CN113885108B - Ion exchange-based aspheric lens manufacturing method and lens - Google Patents
Ion exchange-based aspheric lens manufacturing method and lens Download PDFInfo
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- CN113885108B CN113885108B CN202111251215.7A CN202111251215A CN113885108B CN 113885108 B CN113885108 B CN 113885108B CN 202111251215 A CN202111251215 A CN 202111251215A CN 113885108 B CN113885108 B CN 113885108B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/02—Simple or compound lenses with non-spherical faces
- G02B3/04—Simple or compound lenses with non-spherical faces with continuous faces that are rotationally symmetrical but deviate from a true sphere, e.g. so called "aspheric" lenses
Abstract
The invention discloses an ion exchange-based aspheric lens manufacturing method, which comprises the following steps: carrying out simulation design on a target aspheric lens to obtain a simulation curve of the target aspheric lens; converting the simulation curve into a photoetching graph in a preset calculation mode; transferring the pattern appearance of the photoetching pattern to a glass substrate through a photoetching process; the target aspheric lens is prepared by an ion exchange process. The preparation method processes the graph of the simulation curve and transfers the graph by utilizing the photoetching process, and the actual preparation process mainly depends on the control of the ion exchange process, so that a larger number of micro lenses can be simultaneously prepared in a single batch, and the micro lenses in the same batch have higher consistency, thereby being beneficial to the subsequent quality screening inspection and control of finished products and effectively ensuring the yield of the finished products.
Description
Technical Field
The invention relates to the field of integrated optics, in particular to an ion exchange-based aspheric lens manufacturing method and an ion exchange-based aspheric lens.
Background
The most significant advantage of an aspheric lens over a spherical lens is that the spherical aberration introduced by a spherical lens in the collimating and focusing system can be corrected. By adjusting the surface constant and the aspheric coefficient, the aspheric lens can eliminate spherical aberration to the maximum extent.
The existing aspheric lens processing modes mainly comprise modes of mould pressing, polishing, injection molding and the like, the mould pressing and polishing have very high requirements on the precision of a mould, so that the processing difficulty and the processing cost are high, and although the cost of the injection molding mode is reduced, the thermal stability of a plastic material is poor, so that the further development of the aspheric lens is limited.
Disclosure of Invention
In order to overcome the disadvantages of the prior art, the present invention aims to provide a method for manufacturing an aspherical lens based on ion exchange, so as to reduce the production cost of the aspherical lens and improve the production efficiency.
The invention is realized by the following technical measures, comprising the following steps:
A. carrying out simulation design on a target aspheric lens to obtain a simulation curve of the target aspheric lens;
B. converting the simulation curve into a photoetching graph in a preset calculation mode;
C. transferring the pattern appearance of the photoetching pattern to a glass substrate through a photoetching process;
D. the target aspheric lens is prepared by an ion exchange process.
As a preferable mode, the step B includes:
b1, carrying out equal proportion segmentation on the simulation curves according to a preset number of preset shapes;
b2, substituting the midpoint position of each preset shape into the expression to obtain the height of the simulation curve;
b3, dividing each preset shape according to the height of the corresponding simulation curve, arranging a filling surface at the inner end, and arranging a blank surface at the outer end;
and B4, carrying out equal-proportion graph conversion on the preset shape to obtain a photoetching graph.
As a preferable mode, when the target aspheric lens is prepared by an ion exchange process, the step D further includes:
and controlling the ion exchange concentration and the exchange time according to the photoetching pattern.
Preferably, step B1 further includes:
the preset shape is a rectangle;
the step B3 comprises the following steps:
and converting the filling surface and the blank surface of any rectangular transverse distribution into longitudinal distribution in equal proportion.
As a preferable mode, step B1 further includes:
the preset shape is a first unit rectangle, and all the rectangles are combined into a total rectangle;
step B4 comprises the following steps:
taking the midpoint of any length direction of the total rectangle as the center of a circle, and taking the distance from the end point to the midpoint of the filling surface and the blank surface in the length direction of the total rectangle as a radius to make a concentric circle; and obtaining blank rings and filled rings corresponding to the filling surfaces and the blank surfaces of the rings in the concentric circles, and taking the concentric circles as photoetching patterns.
