CN113826203A - 新半导体电子原理技术与器件 - Google Patents
新半导体电子原理技术与器件 Download PDFInfo
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- CN113826203A CN113826203A CN202080025941.4A CN202080025941A CN113826203A CN 113826203 A CN113826203 A CN 113826203A CN 202080025941 A CN202080025941 A CN 202080025941A CN 113826203 A CN113826203 A CN 113826203A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 205
- 238000005516 engineering process Methods 0.000 title claims abstract description 36
- 230000008859 change Effects 0.000 claims abstract description 54
- 239000000463 material Substances 0.000 claims abstract description 32
- 238000006243 chemical reaction Methods 0.000 claims abstract description 19
- 238000012545 processing Methods 0.000 claims abstract description 10
- 238000005265 energy consumption Methods 0.000 claims abstract description 8
- 238000004519 manufacturing process Methods 0.000 claims abstract description 8
- 238000013473 artificial intelligence Methods 0.000 claims abstract description 5
- 238000013461 design Methods 0.000 claims abstract description 4
- 230000007613 environmental effect Effects 0.000 claims abstract description 4
- 230000005669 field effect Effects 0.000 claims description 34
- 230000007423 decrease Effects 0.000 claims description 28
- 230000003068 static effect Effects 0.000 claims description 20
- 238000009826 distribution Methods 0.000 claims description 17
- 229910052732 germanium Inorganic materials 0.000 claims description 16
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 14
- 239000000969 carrier Substances 0.000 claims description 14
- 229910052710 silicon Inorganic materials 0.000 claims description 14
- 239000010703 silicon Substances 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 13
- 230000003321 amplification Effects 0.000 claims description 11
- 230000007246 mechanism Effects 0.000 claims description 11
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 10
- 230000009467 reduction Effects 0.000 claims description 8
- 230000003247 decreasing effect Effects 0.000 claims description 7
- 230000005684 electric field Effects 0.000 claims description 5
- 239000002800 charge carrier Substances 0.000 claims description 4
- 238000012937 correction Methods 0.000 claims description 4
- 238000009792 diffusion process Methods 0.000 claims description 4
- 230000005672 electromagnetic field Effects 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- 101100356682 Caenorhabditis elegans rho-1 gene Proteins 0.000 claims description 3
- 238000004364 calculation method Methods 0.000 claims description 3
- 230000007935 neutral effect Effects 0.000 claims description 3
- 230000035945 sensitivity Effects 0.000 claims description 3
- 230000009471 action Effects 0.000 claims description 2
- 239000004020 conductor Substances 0.000 claims description 2
- 239000012212 insulator Substances 0.000 claims description 2
- 238000013146 percutaneous coronary intervention Methods 0.000 claims description 2
- 239000002210 silicon-based material Substances 0.000 claims description 2
- 230000000087 stabilizing effect Effects 0.000 claims 2
- 230000005611 electricity Effects 0.000 claims 1
- 238000012797 qualification Methods 0.000 claims 1
- 108091006146 Channels Proteins 0.000 description 6
- 238000011161 development Methods 0.000 description 5
- 239000002019 doping agent Substances 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000012795 verification Methods 0.000 description 2
- 108010075750 P-Type Calcium Channels Proteins 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0255—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using diodes as protective elements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0207—Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
- H01L27/0211—Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique adapted for requirements of temperature
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0259—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using bipolar transistors as protective elements
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- H01—ELECTRIC ELEMENTS
