CN113927456A - Double-station polishing machine for ceramic wire guide and polishing method thereof - Google Patents

Double-station polishing machine for ceramic wire guide and polishing method thereof Download PDF

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Publication number
CN113927456A
CN113927456A CN202111140957.2A CN202111140957A CN113927456A CN 113927456 A CN113927456 A CN 113927456A CN 202111140957 A CN202111140957 A CN 202111140957A CN 113927456 A CN113927456 A CN 113927456A
Authority
CN
China
Prior art keywords
polishing
cylinder
product
feeding
ejector rod
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202111140957.2A
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Chinese (zh)
Inventor
秦乐宁
陈简
龚卫忠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suzhou Sailantec High Tech Ceramic Co ltd
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Suzhou Sailantec High Tech Ceramic Co ltd
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Filing date
Publication date
Application filed by Suzhou Sailantec High Tech Ceramic Co ltd filed Critical Suzhou Sailantec High Tech Ceramic Co ltd
Priority to CN202111140957.2A priority Critical patent/CN113927456A/en
Publication of CN113927456A publication Critical patent/CN113927456A/en
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00—Other grinding machines or devices
    • B24B27/0023—Other grinding machines or devices grinding machines with a plurality of working posts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00—Other grinding machines or devices
    • B24B27/0069—Other grinding machines or devices with means for feeding the work-pieces to the grinding tool, e.g. turntables, transfer means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00—Other grinding machines or devices
    • B24B27/0076—Other grinding machines or devices grinding machines comprising two or more grinding tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/005—Feeding or manipulating devices specially adapted to grinding machines
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/06—Work supports, e.g. adjustable steadies
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B47/00—Drives or gearings; Equipment therefor
    • B24B47/02—Drives or gearings; Equipment therefor for performing a reciprocating movement of carriages or work- tables
    • B24B47/06—Drives or gearings; Equipment therefor for performing a reciprocating movement of carriages or work- tables by liquid or gas pressure only

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)

Abstract

The invention provides a double-station polishing machine for a ceramic wire guide and a polishing method thereof, and the polishing machine comprises a feeding mechanism arranged on an operation table top and a polishing component arranged on one side of the feeding mechanism, wherein the polishing component comprises a polishing mechanism and a material ejecting mechanism arranged on the opposite surface of the polishing mechanism, the polishing component comprises a first polishing component and a second polishing component arranged on one side of the first polishing component, a material moving mechanism is arranged between the two polishing components, a product to be polished is fed by the feeding mechanism, the material ejecting mechanism ejects the product to perform first polishing, and the product after the first polishing is moved to the second polishing component by the material moving mechanism to complete second polishing. The invention has the beneficial effects that: the polishing machine has the advantages that continuity between two times of polishing is realized, manual carrying operation and switching are avoided, time and labor are saved, and polishing efficiency is greatly improved.

