CN114100998A - Method for preparing micro-nano structure on surface of substrate, substrate with micro-nano structure on surface and application of substrate - Google Patents
Method for preparing micro-nano structure on surface of substrate, substrate with micro-nano structure on surface and application of substrate Download PDFInfo
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- CN114100998A CN114100998A CN202111195108.7A CN202111195108A CN114100998A CN 114100998 A CN114100998 A CN 114100998A CN 202111195108 A CN202111195108 A CN 202111195108A CN 114100998 A CN114100998 A CN 114100998A
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
- B05D3/065—After-treatment
- B05D3/067—Curing or cross-linking the coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
- B05D3/141—Plasma treatment
- B05D3/145—After-treatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/08—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface
Abstract
The invention relates to a method for preparing a micro-nano structure on the surface of a base material, the base material with the micro-nano structure on the surface and application thereof. The method comprises the following steps: providing a substrate and a micro-nano texture template with a micro-nano three-dimensional structure; applying a transfer UV glue on the substrate; applying the micro-nano texture template on the transfer printing UV glue through UV transfer printing, preparing a transition glue layer through UV curing, removing the micro-nano texture template, and preparing an intermediate; and performing plasma etching on the intermediate by using an etching plasma source to remove the transition adhesive layer in the area needing to be etched on the surface of the substrate, and etching a three-dimensional structure with a micro-nano size on the surface of the substrate. The method has the advantages of simple operation, controllable micro-nano structure appearance, low cost, long acting and large-scale application. In addition, the use of exposure and development can be reduced, and the equipment cost and the manufacturing cost can be saved.
Description
Technical Field
The invention relates to the technical field of material surface processing, in particular to a method for preparing a micro-nano structure on the surface of a base material, the base material with the micro-nano structure on the surface and application thereof.
Background
The UV transfer printing process is also called as UV filling process or UV coating process, and utilizes the non-stick characteristic of UV transfer printing glue and metal to transfer various ultrathin key effects to polyethylene glycol terephthalate (PET), Polycarbonate (PC) or polymethyl methacrylate (PMMA) sheets through the UV transfer printing process, so that the ultrathin key is made, and the ultrathin key comprises CD grains, wiredrawing grains, sun grains, batch patterns, woven grains, sand-blasting grains, dermatoglyph, 3D surface, multicolor effect, bulging effect, cat eye effect, matte surface, bright surface, high bright surface and other effects, and is characterized in that: (1) the coating has good optical property, high hardness, excellent friction resistance, good chemical resistance and strong stain resistance; (2) the reflective effect is good, the appearance patterns are varied, and the reflective paint is wear-resistant and press-resistant; (3) the metal key has ultra-thin property; (4) the one-step forming is realized, and complex processes such as punching, spraying, laser etching, assembling and the like are avoided; (5) high solvent resistance, delicate appearance and the like.
Compared with a material with a common surface, the material with the surface having the micro-nano structure can be obviously improved in certain properties. The research and development of the micro-nano structure array can be traced back to the integrated photography of the cat eye lens plate proposed by Lippman in the beginning of the 20 th century at the earliest. In 2007, researchers of Korean LG company report that the light output efficiency of an OLED is enhanced by using a high-filling-factor micro-nano structure array, and the micro-nano structure array with high filling factor is manufactured on the surface of an OLED device by utilizing a micro-mechanical manufacturing process of channel forming and high-molecular conformal coating vapor deposition, so that the output efficiency of the OLED is improved by 48%.
Then, people find that the micro-nano structure morphology can also be used in other fields, such as inorganic cover plates (glass cover plates, quartz and the like) or organic material cover plates and the like, but in the process of preparing the micro-nano structure, the problems of complex process, poor morphology controllability and the like of the currently adopted preparation method are found.
Disclosure of Invention
Based on the above, the invention aims to provide a method for preparing a material surface micro-nano structure with simple process and controllable micro-nano structure morphology.
The technical scheme is as follows:
a method for preparing a micro-nano structure on the surface of a base material comprises the following steps:
providing a substrate and a micro-nano texture template with a micro-nano three-dimensional structure;
applying a transfer UV glue on the substrate;
applying the micro-nano texture template on the transfer printing UV glue through UV transfer printing, preparing a transition glue layer through UV curing, removing the micro-nano texture template, and preparing an intermediate;
and carrying out plasma etching on the intermediate by adopting an etching plasma source to remove the transition adhesive layer, and etching a three-dimensional structure with a micro-nano size on the surface of the substrate.
