CN114221203A - Extreme ultraviolet pulse light source device with long-time stable output - Google Patents
Extreme ultraviolet pulse light source device with long-time stable output Download PDFInfo
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- H—ELECTRICITY
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
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- H—ELECTRICITY
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10007—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
- H01S3/10023—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by functional association of additional optical elements, e.g. filters, gratings, reflectors
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Abstract
An extreme ultraviolet pulse light source device with long-time stable output comprises a high-power femtosecond laser, a differential gas action device and a laser blocking device; the high-power femtosecond laser device emits femtosecond-level ultrashort pulse laser, and the ultrashort pulse laser passes through the plane reflecting mirror and the laser focusing mirror and is focused in the differential gas action device; after pressure control, reaction gas is continuously injected into a gas box with adjustable length and interacts with laser to generate higher harmonic wave, and EUV light is radiated; the gas box is arranged in the differential cavity and forms a differential with the outer vacuum cavity, so that the vacuum degree in the vacuum cavity is effectively maintained; the EUV light generated by the reaction and unconverted incident laser light enter the laser blocking device, and the incident laser light is attenuated and blocked to obtain pure EUV light.
Description
Technical Field
The invention relates to an extreme ultraviolet pulse light source device with stable output for a long time. Belongs to the technical field of intense field laser physics and attosecond laser.
Background
The extreme ultraviolet light source is widely applied to the fields of extreme ultraviolet microscopy, photoetching, ultrafast photoelectric energy spectrum, coherent diffraction imaging and the like. Common methods for obtaining extreme ultraviolet light sources include synchrotron radiation, laser (discharge) plasma, crystal frequency doubling and higher harmonics. The higher harmonics are generated by the interaction between high-energy femtosecond pulse laser and gas medium (inert gas such as He, Ne, Ar, Kr, etc.). In the process, electrons of gas atoms generate tunneling ionization under the action of a strong laser field, quasi-free electrons oscillate under the laser electric field and obtain additional kinetic energy from the quasi-free electrons, and when the electrons return to the vicinity of atomic nuclei again and are recombined, photons are radiated to release excess energy. The generated ultraharmonic extreme ultraviolet light source has extremely narrow pulse width (generally less than several femtoseconds), has good directivity and excellent time and space coherence, and is widely applied to physics research of attosecond time resolution and subatomic scale space resolution.
In the high-order harmonic extreme ultraviolet light source generating device, a gas box scheme is one of the commonly used gas injection modes. The gas box generally refers to a metal thin-wall conduit with a diameter of several mm, and gas is continuously injected from the top of the metal conduit with a certain back pressure, and the internal gas pressure is basically maintained stable. In the process of generating higher harmonics, a laser beam breaks through a gas box to form a perforation with the magnitude of hundreds of microns, and laser interacts with gas in the box through the perforation to generate Extreme Ultraviolet (EUV) rays. Because laser and gas box direct contact, the perforation can grow gradually after long-time work, and gas leakage in the box has both influenced the stability of higher harmonic extreme ultraviolet light source output and has reduced higher harmonic conversion efficiency in the vacuum chamber. Further, in an extreme ultraviolet light source application system, a metal-coated optical element or a multilayer optical element is generally used to reflect EUV light with high efficiency. After the higher harmonic wave is generated, unconverted incident laser and EUV light are transmitted in a collinear way, the high-energy incident laser can damage the film layer of the optical element, especially after the laser repetition frequency and the single pulse energy are improved, the average power of the laser is obviously enhanced, the damage to the film layer is aggravated, and the service life of the optical element can be greatly shortened.
Therefore, achieving long-term stability of the output of the light source system and alleviating damage of the high average power laser to the euv optical element are problems that need to be solved by the euv pulse light source generating device.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provide an extreme ultraviolet pulse light source device which can output stable extreme ultraviolet light for a long time, and simultaneously attenuate and block incident laser with high average power so as to relieve the damage of the incident laser to an extreme ultraviolet optical element and prolong the service life of a light source application system.
The purpose of the invention can be realized by the following technical scheme: an extreme ultraviolet pulse light source device whose output is stable for a long time, comprising: high power femtosecond laser, differential gas action device and laser blocking device.