Description

Double-station polishing machine for ceramic wire guide and polishing method thereof
Technical Field
The invention belongs to the technical field of ceramic part processing, and particularly relates to a double-station polishing machine for a ceramic wire guide and a polishing method thereof.
Background
Ceramics are processed and applied to various occasions because of their high melting point, high hardness and excellent wear resistance. The alumina ceramic part is Al2O3The special corundum ceramic is prepared by using rare metal oxide as a flux and roasting at 1650 ℃. It is the ceramic guide wire that has come into play due to its unique properties. The yarn guide needs to be polished twice on the surface after being prepared, the existing polishing is generally carried out by two polishing machines, the yarn guide is transported to a second polishing machine by an operator after the first polishing is finished to carry out secondary polishing, and the two times of polishing cannot be continuously and efficiently finished.
Disclosure of Invention
In order to solve the defects of the prior art, the invention provides a double-station polishing machine for a ceramic wire guide and a polishing method thereof.
The purpose of the invention is realized by the following technical scheme:
the double-station polishing machine for the ceramic wire guide comprises a feeding mechanism arranged on an operation table board and a polishing component arranged on one side of the feeding mechanism, wherein the polishing component comprises a polishing mechanism and a material ejecting mechanism arranged on the opposite surface of the polishing mechanism, the polishing component comprises a first polishing component and a second polishing component arranged on one side of the first polishing component, a material moving mechanism is arranged between the two polishing components, a product to be polished is fed by the feeding mechanism, the material ejecting mechanism ejects the product to be polished for the first time, and the product after the first polishing is moved to the second polishing component through the material moving mechanism to complete the second polishing.
Preferably, a feeding mechanism for feeding polishing abrasive is arranged above the polishing mechanism.
Preferably, the feeding mechanism comprises a feeding pipe arranged on the operation table top through a support, a displacement assembly is arranged at the discharge end of the feeding pipe, the displacement assembly comprises a pneumatic clamping jaw arranged on the moving track, and the pneumatic clamping jaw is connected with a clamping jaw matched with a product.
Preferably, the polishing mechanism comprises two polishing wheels and a motor for driving the polishing wheels to rotate, and an ejector rod for sleeving a product is arranged between the two polishing wheels.
Preferably, the ejection mechanism comprises an ejection cylinder and an ejection rod connected with a cylinder shaft of the ejection cylinder, and the ejection rod is arranged right in front of the ejection rod.
Preferably, the material moving mechanism comprises a moving cylinder, the moving cylinder is connected with a clamping jaw cylinder, the moving cylinder is arranged on a sliding rail through a connecting block, the sliding rail is arranged above the polishing mechanisms, and the moving cylinder moves on the sliding rail to realize position switching between the two polishing mechanisms.
Preferably, a pushing cylinder is further arranged on the ejector rod of the second polishing assembly, and a pushing plate used for pushing out a polished product is connected to the pushing cylinder.
Preferably, the feeding mechanism comprises a feeding cylinder and feeding rods arranged at two ends of the feeding cylinder, and the discharge end of each feeding rod is arranged above the ejector rod.
Preferably, the polishing method of the double-station polishing machine for the ceramic wire guide comprises the following steps:
s1, feeding, namely sequentially placing products to be polished in a feeding pipe, and enabling the products to fall into a position to be clamped from the feeding pipe;
s2, feeding, wherein the pneumatic clamping jaw is driven by the air cylinder to descend to the position of the product in the S1, the clamped product is placed in front of the ejector rod of the first polishing mechanism, and the ejector air cylinder works to drive the ejector rod to tightly push the product and the ejector rod;
s3, polishing for the first time, wherein a polishing mechanism of the first polishing component works, a polishing wheel rotates, and the ejector rod rotates simultaneously to finish the integral first polishing of the product better;
s4, transferring materials, wherein after the first polishing is finished, the transferring mechanism moves to the front of the first polishing mechanism on the track, the transferring cylinder drives the clamping jaw cylinder to clamp the product, and the ejecting cylinder in front of the first polishing mechanism returns the ejecting rod to the initial position; the material moving cylinder moves to move the product to the position right in front of the ejector rod of the second polishing mechanism to finish material moving;
s5, polishing for the second time, wherein a material ejection cylinder of a second polishing mechanism drives a corresponding ejector rod to tightly eject the product to the ejector rod of the second polishing assembly, and a polishing wheel in the second polishing mechanism works to polish the product for the second time;
and S6, blanking, wherein the cylinder at the ejector rod of the second polishing mechanism works, and the product after the second polishing on the ejector rod is pushed out by the material pushing plate and falls into the material receiving tray.
The invention has the beneficial effects that: the polishing machine has the advantages that continuity between two times of polishing is realized, manual carrying operation and switching are avoided, time and labor are saved, and polishing efficiency is greatly improved.
Drawings
FIG. 1: the invention has a schematic three-dimensional structure, and the related shell cover is hidden.
FIG. 2: the invention is a schematic three-dimensional structure.
FIG. 3: the invention is illustrated in the backside structure of fig. 1.
The automatic feeding device comprises a feeding pipe 1, a 11 waiting frame, a 2 rail, a 21 sliding block, a 22 second air cylinder, a 23 pneumatic clamping jaw, a 24 clamping jaw, a 25 first air cylinder, a 3 third air cylinder, a 31 ejection rod, a 32 polishing wheel, a 33 ejector rod, a 4 second sliding rail, a 41 connecting plate, a 42 moving air cylinder, a 43 sliding block, a 45 clamping jaw air cylinder, a 5 pushing air cylinder, a 51 pushing plate, a 6 motor, a 61 product rotating motor, a 62 ejecting air cylinder, a 7 operating table board, an 8 feeding air cylinder and a 81 feeding rod.
Detailed Description
The invention discloses a double-station polishing machine for a ceramic wire guide, which is shown by combining figures 1-3 and comprises a feeding mechanism arranged on an operation table top 7 and a polishing component arranged on one side of the feeding mechanism, wherein the polishing component comprises a polishing mechanism and a material ejecting mechanism arranged on the opposite surface of the polishing mechanism. The polishing assembly comprises a first polishing assembly and a second polishing assembly arranged on one side of the first polishing assembly, a material moving mechanism is arranged between the two polishing assemblies, a product to be polished is loaded by the loading mechanism, the material ejecting mechanism ejects the product to perform first polishing, and the product after the first polishing is moved to the second polishing assembly through the material moving mechanism to complete second polishing. And a feeding mechanism for feeding polishing abrasive is arranged above the polishing mechanism.
Specifically, the operation table 7 is arranged in an L shape. The feeding mechanism comprises a feeding pipe 1 arranged on the operation table top 7 through a support, the feeding pipe 1 is L-shaped, and the discharging end of the feeding pipe faces the direction of the polishing assembly. And a product waiting frame 11 is arranged below the discharge end of the feeding pipe 1. The shifting assembly is arranged on one side of the feeding pipe 1 and comprises a track 2 erected on the operating platform 7, a first air cylinder 25 is connected to the track through a sliding block 21, an air cylinder shaft of the first air cylinder 25 moves horizontally and is connected with a second air cylinder 22 through a connecting block, and the moving direction of the air cylinder shaft of the second air cylinder 22 is vertical. The second cylinder 22 is connected with a pneumatic clamping jaw 23, and the pneumatic clamping jaw 23 is connected with a clamping jaw 24 matched with a product.
The other side of the feeding pipe 1 is provided with a material ejecting mechanism in the first polishing assembly, the material ejecting mechanism comprises a third cylinder 3 arranged on the support, and a cylinder shaft of the third cylinder 3 is connected with an ejecting rod 31. The product processed by the device is a thread guide, and the material ejecting end of the material ejecting rod 31 is smaller than the central hole of the thread guide.