In one embodiment, the micro-nano three-dimensional stereo structure is in an ordered arrangement structure and/or a disordered arrangement structure.
In one embodiment, the ordered arrangement structure is at least one of a lattice stereo structure and a linear array stereo structure.
In one embodiment, the micro-nano-sized three-dimensional stereo structure is at least one of a pyramid shape, a cylinder shape, a sphere shape and an irregular shape.
In one embodiment, during the plasma etching, the method further comprises the steps of continuously replenishing the plasma etching source and removing gaseous compounds generated by the etching plasma source and the transition glue layer and/or the surface of the substrate.
In one embodiment, the substrate is at least one of a resinous organic material, a silicon-containing inorganic material, diamond, sapphire, and a metal.
In one embodiment, the organic material is selected from at least one of polyethylene terephthalate, polycarbonate, polymethacrylate, polyimide, polystyrene, polyurethane, polypropylene, and polyethylene;
the silicon-containing inorganic material is at least one selected from glass, sapphire, quartz, silicon and silicon carbide and ceramics.
In one embodiment, the substrate is a resinous organic material and the etching plasma source is an oxygen-containing plasma source;
the base material is a silicon-containing inorganic material, diamond, sapphire or metal, and the etching plasma source is a fluorine-containing plasma gas source or a chlorine-containing plasma gas source;
the base material is a mixed material containing resin organic materials and inorganic materials, and the etching plasma source is a mixed plasma gas source containing an oxygen-containing plasma source and a fluorine-containing plasma gas source or a chlorine-containing plasma gas source.
In one embodiment, the main material of the transfer UV paste includes: one or more of UV light-initiated resins such as epoxy acrylate, amino acrylate, polyether resin, acrylic resin, unsaturated polyester, alcohol compound, cationic resin, epoxy resin, and silicone resin. In addition, the transfer UV glue also comprises an initiator and an auxiliary agent.
In one embodiment, the UV curing comprises: and irradiating by adopting a UV parallel light source or a UV non-parallel light source or a UV laser light source to enable a UV photoinitiator in the UV transfer glue to activate the main material in the glue for reaction, and curing and adhering the main material on the surface of the base material.
In one embodiment, the method for preparing the micro-nano structure on the surface of the substrate further comprises the following steps: and cleaning the surface of the substrate subjected to the plasma etching operation.
In one embodiment, the method for preparing the micro-nano structure on the surface of the substrate further comprises the following steps: and preparing a modification layer on the surface of the base material subjected to the cleaning operation by adopting a surface modification material.
In one embodiment, the surface modification material is a hydrophobic material, and the corresponding surface modification layer is a hydrophobic layer; or the surface modification material is an oleophobic material, and the corresponding surface modification layer is an oleophobic layer; or the surface modification material is a hydrophobic and oleophobic material, and the corresponding surface modification layer is a hydrophobic and oleophobic layer.
The invention also provides a base material with the surface provided with the micro-nano structure, and the micro-nano structure on the surface is prepared by the method for preparing the micro-nano structure on the surface of the base material.
The invention also provides a surface functional part which comprises the base material with the micro-nano structure on the surface.
The invention has the following beneficial effects:
the method for preparing the micro-nano structure on the surface of the base material mainly comprises the steps of UV transfer printing and plasma etching, and has the advantages of simplicity and easiness in operation, controllable micro-nano structure appearance, low cost, long acting and large-scale application. In addition, the use of exposure and development can be reduced, and the equipment cost and the manufacturing cost can be saved.
Furthermore, if the micro-nano structure is manufactured on the surface of the resin material, the effect of high water contact angle and the anti-fingerprint effect can be directly formed, the greasy hand feeling and the bionic characteristic are obtained, and the effects of hydrophobicity or oleophobicity, stain resistance and abrasion resistance are achieved. If the micro-nano structure is used for manufacturing the outer surface of the window glass or the rearview mirror, the influence on the visual effect caused by the residual water drops can be prevented, and the micro-nano structure is resistant to dirt. If the micro-nano structure is manufactured on the surface of tableware, the non-stick property can be formed, and the unhealthy characteristic of the existing non-stick coating is solved. Or the micro-nano structure is manufactured on the outer surface of an airplane or the surface of other outdoor materials, so that the anti-icing property can be improved. Or the micro-nano structure is manufactured on the bottom surfaces of ship bodies, naval vessels, steamships and the like, or the surfaces of diving suits and swimsuits, so that the water resistance can be effectively reduced, the energy and energy loss can be saved, and the speed can be increased.
