CN114150272B - Self-cleaning device of evaporation table for semiconductor processing - Google Patents
Self-cleaning device of evaporation table for semiconductor processing Download PDFInfo
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- CN114150272B CN114150272B CN202111466085.9A CN202111466085A CN114150272B CN 114150272 B CN114150272 B CN 114150272B CN 202111466085 A CN202111466085 A CN 202111466085A CN 114150272 B CN114150272 B CN 114150272B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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Abstract
The invention belongs to the technical field of semiconductor processing, and particularly relates to a self-cleaning device of an evaporation table for semiconductor processing, which comprises an evaporation table body, a moving structure, an installation underframe, a lifting cylinder, an electric base, a vertical beam frame, a cleaning structure and a dust removal structure, wherein the moving structure is arranged on the outer side of the evaporation table body, the installation underframe is installed at one end of the moving structure, the lifting cylinder is installed in the center of the end surface of the installation underframe, the electric base is arranged above the top of the lifting cylinder, and the vertical beam frame is fixedly installed in the center of the end surface of the top of the electric base; through the in-process that the removal structure was removing, make lift cylinder and electronic base can adjust the height and the turned angle of erector frame, make the position of cleaning structure and dust removal structure take place to adjust, make clean structure and dust removal structure can clean the dust removal with the different positions at evaporation table body top, effectively avoid remaining the problem at clean dead angle, have good automatically cleaning effect.
Description
Technical Field
The invention belongs to the technical field of semiconductor processing, and particularly relates to a self-cleaning device of an evaporation table for semiconductor processing.
Background
The semiconductor refers to a material having a conductivity between a conductor and an insulator at normal temperature. Semiconductors are used in the fields of integrated circuits, consumer electronics, communication systems, photovoltaic power generation, lighting, high-power conversion, etc., for example, diodes are devices fabricated using semiconductors. In the process of semiconductor processing, the original sheet needs to be subjected to evaporation coating process treatment.
The evaporation coating is a process of heating a metal with a low melting point so that the metal on an evaporation table is evaporated and attached to a wafer to be processed to form a coating.
The invention can make the gas phase metal formed in the evaporation process contact the side end surface and the upper end surface of the working chamber, and then form liquid phase metal drop by cooling and can be recycled, thereby on one hand, avoiding the inner wall of the working chamber from being stained with the gas phase metal for a long time to form dirt, on the other hand, improving the waste of raw materials.
Aiming at the problems in the invention, in the process of coating the film on the evaporation table, the waste material generated by coating the film is accumulated on the surface of the evaporation table, and the waste material is inconvenient to clean after being solidified; in addition, in the cleaning process, the condition of cleaning dead angles is easy to remain.
Therefore, the invention provides a self-cleaning device of an evaporation table for semiconductor processing.
Disclosure of Invention
In order to make up for the defects of the prior art, the problems that waste materials generated by coating can be accumulated on the surface of an evaporation table in the coating process of the evaporation table and the waste materials are inconvenient to clean after being solidified are solved; the invention also provides a self-cleaning device of the evaporation table for semiconductor processing, which solves the problem that the situation of cleaning dead angles is easy to remain in the cleaning process.
The technical scheme adopted by the invention for solving the technical problems is as follows: the invention relates to a self-cleaning device of an evaporation table for semiconductor processing, which comprises an evaporation table body, a moving structure, an installation bottom frame, a lifting cylinder, an electric base, a vertical beam frame, a cleaning structure and a dust removing structure, wherein the moving structure is arranged at the outer side of the evaporation table body, the installation bottom frame is arranged at one end of the moving structure, the lifting cylinder is arranged in the center of the end surface of the installation bottom frame, the electric base is arranged above the top of the lifting cylinder, the vertical beam frame is fixedly arranged in the center of the end surface of the top of the electric base, the cleaning structure is arranged at one side of the end surface of the vertical beam frame, the dust removing structure is arranged above the end surface of the vertical beam frame, and the dust removing structure is fixedly connected with the installation bottom frame; clean the structure and include motor support, first rotation motor, transmission end cover, clean axle, clean cover and clean brush, the motor support passes through bolt fixed mounting in outer wall one side of erector frame, first rotation motor is installed to the medial extremity face of motor support, the one end motor shaft of first rotation motor has the axle of cleaning through shaft coupling fixed mounting, a side end face of erector frame has the transmission end cover through screw fixed mounting, and the one end of cleaning the axle passes the transmission end cover and connects and install clean cover, and the outside fixed mounting of clean cover has clean brush.
