | 2017-04-21 | 2018-11-02 | 莱卡微系统Cms有限责任公司 | For microscopical immersion objective |
| CN109581630A (en) * | 2019-01-17 | 2019-04-05 | 广东奥普特科技股份有限公司 | A kind of low distortion fixed-focus line of large aperture sweeps machine visual lens |
| CN110764226A (en) * | 2019-10-29 | 2020-02-07 | 华中科技大学 | Large-view-field micro microscope objective |
| CN111856735A (en) * | 2020-07-10 | 2020-10-30 | 宁波永新光学股份有限公司 | Objective lens for 40 times biological observation |
| CN213399045U (en) * | 2020-10-13 | 2021-06-08 | 浙江工业大学 | High-resolution double-telecentric optical lens for optical measurement and detection |
| CN113031240A (en) * | 2021-03-10 | 2021-06-25 | 北京理工大学珠海学院 | Microscope objective |
| CN113820828A (en) * | 2021-10-09 | 2021-12-21 | 广东奥普特科技股份有限公司 | High-resolution fixed-focus lens |
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2021
- 2021-12-31 CN CN202111679614.3A patent/CN114397751A/en active Pending
Patent Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1031162A (en) * | 1996-05-13 | 1998-02-03 | Nikon Corp | Microscope |
| CN1725054A (en) * | 2005-07-11 | 2006-01-25 | 中国科学院上海技术物理研究所 | The small-size long working distance micro optical system that use in a kind of suitable space |
| JP2010060920A (en) * | 2008-09-04 | 2010-03-18 | Olympus Corp | Objective optical system and microscope with the same |
| JP2014006291A (en) * | 2012-06-21 | 2014-01-16 | Olympus Corp | Microscope, microscope system and image synthesis method |
| CN104570309A (en) * | 2014-12-31 | 2015-04-29 | 广西师范大学 | Long-work-distance flat-field apochromatic metallographic microscope objective with magnification power being 10 and without CaF2 |
| CN104570310A (en) * | 2014-12-31 | 2015-04-29 | 桂林电子科技大学 | Flat-field apochromatic metallographic microscope objective with magnification power being 40 and without CaF2 |
| CN108732738A (en) * | 2017-04-21 | 2018-11-02 | 莱卡微系统Cms有限责任公司 | For microscopical immersion objective |
| CN109581630A (en) * | 2019-01-17 | 2019-04-05 | 广东奥普特科技股份有限公司 | A kind of low distortion fixed-focus line of large aperture sweeps machine visual lens |
| CN110764226A (en) * | 2019-10-29 | 2020-02-07 | 华中科技大学 | Large-view-field micro microscope objective |
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| CN213399045U (en) * | 2020-10-13 | 2021-06-08 | 浙江工业大学 | High-resolution double-telecentric optical lens for optical measurement and detection |
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| CN113820828A (en) * | 2021-10-09 | 2021-12-21 | 广东奥普特科技股份有限公司 | High-resolution fixed-focus lens |
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