Drawings
Fig. 1 is a schematic flow chart of a process for preparing a micro-nano structure on a substrate surface according to an embodiment of the invention;
fig. 2 is a schematic structural diagram of a micro-nano texture template, a transition glue layer, a substrate and a substrate with a micro-nano structure on the surface according to an embodiment of the invention;
FIG. 3 is a schematic structural diagram of a substrate with a micro-nano structure on the surface according to example 1;
FIG. 4 is a schematic structural diagram of a substrate with a micro-nano structure on the surface according to example 2;
fig. 5 is a schematic structural diagram of a substrate having a micro-nano structure on a surface according to example 3.
Detailed Description
The present invention will be described in further detail with reference to the following specific embodiments and the accompanying drawings. The present invention may be embodied in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
The invention aims to provide a method for preparing a material surface micro-nano structure with simple working procedures and controllable micro-nano structure appearance.
The technical scheme is as follows:
referring to fig. 1, the method for preparing a micro-nano structure on a substrate surface provided by the invention comprises the following steps:
s10, providing a substrate and a micro-nano texture template with a micro-nano three-dimensional structure;
s20, applying transfer printing UV glue on the base material;
s30, applying the micro-nano texture template on the transfer UV glue through UV transfer printing;
s40, preparing a transition adhesive layer through UV curing, removing the micro-nano texture template, and preparing an intermediate;
s50, performing plasma etching on the intermediate by using an etching plasma source to remove the transition adhesive layer, and etching a three-dimensional structure with a micro-nano size on the surface of the substrate.
The specific description is as follows:
s10, providing a substrate and a micro-nano texture template with a micro-nano three-dimensional structure
In one embodiment, the substrate is at least one of a resinous organic material, a silicon-containing inorganic material, diamond, sapphire, and a metal.
Further, the resin organic material is selected from at least one of polyethylene terephthalate, polycarbonate, polymethacrylate, polyimide, polystyrene, polyurethane, polypropylene and polyethylene; the silicon-containing inorganic material is at least one selected from glass, quartz, silicon carbide and ceramics.
It can be understood that if the micro-nano structure is manufactured on the surfaces of polyethylene terephthalate, polycarbonate, polypropylene and polyethylene resin materials, the high water contact angle effect and the fingerprint prevention effect can be directly formed, the greasy hand feeling and the bionic characteristic are obtained, and the effects of hydrophobicity or oleophobicity, stain resistance and abrasion resistance are achieved.
In one embodiment, the micro-nano three-dimensional stereo structure is in an ordered arrangement structure and/or a disordered arrangement structure; the ordered arrangement structure is at least one of a lattice three-dimensional structure and a linear array three-dimensional structure. Further, the micro-nano three-dimensional structure is at least one of a cone, a cylinder, a sphere and an irregular shape.
In the invention, the micro-nano three-dimensional structures can be distributed in different modes by adopting different shapes, so that different requirements of customers can be met.
S20: application of transfer UV glue to a substrate
In one embodiment, the main material of the transfer UV paste includes: one or more of epoxy acrylate, amino acrylate, polyether resin, acrylic resin, unsaturated polyester, alcohol compound, cationic resin, epoxy resin, silicone resin, and UV light-initiated resin. In addition, the transfer UV glue also comprises an initiator and an auxiliary agent.
S30: applying the micro-nano texture template on the transfer UV glue by UV transfer printing comprises:
dispensing glue at one side of a substrate surface area needing to be provided with micro-nano structure textures to enable transfer printing UV glue to be linear, placing a micro-nano texture template with a micro-nano three-dimensional structure on the transfer printing UV glue, enabling the micro-nano texture surface to be in contact with the glue, aligning the micro-nano texture template with the micro-nano three-dimensional structure with the micro-nano size with the substrate area needing to be provided with the micro-nano texture, applying roller pressure on the micro-nano texture template with the micro-nano three-dimensional structure, rolling the micro-nano texture template from one side of the dispensing glue to the opposite side, enabling the micro-nano texture surface of the template and the corresponding gap of the substrate surface at the corresponding position to be completely filled with the transfer printing UV glue, enabling the thickness of the filling transfer printing UV glue layer to be determined by the applied pressure and the transfer printing UV glue viscosity to obtain the required thickness, and fixing the glue layer and the micro-nano texture through UV curing.
