CN109638624A - A kind of high efficiency based on ultra-short pulse laser and the continuously adjustable extreme ultraviolet generation system of wavelength - Google Patents
A kind of high efficiency based on ultra-short pulse laser and the continuously adjustable extreme ultraviolet generation system of wavelength Download PDFInfo
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- CN109638624A CN109638624A CN201910066739.5A CN201910066739A CN109638624A CN 109638624 A CN109638624 A CN 109638624A CN 201910066739 A CN201910066739 A CN 201910066739A CN 109638624 A CN109638624 A CN 109638624A
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- extreme ultraviolet
- pulse laser
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- high efficiency
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
- H01S3/109—Frequency multiplication, e.g. harmonic generation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
- H01S3/1083—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering using parametric generation
Abstract
The invention discloses a kind of high efficiency based on ultra-short pulse laser and extreme ultraviolet generation system that wavelength is continuously adjustable, it include: the fundamental frequency light of the ultrashort pulse laser output by optical frequency doubler or optical parametric amplifier progress wavelength convert, instrument is generated by higher hamonic wave, and the pulse laser focusing after conversion is radiated to generation higher hamonic wave on inert gas, wavelength selection, the monochromatic extreme ultraviolet of final output high-energy and high light flux are carried out by extreme ultraviolet monochromator.Stability of the present invention is high, signal-to-noise ratio is good, wavelength convert is carried out to ultrashort pulse fundamental frequency light using optical frequency doubler or optical parametric amplifier, and the higher hamonic wave that structure selects specific photon energy from high order harmonic spectrum is adjusted by spectro-grating, reflecting mirror and multidimensional, it realizes high efficiency and wavelength is continuously adjustable, the high-energy and high light flux extreme ultraviolet of generation can be used for time resolution and angle resolved photoelectron spectroscope system and extreme ultraviolet coherent diffraction imaging systematic research.
Description
Technical field
The present invention relates to a kind of high efficiency based on ultra-short pulse laser and extreme ultraviolet that wavelength is continuously adjustable generates system
System, belongs to time resolution and angle resolved photoelectron spectroscope system and extreme ultraviolet coherent diffraction imaging systems technology field.
Background technique
Time resolution and angle resolved photoelectron spectroscope system (TR-ARPES) utilize photoelectric effect research inside of solid material
Electronic band structure.Sample is detected using the extreme ultraviolet pulsed light of femtosecond magnitude in the system, sample can be obtained
Electron energy band changing rule within the scope of femtosecond magnitude time scale, this is the internal electron dynamic for studying novel electron material
Information and research ultrahigh-speed device provide a kind of effective method.In time resolution and angle resolved photoelectron spectroscope experiment,
In order to improve the signal-to-noise ratio of photoelectron spectroscopy, it is desirable that the efficiency or luminous flux that extreme ultraviolet generates are sufficiently high.Moreover, in order to comprehensive
Various semiconductors, metal and insulating materials are studied, needs extreme ultraviolet photon energy range that can cover entire valence band, conduction band and depth
Layer electronics even requires the energy of extreme ultraviolet photon to be greater than 100eV when studying certain materials (extreme ultraviolet wavelength is sufficiently small).
In addition, by a branch of extreme ultraviolet irradiation sample, being received using CCD in extreme ultraviolet coherent diffraction imaging system
Collect coherent diffraction pattern of the sample at far field, phase recovery and image weight are carried out to diffraction pattern by sampling and iterative algorithm
It builds.It is this to be widely used in terms of physics, biology and materialogy based on the coherent diffraction of extreme ultraviolet.Based on extremely purple
The resolution ratio of the coherent diffraction imaging technology of outer light and the energy of extreme ultraviolet photon are directly proportional, and photon energy is higher, resolution ratio
Also higher.
In recent years, higher hamonic wave is generated using ultra-short pulse laser excited inert gas, is time resolution and angular resolution light
Electron spectrum system and extreme ultraviolet coherent diffraction imaging provide simply, the controllable EUV light source of cost.But at these
In system, higher hamonic wave usually utilizes ultrashort pulse basic frequency laser directly to excite, lower, transfer efficiency that there is luminous fluxes compared with
The limitations such as low, photon energy is difficult breakthrough 100eV (ultraviolet wavelength is longer), lambda1-wavelength can not be continuously adjusted.
