CN114101297B - Device and method for treating photocuring waste through ultraviolet-assisted pyrolysis - Google Patents
Device and method for treating photocuring waste through ultraviolet-assisted pyrolysis Download PDFInfo
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- CN114101297B CN114101297B CN202111373748.2A CN202111373748A CN114101297B CN 114101297 B CN114101297 B CN 114101297B CN 202111373748 A CN202111373748 A CN 202111373748A CN 114101297 B CN114101297 B CN 114101297B
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Abstract
The invention discloses a device and a method for treating photocured waste through ultraviolet-assisted pyrolysis, wherein the device comprises the following steps: the gas storage part is used for storing the feed gas; the number of the first gas paths is at least one, the first gas paths are communicated with the gas storage part, and gas passing through the first gas paths is preheated by the preheating part; the reaction part comprises a reactor, the reactor is communicated with the first gas path, the reactor is arranged in the stainless steel heating furnace, the reactor is connected with light guide cylinders, the light guide cylinders are connected with light sources, and the number of the light guide cylinders corresponds to that of the light sources one by one; the detection part is connected with a gas-phase product gas outlet of the reactor and is used for detecting the infrared spectrum and the gas chromatography of the gas-phase product on line.
Description
Technical Field
The invention relates to the technical field of photo-thermal combined treatment experiments, in particular to a device and a method for treating photocured waste through ultraviolet-assisted pyrolysis.
Background
The photo-thermal combination treatment is to combine a thermochemical reaction and a photochemical reaction, wherein the temperature of the thermochemical reaction can be obviously reduced in the presence of light, and the time of the photochemical reaction can be obviously reduced with the aid of heat. If a photocatalyst and a thermal catalyst are used, the photo-thermal synergistic treatment can enable the reaction performance of the catalyst to be higher than that of single photocatalytic and thermal catalytic activities. In the reaction process, the wavelength ranges of light sources are different, the energy of the photo-generated electrons capable of being excited is also different, and the sensitivity of different substances to light with different wavelength bands is also different; similarly, with the increase of the optical power density, the more the number of high-energy photons generated by radiation is, the more beneficial the catalyst is to be excited to generate photo-generated electrons, hydroxyl free radicals are generated on the surface of the catalyst, and the reaction rate and the reaction conversion rate are improved; the influence of the reaction temperature on the reaction is very important, the higher the temperature is, the higher the degradation rate is, but the overhigh temperature is not beneficial to the adsorption of pollutants, oxygen and water on the surface of the catalyst, and different organic pollutants can generate different intermediate products at different temperatures, so that the proper reaction temperature is selected; since water is essential in most photocatalytic reactions, relative humidity can have an effect on the photocatalytic effect. In summary, the light source waveband range, the optical power density, the reaction temperature and the relative humidity all affect the reaction result. Therefore, the method has the advantages that the appropriate reaction conditions are explored aiming at different reactants, so that the optimal reaction condition is provided for photo-thermal co-treatment, and the significance is very great. The Chinese patent CN202011220904.7 introduces light into the thermocatalysis process, and has the problems that the equipment can only put a specially configured quartz tube for gas phase reaction, and if solid reactants are treated, the pipeline can be blocked. Chinese patent CN212524037U, CN112934144a also treats photothermal combination, but the apparatus cannot explore the influence of optical power density on photothermal co-treatment, so a novel apparatus and method for treating waste by photothermal combination are needed.
Disclosure of Invention
The invention aims to provide a device and a method for treating photocuring waste through ultraviolet-assisted pyrolysis, which aim to solve the problems in the prior art.
In order to achieve the purpose, the invention provides the following scheme: an apparatus for ultraviolet light assisted pyrolysis treatment of photo-cured waste, comprising:
a gas storage portion for storing a feed gas;
the number of the first air channels is at least one, the first air channels are communicated with the air storage part, and air passing through the first air channels is preheated by the preheating part;
the reaction part comprises a reactor, the reactor is communicated with the first air path, the reactor is arranged in the stainless steel heating furnace, the reactor is connected with a light guide cylinder, the light guide cylinder is connected with at least one light source, and the number of the light guide cylinders corresponds to that of the light sources one to one;
and the detection part is connected with a gas outlet of the gas product of the reactor and is used for detecting the infrared spectrum and the gas chromatography of the gas product on line.
