CN109659798A - A kind of device generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray - Google Patents
A kind of device generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray Download PDFInfo
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- CN109659798A CN109659798A CN201910013953.4A CN201910013953A CN109659798A CN 109659798 A CN109659798 A CN 109659798A CN 201910013953 A CN201910013953 A CN 201910013953A CN 109659798 A CN109659798 A CN 109659798A
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- extreme ultraviolet
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- 238000012544 monitoring process Methods 0.000 claims abstract description 15
- 230000003993 interaction Effects 0.000 claims abstract description 6
- 238000006243 chemical reaction Methods 0.000 claims description 11
- 238000003384 imaging method Methods 0.000 claims description 9
- 238000002955 isolation Methods 0.000 claims description 7
- 238000009434 installation Methods 0.000 claims description 4
- 238000005553 drilling Methods 0.000 claims description 3
- 238000009738 saturating Methods 0.000 claims description 2
- 238000011160 research Methods 0.000 abstract description 4
- 238000005259 measurement Methods 0.000 abstract description 3
- 238000001420 photoelectron spectroscopy Methods 0.000 abstract description 2
- 230000015556 catabolic process Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 36
- 238000002474 experimental method Methods 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 230000005469 synchrotron radiation Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 210000001367 artery Anatomy 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 210000003462 vein Anatomy 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0092—Nonlinear frequency conversion, e.g. second harmonic generation [SHG] or sum- or difference-frequency generation outside the laser cavity
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/3501—Constructional details or arrangements of non-linear optical devices, e.g. shape of non-linear crystals
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- X-Ray Techniques (AREA)
Abstract
The invention discloses a kind of devices for generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray, comprising: the femto-second laser of the Superhigh repetition rate is used to export the laser pulse of femtosecond magnitude, and repetition rate reaches as high as MHz；The focusing optic by laser pulse for guiding and focusing in the intracorporal continuity gas device of vacuum chamber；The continuity gas device is used to discharge gas and generates femtosecond extreme ultraviolet ray after interacting with the laser pulse after focusing；The vacuum system is for absorbing excessive gas in gas device, it is ensured that the vacuum degree in device；The monitoring system is used to monitor the interaction of laser and gas device, and avoiding device is by laser breakdown.The configuration of the present invention is simple, it is convenient to operate, and being formed by high-throughput and Superhigh repetition rate extreme ultraviolet ray has the other pulse width of femtosecond, can provide high-quality light source for the scientific instrument application such as photoelectron spectroscopy, measurement efficiency is greatly improved, ultrafast area research is facilitated.
Description
Technical field
The present invention relates to a kind of device for generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray, belong to extremely purple
Outer ray field.
Background technique
Being constantly progressive and develop with science and technology, extreme ultraviolet ray even X-ray are obtained in numerous areas
It is widely applied, such as photoelectron spectroscopy, extreme ultraviolet photolithographic etc..Past extreme ultraviolet ray can only by synchrotron radiation light source or again
The equipment such as frequency crystal generate.Synchrotron radiation light source can satisfy the requirement of many scientific experiments, but its equipment is huge, and when machine is tight
, and pulse width is longer, therefore has many limitations in practical applications.Although in addition can by the way of frequency-doubling crystal
Overcome the problems, such as pulse width, but wave-length coverage is relatively narrow, is difficult to meet the requirement of wide range in scientific experiment.
Appearance and higher hamonic wave progress of research with femto-second laser, light laser and inert gas interaction generate
The wide range extreme ultraviolet ray of femtosecond is possibly realized.But at present experimental facilities mostly use greatly impulse jet nozzle release inert gas and
Laser interaction, although this impulse jet nozzle can control the vacuum degree of vacuum cavity well, efficiency is very low, therefore
This extreme ultraviolet ray is mostly low-repetition-frequency, the lesser extreme ultraviolet ray of luminous flux, and which greatly limits in scientific experiment
Efficiency is also unable to satisfy the requirement of photoetching technique center high pass amount.
Summary of the invention
Goal of the invention: in order to overcome the deficiencies in the prior art, it is high-throughput that the present invention provides a kind of generation femtosecond
With the device of Superhigh repetition rate extreme ultraviolet ray, there are the spies such as structure is simple, operation is convenient, occupies little space, is cheap
Point greatly improves the measurement efficiency of scientific instrument, helps to carry out the research topic in ultrafast field.