The high-power femtosecond laser device emits femtosecond-level ultrashort pulse laser, and the ultrashort pulse laser passes through optical elements such as a plane reflector and a laser focusing mirror and is focused in the differential gas action device; the reaction gas is continuously injected into the gas box with adjustable length after pressure control, the gas box is arranged in the differential chamber and forms a differential with the outer vacuum cavity, and the vacuum degree in the outer vacuum cavity is effectively maintained; the laser interacts with the gas in the box to generate higher harmonic waves and radiate EUV light; the EUV light generated by the reaction and the unconverted incident laser enter the laser blocking device, and the incident laser is attenuated and blocked to obtain pure EUV light, so that the problem that the incident laser damages the extreme ultraviolet optical element in a light source application system can be effectively solved.
The differential gas action device comprises a gas box with adjustable length, a differential chamber and a gas inlet device. The gas box is fixed in the differential chamber and forms a differential with the outer vacuum chamber. The gas with certain back pressure is injected into the gas box through a gas inlet device consisting of a pressure reducing valve and a gas inlet pipe.
The gas box is divided into an inner layer and an outer layer, the length of the gas box can be adjusted by pushing and pulling the inner layer, and the adjusting range is 0-15 mm. The gas box is opened with a central hole (about 1-2mm) at the front end and the rear end and is used as a channel for incident laser and EUV light.
The length of the differential chamber is about 10cm, the gas box is fixed in the differential chamber, the bottom of the differential chamber is connected to the vacuum pump through the metal hose, leaked gas after reaction of the gas box is timely pumped out, and the vacuum degree of the outer vacuum chamber is effectively maintained. Holes (2-3mm) were also bored in the front and rear end centers of the differential chamber for the incident laser and EUV light to pass through. In addition, in order to adjust the relative position of the laser focus and the gas box conveniently and meet the phase matching condition of higher harmonics, the differential chamber is arranged on a one-dimensional translation table which can move back and forth along the laser incidence direction;
the laser blocking device comprises a first spectroscope, an optical garbage can, a second spectroscope and an optical filter. The extreme ultraviolet/infrared spectroscope based on the multi-medium AR coating can efficiently reflect EUV light and transmit incident laser in an infrared band. The optical garbage can is arranged at the light transmission outlet of the spectroscope and used for collecting transmitted incident laser. The optical filter is arranged at the reflected light outlet of the second spectroscope, so that residual incident laser is further filtered, and the rough wavelength selection of the EUV light source can be performed by selecting optical filters made of different materials. The theoretical wavelength range is determined mainly by the gaseous medium, such as argon gas for 30-100nm and neon gas for 10-100 nm.
The high-power femtosecond laser outputs high-energy ultrashort pulse laser. Firstly, a power attenuator consisting of a half-wave plate, a Brewster type film polaroid and an optical garbage can is used for adjusting the power of pulse laser. Then focusing the pulse laser by using a laser focusing mirror to achieve a typical value of 10 of the laser power density required by gas higher harmonic reaction13～1015W/cm2。
Has the advantages that: the extreme ultraviolet pulse light source device with long-time stable output provided by the invention adopts a gas box scheme, and is added with a differential chamber design, so that the stability of the air pressure in the box is good, and the long-time stability of the output of an EUV light source can be ensured. And the length of the gas box can be flexibly adjusted according to the change of conditions such as the focal length of a reaction gas medium and a laser focusing mirror, so that the higher harmonic reaction efficiency is improved, and the reuse rate of the gas box is increased. In addition, the laser blocking device is added, so that the problem that high-average-power laser damages the extreme ultraviolet optical element is solved, and the service life of the light source application system is prolonged.
Drawings
FIG. 1 is a schematic view of the overall structure of the present invention;
FIG. 2 is a schematic view of the structure of a gas box in an embodiment of the present invention;
FIG. 3 is a graph of transmittance for 100nm thick Al and Zr films filters;
FIG. 4 is a graph of reflectivity of a beam splitter for incident laser light and EUV light at different angles in an embodiment of the present invention.
Detailed Description
The present invention will be further described with reference to the accompanying drawings and examples.
Fig. 1 includes: 1.1-femtosecond laser, 1.2-half wave plate, 1.3-Brewster type film polaroid, 1.4 optical garbage can,
1.5-plane reflector, 1.6-diaphragm, 1.7-plano-convex lens.