Preferably, the gas storage portion includes at least one gas cylinder, the feed gas has been stored in the gas cylinder, the gas cylinder with first gas circuit intercommunication, be equipped with first gas circuit valve, mass flow meter and mass flow controller control valve on the first gas circuit in proper order, first gas circuit valve be located the gas cylinder with between the mass flow meter, the mass flow meter with mass flow controller control valve is parallelly connected.
Preferably, the preheating part is arranged between the mass flow meter and the reactor, the preheating part is a preheating furnace arranged on the first gas path and/or,
the preheating piece is a heat tracing band wound on the first air path.
Preferably, the first gas path is communicated with the reactor through a second gas path, a four-way valve is mounted on the second gas path, and the four-way valve is communicated with a constant-temperature circulating pump.
Preferably, the reactor is connected with a catalyst filler, and a gas-phase product gas outlet of the reactor is provided with a product gas path valve.
Preferably, the quantity of first gas circuit is two, two different types of gas is let in respectively to first gas circuit, two the end of giving vent to anger of first gas circuit all with the inlet end intercommunication of second gas circuit, just second gas circuit valve is installed to the inlet end of second gas circuit, install gas mixer on the second gas circuit, gas mixer is located the four-way valve with between the second gas circuit valve.
Preferably, the number of the first gas paths is two, different types of gas are respectively introduced into the two first gas paths, a third gas path valve is installed at the gas outlet end of any one first gas path, and a fourth gas path valve is installed at the gas outlet end of the other first gas path;
the air outlet end of the first air path provided with the fourth air path valve is communicated with the air inlet end of the second air path; the other first gas path extends into the reactor, and the first gas path is adjusted by the stainless steel heating furnace to be preheated to a set temperature in advance;
when the fourth gas path valve is opened and the third gas path valve is closed, the photo-oxidation and pyrolysis treatment can be carried out; when the third gas path valve is opened and the fourth gas path valve is closed, the photooxidation and gasification treatment can be carried out; when the third air path valve and the fourth air path valve are opened simultaneously, the mixing ratio of the two gases can be controlled.
Preferably, the light source is arranged at the top of the reactor, the light guide cylinder extends into the top opening of the reactor along the vertical direction and/or,
the light source is arranged on the side wall of the reactor, and the light guide cylinder penetrates into the reactor along the horizontal direction.
Preferably, a quartz inner support is arranged in the reactor.
A method for treating photocured waste through ultraviolet-assisted pyrolysis is realized through the following steps:
the method comprises the following steps: placing a treated object in the reactor;
step two: adjusting the illumination wave band according to the requirement;
step three: adjusting the optical power density;
step four: preheating the prepared feed gas to a specified temperature, and introducing the feed gas into the reactor;
step five: carrying out reaction, and adjusting temperature, humidity and optical power density according to needs in the reaction process;
step six: monitoring and controlling the temperature, reaction pressure and gas flow of the reactor during the reaction;
step seven: and after the reaction is finished, detecting the infrared spectrum and the gas chromatography of the gas phase product on line, and simultaneously taking out and detecting the solid phase product and the liquid phase product in the reactor.
The invention discloses the following technical effects:
(1) The introduction of light can reduce the reaction temperature of the traditional thermal catalysis, is beneficial to reducing the reaction time and improving the conversion rate of reactants.
(2) The introduction of heat during the light treatment process can reduce the time during which the light oxidation treatment occurs in conventional light treatments.
(3) The high molecular polymer can be degraded into low molecular products in the pyrolysis process through light pretreatment, so that the solid network structure of the high molecular polymer can be aged and loosened, and the pyrolysis conversion efficiency is improved.
(4) In the aspect of pollutant control, after the migration rule of sensitive pollutants in the photooxidation pyrolysis process, the introduction of light can control or reduce the generation of pollutants by taking control as guidance.
(5) The combination of light treatment and heat treatment is beneficial to the efficient recovery of resources and energy.
The invention can process solid and liquid raw materials, realizes the photo-thermal synchronous rapid heating process, provides ideal experimental conditions for researching photo-thermal catalytic reaction mechanism, is simultaneously suitable for the research of photo-catalytic, thermal-catalytic and photo-thermal concerted catalytic reactions, and provides a good platform for contrastively researching the common problem among various catalytic reactions.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.