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- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0266—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements
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- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0296—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices involving a specific disposition of the protective devices
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F1/00—Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
- H03F1/30—Modifications of amplifiers to reduce influence of variations of temperature or supply voltage or other physical parameters
- H03F1/302—Modifications of amplifiers to reduce influence of variations of temperature or supply voltage or other physical parameters in bipolar transistor amplifiers
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- Engineering & Computer Science (AREA)
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Engineering & Computer Science (AREA)
- Amplifiers (AREA)
- Bipolar Transistors (AREA)
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
一种半导体电子器件,电信号的转换是通过调制半导体电子器件的电导率完成,以电导率变化为基础的无源半导体电子器件,取代以电流变化为基础的有源半导体电子器件在半导体电子技术和设备中的应用,有效解决半导体电子理论与技术的发热等关键问题,完整地发挥半导体电子器件的功能和特性。半导体电子器件可根据功能和特性的不同要求,选用不同的半导体材料制造,工作速率提高100倍以上,在80℃以下环境温度中能保持正常、稳定和可靠工作,不需预热,开机就能稳定工作,电子器件以性能更强、稳定性可靠性更高、耗能更低的芯片,提高处理数据的能力和速度,解决无人驾驶、人工智能和智慧医疗等新兴领域亟待突破的关口,用于所有半导体电子设备。涉及半导体电子原理与技术、器件结构和工作原理、电路设计、器件制造和材料,产品功能与特性,属半导体电子技术领域。
Description
PCT国内申请,说明书已公开。
Claims (2)
- PCT国内申请,权利要求书已公开。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201911426662 | 2019-12-28 | ||
CN2019114266624 | 2019-12-28 | ||
PCT/CN2020/000042 WO2021128435A1 (zh) | 2019-12-28 | 2020-03-09 | 新半导体电子原理技术与器件 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN113826203A true CN113826203A (zh) | 2021-12-21 |
Family
ID=76507611
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202080025941.4A Pending CN113826203A (zh) | 2019-12-28 | 2020-03-09 | 新半导体电子原理技术与器件 |
CN202010702431.8A Pending CN113053871A (zh) | 2019-12-28 | 2020-07-04 | 新半导体电子原理技术与器件 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
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CN202010702431.8A Pending CN113053871A (zh) | 2019-12-28 | 2020-07-04 | 新半导体电子原理技术与器件 |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP4084070A4 (zh) |
JP (1) | JP2023508509A (zh) |
KR (1) | KR20220119678A (zh) |
CN (2) | CN113826203A (zh) |
AU (1) | AU2020414761A1 (zh) |
CA (1) | CA3163026A1 (zh) |
WO (1) | WO2021128435A1 (zh) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1003755B (zh) * | 1986-12-06 | 1989-03-29 | 汪克明 | 半导体电路不稳定性解决效率提高 |
IT1218200B (it) * | 1988-03-29 | 1990-04-12 | Sgs Thomson Microelectronics | Procedimento di fabbricazione di un dispositivo semiconduttore mos di poterza a modulazione di conducibilita' (himos) e dispositivi con esso ottenuti |
EP0371785B1 (en) * | 1988-11-29 | 1996-05-01 | Kabushiki Kaisha Toshiba | Lateral conductivity modulated MOSFET |
CN103887169A (zh) * | 2013-11-29 | 2014-06-25 | 杭州恩能科技有限公司 | 一种具有提高抗浪涌电流能力的半导体装置的制备方法 |
EP3519607A1 (en) * | 2016-09-27 | 2019-08-07 | Luxembourg Institute of Science and Technology (LIST) | Transparent p-n junction providing a rectifying contact |
CN107170817B (zh) * | 2017-06-16 | 2019-08-02 | 电子科技大学 | 一种横向igbt |
-
2020
- 2020-03-09 AU AU2020414761A patent/AU2020414761A1/en not_active Abandoned
- 2020-03-09 KR KR1020227025314A patent/KR20220119678A/ko not_active Application Discontinuation
- 2020-03-09 EP EP20907132.3A patent/EP4084070A4/en active Pending
- 2020-03-09 CA CA3163026A patent/CA3163026A1/en active Pending
- 2020-03-09 CN CN202080025941.4A patent/CN113826203A/zh active Pending
- 2020-03-09 WO PCT/CN2020/000042 patent/WO2021128435A1/zh unknown
- 2020-03-09 JP JP2022539754A patent/JP2023508509A/ja active Pending
- 2020-07-04 CN CN202010702431.8A patent/CN113053871A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2023508509A (ja) | 2023-03-02 |
EP4084070A4 (en) | 2024-02-07 |
WO2021128435A1 (zh) | 2021-07-01 |
AU2020414761A1 (en) | 2022-07-14 |
EP4084070A1 (en) | 2022-11-02 |
KR20220119678A (ko) | 2022-08-30 |
CN113053871A (zh) | 2021-06-29 |
CA3163026A1 (en) | 2021-07-01 |
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