CN114072539A - 镀膜设备和应用 - Google Patents

镀膜设备和应用 Download PDF

Info

Publication number
CN114072539A
CN114072539A CN202080001813.6A CN202080001813A CN114072539A CN 114072539 A CN114072539 A CN 114072539A CN 202080001813 A CN202080001813 A CN 202080001813A CN 114072539 A CN114072539 A CN 114072539A
Authority
CN
China
Prior art keywords
reaction chamber
gas inlet
electrode
gas
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN202080001813.6A
Other languages
English (en)
Other versions
CN114072539B (zh
Inventor
宗坚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jiangsu Favored Nanotechnology Co Ltd
Original Assignee
Jiangsu Favored Nanotechnology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jiangsu Favored Nanotechnology Co Ltd filed Critical Jiangsu Favored Nanotechnology Co Ltd
Publication of CN114072539A publication Critical patent/CN114072539A/zh
Application granted granted Critical
Publication of CN114072539B publication Critical patent/CN114072539B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

本发明提供了一镀膜设备和应用，以供在待镀膜工件的表面镀膜，所述镀膜设备包括一电极装置和一反应腔体，其中所述反应腔体具有一反应腔、连通所述反应腔的至少一进料口和至少一抽气口，其中所述进料口位于所述反应腔体的靠近中间位置，其中所述抽气口位于所述反应腔体的侧面位置，其中所述电极装置在所述反应腔内放电，以供在该待镀膜工件的表面镀膜。

Description

PCT国内申请，说明书已公开。

Claims (40)

  1. PCT国内申请，权利要求书已公开。
CN202080001813.6A 2020-06-09 2020-06-09 镀膜设备和应用 Active CN114072539B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2020/095072 WO2021248303A1 (zh) 2020-06-09 2020-06-09 镀膜设备和应用

Publications (2)

Publication Number Publication Date
CN114072539A true CN114072539A (zh) 2022-02-18
CN114072539B CN114072539B (zh) 2023-11-14

Family

ID=78846664

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080001813.6A Active CN114072539B (zh) 2020-06-09 2020-06-09 镀膜设备和应用

Country Status (2)

Country Link
CN (1) CN114072539B (zh)
WO (1) WO2021248303A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115125522A (zh) * 2022-07-29 2022-09-30 龙鳞(深圳)新材料科技有限公司 一种镀膜系统
CN115505896A (zh) * 2022-10-11 2022-12-23 江苏鹏举半导体设备技术有限公司 旋转式内壁镀膜装置

Citations (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4969416A (en) * 1986-07-03 1990-11-13 Emcore, Inc. Gas treatment apparatus and method
US5422139A (en) * 1990-04-12 1995-06-06 Balzers Aktiengesellschaft Method for a reactive surface treatment of a workpiece and a treatment chamber for practicing such method
JP2000252218A (ja) * 1999-03-01 2000-09-14 Kanegafuchi Chem Ind Co Ltd プラズマｃｖｄ装置およびシリコン系薄膜光電変換装置の製造方法
JP2001140078A (ja) * 1999-11-12 2001-05-22 Anelva Corp 化学蒸着装置
US20030091742A1 (en) * 1999-12-14 2003-05-15 Jeanne Forget Coating method
CN102054650A (zh) * 2009-10-28 2011-05-11 东京毅力科创株式会社 等离子体处理装置
CN102206815A (zh) * 2010-03-30 2011-10-05 鸿富锦精密工业（深圳）有限公司 等离子体镀膜装置
CN103451621A (zh) * 2012-06-05 2013-12-18 北京北方微电子基地设备工艺研究中心有限责任公司 Mocvd反应腔及工艺设备
CN104428444A (zh) * 2012-07-13 2015-03-18 盖列姆企业私人有限公司 膜形成装置及方法
CN106958012A (zh) * 2017-05-21 2017-07-18 无锡荣坚五金工具有限公司 一种基材运动式等离子体放电制备纳米涂层的设备及方法
CN107022753A (zh) * 2017-04-19 2017-08-08 同济大学 一种原子层沉积反应装置及通孔材料表面薄膜沉积工艺
CN108690972A (zh) * 2018-08-06 2018-10-23 长江存储科技有限责任公司 用于膜层沉积装置的气体注入管及膜层沉积装置
CN208667844U (zh) * 2018-08-06 2019-03-29 长江存储科技有限责任公司 用于膜层沉积装置的气体注入管及膜层沉积装置
CN110106481A (zh) * 2019-06-06 2019-08-09 京东方科技集团股份有限公司 镀膜装置及物理气相沉积设备
US20190385826A1 (en) * 2018-06-13 2019-12-19 Industrial Technology Research Institute Plasma processing device
CN110965048A (zh) * 2019-12-04 2020-04-07 江苏菲沃泰纳米科技有限公司 镀膜设备及其电极装置和应用
CN111020534A (zh) * 2019-12-04 2020-04-17 江苏菲沃泰纳米科技有限公司 镀膜设备

