CN1136365A - 涂有干扰膜的电灯 - Google Patents

涂有干扰膜的电灯 Download PDF

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CN1136365A
CN1136365A CN95190975.4A CN95190975A CN1136365A CN 1136365 A CN1136365 A CN 1136365A CN 95190975 A CN95190975 A CN 95190975A CN 1136365 A CN1136365 A CN 1136365A
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film
bulb
tack coat
oxide
light source
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CN1089944C (zh
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G·A·M·马尔达
W·H·M·M·范迪施皮克
C·G·韦泽
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Koninklijke Philips NV
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01K—ELECTRIC INCANDESCENT LAMPS
    • H01K1/00—Details
    • H01K1/28—Envelopes; Vessels
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
    • H01J5/02—Vessels; Containers; Shields associated therewith; Vacuum locks
    • H01J5/08—Vessels; Containers; Shields associated therewith; Vacuum locks provided with coatings on the walls thereof; Selection of materials for the coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/30—Vessels; Containers
    • H01J61/34—Double-wall vessels or containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/38—Devices for influencing the colour or wavelength of the light
    • H01J61/40—Devices for influencing the colour or wavelength of the light by light filters; by coloured coatings in or on the envelope

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)

Abstract

一种电灯，具有石英玻璃灯泡(1)，灯泡内装有光源(2)。灯泡由干扰膜(5)覆盖，后者具有交替排列的氧化硅层(51)和较高折射率的材料层(2)，包含氧化硅的粘结层(53)置于灯泡(1)和膜(5)之间。粘结层含有氧化硼和/或氧化磷。