Preferably, the moving structure comprises an adjusting groove, an electric guide rail, an adjusting sliding seat and a follow-up frame, the adjusting groove is formed in the center of the outer wall of the evaporation table body, the electric guide rail is fixedly mounted in the center of the inner wall of the adjusting groove, the adjusting sliding seat is mounted on the outer side of the electric guide rail, the follow-up frame is fixedly mounted on the end face of the outer side of the adjusting sliding seat, and the mounting bottom frame is fixedly connected with the follow-up frame through bolts.
Preferably, wear pads are attached to the top end face and the bottom end face of the adjusting groove.
Preferably, the motor support is of an L-shaped structure, a heat dissipation plate is fixedly mounted on the inner side end face of the motor support through screws, and the first rotating motor is fixedly connected with the end face of the heat dissipation plate through screws.
Preferably, a transmission through hole is formed in the center of the end face of the vertical beam frame, a transmission shaft sleeve is fixedly mounted inside the transmission through hole, and the outer wall of the cleaning shaft is connected with the inner wall of the transmission shaft sleeve in a fitting mode.
Preferably, the dust removing structure comprises a fixed wall plate, an air delivery pump, a telescopic pipe sleeve, an injection pipe, an adjusting arm, a clamping pipe, a filtering nozzle, a rotating seat, a second rotating motor and a third rotating motor, wherein the fixed wall plate is installed on one side of the outer wall of the installation underframe through a screw, the air delivery pump is fixedly installed in the center of the inner side end face of the fixed wall plate through a screw, the telescopic pipe sleeve is installed at one end of the top of the air delivery pump in a connected mode, the injection pipe is installed at one end of the top of the telescopic pipe sleeve through the end face of the top of the fixed wall plate in a connected mode, the adjusting arm is installed at one end of the injection pipe through a transmission end cover in a connected mode, the rotating seat is arranged on the inner side of one end of the top of the adjusting arm, the clamping pipe is installed at the end face of the bottom of the rotating seat in an inserted mode, a communication hole is formed in the adjusting arm, and one end of the injection pipe penetrates through the communication hole to be connected with the clamping pipe, and the bottom end face of the clamping pipe is connected with and provided with a filtering nozzle.
Preferably, the second rotating motor is installed at one end of the top of the adjusting arm, a motor shaft at one end of the second rotating motor penetrates through the adjusting arm and is fixedly connected with the rotating seat, a third rotating motor is fixedly installed at the top of the outer side of the vertical beam frame, and a motor shaft at one end of the third rotating motor penetrates through the vertical beam frame and is fixedly connected with the adjusting arm.
Preferably, one end of the transmission end cover is fixedly provided with two limiting hooks through welding, and the inner walls of the limiting hooks are attached to the outer wall of the blowing pipe.