2-differential gas action device, 2.1-gas box, 2.2-differential chamber, 2.3-one-dimensional translation table, 2.4-gas inlet pipe, 2.5-pressure reducing valve, 2.6-metal hose and 2.7-turbo mechanical pump.
3-laser blocking device, 3.1-first spectroscope, 3.2-optical garbage bin, 3.3-second spectroscope, 3.4-optical filter, 3.5 laser blocking cavity. 4-high harmonic generation cavity and 5-high pressure gas cylinder.
As shown in fig. 1, an euv pulse light source device with a stable output for a long time includes: high power femtosecond laser, differential gas action device and laser blocking device.
The high-power femtosecond laser device emits femtosecond-level ultrashort pulse laser, and the ultrashort pulse laser passes through optical elements such as a plane reflecting mirror and a laser focusing mirror and is focused in a differential gas action device; after pressure control, reaction gas is continuously injected into a gas box with adjustable length and interacts with laser to generate higher harmonic wave, and EUV light is radiated; the gas box is arranged in the differential cavity and forms a differential with the outer vacuum cavity, so that the vacuum degree in the vacuum cavity is effectively maintained; the EUV light generated by the reaction and the unconverted incident laser enter the laser blocking device, and the incident laser is attenuated and blocked to obtain pure EUV light, so that the problem that the incident laser damages the extreme ultraviolet optical element in a light source application system can be effectively solved. The laser is generally at 800nm, and specific parameters are mentioned in the examples. The theoretical wavelength range of extreme ultraviolet lasers is determined primarily by the gaseous medium, such as argon producing 30-100nm and neon producing 10-100 nm.
In this embodiment, the high power femtosecond laser 1.1 generates a pulsed laser with a wavelength of 800nm, an energy of several millijoules, a pulse width of 50fs, and a repetition frequency of 1kHz/10 kHz. The laser power is adjusted by attenuation means consisting of a half-wave plate 1.2 and a brewster-type thin-film polarizer 1.3. The incident laser is then focused using plano-convex lens 1.7 to achieve the laser power density required for gas higher harmonic reaction, typically 1013～1015W/cm2. The focal point of the plano-convex lens 1.7 is in the center of the gas box 2.1.
The differential gas action device 2 comprises a gas box 2.1, a differential chamber 2.2, a one-dimensional translation table 2.3, a gas inlet pipe 2.4, a pressure reducing valve 2.5, a metal hose 2.6 and a vacuum pump 2.7. The gas box 2.1 is fixed in the differential chamber 2.2, the differential chamber is arranged on the one-dimensional translation table 2.3, the one-dimensional translation table 2.3 moves back and forth along the laser incidence direction, the relative position of the gas box 2.1 and the laser focus is adjusted, and the high-order harmonic phase matching condition is realized. The gas pressure of the gas from the high-pressure gas cylinder 5 is reduced to several tens to several hundreds Torr by the regulation action of the pressure reducing valve 2.5, and then the gas is continuously injected into the gas box 2.1 through the gas inlet pipe 2.4, and the gas density inside the gas box is approximately uniform and stable. Gaseous medium and after focusingThe high power density pulse laser interacts to generate higher harmonics, which radiate EUV light. The residual gas after the higher harmonic reaction can leak into the differential chamber 2.2 through the perforations in the gas box 2.1. The differential chamber 2.2 is connected to a vacuum pump 2.7 via a metal hose 2.6. The gas leaked into the differential chamber 2.2 is discharged in time, and the vacuum degree of the higher harmonic generation cavity 4 is effectively maintained. In the embodiment, 5m is selected as the vacuum pump 2.73A/s pumping speed of the turbomachinery pump. Meanwhile, the higher harmonic generation cavity 4 is additionally connected with a vortex mechanical pump and a turbo molecular pump for maintaining self vacuum.