Summary of the invention
Goal of the invention: in order to overcome the deficiencies in the prior art, the present invention provides a kind of based on ultra-short pulse laser
High efficiency and the continuously adjustable extreme ultraviolet generation system of wavelength, have that stability is high, signal-to-noise ratio is good, high efficiency and wavelength connect
Continue the features such as adjustable, the high-energy and high light flux extreme ultraviolet of generation can be used for time resolution and angle resolved photoelectron spectroscope system
System and the systematic research of extreme ultraviolet coherent diffraction imaging.
Technical solution: to achieve the above object, the technical solution adopted by the present invention are as follows:
A kind of high efficiency based on ultra-short pulse laser and the continuously adjustable extreme ultraviolet generation system of wavelength, including it is ultrashort
Pulse laser, higher hamonic wave generate instrument and extreme ultraviolet monochromator；
Wherein, the fundamental frequency light of ultrashort pulse laser output by optical frequency doubler or optical parametric amplifier into
Row wavelength convert then generates instrument by higher hamonic wave and the pulse laser focusing after conversion is radiated to generation height on inert gas
Subharmonic, and wavelength selection, the monochromatic extreme ultraviolet of final output high-energy and high light flux are carried out by extreme ultraviolet monochromator
Light.
Further, the ultrashort pulse laser includes ultrashort pulse mode locking oscillator, pulse stretcher, pulse repetition
Frequency changer, cascade amplifier, pulse compression/reshaper.
Further, optical frequency-doubling system device, the fundamental frequency light for exporting ultrashort pulse laser pass through frequency multiplication crystalline substance
Body carries out frequency multiplication.According to relationship E~λ of higher hamonic wave generation efficiency E and incident light source wavelength λ(5~6), frequency multiplication after two frequencys multiplication
The efficiency of pulsed light excitation higher hamonic wave can promote 50 times or so.
Further, the optical parametric amplifier, the fundamental frequency light for exporting ultrashort pulse laser carry out wavelength
Conversion, output are longer than the laser of fundamental frequency light wave-length coverage.According to higher hamonic wave highest photon energy formula e=Ip+3.17Up,
Middle IpAnd UpThe respectively maximum kinetic energy that is obtained in laser field of the ionization energy of atom (ion) and electronics, and Up~Is×λ2, Is
For the saturation laser intensity of medium, λ is incident light source wavelength, so exciting generation high order humorous using longer wavelengths of incident light source
Wave, the highest photon energy generated are also higher.
Further, the higher hamonic wave generates the arteries and veins that instrument includes the first vacuum cavity, is arranged on the first vacuum cavity
It rushes laser input window, extreme ultraviolet output window and is sequentially arranged in the intracorporal convex lens of the first vacuum chamber, inert gas dress
It sets, the pulse laser focusing for being amplified process optical frequency-doubling or optical parameter by convex lens is into specific inert gas, Qiang Ji
Light pulse and the interaction of atom or molecular media generate higher hamonic wave.
Further, the inert gas installation includes inert gas nozzle and for adjusting inert gas nozzle position
Multi-dimensional adjusting mechanism.Multi-dimensional adjusting mechanism be mainly used for adjust nozzle position, with meet higher hamonic wave generate during
Phase matched.
Further, the extreme ultraviolet monochromator include the second vacuum cavity, the pole that is arranged on the second vacuum cavity
It ultraviolet light input window, monochromatic extreme ultraviolet output window and is sequentially arranged in the intracorporal first surface reflection of the second vacuum chamber
Mirror, balzed grating, the second curved reflector, slit.Structure is adjusted from high order harmonic spectrum by spectro-grating, reflecting mirror and multidimensional
The higher hamonic wave of middle selection specific photon energy, the size by changing slit pick out the extreme ultraviolet of different-energy and wavelength
Light.
Further, the extreme ultraviolet output window realizes vacuum by stainless steel pipes with extreme ultraviolet input window
Connection, the two are knife-edge method orchid.
