CN113649773A - Preparation method of large-size panel aluminum target - Google Patents
Preparation method of large-size panel aluminum target Download PDFInfo
- Publication number
- CN113649773A CN113649773A CN202110979810.6A CN202110979810A CN113649773A CN 113649773 A CN113649773 A CN 113649773A CN 202110979810 A CN202110979810 A CN 202110979810A CN 113649773 A CN113649773 A CN 113649773A
- Authority
- CN
- China
- Prior art keywords
- treatment
- aluminum
- forging
- aluminum target
- sand blasting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23P—METAL-WORKING NOT OTHERWISE PROVIDED FOR; COMBINED OPERATIONS; UNIVERSAL MACHINE TOOLS
- B23P15/00—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass
Abstract
The invention provides a preparation method of a large-size panel aluminum target, which comprises the following steps: sequentially carrying out first forging and stretching treatment, first heat treatment, second forging and stretching treatment, second heat treatment and finish milling treatment on the aluminum blank to obtain an aluminum target; and brazing the aluminum target and the back plate, and sequentially performing polishing treatment and sand blasting treatment to obtain the large-size panel aluminum target. The preparation method effectively improves the performance and the quality of the target material and improves the bonding performance of the aluminum target and the back plate.
Description
Technical Field
The invention belongs to the field of target material manufacturing, relates to a preparation method of a panel aluminum target, and particularly relates to a preparation method of a large-size panel aluminum target.
Background
Sputtering Target Back Plate (BP): metal sputtering targets are materials used as cathodes in sputter deposition techniques. The cathode material is separated from the cathode in the form of molecules, atoms or ions under the impact of positive charged cations in a sputtering machine and is redeposited on the surface of the anode. Since the metal sputtering target is usually a relatively expensive material such as high-purity aluminum, copper, titanium, nickel, tantalum, and noble metal, a relatively common material is often used as the backing plate in the manufacturing process. The back plate has the functions of supporting the target material, cooling, reducing the cost and the like, and common materials comprise aluminum Alloy (ALBP), copper alloy (CUBP) and the like.
Braze (Brazing and Brazing, SB): a welding method using a metal material with a melting point lower than that of a base metal as a brazing filler metal, wetting the base metal with the brazing filler metal, filling a gap between a workpiece interface and the base metal, and mutually diffusing the base metal and the brazing filler metal to form a weld joint. The brazing deformation is small, the joint is smooth and attractive, and the method is suitable for welding components which are precise, complex and composed of different materials. Vacuum brazing is a technique of heating brazing filler metal to weld workpieces in a vacuum brazing furnace in a vacuum state.
CN101564793A discloses a welding method of an aluminum target blank and an aluminum alloy back plate, which comprises the following steps: providing an aluminum target blank and an aluminum alloy back plate; placing the aluminum target blank and the aluminum alloy back plate into a vacuum sheath and conveying the aluminum target blank and the aluminum alloy back plate into welding equipment; performing diffusion welding by adopting a hot isostatic pressing process, and welding the aluminum target blank to the aluminum alloy back plate to form a target assembly; and after welding is finished, air cooling is carried out, the vacuum sheath is removed, and the target assembly is taken out. The method adopts the vacuum sleeve package to realize the isolation of the target material and the back plate from air, effectively prevents the metal surface from being oxidized during welding and reduces the cost of vacuum equipment; on the other hand, diffusion welding is performed by a hot isostatic pressing process, so that the bonding strength between the aluminum target blank and the aluminum alloy backing plate is further improved, and the bending deformation after bonding is small.
CN110666281A discloses a brazing welding method of an aluminum target and a copper-containing backing plate, which comprises the following steps: (1) carrying out infiltration treatment on the welding surface of the aluminum target by using a first welding flux; (2) carrying out infiltration treatment on the welding surface of the copper-containing back plate by using a second welding flux; (3) combining the welding surface of the aluminum target with the welding surface of the copper-containing back plate, and then cooling to obtain a welding part of the aluminum target and the copper-containing back plate; the first solder is Sn-Zn solder, and the second solder is Sn-Ag-Cu solder and/or Sn-Pb-Ag solder.
Disclosure of Invention
In order to solve the technical problems, the application provides a preparation method of a large-size panel aluminum target, which effectively improves the performance and quality of a target material and improves the bonding performance of the aluminum target and a back plate.
In order to achieve the technical scheme, the invention adopts the following technical scheme:
the invention provides a preparation method of a large-size panel aluminum target, which comprises the following steps:
sequentially carrying out first forging and stretching treatment, first heat treatment, second forging and stretching treatment, second heat treatment and finish milling treatment on the aluminum blank to obtain an aluminum target;
and brazing the aluminum target and the back plate, and sequentially performing polishing treatment and sand blasting treatment to obtain the large-size panel aluminum target.
In a preferred embodiment of the present invention, the first forging and drawing process comprises upsetting the aluminum billet to 70 to 75% of the original length and then drawing the aluminum billet to 125 to 130% of the original length.
The material may be upset to 71%, 72%, 73%, 74%, etc. of the original length, and may be drawn to 126%, 127%, 128%, 129%, etc. of the original length, but the material is not limited to the values listed, and other values not listed in the range of the values are also applicable.
Preferably, the temperature of the first forging treatment is 290 to 310 ℃, such as 292 ℃, 295 ℃, 300 ℃, 302 ℃, 305 ℃ or 308 ℃, but is not limited to the recited values, and other values not recited in the numerical range are also applicable.
Preferably, the first forging process is repeated at least 2 times, such as 3 times, 4 times, 5 times, or 6 times, but not limited to the recited values, and other values not recited within the range of values are equally applicable.
In a preferred embodiment of the present invention, the temperature of the first heat treatment is 290 to 310 ℃, for example 292 ℃, 295 ℃, 300 ℃, 302 ℃, 305 ℃, or 308 ℃, but is not limited to the above-mentioned values, and other values not shown in the above-mentioned range are also applicable.
Preferably, the first heat treatment time is 55-65 min, such as 56min, 57min, 58min, 59min, 60min, 61min, 62min, 63min or 64min, but not limited to the recited values, and other values not recited in the range of the recited values are also applicable.
In the invention, the blank does not need to be cooled after the first heat treatment, and the second forging and stretching treatment can be directly carried out while maintaining the temperature of the blank.
In a preferred embodiment of the present invention, the second forging and stretching process is to upset the aluminum billet to 70 to 75% of the original length and then to lengthen 125 to 130% of the original length.
The material may be upset to 71%, 72%, 73%, 74%, etc. of the original length, and may be drawn to 126%, 127%, 128%, 129%, etc. of the original length, but the material is not limited to the values listed, and other values not listed in the range of the values are also applicable.
Preferably, the temperature of the second forging treatment is 290 to 310 ℃, such as 292 ℃, 295 ℃, 300 ℃, 302 ℃, 305 ℃ or 308 ℃, but is not limited to the recited values, and other values not recited in the numerical range are also applicable.
Preferably, the second forging process is repeated at least 2 times, such as 3 times, 4 times, 5 times, or 6 times, but not limited to the recited values, and other values not recited within the range of values are equally applicable.
In the present invention, after the second forging and stretching treatment, if the surface of the billet is uneven, hot rolling leveling may be performed first and then the second heat treatment may be performed.
In a preferred embodiment of the present invention, the temperature of the second heat treatment is 145 to 155 ℃, for example, 146 ℃, 147 ℃, 148 ℃, 149 ℃, 150 ℃, 151 ℃, 152 ℃, 153 ℃ or 154 ℃, but is not limited to the recited values, and other values not recited in the range of the values are also applicable.
Preferably, the time of the second heat treatment is 10 to 20min, such as 11min, 12min, 13min, 14min, 15min, 16min, 17min, 18min or 19min, but is not limited to the recited values, and other values not recited in the range of the recited values are also applicable.
In the invention, the sputtering surface, the welding surface and the appearance of the aluminum target can be roughly milled before the finish milling treatment.
As a preferable embodiment of the present invention, the finish milling process includes finish milling the welding surface, the sputtering surface, the outer shape, and the R-angle of the aluminum target.
In the invention, after the finish milling treatment, the sputtering surface can be polished by using sand paper.
In a preferred embodiment of the present invention, the brazing temperature is 200 to 220 ℃, for example, 202 ℃, 205 ℃, 208 ℃, 210 ℃, 212 ℃, 215 ℃ or 218 ℃, but the brazing temperature is not limited to the above-mentioned values, and other values not shown in the above-mentioned range are also applicable.
Preferably, the brazing provides a bonding layer having a thickness of 0.25 to 0.5mm, such as 0.3mm, 0.35mm, 0.4mm or 0.45mm, but not limited to the recited values, and other values not recited within the recited values are equally applicable.
In the present invention, the brazing method used is preferably indium welding, which is a method known in the art, and the specific method of indium welding is not particularly limited herein.
In the invention, after brazing treatment, the curvature correction can be carried out on the panel aluminum target, and the specific curvature is as follows: the length direction is (-2, +1.5) mm, the width direction is (-0.5, +0.5) mm, and the detection is carried out in a shape of Chinese character mi.
As a preferable technical scheme of the invention, drying treatment is carried out before polishing.
Preferably, the temperature of the drying treatment is 70 to 90 ℃, such as 72 ℃, 75 ℃, 78 ℃, 80 ℃, 82 ℃, 85 ℃ or 88 ℃, but not limited to the recited values, and other values not recited in the range of the values are also applicable.