FIG. 1 is a schematic view showing the structure of an apparatus for UV-assisted pyrolysis treatment of photo-cured waste according to example 1;
FIG. 2 is a schematic diagram showing the structure of an apparatus for UV-assisted pyrolysis treatment of photo-cured waste according to example 2;
FIG. 3 is a schematic diagram showing the structure of an apparatus for UV-assisted pyrolysis treatment of photo-cured waste according to example 3;
FIG. 4 is a schematic diagram showing the structure of an apparatus for UV-assisted pyrolysis treatment of photo-cured waste according to example 4;
FIG. 5 is a schematic view showing the structure of an apparatus for UV-assisted pyrolysis treatment of photo-setting waste in example 5;
FIG. 6 is a schematic view showing the structure of an apparatus for UV-assisted pyrolysis treatment of photo-setting waste in example 6;
FIG. 7 is a schematic diagram showing the structure of an apparatus for UV-assisted pyrolysis treatment of photo-cured waste according to example 7;
wherein, 1 is the gas cylinder, 2 is first gas circuit valve, 3 is mass flow meter, 4 is mass flow controller control valve, 5 is the preheater, 6 is the reactor, 7 is the light source, 8 is the leaded light section of thick bamboo, 9 is the result gas circuit valve, 10 is the detection part, 11 is first gas circuit, 12 is the stainless steel heating furnace, 13 is the second gas circuit, 14 is the four-way valve, 15 is the constant temperature circulating pump, 16 is the catalyst filling device, 17 is the second gas circuit valve, 18 is gas mixer, 19 is the third gas circuit valve, 20 is the fourth gas circuit valve, 21 holds in the palm in the quartzy.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without making any creative effort based on the embodiments in the present invention, belong to the protection scope of the present invention.
In order to make the aforementioned objects, features and advantages of the present invention more comprehensible, the present invention is described in detail with reference to the accompanying drawings and the detailed description thereof.
The invention provides a device for treating photocured waste through ultraviolet-assisted pyrolysis, which comprises:
the gas storage part is used for storing the feed gas;
the number of the first air paths 11 is at least one, the first air paths 11 are communicated with the air storage part, and air passing through the first air paths 11 is preheated by the preheating part;
the reaction part comprises a reactor 6, the reactor 6 is communicated with a first air path 11, the reactor 6 is arranged in a stainless steel heating furnace 12, the reactor 6 is connected with a light guide cylinder 8, the light guide cylinder 8 is connected with at least one light source 7, and the number of the light sources 7 is one-to-one corresponding to that of the light sources 7;
and the detection part 10, the detection part 10 is connected with the gas outlet of the gas product of the reactor 6, and is used for detecting the infrared spectrum and the gas chromatography of the gas product on line.
Further optimize the scheme, gas storage portion includes at least one gas cylinder 1, has stored the feed gas in the gas cylinder 1, and gas cylinder 1 and first gas circuit 11 intercommunication are equipped with first gas circuit valve 2, mass flow meter 3 and mass flow controller control flap 4 on the first gas circuit 11 in proper order, and first gas circuit valve 2 is located between gas cylinder 1 and the mass flow meter 3, and mass flow meter 3 is parallelly connected with mass flow controller control flap 4 for the gas flow in the detection control first gas circuit 11.
In a further optimized scheme, the preheating part is arranged between the mass flow meter 3 and the reactor 6, the preheating part is a preheating furnace 5 and/or a preheating furnace arranged on the first gas path 11,
the preheating part is a heat tracing band wound on the first gas path 11, and the preheating part can be the preheating furnace 5 or the heat tracing band, or the two heating bands are shared and arranged on the first gas path 11.
In a further optimization scheme, a gas-phase product gas outlet of the reactor 6 is provided with a product gas path valve 9 for controlling the flow of the meteorological product.
In a further optimized scheme, a quartz inner support 21 is arranged in the reactor 6, and the treated object is placed on the quartz inner support 21.
The treated object can be solid or liquid, the whole device can combine light treatment and heat treatment, and the light treatment (photooxidation treatment and photocatalysis treatment) can be used for pretreatment, so that the position is not required to be moved and the shadow of external light is not required to be irradiatedDirectly performing heat treatment, adjusting temperature range of the stainless steel heating furnace 12 from room temperature to 800 deg.C, adjusting illumination waveband (200-400 nm) via reflector, diaphragm and filter, and adjusting optical power density (0.05-300 mW/cm) 2 ) Can be adjusted by diaphragm, distance and current.
