CN1137572A - Column target electric arc vapor-phase depositor and method - Google Patents
Column target electric arc vapor-phase depositor and method Download PDFInfo
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- CN1137572A CN1137572A CN 95105971 CN95105971A CN1137572A CN 1137572 A CN1137572 A CN 1137572A CN 95105971 CN95105971 CN 95105971 CN 95105971 A CN95105971 A CN 95105971A CN 1137572 A CN1137572 A CN 1137572A
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Abstract
The present invention belongs to the field of vacuum evaporation coating and multiple-arc ion plating technology. It is technically characterized by that said invention is an electric-arc vapor-phase deposition equipment using electromagnetic coil to control column target. Said electromagnetic coil is passed through whole length of the target, and charged with D.C. or A.C., so that on thetarget surface said coil whole body can produce a moving electromagnetic field, and said electromagnetic field of the coil is used to control the arc spot movement, therefore the column target surface etching is uniform, utilization ratio of target material is high, coating thickness is uniform and filming rate is high.
Description
The present invention is a kind of column target electric arc vapor-phase depositor and method, belongs to vacuum plating, multi-arc ion coating membrane technique.
Arc ion plating (aip) is one of current state-of-the-art ion plating technique, it utilizes awkward silence at a meeting to cause the emission arc source provides the high-density metal ionic current, it is the highest technology of metal ionization level in the various ion plating techniques, help forming compound coats such as titanium nitride, in the imitating gold decorating plating, there is wide application aspects such as instrument plating.
The ion plating equipment that generally uses is planar target in the market, in the patent No. is the method and apparatus of 91105729.3 magnetic field bundle arc vapor-phase deposition, narrate a kind of column target electric arc ion plating system, and adopted the permanent magnet that moves back and forth along the columnar target central shaft that arc class is controlled.Magnetic field in this patent be by mechanical moving method control the arc spot on the target surface etching equably, but when the magnetic field commutator that moves, to be magnetic field move to the moment of moving from bottom to top from top to bottom along post pinwheel axle exists of short duration left alone without help always, in the course of time will cause at the two ends of target and etch groove, more extremely cause entire target to scrap, the mechanical in addition failure rate that moves is higher, and it is restricted in suitability for industrialized production.
The objective of the invention is to overcome above-mentioned deficiency, and the column target electric arc vapor-phase depositor that is placed with the may command spots moving of solenoid in a kind of negative electrode columnar target is provided.
The present invention proposes following technical scheme to achieve these goals: this column target electric arc vapor-phase depositor device comprises anode casing, negative electrode columnar target and striking silk, be fixed with solenoid in the negative electrode columnar target that the anode casing middle part is adorned, it is long that solenoid passes through the sky entire target, and pass to direct current or exchange current, be provided with the cooling inhalent siphon in the solenoid, negative electrode columnar target top dress cooling rising pipe, between solenoid periphery and the negative electrode columnar target wall is water chamber, and the solenoid outside scribbles waterproof layer.Whole winding in the negative electrode columnar target is divided at least one group, and every group of coil be by constituting more than the three-phase, each mutually between phasic difference between the logical exchange current of institute be particular value, every group of coil in the negative electrode columnar target is as if being divided into three-phase, the exchange current phasic difference is between every phase
π; If every group of coil is divided into four phases, the exchange current phasic difference is between every phase
, every group of coil is divided into six phases, and the exchange current phasic difference is between every phase
, if every group of coil is divided into eight phases, the exchange current phasic difference is between every phase
Phase place in the interior every group of coil of negative electrode columnar target is changed by its target progress line period sexual intercourse in magnetic field, causes to produce reciprocating magnetic field.
Characteristics of the present invention are: negative electrode columnar target surface etch is even, the target utilization height, and coating film thickness is even, the rate of film build height, structure design is good, and is of many uses.
Particular content of the present invention is provided by accompanying drawing 1～2.
Fig. 1 is the one-piece construction synoptic diagram of column target electric arc vapor deposition apparatus;
Fig. 2 is a negative electrode cylindricality target structure synoptic diagram.
Primary structure among the figure is: vacuum chamber flange 1, arc initiation device insulated enclosure cover 2, water jacket insulated enclosure cover 3, joint flange 4, striking silk 5, solenoid 6, water coolant 7, front apron 8, rear deflector door 9, negative electrode columnar target 10, solenoid lead-in wire 11, inhalent siphon 12, rising pipe 13, anode casing 14, water chamber 15, arc initiation device 16, arc power 17.
Below in conjunction with accompanying drawing the present invention is described in detail.
This column target electric arc vapor-phase depositor and method, comprise anode casing 14, negative electrode columnar target 10 and striking silk 5, be fixed with solenoid 6 in the negative electrode columnar target that the anode casing middle part is adorned, it is long that solenoid runs through entire target, and pass to direct current or exchange current, front apron 8 and rear deflector door 9 are housed respectively before and after the coil, separate a gap between front apron and rear deflector door and the negative electrode columnar target wall, coil is not done any moving, adopt solenoid and produce the control arc class required magnetic field of motion, dress cooling inhalent siphon 12 in the solenoid, negative electrode columnar target top dress cooling rising pipe 13, between solenoid periphery and the negative electrode columnar target wall is water chamber 15, and the solenoid outside scribbles waterproof layer.Whole winding in the negative electrode columnar target is divided at least one group, can produce reciprocating magnetic field in order to make coil integral body, and every group of coil is divided into three-phase at least, if every group of coil is divided into 3 phases, the electric current phasic difference is between every phase
π represents each with A, B, C, if any two-phase in the exchange three-phase.
The Movement in Magnetic Field direction---→ BC exchanges mutually
A C B A C B A C B ... A C B Movement in Magnetic Field direction ←--can make magnetic field opposite with direction of motion.
Every group of coil also can be divided into four phases, and the electric current phasic difference is between every phase
, each is represented with A, B, C, D
Magnetic field move direction-----→ BD exchanges mutually
The Movement in Magnetic Field direction ←--
The two-phase exchange can make direction of motion opposite (as BD exchange or AC exchange)
In like manner every group of coil also can be divided into six phases, eight phases or more heterogeneous, and every phase adds the exchange current phasic difference and is respectively
Or
Every group of number of phases that coil divides is many more, and it is level and smooth more at the formed moving magnetic field in target surface, so but the too much number of phases can make complicated more eight phases that generally are no more than of power supply.The phasic difference of 50 all three-phase alternating current electricity itself is
, directly utilize three-phase alternating current can make supplying unit the simplest, when power frequency is fixed as 50Hz and when not needing to change, adopt three-phase or six the most simple and practical mutually.
As embodiments of the invention, the anode columnar target is placed at center at the vacuum chamber anode casing of the high 820mm of diameter 750mm, target adopts the titanium pipe to make, titanium external diameter of pipe 74mm, wall thickness 10mm, solenoid is packed in the titanium pipe, adorn front apron and rear deflector door before and after the solenoid respectively, before, leave the gap of 4mm between rear deflector door and coil and the titanium tube wall, so that water coolant (7) can flow through smoothly water chamber and before, gap between rear deflector door and the titanium tube wall and flow out from rising pipe, guarantee that target surface has better cooling effect, the solenoid external diameter be 42mm on polyamide skeleton, there is the thick waterproof layer of 2mm coil outside, is used for guaranteeing the insulativity of coil, the actual useful length of entire target is 540mm, solenoid is divided into 5 groups, and every group by three phase composites and pass to three-phase alternating current, every through 5 periodic reverses once.
The exemplary operation electric current of native system is 120A, and voltage 20V is used for decorating plating, plates about 15 minutes at every turn.
During work, negative electrode columnar target and arc power negative pole are joined, anode casing connects positive source, the striking silk forms striking electric arc by arc initiation device 16, and become main arc between negative electrode columnar target and the anode casing rapidly, with the arc process of realizing ideal, carry out workpiece and cross film.
