CN102321869A - Method and apparatus for ion vacuum plating - Google Patents
Method and apparatus for ion vacuum plating Download PDFInfo
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- CN102321869A CN102321869A CN201110274961A CN201110274961A CN102321869A CN 102321869 A CN102321869 A CN 102321869A CN 201110274961 A CN201110274961 A CN 201110274961A CN 201110274961 A CN201110274961 A CN 201110274961A CN 102321869 A CN102321869 A CN 102321869A
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Abstract
An ion vacuum plating method. Two ends of a target material are applied with independent working arc source powers, and voltage level and arc source current level are controlled respectively by each arc source power, namely change of the voltage or arc source current of each arc source power is applied to the two ends of the target material respectively. Current level change is controlled by each arc source power in a same period way, and when an arc source power or a current of one end of the target material is at the maximum level, a voltage of an arc source on the other end of the target material is low. The invention has advantages of cylindrical solid target material with uniformly radiate ion beams around, automatic uniform velocity control of the applied voltage and uniform moving of the arc; besides the invention can overcome many defects of a prior art to ensure quality of a functional ion coating.
Description
Technical field
the present invention relates to ion vacuum coating method and device.
Background technology
The ion vacuum coating method adopts magnetic control column arc source multi-arc ion plating film with device, and its device is in coating chamber central authorities gyromagnet control column arc source (tubulose) to be installed.Form by coating chamber, workpiece pivoted frame, magnetic control column arc source, air inlet (need feed different working gas during the plating differing materials) system, arc source current, workpiece heating source, arc ignition system, vacuum system, workpiece bias power supply.Post arc source is done in target, the pipe several strip permanent magnets to be installed by tubular metal material, permanent magnet (comprises rotation and back and forth movement) in target pipe motion.The arc spot is wire and distributes along post arc target total length, and scans along post arc target surface.Thereby be provided under the high vacuum condition with the arc source by the target of tubular metal material and gas material with the ionic means plated film to workpiece.
Propose a kind of rotary magnetron column arc source multi-arc ion plating film machine like CN96218605.8, rotary magnetron column arc source is installed in coating chamber central authorities.Mainly form by coating chamber, workpiece pivoted frame, rotary magnetron column arc source, inlet system, arc source current, baking heating source, striking needle system, vacuum system, workpiece bias power supply.Post arc source is done in target, the pipe several strip permanent magnets to be installed by tubular metal material, and permanent magnet rotates in the target pipe.The arc spot is wire and distributes along post arc target total length, and scans along post arc target surface.Rotary magnetron column arc source multi-arc ion plating film machine has vertical structure, horizontal type structure, case structure.
Yet above method has a lot of weak points: however the multi sphere ion particle that the method for existing multi-arc ion plating film produces is thick; The droplet phenomenon is arranged, and striking concentrates on magnetic ring, and the etching of tubular target is inhomogeneous; Will revise target surface in two or three days; Need in time to adjust the distance of magnet steel and target, the availability of target is low, has also greatly influenced the working efficiency of vacuum plating; Another deficiency is that the ionic fluid of multi sphere tubular target disperses, and arc light is loose random, and is moving at target tube-surface string; Target tube-surface etching is irregular, is prone to produce groove at two end surfaces of target pipe, has influenced the work-ing life of target greatly; This is to move owing to the magnet steel in the outer motor traction of the traction of the arc target pipe moves back and forth; Be prone to demagnetization under the hot conditions of magnet steel in pipe, thereby influence the striking effect, above-mentioned deficiency all has very big influence to the quality and the production efficiency of ion plating.
95105971.8 the column target electric arc vapor-phase depositor and the method that propose; Multi-arc ion plating film is the electric arc vapor-phase depositor with the columnar target of solenoid controlled arc class motion; It is long to run through entire target with solenoid; And passing to direct current or exchange current, the EM field that makes coil integral body on target surface, produce motion carries out the striking of target gas ions.Need to adopt the arc vapor-phase deposition of the columnar target of solenoid controlled arc class motion, this coil needs very big volume, and obvious obstacle is arranged in practicality--------otherwise the effect of control striking is bad, otherwise be exactly that this coil cannot be installed in Vakuumkammer.The ion vacuum coating method has obtained widely using, and the device of 201020197886 preparation back electrode of solar cell retes and for example also comprises the method for preparing the wearing layer workpiece etc.
Summary of the invention
The objective of the invention is: propose a kind of ion vacuum coating method and device; Adopt on-mechanical magnet mode, the ion striking can be evenly or any-mode move, control the ionic weight of target every place striking; Ion plating quality fine and smooth and the workpiece key coat is high; The length of target is unrestricted, and the utilization ratio of target is high, long service life, adjustment and maintenance, the ion vacuum coating method and the device of applied range of need not in service.
Technical scheme of the present invention is: a kind of ion vacuum coating method and device; The two ends of target all apply the arc source current that works alone; Each arc source current carries out the control of voltage height or arc source size of current respectively, promptly arc source current voltage height or arc source size of current variation put on the two ends of target respectively, the ionic weight of gas ions was big when arc source current voltage height or electric current were big; The topknot ability is strong; Especially every power supply all changes control with the power that the mode of same period is carried out size of current, and target one end arc source current voltage is the highest or electric current when maximum, and the arc source current voltage that the target the other end applies is low or electric current is little.The height of the arc source current voltage that applies according to two ends or the control of arc source current size of current, ion striking can be evenly or any-mode move the ionic weight of control target every place striking; Can take the power adjustment equipment of silicon controlled rectifier voltage setter, especially silicon controlled rectifier regulated with the mode of microprocessor control.
Voltage that target applies or size of current are carried out the control of uniform acceleration automatically; Electric arc evenly moves; Can control through maximum absolute volt and obtain different ionic fluids; The ion exquisiteness can guarantee the exquisiteness of ion plating and the quality of coating and key coat, and the nitrogen that combines simultaneously to apply or the amount of hydrocarbon gas (like working gass such as acetylene ethene) are to the maximum voltage of the arc source current that applies and the strong and weak cycle of variation.
All apply the arc source current that works alone at the target two ends; Each arc source current carries out the control of size of current respectively; Be the two ends that the variation of arc source current size of current puts on target respectively, if the workpiece uneven distribution, control needs the zone of ionic fluid amount to apply higher voltage; Obtain bigger electric currents, the ion that runs arc increases.
Electric current ionic weight big, that send was big when said arc source current voltage was high, and the topknot ability is strong.
Improvement of the present invention is that every target all adopts the cylindrical, massive target.The life-span of its use is extremely long, and target evenly consumes, and operational process need not be adjusted.
Beneficial effect of the present invention: cylindrical, massive target; Divergence of ion beam all around is even; Automatically carry out the control of uniform acceleration through the voltage that applies, electric arc evenly moves, and above-mentioned shortcoming all can overcome; The ionic weight that guarantees striking big (can also control through absolute volt or size of current and obtain different ionic fluids); The ion exquisiteness can guarantee the exquisiteness of ion plating and the quality of coating and key coat, thereby guarantees in the quality that needs functional ion coating, and--------can accomplish through parameter control is convenient like wearing layer, the present invention when anti-corrosion layer has particular requirement, and be obvious more superior than prior art.Striking applies power supply 2, applies power supply (also can control the size of certain regional ionic weight according to the workpiece situation arbitrarily, near the ionic weight of certain workpiece is controlled) in even arc source at solid target through the arc source.The present invention need not magnet steel; Target length is unrestricted; The utilization ratio of target is high; Have increase (as in practicality can use titanium target or zirconium target can use two year need not change) of two one magnitude than life-span of multi sphere ion planar target work-ing life, and the present invention need not adjustment and maintenance in actual motion.The target temperature is low in actual use, and the particle fineness of ionic fluid is good, and the ion may command must be concentrated, energy is big, and is better with the sticking power of workpiece, makes the plating article bright and clean, and the quality of functional ion coating has well then guaranteed the ion film plating of special workpiece.Therefore, the present invention can be applied to the surface decoration of stainless material, also is used for the semiconductor technology various plated films of (comprising the solar photoelectric product), selects different Coating Materials, and the present invention also can be used for the ion plating of wearing layer, also comprises the alloy plating.
Description of drawings
Fig. 1 is a structural representation of the present invention,
Fig. 2 is rolled into tubular when being smooth plate plated film of the present invention, Style Columu Talget is positioned at the synoptic diagram of the post heart position of tube.
Embodiment
The present invention adopts the striking of on-mechanical magnet mode ion; Apply the variation of voltage through the two ends of target; The two ends of said target are not limited to the end face at bar-shaped target, also can insert voltage at any two positions of target rod, but be preferably in the target two ends; Target can be consumed uniformly, and adopting solid column rod is the selection of optimizing as target.All apply the arc source current that works alone at the target two ends; Each arc source current carries out the control of size of current respectively; Be the two ends that the variation of arc source current size of current puts on target respectively, if the workpiece uneven distribution can be controlled the zone that needs the ionic fluid amount and apply higher voltage; Obtain bigger electric currents, the ion that runs arc or striking increases.Electric current ionic weight big, that send was big when said arc source current voltage was high, and the topknot ability is strong.Every target all adopts the cylindrical, massive target, and the life-span of its use is extremely long, and target evenly consumes, and operational process need not be adjusted.Every power supply carries out the power variation to be regulated, and for example all to regulate with the mode of same period, for example takes the power adjustment equipment of silicon controlled rectifier voltage setter, especially with the mode of microprocessor control silicon controlled rectifier is regulated.
To uniform workpiece, as a flat board is carried out even plated film, adopt a Style Columu Talget, smooth plate be rolled into tubular or be converted into U-shaped, V-arrangement all can, around Style Columu Talget, Style Columu Talget is positioned at the i.e. post heart position of tube, body of heater center, workpiece connects bias voltage 7 workpiece and connects bias voltage.Then every power supply all changes with the power that the mode of same period is carried out voltage or electric current, and target one end arc source current voltage or electric current be when the highest, and the arc source current voltage that the target the other end applies is just low.Arc source current voltage that applies according to two ends or the control of the height of arc source current electric current size, ion striking can be evenly or any-mode move, can control the ionic weight of target length different positions striking.To the solid target of single target, smooth plate is rolled into the horizontal type structure of tubular.
The voltage that target applies carries out the control of uniform acceleration automatically; Electric arc evenly moves; Can control through maximum absolute volt or current value and obtain different ionic fluids; The ion exquisiteness can guarantee the exquisiteness of ion plating and the quality of coating and key coat, and the nitrogen that combines simultaneously to apply or the amount of hydrocarbon gas (when being used to be coated with alloy or compound, adopting working gass such as acetylene ethene) are to the maximum voltage of the arc source current that applies or the strong and weak cycle that electric current changes.
Every power supply carries out the power variation to be regulated, and for example all to regulate with the mode of same period, for example takes the power adjustment equipment of silicon controlled rectifier voltage setter, especially with the mode of microprocessor control silicon controlled rectifier is regulated.Every power supply also can independently carry out the regulative mode in cycle by any way; With the mode of different cycles regulate change can, do not need synchronously, prior art all realizes easily; On the macroscopic view to still controlling power that arc is run in each zone, corresponding ion has less more.
Certainly; The technician of the industry should understand; The present invention is not restricted to the described embodiments, and that describes in the foregoing description and the specification sheets just explains principle of the present invention, under the prerequisite that does not break away from the inventive method scope; The present invention also has various variations and is equal to, and these variations and improvement can fall in the scope of the invention that requires protection.The present invention requires protection domain to be defined by appending claims and equivalent thereof.
Claims (9)
1. ion vacuum coating method; The two ends that it is characterized in that target all apply the arc source current that works alone; Each arc source current carries out the control of voltage height or arc source size of current respectively, promptly arc source current voltage height or arc source size of current variation put on the two ends of target respectively.
2. ion vacuum coating method according to claim 1; It is characterized in that every arc source current all carries out the power variation control of size of current with the mode of same period; And target one end arc source current voltage is the highest or electric current when maximum, and the arc source current voltage that the target the other end applies is low.
3. ion vacuum coating method according to claim 1 and 2; The height of the arc source current voltage that it is characterized in that applying or the control of arc source current size of current according to the target two ends; The ion striking can be evenly or any-mode move the ionic weight of control target every place striking; Take the power adjustment equipment of silicon controlled rectifier voltage setter, silicon controlled rectifier is regulated with the mode of microprocessor control.
4. ion vacuum coating method according to claim 1 and 2; It is characterized in that voltage or size of current that target applies carry out the control of uniform acceleration automatically; Electric arc evenly moves; Can control through maximum absolute volt and obtain different ionic fluids, the ion exquisiteness can guarantee the exquisiteness of ion plating and the quality of coating and key coat, and the nitrogen that combination simultaneously applies or the amount of hydrocarbon gas are to the maximum voltage of the arc source current that applies and the strong and weak cycle of variation.
5. ion vacuum coating method according to claim 1 and 2; It is characterized in that all applying the arc source current that works alone at the target two ends, each arc source current carries out the control of size of current respectively, i.e. the variation of arc source current size of current puts on the two ends of target respectively; If workpiece uneven distribution; Control needs the zone of ionic fluid amount to apply higher voltage, obtains bigger electric currents, and the ion that runs arc increases.
6. ion vacuum coating method according to claim 1 and 2; It is characterized in that every power supply carries out the power variation and regulates; All regulate, take the power adjustment equipment of silicon controlled rectifier voltage setter or silicon controlled rectifier is regulated with the mode of microprocessor control with the mode of same period.
7. ion vacuum coating method according to claim 1 and 2 is characterized in that every target all adopts the cylindrical, massive target.
8. ion vacuum coating method according to claim 1 and 2; It is characterized in that a flat board is carried out even plated film, adopt a Style Columu Talget, smooth plate is rolled into tubular; Style Columu Talget is positioned at the post heart position of tube; Then every power supply all carries out power with the mode of same period and changes, and target one end arc source current voltage is when the highest, and the arc source current voltage that the target the other end applies is then low.
9. ion vacuum coating method according to claim 1 and 2 is characterized in that it is horizontal that smooth plate is rolled into tubular.
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| CN201110274961A CN102321869A (en) | 2011-09-16 | 2011-09-16 | Method and apparatus for ion vacuum plating |
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| CN201110274961A CN102321869A (en) | 2011-09-16 | 2011-09-16 | Method and apparatus for ion vacuum plating |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108624848A (en) * | 2018-07-04 | 2018-10-09 | 深圳海容高新材料科技有限公司 | Collect the vacuum coating equipment and vacuum coating method of CVD and PVD one |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5269898A (en) * | 1991-03-20 | 1993-12-14 | Vapor Technologies, Inc. | Apparatus and method for coating a substrate using vacuum arc evaporation |
| CN1137572A (en) * | 1995-06-06 | 1996-12-11 | 北京长城钛金技术联合开发公司 | Column target electric arc vapor-phase depositor and method |
| CN102102178A (en) * | 2009-12-22 | 2011-06-22 | 王殿儒 | Tubular cathode controlled arc plasma evaporation and ionization source |
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2011
- 2011-09-16 CN CN201110274961A patent/CN102321869A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5269898A (en) * | 1991-03-20 | 1993-12-14 | Vapor Technologies, Inc. | Apparatus and method for coating a substrate using vacuum arc evaporation |
| CN1137572A (en) * | 1995-06-06 | 1996-12-11 | 北京长城钛金技术联合开发公司 | Column target electric arc vapor-phase depositor and method |
| CN102102178A (en) * | 2009-12-22 | 2011-06-22 | 王殿儒 | Tubular cathode controlled arc plasma evaporation and ionization source |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108624848A (en) * | 2018-07-04 | 2018-10-09 | 深圳海容高新材料科技有限公司 | Collect the vacuum coating equipment and vacuum coating method of CVD and PVD one |
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Application publication date: 20120118 |