Preferably, the drying time is 30-60 min, such as 35min, 40min, 45min, 50min or 55min, but not limited to the recited values, and other values not recited in the range of the values are also applicable.
Preferably, the roughness Ra of the sputtering surface after the polishing treatment is 0.2 to 0.8 μm, such as 0.3 μm, 0.4 μm, 0.5 μm, 0.6 μm, or 0.7 μm, but is not limited to the recited values, and other values not recited in the numerical range are also applicable.
In a preferred embodiment of the present invention, the roughness Ra of the back plate after the sand blasting is 5 to 10 μm, such as 5.5 μm, 6 μm, 6.5 μm, 7 μm, 7.5 μm, 8 μm, 8.5 μm, 9 μm, or 9.5 μm, but is not limited to the above-mentioned values, and other values not listed in the above-mentioned range are also applicable.
Preferably, the roughness Ra of the aluminum target after sand blasting is less than or equal to 3.2 μm, such as 0.5 μm, 1.0 μm, 1.5 μm, 2.0 μm, 2.5 μm, or 3.0 μm, but is not limited to the recited values, and other values not recited in the numerical range are also applicable.
Preferably, the air pressure of the sand blasting treatment is 4-5 kg/cm2G, e.g. 4.1kg/cm2G、4.2kg/cm2G、4.3kg/cm2G、4.4kg/cm2G、4.5kg/cm2G、4.6kg/cm2G、4.7kg/cm2G、4.8kg/cm2G or 4.9kg/cm2G, etc., but are not limited to the recited values, and other values not recited within the numerical range are also applicable.
Preferably, the distance between the blasting device and the backing plate or the aluminum target in the blasting process is 300-400 mm, such as 310mm, 320mm, 330mm, 340mm, 350mm, 360mm, 370mm, 380mm or 390mm, but not limited to the values listed, and other values not listed in the range of the values are also applicable.
As a preferred technical solution of the present invention, the method for preparing the large-size panel aluminum target comprises:
sequentially carrying out first forging and stretching treatment on the aluminum blank, wherein the first forging and stretching treatment method comprises the steps of upsetting the aluminum blank to 70-75% of the original length, drawing the aluminum blank to 125-130% of the original length at 290-310 ℃, and repeating for at least 2 times;
performing first heat treatment, wherein the temperature of the first heat treatment is 290-310 ℃, and the time is 55-65 min;
second forging and stretching treatment, wherein the second forging and stretching treatment comprises the steps of upsetting the aluminum blank to 70-75% of the original length, drawing the aluminum blank to 125-130% of the original length at 290-310 ℃, and repeating for at least 2 times;
performing second heat treatment, wherein the temperature of the second heat treatment is 145-155 ℃, and the time is 10-20 min;
performing finish milling treatment, wherein the finish milling treatment comprises the step of performing finish milling on a welding surface, a sputtering surface, the shape and an R angle of the aluminum target to obtain the aluminum target;
carrying out brazing treatment on the aluminum target and the back plate, wherein the brazing temperature is 200-220 ℃, and the thickness of the bonding layer obtained by brazing is 0.25-0.5 mm;
drying at 70-90 ℃ for 30-60 min;
and sequentially carrying out polishing treatment and sand blasting treatment, wherein the roughness Ra of the sputtering surface after the polishing treatment is 0.2-0.8 mu m, the roughness Ra of the backboard after the sand blasting treatment is 5-10 mu m, the roughness Ra of the aluminum target after the sand blasting treatment is less than or equal to 3.2 mu m, and the air pressure of the sand blasting treatment is 4-5 kg/cm2G, the distance between the sand blasting device and the back plate or the aluminum target is 300-400 mm in the sand blasting process, and the large-size panel aluminum target is obtained.
Compared with the prior art, the invention has at least the following beneficial effects:
the application provides a preparation method of a large-size panel aluminum target, which effectively improves the performance and quality of a target material and improves the bonding performance of the aluminum target and a back plate.
Detailed Description
For the purpose of facilitating an understanding of the present invention, the present invention will now be described by way of examples. It should be understood by those skilled in the art that the examples are only for the understanding of the present invention and should not be construed as the specific limitations of the present invention.