The invention has the following beneficial effects:
according to the self-cleaning device of the evaporation table for semiconductor processing, during work, the mounting underframe can move on the outer side of the evaporation table body through the moving structure, and in the moving process, the height and the rotating angle of the vertical beam frame can be adjusted through the lifting cylinder and the electric base, so that the positions of the cleaning structure and the dust removing structure on the outer side of the vertical beam frame can be adjusted, different positions on the top of the evaporation table body can be cleaned and dedusted through the cleaning structure and the dust removing structure, and the problem of residual cleaning dead angles is effectively avoided;
when the first rotating motor works, the cleaning shaft rotates through the motor shaft and the coupler, when the cleaning shaft rotates inside the transmission shaft sleeve, the cleaning brush can effectively avoid abrasion of the cleaning shaft on the vertical beam frame, and when the cleaning shaft drives the cleaning sleeve and the cleaning brush to rotate outside the transmission end cover, dust at the outer side of the surface of the evaporation table body can be cleaned by the cleaning brush, the transmission end cover can protect the transmission shaft sleeve, so that the dust is prevented from entering the inside of the transmission shaft sleeve and affecting the transmission stability of the cleaning shaft; the air delivery pump in the fixed wall plate works to deliver outside air to the inside of the injection pipe through the telescopic pipe sleeve, when the third rotating motor on the outer side of the vertical beam frame works, the angle of the adjusting arm at the top of the vertical beam frame is changed through the motor shaft, and the injection pipe at one end of the adjusting arm pulls the telescopic pipe sleeve, so that the injection pipe has a certain displacement effect through the telescopic pipe sleeve, the injection pipe can be limited through the limiting hook, and the situation that the injection pipe is staggered in the moving process is avoided; when the second rotating motor at the top of the adjusting arm works, the angle of the rotating seat can be adjusted through the motor shaft, so that the blowing position of the clamping pipe and the filtering nozzle at the bottom of the rotating seat is changed, the air flow conveyed to the inside of the clamping pipe through the blowing pipe is blown to the top end face of the evaporation table body through the filtering nozzle, the dust and the waste materials on the end face of the evaporation table body can be separated from the surface of the evaporation table body, and the filtering nozzle can also effectively prevent the waste materials from being sputtered into the clamping pipe; the adjusting slide seat moves on the outer side of the electric guide rail, the electric guide rail is arranged in the adjusting groove, so that the adjusting slide seat can be installed on a circular track to move when moving, and the follow-up frame on the outer side of the adjusting slide seat is fixedly connected with the installation underframe, so that the cleaning structure above the top of the installation underframe can clean the outer side position of the surface of the evaporation table body; and make dust removal structure can spray the dust removal to the position of evaporating station body surface inboard, rethread lift cylinder and electronic base adjust the height and the angle of erector roof beam frame to can have good clean effect to the surface of evaporating station body, avoid having the condition at clean dead angle.
Drawings
The invention will be further described with reference to the accompanying drawings.
FIG. 1 is an overall front perspective view of the present invention;
FIG. 2 is an overall side perspective view of the present invention;
FIG. 3 is an overall front view of the present invention;
FIG. 4 is an overall rear view of the present invention;
FIG. 5 is an overall top view of the present invention;
FIG. 6 is an overall cross-sectional view of the present invention;
in the figure: 1. an evaporation table body; 2. a moving structure; 3. installing a bottom frame; 4. a lifting cylinder; 5. an electric base; 6. a stringer frame; 7. a cleaning structure; 8. a dust removal structure; 21. an adjustment groove; 22. an electric rail; 23. adjusting the sliding seat; 24. a follow-up frame; 71. a motor bracket; 72. a first rotating electric machine; 73. a driving shaft sleeve; 74. a transmission end cover; 75. cleaning the shaft; 76. cleaning the sleeve; 77. cleaning the brush; 81. fixing the wall plate; 82. an air delivery pump; 83. a telescopic pipe sleeve; 84. a blowing pipe; 85. an adjusting arm; 86. clamping the connecting pipe; 87. a filtering nozzle; 88. rotating the base; 89. a second rotating electric machine; 810. and a third rotating electric machine.
Detailed Description
The present invention will be further described with reference to the following detailed description so that the technical means, the creation features, the achievement purposes and the effects of the present invention can be easily understood.