The utility model has the advantages that continuously adjustable extremely purple of a kind of high efficiency based on ultra-short pulse laser provided by the invention and wavelength
Outer smooth generation system has the advantage that stability height, signal-to-noise ratio is good, using optical frequency doubler or light compared with the existing technology
Learn the fundamental frequency light that parameter amplifier export high-energy ultrashort pulse laser and carry out wavelength convert, and by spectro-grating, instead
It penetrates mirror and multidimensional adjustment structure selects the higher hamonic wave of specific photon energy from high order harmonic spectrum, realize high efficiency and wavelength connects
Continue adjustable, the high-energy and high light flux extreme ultraviolet of generation can be used for time resolution and angle resolved photoelectron spectroscope system and pole
Ultraviolet light coherent diffraction imaging systematic research.
Detailed description of the invention
Fig. 1 is overall structure diagram of the invention；
Fig. 2 is the structural schematic diagram that higher hamonic wave generates instrument in the embodiment of the present invention；
Fig. 3 is the structural schematic diagram of extreme ultraviolet monochromator in the embodiment of the present invention；
It include: 1- ultrashort pulse laser in figure, 2- optical frequency doubler, 5- optical parametric amplifier,
3- higher hamonic wave generation instrument, 3.1- pulse laser input window, 3.2- convex lens, 3.3- inert gas nozzle,
3.4- multi-dimensional adjusting mechanism, 3.5- extreme ultraviolet output window,
4- extreme ultraviolet monochromator, 4.1- extreme ultraviolet input window, 4.2- first surface reflecting mirror, 4.3- glare
Grid, the second curved reflector of 4.4-, 4.5- slit, 4.6- monochrome extreme ultraviolet output window.
Specific embodiment
The present invention will be further explained with reference to the accompanying drawings and embodiments.
Embodiment:
It is as shown in Figure 1 a kind of high efficiency based on ultra-short pulse laser and the extreme ultraviolet generation system that wavelength is continuously adjusted
System, Ti:Sapphire laser ultrashort pulse laser 1, higher hamonic wave including high-energy generate instrument 3 and extreme ultraviolet monochromator 4；
Wherein, the fundamental frequency light that the ultrashort pulse laser 1 exports passes through optical frequency doubler 2 or optical parametric amplifier
5 carry out wavelength convert, then generate instrument 3 by higher hamonic wave and the pulse laser focusing after conversion is radiated to production on inert gas
Raw higher hamonic wave, and wavelength selection, the monochromatic pole of final output high-energy and high light flux are carried out by extreme ultraviolet monochromator 4
Ultraviolet light.
In the present embodiment, the ultrashort pulse laser 1 includes ultrashort pulse mode locking oscillator, pulse stretcher, pulse
Repetition rate converter, cascade amplifier, pulse compression/reshaper, for generating femtosecond magnitude, energy as the super of several millijoules
Short pulse fundamental frequency light；
Optical frequency-doubling system device, the fundamental frequency light for exporting ultrashort pulse laser 1 are carried out again by frequency-doubling crystal
Frequently；
The optical parametric amplifier 5, the fundamental frequency light for exporting ultrashort pulse laser 1 carries out wavelength convert, defeated
It is longer than the laser of fundamental frequency light wave-length coverage out.
Include the first vacuum cavity, be arranged on the first vacuum cavity as shown in Fig. 2, the higher hamonic wave generates instrument 3
Pulse laser input window 3.1, extreme ultraviolet output window 3.5 and be sequentially arranged in the intracorporal convex lens 3.2 of the first vacuum chamber,
Inert gas installation；The inert gas installation includes inert gas nozzle 3.3 and for adjusting 3.3 position of inert gas nozzle
Multi-dimensional adjusting mechanism 3.4.
In the present embodiment, the focal length of the convex lens 3.2 is equal to 400mm, and for focusing incident pulse laser, focus is lazy
Property 3.3 center of gas nozzle；The position that multi-dimensional adjusting mechanism 3.4 is mainly used for adjusting nozzle (can be one-dimensional, two-dimentional or three
Tie up the adjustment on direction), to meet the phase matched during higher hamonic wave generates.