Example 1
The embodiment provides a preparation method of a large-size panel aluminum target, which comprises the following steps:
sequentially carrying out first forging and stretching treatment on the aluminum blank, wherein the first forging and stretching treatment method comprises the steps of upsetting the aluminum blank to 70% of the original length, drawing the aluminum blank to 125% of the original length, controlling the temperature to be 310 ℃, and repeating for 2 times;
a first heat treatment, wherein the temperature of the first heat treatment is 310 ℃, and the time is 55 min;
second forging and stretching treatment, wherein the second forging and stretching treatment comprises the steps of upsetting the aluminum blank to 70% of the original length, drawing the aluminum blank to 125% of the original length, controlling the temperature to be 310 ℃, and repeating for 2 times;
performing second heat treatment, wherein the temperature of the second heat treatment is 145 ℃, and the time is 20 min;
performing finish milling treatment, wherein the finish milling treatment comprises the step of performing finish milling on a welding surface, a sputtering surface, the shape and an R angle of the aluminum target to obtain the aluminum target;
carrying out brazing treatment on the aluminum target and the back plate, wherein the brazing temperature is 200 ℃, and the thickness of a bonding layer obtained by brazing is 0.5 mm;
drying at 70 ℃ for 60 min;
and sequentially carrying out polishing treatment and sand blasting treatment, wherein the roughness Ra of the sputtering surface after the polishing treatment is 0.2-0.4 mu m, the roughness Ra of the back plate after the sand blasting treatment is 5-7 mu m, the roughness Ra of the aluminum target after the sand blasting treatment is less than or equal to 1.5 mu m, and the air pressure of the sand blasting treatment is 5kg/cm2G, the distance between the sand blasting device and the back plate or the aluminum target is 400mm in the sand blasting process, and the large-size panel aluminum target is obtained.
Example 2
The embodiment provides a preparation method of a large-size panel aluminum target, which comprises the following steps:
sequentially carrying out first forging and stretching treatment on the aluminum blank, wherein the first forging and stretching treatment method comprises the steps of upsetting the aluminum blank to 75% of the original length, drawing the aluminum blank to 130% of the original length, controlling the temperature to be 290 ℃, and repeating for 3 times;
a first heat treatment, wherein the temperature of the first heat treatment is 290 ℃, and the time is 65 min;
second forging and stretching treatment, wherein the second forging and stretching treatment comprises the steps of upsetting the aluminum blank to 75% of the original length, drawing the aluminum blank to 130% of the original length, controlling the temperature to be 290 ℃, and repeating for 3 times;
performing second heat treatment, wherein the temperature of the second heat treatment is 155 ℃, and the time is 10 min;
performing finish milling treatment, wherein the finish milling treatment comprises the step of performing finish milling on a welding surface, a sputtering surface, the shape and an R angle of the aluminum target to obtain the aluminum target;
carrying out brazing treatment on the aluminum target and the back plate, wherein the brazing temperature is 220 ℃, and the thickness of a bonding layer obtained by brazing is 0.5 mm;
drying at 90 ℃ for 30 min;
and sequentially carrying out polishing treatment and sand blasting treatment, wherein the roughness Ra of the sputtering surface after the polishing treatment is 0.6-0.8 mu m, the roughness Ra of the backboard after the sand blasting treatment is 8-10 mu m, the roughness Ra of the aluminum target after the sand blasting treatment is less than or equal to 3.2 mu m, and the air pressure of the sand blasting treatment is 4kg/cm2G, the distance between the sand blasting device and the back plate or the aluminum target is 300mm in the sand blasting process, and the large-size panel aluminum target is obtained.
Example 3
The embodiment provides a preparation method of a large-size panel aluminum target, which comprises the following steps:
sequentially carrying out first forging and stretching treatment on the aluminum blank, wherein the first forging and stretching treatment is to upset the aluminum blank to 71% of the original length, then draw the aluminum blank to 126% of the original length, control the temperature to be 305 ℃, and repeat for 2 times;
a first heat treatment, wherein the temperature of the first heat treatment is 305 ℃, and the time is 58 min;
performing second forging and stretching treatment, wherein the second forging and stretching treatment comprises the steps of upsetting the aluminum blank to 71% of the original length, drawing the aluminum blank to 126% of the original length, controlling the temperature to be 305 ℃, and repeating for 2 times;
a second heat treatment, wherein the temperature of the second heat treatment is 148 ℃, and the time is 18 min;
performing finish milling treatment, wherein the finish milling treatment comprises the step of performing finish milling on a welding surface, a sputtering surface, the shape and an R angle of the aluminum target to obtain the aluminum target;
carrying out brazing treatment on the aluminum target and the back plate, wherein the brazing temperature is 210 ℃, and the thickness of a bonding layer obtained by brazing is 0.35 mm;
drying at 80 ℃ for 45 min;
and sequentially carrying out polishing treatment and sand blasting treatment, wherein the roughness Ra of the sputtering surface after the polishing treatment is 0.3-0.5 mu m, the roughness Ra of the backboard after the sand blasting treatment is 6-8 mu m, the roughness Ra of the aluminum target after the sand blasting treatment is less than or equal to 2.5 mu m, and the air pressure of the sand blasting treatment is 4.5kg/cm2G, the distance between the sand blasting device and the back plate or the aluminum target is 350mm in the sand blasting process, and the large-size panel aluminum target is obtained.