Examples
As shown in fig. 1 to 6, the self-cleaning device for an evaporation table for semiconductor processing according to the present invention comprises an evaporation table body 1, a moving structure 2, an installation underframe 3, a lifting cylinder 4, an electric base 5, a vertical beam frame 6, a cleaning structure 7 and a dust removing structure 8, wherein the moving structure 2 is arranged on the outer side of the evaporation table body 1, the installation underframe 3 is installed at one end of the moving structure 2, the lifting cylinder 4 is installed in the center of the end surface of the installation underframe 3, the electric base 5 is arranged above the top of the lifting cylinder 4, the vertical beam frame 6 is fixedly installed in the center of the end surface of the top of the electric base 5, the cleaning structure 7 is arranged on one side of the end surface of the vertical beam frame 6, the dust removing structure 8 is arranged above the end surface of the vertical beam frame 6, and the dust removing structure 8 is fixedly connected with the installation underframe 3; during operation, make installation chassis 3 can remove in the outside of evaporating station body 1 through mobile structure 2, at the in-process that removes, can adjust the height and the turned angle of erector frame 6 through lift cylinder 4 and electronic base 5 to make the position of cleaning structure 7 and dust removal structure 8 in erector frame 6 outside can take place to adjust, make and clean structure 7 and dust removal structure 8 and can clean the dust removal with the different positions at evaporating station body 1 top, effectively avoid remaining the problem at clean dead angle.
The sweeping structure 7 comprises a motor support 71, a first rotating motor 72, a transmission end cover 74, a sweeping shaft 75, a cleaning sleeve 76 and a cleaning brush 77, wherein the motor support 71 is fixedly installed on one side of the outer wall of the vertical beam frame 6 through bolts, the first rotating motor 72 is installed on the end face of the inner side of the motor support 71, a motor shaft at one end of the first rotating motor 72 is fixedly installed with the sweeping shaft 75 through a coupler, the transmission end cover 74 is fixedly installed on the end face of one side of the vertical beam frame 6 through a screw, one end of the sweeping shaft 75 penetrates through the transmission end cover 74 to be connected with the cleaning sleeve 76, and the cleaning brush 77 is fixedly installed on the outer side of the cleaning sleeve 76; the motor bracket 71 is of an L-shaped structure, a heat dissipation plate is fixedly mounted on the end face of the inner side of the motor bracket 71 through screws, and the first rotating motor 72 is fixedly connected with the end face of the heat dissipation plate through screws; a transmission through hole is formed in the center of the end face of the vertical beam frame 6, a transmission shaft sleeve 73 is fixedly mounted inside the transmission through hole, and the outer wall of the cleaning shaft 75 is attached to the inner wall of the transmission shaft sleeve 73; when the cleaning device works, the first rotating motor 72 is fixedly arranged on the inner side of the motor support 71 through the motor support 71 and the heat dissipation plate, so that the first rotating motor 72 can have a stable structure and a good heat dissipation effect, when the first rotating motor 72 works, the cleaning shaft 75 is rotated through the motor shaft and the coupler, when the cleaning shaft 75 rotates inside the transmission shaft sleeve 73, abrasion of the cleaning shaft 75 on the vertical beam frame 6 can be effectively avoided, when the cleaning shaft 75 drives the cleaning sleeve 76 and the cleaning brush 77 to rotate outside the transmission end cover 74, dust on the outer side of the surface of the evaporation table body 1 can be cleaned through the cleaning brush 77, the transmission end cover 74 can protect the transmission shaft sleeve 73, and the dust is prevented from entering the inside of the transmission shaft sleeve 73 to influence the transmission stability of the cleaning shaft 75.