The gas box 2.1 is adjustable in length. Experiments show that when the length of the higher harmonic reaction zone is close to the Rayleigh length
zR＝πωo 2λ (λ is femtosecond laser wavelength, ω)0Laser waist radius), the higher harmonic reaction has the highest conversion efficiency. For the gas box scheme, the gas box length is approximately equal to the higher harmonic reaction zone length. The key to improve the efficiency of higher harmonics is to select a gas box with a proper length. The embodiment adopts a gas box with adjustable length, and the detailed structure is shown in figure 2: the gas box is divided into an inner layer and an outer layer, the middle of the gas box is sealed by rubber, and meanwhile, the inner layer is bonded with the rubber by vacuum glue. The length of the gas box can be changed by pushing and pulling the inner layer. And when the length is selected, screwing the screw on the outer layer for fixing. The center of the front end and the rear end of the gas box is provided with a through hole of 1-2mm, and the through hole is used as a channel for incident laser and EUV light. The gas pressure inside the gas box 2.1 is maintained substantially constant, in the order of-3 mbar. Depending on the difference of the reactive gas media (e.g. Ar, Ne, Xe), the optimum conversion efficiency may have an order of magnitude of fluctuation above and below the corresponding pressure.
The laser blocking device 3 comprises a first spectroscope 3.1, an optical garbage can 3.2, a second spectroscope 3.3, an optical filter 3.4 and a laser blocking chamber 3.5. After the generation of the higher harmonics, the incident laser beam, which is not converted by the reaction, and the generated EUV beam propagate collinearly. The first beam splitter 3.1 and the second beam splitter 3.2 are adjusted to reflect EUV light at grazing incidence angles (6-9 °) and to transmit incident laser light. The transmitted incident laser is collected by an optical garbage can 3.2, or a reflector is arranged to reflect the incident laser to the outside of the cavity, and the EUV light source is excited again or used for other purposes. An optical filter 3.4 is arranged on a reflection light path of the second spectroscope 3.3, incident laser is further filtered, and meanwhile, EUV light sources of different wave bands can be obtained by selecting optical filters made of different materials. FIG. 3 is a graph of the transmittance of 100nm thick Al and Zr films. It can be known that the Al film filter has higher transmittance in the 20-60nm band, and the Zr film filter has higher transmittance in the 7-15nm band.
In this embodiment, the surface of the spectroscope is coated with 51nm/3nm thick Si/B4The reflectance curve of film C is shown in FIG. 4. The dashed line shows the reflectance curve for 20nm EUV light at different angles of incidence, and the solid line shows the reflectance curve for 800nm incident laser light at different angles of incidence. When an incident beam strikes the beam splitter at a grazing incidence angle (6-9 deg.), the beam splitter can efficiently reflect light in the extreme ultraviolet band, and the reflectivity for incident laser light at 800nm is low. As can be seen from fig. 4, when the beam splitter makes an angle of 7 ° with the incident beam, the reflectivity for the incident laser light of 800nm is less than 0.1%, and the reflectivity for 20nm euv light is about 90%.
The range of the glancing angle of the spectroscope is the same for 3.1 and 3.2.
The above embodiments are preferred embodiments of the present invention, but the present invention is not limited to the above embodiments, and any changes, modifications, substitutions, combinations, and simplifications made by the above embodiments without departing from the spirit and principle of the present invention should be construed as equivalents and all changes which fall within the scope of the present invention.
Claims (10)
1. An extreme ultraviolet pulse light source device with long-time stable output is characterized in that: the device comprises a high-power femtosecond laser, a differential gas action device and a laser blocking device; the high-power femtosecond laser device emits femtosecond-level ultrashort pulse laser, and the ultrashort pulse laser passes through the plane reflecting mirror and the laser focusing mirror and is focused in the differential gas action device; after pressure control, reaction gas is continuously injected into a gas box with adjustable length and interacts with laser to generate higher harmonic wave, and EUV light is radiated; the gas box is arranged in the differential cavity and forms a differential with the outer vacuum cavity, so that the vacuum degree in the vacuum cavity is effectively maintained; the EUV light generated by the reaction and unconverted incident laser light enter the laser blocking device, and the incident laser light is attenuated and blocked to obtain pure EUV light.
2. An euv pulsed light source device with a stable output for a long time according to claim 1, wherein said differential gas action means comprises a gas box, a differential chamber and a gas inlet means.
3. The euv pulse light source device with stable output for a long time according to claim 1, wherein the laser blocking device comprises a first spectroscope, an optical trash can, a second spectroscope and a filter; the first spectroscope and the second spectroscope are parallel to each other and are arranged in a staggered manner from front to back along the incident laser direction at a grazing incidence angle; an optical garbage can is arranged at the light transmission outlets of the first spectroscope and the second spectroscope, and an optical filter is arranged at the light reflection outlet of the second spectroscope.