Example 4
The embodiment provides a preparation method of a large-size panel aluminum target, which comprises the following steps:
sequentially carrying out first forging and stretching treatment on the aluminum blank, wherein the first forging and stretching treatment method comprises the steps of upsetting the aluminum blank to 74% of the original length, drawing the aluminum blank to 129% of the original length, controlling the temperature to be 295 ℃, and repeating for 2 times;
the first heat treatment is carried out at the temperature of 295 ℃ for 63 min;
second forging and stretching treatment, wherein the second forging and stretching treatment comprises the steps of upsetting the aluminum blank to 74% of the original length, drawing the aluminum blank to 129% of the original length, controlling the temperature to 295 ℃, and repeating for 2 times;
a second heat treatment, wherein the temperature of the second heat treatment is 152 ℃, and the time is 12 min;
performing finish milling treatment, wherein the finish milling treatment comprises the step of performing finish milling on a welding surface, a sputtering surface, the shape and an R angle of the aluminum target to obtain the aluminum target;
carrying out brazing treatment on the aluminum target and the back plate, wherein the brazing temperature is 210 ℃, and the thickness of a bonding layer obtained by brazing is 0.35 mm;
drying at 80 ℃ for 45 min;
and sequentially carrying out polishing treatment and sand blasting treatment, wherein the roughness Ra of the sputtering surface after the polishing treatment is 0.3-0.5 mu m, the roughness Ra of the backboard after the sand blasting treatment is 6-8 mu m, the roughness Ra of the aluminum target after the sand blasting treatment is less than or equal to 2.5 mu m, and the air pressure of the sand blasting treatment is 4.5kg/cm2G, the distance between the sand blasting device and the back plate or the aluminum target is 350mm in the sand blasting process, and the large-size panel aluminum target is obtained.
Example 5
The embodiment provides a preparation method of a large-size panel aluminum target, which comprises the following steps:
sequentially carrying out first forging and stretching treatment on the aluminum blank, wherein the first forging and stretching treatment method comprises the steps of upsetting the aluminum blank to 72% of the original length, drawing the aluminum blank to 128% of the original length, controlling the temperature to be 300 ℃, and repeating for 2 times;
performing first heat treatment, wherein the temperature of the first heat treatment is 300 ℃, and the time is 60 min;
second forging and stretching treatment, wherein the second forging and stretching treatment comprises the steps of upsetting the aluminum blank to 72% of the original length, drawing the aluminum blank to 128% of the original length, controlling the temperature to be 300 ℃, and repeating for 2 times;
performing second heat treatment, wherein the temperature of the second heat treatment is 150 ℃, and the time is 15 min;
performing finish milling treatment, wherein the finish milling treatment comprises the step of performing finish milling on a welding surface, a sputtering surface, the shape and an R angle of the aluminum target to obtain the aluminum target;
carrying out brazing treatment on the aluminum target and the back plate, wherein the brazing temperature is 210 ℃, and the thickness of a bonding layer obtained by brazing is 0.35 mm;
drying at 80 ℃ for 45 min;
and sequentially carrying out polishing treatment and sand blasting treatment, wherein the roughness Ra of the sputtering surface after the polishing treatment is 0.3-0.5 mu m, the roughness Ra of the backboard after the sand blasting treatment is 6-8 mu m, the roughness Ra of the aluminum target after the sand blasting treatment is less than or equal to 2.5 mu m, and the air pressure of the sand blasting treatment is 4.5kg/cm2G, the distance between the sand blasting device and the back plate or the aluminum target is 350mm in the sand blasting process, and the large-size panel aluminum target is obtained.
Comparative example 1
This comparative example was the same as example 5 except that the first forging treatment was not performed.
Comparative example 2
This comparative example was the same as example 5 except that the second forging treatment was not performed.
Comparative example 3
This comparative example was identical to example 5 except that the first heat treatment was not performed.
Comparative example 4
This comparative example was identical to example 5 except that the second heat treatment was not performed.
The purity of the aluminum ingots used in examples 1 to 5 and comparative examples 1 to 4 was 99.999%. The brazing method is indium welding, and specifically comprises the following steps: the aluminum target and the oxygen-free copper back plate are well assembled, the temperature of the heating platform is reduced to 200 ℃, the temperature of the furnace is set to 210 ℃, the solder groove is infiltrated by filling the solder with indium solder on the Blank and BP surface, and the melting temperature of the solder is as follows: indium at 150-160 deg.c.
Target material infiltration: scraping the surface solder by using silica gel, wherein the welding surface is uniformly attached by silvery white solder; back plate infiltration: the surface of the area scratched by the ultrasonic head has no bubbles, is silvery white, and has good fluidity. And cooling along with the furnace after welding. And after welding, ensuring that no solder overflows from the welding position.