The moving structure 2 comprises an adjusting groove 21, an electric guide rail 22, an adjusting slide seat 23 and a follow-up frame 24, the adjusting groove 21 is formed in the center of the outer wall of the evaporation table body 1, the electric guide rail 22 is fixedly installed in the center of the inner wall of the adjusting groove 21, the adjusting slide seat 23 is installed on the outer side of the electric guide rail 22, the follow-up frame 24 is fixedly installed on the end face of the outer side of the adjusting slide seat 23, and the installation bottom frame 3 is fixedly connected with the follow-up frame 24 through bolts; the top end face and the bottom end face of the adjusting groove 21 are respectively provided with a wear-resistant pad in a fitting manner; during operation, the adjusting slide 23 moves on the outer side of the electric guide rail 22, the electric guide rail 22 is installed inside the adjusting groove 21, so that the adjusting slide 23 can move along a circular track when moving, and the follow-up frame 24 on the outer side of the adjusting slide 23 is fixedly connected with the installation underframe 3, so that the cleaning structure 7 above the top of the installation underframe 3 can clean the outer side position of the surface of the evaporation table body 1; and make dust removal structure 8 can spray the dust removal to the position of evaporating station body 1 surperficial inboard, rethread lift cylinder 4 and electronic base 5 adjust the height and the angle of erector beam frame 6 to can have good clean effect to the surface of evaporating station body 1, avoid having the condition at clean dead angle.
The dust removing structure 8 comprises a fixed wall plate 81, an air delivery pump 82, a telescopic pipe sleeve 83, an injection pipe 84, an adjusting arm 85, a clamping pipe 86, a filtering nozzle 87, a rotating seat 88, a second rotating motor 89 and a third rotating motor 810, wherein the fixed wall plate 81 is installed on one side of the outer wall of the installation bottom frame 3 through a screw, the air delivery pump 82 is fixedly installed in the center of the inner side end face of the fixed wall plate 81 through a screw, the telescopic pipe sleeve 83 is installed at one end of the top of the air delivery pump 82 in a connected mode, the injection pipe 84 is installed at one end of the top of the telescopic pipe sleeve 83 in a connected mode through the top end face of the fixed wall plate 81, the adjusting arm 85 is installed at one end of the injection pipe 84 through a transmission end cover 74 in a connected mode, the adjusting arm 85 is installed at the top end face of the vertical beam frame 6, the rotating seat 88 is arranged on the inner side of one end of the top of the adjusting arm 85, the clamping pipe 86 is installed in an inserted mode through the bottom end face of the rotating seat 88, and a communicating hole is formed in the adjusting arm 85, one end of the blowing pipe 84 penetrates through the communication hole to be connected with the clamping pipe 86, and the end face of the bottom of the clamping pipe 86 is connected with a filtering nozzle 87; a second rotating motor 89 is installed at one end of the top of the adjusting arm 85, a motor shaft at one end of the second rotating motor 89 penetrates through the adjusting arm 85 to be fixedly connected with the rotating seat 88, a third rotating motor 810 is fixedly installed at the top of the outer side of the vertical beam frame 6, and a motor shaft at one end of the third rotating motor 810 penetrates through the vertical beam frame 6 to be fixedly connected with the adjusting arm 85; when the second rotating motor 89 works, the angle between the rotating seat 88 and the adjusting arm 85 can be adjusted, when the third rotating motor 810 works, the angle between the adjusting arm 85 and the vertical beam frame 6 can be adjusted, and the blowing angle of the filtering nozzle 87 at the bottom of the clamping pipe 86 is adjusted by adjusting the adjusting arm 85 and the angle of the clamping pipe 86, so that different positions of the top end face of the evaporation table body 1 are blown; one end of the transmission end cover 74 is fixedly provided with two limiting hooks by welding, and the inner walls of the limiting hooks are attached and connected with the outer wall of the blowing pipe 84; the position of the blowing pipe 84 is limited through the limiting hook, so that the blowing pipe 84 is prevented from falling off and the blowing cleanness is prevented from being influenced; when the air supply pump 82 works, so that outside air can be supplied to the inside of the blowing pipe 84 through the telescopic pipe sleeve 83, when the third rotating motor 810 on the outer side of the vertical beam frame 6 works, the angle of the adjusting arm 85 at the top of the vertical beam frame 6 is changed through the motor shaft, the blowing pipe 84 at one end of the adjusting arm 85 pulls the telescopic pipe sleeve 83, the blowing pipe 84 can have a certain displacement effect through the telescopic pipe sleeve 83, the blowing pipe 84 can be limited through the limiting hook, and the situation that the blowing pipe 84 is dislocated in the moving process is avoided; when the second rotating motor 89 at regulating arm 85 top worked, the angle of rotating seat 88 can be adjusted through the motor shaft, and then make the position that joint pipe 86 and the filter nozzle 87 of rotating seat 88 bottom will be spouted change, carry the inside air current of joint pipe 86 through jetting pipe 84, blow to the top terminal surface of evaporating table body 1 through filter nozzle 87, make the dust and the waste material of evaporating table body 1 terminal surface can break away from the surface of evaporating table body 1, filter nozzle 87 also can effectively avoid the waste material to sputter the inside of joint pipe 86, the rethread cleans structure 7, thereby accomplish automatically cleaning.