Example 1:
referring to fig. 1, the present embodiment is suitable for studying photo-oxidation and pyrolysis co-processing, and photo-oxidation and pyrolysis co-processing can also be performed. The light source 7 for adjusting the wave band adopts a UV xenon lamp (an ultraviolet reflector, an integrator and a diaphragm), the adjustable range is 200-400nm continuous spectrum, and the adjustable range of the optical power density is 0.05-300mW/cm 2 The temperature adjustable range is from room temperature to 800 ℃, the atmosphere is preheated by the preheating furnace 5 to reach the set temperature and enters the photo-thermal reaction kettle (namely the reactor 6), the preheating furnace 5 and the photo-thermal reaction kettle can adjust the program temperature rise, and no humidity adjusting device is arranged.
In the following devices of other embodiments, the common technical feature is that the first gas path 11 is communicated with the reactor 6 through the second gas path 13, the second gas path 13 is provided with a four-way valve 14, and the four-way valve 14 is communicated with a constant temperature circulating pump 15 for adjusting humidity.
Example 2:
referring to fig. 2, the difference from the above embodiment 1 is that a constant temperature circulating pump 15 is added to adjust the humidity, the humidity adjustable range is 20% -90%, and the rest of the control manner is the same as the adjustable manner and range of the embodiment 1. The embodiment can be used for researching the treatment influence of humidity, optical power density, illumination intensity, illumination wave band and temperature factors on the photooxidation of the treated object.
Example 3:
referring to fig. 3, the difference from the above example 2 is that the reactor 6 is connected with a catalyst filler 16, which can add catalyst in real time during the experiment operation and control the amount of catalyst, the catalyst can be powder or liquid, and the humidity, optical power density, illumination intensity, illumination band and temperature can be adjusted to perform the photocatalysis and pyrolysis treatment. The embodiment can be used for researching the treatment influence of the catalyst, humidity, optical power density, illumination intensity, illumination wave band and temperature factors on the photooxidation of the treated object.
Example 4:
referring to fig. 4, the difference from the above embodiment 2 is that the number of the first gas paths 11 is two, two first gas paths 11 respectively introduce different kinds of gases, the gas outlet ends of the two first gas paths 11 are both communicated with the gas inlet end of the second gas path 13, the gas inlet end of the second gas path 13 is provided with a second gas path valve 17, the second gas path 13 is provided with a gas mixer 18, the gas mixer 18 is located between the four-way valve 14 and the second gas path valve 17, in this embodiment, mixing of two gases can be controlled in real time, co-processing of photo-oxidation and pyrolysis is realized, and the rest of control modes are the same as the adjustable mode and range of the embodiment 2.
Example 5:
referring to fig. 5, the difference from the above embodiment 2 is that the number of the first gas paths 11 is two, two first gas paths 11 are respectively introduced with different kinds of gas, a third gas path valve 19 is installed at the gas outlet end of any one first gas path 11, and a fourth gas path valve 20 is installed at the gas outlet end of the other first gas path 11; the air outlet end of the first air path 11 provided with the fourth air path valve 20 is communicated with the air inlet end of the second air path 13; the other first gas path 11 extends into the reactor 6, and the first gas path 11 is adjusted by a stainless steel heating furnace 12 to be preheated to a set temperature in advance; when the fourth gas path valve 20 is opened and the third gas path valve 19 is closed, the photo-oxidation and pyrolysis treatment can be carried out; when the third air path valve 19 is opened and the fourth air path valve 20 is closed, the photo-oxidation and gasification treatment can be carried out; when the third air path valve 19 and the fourth air path valve 20 are opened simultaneously, the mixing ratio of the two gases can be controlled, two air paths are designed in the embodiment, and one air path can be adjusted by the stainless steel heating furnace 12 to preheat to the set temperature in advance. The two valves are opened simultaneously, so that the mixing proportion of the two gases can be controlled in real time; the embodiment can be used for researching the photo-oxidation treatment influence of reaction process atmosphere, humidity, optical power density, illumination intensity, illumination wave band and temperature factors on the treated object.
The following technical features are common technical features of embodiments 6 to 7, the light source 7 is disposed at the top of the reactor 6, the light guide tube 8 extends into the top opening of the reactor 6 in the vertical direction and/or the light source 7 is disposed at the side wall of the reactor 6, and the light guide tube 8 penetrates into the reactor 6 in the horizontal direction. The light sources 7 may be directed toward the top opening of the reactor 6 or the side wall of the reactor 6, or two light sources 7 may be provided, one directed toward the top opening of the reactor 6 and the other directed toward the side wall of the reactor 6.