The welding effect of the backing plate aluminum targets provided by examples 1-5 and comparative examples 1-4 was verified by using the C-SCAN test, the test conditions are shown in Table 1, and the results are shown in Table 2.
TABLE 1
| Detection conditions | Product(s) |
| Probe head | 10MHZ |
| Sensitivity of the device | 36dB |
| Acoustic velocity of material | 4000m/s |
| Distance to water | 85.38mm |
| Distance between X-axis | 0.2mm |
| Distance between Y-axis | 0.2mm |
| Scanning speed | 100mm/s |
| Scanning range | / |
| Scanning direction | Y-X |
| Threshold value | TH＝60 |
TABLE 2
| Overall binding rate/%) | Single defect rate/%) | |
| Example 1 | 96.8 | 1.5 |
| Example 2 | 98.2 | 1.0 |
| Example 3 | 97.6 | 1.2 |
| Example 4 | 97.9 | 1.1 |
| Example 5 | 97.8 | 1.1 |
| Comparative example 1 | 91.3 | 2.5 |
| Comparative example 2 | 91.6 | 2.2 |
| Comparative example 3 | 92.5 | 2.0 |
| Comparative example 4 | 92.6 | 1.9 |
As can be seen from the test results in table 1, the aluminum targets provided in examples 1 to 5 have excellent bonding rate with the backing plate, and the bonding rate can reach more than 96.5%. Comparative examples 1 and 2, which were not subjected to the first forging treatment and the second forging treatment, respectively, resulted in a decrease in the weld bonding rate of the aluminum target to the backing plate due to the absence of a limited plastic treatment of the aluminum blank as compared to example 5. In contrast, comparative examples 3 and 4 were subjected to a defined heat treatment compared to example 5, which likewise leads to a reduction in comparison to example 5.
The applicant states that the present invention is illustrated by the above examples to show the detailed process equipment and process flow of the present invention, but the present invention is not limited to the above detailed process equipment and process flow, i.e. it does not mean that the present invention must rely on the above detailed process equipment and process flow to be implemented. It should be understood by those skilled in the art that any modification of the present invention, equivalent substitutions of the raw materials of the product of the present invention, addition of auxiliary components, selection of specific modes, etc., are within the scope and disclosure of the present invention.
Claims (10)
1. A preparation method of a large-size panel aluminum target is characterized by comprising the following steps:
sequentially carrying out first forging and stretching treatment, first heat treatment, second forging and stretching treatment, second heat treatment and finish milling treatment on the aluminum blank to obtain an aluminum target;
and brazing the aluminum target and the back plate, and sequentially performing polishing treatment and sand blasting treatment to obtain the large-size panel aluminum target.
2. The method of claim 1, wherein the first forging and drawing process comprises upsetting the aluminum billet to 70-75% of the original length and drawing the aluminum billet to 125-130% of the original length;
preferably, the temperature of the first forging and stretching treatment is 290-310 ℃;
preferably, the first forging process is repeated at least 2 times.
3. The method according to claim 1 or 2, wherein the temperature of the first heat treatment is 290 to 310 ℃;
preferably, the time of the first heat treatment is 55-65 min.
4. The production method according to any one of claims 1 to 3, wherein the second forging treatment is to upset the aluminum billet to 70 to 75% of the original length and then to draw up to 125 to 130% of the original length;
preferably, the temperature of the second forging and stretching treatment is 290-310 ℃;
preferably, the second forging process is repeated at least 2 times.
5. The method according to any one of claims 1 to 4, wherein the temperature of the second heat treatment is 145 to 155 ℃;
preferably, the time of the second heat treatment is 10-20 min.
6. The production method according to any one of claims 1 to 5, wherein the finish-milling treatment includes finish-milling of a welding face, a sputtering face, a profile, and an R-angle of the aluminum target.
7. The method according to any one of claims 1 to 6, wherein the brazing temperature is 200 to 220 ℃;
preferably, the thickness of the bonding layer obtained by brazing is 0.25-0.5 mm.
8. The production method according to any one of claims 1 to 7, wherein a drying treatment is performed before the polishing;
preferably, the temperature of the drying treatment is 70-90 ℃;
preferably, the drying time is 30-60 min;
preferably, the roughness Ra of the sputtering surface after the polishing treatment is 0.2-0.8 μm.
9. The production method according to any one of claims 1 to 8, wherein the roughness Ra of the sandblasted back sheet is 5 to 10 μm;
preferably, the roughness Ra of the aluminum target after sand blasting treatment is less than or equal to 3.2 mu m;
preferably, the air pressure of the sand blasting treatment is 4-5 kg/cm2G；
Preferably, the distance between the sand blasting device and the back plate or the aluminum target in the sand blasting process is 300-400 mm.
