CN103269556A - Large-area atmosphere plasma even discharge electrode - Google Patents

Large-area atmosphere plasma even discharge electrode Download PDF

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Publication number
CN103269556A
CN103269556A CN2013101770682A CN201310177068A CN103269556A CN 103269556 A CN103269556 A CN 103269556A CN 2013101770682 A CN2013101770682 A CN 2013101770682A CN 201310177068 A CN201310177068 A CN 201310177068A CN 103269556 A CN103269556 A CN 103269556A
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China
Prior art keywords
convex shaped
microelectrode
atmosphere plasma
area
microelectrodes
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CN2013101770682A
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Chinese (zh)
Inventor
王波
金会良
姚英学
李娜
车琳
辛强
金江
李铎
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Harbin Institute of Technology
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Harbin Institute of Technology
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Priority to CN2013101770682A priority Critical patent/CN103269556A/en
Publication of CN103269556A publication Critical patent/CN103269556A/en
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Abstract

The invention discloses a large-area atmosphere plasma even discharge electrode and belongs to the field of optical processing. The large-area atmosphere plasma even discharge electrode aims to solve the problems that an alternating current generated by discharging of an existing large-area atmosphere plasma has the skin effect that the current density is increased when the alternating current approaches the edge of the electrode, uneven discharging of the large-area electrode is caused, and precision and efficiency of a processing technology of the atmosphere plasma are seriously influenced. The large-area atmosphere plasma uneven discharge electrode is flat-sheet-shaped. A plurality of protruding microelectrodes are arranged on the discharging surface of the large-area atmosphere plasma even discharge electrode, the shapes and the sizes of all protruding microelectrodes are identical, the distances between each protruding microelectrode and adjacent protruding microelectrode are identical, and the distances between the discharging surfaces of each protruding microelectrode and the processed working surfaces which are opposite to the protruding microelectrodes are equal. The large-area atmosphere plasma even discharge electrode can achieve large-area even discharging of the atmosphere plasma, avoids the phenomenon of uneven discharging caused by the skin effect and the marginal discharge effect when continuous surface electrodes motivate the plasma in an atmospheric environment, and therefore the processing precision and the processing efficiency of the atmosphere plasma can be effectively improved.

Description

The even sparking electrode of large tracts of land atmosphere plasma
Technical field
The invention belongs to the optics manufacture field.
Background technology
Atmosphere plasma chemical process technology is the reaction of atomic that utilizes radio-frequency power supply to inspire under atmospheric environment to have the high density high reaction activity and a kind of chemical process technology of surface of the work atom generation chemical reaction.The active reaction atom that inspires can be regulated by excitation power source power and reaction gas flow, the speed of chemical reaction is compared the processing clearance of traditional mechanical polishing, efficient improves several times even tens times, is with a wide range of applications at the large-sized optical elements manufacture field.
At present the atmosphere plasma form processing mainly is that motion control by small-bore plasma jet realizes, this processing mode is for the large-sized precision optical element, though efficient increases, still can't satisfy the large scale optical element to the demand of atmosphere plasma working (machining) efficiency.Remove speed for the processing that further improves atmosphere plasma, can increase the plasma discharge area under atmospheric pressure, realize the discharge of large tracts of land atmosphere plasma.China Patent No.: 200910085918.X, denomination of invention: large-area flat-plate normal-pressure radio-frequency cold plasma system, this invention is mainly used in surface modification, surface clean and surface sterilization, and there is skin effect in the large tracts of land sparking electrode in this system when plasma discharge, marginal discharge intensity is big, and more obvious with the increase skin effect of electrode size.The discharge of large tracts of land atmosphere plasma is according to the dielectric barrier discharge principle, being applied to the electric field that the alternating voltage on the electrode constitutes by radio-frequency power supply excites, the alternating current of discharge generation has current density to increase at convergence electrode edge place skin effect, cause in discharge process electrode edge place plasma exciatiaon intensity big, and insufficient at the center of electrode plasma exciatiaon, broad-area electrode discharge problem of non-uniform has had a strong impact on precision and the efficient of atmosphere plasma process technology.
Summary of the invention
The purpose of this invention is to provide the even sparking electrode of a kind of large tracts of land atmosphere plasma, the skin effect that the current density increase is arranged at convergence electrode edge place for the alternating current that solves existing large tracts of land atmosphere plasma discharge generation, cause the broad-area electrode discharge inhomogeneous, and had a strong impact on the precision of atmosphere plasma process technology and the problem of efficient.
Described purpose realizes by following scheme: the even sparking electrode of described a kind of large tracts of land atmosphere plasma, it be shaped as flat shape; Its discharge face is provided with a plurality of convex shaped microelectrodes (array), the geomery of all convex shaped microelectrodes is identical, all convex shaped microelectrodes equate all that with the distance each other of adjacent protrusion shape microelectrode the distance of the machined surface that the discharging surface of all convex shaped microelectrodes is relative with it all equates; On the outer surface of discharge face, cover one deck insulating medium layer with differential arc oxidization technique or plasma spray coating technology.
The technical advantage of patent of the present invention:
1, patent of the present invention can realize that the atmosphere plasma large tracts of land evenly discharges, avoid under the atmospheric environment continuous surface electrode activated plasma because of skin effect and marginal discharge effect guiding discharge non-uniform phenomenon, thereby effectively improved atmosphere plasma machining accuracy and efficient;
2, the generation of large area plasma discharge is to realize under open atmospheric conditions, broken through the restriction of large tracts of land discharge under vacuum, and be not subjected to the restriction of vacuum-chamber dimensions, greatly reduce use cost and expanded atmosphere plasma processed and applied scope.
Description of drawings
Fig. 1 is overall structure schematic diagram of the present invention;
Fig. 2 is the plan structure schematic diagram of Fig. 1;
Structural representation when Fig. 3 is convex shaped microelectrode 2 for the strip projection that connects;
Structural representation when Fig. 4 is convex shaped microelectrode 2 for the strip projection that connects;
Structural representation when Fig. 5 is convex shaped microelectrode 2 for the strip projection that connects;
Fig. 6 is the structural representation of embodiment six.
Embodiment
Embodiment one: as shown in Figure 1 and Figure 2, it be shaped as flat shape; Its discharge face 1 is provided with a plurality of convex shaped microelectrode 2(arrays), the geomery of all convex shaped microelectrodes 2 is identical, all convex shaped microelectrodes 2 equate all that with the distance each other of adjacent protrusion shape microelectrode 2 distance of the machined surface that the discharging surface of all convex shaped microelectrodes 2 is relative with it all equates; On the outer surface of discharge face 1, cover one deck insulating medium layer with differential arc oxidization technique or plasma spray coating technology.
Embodiment two: as Fig. 3, Fig. 4, shown in Figure 5, the difference of present embodiment and embodiment one is the strip projection of described convex shaped microelectrode 2 for connecting.Other composition is identical with embodiment one with annexation.
Embodiment three: as shown in Figure 3, the difference of present embodiment and embodiment two be described convex shaped microelectrode 2 truncation surface be shaped as rectangle; The duty ratio of their spacing dimensions between adjacent of the width dimensions of convex shaped microelectrode 2 and its is 0.5 ~ 3, and the height of convex shaped microelectrode 2 is 0.2 mm ~ 3 mm.Other composition is identical with embodiment one with annexation.
Embodiment four: as shown in Figure 4, the difference of present embodiment and embodiment two be described convex shaped microelectrode 2 truncation surface be shaped as triangle; The duty ratio of their spacing dimensions between adjacent of the bottom width size of convex shaped microelectrode 2 and its is 0.5 ~ 3, and the height of convex shaped microelectrode 2 is 0.2 mm ~ 3 mm.Other composition is identical with embodiment one with annexation.
Embodiment five: as shown in Figure 5, the difference of present embodiment and embodiment two be described convex shaped microelectrode 2 truncation surface be shaped as circular arc; The duty ratio of their spacing dimensions between adjacent of the bottom width size of convex shaped microelectrode 2 and its is 0.5 ~ 3, and the height of convex shaped microelectrode 2 is 0.2 mm ~ 3 mm.Other composition is identical with embodiment one with annexation.
Embodiment six: as shown in Figure 6, the difference of present embodiment and embodiment one is that described convex shaped microelectrode 2 is pyramid, the duty ratio of their spacing dimensions between adjacent of the bottom size of convex shaped microelectrode 2 and its is 0.5 ~ 3, and the height of convex shaped microelectrode 2 is 0.2 mm ~ 3 mm.Other composition is identical with embodiment one with annexation.
Operation principle: because the discharge face 1 of electrode is provided with a plurality of convex shaped microelectrodes 2, be that each convex shaped microelectrode 2 structure is as a little electrode, the processing of independently discharging, and the discharging gap between the machined surface is 3mm~5mm, add man-hour when using this electrode to carry out the large tracts of land workpiece, removal amount is more even, effectively suppressed the skin effect that produces in the broad-area electrode discharge process, and having utilized local point discharge that the middle part is produced removes, the plasma active particle concentration that increases has realized the High-speed machining of large area plasma under the atmospheric pressure.