As shown in figure 3, the extreme ultraviolet monochromator 4 includes the second vacuum cavity, is arranged on the second vacuum cavity
It extreme ultraviolet input window 4.1, monochromatic extreme ultraviolet output window 4.6 and is sequentially arranged bent in the second vacuum chamber intracorporal first
Face reflecting mirror 4.2, balzed grating, 4.3, the second curved reflector 4.4, slit 4.5.
In the present embodiment, extreme ultraviolet input window 4.1 and previous stage higher hamonic wave generate the extreme ultraviolet in instrument 3 and export
Window 3.5 is connected, and due to being in vacuum system, the two is knife-edge method orchid, is connected by stainless steel pipes.
Incident light by beating on balzed grating, 4.3 after the collimation of first surface reflecting mirror 4.2, make by the light splitting of balzed grating,
With enabling extreme ultraviolet to be spatially separated out, is then converged, focused on adjustable by the second curved reflector 4.4 again
At slit 4.5, the size by changing slit picks out the extreme ultraviolet of different-energy and wavelength.
The present invention can use optical frequency doubler, and the fundamental frequency light of high-energy ultrashort pulse laser output is passed through frequency multiplication crystalline substance
Body carries out frequency multiplication, and frequency doubled light can obtain tremendous increase compared to its higher hamonic wave generation efficiency of fundamental frequency light；Optics can also be used
The fundamental frequency light of high-energy ultrashort pulse laser output is carried out wavelength convert by parameter amplifier, exportable to be longer than fundamental light wave
The laser of long range, using longer wavelengths of incident light source excite generate higher hamonic wave, generate highest photon energy also compared with
It is high.
The above is only a preferred embodiment of the present invention, it should be pointed out that: for the ordinary skill people of the art
For member, various improvements and modifications may be made without departing from the principle of the present invention, these improvements and modifications are also answered
It is considered as protection scope of the present invention.
Claims (8)
1. the extreme ultraviolet generation system that a kind of high efficiency based on ultra-short pulse laser and wavelength are continuously adjusted, feature exist
In, including ultrashort pulse laser (1), higher hamonic wave generation instrument (3) and extreme ultraviolet monochromator (4)；
Wherein, the fundamental frequency light of ultrashort pulse laser (1) output passes through optical frequency doubler (2) or optical parametric amplifier
(5) carry out wavelength convert, then by higher hamonic wave generation instrument (3) by the pulse laser focusing after conversion the spoke on inert gas
It penetrates generation higher hamonic wave, and carries out wavelength selection by extreme ultraviolet monochromator (4), final output high-energy and high light flux
Monochromatic extreme ultraviolet.
2. the extreme ultraviolet that a kind of high efficiency based on ultra-short pulse laser and wavelength are continuously adjusted according to claim 1 produces
Raw system, which is characterized in that the ultrashort pulse laser (1) includes ultrashort pulse mode locking oscillator, pulse stretcher, pulse
Repetition rate converter, cascade amplifier, pulse compression/reshaper.
3. the extreme ultraviolet that a kind of high efficiency based on ultra-short pulse laser according to claim 1 and wavelength are continuously adjusted
Generation system, which is characterized in that optical frequency-doubling system device, for the fundamental frequency light that ultrashort pulse laser (1) exports to be passed through
Frequency-doubling crystal carries out frequency multiplication.
4. the extreme ultraviolet that a kind of high efficiency based on ultra-short pulse laser according to claim 1 and wavelength are continuously adjusted
Generation system, which is characterized in that the optical parametric amplifier (5), the fundamental frequency light for exporting ultrashort pulse laser (1)
Wavelength convert is carried out, output is longer than the laser of fundamental frequency light wave-length coverage.
5. the extreme ultraviolet that a kind of high efficiency based on ultra-short pulse laser according to claim 1 and wavelength are continuously adjusted
Generation system, which is characterized in that the higher hamonic wave generates instrument (3) and includes the first vacuum cavity, is arranged in the first vacuum cavity
On pulse laser input window (3.1), extreme ultraviolet output window (3.5) and be sequentially arranged intracorporal convex in the first vacuum chamber
Lens (3.2), inert gas installation.