The polishing mechanism in the first polishing assembly comprises two polishing wheels 32 and a motor 6 for driving the polishing wheels 32 to operate, in this embodiment, the two polishing wheels 32 in each group of polishing mechanisms are arranged oppositely, and an ejector rod 33 for sleeving a product is arranged between the polishing wheels 32. In order to improve the polishing efficiency, one end of the ejector rod 33 is connected with the product rotating motor 61, and the product rotating motor 61 works to drive the product rotating motor to rotate. The motor 6 is arranged on the base, and the base is connected with the jacking cylinder 62, namely, the jacking cylinder 62 works to adjust the position of the motor 6, so that the position of the polishing wheel 32 is adjusted to better adapt to polishing of products with different sizes. Correspondingly, the ejector rod 31 is arranged right in front of the ejector rod 33. In this embodiment, the second polishing assembly has the same structure as the first polishing assembly, and the difference is that a pushing cylinder 5 is further disposed at the position of the ejector rod in the second polishing assembly, a pushing plate 51 is disposed on the pushing cylinder 5, a pushing hole is disposed on the pushing plate 51, the ejector rod 33 penetrates through the pushing hole, when polishing is performed, a product is placed on the ejector rod 33, and after polishing is completed, the pushing cylinder 5 drives the pushing plate 51 to push the polished product out of the ejector rod 33. For better material receiving, a material receiving disc is arranged below the ejector rod of the second polishing mechanism.
The feeding mechanism comprises a feeding cylinder 8 and feeding rods 81 arranged at two ends of the feeding cylinder 8, and the discharge ends of the feeding rods 81 are arranged above the ejector rods 33. The feeding rod 81 is provided with an abrasive, and the abrasive can be supplemented and added according to the requirement.
The upper end of the operation table top 7 is provided with a second slide rail 4, and the length of the second slide rail 4 extends from the first polishing mechanism to the second polishing mechanism. The second slide rail 4 is connected with a material moving mechanism through a connecting plate 41, and the connecting plate 41 is erected on the second slide rail 4 through a sliding block 43.
Move material mechanism including moving cylinder 42, moving cylinder 42 is connected with a clamping jaw cylinder 45, it is in to move material mechanism second slide rail 4 upward movement realizes switching of position between two polishing mechanism, and drives through moving cylinder 42 clamping jaw cylinder 45 realizes the centre gripping to the product.
The invention also discloses a polishing method of the double-station polishing machine for the ceramic wire guide, which comprises the following steps:
s1, feeding, namely sequentially placing products to be polished in the feeding pipe 1, and enabling the products to fall into the stand-to-be-positioned 11 from the feeding pipe 1.
And S2, feeding, and lowering the pneumatic clamping jaw 24 to the product position in S1 under the driving of the second air cylinder 22, and moving the clamped product to the front of the first polishing mechanism through the sliding block 21. The first air cylinder 25 moves to drive the pneumatic clamping jaw 24 to place the product right in front of the ejector rod 33 of the first polishing mechanism, and the third air cylinder 3 works to drive the ejector rod 31 to tightly push the product and the ejector rod 33.
S3, polishing for the first time, wherein the polishing mechanism of the first polishing component works, namely, the motor 6 in the first polishing mechanism drives the polishing wheel to rotate, and the ejector rod 33 is driven by the product rotating motor 61 to rotate simultaneously so as to better finish the integral first polishing of the product. The feeding mechanism supplements polishing agents for the polished products according to requirements.
And S4, moving the material, wherein after the first polishing is finished, the moving cylinder 42 moves to the front of the first polishing mechanism on the second track 4, and the moving cylinder 42 drives the clamping jaw cylinder 45 to clamp the product. The third cylinder 3 in front of the first polishing mechanism returns the ejector rod 31 to the initial position. The moving cylinder 42 moves on the second slide rail 4 to move the product to the position right in front of the ejector rod of the second polishing mechanism, so that the material moving is completed;
and S5, polishing for the second time, wherein the material ejection cylinder of the second polishing mechanism drives the corresponding ejector rod to tightly eject the product to the ejector rod of the second polishing component, and the polishing wheel in the second polishing mechanism works to polish the product for the second time.
And S6, blanking, wherein the cylinder at the ejector rod of the second polishing mechanism works, and the product after the second polishing on the ejector rod is pushed out by the material pushing plate 51 and falls into the material receiving tray.
Finally, it should be noted that: the terms "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience in describing the present invention and simplifying the description, but do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
The above embodiments are only used to illustrate the technical solution of the present invention, but not to limit the same; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.

Claims (9)

1. The ceramic silk guide utensils duplex position burnishing machine which characterized in that: including setting up feed mechanism on the operation mesa and set up in the polishing subassembly of feed mechanism one side, polishing subassembly including polish mechanism and set up in the liftout mechanism of the opposite face of polishing mechanism, polishing subassembly include first polishing subassembly and set up in the second polishing subassembly of first polishing subassembly one side is provided with between two polishing subassemblies and moves material mechanism, treats that the polishing product is by feed mechanism material loading, liftout mechanism withstands the product and carries out the polishing for the first time, removes to second polishing subassembly through moving material mechanism and accomplishes the polishing for the second time with the product after the polishing for the first time.
2. The double station polisher for a ceramic wire guide of claim 1 further comprising: and a feeding mechanism for feeding polishing abrasive is arranged above the polishing mechanism.
3. The double station polisher for a ceramic wire guide of claim 2 further comprising: the feeding mechanism comprises a feeding pipe arranged on the operation table board through a support, a shifting assembly is arranged at the discharging end of the feeding pipe, the shifting assembly comprises a pneumatic clamping jaw arranged on a moving track, and the pneumatic clamping jaw is connected with a clamping jaw matched with a product.
4. The double station polisher for a ceramic wire guide of claim 3 further comprising: the polishing mechanism comprises two polishing wheels and a motor for driving the polishing wheels to operate, and an ejector rod for sleeving a product is arranged between the two polishing wheels.
5. The double station polisher for the ceramic wire guide of claim 4 further comprising: the material ejecting mechanism comprises an ejecting cylinder and an ejecting rod connected with a cylinder shaft of the ejecting cylinder, and the ejecting rod is arranged right in front of the ejecting rod.
6. The double station polisher for a ceramic wire guide of claim 5 further comprising: the material moving mechanism comprises a moving cylinder, the moving cylinder is connected with a clamping jaw cylinder, the moving cylinder is arranged on a sliding rail through a connecting block, the sliding rail is arranged above the polishing mechanisms, and the moving cylinder moves on the sliding rail to realize position switching between the two polishing mechanisms.
7. The double station polisher for a ceramic wire guide of claim 6 further comprising: and the ejector rod of the second polishing component is also provided with a material pushing cylinder, and the material pushing cylinder is connected with a material pushing plate used for pushing out a polished product.
8. The double station polisher for a ceramic wire guide of claim 7 further comprising: the feeding mechanism comprises a feeding cylinder and feeding rods arranged at two ends of the feeding cylinder, and the discharge end of each feeding rod is arranged above the ejector rod.
9. The polishing method of a double-station polishing machine for a ceramic wire guide according to any one of claims 1 to 8, characterized by comprising: the method comprises the following steps:
s1, feeding, namely sequentially placing products to be polished in a feeding pipe, and enabling the products to fall into a position to be clamped from the feeding pipe;
s2, feeding, wherein the pneumatic clamping jaw is driven by the air cylinder to descend to the position of the product in the S1, the clamped product is placed in front of the ejector rod of the first polishing mechanism, and the ejector air cylinder works to drive the ejector rod to tightly push the product and the ejector rod;
s3, polishing for the first time, wherein a polishing mechanism of the first polishing component works, a polishing wheel rotates, and the ejector rod rotates simultaneously to finish the integral first polishing of the product better;
s4, transferring materials, wherein after the first polishing is finished, the transferring mechanism moves to the front of the first polishing mechanism on the track, the transferring cylinder drives the clamping jaw cylinder to clamp the product, and the ejecting cylinder in front of the first polishing mechanism returns the ejecting rod to the initial position; the material moving cylinder moves to move the product to the position right in front of the ejector rod of the second polishing mechanism to finish material moving;
s5, polishing for the second time, wherein a material ejection cylinder of a second polishing mechanism drives a corresponding ejector rod to tightly eject the product to the ejector rod of the second polishing assembly, and a polishing wheel in the second polishing mechanism works to polish the product for the second time;
and S6, blanking, wherein the cylinder at the ejector rod of the second polishing mechanism works, and the product after the second polishing on the ejector rod is pushed out by the material pushing plate and falls into the material receiving tray.
CN202111140957.2A 2021-09-28 2021-09-28 Double-station polishing machine for ceramic wire guide and polishing method thereof Pending CN113927456A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202111140957.2A CN113927456A (en) 2021-09-28 2021-09-28 Double-station polishing machine for ceramic wire guide and polishing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202111140957.2A CN113927456A (en) 2021-09-28 2021-09-28 Double-station polishing machine for ceramic wire guide and polishing method thereof

Publications (1)

Publication Number Publication Date
CN113927456A true CN113927456A (en) 2022-01-14

Family

ID=79277027

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202111140957.2A Pending CN113927456A (en) 2021-09-28 2021-09-28 Double-station polishing machine for ceramic wire guide and polishing method thereof

Country Status (1)

Country Link
CN (1) CN113927456A (en)

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