S40: preparing a transition adhesive layer through UV curing, removing the micro-nano texture template, and preparing an intermediate;
the UV curing includes: and irradiating by adopting a UV parallel light source or a UV non-parallel light source or a UV laser light source to enable a UV photoinitiator in the UV transfer glue to activate the main material in the glue for reaction, and curing and adhering the main material on the surface of the base material.
And initiating the transfer printing UV glue to react by adopting a UV light source, wherein the UV light source can be parallel light or non-parallel light. The UV light changes the transfer printing UV glue from a liquid state to a solid state, so that the interface morphology of the adhesion of the glue layer and the boundary of the glue layer is fixed. If the substrate is in a UV light transmitting state, UV light can irradiate the transfer printing UV glue from one side of the substrate; the substrate is in a non-UV-transparent state, a micro-nano texture template with a three-dimensional structure of micro-nano size is required to be in a UV-transparent state, and UV light is required to irradiate and transfer UV glue through one side of the micro-nano texture template with the three-dimensional structure of micro-nano size; if the substrate and the texture mold can transmit UV light, the UV light can be irradiated from two sides or one side of the substrate and the micro-nano texture template with the three-dimensional structure of micro-nano size.
In one embodiment, the UV cure operating parameters include: the energy of a full UV wave band non-parallel light source is 100 mJ-1000 mJ, the curing time is 1 s-20 s, and the total thickness of a transfer printing UV adhesive layer is 100 nm-1000 nm.
S50: performing plasma etching on the intermediate by using an etching plasma source to remove the transition adhesive layer (of the area to be etched on the surface of the substrate), and etching a three-dimensional structure with micro-nano size on the surface of the substrate
And under a vacuum environment, etching the intermediate by using the etching plasma source, wherein the etching plasma source reacts with a region with a thinner thickness on the transition adhesive layer, the transition adhesive layer is gradually removed, the region to be etched on the surface of the base material is exposed, and the micro-nano structure morphology corresponding to the micro-nano texture template structure is gradually etched on the surface of the base material through plasma etching.
In one embodiment, during the plasma etching, the method further comprises the steps of continuously replenishing the plasma etching source and removing gaseous compounds generated by the etching plasma source and the transition glue layer and/or the surface of the substrate.
In one embodiment, if the substrate is a resinous organic material, the etching plasma source is an oxygen-containing plasma source;
if the base material is a silicon-containing inorganic material, diamond, sapphire or metal, the etching plasma source is a fluorine-containing plasma gas source or a chlorine-containing plasma gas source;
the base material is a mixed material containing a resin organic material and the inorganic material, and the etching plasma source is a mixed plasma gas source containing an oxygen-containing plasma source and a fluorine-containing plasma gas source or a chlorine-containing plasma gas source.
After the transition adhesive layer is manufactured on the surface of the base material, the plasma etching can adopt a single-component plasma etching source to carry out fractional step-by-step etching; or a mixed plasma etching source can be adopted, the synchronous etching of the transition adhesive layer and the surface of the etching base material is formed by adjusting the composition ratio of the etching plasma source, and then different types of etching appearances are formed by combination, and the appearance type of the transition adhesive layer is formed by etching on the surface of the base material.
S60: post-treatment
In one embodiment, the method for preparing the micro-nano structure on the surface of the substrate further comprises the following steps: and cleaning the surface of the substrate subjected to the plasma etching operation.
In one embodiment, the method for preparing the micro-nano structure on the surface of the substrate further comprises the following steps: and preparing a modification layer on the surface of the base material subjected to the cleaning operation by adopting a surface modification material.
In one embodiment, the surface modification material is a hydrophobic material, and the corresponding surface modification layer is a hydrophobic layer; or the surface modification material is an oleophobic material, and the corresponding surface modification layer is an oleophobic layer; or the surface modification material is a micro-hydrophobic and oleophobic material, and the corresponding surface modification layer is a hydrophobic and oleophobic layer.
Taking a micro-nano texture template with a micro-nano spherical structure as an example to prepare a micro-nano structure on the surface of a substrate according to the method of the invention, each element can be seen in fig. 2, wherein 101 is the micro-nano texture template with the micro-nano three-dimensional structure, 102 is transfer printing UV glue after curing, 103 is the substrate, 104 is the substrate which is not completely etched, and 105 is the substrate with the micro-nano spherical structure on the surface.