10. The production method according to any one of claims 1 to 9, characterized by comprising:
sequentially carrying out first forging and stretching treatment on the aluminum blank, wherein the first forging and stretching treatment method comprises the steps of upsetting the aluminum blank to 70-75% of the original length, drawing the aluminum blank to 125-130% of the original length at 290-310 ℃, and repeating for at least 2 times;
performing first heat treatment, wherein the temperature of the first heat treatment is 290-310 ℃, and the time is 55-65 min;
second forging and stretching treatment, wherein the second forging and stretching treatment comprises the steps of upsetting the aluminum blank to 70-75% of the original length, drawing the aluminum blank to 125-130% of the original length at 290-310 ℃, and repeating for at least 2 times;
performing second heat treatment, wherein the temperature of the second heat treatment is 145-155 ℃, and the time is 10-20 min;
performing finish milling treatment, wherein the finish milling treatment comprises the step of performing finish milling on a welding surface, a sputtering surface, the shape and an R angle of the aluminum target to obtain the aluminum target;
carrying out brazing treatment on the aluminum target and the back plate, wherein the brazing temperature is 200-220 ℃, and the thickness of the bonding layer obtained by brazing is 0.25-0.5 mm;
drying at 70-90 ℃ for 30-60 min;
and sequentially carrying out polishing treatment and sand blasting treatment, wherein the roughness Ra of the sputtering surface after the polishing treatment is 0.2-0.8 mu m, the roughness Ra of the backboard after the sand blasting treatment is 5-10 mu m, and the backboard after the sand blasting treatment isThe roughness Ra of the aluminum target is less than or equal to 3.2 mu m, and the air pressure of the sand blasting treatment is 4-5 kg/cm2G, the distance between the sand blasting device and the back plate or the aluminum target is 300-400 mm in the sand blasting process, and the large-size panel aluminum target is obtained.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110979810.6A CN113649773B (en) | 2021-08-25 | 2021-08-25 | Preparation method of large-size panel aluminum target |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110979810.6A CN113649773B (en) | 2021-08-25 | 2021-08-25 | Preparation method of large-size panel aluminum target |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113649773A true CN113649773A (en) | 2021-11-16 |
| CN113649773B CN113649773B (en) | 2022-09-27 |
Family
ID=78492803
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110979810.6A Active CN113649773B (en) | 2021-08-25 | 2021-08-25 | Preparation method of large-size panel aluminum target |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113649773B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114750079A (en) * | 2022-04-24 | 2022-07-15 | 广东江丰电子材料有限公司 | Preparation method of target material assembly |
| CN116732479A (en) * | 2023-07-28 | 2023-09-12 | 宁波江丰电子材料股份有限公司 | Manufacturing method of integrated high-purity aluminum target for LCD |
Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6698647B1 (en) * | 2000-03-10 | 2004-03-02 | Honeywell International Inc. | Aluminum-comprising target/backing plate structures |
| CN101564793A (en) * | 2009-04-17 | 2009-10-28 | 宁波江丰电子材料有限公司 | Welding method of aluminum target blank and aluminum alloy backboard |
| CN105624622A (en) * | 2014-11-26 | 2016-06-01 | 宁波江丰电子材料股份有限公司 | Manufacturing method of target assembly |
| CN107755837A (en) * | 2016-08-18 | 2018-03-06 | 宁波江丰电子材料股份有限公司 | The manufacture method of target material assembly |
| CN111088481A (en) * | 2018-10-23 | 2020-05-01 | 宁波江丰电子材料股份有限公司 | Nickel target blank and method for manufacturing target material |
| CN112059349A (en) * | 2020-08-31 | 2020-12-11 | 宁波江丰电子材料股份有限公司 | Welding method of titanium target and copper back plate |
| CN112779508A (en) * | 2020-12-28 | 2021-05-11 | 宁波江丰电子材料股份有限公司 | Preparation method of high-purity vanadium target blank and high-purity vanadium target prepared by using same |
| CN112975102A (en) * | 2021-03-04 | 2021-06-18 | 宁波江丰电子材料股份有限公司 | Diffusion welding method for cobalt target and copper back plate |
| CN113025972A (en) * | 2021-03-01 | 2021-06-25 | 宁波江丰电子材料股份有限公司 | Manufacturing method of aluminum target material |
| CN113061853A (en) * | 2021-03-17 | 2021-07-02 | 宁波江丰电子材料股份有限公司 | High-purity aluminum or aluminum alloy target material and preparation method and application thereof |
| CN113061852A (en) * | 2021-03-17 | 2021-07-02 | 宁波江丰电子材料股份有限公司 | High-purity aluminum or aluminum alloy target material and preparation method thereof |