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11195611A (ja) * 1997-12-26 1999-07-21 Canon Inc 反応装置及び半導体部材の製造方法
CN209307484U (zh) * 2018-12-11 2019-08-27 广东双虹新材料科技有限公司 一种常压多层气相反应炉

Patent Citations (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4969416A (en) * 1986-07-03 1990-11-13 Emcore, Inc. Gas treatment apparatus and method
US5422139A (en) * 1990-04-12 1995-06-06 Balzers Aktiengesellschaft Method for a reactive surface treatment of a workpiece and a treatment chamber for practicing such method
JP2000252218A (ja) * 1999-03-01 2000-09-14 Kanegafuchi Chem Ind Co Ltd プラズマｃｖｄ装置およびシリコン系薄膜光電変換装置の製造方法
JP2001140078A (ja) * 1999-11-12 2001-05-22 Anelva Corp 化学蒸着装置
US20030091742A1 (en) * 1999-12-14 2003-05-15 Jeanne Forget Coating method
CN102054650A (zh) * 2009-10-28 2011-05-11 东京毅力科创株式会社 等离子体处理装置
CN102206815A (zh) * 2010-03-30 2011-10-05 鸿富锦精密工业（深圳）有限公司 等离子体镀膜装置
CN103451621A (zh) * 2012-06-05 2013-12-18 北京北方微电子基地设备工艺研究中心有限责任公司 Mocvd反应腔及工艺设备
CN104428444A (zh) * 2012-07-13 2015-03-18 盖列姆企业私人有限公司 膜形成装置及方法
CN107022753A (zh) * 2017-04-19 2017-08-08 同济大学 一种原子层沉积反应装置及通孔材料表面薄膜沉积工艺
CN106958012A (zh) * 2017-05-21 2017-07-18 无锡荣坚五金工具有限公司 一种基材运动式等离子体放电制备纳米涂层的设备及方法
US20190385826A1 (en) * 2018-06-13 2019-12-19 Industrial Technology Research Institute Plasma processing device
CN108690972A (zh) * 2018-08-06 2018-10-23 长江存储科技有限责任公司 用于膜层沉积装置的气体注入管及膜层沉积装置
CN208667844U (zh) * 2018-08-06 2019-03-29 长江存储科技有限责任公司 用于膜层沉积装置的气体注入管及膜层沉积装置
CN110106481A (zh) * 2019-06-06 2019-08-09 京东方科技集团股份有限公司 镀膜装置及物理气相沉积设备
CN110965048A (zh) * 2019-12-04 2020-04-07 江苏菲沃泰纳米科技有限公司 镀膜设备及其电极装置和应用
CN111020534A (zh) * 2019-12-04 2020-04-17 江苏菲沃泰纳米科技有限公司 镀膜设备

Also Published As

Publication number Publication date
WO2021248303A1 (zh) 2021-12-16
CN114072539B (zh) 2023-11-14

Similar Documents

Publication Publication Date Title
CN114072539A (zh) 镀膜设备和应用
US6528947B1 (en) Hollow cathode array for plasma generation
CN111020534B (zh) 镀膜设备
US20180174803A1 (en) Plasma polymerization coating apparatus
WO2021120540A1 (zh) 镀膜设备及其镀膜方法
CN103460329A (zh) 基于等离子体的表面增强方法
WO2000034979A1 (en) Hollow cathode array for plasma generation
CN110983296A (zh) 支撑结构、支架、镀膜设备和应用
CN211814641U (zh) 镀膜设备
CN102206815A (zh) 等离子体镀膜装置
CN112899656B (zh) 镀膜装置的进气系统
TWI774068B (zh) 鍍膜設備及其運動電極裝置、可運動支架裝置和應用
WO2021248865A1 (zh) 镀膜设备及其镀膜方法
US20210287870A1 (en) Coating Apparatus and Coating Method
CN211645377U (zh) 支架和镀膜设备
CN112538617B (zh) 镀膜设备
CN112538618B (zh) 运动电极装置、可运动支架装置和应用
EP4071269A1 (en) Coating equipment
CN111020535A (zh) 一种细胞计数板等离子化学气相沉积纳米膜的制备方法
US20210193441A1 (en) Coating Apparatus and Coating Method
JPS61163280A (ja) プラズマ反応装置
CN110914970A (zh) 基板处理设备的气体分配设备、基板处理设备及基板处理方法
Matousek et al. Plasma Polymerization of n-hexane in a Modular Reactor
KR20040026881A (ko) 플라즈마 챔버장치

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
PE01 Entry into force of the registration of the contract for pledge of patent right

Denomination of invention: Coating equipment and applications

Granted publication date: 20231114

Pledgee: Wuxi Branch of China CITIC Bank Co.,Ltd.

Pledgor: Jiangsu feiwotai nanotechnology Co.,Ltd.

Registration number: Y2024980016337

PE01 Entry into force of the registration of the contract for pledge of patent right