The invention also provides a base material with the surface provided with the micro-nano structure, and the micro-nano structure on the surface is prepared by the method for preparing the micro-nano structure on the surface of the base material.
The invention also provides a surface functional part which comprises the base material with the micro-nano structure on the surface.
In one embodiment, the surface functional component is an electronic cover, housing or trim component.
The present invention will be described in further detail with reference to specific examples.
DETAILED DESCRIPTION OF EMBODIMENT (S) OF INVENTION
Example 1
The PET membrane with the surface provided with the three-dimensional concave columnar array micro-nano texture template with the diameter of 2.5 mu m and the depth of 300nm is used as a transfer printing mold, the texture surface has an anti-sticking effect, and the PET membrane is not adhered to the transfer printing UV glue after curing.
And (3) point-transferring a UV glue line on one side of the edge of the outer surface of the PMMA \ PC composite board substrate, placing a transfer printing mold PET membrane on the glue line substrate, wherein the side of the mold texture faces the UV glue, and the mold texture area corresponds to the texture area to be manufactured on the substrate. And applying roller pressure on the outer surface of the transfer printing mold, and rolling from one side of the dispensing line to the corresponding side to completely fill the transfer printing UV glue between the texture surface of the transfer printing mold and the surface of the base material.
Irradiating and transferring the UV adhesive layer for 6s through a full-waveband UV area light source with energy of 360mJ, curing to prepare a transition adhesive layer, removing the micro-nano texture template, and preparing an intermediate, wherein the total thickness of the transition adhesive layer is 500 nm;
and carrying out plasma etching on the intermediate by adopting an oxygen-containing plasma source to remove the transition adhesive layer of the area needing to be etched on the surface of the base material, wherein the transition adhesive layer of the area with the smaller thickness is etched to expose the surface of the base material of the area needing to be etched, and the transition adhesive layer with the thicker thickness is gradually etched along with the continuous etching of the transition adhesive layer to expose the area of the base material covered by the transition adhesive layer. And etching the surface of the base material by using an etching plasma source along with the bare leakage of the surface of the base material in the coverage area of the transition adhesive layer, and gradually expanding the etching on the surface of the base material to the thickest coverage area of the transition adhesive layer along with the reduction of the etching of the transition adhesive layer, so that the surface micro-nano morphology close to the texture template is etched on the surface of the base material. Wherein, the etching depth of the base material is about 300nm, the micro-nano texture on the surface of the base material is columnar, and the diameter is about 2.3 μm. The micro-nano texture topography micrograph is shown in figure 3.
The approximate columnar micro-nano texture structure on the surface of the PMMA \ PC composite board substrate can improve the surface water contact angle (or assist the manufacture of a transition layer to improve the contact angle or the hardness or the combination), and has a high-transparency AG matte effect. The substrate with the micro-nano structure on the surface can be used as a shell substrate of a consumer electronic product, or a hydrophobic shell substrate, or a surface substrate of a touch product, and different effects can be realized through the size of the micro-nano structure.
Through tests, after the substrate is provided with the micro-nano texture, the surface contact angle is improved from a 76-degree water contact angle without the texture to a 96-degree contact angle with the micro-nano texture shown in the figure, and the substrate has good waterproof property.
Example 2
The PET film with the surface provided with the three-dimensional convex column array micro-nano texture template with the diameter of 600nm and the depth of 200nm is used as a transfer printing mold, the texture surface has an anti-sticking effect, and the PET film is not adhered to the transfer printing UV glue after curing.
And (3) point-transferring UV glue lines on one side of the edge of the outer surface of the high-alumina-silica glass substrate, placing a transfer printing mold PET membrane on the glue line substrate, wherein the transfer printing UV glue is arranged on one side of the mold texture, and the mold texture area corresponds to the texture area to be manufactured of the substrate. And applying roller pressure on the outer surface of the transfer printing mold, and rolling from one side of the dispensing line to the corresponding side to completely fill the transfer printing UV glue between the texture surface of the transfer printing mold and the surface of the base material.
Irradiating the UV adhesive layer for 6s through a full-waveband UV area light source with energy of 360mJ, curing to prepare a transition adhesive layer, removing the micro-nano texture template, and preparing an intermediate, wherein the total thickness of the transition adhesive layer is 300 nm.