Technical solution: to achieve the above object, the technical solution adopted by the present invention are as follows:
A kind of device generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray, including Superhigh repetition rate
Femto-second laser, focusing optic, continuity gas device, vacuum cavity, vacuum system and monitoring system；
Wherein, the femto-second laser of the Superhigh repetition rate repeats frequency for exporting the other laser pulse of femtosecond
Rate reaches as high as MHz；
The focusing optic by laser pulse for guiding and focusing to the intracorporal continuity gas device of vacuum chamber
In；
The continuity gas device, which is used to discharge gas, flies it with generation after the laser pulse interaction after focusing
Second grade extreme ultraviolet ray；
The vacuum system is used to absorb the excessive gas of continuity gas device release, it is ensured that the intracorporal vacuum of vacuum chamber
Degree；
Relative position and laser pulse of the monitoring system for monitoring laser pulse and continuity gas device are saturating
Penetrated the facula position and shape of continuity gas device.
Preferably, the focusing optic includes off axis paraboloidal mirror or short focus plano-convex lens.
Preferably, the continuity gas device includes outer layer protection cavity and to be connected to outer layer protection chamber intracorporal continuous
Gas nozzle.
Preferably, the continuity gas nozzle uses needle point formula nozzle or hole drilling type nozzle.
Preferably, the calibrating installation passed through completely for ensuring laser is provided on the outer layer protection cavity.
Preferably, the vacuum system includes that vacuum pump and vibration isolation hose, vacuum pump are inhaled by vibration isolation hose
Receive the excessive gas discharged in continuity gas device.
Preferably, the monitoring system includes CCD imaging system, computer and the form being arranged on vacuum cavity, is led to
It crosses the CCD imaging system being connected with computer and acquires the intracorporal image of vacuum chamber through form.
Preferably, the vacuum cavity includes the anti-reflection window on vacuum reaction chamber and vacuum reaction chamber, laser pulse
It is intracavitary to enter vacuum reaction by anti-reflection window, to guarantee that pulse width does not broaden, and most of energy enters inside cavity.
The utility model has the advantages that a kind of dress for generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray provided by the invention
It sets, compared with the existing technology, has the advantage that 1, structure is simple, it is convenient to operate, and occupies little space, and it is cheap, it provides super
The extreme ultraviolet ray of high repetition frequency, substantially increases the measurement efficiency of the scientific instrument such as electron spectrum；2, it is high to provide femtosecond
The extreme ultraviolet ray of flux meets the application that all multipair flux require, such as ultraviolet photolithographic；3, femtosecond pulse width is provided
Extreme ultraviolet ray, improve the temporal resolution of scientific instrument, help to carry out the research topic in ultrafast field.
Detailed description of the invention
Fig. 1 is the overall structure diagram in the present invention；
Fig. 2 is the structural schematic diagram of the embodiment of the present invention；
It include: the femto-second laser of 1- Superhigh repetition rate in figure,
2- focusing optic, the plane mirror of 2.1- high reflectance, 2.2- off axis paraboloidal mirror,
3- continuity gas device, 3.1- outer layer protection cavity, 3.2- continuous gas nozzle,
4- vacuum system, 4.1- vacuum pump, 4.2- vibration isolation hose,
5- monitoring system, 5.1- form, 5.2-CCD imaging system, 5.3- computer,
6- vacuum cavity, 6.1- vacuum reaction chamber, 6.2- is anti-reflection window.
Specific embodiment
The present invention will be further explained with reference to the accompanying drawings and embodiments.
It is as shown in Figure 1 a kind of device for generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray, including super
The femto-second laser 1 of high repetition frequency, focusing optic 2, continuity gas device 3, vacuum system 4, monitoring system 5 and true
Cavity body 6；
Wherein, the femto-second laser 1 of the Superhigh repetition rate repeats frequency for exporting the other laser pulse of femtosecond
Rate reaches as high as MHz；
Laser pulse for being guided and being focused to the dress of the continuity gas in vacuum cavity 6 by the focusing optic 2
It sets in 3；
The continuity gas device 3, which is used to discharge gas, flies it with generation after the laser pulse interaction after focusing
Second grade extreme ultraviolet ray；
The vacuum system 4 is used to absorb the excessive gas of the release of continuity gas device 3, it is ensured that in vacuum cavity 6
Vacuum degree；
The monitoring system 5 is used to monitor relative position and the laser pulse of laser pulse and continuity gas device 3
Transmitted through the facula position and shape of continuity gas device 3.