The front, the back, the left, the right, the upper and the lower are all based on figure 1 in the attached drawings of the specification, according to the standard of the observation angle of a person, the side of the device facing an observer is defined as the front, the left side of the observer is defined as the left, and the like.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate orientations or positional relationships based on those shown in the drawings, and are used merely for convenience in describing the present invention and for simplifying the description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the scope of the present invention.
The foregoing illustrates and describes the principles, general features, and advantages of the present invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are described in the specification and illustrated only to illustrate the principle of the present invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the present invention, which fall within the scope of the invention as claimed. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (7)
1. The utility model provides a semiconductor processing is with automatically cleaning device of evaporation station, includes evaporation station body (1), moving structure (2), installation chassis (3), lift cylinder (4), electronic base (5), erects roof beam frame (6), cleans structure (7) and dust removal structure (8), its characterized in that: a moving structure (2) is arranged on the outer side of the evaporation table body (1), an installation bottom frame (3) is installed at one end of the moving structure (2), a lifting cylinder (4) is installed in the center of the end face of the installation bottom frame (3), an electric base (5) is arranged above the top of the lifting cylinder (4), a vertical beam frame (6) is fixedly installed in the center of the top end face of the electric base (5), a cleaning structure (7) is arranged on one side of the end face of the vertical beam frame (6), a dust removing structure (8) is arranged above the end face of the vertical beam frame (6), and the dust removing structure (8) is fixedly connected with the installation bottom frame (3); the cleaning structure (7) comprises a motor support (71), a first rotating motor (72), a transmission end cover (74), a cleaning shaft (75), a cleaning sleeve (76) and a cleaning brush (77), wherein the motor support (71) is fixedly installed on one side of the outer wall of the vertical beam frame (6) through bolts, the first rotating motor (72) is installed on the end face of the inner side of the motor support (71), the cleaning shaft (75) is fixedly installed on a motor shaft at one end of the first rotating motor (72) through a coupler, the transmission end cover (74) is fixedly installed on the end face of one side of the vertical beam frame (6) through screws, one end of the cleaning shaft (75) penetrates through the transmission end cover (74) to be connected with the cleaning sleeve (76), and the cleaning brush (77) is fixedly installed on the outer side of the cleaning sleeve (76);
the movable structure (2) comprises an adjusting groove (21), an electric guide rail (22), an adjusting sliding seat (23) and a follow-up frame (24), the adjusting groove (21) is formed in the center of the outer wall of the evaporation table body (1), the electric guide rail (22) is fixedly installed in the center of the inner wall of the adjusting groove (21), the adjusting sliding seat (23) is installed on the outer side of the electric guide rail (22), the follow-up frame (24) is fixedly installed on the end face of the outer side of the adjusting sliding seat (23), and the installation chassis (3) is fixedly connected with the follow-up frame (24) through bolts.
2. A self-cleaning apparatus of an evaporation stage for semiconductor processing according to claim 1, wherein: the top and the bottom end faces of the adjusting groove (21) are respectively provided with a wear-resistant pad in a fitting manner.
3. A self-cleaning apparatus of an evaporation stage for semiconductor processing according to claim 1, wherein: the motor support (71) is of an L-shaped structure, a heat dissipation plate is fixedly mounted on the inner side end face of the motor support (71) through screws, and the first rotating motor (72) is fixedly connected with the end face of the heat dissipation plate through screws.
