CN113885114A - Light-weight reflecting mirror blank and preparation method thereof - Google Patents

Light-weight reflecting mirror blank and preparation method thereof Download PDF

Info

Publication number
CN113885114A
CN113885114A CN202111328550.2A CN202111328550A CN113885114A CN 113885114 A CN113885114 A CN 113885114A CN 202111328550 A CN202111328550 A CN 202111328550A CN 113885114 A CN113885114 A CN 113885114A
Authority
CN
China
Prior art keywords
substrate
modified layer
mirror blank
layer
light weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202111328550.2A
Other languages
Chinese (zh)
Inventor
范军
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Luoyang Sipaite Technology Co ltd
Original Assignee
Luoyang Sipaite Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Luoyang Sipaite Technology Co ltd filed Critical Luoyang Sipaite Technology Co ltd
Priority to CN202111328550.2A priority Critical patent/CN113885114A/en
Publication of CN113885114A publication Critical patent/CN113885114A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/08Mirrors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K20/00Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
    • B23K20/001Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating by extrusion or drawing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/10Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

The invention provides a light-weight reflecting mirror blank and a preparation method thereof, belonging to the technical field of optical reflection, wherein the mirror blank comprises a substrate and a modified layer, wherein the substrate is ceramic of carbide, nitride or oxide, the modified layer is monocrystalline silicon, germanium or optical glass, and the substrate and the modified layer are connected in a vacuum liquid phase diffusion welding mode; the invention solves the problems that the existing ceramic surface has the defects of complex phase, low coating reflectivity, air holes, difficult polishing and the like and can not be directly used for an optical reflector, and opens up a new idea for developing novel high-performance ceramic and a light reflector. The invention is mainly applied to the optical reflector of photoelectric detection equipment such as remote sensing satellites, fighters, helicopters and the like.