Claims (6)

1. the even sparking electrode of large tracts of land atmosphere plasma is characterized in that flat shape of being shaped as of it; Its discharge face (1) is provided with a plurality of convex shaped microelectrodes (2), the geomery of all convex shaped microelectrodes (2) is identical, all convex shaped microelectrodes (2) equate all that with the distance each other of adjacent protrusion shape microelectrode (2) distance of the machined surface that the discharging surface of all convex shaped microelectrodes (2) is relative with it all equates; On the outer surface of discharge face (1), cover one deck insulating medium layer with differential arc oxidization technique or plasma spray coating technology.
2. the even sparking electrode of large tracts of land atmosphere plasma according to claim 1 is characterized in that the strip projection of described convex shaped microelectrode (2) for connecting.
3. the even sparking electrode of large tracts of land atmosphere plasma according to claim 2, it is characterized in that described convex shaped microelectrode (2) truncation surface be shaped as rectangle; The duty ratio of their spacing dimensions between adjacent of the width dimensions of convex shaped microelectrode (2) and its is 0.5 ~ 3, and the height of convex shaped microelectrode (2) is 0.2 mm ~ 3 mm.
4. the even sparking electrode of large tracts of land atmosphere plasma according to claim 2, it is characterized in that described convex shaped microelectrode (2) truncation surface be shaped as triangle; The duty ratio of their spacing dimensions between adjacent of the bottom width size of convex shaped microelectrode (2) and its is 0.5 ~ 3, and the height of convex shaped microelectrode (2) is 0.2 mm ~ 3 mm.
5. the even sparking electrode of large tracts of land atmosphere plasma according to claim 2, it is characterized in that described convex shaped microelectrode (2) truncation surface be shaped as circular arc; The duty ratio of their spacing dimensions between adjacent of the bottom width size of convex shaped microelectrode (2) and its is 0.5 ~ 3, and the height of convex shaped microelectrode (2) is 0.2 mm ~ 3 mm.
6. the even sparking electrode of large tracts of land atmosphere plasma according to claim 1, it is characterized in that described convex shaped microelectrode (2) is pyramid, the duty ratio of their spacing dimensions between adjacent of the bottom size of convex shaped microelectrode (2) and its is 0.5 ~ 3, and the height of convex shaped microelectrode (2) is 0.2 mm ~ 3 mm.
CN2013101770682A 2013-05-14 2013-05-14 Large-area atmosphere plasma even discharge electrode Pending CN103269556A (en)