In preferred embodiment as shown in Figure 2, the plane mirror 2.1 of the focusing optic 2 including high reflectance and from
Axis paraboloidal mirror 2.2；
The continuity gas device 3 includes outer layer protection cavity 3.1 and is connected to continuous in outer layer protection cavity 3.1
Gas nozzle 3.2；
The vacuum system 4 includes vacuum pump 4.1 and vibration isolation hose 4.2, and vacuum pump 4.1 passes through vibration isolation hose
The excessive gas discharged in 4.2 absorption continuity gas devices 3；
The monitoring system 5 includes the form 5.1 on CCD imaging system 5.2, computer 5.3 and vacuum cavity 6, is passed through
The CCD imaging system 5.2 being connected with computer 5.3 acquires the image in vacuum cavity 6 through form 5.1；
The vacuum cavity 6 includes vacuum reaction chamber 6.1 and the anti-reflection window 6.2 being arranged on vacuum reaction chamber 6.1,
Laser pulse is entered in vacuum reaction chamber 6.1 by anti-reflection window 6.2.
In the present embodiment, the continuous gas nozzle 3.2 uses needle point formula nozzle or hole drilling type nozzle；The outer layer is protected
The calibrating installation passed through completely for ensuring laser is provided on shield cavity 3.1.
A specific embodiment of the invention is as follows:
The central wavelength of femto-second laser is 1030nm, repetition rate 1MHz, after being compressed by hollow optical fiber, arteries and veins
Width is rushed less than 40fs, single pulse energy can reach 0.7mJ.The femtosecond laser of Superhigh repetition rate is by the flat of high reflectance
Face mirror 2.1 reflects, and minimum hot spot is focused into using off axis paraboloidal mirror 2.2, the mean intensity of focal zone laser is big
In 1014W/cm2.Laser is needed when entering vacuum reaction chamber 6.1 through anti-reflection window 6.2, and guarantee pulse width does not broaden, and
Most of energy enters inside cavity.After femtosecond laser enters cavity, the calibrating installation in continuity gas device 3 is adjusted, is made
It obtains femtosecond laser and passes through outer layer protection cavity 3.1 like clockwork, the gas then released with continuous gas nozzle 3.2 is mutual
Effect generates femtosecond extreme ultraviolet ray.
It should be noted that monitoring whether laser completely passes through by monitoring system 5 when adjusting continuity gas device
Continuity gas device 3, the interior metal without bombarding device.Through form 5.1, CCD imaging system can be observed constantly
To the laser position and light spot shape through gas device.Excessive gas is ceaselessly absorbed additionally by vacuum system, it can not only
It is enough that extra gas is prevented to absorb extreme ultraviolet ray in time, and can guarantee the intracorporal vacuum degree of vacuum chamber.
It is measured through experiment, in the present embodiment, apparatus of the present invention can generate pulse less than 40fs, and repetition rate is up to
1MHz, luminous flux is up to 1013-1014The extreme ultraviolet ray of photons/second.
In above-mentioned apparatus, used optical element and its quantity are only schematical, and use can play phase same-action
Other art-recognized components the purpose of the present invention equally may be implemented.For example, laser used can be by superpower
Other femto-second lasers commonly used by laser field are substituted.The conditions such as wavelength, frequency for laser, do not limit strictly
System, those of ordinary skill in the art can select as the case may be under the enlightenment of the present embodiment.In addition, off-axis paraboloidal mirror
It can also be substituted by other focusing optics such as spherical surface focusing mirror, long focus lens, they can carry out laser
It focuses, but off-axis paraboloidal mirror can eliminate the aberration during laser transmission, and be able to bear higher less laser energy value of threshold,
Therefore as preferred.CCD imaging system needs to pay attention to damage of the laser for CCD when monitoring laser position, has to infuse
Meaning decaying.
In conclusion the device of the extreme ultraviolet ray of femtosecond high throughput proposed by the present invention and Superhigh repetition rate, knot
Structure is simple, and it is convenient to operate, and occupies little space, cheap, compared with synchrotron radiation source, X-ray tube etc., has significantly excellent.To the greatest extent
Pipe has made specific descriptions to the present invention referring to the above embodiments, but for those of ordinary skill in the art, it answers
The understanding can be modified or be improved based on present disclosure within spirit and scope of the invention not departing from.
The above is only a preferred embodiment of the present invention, it should be pointed out that: for the ordinary skill people of the art
For member, various improvements and modifications may be made without departing from the principle of the present invention, these improvements and modifications are also answered
It is considered as protection scope of the present invention.