6. the extreme ultraviolet that a kind of high efficiency based on ultra-short pulse laser according to claim 5 and wavelength are continuously adjusted
Generation system, which is characterized in that the inert gas installation includes inert gas nozzle (3.3) and sprays for adjusting inert gas
The multi-dimensional adjusting mechanism (3.4) of mouth (3.3) position.
7. the extreme ultraviolet that a kind of high efficiency based on ultra-short pulse laser according to claim 6 and wavelength are continuously adjusted
Generation system, which is characterized in that the extreme ultraviolet monochromator (4) includes the second vacuum cavity, is arranged in the second vacuum cavity
On extreme ultraviolet input window (4.1), monochromatic extreme ultraviolet output window (4.6) and be sequentially arranged in the second vacuum cavity
First surface reflecting mirror (4.2), balzed grating, (4.3), the second curved reflector (4.4), slit (4.5).
8. the extreme ultraviolet that a kind of high efficiency based on ultra-short pulse laser according to claim 7 and wavelength are continuously adjusted
Generation system, which is characterized in that the extreme ultraviolet output window (3.5) passes through stainless with extreme ultraviolet input window (4.1)
Steel conduit realizes bonding in vacuum.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910066739.5A CN109638624A (en) | 2019-01-24 | 2019-01-24 | A kind of high efficiency based on ultra-short pulse laser and the continuously adjustable extreme ultraviolet generation system of wavelength |
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| CN201910066739.5A CN109638624A (en) | 2019-01-24 | 2019-01-24 | A kind of high efficiency based on ultra-short pulse laser and the continuously adjustable extreme ultraviolet generation system of wavelength |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114221203A (en) * | 2021-09-30 | 2022-03-22 | 南京大学 | Extreme ultraviolet pulse light source device with long-time stable output |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010084202A1 (en) * | 2009-01-26 | 2010-07-29 | Centre National De La Recherche Scientifique -Cnrs- | Coherent ultra-short ultraviolet or extended ultraviolet pulse generating systems |
| CN103560388A (en) * | 2013-11-05 | 2014-02-05 | 温州大学 | Device and method for producing high-order harmonic super-continuum spectrum |
| CN105305209A (en) * | 2015-11-04 | 2016-02-03 | 南京大学 | Extreme ultraviolet ultrafast time-resolved photoelectron spectroscopy system with high repetition frequency |
| CN106756810A (en) * | 2017-01-04 | 2017-05-31 | 南京大学 | A kind of test integrated system of the growth of material |
| CN107210579A (en) * | 2015-02-17 | 2017-09-26 | 诺华股份有限公司 | Femtosecond ultraviolet laser |
-
2019
- 2019-01-24 CN CN201910066739.5A patent/CN109638624A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010084202A1 (en) * | 2009-01-26 | 2010-07-29 | Centre National De La Recherche Scientifique -Cnrs- | Coherent ultra-short ultraviolet or extended ultraviolet pulse generating systems |
| CN103560388A (en) * | 2013-11-05 | 2014-02-05 | 温州大学 | Device and method for producing high-order harmonic super-continuum spectrum |
| CN107210579A (en) * | 2015-02-17 | 2017-09-26 | 诺华股份有限公司 | Femtosecond ultraviolet laser |
| CN105305209A (en) * | 2015-11-04 | 2016-02-03 | 南京大学 | Extreme ultraviolet ultrafast time-resolved photoelectron spectroscopy system with high repetition frequency |
| CN106756810A (en) * | 2017-01-04 | 2017-05-31 | 南京大学 | A kind of test integrated system of the growth of material |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114221203A (en) * | 2021-09-30 | 2022-03-22 | 南京大学 | Extreme ultraviolet pulse light source device with long-time stable output |
| CN114221203B (en) * | 2021-09-30 | 2023-11-03 | 南京大学 | Extreme ultraviolet pulse light source device capable of outputting long-time stability |
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Application publication date: 20190416 |