CN113614647A - 抗蚀剂剥离液 - Google Patents

抗蚀剂剥离液 Download PDF

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Publication number
CN113614647A
CN113614647A CN201980094569.XA CN201980094569A CN113614647A CN 113614647 A CN113614647 A CN 113614647A CN 201980094569 A CN201980094569 A CN 201980094569A CN 113614647 A CN113614647 A CN 113614647A
Authority
CN
China
Prior art keywords
resist stripping
stage
resist
stripping solution
mass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201980094569.XA
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English (en)
Chinese (zh)
Inventor
渊上真一郎
鬼头佑典
小池至人
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Intellectual Property Management Co Ltd
Original Assignee
Panasonic Intellectual Property Management Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Intellectual Property Management Co Ltd filed Critical Panasonic Intellectual Property Management Co Ltd
Publication of CN113614647A publication Critical patent/CN113614647A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
CN201980094569.XA 2019-03-25 2019-03-25 抗蚀剂剥离液 Pending CN113614647A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/012341 WO2020194420A1 (ja) 2019-03-25 2019-03-25 レジスト剥離液

Publications (1)

Publication Number Publication Date
CN113614647A true CN113614647A (zh) 2021-11-05

Family

ID=70286713

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201980094569.XA Pending CN113614647A (zh) 2019-03-25 2019-03-25 抗蚀剂剥离液

Country Status (4)

Country Link
JP (1) JP6684998B1 (ja)
CN (1) CN113614647A (ja)
TW (1) TWI721833B (ja)
WO (1) WO2020194420A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230091893A1 (en) * 2020-09-22 2023-03-23 Lg Chem, Ltd. Stripper composition for removing photoresist and stripping method of photoresist using the same

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1758144A (zh) * 2004-09-13 2006-04-12 东进世美肯株式会社 光阻剂剥离液组合物
JP2006169553A (ja) * 2004-12-13 2006-06-29 Tosoh Corp 防食用組成物
CN101042543A (zh) * 2006-03-23 2007-09-26 株式会社东进世美肯 用于清洗抗蚀剂脱膜剂的化学清洗组合物
JP2016085378A (ja) * 2014-10-27 2016-05-19 パナソニックＩｐマネジメント株式会社 レジスト剥離液
CN106062637A (zh) * 2014-08-20 2016-10-26 株式会社Lg化学 用于移除光刻胶的剥离剂组合物以及使用其剥离光刻胶的方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3516446B2 (ja) * 2002-04-26 2004-04-05 東京応化工業株式会社 ホトレジスト剥離方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1758144A (zh) * 2004-09-13 2006-04-12 东进世美肯株式会社 光阻剂剥离液组合物
JP2006169553A (ja) * 2004-12-13 2006-06-29 Tosoh Corp 防食用組成物
CN101042543A (zh) * 2006-03-23 2007-09-26 株式会社东进世美肯 用于清洗抗蚀剂脱膜剂的化学清洗组合物
CN106062637A (zh) * 2014-08-20 2016-10-26 株式会社Lg化学 用于移除光刻胶的剥离剂组合物以及使用其剥离光刻胶的方法
JP2016085378A (ja) * 2014-10-27 2016-05-19 パナソニックＩｐマネジメント株式会社 レジスト剥離液

Also Published As

Publication number Publication date
TW202041984A (zh) 2020-11-16
TWI721833B (zh) 2021-03-11
JPWO2020194420A1 (ja) 2021-04-08
WO2020194420A1 (ja) 2020-10-01
JP6684998B1 (ja) 2020-04-22

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Application publication date: 20211105