Claims (7)
1. column target electric arc vapor-phase depositor, comprise anode casing, negative electrode columnar target and striking silk, be fixed with solenoid in the negative electrode columnar target that it is characterized in that being adorned at the anode casing middle part, it is long that solenoid runs through entire target, and pass to direct current or exchange current, front apron and rear deflector door are housed respectively before and after the coil, be provided with the gap between front apron and rear deflector door and the negative electrode columnar target wall, be provided with the cooling inhalent siphon in the solenoid, negative electrode columnar target top dress cooling rising pipe, between solenoid periphery and the negative electrode columnar target wall is water chamber, and the solenoid outside scribbles waterproof layer.
2. column target electric arc vapor-phase depositor according to claim 1, it is characterized in that: the whole winding in the negative electrode columnar target is divided at least one group, every group of coil is by constituting more than the three-phase, each mutually between phasic difference between the logical exchange current of institute be particular value, make coil integral body on target surface, produce the electromagnetic field of moving.
3. according to claim 1,2 described column target electric arc vapor-phase depositors, it is characterized in that every group of coil in the negative electrode columnar target is divided into three-phase, the exchange current phasic difference is between every phase
π.
4. according to claim 1,2 described column target electric arc vapor-phase depositors, it is characterized in that: every group of coil in the negative electrode columnar target is divided into four phases, and the exchange current phasic difference is between every phase
5. according to claim 1,2 described column target electric arc vapor-phase depositors, it is characterized in that: every group of coil in the negative electrode columnar target is divided into six phases, and the exchange current phasic difference is between every phase
π.
6. according to claim 1,2 described column target electric arc vapor-phase depositors, it is characterized in that: every group of coil in the negative electrode columnar target is divided into that the exchange current phasic difference is between eight mutually every phases
π.
7. a column target electric arc vapor deposition method is characterized in that the phase place in the interior every group of coil of negative electrode columnar target is changed by its target progress line period sexual intercourse in magnetic field, causes to produce reciprocating magnetic field.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 95105971 CN1137572A (en) | 1995-06-06 | 1995-06-06 | Column target electric arc vapor-phase depositor and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 95105971 CN1137572A (en) | 1995-06-06 | 1995-06-06 | Column target electric arc vapor-phase depositor and method |
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| Publication Number | Publication Date |
|---|---|
| CN1137572A true CN1137572A (en) | 1996-12-11 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN 95105971 Pending CN1137572A (en) | 1995-06-06 | 1995-06-06 | Column target electric arc vapor-phase depositor and method |
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| CN (1) | CN1137572A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1952205B (en) * | 2005-10-17 | 2010-06-02 | 株式会社神户制钢所 | Arc ion plating apparatus |
| CN101363115B (en) * | 2008-03-21 | 2011-11-23 | 中国科学院金属研究所 | Arc source of rotary magnetron arc ion plating |
| CN102321870A (en) * | 2011-09-19 | 2012-01-18 | 王敬达 | Vacuum ion plating method of wear-resisting layer on inner wall of metal cylinder |
| CN102321869A (en) * | 2011-09-16 | 2012-01-18 | 王敬达 | Method and apparatus for ion vacuum plating |
-
1995
- 1995-06-06 CN CN 95105971 patent/CN1137572A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1952205B (en) * | 2005-10-17 | 2010-06-02 | 株式会社神户制钢所 | Arc ion plating apparatus |
| US8261693B2 (en) | 2005-10-17 | 2012-09-11 | Kobe Steel, Ltd. | Arc ion plating apparatus |
| CN101363115B (en) * | 2008-03-21 | 2011-11-23 | 中国科学院金属研究所 | Arc source of rotary magnetron arc ion plating |
| CN102321869A (en) * | 2011-09-16 | 2012-01-18 | 王敬达 | Method and apparatus for ion vacuum plating |
| CN102321870A (en) * | 2011-09-19 | 2012-01-18 | 王敬达 | Vacuum ion plating method of wear-resisting layer on inner wall of metal cylinder |
| CN102321870B (en) * | 2011-09-19 | 2013-07-31 | 王敬达 | Vacuum ion plating method of wear-resisting layer on inner wall of metal cylinder |
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