Example 6:
referring to fig. 6, the difference from embodiment 2 is that this embodiment can realize side illumination of the light source 7, and the detachable quartz inner holder 21 is provided inside, so as to minimize the depth of the reactor 6. The rest control modes are the same as the adjustable modes and the range of the embodiment 2. Can be used by students who need to precisely control the optical power density.
Example 7:
referring to FIG. 7, the difference from example 2 is that this embodiment can realize the simultaneous side and top illumination of the light source 7, can explore the effect of illumination in different directions on the product, and can also increase the optical power density by more than 300mW/cm by adjusting 2 . The rest control modes are the same as the adjustable modes and the range of the embodiment 2.
A method for treating photocured waste through ultraviolet light-assisted pyrolysis is realized by the following steps:
the method comprises the following steps: the treated substance is placed in a reactor 6, the reactor 6 can be integrally taken out after the experiment is finished, the reactor is designed to be detachable at the bottom, the cleaning is convenient, and the reactor 6 can also be taken out after the experiment is finished;
step two: adjusting the illumination wave band, wherein the light source 7 comprises any one of a xenon lamp, a mercury lamp, a deuterium lamp and a metal halide lamp, the bulb wavelength of the light source 7 is 200-2500nm, an ultraviolet reflector can be used for adjusting the wave band range as required, and the adjustable wavelength of the optical filter is 254nm, 280nm, 290nm, 300nm, 313nm, 334nm, 350nm, 355nm and the like;
step three: adjusting the optical power density within the range of 0.05-300mW/cm 2 The device can be measured by an optical power meter and is provided with a light guide cylinder 8, the adjusting mode is coarse adjustment of a diaphragm and a distance (the range is 5-75 cm), and then fine adjustment is carried out by current;
step four: the prepared raw material gas enters a reactor 6 (a built-in backflow type gas-solid reactor), the mass flow of the raw material gas can be controlled, the gas phase flow range is 0-100 mL/min, the gas flow control precision is +/-1%, the atmosphere comprises a flowing atmosphere and an inert atmosphere, two gas paths can be arranged, and the atmosphere mixing ratio can be adjusted in real time. The gas path is wound with a heat tracing band, the highest temperature can reach 230 ℃, the atmosphere can be preheated to the specified temperature through a preheating furnace 5 or the heat tracing band and then enters a reactor 6;
step five: the temperature, humidity and optical power density can be adjusted in the reaction process. The temperature adjustable range is from room temperature to 800 ℃, a multi-stage heating program can be set according to actual needs, the heating rate range is 0-25 ℃/min, and the temperature control precision is +/-1 ℃. The adjustable range of the humidity is 20-90 percent;
step six: the temperature, the reaction pressure and the gas flow of the reactor 6 can be controlled and displayed by a process monitoring system in the reaction process, and the pressure and the temperature of the reactor 6 in the reaction process can also be monitored;
step seven: the flow velocity of a gas outlet of the gas phase product after the reaction is finished is adjustable, and a shunt pipeline is arranged, so that the infrared spectrum and the gas chromatography can be detected on line; the solid and liquid phase products are stored in the reactor 6, and can be taken out for detection.
Examples 8-14 below are further illustrated with respect to the above-described process.
Example 8:
the gas cylinder 1 is prepared according to 79 percent of nitrogen and 21 percent of oxygen. The photo-cured waste is taken out, pulverized into powder by a pulverizer or a file, and is spread in the built-in reactor 6 with a height of about 2mm. Adjusting the illumination wave band to 200-400nm by using an ultraviolet reflector, adjusting the illumination distance (75 cm), the aperture/diaphragm cover and the current to adjust the illumination intensity to 200mW/cm 2 The temperature was 200 ℃, the test time was 6 hours, the object was observed at 3 hours, the detection part 10 was connected to analyze the gaseous product, and the remaining solid was tested by SEM.
Example 9:
according to 79 percent of nitrogen and 21 percent of oxygen, the gas cylinder 1 is prepared. Collecting the photo-cured waste, pulverizing into powder with a pulverizer or a file, spreading in a built-in reactor 6, and levelingThe bed height was about 2mm. Adjusting the illumination wave band to 200-400nm by using an ultraviolet reflector, adjusting the illumination distance (75 cm), the aperture/diaphragm cover and the current to adjust the illumination intensity to 100mW/cm 2 The temperature was 200 ℃, the test time was 6 hours, the object to be treated was observed at 3 hours, the detection part 10 was connected to analyze the gaseous product, and the remaining solid was tested by SEM.