-
2021
- 2021-08-25 CN CN202110979810.6A patent/CN113649773B/en active Active
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6698647B1 (en) * | 2000-03-10 | 2004-03-02 | Honeywell International Inc. | Aluminum-comprising target/backing plate structures |
| CN101564793A (en) * | 2009-04-17 | 2009-10-28 | 宁波江丰电子材料有限公司 | Welding method of aluminum target blank and aluminum alloy backboard |
| CN105624622A (en) * | 2014-11-26 | 2016-06-01 | 宁波江丰电子材料股份有限公司 | Manufacturing method of target assembly |
| CN107755837A (en) * | 2016-08-18 | 2018-03-06 | 宁波江丰电子材料股份有限公司 | The manufacture method of target material assembly |
| CN111088481A (en) * | 2018-10-23 | 2020-05-01 | 宁波江丰电子材料股份有限公司 | Nickel target blank and method for manufacturing target material |
| CN112059349A (en) * | 2020-08-31 | 2020-12-11 | 宁波江丰电子材料股份有限公司 | Welding method of titanium target and copper back plate |
| CN112779508A (en) * | 2020-12-28 | 2021-05-11 | 宁波江丰电子材料股份有限公司 | Preparation method of high-purity vanadium target blank and high-purity vanadium target prepared by using same |
| CN113025972A (en) * | 2021-03-01 | 2021-06-25 | 宁波江丰电子材料股份有限公司 | Manufacturing method of aluminum target material |
| CN112975102A (en) * | 2021-03-04 | 2021-06-18 | 宁波江丰电子材料股份有限公司 | Diffusion welding method for cobalt target and copper back plate |
| CN113061853A (en) * | 2021-03-17 | 2021-07-02 | 宁波江丰电子材料股份有限公司 | High-purity aluminum or aluminum alloy target material and preparation method and application thereof |
| CN113061852A (en) * | 2021-03-17 | 2021-07-02 | 宁波江丰电子材料股份有限公司 | High-purity aluminum or aluminum alloy target material and preparation method thereof |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114750079A (en) * | 2022-04-24 | 2022-07-15 | 广东江丰电子材料有限公司 | Preparation method of target material assembly |
| CN116732479A (en) * | 2023-07-28 | 2023-09-12 | 宁波江丰电子材料股份有限公司 | Manufacturing method of integrated high-purity aluminum target for LCD |
Also Published As
| Publication number | Publication date |
|---|---|
| CN113649773B (en) | 2022-09-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN113649773B (en) | Preparation method of large-size panel aluminum target | |
| CN103009000B (en) | Niobium target and preparation method of niobium target | |
| CN105107841B (en) | The preparation method of titanium steel composite board | |
| AU2019303619B2 (en) | Corner-thickened cold/hot composite formation square/rectangular steel pipe and preparation method therefor | |
| CN109290371B (en) | Cold rolling manufacturing method of copper-aluminum composite plate strip | |
| CN113319539A (en) | Preparation method of molybdenum target of large-size panel | |
| CN111195757A (en) | Brazing method for tantalum target and copper back plate | |
| CN103866245A (en) | Niobium alloy target material and preparation method thereof | |
| CN113652655B (en) | Preparation method of high-purity aluminum target material | |
| CN108465910A (en) | A method of improving silk material electric arc increasing material manufacturing aluminium copper intensity | |
| CN113828881A (en) | Brazing method for polycrystalline silicon target and copper back plate | |
| TWI772313B (en) | Method for manufacturing sputtering target, sputtering target, and assembly for sputtering target manufacturing | |
| CN112811797B (en) | Method for hot bending of plate glass | |
| CN112975295A (en) | Preparation method of niobium target material assembly for semiconductor | |
| CN113042841A (en) | Welding method of strip-shaped titanium target assembly | |
| CN104959783A (en) | Method for improving yield and quality of metal composite materials produced through brazing and rolling method | |
| CN110586823B (en) | Aluminum alloy over-temperature forging method | |
| CN104624642A (en) | Method for rolling large unit-weight and wide molybdenum plates for sputtering target material | |
| CN103692151B (en) | The manufacture method of titanium focusing ring | |
| CN115041767A (en) | Method for binding ITO target and Cu backboard | |
| CN105080998A (en) | Method for preparing no-interlayer titanium steel composite plates | |
| CN113817997A (en) | High-purity alloy aluminum target material and preparation method thereof | |
| CN111069776B (en) | Method for improving welding strength of pure nickel strip and aluminum strip for electronic industry | |
| CN110576161B (en) | Deformation control method for crystallizer copper plate manufactured and remanufactured by laser | |
| CN113667945B (en) | Preparation method of oxygen-free copper backboard with water channel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |