CN113667551A - 一种高性能电子产品印制板组装件中性半水基清洗剂及其制备方法和应用 - Google Patents
一种高性能电子产品印制板组装件中性半水基清洗剂及其制备方法和应用 Download PDFInfo
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- CN113667551A CN113667551A CN202110752359.4A CN202110752359A CN113667551A CN 113667551 A CN113667551 A CN 113667551A CN 202110752359 A CN202110752359 A CN 202110752359A CN 113667551 A CN113667551 A CN 113667551A
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- cleaning agent
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- electronic product
- water
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/261—Alcohols; Phenols
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/261—Alcohols; Phenols
- C11D7/262—Alcohols; Phenols fatty or with at least 8 carbon atoms in the alkyl or alkenyl chain
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/265—Carboxylic acids or salts thereof
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/266—Esters or carbonates
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3263—Amides or imides
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3281—Heterocyclic compounds
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5022—Organic solvents containing oxygen
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Emergency Medicine (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Detergent Compositions (AREA)
Abstract
本发明公开了一种高性能电子产品印制板组装件中性半水基清洗剂,其原料组成成分及重量份数为:二元醇醚酯溶剂30‑50份、脂肪族二元醇15‑35份、促进剂5‑15份、炔二醇活性剂3‑10份、苯并三氮唑衍生物0.05‑1份、羟基羧酸0.5‑3份、DI水补足至100份。本发明清洗剂为均一透明液体,中性产品(pH=7.50±0.50);具有优良的高低温稳定性,无闪点,使用、运输和储存安全;不产生泡沫,易漂洗。
Description
技术领域
本发明属于无线电电子学、电信技术领域,尤其是一种高性能电子产品印制板组装件中性半水基清洗剂及其制备方法和应用。
背景技术
近年来,随着集成电路的迅速发展及广泛应用,电子设备的体积越来越小,电路布线密度越来越大。电子产品快速向微型化、高集成化、高精密、高可靠性要求发展,这就对印制板及组件的清洗提出了更高的要求。
对于军工、航空航天、汽车电子、仪器仪表等领域的电路板及精密元器件而言,不论是表面贴装还是通孔插装的印制板,在回流焊、波峰焊或手工焊接以后都需要对印制板进行严格地清洗,以清除助焊剂、油脂污物等各种残留物,保证电子产品性能的长期稳定性。特别是目前在普遍采用表面贴装工艺的印制板中,由于助焊剂可能会进入表面组装元器件和基板之间的细小缝隙中,从而使得清洗更为困难。正确地选择清洗剂、制定相应的清洗工艺、有效去除印制线路板上的有害残留物,并且对清洗后的印制线路板进行清洁度检测,对于保证电子产品的质量极为重要。
近年来应用较广泛的一类清洗剂是半水基清洗剂,此类清洗剂的相容性好、操作安全、不燃不爆,再配合加热、刷洗、喷淋喷射和超声波等物理清洗手段,对极性及非极性污染物均有较好的清洗效果。
目前某些半水基助焊剂清洗剂为保证清洗效果,普遍存在碱性较强,容易腐蚀电路板及清洗设备的弊端,造成清洗后电路板表面焊点处发污、敏感的特殊功能材料易被氧化变色、溶胀、变形、脱落等。若喷淋清洗设备长期配合碱性较强的清洗剂使用,还易造成喷淋液箱内的喷嘴等零部件被腐蚀。某些清洗剂的工作液在喷淋使用时会产生较高的泡沫,无法配合喷淋清洗设备使用,只适用于手工刷洗,降低了生产效率,从而限制了这些产品在集成电路及电子元器件清洗方面的广泛使用。
通过检索,发现如下三篇与本发明专利申请相关的专利公开文献:
1、一种柔性印制电路板的清洗工艺方法及其清洗剂组合物(CN108207087A),助焊剂清洗剂由质量百分比为80-85%的脂肪醇聚氧乙烯醚及15-20%的1,2,3,4-四氢化萘组成。高效清洗剂按质量百分含量包括如下组分:磷酸酯盐1-3份、硫酸酯盐2-5份、氯化锌1-3份、脂肪醇聚氧乙烯醚硫酸钠3-10份、甲基苯骈三氮唑3-6份、盐酸10-15份、EDTA 1-2份、乳化剂1-3份、非离子表面活性剂1-5份、去离子水50-80份。需按照乙醇预清洗——乙醇超声波清洗——风干——助焊剂清洗剂超声波清洗——去离子水超声波漂洗——高效清洗剂超声波清洗——电刷刷洗局部——乙醇超声波漂洗——风干的清洗工艺步骤进行清洗。该发明严格利用超声波清洗原理,针对性的配制清洗剂,清洗工艺中涉及乙醇、助焊剂清洗剂和高效清洗剂三种类型的清洗剂。通过对比,本发明可采用超声波清洗、喷淋清洗、手工刷洗等多种清洗方式,采用清洗剂清洗-RO水漂洗-干燥的工艺步骤可实现有效清洗,本发明与上述专利公开文献存在本质的不同。
2、柔性电路板清洗剂、柔性电路板清洗工艺、柔性电路板及电子设备(CN107629887A),柔性电路板清洗剂按质量百分含量包括如下组分:N-甲基吡咯烷酮30-45%,丁内酯20-35%,羧基酸类络合剂1.5-3%,渗透剂0.5-2%,其余为水,采用的清洗工艺为超声波清洗。通过对比,本发明可采用超声波清洗、喷淋清洗、手工刷洗等多种清洗方式,且清洗剂可用DI水稀释为5%-25%的工作液使用,本发明与上述专利公开文献存在本质的不同。
3、一种清洗电路板的清洗剂及其制备方法(CN 104371838 A),清洗剂按质量百分含量包括如下组分:椰油酸二乙醇酰胺10-15份,二乙二醇单丁醚4-6份,聚氧乙烯醚3-5份、苯并三氮唑2-4份、异丁醇2-3份、四氟丙醇1-2份、EDTA 1-2份、柠檬酸钠1-2份、三聚磷酸钠1-2份、月桂醇醚磷酸酯钾1-2份、去离子水50-60份。通过对比,本发明所述清洗剂不含氟、氯等卤素,不含磷,且清洗剂可用DI水稀释为5%-25%的工作液使用,本发明与上述专利公开文献存在本质的不同。
通过对比,本发明专利申请相与上述专利公开文献存在本质的不同。
发明内容
本发明目的在于克服现有技术中的不足之处,提供一种高性能电子产品印制板组装件中性半水基清洗剂及其制备方法和应用。
本发明解决其技术问题所采用的技术方案是:
一种高性能电子产品印制板组装件中性半水基清洗剂,其原料组成成分及重量份数为:
二元醇醚酯溶剂30-50份、脂肪族二元醇15-35份、促进剂5-15份、炔二醇活性剂3-10份、苯并三氮唑衍生物0.05-1份、羟基羧酸0.5-3份、DI水补足至100份。
进一步地,所述二元醇醚酯溶剂为二乙二醇乙醚醋酸酯、二乙二醇丁醚醋酸酯、丙二醇甲醚醋酸酯、丙二醇甲醚丙酸酯、二丙二醇甲醚醋酸酯中的至少一种。
进一步地,所述脂肪族二元醇为1,2-丙二醇、2,3-丁二醇、1,2-戊二醇、1,5-戊二醇、2-甲基-2,4-戊二醇、1,2-己二醇、2-乙基-1,3-己二醇中的至少一种。
进一步地,所述炔二醇活性剂为丁炔二醇、二甲基己炔二醇、二甲基辛炔二醇、四甲基癸炔二醇中的一种。
进一步地,所述羟基羧酸为DL-羟基丁二酸、2,3-二羟基丁二酸、3-羧基-3-羟基戊二酸中的一种。
进一步地,所述促进剂为低分子液态酰胺。
如上所述的高性能电子产品印制板组装件中性半水基清洗剂的制备方法,步骤如下:
A.按照质量配比称取二元醇醚酯溶剂、脂肪族二元醇、促进剂、炔二醇活性剂、苯并三氮唑衍生物、羟基羧酸及DI水;
B.在室温条件下,将上述原料加入至搅拌釜中,开启搅拌,转速100-300r/min,时间30-60min,混合均匀后,即得高性能电子产品印制板组装件中性半水基清洗剂。
如上所述的高性能电子产品印制板组装件中性半水基清洗剂在电子产品印制板清洗方面中的应用。
利用如上所述的高性能电子产品印制板组装件中性半水基清洗剂清洗高性能电子产品印制板组装件的方法,其特征在于:步骤如下:
用DI水将高性能电子产品印制板组装件中性半水基清洗剂稀释为质量浓度为5%-25%的工作液,使用喷淋清洗、手工刷洗、超声波清洗的清洗工艺对印制板组装件进行清洗。
本发明取得的优点和积极效果为:
1、本发明清洗剂为均一透明液体,中性产品(pH=7.50±0.50);具有优良的高低温稳定性,无闪点,使用、运输和储存安全;不产生泡沫,易漂洗。
2、本发明清洗剂配合喷淋清洗、手工刷洗、超声波清洗等清洗方式,能有效清除含铅或无铅的助焊剂残留物。由于单一成分对多种助焊剂的清洗效果有限,因此所述助焊剂采用含多种有效结构的化合物组合,用以针对性的清除助焊剂残留物中的极性及非极性成分。例如,含氧基团促进了与助焊剂残留物中羧酸基的氢键形成;短链及多支链结构的化合物有助于打破助焊剂的晶体结构。促进剂可促使清洗剂在细间距元器件间的渗透和润湿,同时在漂洗步骤防止助焊剂固体再次沉积。
3、本发明清洗剂对常用的元器件或材料均表现出良好的兼容性,但不适于铝镁合金的清洗。
4、本发明清洗剂不含卤素及芳烃等有毒有害物质,不含消耗臭氧层及全球变暖物质,不含《空气清洁法案》中限定的有害空气污染物,符合欧盟RoHS指令,对人体无害,对环境友好,能够保障电子产品清洗的有效性、可靠性、安全性。
5、使用DI水将本发明所述清洗剂稀释为一定浓度的工作液,具有较好的经济性。生产设备、工艺简单,易于实现。
6、本发明清洗剂为中性产品,针对含铅及无铅焊膏设计,可有效清除电路板及电子元器件表面附着的助焊剂残留物、油污、灰尘等污染物,清洗效果良好;不腐蚀清洗设备,对常用电子组件及材料兼容性好;因此,所述中性半水基清洗剂能够保障电子产品清洗的有效性、可靠性及安全性。
附图说明
图1为本发明中产品测试报告图;
图2为本发明中RoHS测试报告图。
具体实施方式
下面详细叙述本发明的实施例,需要说明的是,本实施例是叙述性的,不是限定性的,不能以此限定本发明的保护范围。
本发明中所使用的原料,如无特殊说明,均为常规的市售产品;本发明中所使用的方法,如无特殊说明,均为本领域的常规方法。
一种高性能电子产品印制板组装件中性半水基清洗剂,其原料组成成分及重量份数为:
二元醇醚酯溶剂30-50份、脂肪族二元醇15-35份、促进剂5-15份、炔二醇活性剂3-10份、苯并三氮唑衍生物0.05-1份、羟基羧酸0.5-3份、DI水补足至100份。
较优地,所述二元醇醚酯溶剂为二乙二醇乙醚醋酸酯、二乙二醇丁醚醋酸酯、丙二醇甲醚醋酸酯、丙二醇甲醚丙酸酯、二丙二醇甲醚醋酸酯中的至少一种。
较优地,所述脂肪族二元醇为1,2-丙二醇、2,3-丁二醇、1,2-戊二醇、1,5-戊二醇、2-甲基-2,4-戊二醇、1,2-己二醇、2-乙基-1,3-己二醇中的至少一种。
较优地,所述炔二醇活性剂为丁炔二醇、二甲基己炔二醇、二甲基辛炔二醇、四甲基癸炔二醇中的一种。
较优地,所述羟基羧酸为DL-羟基丁二酸、2,3-二羟基丁二酸、3-羧基-3-羟基戊二酸中的一种。
较优地,所述促进剂为低分子液态酰胺。
如上所述的高性能电子产品印制板组装件中性半水基清洗剂的制备方法,步骤如下:
A.按照质量配比称取二元醇醚酯溶剂、脂肪族二元醇、促进剂、炔二醇活性剂、苯并三氮唑衍生物、羟基羧酸及DI水;
B.在室温条件下,将上述原料加入至搅拌釜中,开启搅拌,转速100-300r/min,时间30-60min,混合均匀后,即得高性能电子产品印制板组装件中性半水基清洗剂。
如上所述的高性能电子产品印制板组装件中性半水基清洗剂在电子产品印制板清洗方面中的应用。
利用如上所述的高性能电子产品印制板组装件中性半水基清洗剂清洗高性能电子产品印制板组装件的方法,其特征在于:步骤如下:
用DI水将高性能电子产品印制板组装件中性半水基清洗剂稀释为质量浓度为5%-25%的工作液,使用喷淋清洗、手工刷洗、超声波清洗的清洗工艺对印制板组装件进行清洗。
具体地,相关制备及检测实施例如下:
实施例1
一种高性能电子产品印制板组装件中性半水基清洗剂,其原料组成及重量百分比为:
丙二醇甲醚醋酸酯45%、2-甲基-2,4-戊二醇25%、促进剂10%、四甲基癸炔二醇8%、苯并三氮唑衍生物0.5%、DL-羟基丁二酸1%,DI水余量。
上述高性能电子产品印制板组装件中性半水基清洗剂的制备方法步骤如下:
按照质量配比称取丙二醇甲醚醋酸酯、2-甲基-2,4-戊二醇、促进剂、四甲基癸炔二醇、苯并三氮唑衍生物、DL-羟基丁二酸及DI水;在室温条件下,将上述原料加入至搅拌釜中,开启搅拌,转速200r/min,时间45min,混合均匀后,即得高性能电子产品印制板组装件中性半水基清洗剂,清洗剂pH值(原液,25℃)=7.50。
采用喷淋清洗的方式对三组印制板组装件进行清洗,按如下步骤进行:
用DI水将中性半水基清洗剂稀释为20%的工作液,混合均匀;确定清洗的工艺流程及工艺参数如表1所示,清洗前需空机循环10-30min,同时安装合适的过滤器以去除清洗下来的锡球、焊渣等固体颗粒。
表1清洗工艺步骤及参数
使用三目测量显微镜在30倍倍率下对清洗后的组装件进行目检,所述清洗剂及清洗工艺可有效清除含铅或无铅的助焊剂残留物,对部件标识、涂覆层、塑料、弹性体等电子元器件的兼容性良好。
使用离子污染度测试仪对上述清洗后的电路板进行离子污染物测试,得到表示电子组件污染程度的单位面积上的氯化钠含量分别为0.94μg(NaCl)/cm2、0.16μg(NaCl)/cm2、0.54μg(NaCl)/cm2。
使用所述清洗剂对电子产品中常用元器件进行了材料短期暴露兼容性测试。所述清洗剂不会引起铜合金、镀银层等金属合金的变色或部件标识的脱落,对常用的元器件或材料均表现出良好的兼容性,但不适于铝镁合金的清洗。
实施例2
一种高性能电子产品印制板组装件中性半水基清洗剂,其组成及重量百分比为:
二丙二醇甲醚醋酸酯40%、1,2-己二醇20%、促进剂12%、二甲基辛炔二醇6%、苯并三氮唑衍生物0.5%、2,3-二羟基丁二酸1.5%,DI水余量。
上述高性能电子产品印制板组装件中性半水基清洗剂的制备方法步骤如下:
按照质量配比称取二丙二醇甲醚醋酸酯、1,2-己二醇、促进剂、二甲基辛炔二醇、苯并三氮唑衍生物、2,3-二羟基丁二酸及DI水;在室温条件下,将上述原料加入至搅拌釜中,开启搅拌,转速200r/min,时间45min,混合均匀后,即得高性能电子产品印制板组装件中性半水基清洗剂,清洗剂pH值(原液,25℃)=7.46。
采用手工刷洗进行清洗试验,用DI水将所述清洗剂稀释为15%的工作液,将电路板组件倾斜,用防静电毛刷蘸取适量工作液(45℃),将电路板组件从高至低、从前往后进行刷洗,清洗后使用DI水将电路板漂洗干净,吹干后检测。
使用三目测量显微镜在30倍倍率下对清洗后的组装件进行目检,所述清洗剂及清洗工艺可有效清除残留助焊剂、油污、指印、灰尘等污染物,清洗后电子部件上的金属及非金属材料表面无腐蚀。能够保障电子产品清洗的有效性、可靠性及安全性。
相关检测见图1和图2。图1的检测结果表明:所研制清洗剂为均一透明液体,中性产品(pH=7.50±0.50);具有优良的高低温稳定性,无闪点,使用、运输和储存安全。采用喷淋清洗或手工刷洗等清洗方式,能有效清除含铅或无铅的免洗或松香锡膏残留物。由于单一成分对多种助焊剂的清洗效果有限,因此所研制助焊剂采用含多种有效结构的有机化合物组合,用以针对性的清除助焊剂残留物中的非极性成分。例如,含氧基团促进了与助焊剂残留物中羧酸基的氢键形成;短链及多支链结构的化合物有助于打破助焊剂的晶体结构。某功能性添加剂可促进清洗剂在细间距元器件间的渗透和润湿,同时在漂洗步骤防止助焊剂固体再次沉积。所研制清洗剂对常用的元器件或材料均表现出良好的兼容性,不会引起铜合金、镀银层的变色或部件标识的脱落,对这些材料表现出良好的兼容性。
说明书附图中图2的检测结果表明:所研制清洗剂符合欧盟RoHS指令,对人体无害,对环境友好。
尽管为说明目的公开了本发明的实施例,但是本领域的技术人员可以理解:在不脱离本发明及所附权利要求的精神和范围内,各种替换、变化和修改都是可能的,因此,本发明的范围不局限于实施例所公开的内容。
Claims (9)
1.一种高性能电子产品印制板组装件中性半水基清洗剂,其特征在于:其原料组成成分及重量份数为:
二元醇醚酯溶剂30-50份、脂肪族二元醇15-35份、促进剂5-15份、炔二醇活性剂3-10份、苯并三氮唑衍生物0.05-1份、羟基羧酸0.5-3份、DI水补足至100份。
2.根据权利要求1所述的高性能电子产品印制板组装件中性半水基清洗剂,其特征在于:所述二元醇醚酯溶剂为二乙二醇乙醚醋酸酯、二乙二醇丁醚醋酸酯、丙二醇甲醚醋酸酯、丙二醇甲醚丙酸酯、二丙二醇甲醚醋酸酯中的至少一种。
3.根据权利要求1所述的高性能电子产品印制板组装件中性半水基清洗剂,其特征在于:所述脂肪族二元醇为1,2-丙二醇、2,3-丁二醇、1,2-戊二醇、1,5-戊二醇、2-甲基-2,4-戊二醇、1,2-己二醇、2-乙基-1,3-己二醇中的至少一种。
4.根据权利要求1所述的高性能电子产品印制板组装件中性半水基清洗剂,其特征在于:所述炔二醇活性剂为丁炔二醇、二甲基己炔二醇、二甲基辛炔二醇、四甲基癸炔二醇中的一种。
5.根据权利要求1所述的高性能电子产品印制板组装件中性半水基清洗剂,其特征在于:所述羟基羧酸为DL-羟基丁二酸、2,3-二羟基丁二酸、3-羧基-3-羟基戊二酸中的一种。
6.根据权利要求1至5任一项所述的高性能电子产品印制板组装件中性半水基清洗剂,其特征在于:所述促进剂为低分子液态酰胺。
7.如权利要求1至6任一项所述的高性能电子产品印制板组装件中性半水基清洗剂的制备方法,其特征在于:步骤如下:
A.按照质量配比称取二元醇醚酯溶剂、脂肪族二元醇、促进剂、炔二醇活性剂、苯并三氮唑衍生物、羟基羧酸及DI水;
B.在室温条件下,将上述原料加入至搅拌釜中,开启搅拌,转速100-300r/min,时间30-60min,混合均匀后,即得高性能电子产品印制板组装件中性半水基清洗剂。
8.如权利要求1至6任一项所述的高性能电子产品印制板组装件中性半水基清洗剂在电子产品印制板清洗方面中的应用。
9.利用如权利要求1至6任一项所述的高性能电子产品印制板组装件中性半水基清洗剂清洗高性能电子产品印制板组装件的方法,其特征在于:步骤如下:
用DI水将高性能电子产品印制板组装件中性半水基清洗剂稀释为质量浓度为5%-25%的工作液,使用喷淋清洗、手工刷洗、超声波清洗的清洗工艺对印制板组装件进行清洗。
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