Example 10:
the gas cylinder 1 is prepared according to 79 percent of nitrogen and 21 percent of oxygen. The photo-cured waste is taken out, pulverized by a pulverizer or a file, and spread in the built-in reactor 6 to a height of about 2mm. Adjusting illumination band to 200-400nm by using ultraviolet reflector, adjusting illumination distance (75 cm), aperture/diaphragm cover and current to 300mW/cm 2 The temperature was 200 ℃, the test time was 6 hours, the object was observed at 3 hours, the detection part 10 was connected to analyze the gaseous product, and the remaining solid was tested by SEM.
Example 11:
the gas cylinder 1 is prepared according to 79 percent of nitrogen and 21 percent of oxygen. The photo-cured waste is taken out, pulverized into powder by a pulverizer or a file, and is spread in the built-in reactor 6 with a height of about 2mm. Adjusting illumination band to 200-400nm by using ultraviolet reflector, adjusting illumination distance (75 cm), aperture/diaphragm cover and current to 200mW/cm 2 The temperature was 200 ℃, the test time was 3 hours, and the object was observed at 1.5 hours, the gaseous product was analyzed by the connection detection unit 10, and the remaining solid was tested by SEM.
Example 12:
the gas cylinder 1 is prepared according to 79 percent of nitrogen and 21 percent of oxygen. The photo-cured waste is taken out, pulverized by a pulverizer or a file, and spread in the built-in reactor 6 to a height of about 2mm. Adjusting illumination band to 200-400nm by using ultraviolet reflector, adjusting illumination distance (75 cm), aperture/diaphragm cover and current to 200mW/cm 2 At 200 ℃ for 12 hours and 6 hours, the object was observed, the gas product was analyzed by the connection detector 10, and the remaining solid was measured by SEM。
Example 13:
the gas cylinder 1 is prepared according to 79 percent of nitrogen and 21 percent of oxygen. The photo-cured waste is taken out, pulverized by a pulverizer or a file, and spread in the built-in reactor 6 to a height of about 2mm. Adjusting the illumination wave band to 200-400nm by using an ultraviolet reflector, adjusting the illumination distance (75 cm), the aperture/diaphragm cover and the current to adjust the illumination intensity to 200mW/cm 2 The temperature was 100 ℃, the test time was 6 hours, the object was observed at 3 hours, the connection detector 10 analyzed the gaseous product, and the remaining solid was tested by SEM.
Example 14:
the gas cylinder 1 is prepared according to 79 percent of nitrogen and 21 percent of oxygen. The photo-cured waste is taken out, pulverized into powder by a pulverizer or a file, and is spread in the built-in reactor 6 with a height of about 2mm. Adjusting illumination band to 200-400nm by using ultraviolet reflector, adjusting illumination distance (75 cm), aperture/diaphragm cover and current to 200mW/cm 2 The temperature was 300 ℃, the test time was 6 hours, the object was observed at 3 hours, the detection part 10 was connected to analyze the gaseous product, and the remaining solid was tested by SEM.
In the description of the present invention, it is to be understood that the terms "longitudinal", "lateral", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on those shown in the drawings, are merely for convenience of description of the present invention, and do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be construed as limiting the present invention.
The above-described embodiments are only intended to illustrate the preferred embodiments of the present invention, and not to limit the scope of the present invention, and various modifications and improvements made to the technical solution of the present invention by those skilled in the art without departing from the spirit of the present invention should fall within the protection scope defined by the claims of the present invention.
Claims (6)
1. An apparatus for ultraviolet light assisted pyrolysis treatment of photo-cured waste, comprising:
a gas storage portion for storing a feed gas;
the number of the first air passages (11) is at least one, the first air passages (11) are communicated with the air storage part, and air passing through the first air passages (11) is preheated by a preheating piece;
the reaction part comprises a reactor (6), the reactor (6) is communicated with the first gas path (11), the reactor (6) is arranged in a stainless steel heating furnace (12), the reactor (6) is connected with a light guide cylinder (8), the light guide cylinder (8) is connected with a light source (7), the number of the light sources (7) is at least one, and the number of the light guide cylinders (8) corresponds to the number of the light sources (7) one by one;
the detection part (10), the detection part (10) is connected with the gas outlet of the gas product of the reactor (6) and is used for detecting the infrared spectrum and the gas chromatogram of the gas product on line;
the gas storage part comprises at least one gas cylinder (1), wherein a feed gas is stored in the gas cylinder (1), the gas cylinder (1) is communicated with the first gas path (11), a first gas path valve (2), a mass flow meter (3) and a mass flow controller control valve (4) are sequentially arranged on the first gas path (11), the first gas path valve (2) is positioned between the gas cylinder (1) and the mass flow meter (3), and the mass flow meter (3) is connected with the mass flow controller control valve (4) in parallel;
the preheating part is arranged between the mass flow meter (3) and the reactor (6), the preheating part is a preheating furnace (5) arranged on the first gas path (11) and/or is arranged on the first gas path,
the preheating piece is a heat tracing band wound on the first air path (11);
the first gas path (11) is communicated with the reactor (6) through a second gas path (13), a four-way valve (14) is mounted on the second gas path (13), and the four-way valve (14) is communicated with a constant-temperature circulating pump (15);
the quantity of first gas circuit (11) is two, two first gas circuit (11) lets in different types of gas respectively, two the end of giving vent to anger of first gas circuit (11) all with the inlet end intercommunication of second gas circuit (13), just second gas circuit valve (17) are installed to the inlet end of second gas circuit (13), install gas mixer (18) on second gas circuit (13), gas mixer (18) are located four-way valve (14) with between second gas circuit valve (17).
2. The apparatus for ultraviolet light assisted pyrolysis treatment of photo-cured waste as claimed in claim 1, wherein: the reactor (6) is connected with a catalyst filler (16), and a gas-phase product gas outlet of the reactor (6) is provided with a product gas path valve (9).
3. The apparatus for ultraviolet light assisted pyrolysis treatment of photo-cured waste as claimed in claim 1, wherein: the number of the first air paths (11) is two, different types of gas are respectively introduced into the two first air paths (11), a third air path valve (19) is installed at the gas outlet end of any one first air path (11), and a fourth air path valve (20) is installed at the gas outlet end of the other first air path (11);
the air outlet end of the first air path (11) provided with the fourth air path valve (20) is communicated with the air inlet end of the second air path (13); the other first gas path (11) extends into the reactor (6), and the first gas path (11) is adjusted to be preheated to a set temperature in advance through the stainless steel heating furnace (12);
when the fourth gas path valve (20) is opened and the third gas path valve (19) is closed, the photooxidation and pyrolysis treatment can be carried out; when the third gas path valve (19) is opened and the fourth gas path valve (20) is closed, the photooxidation and gasification treatment can be carried out; when the third gas path valve (19) and the fourth gas path valve (20) are opened simultaneously, the mixing ratio of the two gases can be controlled.
4. The apparatus for ultraviolet light assisted pyrolysis treatment of photo-cured waste as claimed in claim 1, wherein: the light source (7) is arranged at the top of the reactor (6), the light guide cylinder (8) extends into the top opening and/or the bottom opening of the reactor (6) along the vertical direction,
the light source (7) is arranged on the side wall of the reactor (6), and the light guide cylinder (8) penetrates into the reactor (6) along the horizontal direction.
5. The apparatus for ultraviolet light assisted pyrolysis treatment of photo-cured waste as claimed in claim 1, wherein: and a quartz inner support (21) is arranged in the reactor (6).
6. The method for treating the photo-curing waste through ultraviolet light-assisted pyrolysis is based on the device for treating the photo-curing waste through ultraviolet light-assisted pyrolysis as claimed in claim 1, and is characterized by comprising the following steps of:
the method comprises the following steps: placing the treated substance in the reactor (6);
step two: adjusting the illumination wave band according to the requirement;
step three: adjusting the optical power density;
step four: preheating the prepared feed gas to a specified temperature, and introducing the feed gas into the reactor (6);
step five: carrying out reaction, and adjusting temperature, humidity and optical power density according to requirements in the reaction process;
step six: monitoring and controlling the temperature, reaction pressure and gas flow of the reactor (6) during the reaction;
step seven: and (3) after the reaction is finished, detecting the infrared spectrum and the gas chromatography of the gas phase product on line, and simultaneously taking out and detecting the solid phase product and the liquid phase product in the reactor (6).
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