4. A self-cleaning apparatus of an evaporation stage for semiconductor processing according to claim 1, wherein: the end face center of the vertical beam frame (6) is provided with a transmission through hole, a transmission shaft sleeve (73) is fixedly mounted inside the transmission through hole, and the outer wall of the cleaning shaft (75) is attached to the inner wall of the transmission shaft sleeve (73).
5. A self-cleaning apparatus of an evaporation stage for semiconductor processing according to claim 1, wherein: the dust removing structure (8) comprises a fixed wall plate (81), an air conveying pump (82), a telescopic pipe sleeve (83), an injection pipe (84), an adjusting arm (85), a clamping pipe (86), a filtering nozzle (87), a rotating seat (88), a second rotating motor (89) and a third rotating motor (810), wherein the fixed wall plate (81) is installed on one side of the outer wall of the installation bottom frame (3) through a screw, the air conveying pump (82) is fixedly installed in the center of the inner side end face of the fixed wall plate (81) through the screw, the telescopic pipe sleeve (83) is installed at one end of the top of the air conveying pump (82) in a connecting mode, the injection pipe (84) is installed at one end of the top of the telescopic pipe sleeve (83) through the top end face of the fixed wall plate (81), the adjusting arm (85) is installed at one end of the injection pipe (84) through a transmission end cover (74), and the adjusting arm (85) is installed at the top end face of the vertical beam frame (6), the inner side of one end of the top of the adjusting arm (85) is provided with a rotating seat (88), the end face of the bottom of the rotating seat (88) is provided with a clamping pipe (86) in an inserted connection mode, a communicating hole is formed in the adjusting arm (85), one end of the blowing pipe (84) penetrates through the communicating hole to be connected with the clamping pipe (86), and the end face of the bottom of the clamping pipe (86) is provided with a filtering nozzle (87) in a connected mode.
6. A self-cleaning apparatus of an evaporation stage for semiconductor processing according to claim 5, wherein: second rotation motor (89) is installed to the top one end of regulating arm (85), and the one end motor shaft of second rotation motor (89) passes regulating arm (85) and rotates seat (88) fixed connection, the outside top fixed mounting of erecting roof beam structure (6) has third rotation motor (810), and the motor shaft of third rotation motor (810) one end passes erecting roof beam structure (6) and regulating arm (85) fixed connection.
7. A self-cleaning apparatus of an evaporation stage for semiconductor processing according to claim 5, wherein: and two limiting hooks are fixedly arranged at one end of the transmission end cover (74) through welding, and the inner walls of the limiting hooks are attached to the outer wall of the blowing pipe (84).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111466085.9A CN114150272B (en) | 2021-12-03 | 2021-12-03 | Self-cleaning device of evaporation table for semiconductor processing |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111466085.9A CN114150272B (en) | 2021-12-03 | 2021-12-03 | Self-cleaning device of evaporation table for semiconductor processing |
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| CN114150272A CN114150272A (en) | 2022-03-08 |
| CN114150272B true CN114150272B (en) | 2022-08-23 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH08176797A (en) * | 1994-12-22 | 1996-07-09 | Toray Ind Inc | Can cleaning device |
| JP2001297993A (en) * | 2000-04-17 | 2001-10-26 | Hitachi Kokusai Electric Inc | Semiconductor manufacturing method |
| JP2008111171A (en) * | 2006-10-31 | 2008-05-15 | Seiko Epson Corp | Film-forming apparatus and its cleaning method |
| TWI426964B (en) * | 2008-09-17 | 2014-02-21 | Hitachi High Tech Corp | Organic EL display cleaning device, organic EL display manufacturing device, organic EL display and organic EL mask cleaning method |
| CN105316626A (en) * | 2015-11-20 | 2016-02-10 | 苏州赛森电子科技有限公司 | Coating film raw material guiding device of evaporation table for semiconductor processing |
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