Preferably, step B1 further includes: the preset shape is a first unit rectangle, and only the first unit rectangle on one side of the symmetry axis is reserved;
step B3 further comprises: and taking a first unit rectangle close to the symmetry axis as a central reference rectangle, removing blank surfaces from the central reference rectangle to reserve a filling surface, and removing the blank surfaces with the same area from the other first unit rectangles.
Step B4 comprises the following steps: all the first unit rectangles are combined into a total rectangle, the end point of the approximate symmetry axis in any length direction of the length of the total rectangle is taken as the center of a circle, and the distance from each end point of the filling surface and the blank surface in the length direction of the total rectangle to the end point of the approximate axis side of the total rectangle is taken as the radius to form a concentric circle; and obtaining blank rings and filled rings corresponding to the filling surfaces and the blank surfaces of the rings in the concentric circles, and taking the concentric circles as photoetching patterns.
According to the manufacturing method of the ion exchange-based aspheric lens, the simulation curve is subjected to image processing, the photoetching process is utilized for image transfer, large-scale repeated engraving can be simply and effectively carried out, the actual manufacturing process mainly depends on the control of the ion exchange process, so that a large number of micro lenses can be simultaneously manufactured in a single batch, the micro lenses in the same batch have high consistency, the subsequent quality screening inspection and control of finished products are facilitated, and the yield of the finished products is effectively ensured.
A lens is prepared by any one of the preparation methods, and a micro lens formed by ion exchange of the lens is of an inwards concave structure, two outer sides of the micro lens are flat and smooth, so that the micro lens is easier to clamp and fix in an actual use process compared with a traditional lens with a single surface smooth and a single convex surface, and meanwhile, the flat surface of the micro lens is beneficial to calibration with an optical axis, so that the micro lens has higher stability and effectively improves precision.
Drawings
FIG. 1 is a simplified side view of a lens according to an embodiment of the present invention;
FIG. 2 is a diagram illustrating simulation curve segmentation according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a first unit rectangle according to an embodiment of the present invention;
FIG. 4 is a second unit rectangle of the present invention;
FIG. 5 is a schematic diagram illustrating a graph transformation principle according to an embodiment of the present invention;
FIG. 6 is a schematic view of a ring after graphics conversion according to an embodiment of the present invention.
Number and name in the figure: 1. simulation curve 2, incident light 3, first unit rectangle 31, filling surface 32, blank surface 4, second unit rectangle 5, center reference rectangle
Detailed Description
The present invention will be described in further detail with reference to the following examples and drawings.
An ion exchange-based aspheric lens manufacturing method, referring to fig. 1 to 6, comprises the following steps:
A. carrying out simulation design on a target aspheric lens to obtain a simulation curve 1 of the target aspheric lens;
specifically, simulation design can be performed on the target aspheric lens according to practical application requirements through simulation software such as ZEMAX, and as shown in fig. 1, the effect that the incident light 2 converges on one point is achieved.
It should be noted that, in this embodiment, the curve equation of the simulation design using ZEMAX is:
wherein r is the radial distance from the aspheric axis; z is the corresponding vertical distance; c is the apex curvature c =1/R 0 ；R 0 Is the vertex radius of curvature; k is a quadratic constant; a is i Is a polynomial coefficient; e is eccentricity, a i ＝0，k＝-e 2 ；
After design based on simulationThe expression of the obtained simulation curve is as follows: y is 2 +z 2 ＝2R 0 x-(1-e 2 )x 2 +αx 3 +βx 4 +γx 5 +.; which is a commonly used expression in optical design.
B. Converting the simulation curve into a photoetching graph in a preset calculation mode;
the method specifically comprises the following steps:
b1, carrying out equal proportion segmentation on the simulation curves according to a preset number of preset shapes;
the preset shapes in the embodiment are preferably rectangular, and the preset number is 20, so that the calculation is convenient; for ease of resolution, the small rectangle used for the segmentation is denoted as the first unit rectangle 3.
B2, substituting the midpoint positions of the preset shapes into the expression respectively to obtain the height of the simulation curve;
referring to fig. 2, the height of the middle point of the width on the first unit rectangle 3 is substituted into the expression to obtain the height of the simulation curve 1;
b3, dividing each preset shape according to the height position of the corresponding simulation curve, wherein a filling surface 31 is arranged at the inner end of the divided position of any preset shape, and a blank surface 32 is arranged at the outer end of the divided position;
converting the filling surface 31 and the blank surface 32 distributed transversely in any first unit rectangle 3 into longitudinal distribution in equal proportion; the converted small rectangles are denoted as second unit rectangles 4, and all the second unit rectangles 4 are combined into a total rectangle.
B4, carrying out equal-proportion graph conversion on the preset shape to obtain a photoetching graph;
specifically, concentric circles are drawn with the midpoint of any one of the length directions of the total rectangle (the length direction is understood to be based on the longitudinal direction in the converted first unit rectangle 3) as the center, and the distances from the end points to the midpoint of the filling surface 31 and the blank surface 32 in the length direction of the total rectangle as the radius; obtaining blank rings and filled rings corresponding to the filling surfaces 31 and the blank surfaces 32 of the rings in the concentric circles, and taking the concentric circles as photoetching patterns;
as shown in fig. 3, because the simulation curve 1 is axisymmetric, in step B1, only the first unit rectangle 3 on one side of the axis is reserved, which is more convenient for calculation and conversion in step B4;
in step B3, referring to fig. 3, the first unit rectangle 3 near the axis may be used as the central reference rectangle 5, the blank surface 32 is discarded to leave only the filling surface 31, and the remaining first unit rectangles 3 may be used to remove the blank surface on the upper side of the height position based on the length (i.e., the height shown in fig. 3) of the central reference rectangle 5; in step B4, the graph conversion is performed by taking the end point on the near-axis side in any length direction of the total rectangle as the center of a circle, and taking the distance from each end point of the filling surface 31 and the blank surface 32 in the length direction of the total rectangle to the end point on the near-axis side of the total rectangle as a radius to form a concentric circle; corresponding filling surfaces and blank surfaces to the rings in the concentric circles to obtain blank rings and filling rings; the central circle is the filling circle.
C. Transferring the pattern appearance of the photoetching pattern to a glass substrate through a photoetching process;
specifically, a glass substrate and a base body for manufacturing an aspherical lens; a photoresist layer is preset on the glass substrate, and after the graph composition design is finished in the step B4, the obtained photoresist graph is transferred to the photoresist layer to form a photoresist graph; the method of transferring the lithography pattern includes, but is not limited to, exposure, development, and the like, and the lithography development is preferred in this embodiment.
D. The target aspheric lens is prepared by an ion exchange process.
Specifically, the photoresist pattern is subjected to plasma exchange by using an ion exchange process, and the effective refractive index after the ion exchange is related to the ion exchange area, the exchange time and the ion concentration; the larger the area, the larger the ion exchange number, and the higher the refractive index; after the exchange pattern is designed according to the blank gap shown in fig. 6, the effective refractive index ratio of each filled ring to each blank ring is the same as the ratio of the filled surface 31 to the blank surface 32 in the first unit rectangle 3; the exchange time can be controlled by using the fixed ion exchange concentration, so that the target aspheric lens can be prepared by using the refractive index of the central ring and the refractive index of the simulation design all the time.
It should be understood that the graph is divided on the basis of the rectangle in the present embodiment to facilitate the calculation and the subsequent graph conversion; in other embodiments, a proper basic segmentation graph is selected according to actual requirements to carry out infinitesimal cutting on the simulation curve 1; the lens structure in this embodiment needs to convert the lithography pattern into a corresponding ring structure design, and in other embodiments, the lens structure should not be limited to the ring structure, and the pattern conversion needs to be performed according to the actual structure, shape, and the like of the target lens.
It should be noted that the axial side of the simulation curve 1 is divided by 10 rectangles in the present embodiment, which is only for the purpose of understanding the present invention. In the actual design and preparation process, the division number is far larger than the number, the preparation effect is closer to the simulation effect when the division number is larger, but the division number is reasonably selected according to the preparation method by comprehensively considering the preparation limit, the preparation cost and the like of the existing conditions.
The preparation method can simply and effectively carry out large-scale repeated engraving by carrying out graphic processing on the simulation curve and carrying out graphic transfer by utilizing a photoetching process, and the actual preparation process mainly depends on the control of an ion exchange process, so that a large number of micro lenses can be simultaneously prepared in a single batch, and the micro lenses in the same batch have higher consistency, thereby being beneficial to the subsequent quality screening inspection and control of finished products and effectively ensuring the yield of finished products.
Example two
A lens is prepared by the preparation method of the first embodiment, and a micro lens formed by ion exchange is of an inwards concave structure, two outer sides of the micro lens are flat and smooth, so that the micro lens is easier to clamp and fix in an actual use process compared with a traditional lens with a single surface smooth and a single convex, and meanwhile, the flat surface of the micro lens is beneficial to being calibrated with an optical axis, so that the micro lens has higher stability and effectively improves precision.
Although the present invention has been described in connection with a method for manufacturing an ion-exchange based aspheric lens and a lens, it should be understood that the present invention is not limited to the above-described embodiments, and any changes, modifications, substitutions, combinations, and simplifications that do not depart from the spirit of the present invention are intended to be construed as equivalents thereof.
Claims (3)
1. An ion exchange-based method for manufacturing an aspherical lens, comprising the steps of:
A. carrying out simulation design on a target aspheric lens to obtain a simulation curve of the target aspheric lens;
B. converting the simulation curve into a photoetching graph in a preset calculation mode;
C. transferring the pattern appearance of the photoetching pattern to a glass substrate through a photoetching process;
D. preparing the target aspheric lens by an ion exchange process;
wherein, step B includes:
b1, performing equal proportion segmentation on the simulation curves according to preset shapes with preset quantity;
b2, substituting the midpoint position of each preset shape into an optical design expression to obtain the height of the simulation curve;
b3, dividing each preset shape according to the height of the corresponding simulation curve, arranging a filling surface at the inner end, and arranging a blank surface at the outer end;
b4, carrying out equal-proportion graph conversion on the preset shape to obtain a photoetching graph;
the step B1 further includes:
the preset shape is a rectangle;
meanwhile, the step B3 further includes:
converting any rectangular filling surface and blank surface which are distributed transversely into longitudinal distribution in equal proportion;
the step B1 further includes:
the preset shape is a first unit rectangle, and all the rectangles are combined into a total rectangle;
meanwhile, the step B4 further includes:
taking the midpoint of any length direction of the total rectangle as the center of a circle, and taking the distance from the end point to the midpoint of the filling surface and the blank surface in the length direction of the total rectangle as a radius to make a concentric circle; obtaining a blank circular ring and a filled circular ring for the corresponding filling surface and blank surface of the circular ring in the concentric circle, and taking the concentric circle as a photoetching pattern;
the step B1 further includes: the preset shape is a first unit rectangle, and only the first unit rectangle on one side of the symmetry axis is reserved;
meanwhile, the step B3 further includes: taking a first unit rectangle close to a symmetry axis as a central reference rectangle, removing blank surfaces of the central reference rectangle and reserving filling surfaces, and removing the blank surfaces with the same area from other first unit rectangles;
meanwhile, the step B4 further includes: all the first unit rectangles are combined into a total rectangle, the end point of the approximate symmetry axis in any length direction of the length of the total rectangle is taken as the center of a circle, and the distance from each end point of the filling surface and the blank surface in the length direction of the total rectangle to the end point of the approximate axis side of the total rectangle is taken as the radius to form a concentric circle; and obtaining blank rings and filled rings corresponding to the filling surfaces and the blank surfaces of the rings in the concentric circles, and taking the concentric circles as photoetching patterns.
2. The method of claim 1, wherein when preparing the target aspheric lens by an ion exchange process, step D further comprises:
and controlling the ion exchange concentration and the exchange time according to the photoetching pattern.
3. A lens formed using an ion-exchange based aspheric lens manufacturing method as claimed in any of claims 1 or 2.
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| CN103855251A (en) * | 2014-01-17 | 2014-06-11 | 中国科学院上海技术物理研究所 | Manufacturing method of monolithic integration type infrared micro lens line |
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