Description

Light-weight reflecting mirror blank and preparation method thereof
Technical Field
The invention relates to the technical field of optical reflectors, in particular to a light reflecting mirror blank and a preparation method thereof.
Background
The lightweight reflector is widely applied to various photoelectric detection devices such as ship-borne, missile-borne, vehicle-borne and airborne devices, the lightweight reflector is various, mainly comprises a plastic-based reflector, a glass-based reflector, a ceramic-based reflector, a metal-based reflector and the like, and ceramic materials are widely applied to various high-precision reflective optical systems due to low density, high specific stiffness and good thermal stability of the ceramic materials. However, the surface of the existing ceramic material has the defects of complex phase, low coating reflectivity, air holes, difficult polishing and the like, and cannot be directly used for an optical reflector blank, the ceramic material needs surface treatment, and the most common method at present is to plate a micron-sized film on the surface of the polished ceramic material by a vacuum coating method and then polish the polished ceramic material. However, the modified layer prepared by the vacuum coating modification method is very thin and is very easy to discard in the subsequent polishing process, so that the process is frequently repeated, the period is long, and the yield is low.
Disclosure of Invention
In view of the above, the invention provides a light-weight reflecting mirror blank and a preparation method thereof. Solves the problem that the surface modification layer of the existing ceramic material is thinner.
In order to solve the technical problem, the invention provides a light-weight reflecting mirror blank which comprises a substrate and a modified layer, wherein the modified layer is welded on the substrate through vacuum liquid phase diffusion welding.
Further, one surface of the substrate is defined as a substrate welding surface, one surface of the modification layer is defined as a modification layer welding surface, and the curvature radius of the substrate welding surface is consistent with that of the modification layer welding surface.
Further, the substrate is of a lightweight structure.
Further, the substrate is of a triangular, hexagonal or honeycomb-shaped lightweight structure.
Further, the substrate is a ceramic substrate.
Further, the substrate is a carbide ceramic (silicon carbide, boron carbide, carbon/silicon carbide composite, boron carbide/silicon carbide composite, etc.) substrate, a nitride ceramic (silicon nitride, aluminum nitride, etc.) substrate, or an oxide ceramic (aluminum oxide, zirconium oxide, etc.) substrate.
Further, the modified layer is a single crystal silicon, germanium layer, or optical glass (microcrystalline glass, chalcogenide glass, or the like) layer.
A preparation method of a light reflecting mirror blank comprises the following preparation steps:
step one, substrate surface treatment: firstly, grinding and polishing the surface of a substrate by adopting chemical mechanical polishing equipment; then, ultrasonic equipment is adopted to remove oil from the polished surface of the substrate;
step two, modified layer surface treatment: firstly, grinding and polishing the surface of the modified layer by adopting chemical mechanical polishing equipment, and then removing oil on the polished surface of the modified layer by adopting ultrasonic equipment;
step three, connecting the substrate and the modified layer: stacking one side of the substrate with the same curvature radius and one side of the modified layer together, and integrally placing the substrate and the modified layer in vacuum diffusion welding equipment, wherein the process parameters are as follows: the temperature is 800-2000 ℃, the pressure is 1-50 Mpa, the heat preservation is carried out for 1-5 hours, and then the glass blank is cooled to the room temperature along with the furnace to obtain the glass blank.
Compared with the prior art, the invention has the beneficial technical effects that:
1. the modified layer is made of materials such as monocrystalline silicon, optical glass, germanium and the like which are easy to polish, the surface is compact, no surface defect exists, and the existing polishing equipment can polish;
2. the connection mode of the substrate and the modified layer adopts a mature vacuum liquid phase diffusion welding technology, the process is mature, and the yield is high.
Drawings
Fig. 1 is a schematic structural view of a light-weight reflecting mirror blank according to the present invention.
In the figure: 1. a modified layer; 2. a substrate.
Detailed Description
The following examples are intended to illustrate the present invention in detail and should not be construed as limiting the scope of the present invention in any way. The instruments and devices referred to in the following examples are conventional instruments and devices unless otherwise specified; the industrial raw materials are all conventional industrial raw materials which are sold on the market if not specifically indicated; the processing and manufacturing methods are conventional methods unless otherwise specified.
Example 1:
the light reflecting mirror blank comprises a substrate and a modified layer, wherein the substrate is made of silicon carbide, the modified layer is made of monocrystalline silicon, the substrate and the modified layer are connected in a vacuum liquid phase diffusion welding mode, and the curvature radius of the connection part of the substrate and the modified layer is consistent.
The preparation method of the light reflecting mirror blank comprises the following steps:
step one, substrate surface treatment: the used ceramic material is silicon carbide, the size is 200mm long, 100mm wide and 12mm high, adopt the chemical mechanical polishing equipment, carry on the grinding and polishing step by step with W60, W40, W30, W20, W10, W7, W3.5, W0.5 diamond polishing solution, then adopt the ultrasonic equipment, make mixed solution with 50g of sodium hydroxide + 30g of sodium silicate + 50g of sodium phosphate +1000ml of water, carry on the degreasing to the polished surface;
step two, modified layer surface treatment: the modified material is monocrystalline silicon, the size is 200mm long, 100mm wide and 12mm high, chemical mechanical polishing equipment is adopted, diamond polishing solution of W60, W40, W30, W20, W10, W7, W3.5 and W0.5 is used for grinding and polishing step by step, then ultrasonic equipment is adopted, mixed solution is prepared by 50g of sodium hydroxide, 30g of sodium silicate, 50g of sodium phosphate and 1000ml of water, and oil is removed from the polished surface;
step three, connecting the substrate and the modified layer: stacking the polished surface of the silicon carbide substrate with the size of 200mm, 12mm long and 12mm wide and the polished surface of the monocrystalline silicon with the size of 200mm, 100mm wide and 12mm high together, and integrally placing the silicon carbide substrate and the monocrystalline silicon in vacuum diffusion welding equipment, wherein the process parameters are as follows: the temperature is 1400 ℃, the pressure is 10Mpa, the temperature is kept for 2 hours, and then the temperature is cooled to the room temperature along with the furnace, so as to obtain the mirror blank.
Example 2:
the light reflecting mirror blank comprises a substrate and a modified layer, wherein the substrate is made of alumina, the modified layer is made of sapphire, the substrate and the modified layer are connected in a vacuum liquid phase diffusion welding mode, and the curvature radius of the connection part of the substrate and the modified layer is consistent.
The preparation method of the light reflecting mirror blank comprises the following steps:
step one, substrate surface treatment: the used ceramic material is alumina, the size is 200mm long, 100mm wide, 12mm high, adopt the chemical machinery polishing equipment, with W60, W40, W30, W20, W10, W7, W3.5, W0.5 diamond polishing solution, grind and polish step by step, then adopt the ultrasonic equipment, make mixed solution with 50g of sodium hydroxide + 30g of sodium silicate + 50g of sodium phosphate +1000ml of water, carry on the deoiling to the polished surface;
step two, modified layer surface treatment: the modified material is sapphire, the size is 200mm long, 100mm wide and 12mm high, the diamond polishing solution of W60, W40, W30, W20, W10, W7, W3.5 and W0.5 is used for grinding and polishing step by adopting chemical mechanical polishing equipment, and then the mixed solution is prepared by 50g of sodium hydroxide, 30g of sodium silicate, 50g of sodium phosphate and 1000ml of water by adopting ultrasonic equipment to remove oil on the polished surface;
step three, connecting the substrate and the modified layer: stacking the polished surface of the silicon carbide substrate with the size of 200mm, 12mm long and 12mm wide and the polished surface of the monocrystalline silicon with the size of 200mm, 100mm wide and 12mm high together, and integrally placing the silicon carbide substrate and the monocrystalline silicon in vacuum diffusion welding equipment, wherein the process parameters are as follows: keeping the temperature at 2000 ℃ and the pressure at 20Mpa for 5 hours, and then cooling to room temperature along with the furnace to obtain the mirror blank.
While the present invention has been described in detail with reference to the drawings and examples, it will be understood by those skilled in the art that various changes in the specific parameters of the above examples may be made without departing from the spirit of the invention, and various specific examples are included in the scope of the present invention and will not be described in detail herein.

Claims (8)

1. The light reflecting mirror blank comprises a substrate and a modified layer, and is characterized in that the modified layer is welded on the substrate through vacuum liquid phase diffusion welding.
2. The light weight mirror blank of claim 1, wherein the one surface of the substrate is defined as a substrate bonding surface, the one surface of the modifying layer is defined as a modifying layer bonding surface, and the substrate bonding surface and the modifying layer bonding surface have a radius of curvature that is coincident.
3. The light weight mirror blank of claim 1, wherein the substrate is of light weight construction.
4. The light weight mirror blank of claim 3, wherein the substrate is a triangular, hexagonal or honeycomb light weight structure.
5. The light weight mirror blank of claim 1, wherein the substrate is a ceramic substrate.
6. The light weight mirror blank of claim 5, wherein the substrate is a carbide ceramic substrate, a nitride ceramic substrate, or an oxide ceramic substrate.
7. The light weight mirror blank of claim 1, wherein the modification layer is a single crystal silicon, germanium layer, or optical glass layer.
8. The method for manufacturing a light-weight mirror blank according to any of claims 1 to 7, comprising the steps of:
step one, substrate surface treatment: firstly, grinding and polishing the surface of a substrate by adopting chemical mechanical polishing equipment; then, ultrasonic equipment is adopted to remove oil from the polished surface of the substrate;
step two, modified layer surface treatment: firstly, grinding and polishing the surface of the modified layer by adopting chemical mechanical polishing equipment, and then removing oil on the polished surface of the modified layer by adopting ultrasonic equipment;
step three, connecting the substrate and the modified layer: stacking one side of the substrate with the same curvature radius and one side of the modified layer together, and integrally placing the substrate and the modified layer in vacuum diffusion welding equipment, wherein the process parameters are as follows: the temperature is 800-2000 ℃, the pressure is 1-50 Mpa, the heat preservation is carried out for 1-5 hours, and then the glass blank is cooled to the room temperature along with the furnace to obtain the glass blank.
CN202111328550.2A 2021-11-10 2021-11-10 Light-weight reflecting mirror blank and preparation method thereof Pending CN113885114A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202111328550.2A CN113885114A (en) 2021-11-10 2021-11-10 Light-weight reflecting mirror blank and preparation method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202111328550.2A CN113885114A (en) 2021-11-10 2021-11-10 Light-weight reflecting mirror blank and preparation method thereof

Publications (1)

Publication Number Publication Date
CN113885114A true CN113885114A (en) 2022-01-04

Family

ID=79017789

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202111328550.2A Pending CN113885114A (en) 2021-11-10 2021-11-10 Light-weight reflecting mirror blank and preparation method thereof

Country Status (1)

Country Link
CN (1) CN113885114A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115016052A (en) * 2022-06-29 2022-09-06 华中科技大学 Laser omnidirectional reflection film and application thereof in wearable laser protection field
CN115784719A (en) * 2022-11-29 2023-03-14 云南雷迅科技有限公司 Preparation method of composite mirror blank of ceramic-based reflecting mirror

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115016052A (en) * 2022-06-29 2022-09-06 华中科技大学 Laser omnidirectional reflection film and application thereof in wearable laser protection field
CN115784719A (en) * 2022-11-29 2023-03-14 云南雷迅科技有限公司 Preparation method of composite mirror blank of ceramic-based reflecting mirror
CN115784719B (en) * 2022-11-29 2023-11-28 云南雷迅科技有限公司 Preparation method of composite mirror blank of ceramic-based reflector

Similar Documents

Publication Publication Date Title
CN113885114A (en) Light-weight reflecting mirror blank and preparation method thereof
CN107935567B (en) Composite mirror blank material for ceramic-based space reflector
KR101595693B1 (en) Handle substrate for compound substrate for use with semiconductor
US3798746A (en) Process of making acousto-optic devices
US20170338110A9 (en) Methods and structures for preparing single crystal silicon wafers for use as substrates for epitaxial growth of crack-free gallium nitride films and devices
US7630423B2 (en) Glaze soldered laser components and method of manufacturing
US5516388A (en) Sol-gel bonding
KR101531809B1 (en) Handle substrate for compound substrate for use with semiconductor
US20100128347A1 (en) Polarizing cube and method of fabricating the same
CN111527447A (en) Color wheel and projector
US20230075685A1 (en) Method for manufacturing a film on a flexible sheet
CN216772016U (en) Light reflecting mirror blank
US20170050890A1 (en) Advanced Mirrors Utilizing Polymer-Derived-Ceramic Mirror Substrates
KR102019162B1 (en) Substrate comprising a layer of silicon and a layer of diamond having an optically finished (or a dense) silicon-diamond interface
EP3537188B1 (en) Color wheel and method for manufacturing a color wheel
CN1253731C (en) Heavy-cabiber light composite material mirror and its preparing method
CN109065508B (en) Ultrathin wafer with reverse mesa composite structure and preparation method thereof
KR101642671B1 (en) Handle substrates of composite substrates for semiconductors, and composite substrates for semiconductors
CN110919465A (en) Nondestructive high-flatness single crystal silicon carbide planar optical element and preparation method thereof
CN104057666B (en) A kind of monocrystalline sapphire bulletproof glass and processing method thereof being easy to processing
CN102303268A (en) Ultra smooth non-destructive nano grinding method for soft and fragile film
JP3857742B2 (en) Glass mold for optical element molding
EP3805629A1 (en) Optical device
RU2020109381A (en) MULTI-TRANSITIONAL SOLAR ELEMENT WITH FUSED QUARTZ COVERGLASS
Goela et al. Fabrication of light-weighted Si/SiC lidar mirrors

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination