CN113659038A - Method for manufacturing grid line of solar photovoltaic cell - Google Patents
Method for manufacturing grid line of solar photovoltaic cell Download PDFInfo
- Publication number
- CN113659038A CN113659038A CN202110923462.0A CN202110923462A CN113659038A CN 113659038 A CN113659038 A CN 113659038A CN 202110923462 A CN202110923462 A CN 202110923462A CN 113659038 A CN113659038 A CN 113659038A
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- CN
- China
- Prior art keywords
- battery piece
- layer
- nickel
- plating
- copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 34
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 91
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 44
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 35
- 229910052802 copper Inorganic materials 0.000 claims abstract description 35
- 239000010949 copper Substances 0.000 claims abstract description 35
- 238000007747 plating Methods 0.000 claims abstract description 29
- 239000002184 metal Substances 0.000 claims abstract description 28
- 229910052751 metal Inorganic materials 0.000 claims abstract description 28
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 16
- 239000000126 substance Substances 0.000 claims abstract description 12
- 238000006243 chemical reaction Methods 0.000 claims abstract description 9
- 238000003466 welding Methods 0.000 claims abstract description 9
- 238000005406 washing Methods 0.000 claims description 8
- 239000012528 membrane Substances 0.000 claims description 6
- 230000003647 oxidation Effects 0.000 claims description 5
- 238000007254 oxidation reaction Methods 0.000 claims description 5
- 238000005253 cladding Methods 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 4
- 238000007598 dipping method Methods 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 239000007800 oxidant agent Substances 0.000 claims description 3
- 239000007888 film coating Substances 0.000 abstract 1
- 238000009501 film coating Methods 0.000 abstract 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 238000010248 power generation Methods 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 230000005611 electricity Effects 0.000 description 3
- 238000000576 coating method Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention discloses a method for manufacturing a grid line of a solar photovoltaic cell, which comprises the following steps of: according to the design of grid lines on the surface of a battery piece, a layer of film is pasted on the surface which does not need to be covered by a metal layer to prepare for subsequent vacuum coating, specifically, the battery piece is placed in a film pasting machine and is placed in a working area through a mechanical arm, the surface of the battery piece is plated with nickel in a vacuum mode, a layer of copper is plated on the surface of the nickel in a chemical plating mode after the nickel plating is completed, the battery piece is convenient to be welded with a welding strip in the series connection process, one surface of the battery piece is a positive electrode, the reverse side of the battery piece is a negative electrode, the battery piece converts light energy into current under the irradiation of sunlight, the current is led out through the metal layer, nickel is coated between films through film coating, a nickel strip can be covered as required, the bonding force between the welding strip and the battery piece is improved through a copper plating mode, and the stability is improved; the vacuum coating makes the plating more even, reduces the on-resistance, bears high on-current, improves battery piece conversion efficiency.
Description
The technical field is as follows:
the invention belongs to the technical field of solar cell manufacturing, and particularly relates to a method for manufacturing a grid line of a solar photovoltaic cell.
Background art:
along with the improvement of people's consciousness to environmental protection, traditional burning electricity generation is replaced gradually, and various new forms of energy electricity generation walk into millions of families gradually, and the common includes hydroelectric power generation, wind power generation and solar energy power generation etc. wherein solar energy power generation adds because of its simple structure establishes convenience etc. also can be used in each family, is the new forms of energy electricity generation mode that uses comparatively extensively.
In the prior art, the traditional method for the solar photovoltaic television film is to brush silver paste on the surface of the cell by adopting a printing mode, and the traditional method for brushing silver paste has the defects of small binding force between the silver paste and the cell, uneven thickness of a silver layer and large on-resistance, so that the conversion rate of the solar cell is low.
The invention content is as follows:
the invention aims to solve the problems and provide a method for manufacturing a grid line of a solar photovoltaic cell.
In order to solve the above problems, the present invention provides a technical solution:
a method for manufacturing a grid line of a solar photovoltaic cell comprises the following steps:
the method comprises the following steps: pasting a film on the surface of the battery piece: according to the design of grid lines on the surface of a battery piece, a layer of film is pasted on the surface which does not need to be covered by a metal layer to prepare for subsequent vacuum coating.
Step two: vacuum nickel plating on the surface of the battery piece: the one side of battery piece is anodal, the reverse side is the negative pole, the battery piece is under the sunlight irradiation, can convert light energy into electric energy, form the electric current, after the electric energy conversion, need derive the electric energy of battery piece conversion and collect the utilization, this process is at battery piece surface plating one deck metal level, thereby derive the electric current, specifically fix the battery piece in vacuum coating equipment, cover one deck metallic nickel on the battery piece surface through the mode of vacuum plating, the metal level covers the back of accomplishing, because the cover of membrane, need not cover the place of metal level and take off the back with the membrane, just kept battery piece state itself, battery piece grid line nickel layer thickness is formulated according to process design, can realize 1 ~ 10um thickness control.
Step three: plating copper on the surface of the battery piece: in order to improve the binding force between the grid line of the cell piece and the welding strip, a copper layer needs to be plated on the nickel layer, the binding force between the welding strip and the cell piece is improved, the copper layer is increased in a vacuum coating mode, the phenomenon of metal layer layering can be generated, the binding force is poor, the copper layer is increased in a chemical plating mode, the thickness of the copper layer is controllable, and meanwhile, the binding force of the metal layer and the thickness of the metal layer are uniform, and the process is divided into 5 steps; specifically, the step 1: firstly, carrying out deoxidation treatment on a nickel layer on the surface of a battery piece, wherein the nickel layer is oxidized after contacting with air, and an oxide layer on the surface of the nickel layer needs to be removed, and a special oxidizer removing treatment is utilized; step 2: the surface of the nickel layer with the oxidation removed is activated, so that the binding force of the nickel layer of the battery piece is improved; and 3, step 3: performing pre-dipping treatment on the battery piece to protect the concentration of chemical solution for electroless copper plating and copper cladding; and 4, step 4: depositing a copper layer on the basis of a nickel layer on the surface of the battery piece by using a chemical plating mode, wherein the thickness of the copper layer is established according to process design, and the thickness control of 1-10 um can be realized; and 5, step 5: and washing, washing with hot water and drying the cell, and cleaning the surface of the cell, wherein after the process is finished, the manufacturing of the grid line of the solar photovoltaic cell is finished.
The invention has the beneficial effects that: according to the method, the coating is carried out and nickel is plated between the coatings, so that the nickel strip can be covered by the kettle as required, the bonding force between the nickel layer and the battery piece substrate is improved in a copper plating mode, and the stability is improved; the vacuum coating makes the plating more even, reduces the on-resistance, bears high on-current, improves battery piece conversion efficiency.
The specific implementation mode is as follows:
the specific implementation mode adopts the following technical scheme: a method for manufacturing a grid line of a solar photovoltaic cell comprises the following steps:
the method comprises the following steps: pasting a film on the surface of the battery piece: according to the design of grid lines on the surface of a battery piece, a layer of film is pasted on the surface which does not need to be covered by a metal layer to prepare for subsequent vacuum coating.
Step two: vacuum nickel plating on the surface of the battery piece: the one side of battery piece is anodal, the reverse side is the negative pole, the battery piece is under the sunlight irradiation, can convert light energy into electric energy, form the electric current, after the electric energy conversion, need derive the electric energy of battery piece conversion and collect the utilization, this process is at battery piece surface plating one deck metal level, thereby derive the electric current, specifically fix the battery piece in vacuum coating equipment, cover one deck metallic nickel on the battery piece surface through the mode of vacuum plating, the metal level covers the back of accomplishing, because the cover of membrane, need not cover the place of metal level and take off the back with the membrane, just kept battery piece state itself, battery piece grid line nickel layer thickness is formulated according to process design, can realize 1 ~ 10um thickness control.
Step three: plating copper on the surface of the battery piece: in order to improve the binding force between the grid line of the battery piece and the welding strip, a copper layer needs to be plated on a nickel layer to improve the welding capacity, the copper layer is increased in a vacuum coating mode, the phenomenon of metal layer layering can be generated, the binding force is poor, the copper layer is increased in a chemical plating mode, the thickness of the copper layer is controllable, and meanwhile, the binding force of the metal layer and the thickness of the metal layer are uniform, and the process is divided into 5 steps; specifically, the step 1: firstly, carrying out deoxidation treatment on a nickel layer on the surface of a battery piece, wherein the nickel layer is oxidized after contacting with air, and an oxide layer on the surface of the nickel layer needs to be removed, and a special oxidizer removing treatment is utilized; step 2: the surface of the nickel layer with the oxidation removed is activated, so that the binding force of the nickel layer of the battery piece is improved; and 3, step 3: performing pre-dipping treatment on the battery piece to protect the concentration of chemical solution for electroless copper plating and copper cladding; and 4, step 4: depositing a copper layer on the basis of a nickel layer on the surface of the battery piece by using a chemical plating mode, wherein the thickness of the copper layer is established according to process design, and the thickness control of 1-10 um can be realized; and 5, step 5: and washing, washing with hot water and drying the cell, and cleaning the surface of the cell, wherein after the process is finished, the manufacturing of the grid line of the solar photovoltaic cell is finished.
Specifically, the method comprises the following steps: according to the design of grid lines on the surface of a battery piece, a layer of film is adhered on the surface which does not need to be covered by a metal layer to prepare for subsequent vacuum coating, specifically, the battery piece is placed in a film adhering machine and is placed in a working area through a mechanical arm, a layer of film is adhered on a blank area on the battery piece, the number of the adhered films is one more than that of the grid lines of the battery piece according to the design of the number of the grid lines of the battery piece, the battery piece is fixed in vacuum coating equipment after the film adhering is finished, a layer of metal nickel is covered on the surface of the battery piece in a vacuum coating mode, after the metal layer is covered, the film is removed at a place which does not need to be covered by the metal layer, the state of the battery piece is kept, the thickness of the grid lines of the battery piece can be controlled by 1-10 mu m according to the process design, a nickel layer needs to be coated on the nickel layer of the grid lines of the battery piece, and the binding force between the welding strip and the battery piece needs to be improved, the copper layer is added in a vacuum coating mode, a metal layer layering phenomenon can be generated, the bonding force is poor, the nickel layer on the surface of the cell piece is subjected to deoxidation treatment, the nickel layer is oxidized after being contacted with air, an oxidation layer on the surface of the nickel layer needs to be removed, and special deoxidation agent treatment is adopted; the surface of the nickel layer with the oxidation removed is activated, so that the binding force of the nickel layer of the battery piece is improved; performing pre-dipping treatment on the battery piece to protect the concentration of chemical solution for electroless copper plating and copper cladding; depositing a copper layer on the basis of a nickel layer on the surface of the battery piece by using a chemical plating mode, wherein the thickness of the copper layer is established according to process design, and the thickness control of 1-10 um can be realized; and washing, washing with hot water and drying the cell, and cleaning the surface of the cell, wherein after the process is finished, the manufacturing of the grid line of the solar photovoltaic cell is finished.
While there have been shown and described what are at present considered to be the fundamental principles of the invention and its essential features and advantages, it will be understood by those skilled in the art that the invention is not limited by the embodiments described above, which are merely illustrative of the principles of the invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the invention as defined by the appended claims and their equivalents.
Claims (1)
1. A method for manufacturing a grid line of a solar photovoltaic cell is characterized by comprising the following steps:
the method comprises the following steps: pasting a film on the surface of the battery piece: according to the design of grid lines on the surface of a battery piece, a layer of film is pasted on the surface which does not need to be covered by a metal layer to prepare for subsequent vacuum coating.
Step two: vacuum nickel plating on the surface of the battery piece: the one side of battery piece is anodal, the reverse side is the negative pole, the battery piece is under the sunlight irradiation, can convert light energy into electric energy, form the electric current, after the electric energy conversion, need derive the electric energy of battery piece conversion and collect the utilization, this process is at battery piece surface plating one deck metal level, thereby derive the electric current, specifically fix the battery piece in vacuum coating equipment, cover one deck metallic nickel on the battery piece surface through the mode of vacuum plating, the metal level covers the back of accomplishing, because the cover of membrane, need not cover the place of metal level and take off the back with the membrane, just kept battery piece state itself, battery piece grid line nickel layer thickness is formulated according to process design, can realize 1 ~ 10um thickness control.
Step three: plating copper on the surface of the battery piece: in order to improve the binding force between the grid line of the cell piece and the welding strip, a copper layer needs to be plated on the nickel layer, the binding force between the welding strip and the cell piece is improved, the copper layer is increased in a vacuum coating mode, the phenomenon of metal layer layering can be generated, the binding force is poor, the copper layer is increased in a chemical plating mode, the thickness of the copper layer is controllable, and meanwhile, the binding force of the metal layer and the thickness of the metal layer are uniform, and the process is divided into 5 steps; specifically, the step 1: firstly, carrying out deoxidation treatment on a nickel layer on the surface of a battery piece, wherein the nickel layer is oxidized after contacting with air, and an oxide layer on the surface of the nickel layer needs to be removed, and a special oxidizer removing treatment is utilized; step 2: the surface of the nickel layer with the oxidation removed is activated, so that the binding force of the nickel layer of the battery piece is improved; and 3, step 3: performing pre-dipping treatment on the battery piece to protect the concentration of chemical solution for electroless copper plating and copper cladding; and 4, step 4: depositing a copper layer on the basis of a nickel layer on the surface of the battery piece by using a chemical plating mode, wherein the thickness of the copper layer is established according to process design, and the thickness control of 1-10 um can be realized; and 5, step 5: and washing, washing with hot water and drying the cell, and cleaning the surface of the cell, wherein after the process is finished, the manufacturing of the grid line of the solar photovoltaic cell is finished.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110923462.0A CN113659038A (en) | 2021-08-12 | 2021-08-12 | Method for manufacturing grid line of solar photovoltaic cell |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110923462.0A CN113659038A (en) | 2021-08-12 | 2021-08-12 | Method for manufacturing grid line of solar photovoltaic cell |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113659038A true CN113659038A (en) | 2021-11-16 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110923462.0A Pending CN113659038A (en) | 2021-08-12 | 2021-08-12 | Method for manufacturing grid line of solar photovoltaic cell |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030172969A1 (en) * | 2000-08-14 | 2003-09-18 | Jenson Jens Dahl | Process for depositing metal contacts on a buried grid solar cell and solar cell obtained by the process |
| US20080092947A1 (en) * | 2006-10-24 | 2008-04-24 | Applied Materials, Inc. | Pulse plating of a low stress film on a solar cell substrate |
| DE102011086302A1 (en) * | 2011-11-14 | 2013-05-16 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for producing contact grid on surface of e.g. photovoltaic solar cell for converting incident electromagnetic radiation into electrical energy, involves electrochemically metalizing contact region with metal, which is not aluminum |
| CN104538495A (en) * | 2014-12-25 | 2015-04-22 | 新奥光伏能源有限公司 | Silicon heterojunction solar cell with electroplating electrode and manufacturing method thereof |
| CN110190140A (en) * | 2019-05-30 | 2019-08-30 | 江苏欧达丰新能源科技发展有限公司 | The method that soluble mask vacuum plating prepares photovoltaic cell gate line electrode |
-
2021
- 2021-08-12 CN CN202110923462.0A patent/CN113659038A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030172969A1 (en) * | 2000-08-14 | 2003-09-18 | Jenson Jens Dahl | Process for depositing metal contacts on a buried grid solar cell and solar cell obtained by the process |
| US20080092947A1 (en) * | 2006-10-24 | 2008-04-24 | Applied Materials, Inc. | Pulse plating of a low stress film on a solar cell substrate |
| DE102011086302A1 (en) * | 2011-11-14 | 2013-05-16 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for producing contact grid on surface of e.g. photovoltaic solar cell for converting incident electromagnetic radiation into electrical energy, involves electrochemically metalizing contact region with metal, which is not aluminum |
| CN104538495A (en) * | 2014-12-25 | 2015-04-22 | 新奥光伏能源有限公司 | Silicon heterojunction solar cell with electroplating electrode and manufacturing method thereof |
| CN110190140A (en) * | 2019-05-30 | 2019-08-30 | 江苏欧达丰新能源科技发展有限公司 | The method that soluble mask vacuum plating prepares photovoltaic cell gate line electrode |
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