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105435291A (en) * 2015-08-17 2016-03-30 老肯医疗科技股份有限公司 Electrode generate for plasma air purification disinfector
TWI552775B (en) * 2013-11-11 2016-10-11 陳柏頴 Cleaning device for decontaminating, sterilizing and killing bugs
CN106179749A (en) * 2016-07-05 2016-12-07 北京航天爱锐科技有限责任公司 Sparking electrode and preparation method thereof, plasma generator and air cleaning facility
CN106488638A (en) * 2015-08-27 2017-03-08 上海至纯洁净系统科技股份有限公司 A kind of plasma apparatus
CN107706080A (en) * 2017-11-13 2018-02-16 珠海倍力高科科技有限公司 A kind of multi-angular whole plate electrode
CN110402010A (en) * 2019-07-15 2019-11-01 中国科学院合肥物质科学研究院 A kind of cascade arcs cathode construction of large area high uniformity active cooling
CN111988902A (en) * 2020-08-14 2020-11-24 清华大学 Flexible gasbag formula plasma generator
CN113056081A (en) * 2021-04-16 2021-06-29 深圳市龙江科创科技有限公司 Flexible electrode and device for plasma surface discharge
CN115475498A (en) * 2022-08-25 2022-12-16 大连海事大学 Waste heat recovery system of ship exhaust gas plasma removing device

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JP2002246368A (en) * 2001-02-14 2002-08-30 Anelva Corp System for processing a wafer using radially uniform plasma over wafer surface
CN1491527A (en) * 2001-02-12 2004-04-21 Se�������幫˾ Apparatus for generating low temperature plasma at atmospheric pressure
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CN1745463A (en) * 2003-02-03 2006-03-08 日本奥特克株式会社 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
CN201002015Y (en) * 2007-01-11 2008-01-09 武汉理工大学 Conic tooth shaped medium-barrier discharge plasma chemical reactor
CN202150988U (en) * 2011-05-17 2012-02-22 上海瑞津环境科技有限公司 Line pipe type electric field regular goad electrode

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001341043A (en) * 2000-06-02 2001-12-11 Sumitomo Osaka Cement Co Ltd Sucking and fixing device
US20050120962A1 (en) * 2001-02-08 2005-06-09 Joichi Ushioda Substrate supporting table, method for producing same, and processing system
CN1491527A (en) * 2001-02-12 2004-04-21 Se�������幫˾ Apparatus for generating low temperature plasma at atmospheric pressure
JP2002246368A (en) * 2001-02-14 2002-08-30 Anelva Corp System for processing a wafer using radially uniform plasma over wafer surface
CN1745463A (en) * 2003-02-03 2006-03-08 日本奥特克株式会社 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
CN201002015Y (en) * 2007-01-11 2008-01-09 武汉理工大学 Conic tooth shaped medium-barrier discharge plasma chemical reactor
CN202150988U (en) * 2011-05-17 2012-02-22 上海瑞津环境科技有限公司 Line pipe type electric field regular goad electrode

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI552775B (en) * 2013-11-11 2016-10-11 陳柏頴 Cleaning device for decontaminating, sterilizing and killing bugs
CN105435291A (en) * 2015-08-17 2016-03-30 老肯医疗科技股份有限公司 Electrode generate for plasma air purification disinfector
CN105435291B (en) * 2015-08-17 2018-09-11 老肯医疗科技股份有限公司 A kind of electrode generator of plasma air purification sterilizer
CN106488638A (en) * 2015-08-27 2017-03-08 上海至纯洁净系统科技股份有限公司 A kind of plasma apparatus
CN106179749A (en) * 2016-07-05 2016-12-07 北京航天爱锐科技有限责任公司 Sparking electrode and preparation method thereof, plasma generator and air cleaning facility
CN106179749B (en) * 2016-07-05 2019-07-02 北京航天爱锐科技有限责任公司 Discharge electrode and preparation method thereof, plasma generator and air cleaning facility
CN107706080A (en) * 2017-11-13 2018-02-16 珠海倍力高科科技有限公司 A kind of multi-angular whole plate electrode
CN110402010A (en) * 2019-07-15 2019-11-01 中国科学院合肥物质科学研究院 A kind of cascade arcs cathode construction of large area high uniformity active cooling
CN111988902A (en) * 2020-08-14 2020-11-24 清华大学 Flexible gasbag formula plasma generator
CN113056081A (en) * 2021-04-16 2021-06-29 深圳市龙江科创科技有限公司 Flexible electrode and device for plasma surface discharge
CN115475498A (en) * 2022-08-25 2022-12-16 大连海事大学 Waste heat recovery system of ship exhaust gas plasma removing device

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Application publication date: 20130828