Claims (8)
1. a kind of device for generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray, which is characterized in that including superelevation
The femto-second laser (1) of repetition rate, focusing optic (2), continuity gas device (3), vacuum system (4), monitoring system
System (5) and vacuum cavity (6)；
Wherein, the femto-second laser (1) of the Superhigh repetition rate is for exporting the other laser pulse of femtosecond, repetition rate
Up to MHz；
Laser pulse for being guided and being focused to the dress of the continuity gas in vacuum cavity (6) by the focusing optic (2)
It sets in (3)；
The continuity gas device (3), which is used to discharge gas, to be made it and generates femtosecond after the laser pulse interaction after focusing
Grade extreme ultraviolet ray；
The vacuum system (4) is used to absorb the excessive gas of continuity gas device (3) release, it is ensured that in vacuum cavity (6)
Vacuum degree；
The monitoring system (5) is used to monitor relative position and the laser pulse of laser pulse and continuity gas device (3)
Transmitted through the facula position and shape of continuity gas device (3).
2. a kind of device for generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray according to claim 1,
It is characterized in that, the focusing optic (2) includes off axis paraboloidal mirror (2.2) or short focus plano-convex lens.
3. a kind of device for generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray according to claim 1,
It is characterized in that, the continuity gas device (3) includes outer layer protection cavity (3.1) and is connected to outer layer protection cavity
(3.1) the continuous gas nozzle (3.2) in.
4. a kind of device for generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray according to claim 3,
It is characterized in that, the continuous gas nozzle (3.2) uses needle point formula nozzle or hole drilling type nozzle.
5. a kind of device for generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray according to claim 3,
It is characterized in that, being provided with the calibrating installation passed through completely for ensuring laser on the outer layer protection cavity (3.1).
6. a kind of device for generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray according to claim 1,
It is characterized in that, the vacuum system (4) includes vacuum pump (4.1) and vibration isolation hose (4.2), vacuum pump (4.1) passes through
Vibration isolation hose (4.2) absorbs the excessive gas discharged in continuity gas device (3).
7. a kind of device for generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray according to claim 1,
It is characterized in that, the monitoring system (5) includes CCD imaging system (5.2), computer (5.3) and is arranged in vacuum cavity (6)
On form (5.1), vacuum chamber is acquired through form (5.1) by the CCD imaging system (5.2) that is connected with computer (5.3)
Image in body (6).
8. a kind of device for generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray according to claim 1,
It is characterized in that, the vacuum cavity (6) includes vacuum reaction chamber (6.1) and the increasing that is arranged on vacuum reaction chamber (6.1)
Saturating window (6.2), laser pulse are entered in vacuum reaction chamber (6.1) by anti-reflection window (6.2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910013953.4A CN109659798A (en) | 2019-01-08 | 2019-01-08 | A kind of device generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910013953.4A CN109659798A (en) | 2019-01-08 | 2019-01-08 | A kind of device generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray |
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| CN109659798A true CN109659798A (en) | 2019-04-19 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114221203A (en) * | 2021-09-30 | 2022-03-22 | 南京大学 | Extreme ultraviolet pulse light source device with long-time stable output |
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|---|---|---|---|---|
| CN102185250A (en) * | 2010-12-02 | 2011-09-14 | 中国科学院物理研究所 | Device and method for generating femtosecond time-resolved X-ray source |
| CN104638505A (en) * | 2015-02-10 | 2015-05-20 | 华中科技大学 | Method and device for generating broadband continuously tunable coherent extreme ultraviolet source |
| CN209266823U (en) * | 2019-01-08 | 2019-08-16 | 南京大学 | A kind of device generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray |
-
2019
- 2019-01-08 CN CN201910013953.4A patent/CN109659798A/en active Pending
Patent Citations (3)
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|---|---|---|---|---|
| CN102185250A (en) * | 2010-12-02 | 2011-09-14 | 中国科学院物理研究所 | Device and method for generating femtosecond time-resolved X-ray source |
| CN104638505A (en) * | 2015-02-10 | 2015-05-20 | 华中科技大学 | Method and device for generating broadband continuously tunable coherent extreme ultraviolet source |
| CN209266823U (en) * | 2019-01-08 | 2019-08-16 | 南京大学 | A kind of device generating femtosecond high throughput and Superhigh repetition rate extreme ultraviolet ray |
Non-Patent Citations (1)
| Title |
|---|
| A CABASSE 等: "Collection and spectral control of high-order harmonics generated with a 50W high-repetition rate Ytterbium femtosecond laser system", 《JOURNAL OF PHYSICS B: ATOMIC, MOLECULAR AND OPTICAL PHYSICS》, pages 1 - 4 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114221203A (en) * | 2021-09-30 | 2022-03-22 | 南京大学 | Extreme ultraviolet pulse light source device with long-time stable output |
| CN114221203B (en) * | 2021-09-30 | 2023-11-03 | 南京大学 | Extreme ultraviolet pulse light source device capable of outputting long-time stability |
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