4. The euv pulse light source device with a long-term stable output according to claim 1, wherein the high-power femtosecond laser outputs high-energy ultrashort pulse laser with a wavelength of 800 nm; the power of the pulse laser is adjusted by using a power attenuator consisting of a half-wave plate, a Brewster type film polaroid and an optical garbage can, and the pulse laser is focused by using a laser focusing lens.
5. The euv pulse light source device with output stable for a long time according to claim 2, wherein the gas box is adjustable in length and is disposed in a differential chamber. The center of the front end and the rear end of the gas box is provided with a hole which is used as a transmission channel of incident laser and EUV light; ne, Ar, Kr and other inert gas media interact with the focused high-power density pulse laser to generate higher harmonics and radiate EUV light; residual gas after the higher harmonic reaction can leak into the differential chamber through the through hole on the gas box, the length of the gas box is adjustable, and when the higher harmonic reaction areaLength close to rayleigh length
When λ is the femtosecond laser wavelength, ω0The radius of the laser waist is the highest conversion efficiency of higher harmonic reaction; for the gas box scheme, the length of the gas box is approximately equal to the length of the higher harmonic reaction zone; the length of the gas box is 2-5mm according to the difference of the focal lengths of the gas medium and the laser focusing mirror. The center of the front end and the rear end of the gas box is provided with a through hole of 1-2mm, and the through hole is used as a channel for incident laser and EUV light.
6. An euv pulse light source device with long-term stable output according to any one of claims 2-5, wherein the front and rear ends of said differential chamber are centrally provided with openings, and the size of the openings is slightly larger than that of the openings of the gas box. The bottom is connected with a vacuum pump through a metal hose.
7. An euv pulse light source device whose output is stable for a long time according to any one of claims 2 to 5, wherein said air inlet means comprises an air inlet pipe and a pressure reducing valve.
8. The euv pulse light source device with long-term stable output according to one of claims 1 to 5, wherein the laser blocking device comprises a first spectroscope, an optical trash can, a second spectroscope, a filter and a laser blocking chamber; after the higher harmonic wave is generated, the incident laser which is not converted in reaction and the generated EUV light beam are transmitted in a collinear way; adjusting the first spectroscope and the second spectroscope to reflect EUV light at a grazing incidence angle and transmit incident laser light; the transmitted incident laser is collected by an optical garbage can, or a reflector is arranged to reflect the incident laser to the outside of the cavity; and an optical filter is arranged on a reflection light path of the second spectroscope to further filter the incident laser.
9. The EUV pulse light source device with a long-term stable output according to claim 8, wherein EUV light sources of different wavelength bands can be obtained by selecting filters of different materials; the Al film filter has high transmittance in a 20-60nm wave band, and the Zr film filter has high transmittance in a 7-15nm wave band.
10. The EUV pulse light source device of claim 8, wherein the spectroscope is coated with 51nm/3nm thick Si/B4The thin film C, when the incident beam hits the spectroscope with the grazing incidence angle of 6-9 degrees, the spectroscope can reflect the light of extreme ultraviolet band with high efficiency, and the reflectance to the incident laser of 800nm is very low; when the beam splitter makes an angle of 7 degrees with the incident beam, the reflectivity of the laser beam for incidence of 800nm is less than 0.1%, and the reflectivity of the laser beam for 20nm EUV light is about 90%.
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| US20160315442A1 (en) * | 2013-09-04 | 2016-10-27 | The Regents Of The University Of Colorado, A Body Corporate | Generation of VUV, EUV, and X-ray Light Using VUV-UV-VIS Lasers |
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| CN207583247U (en) * | 2017-05-16 | 2018-07-06 | 四川九天真空科技股份有限公司 | A kind of vacuum chamber of multi-level differential sealing |
| CN109659798A (en) * | 2019-01-08 | 2019-04-19 | 南京大学 | A kind of device generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray |
| CN109638624A (en) * | 2019-01-24 | 2019-04-16 | 南京大学 | A kind of high efficiency based on ultra-short pulse laser and the continuously adjustable extreme ultraviolet generation system of wavelength |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115266650A (en) * | 2022-09-30 | 2022-11-01 | 安徽创谱仪器科技有限公司 | Spectrophotometer system |
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