And carrying out plasma etching on the intermediate by adopting an oxygen-containing plasma source, etching the intermediate with the thickness of 50-100 nm, exposing the surface of the base material covered by the thinnest region of the transition adhesive layer, and gradually expanding the surface of the base material covered by the thickest region of the transition adhesive layer. And after the surface of the base material covered by the thinnest area of the transition adhesive layer is exposed, etching the exposed surface of the base material by using a fluorine-containing plasma etching source, etching the surface of the base material to the thickness of 200nm, and removing residual intermediate by using an oxygen-containing plasma source or removing the residual adhesive layer by using an atmospheric wet method (wet corrosion stripping or wet dissolution stripping or the combination of the above). Finally, the substrate surface is etched to form an approximate concave column array structure, wherein the diameter of the concave column is about 600nm, and the depth is 200 nm. The micro-nano texture topography micrograph is shown in fig. 4.
An AF coating is manufactured on the surface of the micro-nano structure of the base material, so that the surface contact angle can be obviously improved, and the wear resistance of the shrink oil characteristic can be improved.
The approximate columnar micro-nano texture structure on the surface of the glass substrate is combined with the AF coating, so that the water contact angle of the surface can be obviously improved, and meanwhile, the AG matte effect with high transparency is achieved. The substrate with the micro-nano structure on the surface can be used as a shell substrate of a consumer electronic product, or a hydrophobic shell substrate, or a surface substrate of a touch product, and different effects can be realized through the size of the micro-nano structure.
After testing, after the substrate is provided with the micro-nano texture, the surface contact angle of the auxiliary fingerprint-proof layer is increased from a non-texture 100-degree water contact angle to a graphical micro-nano texture 120-degree contact angle; the wear resistance is improved from a non-textured surface hydrolysis angle of 80 degrees after 3000 degrees to a textured water contact angle of 110 degrees, and the waterproof and wear-resistant properties are good.
Example 3
The template which is formed by combining irregularly-arranged 1 micron-depth dot-shaped patterns with the surface appearance of 10 microns is used as a micro-nano texture mold, the texture surface has an anti-sticking effect, and the micro-nano texture mold is not adhered to the solidified transfer printing UV adhesive.
UV glue lines are point-transferred on one side of the surface edge of the micro-nano texture manufactured on the surface of the glass substrate, a micro-nano texture transfer printing mold is placed on the glue line substrate, the UV glue is transferred towards one side of the mold texture, and the texture area of the mold corresponds to the texture area of the substrate to be manufactured. And applying roller pressure on the outer surface of the transfer printing mold, and rolling from one side of the dispensing line to the corresponding side to completely fill the transfer printing UV glue between the texture surface of the transfer printing mold and the surface of the base material.
Irradiating the UV adhesive layer for 6s by a full-waveband UV area light source with energy of 800mJ, curing to prepare a transition adhesive layer, removing the micro-nano texture template, and preparing an intermediate, wherein the total thickness of the transition adhesive layer is 2 mu m.
And carrying out plasma etching on the intermediate by adopting an oxygen-containing and fluorine-containing plasma mixed etching source, wherein the mixing ratio is 1: 1, etching the thinnest area of the intermediate to expose the surface of the substrate, etching the area in advance under the action of a fluorine-containing plasma source, and gradually forming the appearance of the three-dimensional structure of the texture-like template on the surface of the substrate along with simultaneous etching of the substrate and the intermediate. Removing residual intermediate with oxygen-containing plasma source, or removing residual glue layer with atmospheric wet method (wet etching stripping or wet dissolving stripping or combination thereof). And finally, etching the surface of the substrate to form a three-dimensional micro-nano structure similar to the texture template appearance. The micro-nano texture topography micrograph is shown in fig. 5.
An AF coating is manufactured on the surface of the micro-nano structure of the base material, so that the surface contact angle can be obviously improved, and the wear resistance of the shrink oil characteristic can be improved.
The micro-nano texture structure similar to AG on the surface of the glass substrate is compounded with the AF coating, so that the water contact angle of the surface and the hydrophobic and oleophobic characteristics can be obviously improved. Can be used as a consumer electronics housing substrate, or a hydrophobic housing substrate, or a surface substrate for touch sensitive products. Different effects can be realized by the size of the micro-nano structure.
