CN114147237B - Cleaning method for residual powder in pore channel of additive manufacturing porous tantalum material - Google Patents
Cleaning method for residual powder in pore channel of additive manufacturing porous tantalum material Download PDFInfo
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/60—Treatment of workpieces or articles after build-up
- B22F10/68—Cleaning or washing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/20—Direct sintering or melting
- B22F10/28—Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/60—Treatment of workpieces or articles after build-up
- B22F10/62—Treatment of workpieces or articles after build-up by chemical means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/70—Recycling
- B22F10/73—Recycling of powder
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F12/00—Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
- B22F12/80—Plants, production lines or modules
- B22F12/88—Handling of additively manufactured products, e.g. by robots
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y40/00—Auxiliary operations or equipment, e.g. for material handling
- B33Y40/20—Post-treatment, e.g. curing, coating or polishing
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/20—Other heavy metals
- C23G1/205—Other heavy metals refractory metals
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
Abstract
The invention discloses a method for cleaning residual powder in a pore channel of an additive manufacturing porous tantalum material, which comprises the following steps: firstly, blowing a porous tantalum material formed by an additive manufacturing technology; secondly, ultrasonically cleaning the porous tantalum material cleaned by blowing; and thirdly, introducing a cleaning solution into the ultrasonic cleaning porous tantalum material for cleaning to obtain the porous tantalum material with clean pore channels. According to the method, through sequentially performing blowing, ultrasonic treatment and introduction of a cleaning solution, the most appropriate fluid movement route is selected, when the cleaning solution is introduced, a sodium hydroxide solution for corroding the porous tantalum material is selected, the scouring action of the fluid when the fluid passes through the porous material pore channel is fully utilized, sintering necks formed among powder particles are corroded and damaged, residual powder in the pore channel of the material increase manufactured porous tantalum material is effectively cleaned, the integrity of a porous structure is ensured, the safety and the reliability of the porous tantalum material in the later service process are effectively ensured, and the porous tantalum material can be produced and utilized in a large scale.
Description
Technical Field
The invention belongs to the technical field of post-treatment of additive manufacturing parts, and particularly relates to a method for cleaning residual powder in a pore channel of a porous tantalum material for additive manufacturing.
Background
The porous tantalum is a foam-like porous metal, the elastic modulus of the porous tantalum is about 3GPa, the elastic modulus of the porous tantalum is between that of human cancellous bone (0.1-1.5 GPa) and that of cortical bone (12-18 GPa), and the elastic modulus of the porous tantalum is far lower than that of titanium alloy and cobalt-chromium-molybdenum alloy. As early as 1997, the U.S. food and drug administration approved porous tantalum as a biomedical material for clinical treatment of artificial acetabulum. Compared with other biomedical metal materials, the porous tantalum has the typical characteristics of high volume porosity, low elastic modulus and high surface friction coefficient, and is an ideal bone substitute material. In the aspect of biological performance, the porous tantalum shows good biocompatibility, corrosion resistance and bone induction characteristics, and the application prospect of the porous tantalum is expected to exceed the titanium alloy material which is the most widely applied in the clinical application at present, so that the porous tantalum becomes a new direction for the research of medical implant materials.
In recent years, with the popularization of precise medical concept, the customized demand of the implant is provided clinically, and how to prepare the porous tantalum implant with the composite standard of components and the performance matched with the host according to the individual demand becomes a topic and a research hotspot which are concerned by the material, the medical and engineering communities. The standardized porous tantalum of the American Zimmer company which is most widely applied in the market adopts the traditional chemical vapor deposition technology, and the preparation of the customized porous tantalum implant material cannot be realized.
The metal 3D printing technology, namely additive manufacturing, is an effective means for realizing the customized manufacturing of the porous material, can effectively control the pore size, the porosity and the pore distribution, typically represents a selective laser melting technology and a selective electron beam melting technology, and is already applied to the preparation of medical metal implant materials. Patents with publication numbers CN102796910B and CN107598166B respectively adopt Selective Laser Melting (SLM) and Selective Electron Beam Melting (SEBM) techniques to realize the preparation of porous tantalum materials. Because the electron beam can preheat the powder bed (the maximum temperature can reach 1200 ℃), the stress of the high-melting-point metal tantalum in the forming process is greatly reduced, so that the personalized porous tantalum implant prepared by the SEBM technology is clinically applied, and is expected to replace related products of Zimmer company.
However, in the process of forming the porous tantalum material by the additive manufacturing technology such as SEBM and the like, the preheating of the powder bed (about 1000 ℃) and the heat conduction of the melting region can cause the powder adjacent to the melting region to generate weak "sintering", and the removal of the powder inside the porous structure after the formation becomes the key for limiting the clinical application of the additive manufacturing porous tantalum material at present.
Previous studies found that the residual powder inside the porous tantalum after additive manufacturing forming mainly comprises two types: 1) no melting occurred, only residual powder remaining inside the cell channels. 2) Powder that is metallurgically bonded to the melted zone due to the effect of heat. In order to solve the problems, an ultrasonic vibration method and a high-pressure gas blowing method are developed at home and abroad one after another to clean residual powder in a porous structure formed by an additive manufacturing technology. Actual effect surface, the existing process method can realize effective cleaning of the above 1 st residual powder. The residual powder of the type 2 has no effect, and since the residual powder has been subjected to surface diffusion sintering and has a certain strength, the surface sintering neck is hardly damaged by both high-pressure gas and ultrasonic vibration.
Therefore, a method for cleaning residual powder in the pore channels of the additive manufacturing porous tantalum material is needed.
Disclosure of Invention
The invention aims to solve the technical problem of providing a method for cleaning residual powder in a pore channel of an additive manufacturing porous tantalum material aiming at the defects of the prior art. The method effectively cleans residual powder of the porous tantalum material in the additive manufacturing process by sequentially performing blowing, ultrasonic cleaning and cleaning solution introduction, fully utilizes the scouring action of fluid when the fluid passes through the porous material pore channels when the cleaning solution is introduced, corrodes and destroys sintering necks formed among powder particles, and ensures the integrity of a porous structure, so that the safety and reliability of the porous tantalum material in the later service process are effectively ensured, the method is simple and efficient, and the method can be used for large-scale production.
In order to solve the technical problems, the invention adopts the technical scheme that: a method for cleaning residual powder in a pore channel of an additive manufacturing porous tantalum material is characterized by comprising the following steps:
step one, placing a porous tantalum material formed by an additive manufacturing technology into a powder recovery system, and blowing by using gas to obtain a blowing cleaned porous tantalum material;
step two, sequentially carrying out ultrasonic cleaning and drying on the blowing cleaned porous tantalum material obtained in the step one to obtain an ultrasonic cleaned porous tantalum material;
step three, introducing a cleaning solution into the ultrasonic cleaning porous tantalum material obtained in the step two for cleaning, then performing ultrasonic cleaning in deionized water, and drying to obtain a porous tantalum material with a clean pore channel; and cleaning solution is introduced into the porous tantalum material from the direction of the largest opening of the porous tantalum material, the pressure of the cleaning solution is 50 kPa-200 kPa, the cleaning solution is sodium hydroxide solution with the mass fraction of 30% -80%, the temperature of the cleaning solution is 90-110 ℃, and the time for introducing the cleaning solution is 20-60 min.
According to the invention, gas is adopted for blowing in the powder recovery system, residual powder which is not effectively connected is recovered, the utilization rate of the powder is improved, and the cost is saved, wherein the powder recovery system is matched with additive manufacturing forming equipment, tantalum powder of a powder bed can be circulated in the system, and the primary cleaning is realized by a spray gun which depends on high-pressure gas and carries metal powder to perform high-pressure blowing on a sample; ultrasonic cleaning is carried out to remove powder which cannot be blown off but is not melted; cleaning is carried out by introducing a cleaning solution, a sodium hydroxide solution is used as a carrier tool, and a powerful scouring corrosion effect generated after liquid flows through the porous material is utilized to effectively destroy sintering necks formed among residual powder particles in the porous tantalum, so that the powder which is not melted in the forming process of the additive manufacturing technology is completely cleaned, the integrity of a porous structure is ensured, and the safety and the reliability of the porous tantalum material in the later service process are effectively ensured; according to the method, the cleaning solution is introduced from the direction of the maximum opening in the porous tantalum material during cleaning, the direction of the maximum opening in the porous tantalum material is the direction with the minimum close-packed index, the flow resistance is minimum when the cleaning solution is introduced from the direction, and the optimal removal effect is achieved; according to the method, the sintering necks formed among the residual powder particles are effectively damaged by controlling the pressure of the cleaning solution, so that the residual powder particles are effectively cleaned, the defects that the sintering necks cannot be effectively damaged due to too low pressure, the cleaning time is increased, the efficiency is reduced and the porous tantalum material is damaged due to too high pressure are avoided; according to the method, the sintering necks formed among the residual powder particles are effectively damaged by controlling the mass fraction of the sodium hydroxide solution, so that the residual powder particles are effectively cleaned, the defects that the sintering necks cannot be effectively damaged due to too small mass fraction, the cleaning time is increased, the efficiency is reduced and the porous tantalum material is damaged due to too large mass fraction are overcome; according to the invention, the temperature of the cleaning solution is controlled, so that the cleaning solution reaches the lowest temperature for damaging the sintering neck, and the residual powder particles are effectively cleaned; the invention ensures the full cleaning of the residual powder particles by controlling the time of introducing the cleaning solution.
The cleaning method for residual powder in the pore channel of the additive manufacturing porous tantalum material is characterized in that in the step one, the blowing pressure is 0.2-0.4 MPa, the blowing is repeated for 3-5 times, the gas is dry air, and the distance between a spray gun used for blowing and the surface of the porous tantalum material is less than 10 mm. The residual powder which is not effectively connected on the lattice type porous tantalum material is blown off by controlling the blowing pressure; the invention fully recovers residual powder which is not effectively connected by repeatedly blowing; the method adopts dry air, is cheap and easy to obtain, and does not influence the dot-matrix porous tantalum material; the invention ensures the blowing effect by controlling the distance between the spray gun and the surface of the porous tantalum material.
The cleaning method for residual powder in the pore channel of the additive manufacturing porous tantalum material is characterized in that in the first step, the blowing is performed from the direction of the largest opening in the porous lattice structure.
The method for cleaning the residual powder in the pore passage of the material additive manufacturing porous tantalum material is characterized in that in the second step, the ultrasonic cleaning is carried out in an ethanol solution, the ultrasonic cleaning time is 2-4 hours, and the drying temperature is 100 ℃. The invention removes powder which can not be blown off but is not melted by carrying out ultrasonic treatment in an ethanol solution.
The cleaning method for residual powder in the pore channel of the additive manufacturing porous tantalum material is characterized in that the maximum opening direction in the third step is the direction with the minimum close packing index in the porous lattice structure. The invention has the advantages of minimum flow resistance in the direction of the largest opening in the porous lattice structure by introducing the cleaning solution, optimal removal effect and effective improvement of cleaning efficiency.
The cleaning method for pore residual powder in the additive manufacturing porous tantalum material is characterized in that in the third step, the ultrasonic cleaning is repeatedly carried out for 3 times, each time is 30min, clean deionized water is replaced after each ultrasonic cleaning for next ultrasonic cleaning, and the drying temperature is 100 ℃. The method fully removes the residual sodium hydroxide solution through ultrasonic cleaning, and cleans impurities on the surface of the porous tantalum material.
Compared with the prior art, the invention has the following advantages:
1. the method comprises the steps of sequentially carrying out blowing, ultrasonic cleaning and cleaning solution introduction, effectively cleaning the residual powder of the porous tantalum material pore channel, fully utilizing the scouring action of fluid when the fluid passes through the porous material pore channel when the cleaning solution is introduced, corroding and destroying the sintering necks formed among the powder particles, and realizing effective cleaning of the residual powder particles.
2. When cleaning solution is introduced for cleaning, the cleaning medium is input from the direction of the largest opening in the porous tantalum material, so that high-pressure gas and the cleaning solution are ensured to pass through with the smallest flow resistance, and the residual powder in the pore channel is efficiently cleaned.
3. When cleaning solution passes through the porous material, corrosion can preferentially occur in micro pores formed among powder particles due to the capillary effect of the porous structure, and meanwhile, when cleaning media pass through the porous tantalum material, the surface of the additive manufacturing formed porous tantalum material can be modified, the surface roughness of the porous tantalum material is reduced, and the mechanical property and the later stability of the porous tantalum material in a human body are improved.
4. The method disclosed by the invention carries out blowing, ultrasonic cleaning and cleaning by using a cleaning solution through gas, the structure of the pore channel of the lattice type porous tantalum material is not damaged, the deviation between the porosity of the porous tantalum material with clean pore channels and the porosity of a model design is below 4.9%, and the smaller the deviation is, the closer the finally obtained part is to the design value is, and the higher the forming precision is.
The technical solution of the present invention is further described in detail by the accompanying drawings and examples.
Drawings
FIG. 1 is a microscopic topography of the blow cleaned porous tantalum material obtained in example 1 of the present invention.
Fig. 2 is a microstructure of a porous tantalum material with clean pores obtained in example 1 of the present invention.
Detailed Description
Example 1
The embodiment comprises the following steps:
step one, placing a porous tantalum material formed by an additive manufacturing technology into a powder recovery system, and blowing by using gas to obtain a blowing cleaned porous tantalum material; the porous tantalum material is in a porous lattice structure; the pressure of the blowing is 0.2MPa, the blowing is repeated for 5 times, the gas is dry air, and the distance between a spray gun used for blowing and the surface of the porous tantalum material is less than 10 mm; the blowing is respectively carried out from the maximum opening directions in the directions of an X axis, a Y axis and a Z axis in the porous lattice structure; the lattice structure unit of the porous tantalum material is a rhombic dodecahedron structure;
step two, sequentially carrying out ultrasonic cleaning and drying on the primarily cleaned porous tantalum material obtained in the step one to obtain an ultrasonic cleaning porous tantalum material; the ultrasonic cleaning is carried out in an ethanol solution, the ultrasonic cleaning time is 2 hours, and the drying temperature is 100 ℃;
step three, introducing a cleaning solution into the ultrasonic cleaning porous tantalum material obtained in the step two for cleaning, then performing ultrasonic cleaning in deionized water, and drying to obtain a porous tantalum material with a clean pore channel; cleaning solutions are respectively introduced into the maximum opening directions of the X-axis direction, the Y-axis direction and the Z-axis direction in the porous lattice structure, the maximum opening direction of the porous structure unit is the direction with the minimum dense packing index in the porous lattice structure, the pressure of the cleaning solution is 50kPa, the cleaning solution is a sodium hydroxide solution with the mass fraction of 30%, the temperature of the cleaning solution is 100 ℃, and the time for introducing the cleaning solution is 20 min; the ultrasonic cleaning is repeatedly carried out for 3 times, each time is 30min, clean deionized water is replaced after each ultrasonic cleaning to carry out next ultrasonic cleaning, and the drying temperature is 100 ℃.
Fig. 1 is a microscopic morphology of the spray-cleaned porous tantalum material obtained in this example, and it can be seen from fig. 1 that a large amount of non-micro-melted metal powder still remains inside the channels after spraying.
Fig. 2 is a microscopic morphology diagram of the porous tantalum material with clean channels obtained in example 1 of the present invention, and it can be seen from fig. 2 that after being cleaned by the cleaning solution, the residual powder inside the channels is completely removed, and the deviation between the measured porosity and the designed porosity is only 3.2%.
Example 2
The embodiment comprises the following steps:
step one, placing a porous tantalum material formed by an additive manufacturing technology into a powder recovery system, and blowing by using gas to obtain a blowing cleaned porous tantalum material; the porous tantalum material is in a porous lattice structure; the pressure of the blowing is 0.3MPa, the blowing is repeated for 3 times, the gas is dry air, and the distance between a spray gun used for blowing and the surface of the porous tantalum material is less than 10 mm; the blowing is respectively carried out from the maximum opening directions in the directions of an X axis, a Y axis and a Z axis in the porous lattice structure; the lattice structure of the porous tantalum material is a simple cubic structure;
step two, sequentially carrying out ultrasonic cleaning and drying on the primarily cleaned porous tantalum material obtained in the step one to obtain an ultrasonic cleaning porous tantalum material; the ultrasonic cleaning is carried out in an ethanol solution, the ultrasonic cleaning time is 3h, and the drying temperature is 100 ℃;
step three, introducing a cleaning solution into the ultrasonic cleaning porous tantalum material obtained in the step two for cleaning, then performing ultrasonic cleaning in deionized water, and drying to obtain a porous tantalum material with a clean pore channel; cleaning solutions are respectively introduced into the maximum opening directions in the X-axis direction, the Y-axis direction and the Z-axis direction of the porous lattice structure, the maximum opening direction of the porous structure unit is the direction with the minimum dense packing index in the porous lattice structure, the pressure of the cleaning solution is 100kPa, the cleaning solution is a sodium hydroxide solution with the mass fraction of 50%, the temperature of the cleaning solution is 100 ℃, and the time for introducing the cleaning solution is 40 min; the ultrasonic cleaning is repeatedly carried out for 3 times, each time is 30min, clean deionized water is replaced after each ultrasonic cleaning to carry out next ultrasonic cleaning, and the drying temperature is 100 ℃.
Through detection, the deviation between the porosity of the porous tantalum material with clean channels and the porosity of the model design obtained in the embodiment is only 4.28%.
Example 3
The embodiment comprises the following steps:
step one, placing a porous tantalum material formed by an additive manufacturing technology into a powder recovery system, and blowing by using gas to obtain a blowing cleaned porous tantalum material; the porous tantalum material is in a porous lattice structure; the pressure of the blowing is 0.3MPa, the blowing is repeated for 3 times, the gas is dry air, and the distance between a spray gun used for blowing and the surface of the porous tantalum material is less than 10 mm; the blowing is respectively carried out from the maximum opening direction of the X axis, the Y axis and the Z axis which are inclined by 45 degrees in the porous lattice structure; the lattice structure of the porous tantalum material is an Octet-tress structure, wherein the Octet-tress represents an octagon;
step two, sequentially carrying out ultrasonic cleaning and drying on the primarily cleaned porous tantalum material obtained in the step one to obtain an ultrasonic cleaning porous tantalum material; the ultrasonic cleaning is carried out in an ethanol solution, the ultrasonic cleaning time is 4h, and the drying temperature is 100 ℃;
step three, introducing a cleaning solution into the ultrasonic cleaning porous tantalum material obtained in the step two for cleaning, then performing ultrasonic cleaning in deionized water, and drying to obtain a porous tantalum material with a clean pore channel; cleaning solutions are respectively introduced into the maximum opening directions of the X-axis, the Y-axis and the Z-axis in the porous lattice structure in an inclined direction of 45 degrees, the maximum opening direction of the porous structure unit is the direction with the minimum dense packing index in the porous lattice structure, the pressure of the cleaning solution is 200kPa, the cleaning solution is a sodium hydroxide solution with the mass fraction of 80%, the temperature of the cleaning solution is 100 ℃, and the time for introducing the cleaning solution is 60 min; the ultrasonic cleaning is repeatedly carried out for 3 times, each time is 30min, clean deionized water is replaced after each ultrasonic cleaning to carry out next ultrasonic cleaning, and the drying temperature is 100 ℃.
Through detection, the deviation between the porosity of the porous tantalum material with clean channels and the porosity of the model design obtained in the embodiment is only 4.87%.
The above description is only for the preferred embodiment of the present invention, and is not intended to limit the present invention in any way. Any simple modification, change and equivalent changes of the above embodiments according to the technical essence of the invention are still within the protection scope of the technical solution of the invention.
Claims (6)
1. A method for cleaning residual powder in a pore channel of an additive manufacturing porous tantalum material is characterized by comprising the following steps:
step one, placing a porous tantalum material formed by an additive manufacturing technology into a powder recovery system, and blowing by using gas to obtain a blowing cleaned porous tantalum material;
step two, sequentially carrying out ultrasonic cleaning and drying on the blowing cleaned porous tantalum material obtained in the step one to obtain an ultrasonic cleaned porous tantalum material;
step three, introducing a cleaning solution into the ultrasonic cleaning porous tantalum material obtained in the step two for cleaning, then performing ultrasonic cleaning in deionized water, and drying to obtain a porous tantalum material with a clean pore channel; the cleaning method comprises the steps of introducing a cleaning solution into a porous tantalum material from the direction of a maximum opening of the porous tantalum material, wherein the pressure of the cleaning solution is 50 kPa-200 kPa, the cleaning solution is a sodium hydroxide solution with the mass fraction of 30% -80%, the temperature of the cleaning solution is 90-110 ℃, and the time for introducing the cleaning solution is 20-60 min.
2. The method for cleaning residual powder in the pore channels of the additive manufacturing porous tantalum material, according to claim 1, wherein in the step one, the blowing pressure is 0.2MPa to 0.4MPa, the blowing is repeated for 3 to 5 times, the gas is dry air, and the distance between a spray gun used for blowing and the surface of the porous tantalum material is less than 10 mm.
3. The method for cleaning residual powder in the pore channels of the additive manufacturing porous tantalum material as claimed in claim 1, wherein in the first step, the porous tantalum material is in a porous lattice structure.
4. The method for cleaning the residual powder of the pore channels of the additive manufacturing porous tantalum material according to claim 1, wherein in the second step, ultrasonic cleaning is performed in an ethanol solution, the ultrasonic cleaning time is 2-4 h, and the drying temperature is 100 ℃.
5. The method for cleaning residual powder in the pore channels of the additive manufacturing porous tantalum material as claimed in claim 3, wherein the direction of the maximum opening in the third step is the direction with the smallest close packing index in the porous lattice structure.
6. The method for cleaning residual powder in the pore channels of the additive manufacturing porous tantalum material according to claim 1, wherein in the third step, the ultrasonic cleaning is repeated for 3 times, each time for 30min, clean deionized water is replaced after each ultrasonic cleaning for next ultrasonic cleaning, and the drying temperature is 100 ℃.
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