Description

涂有干扰膜的电灯
本发明涉及一种电灯，此电灯设有石英玻璃灯泡，灯泡内装有光源，光源连接至电流导体，电流导体则从灯泡引出至外部。
灯泡的至少一部分涂有干扰膜，干扰膜包括交替排列的氧化硅层和较高折射率的材料层，并设置于包含氧化硅的粘结层上。
这种电灯可从US-A 5138219中获知。
在这种现有的灯中，较高折射率的层由氧化钽制成。不过，这些层也可根据US-A4734614由氧化铌构成，或根据US-A4775203由氧化钛构成。另外，这些层还可根据US-A4940636由88-95mole(摩尔)％TiO2和5-12mole％ZrO2构成，或88-95mole％TiO2和5-12mole％HfO2或TiO2·ZrO2、TiO2HfO2、TiO2·Nb2O5、TiO2·Ta2O5或Ta2O5·2TiO2构成。
在灯泡上涂有干扰膜的灯中存在一个缺点，即，膜要经受剧烈变化的温度。事实上，与膜采用的材料和制造膜的方法无关，在膜中必将有应力存在，因为在衬底、灯泡和所述的多个层之间存在膨胀系数的差异。
在有利的情况下，例如在膜上有较低的热负载的情况下，这些应力仅会导致细小的裂纹，从而形成细纹图形。但是，存在一种危险，即，裂纹继续延伸至衬底，膜的多个部分与灯泡的表层粉片一起脱落。膜的效率由此而降低，且受损坏的灯泡的强度变小。
为克服现有灯中存在的这种缺点已做了多种尝试，即，在灯泡上淀积膜时设置一个氧化硅层作为中间层，此氧化硅层是以与制备膜相同的技术一低压化学汽相淀积(LPCVD)形成的。由于其厚度约为50nm而无明显的光学效果的粘结层，此后以与衬底相同的材料制成，因而具有与膜中的氧化硅层相同的非光学物理特性。但是，业已发现，膜粉片状脱落的危险并未有效消除。
从IEEE会志A第140卷第6号第417-428页尤其是第427页(1993年11月)中得知，由LPCVD制备的掺杂有氧化硼和/或氧化磷的氧化硅层可降低膜中的应力。掺杂物降低了二氧化硅的粘度。但是，带有任一种或这两种杂质的二氧化硅是吸水的。这意味着，在灯不工作时吸收的湿汽会在各层中引起相分离。这对膜是有害的，会降低其稳定性并增大其光散射效应。
本发明的目的是要提供一种在起始段中所述的类型的电灯，该灯的干扰膜具有改善的粘结性和稳定性。
根据本发明，这一目的是这样实现的：粘结层还包含从氧化硼和氧化磷中选出的一种氧化物。业已发现，根据本发明的电灯的干扰膜，在灯的使用寿命期间能高度地保持其初始特性。
干扰膜的粘结层被包复于衬底和膜之间，这样，来自外界的湿汽在到达粘结层的过程中受到阻挡，因此掺杂的氧化硅的吸湿特性不能或基本上不会表现出来。此外，粘结层可以较薄，而且与现有膜不同，并非膜的每一氧化硅层均需掺杂。这意味着，如果湿汽确实能影响粘结层，其光学效果将是不重要的。
根据本发明的灯中的干扰膜借助于低粘度的粘结层附着于衬底即灯泡上，这足以克服膜的粉片状脱落缺陷。还可以避免膜中的裂纹，这些裂纹会导致延续至衬底的细纹图形。
灯的光源可以是例如处于含卤素的气体中的白炽体，但也可以是处于可电离气体中的一对电极，这里所说的可电离气体例如是含金属卤化物的稀有气体，同时可能含有例如汞之类的缓冲气体。光源可由一个内气密壳体包围。还可能设有围绕灯泡的外壳体。
干扰膜可以是透射光和反射IR(红外)线的。在这种情况下，膜层较厚，其光学厚度，即折射率与物理厚度的乘积，等于光谱的IR区的四分之一波长。但是，膜也可以是反射UV(紫外)线和透射(可见)光的，或反之。膜还可以是带通膜，它仅透射可见光的一部分，而不透射光谱的其他部分。业已发现，在具有较厚层的红外反射膜的情况下，以及当较多层组成为叠置结构而使干扰膜具有例如3.5-4μm的较大厚度时，膜均能保持其有益的特性。
干扰膜可按常规方式制备，粘结层也是如此，例如，以浸渍方式或以LPCVD、PVD(等离子体增强CVD)或溅射方式制备。
业已发现，几十nm例如50nm的粘结层已是很令人满意的。粘结层的掺杂水平不应超过百分之几的重量，因此这个层中的硅含量仍较高，例如95-98％(按重量计)。不过，掺杂物可容易地通过扫描俄歇显微术来监控。
根据本发明的电灯的一个实施例展示于附图中，其中：
图1从侧面示出一种白炽型电灯；
图2示出图1的细节。
在图1中，该电灯具有石英玻璃灯泡1，灯泡1中装有用作光源2的白炽体。电流导体3连接至光源2并从灯泡引出至外部。灯泡内填充有含卤素例如溴化氢的气体。灯泡的至少一部分涂有干扰膜5，干扰膜5包括交替排列的氧化硅层51和较高折射率的材料层52，它设置于包含氧化硅的粘结层53上(图2)。此干扰膜透射可见光并反射红外线。
粘结层53还包含从氧化硼和氧化磷中选出的一种氧化物。
灯泡1安装在外壳4内，外壳4支撑灯头5，电流导体3电连接至此灯头5。
图中所示的灯是一种60W交流电压供电灯，其额定寿命为约2000h。此灯设有通过LPCVD制备的粘结层和设在粘结层上的干扰膜，后者根据表1构成。
粘结层具有约50nm的厚度，它包含按氧化物计算约3％的硼(重量)。此粘结层是通过三甲基硼酸盐、双乙酸基-二-丁氧基硅烷(diacetoxy-di-t-butoxysilane)和氧的混合物的热解得到的。在制造掺杂氧化磷的层时，例如，可采用磷化氢、双乙酸基-二-丁氧基硅烷和氧的混合物。膜中的纯氧化硅层是由相同的硅烷获得的。较高折射率的层由氧化钽构成，它是由五乙氧基钽(penta-ethoxytantalum)获得的。
在灯的使用寿命内，干扰膜保持完好无损并维持其初始特性。
               表1
    层     SiO2(nm)     Ta2O5(nm)
    空气
    1     85.9
    2     125.1
    3     35.0
    4     19.2
    5     193.1
    6     14.7
    7     22.7
    8     126.6
    9     31.4
    10     21.7
    11     211.8
    12     24.0
    13     21.7
    14     172.9
    15     19.6
    16     27.4
    17     208.5
    18     24.0
    19     28.6
    20     123.7
    21     11.8
    22     16.7
    23     171.7
    24     28.3
    25     11.0
    26     105.2
    27     18.4
    28     33.5
    29     182.1
    30     109.1
    31     170.5
    32     31.6
    33     9.1
    34     121.3
    35     11.9
    36     31.4
    37     165.1
    38     98.2
    39     145.7
    40     95.3
    41     143.3
    42     95.2
    43     154.2
    44     102.9
    45     50*
    衬底
*SiO2中含有3％(重量)的B2O3。

Claims (3)

1.一种电灯，设有石英玻璃灯泡(1)，灯泡中安装有光源(2)，光源连接至电流导体(3)，电流导体(3)从灯泡引出至外部，
灯泡的至少一部分涂有干扰膜(5)，干扰膜(5)包括交替排列的氧化硅层(51)和较高折射率的材料层(52)，干扰膜设置在包含氧化硅的粘结层(53)上，
其特征在于，粘结层(53)还含有从氧化硼和氧化磷中选出的一种氧化物。
2.根据权利要求1的电灯，其特征在于，粘结层具有按重量计95-98％的氧化硅。
3.根据权利要求1的电灯，其特征在于，光源(2)为白炽体，干扰膜(5)透射可见光并反射红外线。
CN95190975A 1994-08-22 1995-08-16 涂有干扰膜的电灯 Expired - Fee Related CN1089944C (zh)

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JP3145309B2 (ja) * 1996-06-12 2001-03-12 富士通株式会社 平面表示装置及びプラズマディスプレイパネルの近赤外線放出影響防止方法
US7196471B2 (en) 1996-06-12 2007-03-27 Fujitsu Limited Flat display device
US6356020B1 (en) * 1998-07-06 2002-03-12 U.S. Philips Corporation Electric lamp with optical interference coating
US6710520B1 (en) 2000-08-24 2004-03-23 General Electric Company Stress relief mechanism for optical interference coatings
JP4174216B2 (ja) * 2002-01-18 2008-10-29 フジノン株式会社 バリア層を有する光学素子、光学系および投映プロジェクタ装置
ITTO20020090A1 (it) * 2002-02-01 2003-08-01 C R F Societa Con Sortile Per Dispositivo di illuminazione.
WO2004086105A2 (en) * 2003-03-24 2004-10-07 Philips Intellectual Property & Standards Gmbh Lamp
ES2301048T3 (es) * 2004-09-06 2008-06-16 Koninklijke Philips Electronics N.V. Lampara electrica y pelicula de interferencia.
US8035285B2 (en) * 2009-07-08 2011-10-11 General Electric Company Hybrid interference coatings, lamps, and methods

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JPS61101949A (ja) * 1984-10-24 1986-05-20 東芝ライテック株式会社 電球
NL191813C (nl) * 1985-06-11 1996-08-02 Philips Electronics Nv Elektrische lamp voorzien van een interferentiefilter.
JPH07109758B2 (ja) * 1985-10-31 1995-11-22 東芝ライテック株式会社 管 球
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ES2077562T3 (es) * 1987-07-22 1995-12-01 Philips Electronics Nv Filtro de interferencia optico.
CA2017471C (en) * 1989-07-19 2000-10-24 Matthew Eric Krisl Optical interference coatings and lamps using same

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CN1089944C (zh) 2002-08-28
DE69529270D1 (de) 2003-02-06
US5680001A (en) 1997-10-21
EP0724772A1 (en) 1996-08-07
DE69529270T2 (de) 2003-10-09
WO1996006453A1 (en) 1996-02-29

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