After the AG-like micro-nano texture is manufactured on the base material, the surface contact angle of the auxiliary anti-fingerprint layer is increased from the non-texture 100-degree water contact angle to the graphic micro-nano texture 115-degree contact angle; meanwhile, the micro-nano base material has the anti-glare property.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, so as to understand the technical solutions of the present invention specifically and in detail, but not to be understood as the limitation of the protection scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. It should be understood that the technical solutions provided by the present invention, which are obtained by logical analysis, reasoning or limited experiments, are within the scope of the appended claims. Therefore, the protection scope of the patent of the present invention shall be subject to the content of the appended claims, and the description and the attached drawings can be used for explaining the content of the claims.
Claims (12)
1. A method for preparing a micro-nano structure on the surface of a base material is characterized by comprising the following steps:
providing a substrate and a micro-nano texture template with a micro-nano three-dimensional structure;
applying a transfer UV glue on the substrate;
applying the micro-nano texture template on the transfer printing UV glue through UV transfer printing, preparing a transition glue layer through UV curing, removing the micro-nano texture template, and preparing an intermediate;
and carrying out plasma etching on the intermediate by adopting an etching plasma source to remove the transition adhesive layer, and etching a three-dimensional structure with a micro-nano size on the surface of the substrate.
2. A method for preparing a micro-nano structure on the surface of a substrate according to claim 1, wherein the three-dimensional structure with the micro-nano size is in an ordered arrangement structure and/or a disordered arrangement structure.
3. A method for preparing a micro-nano structure on the surface of a substrate according to claim 2, wherein the three-dimensional structure of the micro-nano size is at least one of a cone shape, a cylinder shape, a sphere shape, a line shape and an irregular shape.
4. The method for preparing a micro-nano structure on the surface of a substrate according to any one of claims 1 to 3, characterized in that the method further comprises a process of continuously replenishing the plasma etching source and removing gaseous compounds generated by the etching plasma source and the transition glue layer and/or the surface of the substrate during the plasma etching process.
5. The method for preparing a micro-nano structure on the surface of a substrate according to any one of claims 1 to 3, wherein the substrate is at least one of a resin organic material, a silicon-containing inorganic material, diamond, sapphire and a metal.
6. A method for preparing a micro-nano structure on the surface of a substrate according to claim 5, wherein the resin organic material is at least one selected from polyethylene terephthalate, polycarbonate, polymethacrylate, polyimide, polystyrene, polyurethane, polypropylene and polyethylene;
the silicon-containing inorganic material is at least one selected from glass, quartz, silicon carbide and ceramics.
7. The method for preparing the micro-nano structure on the surface of the substrate according to claim 5, wherein the substrate is a resin organic material, and the etching plasma source is an oxygen-containing plasma gas source;
the base material is silicon-containing inorganic material, diamond, sapphire or metal, and the etching plasma source is fluorine-containing plasma gas source or chlorine-containing plasma gas source.
8. The method for preparing the micro-nano structure on the surface of the substrate according to any one of claims 1 to 3, wherein the UV curing comprises the following steps: and irradiating by adopting a UV parallel light source or a UV non-parallel light source or a UV laser light source to enable a UV photoinitiator in the UV transfer glue to activate the main material in the glue for reaction, and curing and adhering the main material on the surface of the base material.
9. The method for preparing the micro-nano structure on the surface of the substrate according to any one of claims 1 to 3, characterized by further comprising the following steps: cleaning the surface of the substrate subjected to the plasma etching operation; and/or
Also comprises the following steps: and preparing a modification layer on the surface of the base material subjected to the cleaning operation by adopting a surface modification material.
10. The method for preparing a micro-nano structure on the surface of a substrate according to claim 9, wherein the surface modification material is a hydrophobic material, and the corresponding surface modification layer is a hydrophobic layer; or
The surface modification material is an oleophobic material, and the corresponding surface modification layer is an oleophobic layer;
or the surface modification material is a micro-hydrophobic and oleophobic material, and the corresponding surface modification layer is a hydrophobic and oleophobic layer.
11. The method for preparing the micro-nano structure on the surface of the substrate according to any one of claims 1 to 10, wherein the substrate with the micro-nano structure on the surface is prepared.
12. A surface functional part comprising the substrate having a micro-nano structure on the surface according to claim 11.
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| CN115291468A (en) * | 2022-07-25 | 2022-11-04 | 武汉大学 | Projection curtain with multilayer regular micro-nano textures on surface and preparation method thereof |
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| CN112250312A (en) * | 2020-10-20 | 2021-01-22 | 浙江水晶光电科技股份有限公司 | Method for generating microstructure and product with microstructure on surface |
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