CN113747647A - Double-grid-surface type uniform plasma generator and preparation method thereof - Google Patents
Double-grid-surface type uniform plasma generator and preparation method thereof Download PDFInfo
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- CN113747647A CN113747647A CN202110938331.XA CN202110938331A CN113747647A CN 113747647 A CN113747647 A CN 113747647A CN 202110938331 A CN202110938331 A CN 202110938331A CN 113747647 A CN113747647 A CN 113747647A
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Abstract
The invention discloses a double-grid-surface type uniform plasma generator structure and a preparation method thereof, belonging to the field of structural design of gas purification devices. The electrode plate is made into a grid-shaped three-dimensional structure, when a high-voltage power supply is externally added, a high-field-intensity area is formed in a cavity surrounded by the positive electrode X and the negative electrode X, and partial molecules in gas are ionized under the action of electric field force to generate plasma. Because the whole device structure is a cavity which is surrounded by four electrodes and is periodically arranged, a large number of discharge spaces exist, and a large number of uniform plasmas can be generated in the whole device. Therefore, the plasma generator can realize discharge with higher intensity in a limited space, has low manufacturing cost, and can overcome the defects of low plasma generation efficiency, limited processing space, high power consumption and the like in the industrial application of the specific fields of air disinfection, waste gas and liquid treatment, plasma material modification and the like.
Description
Technical Field
The invention belongs to the field of structural design of gas purification devices, and relates to a double-grid-surface uniform plasma generator structure and a preparation method thereof.
Background
The plasma is in a fourth existing state except solid, liquid and gas, is different from other three states, contains a large number of non-bound charged particles, has equal total charged amounts of positive and negative particles, and is widely applied to the fields of plasma displays, chemical analysis devices, medicine, material treatment, aerospace, environmental management and the like. The existing plasma generating devices have various structures, and the types of pneumatic excitation mainly comprise excitation modes such as arc discharge plasma, corona discharge plasma, laser discharge plasma, microwave discharge plasma and dielectric barrier discharge plasma. Among the above pneumatic excitation, the plasma pneumatic excitation method of dielectric barrier discharge plasma, namely DBD, is the most studied and the technology is the most mature.
The DBD plasma flow control technology, as a new active flow control technology, has many essential advantages compared to the conventional active flow control technology:
(1) the structure is simple, and the size and the weight are small;
(2) the flow feedback is rapid and sensitive, the bandwidth is high, the flow feedback can work under the condition of a changeable scheme, and the automation and the intellectualization of the flow control are easy to realize;
(3) the energy consumption is low, and the working capacity per centimeter is only 0.07-0.14 watt under the unstable scheme;
(4) the flow control has no additional mass input, belongs to zero mass flow control in a strict sense, and has no influence on the flow in a standby state.
Common DBD structures are metal-dielectric-metal structures, and can be classified into a multilayer electrode structure, a counter electrode structure, and a coplanar electrode structure according to the electrode type. The counter electrode structure is suitable for partial discharge, and the coplanar electrode structure is suitable for single-layer large-area discharge, but the two structures are difficult to realize discharge with large range and high uniformity in space.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention aims to provide a double-grid uniform plasma generator structure and a preparation method thereof, which can generate uniform plasma in a large space range, and are applied to various fields such as ozone generation and the like, particularly gas purification treatment.
In order to achieve the purpose, the invention adopts the following technical scheme to realize the purpose:
the invention discloses a double-grid uniform plasma generator, which comprises a first metal plate, a second metal plate, a third metal plate and a fourth metal plate, wherein the first metal plate is a first metal plate;
the first metal plate is connected with an external high-voltage power supply and is grounded, the second metal plate and the third metal plate are respectively connected with the anode of the external high-voltage power supply, and the fourth metal plate is connected with the external high-voltage power supply and is grounded;
arranging a plurality of layers of negative electrodes X on the first metal plate, wherein the negative electrodes X are metal electrodes which are parallel to the horizontal plane and have certain widths, and the negative electrodes X are connected with the third metal plate; a plurality of rows of positive electrodes Y are arranged on the second metal plate, the positive electrodes Y are metal electrodes which are vertical to the horizontal plane and have certain widths, and the positive electrodes Y are connected with the fourth metal plate; a plurality of layers of positive electrodes X are arranged on the third metal plate, the positive electrodes X are metal electrodes which are parallel to the horizontal plane and have certain width, and the positive electrodes X are connected with the first metal plate: a plurality of rows of negative electrodes Y are arranged on the fourth metal plate, the negative electrodes Y are metal electrodes which are vertical to the horizontal plane and have certain widths, and the negative electrodes Y are connected with the second metal plate;
all the positive electrodes X and the negative electrodes X and all the positive electrodes Y and the negative electrodes Y are periodically and vertically arranged in a crossed manner and are interwoven to form a grid three-dimensional structure with crossed warps and wefts.
Preferably, the plurality of layers of positive electrodes X are periodically arranged in the vertical direction, and the plurality of layers of negative electrodes X are periodically arranged in the vertical direction.
Further preferably, the positive electrodes X and the negative electrodes X in the vertical direction are alternately arranged in parallel with each other, and the intervals between the positive electrodes X and the negative electrodes X are uniform and equal.
Preferably, a plurality of columns of positive electrodes Y are periodically arranged in the horizontal direction, and a plurality of columns of negative electrodes Y are periodically arranged in the horizontal direction.
Further preferably, the positive electrodes Y and the negative electrodes Y in the horizontal direction are alternately arranged in parallel with each other, and the pitches between the positive electrodes Y and the negative electrodes Y are uniform and equal.
Preferably, the pitch between each layer of positive electrodes X is equal, the pitch between each layer of negative electrodes X is equal, the pitch between each column of positive electrodes Y is equal, and the pitch between each column of negative electrodes Y is equal.
Preferably, the crosses formed at the intersections of the positive and negative electrodes X, X and Y are spatially uniformly distributed in a uniform periodic distribution.
Preferably, intersections of the positive electrodes X, negative electrodes X and positive electrodes Y, negative electrodes Y are separated by insulating materials, which are disposed in a horizontal direction, for separating the electrodes perpendicular to each other.
Preferably, the positive electrode X, the negative electrode X, the positive electrode Y and the negative electrode Y are all made of metallic aluminum, and the outermost layer is plated with an aluminum oxide protective film.
10. The method of fabricating a dual-grid uniform plasma generator device as recited in claim 9, comprising the steps of:
the method comprises the following steps: cleaning the aluminum substrate;
step two: cutting the aluminum substrate to prepare target devices, namely an electrode X, a negative electrode X, a positive electrode Y, a negative electrode Y and the structural shapes of four metal plates;
step three: carrying out anodic electrochemical oxidation reaction on the aluminum substrate to generate an aluminum oxide protective film with a certain thickness on the surface of the aluminum substrate;
step four: etching part of the aluminum substrate to form a groove, so that the groove can fix the electrodes and prevent the distance between the electrode plates from changing in the discharging process;
step five: etching part of the aluminum substrate to form a gap, so that the aluminum substrate can vertically penetrate other electrodes to form a target structure;
step six: and fixing the positive electrode X, the negative electrode X and the positive electrode Y at the vertical intersection of the positive electrode X, the negative electrode X and the negative electrode Y by using an insulating material, and fixing the positive electrode X, the negative electrode X, the positive electrode Y and the negative electrode Y at the connection parts of the first metal plate, the second metal plate, the third metal plate and the fourth metal plate.
Compared with the prior art, the invention has the following beneficial effects:
the invention discloses a double-grid uniform plasma generating device, which is characterized in that a grid-shaped three-dimensional structure is manufactured by utilizing electrode plates in a staggered design, when a high-voltage power supply is externally added, a high-field-intensity area is formed in a cavity surrounded by a positive electrode X and a negative electrode X, and a part of molecules in gas under the action of electric field force are ionized to generate plasma. Because the whole device structure is a cavity which is surrounded by four electrodes and is periodically arranged, a large number of discharge spaces exist, and a large number of uniform plasmas can be generated in the whole device. The discharge space formed between the electrodes with different polarities is a grid array structure, and has the greatest advantages that the whole discharge area is formed by the electrodes, so that the discharge area and the discharge efficiency are greatly increased, the resistance of gas passing through a device is reduced, the discharge with higher intensity is realized in a limited space, a large amount of uniform plasma can be generated, the generation efficiency of the plasma can be greatly improved, and therefore, the discharge space can be better applied to the treatment of waste gas and waste liquid or volatile organic compounds, the working efficiency can be effectively improved, and the working time can be shortened.
Further, the intersections of the positive electrode X and the negative electrode X and the positive electrode Y and the negative electrode Y are separated by insulating materials, and the insulating materials are used for separating mutually vertical electrode surfaces on one hand and stabilizing the whole device structure on the other hand.
Drawings
FIG. 1 is a three-dimensional schematic diagram of a grid-surface uniform plasma generating device structure disclosed in the present invention;
FIG. 2 is a front cross-sectional view of a grid-faced uniform plasma generating device structure disclosed in the present invention;
FIG. 3 is an enlarged sectional view of the aluminum base side taken at A in FIG. 2;
FIG. 4 is a right side cross-sectional view of a grid-faced uniform plasma generating device structure of the present disclosure;
fig. 5 is a top cross-sectional view of a grid-surface uniform plasma generating device structure disclosed in the present invention.
Wherein, 1 is a first metal plate; 2 is a second metal plate; 3 is a third metal plate; 4 is a fourth metal plate; 5 is a positive electrode X; 6 is a negative electrode X; 7 is a positive electrode Y; 8 is a negative electrode Y; 9 is an insulating material; 10 is a high-voltage power supply; 11 is metal aluminum; 12 is alumina.
Detailed Description
In order to make the technical solutions of the present invention better understood, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It should be noted that the terms "first," "second," and the like in the description and claims of the present invention and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used is interchangeable under appropriate circumstances such that the embodiments of the invention described herein are capable of operation in sequences other than those illustrated or described herein. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
The invention is described in further detail below with reference to the accompanying drawings:
fig. 1 is a three-dimensional schematic diagram of a grid-surface uniform plasma generation device structure, wherein positive electrodes X5 are metal electrodes parallel to a horizontal plane and having a certain width, and are periodically arranged in a vertical horizontal direction, and the distance between every two layers of positive electrodes X5 is equal, all positive electrodes X5 are arranged on a third metal plate 3, and keep the same polarity and potential, the positive electrodes X5 are fixedly connected with a first metal plate 1 through an insulating material 9, and the third metal plate 3 is connected with a positive electrode of a high-voltage power supply 10; the negative electrodes X6 are metal electrodes which are parallel to the horizontal plane and have a certain width, the metal electrodes are periodically arranged in the vertical horizontal direction, the distance between every two layers of the negative electrodes X6 is equal, all the negative electrodes X6 are arranged on the first metal plate 1, the same polarity and the same potential are kept, the negative electrodes X6 are fixedly connected with the third metal plate 3 through an insulating material 9, and the first metal plate 1 is connected with a high-voltage power supply 10 and is connected with the ground; the positive electrodes X5 and the negative electrodes X6 are alternately arranged in parallel, and the distances between the positive electrodes X5 and the negative electrodes X6 are uniform and equal; the positive electrodes Y7 are metal electrodes which are vertical to the horizontal plane and have a certain width, are periodically arranged in the horizontal direction, the distance between every two layers of positive electrodes Y7 is equal, all the positive electrodes Y7 are arranged on the second metal plate 2, the same polarity and the same potential are kept, the positive electrodes Y7 and the fourth metal plate 4 are fixedly connected through an insulating material 9, and the second metal plate 2 is connected with the positive electrode of a high-voltage power supply 10; the negative electrodes Y8 are metal electrodes which are vertical to the horizontal plane and have a certain width, the metal electrodes are periodically arranged in the horizontal direction, the distance between every two layers of negative electrodes Y8 is equal, all the negative electrodes Y8 are arranged on the fourth metal plate 4, the same polarity and the same potential are kept, the negative electrodes Y8 are fixedly connected with the second metal plate 2 through an insulating material 9, and the fourth metal plate 4 is connected with a high-voltage power supply and is connected with the ground; the positive electrodes Y7 and the negative electrodes Y8 are alternately arranged in parallel, and the distances between the positive electrodes Y7 and the negative electrodes Y8 are uniform and equal; the positive electrode X5 and the negative electrode X6 are periodically and vertically arranged with the positive electrode Y7 and the negative electrode Y8 in a crossed way, a grid three-dimensional structure with crossed longitude and latitude is integrally formed, and the crossed parts of the positive electrode X5 and the negative electrode X6 with the positive electrode Y7 and the negative electrode Y8 are uniformly distributed; the crossing parts of the positive electrode X5 and the negative electrode X6 and the positive electrode Y7 and the negative electrode Y8 are separated through an insulating material 9, wherein the insulating material 9 is used for separating mutually vertical electrode surfaces in the X direction and stabilizing the whole device structure on the other hand; the positive electrode X5 is made of metal aluminum 11, and the outer layer of the positive electrode X5 is provided with an aluminum oxide 12 protective film with a certain thickness; the negative electrode X6 is made of metal aluminum, and an aluminum oxide protective film with certain thickness is arranged on the outer layer of the negative electrode X6; the positive electrode Y7 is made of metal aluminum, and an aluminum oxide protective film with a certain thickness is arranged on the outer layer of the positive electrode Y7; the negative electrode Y8 is made of metal aluminum, and an aluminum oxide protective film with certain thickness is arranged on the outer layer of the negative electrode; the first metal plate 1, the second metal plate 2, the third metal plate 3 and the fourth metal plate 4 are made of metal aluminum, and an aluminum oxide protective film with a certain thickness is arranged on the outer layer of the metal aluminum;
fig. 2 is a front sectional view of the structure of the grid-surface uniform plasma generator, which is sequentially provided with a third metal plate 3, a positive electrode Y7, a negative electrode Y8 and a first metal plate 1 from left to right; from top to bottom are a second metal plate 2, a positive electrode X5, a negative electrode X6 and a fourth metal plate 4. The positive electrode X5 and the negative electrode X6 are perpendicular to the positive electrode Y7 and the negative electrode Y8, a discharge space enclosed by the discharge space is a cuboid, the positive electrode X5 is connected with the third metal plate 3 and is connected with the first metal plate 1 through an insulating material 9, the negative electrode X6 is connected with the first metal plate 1 and is connected with the third metal plate 3 through the insulating material 9, the positive electrode Y7 is connected with the second metal plate 2 and is connected with the fourth metal plate 4 through the insulating material 9, and the negative electrode Y8 is connected with the fourth metal plate 4 and is connected with the second metal plate 2 through the insulating material 9.
Fig. 4 is a right sectional view of a grid-type uniform plasma generator structure, wherein the electrodes are connected together at the intersections of the electrodes by an insulating material.
Fig. 5 is a top cross-sectional view of a grid-type uniform plasma generator structure, in which it is known that the insulating material has a certain length but does not completely block the electrodes, and the insulating material forms a saw-tooth structure on the corresponding electrodes.
The grid-surface-type uniform plasma generating device structure provided by the invention utilizes aluminum-based and aluminum electrode sheets which are oxidized to a certain degree to prepare a grid-shaped three-dimensional structure. When a high-voltage power supply is externally added, a high-field-intensity area is formed in a cavity surrounded by the positive electrode X and the negative electrode X, and partial molecules in the gas are ionized under the action of electric field force to generate plasma. Because the whole device structure is a cavity which is surrounded by four electrodes and is periodically arranged, a large number of discharge spaces exist, and a large number of uniform plasmas can be generated in the whole device. The structure of the grid array type uniform plasma generating device has the greatest advantages that the whole discharging area is formed by the electrodes, the discharging area and the discharging efficiency are greatly increased, the resistance of gas passing through the device is reduced, the discharging with larger intensity is realized in a limited space, the manufacturing cost is low, the defects of low plasma generating efficiency, limited processing space, high power consumption and the like in the industrial application of the specific fields of air disinfection, waste gas and liquid treatment, plasma material modification and the like can be overcome, and the operation and maintenance cost of industrial production is reduced.
The above-mentioned contents are only for illustrating the technical idea of the present invention, and the protection scope of the present invention is not limited thereby, and any modification made on the basis of the technical idea of the present invention falls within the protection scope of the claims of the present invention.
Claims (10)
1. A double-grid uniform plasma generator is characterized by comprising a first metal plate (1), a second metal plate (2), a third metal plate (3) and a fourth metal plate (4);
the first metal plate (1) is connected with an external high-voltage power supply (10) and is grounded, the second metal plate (2) and the third metal plate (3) are respectively connected with the positive electrode of the external high-voltage power supply (10), and the fourth metal plate (4) is connected with the external high-voltage power supply (10) and is grounded;
arranging a plurality of layers of negative electrodes X (6) on the first metal plate (1), wherein the negative electrodes X (6) are metal electrodes which are parallel to the horizontal plane and have certain width, and the negative electrodes X (6) are connected with the third metal plate (3); a plurality of rows of positive electrodes Y (7) are arranged on the second metal plate (2), the positive electrodes Y (7) are metal electrodes which are vertical to the horizontal plane and have certain width, and the positive electrodes Y (7) are connected with the fourth metal plate (4); a plurality of layers of positive electrodes X (5) are arranged on the third metal plate (3), the positive electrodes X (5) are metal electrodes which are parallel to the horizontal plane and have certain width, and the positive electrodes X (5) are connected with the first metal plate (1): a plurality of rows of negative electrodes Y (8) are arranged on the fourth metal plate (4), the negative electrodes Y (8) are metal electrodes which are vertical to the horizontal plane and have certain width, and the negative electrodes Y (8) are connected with the second metal plate (2);
all the positive electrodes X (5) and the negative electrodes X (6) are arranged in a periodic vertical crossing way with all the positive electrodes Y (7) and the negative electrodes Y (8), and are interwoven to form a grid three-dimensional structure with intersecting longitude and latitude.
2. Double grid uniform plasma generator device as in claim 1, characterized by several layers of positive electrodes X (5) periodically arranged in vertical direction and several layers of negative electrodes X (6) periodically arranged in vertical direction.
3. Double grid-like uniform plasma generator device according to claim 2, characterized by the fact that the positive X (5) and negative X (6) electrodes are arranged in parallel and alternate in vertical direction and the distance between the positive X (5) and negative X (6) electrodes is uniform and equal.
4. Double grid uniform plasma generator device as claimed in claim 1, characterized by a number of columns of positive electrodes Y (7) periodically arranged in horizontal direction and a number of columns of negative electrodes Y (8) periodically arranged in horizontal direction.
5. The dual-grid uniform plasma generation device as recited in claim 4, wherein the positive electrodes Y (7) and the negative electrodes Y (8) are arranged in parallel and alternate with each other in the horizontal direction, and the spacing between the positive electrodes Y (7) and the negative electrodes Y (8) is uniform and equal.
6. The dual-grid uniform plasma generation device as recited in claim 1, wherein the spacing between each layer of positive electrodes X (5) is equal, the spacing between each layer of negative electrodes X (6) is equal, the spacing between each column of positive electrodes Y (7) is equal, and the spacing between each column of negative electrodes Y (8) is equal.
7. The dual-grid uniform plasma generation device as recited in claim 1, wherein the intersections of the positive X (5) and negative X (6) electrodes with the positive Y (7) and negative Y (8) electrodes are uniformly distributed.
8. Double grid uniform plasma generator device as claimed in claim 1, characterized by the fact that the intersections of the positive X (5) and negative X (6) electrodes with the positive Y (7) and negative Y (8) electrodes are separated by insulating material arranged in horizontal direction for separating the electrodes perpendicular to each other.
9. The dual-grid uniform plasma generator device as claimed in claim 1, wherein said positive X (5), negative X (6), positive Y (7) and negative Y (8) electrodes are all made of aluminum metal with a protective film of aluminum oxide plated on the outermost layer.
10. The method of fabricating a dual-grid uniform plasma generator device as recited in claim 9, comprising the steps of:
the method comprises the following steps: cleaning the aluminum substrate;
step two: cutting the aluminum substrate to prepare target devices, namely an electrode X, a negative electrode X, a positive electrode Y, a negative electrode Y and the structural shapes of four metal plates;
step three: carrying out anodic electrochemical oxidation reaction on the aluminum substrate to generate an aluminum oxide protective film with a certain thickness on the surface of the aluminum substrate;
step four: etching part of the aluminum substrate to form a groove, so that the groove can fix the electrodes and prevent the distance between the electrode plates from changing in the discharging process;
step five: etching part of the aluminum substrate to form a gap, so that the aluminum substrate can vertically penetrate other electrodes to form a target structure;
step six: and fixing the positive electrode X, the negative electrode X and the positive electrode Y at the vertical intersection of the positive electrode X, the negative electrode X and the negative electrode Y by using an insulating material, and fixing the positive electrode X, the negative electrode X, the positive electrode Y and the negative electrode Y at the connection parts of the first metal plate, the second metal plate, the third metal plate and the fourth metal plate.
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