CN113608283B - Reflection reducing film and display device - Google Patents
Reflection reducing film and display device Download PDFInfo
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- CN113608283B CN113608283B CN202110878540.XA CN202110878540A CN113608283B CN 113608283 B CN113608283 B CN 113608283B CN 202110878540 A CN202110878540 A CN 202110878540A CN 113608283 B CN113608283 B CN 113608283B
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/858—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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Abstract
The application provides an anti-reflection film and a display device, and relates to the technical field of display. The antireflection film includes: a first refractive layer and a second refractive layer; the refractive index of the first refractive layer is larger than that of the second refractive layer, and the lattice mismatch degree of the material in the first refractive layer and the material in the second refractive layer is smaller than or equal to a preset value. The antireflection film has lower reflectivity, can reduce the reflectivity of a film interface in the display device under the condition of not influencing the transmittance, and improves the display effect.
Description
Technical Field
The application relates to the technical field of display, in particular to an antireflection film and a display device.
Background
With the rapid development of display technology, OLED (Organic Light Emitting Device, organic light emitting diode) display products are attracting attention due to their self-luminescence, low power consumption, rapid response, and the like. However, the light-emitting side electrode in the OLED is usually made of a metal material, which has a high reflectivity, and severely reduces the display effect of the OLED display product.
The reflectivity is reduced by providing an anti-reflection film in the OLED display product in the related art, and the anti-reflection film in the related art is used to match different display products by adjusting the thickness and the refractive index of the material in the anti-reflection film, however, the negative effect of the microscopic defects in the anti-reflection film on the optical characteristics is not considered.
At present, a new antireflection film is needed to solve the above problems.
Disclosure of Invention
The embodiment of the application provides an antireflection film and a display device, wherein the antireflection film has lower reflectivity, and can reduce the reflectivity of a film layer interface in the display device without influencing the transmittance, so that the display effect is improved.
In order to achieve the above purpose, the embodiments of the present application adopt the following technical solutions:
in one aspect, an antireflection film is provided, comprising: a first refractive layer and a second refractive layer;
the refractive index of the first refractive layer is larger than that of the second refractive layer, and the lattice mismatch degree of the material in the first refractive layer and the material in the second refractive layer is smaller than or equal to a preset value.
In some embodiments, the preset value ranges from 0.6% to 1%.
In some embodiments, the first refractive layer comprises a first sub-layer and a second sub-layer, the second sub-layer being located between the first sub-layer and the second refractive layer;
wherein the lattice constant value of the material of the second refractive layer is located between the lattice constant values of the materials of the first and second sub-layers.
In some embodiments, the absolute value of the difference in lattice constants between each two of the materials in the first refractive layer and the material in the second refractive layer is in the range of 0-0.08nm.
In some embodiments, the material of the first sub-layer comprises zirconia, the material of the second sub-layer comprises titania, and the material of the second refractive layer comprises silica or magnesium fluoride.
In some embodiments, where the material of the first refractive layer comprises titanium oxide and zirconium oxide, the material of the first refractive layer has a refractive index in the range of 2.11-2.25;
in the case where the material of the second refractive layer includes silicon oxide, the refractive index of the material of the second refractive layer ranges from 1.46 to 1.47;
in the case where the material of the second refractive layer includes magnesium fluoride, the refractive index of the material of the second refractive layer ranges from 1.37 to 1.38.
In some embodiments, the lattice constant of the titanium oxide in the first refractive layer is 0.458nm and the lattice constant of the zirconium oxide in the first refractive layer is 0.511nm.
In some embodiments, where the material of the second refractive layer comprises silicon oxide, the lattice constant of the silicon oxide in the second refractive layer is 0.491nm; in the case where the material of the second refractive layer includes magnesium fluoride, the lattice constant of the magnesium fluoride in the second refractive layer is 0.460nm.
In some embodiments, the first sub-layer has a thickness in the range of 20nm to 60nm, the second sub-layer has a thickness in the range of 10nm to 30nm, and the second refractive layer has a thickness in the range of 70nm to 130nm.
In another aspect, there is provided a display apparatus including: a substrate, and a light emitting device and an antireflection film as described above on the substrate; the antireflection film is positioned on one side of the light-emitting device away from the substrate;
wherein the second refraction layer of the anti-reflection film is positioned at one side of the first refraction layer of the anti-reflection film away from the light emitting device.
Embodiments of the present application provide an antireflection film, a display device, the antireflection film including a first refractive layer and a second refractive layer; the refractive index of the material of the first refractive layer is larger than that of the material of the second refractive layer, and the lattice mismatch degree of the material in the first refractive layer and the material in the second refractive layer is smaller than or equal to a preset value.
According to the antireflection film provided by the embodiment of the application, the refractive index of the material of the first refractive layer is larger than that of the material of the second refractive layer, and the lattice mismatch degree of the material of the first refractive layer and the material of the second refractive layer is smaller than or equal to a preset value. Because the lattice mismatch degree of the materials of the first refraction layer and the second refraction layer is smaller, the probability of dislocation of the crystal material near the interface position of the two adjacent film layers is very small, so that the internal microscopic defect existing in the crystal material near the interface of the first refraction layer and the second refraction layer is improved to a great extent, and the effect of reducing the reflectivity of the antireflection film is improved.
Drawings
In order to more clearly illustrate the embodiments of the present application or the technical solutions in the related art, the drawings that are required to be used in the embodiments or the description of the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and other drawings may be obtained according to these drawings without inventive effort to a person having ordinary skill in the art.
Fig. 1 is a schematic structural diagram of an antireflection film according to an embodiment of the present disclosure;
fig. 2 is a schematic structural diagram of a display device according to an embodiment of the present application;
FIG. 3 is a refractive index profile provided by an embodiment of the present application;
FIG. 4 is a graph of reflectivity of a display device according to an embodiment of the present application;
FIG. 5 is a graph of reflectance of another display device according to an embodiment of the present application;
fig. 6 is a schematic diagram of a light refraction path according to an embodiment of the present application.
Detailed Description
The following description of the embodiments of the present application will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are only some, but not all, of the embodiments of the present application. All other embodiments, which can be made by one of ordinary skill in the art without undue burden from the present disclosure, are within the scope of the present disclosure.
In the embodiments of the present application, unless otherwise indicated, the terms "upper" and the like indicate an orientation or a positional relationship based on that shown in the drawings, and are merely for convenience of description and simplification of the description, and do not indicate or imply that the structures or elements referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present application.
In order to clearly describe the technical solutions of the embodiments of the present application, in the embodiments of the present application, the terms "first", "second", etc. are used to distinguish the same item or similar items having substantially the same function and effect, and those skilled in the art will understand that the terms "first", "second", etc. do not limit the numbers.
Throughout the specification and claims, the term "comprising" is to be interpreted as an open, inclusive meaning, i.e. "comprising, but not limited to, unless the context requires otherwise. In the description of the present specification, the terms "one embodiment," "some embodiments," "example embodiments," "examples," "particular examples," or "some examples," etc., are intended to indicate that a particular feature, structure, material, or characteristic associated with the embodiment or example is included in at least one embodiment or example of the present disclosure. The schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics may be combined in any suitable manner in any one or more embodiments or examples.
In the related art, in order to improve the performance of the anti-reflection film and make the anti-reflection film have wider application, the anti-reflection film of a multi-layer film system is developed on the basis of the anti-reflection film with a single-layer structure, and the target requirement of the anti-reflection film is realized by adjusting the matching of materials and thicknesses among a plurality of laminated structures in the anti-reflection film.
However, while the refractive index is studied to reduce the reflectivity by varying the kinds of materials and the thickness of the film layers, the study on the antireflection film in the related art mostly ignores the influence of the micro defects existing between the interfaces of the film layers on the optical characteristics of the antireflection film.
Based on this, an embodiment of the present application provides a light emitting substrate, as shown with reference to fig. 1, including: a first refractive layer 1 and a second refractive layer 2; wherein the refractive index of the first refractive layer 1 is larger than the refractive index of the second refractive layer 2, and the lattice mismatch degree of the material in the first refractive layer 1 and the material in the second refractive layer 2 is smaller than or equal to a preset value.
In some embodiments, the first refractive layer may be a single film layer structure; or the first refractive layer may be a multi-film structure having a laminated structure. In some embodiments, the second refractive layer may be a single film layer structure; or the second refractive layer may be a multi-film structure having a laminated structure.
Illustratively, referring to fig. 1, the first refractive layer 1 is a multi-film structure and the second refractive layer 2 is a single-film structure.
The refractive index of the first refractive layer 1 means that after the first refractive layer 1 is formed on a substrate (e.g., glass) to a predetermined thickness, the refractive index of the resulting first refractive layer 1 is tested instead of the theoretical refractive index of the material of the first refractive layer 1. Since the first refractive layer 1 provided in the embodiment of the present application is a multi-film structure, in practical application, the refractive index of the first refractive layer 1 is different from the refractive index of the material of the multi-film structure included therein, and is specifically determined according to practical situations, which is not limited herein.
The refractive index of the second refractive layer 2 has a similar meaning to that of the first refractive layer 1, and is not described here.
The meaning of lattice mismatch is a mismatch phenomenon caused by the fact that the lattice constant of the substrate material is different from the lattice constant of the crystal material layer when the crystal material layer is formed. Because of the different lattice constants of the two substances, stress is generated near the growth interface of the two film layers, and then crystal defects are generated.
The lattice mismatch, i.e., the degree of lattice mismatch, is a parameter used to measure the lattice match between two adjacent layers. The degree of lattice mismatch is generally related to the lattice constant between two adjacent layers, specifically expressed as follows:
A＝(a1-a2)*100％/a2；
wherein A is lattice mismatch degree, a1 and a2 are average lattice constants of two adjacent film layers respectively, and a1 is more than or equal to a2. In the case of a monolayer structure, the average lattice constant of the film is the lattice constant of the material of the monolayer. In the case where the film layer structure is a multilayer film, the average lattice constant of the film layer is related to the thickness of each sub-layer in the multilayer film.
The lattice mismatch degree of the material in the first refractive layer 1 and the material in the second refractive layer 2 provided in the embodiments of the present application is less than or equal to a preset value.
In some embodiments, the preset value ranges from 0.6% to 1%. Illustratively, the preset value may be 0.6%, 0.7%, 0.8%, or 1%.
In some embodiments, the root mean square roughness parameter RMS of the anti-reflective film is less than or equal to 8nm.
Since the lattice constants (refer to the side length a of the unit cell) of the crystal materials in the two adjacent film layers are different between the interfaces of the two adjacent film layers, when the antireflection film is prepared, the crystal material with a large lattice constant positioned near the interface of the film layers can generate a tensile stress on the crystal material with a small lattice constant, the tensile stress can generate microscopic defects in the crystal material with a small lattice constant, and the larger the lattice constant difference between the crystal materials of the two adjacent film layers is, the larger the tensile stress is, so that the generated microscopic defects are more.
The antireflection film provided by the embodiment of the application has the advantages that the refractive index of the material of the first refractive layer 1 is larger than that of the material of the second refractive layer 2, and the lattice mismatch degree of the material of the first refractive layer 1 and the material of the second refractive layer 2 is smaller than or equal to a preset value. Because the lattice mismatch degree of the materials of the first refraction layer 1 and the second refraction layer 2 is smaller, the probability of dislocation (dislocation is a microscopic defect generated by stress) of the crystal material near the interface position of the two adjacent film layers is very small, so that the internal microscopic defect existing in the crystal material near the interface of the first refraction layer and the second refraction layer is improved to a great extent, and the effect of reducing the reflectivity of the antireflection film is further improved.
In some embodiments, referring to fig. 1, the first refractive layer 1 comprises a first sub-layer 11 and a second sub-layer 12, the second sub-layer 12 being located between the first sub-layer 11 and the second refractive layer 2;
wherein the lattice constant value of the material of the second refractive layer 2 is located between the lattice constant values of the materials of the first sub-layer 11 and the second sub-layer 12.
In the embodiment of the present application, in the case where the first refractive layer 1 is a multilayer film including the first sub-layer 11 and the second sub-layer 12, and the second refractive layer 2 is a single-layer film, by controlling the lattice constant value of the material of the second refractive layer 2 to be located between the lattice constant values of the materials of the first sub-layer 11 and the second sub-layer 12, the average lattice constant value of the first refractive layer 1 can be made closer to the average lattice constant value of the second refractive layer 2.
Specifically, since the first refractive layer 1 includes the first sub-layer 11 and the second sub-layer 12, the average lattice constant value of the first refractive layer 1 is located between the lattice constant value of the material of the first sub-layer 11 and the lattice constant value of the material of the second sub-layer 12, and the lattice constant value of the material of the second refractive layer 2 is also located between the lattice constant values of the materials of the first sub-layer 11 and the second sub-layer 12, so that the lattice constant values of the first refractive layer 1 and the second refractive layer 2 are made closer.
In this way, the lattice mismatch degree of the materials of the first refraction layer 1 and the second refraction layer 2 is smaller, so that the probability of dislocation (dislocation is a microscopic defect generated by stress) of the crystal material near the interface position of the two adjacent film layers is very small, the internal microscopic defect existing in the crystal material near the interface of the first refraction layer 1 and the second refraction layer 2 is improved to a great extent, and the effect of reducing the reflectivity of the antireflection film is improved.
In some embodiments, the absolute value of the difference in lattice constants between each two of the materials in the first refractive layer 1 and the material in the second refractive layer 2 is in the range of 0-0.08nm.
Illustratively, the absolute value of the difference in lattice constant between the material of the first sub-layer 11 and the material of the second sub-layer 12 falls within the range of 0-0.08nm, the absolute value of the difference in lattice constant between the material of the first sub-layer 11 and the material of the second refractive layer 2 falls within the range of 0-0.08nm, and the absolute value of the difference in lattice constant between the material of the second sub-layer 12 and the material of the second refractive layer 2 falls within the range of 0-0.08nm.
In practical applications, when the absolute value of the difference between the lattice constants of the two film materials exceeds the above range, a large number of dislocations will appear at the film interface, and a new material layer (with a lattice constant between the first two materials) needs to be inserted between the layers, so that the lattice constants can be matched through thickness adjustment.
In some embodiments, the material of the first sub-layer 11 comprises zirconia, the material of the second sub-layer 12 comprises titania, and the material of the second refractive layer 2 comprises silica or magnesium fluoride.
In some embodiments, the lattice constant of the titanium oxide in the first refractive layer 1 is 0.458nm and the lattice constant of the zirconium oxide in the first refractive layer 1 is 0.511nm.
In some embodiments, where the material of the second refractive layer comprises silicon oxide, the lattice constant of the silicon oxide in the second refractive layer is 0.491nm; in the case where the material of the second refractive layer includes magnesium fluoride, the lattice constant of magnesium fluoride in the second refractive layer is 0.460nm.
In some embodiments, the thickness of the first sub-layer 11 ranges from 20nm to 60nm, for example: 20nm, 30nm, 40nm, 50nm or 60nm.
The thickness of the second sub-layer 12 ranges from 10nm to 30nm, for example: 10nm, 15nm, 20nm, 25nm or 30nm.
The thickness of the second refractive layer 2 ranges from 70nm to 130nm, for example: 70nm, 80nm, 90nm, 100nm, 110nm, 120nm or 130nm.
In the case where the lattice constant of the material titanium oxide of the second sub-layer 12 in the first refractive layer 1 is 0.458nm, the lattice constant of the material zirconium oxide of the first sub-layer 11 in the first refractive layer 1 is 0.511nm, the lattice constant of the silicon oxide in the second refractive layer is 0.491nm, and the thickness of the first sub-layer 11 is 40nm, the thickness of the second sub-layer 12 is 20nm, and the thickness of the second refractive layer 2 is 100nm, the lattice mismatch degree calculation process of the material of the first refractive layer 1 and the material of the second refractive layer 2 is as follows:
first, the average lattice constant of the first refractive layer 1 is calculated, specifically as follows:
the second refractive layer 2 has a single-layer film structure, and the average lattice constant thereof is that of silicon oxide in the second refractive layer a2=0.491 nm;
secondly, calculating the lattice mismatch degree of the material of the first refraction layer 1 and the material of the second refraction layer 2 according to a lattice mismatch degree formula, wherein the specific calculation is as follows:
A＝(a1-a2)*100％/a2＝(0.493-0.491)*100％/0.491＝0.4％；
obviously, the lattice mismatch degree of the material of the first refractive layer 1 and the material of the second refractive layer 2 is 0.4%, falling within a range of less than or equal to a preset value, wherein the preset value ranges from 0.6% to 1%.
In the case where the material of the first sub-layer 11 in the first refractive layer 1 is zirconia, the material of the second sub-layer 12 is titania, and the material of the sub-layer of the second refractive layer 2 is magnesium fluoride, in practical applications, the thicknesses of the first sub-layer 11 and the second sub-layer 12 need to be determined again through analog calculation, so that lattice matching is achieved between the two film layers of the first refractive layer 1 and the second refractive layer 2.
In the first refractive layer 1 (high refractive layer), the film formation process between the two sub-layers included therein is affected by the interface stress of the two sub-layers, and when the film thicknesses of the two sub-layers are small, the atomic exchange action occurs near the interface position of the sub-layers, and the probability of the atomic exchange action occurring is increased as the film thicknesses of the two sub-layers are closer to the interface position, so that the unit cell size of the crystalline material in the two sub-layers and thus the lattice constant value are affected, and therefore the average lattice constant value of the first refractive layer 1 is correlated with the film thicknesses of the two sub-layers.
In some embodiments, where the material of the first refractive layer 1 comprises titanium oxide and zirconium oxide, the refractive index of the material of the first refractive layer 1 ranges from 2.11 to 2.25;
the refractive index of the material of the first refractive layer 1 is data of refractive index in the visible light range obtained by simulation or test after sequentially forming a sub-layer of zirconia and a sub-layer of titania on a substrate (e.g., glass).
Illustratively, in the case where the material of the first refractive layer 1 includes titanium oxide and zirconium oxide, the light transmission wavelength thereof ranges from 250 to 7000nm.
In some embodiments, where the material of the second refractive layer 2 comprises silicon oxide, the refractive index of the material of the second refractive layer is in the range of 1.46-1.47;
the refractive index of the material of the second refractive layer 2 is refractive index data in the visible light range obtained by simulation or test after forming the first refractive layer of silicon oxide as the material on the substrate.
Illustratively, in the case where the material of the second refractive layer 2 includes silicon oxide, the light transmission wavelength thereof ranges from 200 to 2000nm.
In some embodiments, where the material of the second refractive layer 2 comprises magnesium fluoride, the refractive index of the material of the second refractive layer is in the range of 1.37-1.38.
The refractive index of the material of the second refractive layer 2 is refractive index data in the visible light range obtained by simulation or test after forming a first refractive layer of magnesium fluoride as a material on a substrate (e.g., glass).
Illustratively, in the case where the material of the second refractive layer 2 includes magnesium fluoride, the light transmission wavelength thereof ranges from 120 to 7000nm.
In the case of actually forming the second refractive layer using a magnesium fluoride material, the refractive index is reduced due to magnesium fluoride (MgF 2 ) The hardness, durability and density of the film are changed by temperature change, and the refractive index and density change are close to a direct ratio, so that when magnesium fluoride plating is used, it is necessary to additionally use IAD technology for plating assistance. The IAD technology is a plasma particle auxiliary coating technology, and a film material is evaporated from an electron beam heating evaporation source, converted into a gas phase material and further condensed on a substrate, in the process, the filling density of a film layer is improved through ion bombardment, the film performance is improved, and the binding force and friction resistance of the film layer are enhanced, so that the film forming quality is improved.
The embodiment of the application also provides a display device, referring to fig. 2, including: a substrate 100, and a light emitting device 6 and an antireflection film 10 described above on the substrate 100; the antireflection film 10 is located on a side of the light emitting device 6 remote from the substrate 100;
wherein the second refractive layer 2 of the anti-reflection film 10 is located at a side of the first refractive layer 1 of the anti-reflection film 10 remote from the light emitting device 6.
In some embodiments, the display apparatus may further include an encapsulation layer 7 as shown in fig. 2, wherein the encapsulation layer 7 is located at a side of the anti-reflection film 10 remote from the light emitting device 6.
In some embodiments, the light emitting device 6 includes a first electrode 3, a light emitting layer 4, and a second electrode 5 stacked on the substrate 100, the second electrode 5 being a light emitting side electrode.
Wherein the first pole may be an anode and the second pole may be a cathode; alternatively, the first pole may be a cathode and the second pole may be an anode.
In some embodiments, the light emitting device 6 includes a reflective layer, an anode, a hole injection layer, a hole transport layer, a blocking layer, a light emitting layer, an electron transport layer, an electron injection layer, and a cathode, which are stacked on the substrate 100, wherein the first refractive layer 1 of the anti-reflective film is in direct contact with the cathode.
Referring to FIG. 3, the materials are shown as zirconia (ZrO 2 ) Is made of titanium oxide (TiO 2 ) Is (SiO) 2 ) A refractive index profile of the second refractive layer 2 of the light emitting device 6.
The refractive index of each film layer can be calculated by integrating the wavelengths according to the refractive indexes of the curve data under different wavelengths.
Specifically, depending on the film thickness and/or the manufacturing process, the refractive index of the light emitting device 6 ranges from 1.7 to 2.0, and in the case where the material of the first refractive layer 1 includes titanium oxide and zirconium oxide, the refractive index of the material of the first refractive layer 1 ranges from 2.11 to 2.25, and the refractive index of the material of the second refractive layer ranges from 1.46 to 1.47.
In some embodiments of the present application, referring to fig. 4, there is shown a reflectance curve of a display apparatus, specifically, a light emitting device 6 is disposed on a substrate, and then tested for reflectance (R%) curves at different wavelengths, it can be seen that the reflectance is more than 20% at wavelengths around 450nm, 500nm, 600nm, 700 nm.
By disposing the antireflection film 10 provided in the embodiment of the present application on the side of the light emitting device 6 away from the substrate, and performing the reflectance test again without disposing the encapsulation layer 7, a reflectance curve as shown in fig. 5 is obtained, and as can be seen from fig. 5, the reflectance R is lower than 10% in the band range of 400 to 780nm, and the reflectance R is even lower than 4% in the range of 440 to 550nm, which indicates that the antireflection film provided in the embodiment of the present application has excellent antireflection effect.
The base 100 includes at least a substrate and a driving circuit formed of a conductive pattern on the substrate. The specific structure of the substrate 100 may refer to the related art, and is not described herein.
The embodiment of the application provides a method for determining anti-reflection parameters (including film thickness, refractive index and lattice mismatch degree) of an anti-reflection film, which comprises the following steps:
first, assuming that the antireflection film has a double-layer film structure as shown in fig. 6, the refraction angle δ is calculated by software simulation calculation in the case of r=0 according to the following formula 1 、δ 2 ；
Wherein R is refractive index, n 0 Refractive index of air, n 1 N is the refractive index of the second refractive layer 2 2 Is the refractive index of the first refractive layer 1, n g For the refractive index of the light emitting device 6, d1 is the thickness of the second refractive layer 2 in the direction perpendicular to the substrate 100, d2 is the thickness of the first refractive layer 1 in the direction perpendicular to the substrate 100, δ 1 、δ 2 Respectively two refractive angles as shown in fig. 6.
When r=0, the following formula (2) and formula (3) can be obtained from the above formula (1):
at n 0 And n g In the known case, two refractive angles δ can be calculated 1 And delta 2 。
Step two, according to the following refractive index formula (4), n is calculated 1 * d1 and n 2 * d 2.
Delta=2pi nd/lambda equation (4)
Third step, at n 1 * d1 and n 2 * In the case of numerical determination of d2, the materials of the two film layers are selected according to the refractive index of the materials and n 1 * d1 and n 2 * d2, preliminarily determining the film thickness so that n 1 * d1 and n 2 * d2 approximately matches the numerical relationship.
And fourthly, forming an antireflection film on the substrate according to the determined material and the thickness thereof, testing the antireflection film to obtain the lattice constant of the antireflection film, and calculating the lattice mismatch degree of two sublayers in the antireflection film.
Typically, the crystal structure of the thin film material is tested by using an XRD (X-Ray Diffraction) device to calculate the lattice mismatch, and in addition, an Atomic Force Microscope (AFM) may be used to characterize the surface morphology of the material to obtain the root mean square roughness parameter RMS.
And optimizing the film thickness, film forming quality and the like of the anti-reflection film according to the lattice mismatch degree obtained through testing and calculation, so that the range of the lattice mismatch degree obtained through final calculation is within the range smaller than or equal to a preset value, wherein the range of the preset value is 0.6% -1%.
Further, in order to further optimize the optical characteristics of the antireflection film, the film formation quality may be further optimized (for example, the vacuum degree in the film formation of the antireflection film is increased) according to the root mean square roughness parameter RMS so that the root mean square roughness parameter RMS is less than or equal to 8nm.
And fifthly, according to the lattice mismatch degree obtained by the test in the fourth step, if the calculated lattice mismatch degree is out of the range smaller than or equal to the preset value, wherein the range of the preset value is 0.6% -1%, the film thickness parameter and the film forming condition are further optimized according to the simulation structure and the actual test result.
The foregoing is merely specific embodiments of the present application, but the scope of the present application is not limited thereto, and any person skilled in the art can easily think about changes or substitutions within the technical scope of the present application, and the changes and substitutions are intended to be covered by the scope of the present application. Therefore, the protection scope of the present application shall be subject to the protection scope of the claims.
Claims (9)
1. An antireflection film, comprising: a first refractive layer and a second refractive layer; the first refraction layer comprises a first sub-layer and a second sub-layer, and the second sub-layer is positioned between the first sub-layer and the second refraction layer;
wherein the lattice constant value of the material of the second refractive layer is located between the lattice constant values of the materials of the first and second sub-layers;
the refractive index of the first refractive layer is larger than that of the second refractive layer, and the lattice mismatch degree of the material in the first refractive layer and the material in the second refractive layer is smaller than or equal to a preset value.
2. The antireflection film according to claim 1, wherein the preset value ranges from 0.6% to 1%.
3. The antireflection film according to claim 1, wherein the absolute value of the difference in lattice constant between each two of the materials in the first refractive layer and the material in the second refractive layer is in the range of 0 to 0.08nm.
4. The antireflection film according to claim 1, wherein,
the material of the first sub-layer comprises zirconium oxide, and the material of the second sub-layer comprises titanium oxide;
the material of the second refraction layer comprises silicon oxide or magnesium fluoride.
5. The antireflection film according to claim 4,
in the case where the material of the first refractive layer includes titanium oxide and zirconium oxide, the refractive index of the material of the first refractive layer ranges from 2.11 to 2.25;
in the case where the material of the second refractive layer includes silicon oxide, the refractive index of the material of the second refractive layer ranges from 1.46 to 1.47;
in the case where the material of the second refractive layer includes magnesium fluoride, the refractive index of the material of the second refractive layer ranges from 1.37 to 1.38.
6. The antireflection film of claim 4 wherein the titanium oxide in the first refractive layer has a lattice constant of 0.458nm and the zirconium oxide in the first refractive layer has a lattice constant of 0.511nm.
7. The antireflection film according to claim 4, wherein in the case where the material of the second refractive layer comprises silicon oxide, the lattice constant of the silicon oxide in the second refractive layer is 0.491nm; in the case where the material of the second refractive layer includes magnesium fluoride, the lattice constant of the magnesium fluoride in the second refractive layer is 0.460nm.
8. The antireflection film of claim 4 wherein the first sub-layer has a thickness in the range of 20nm to 60nm, the second sub-layer has a thickness in the range of 10nm to 30nm, and the second refractive layer has a thickness in the range of 70nm to 130nm.
9. A display device comprising a substrate, a light-emitting device provided over the substrate, and the antireflection film according to any one of claims 1 to 8; the antireflection film is positioned on one side of the light-emitting device away from the substrate;
wherein the second refraction layer of the anti-reflection film is positioned at one side of the first refraction layer of the anti-reflection film away from the light emitting device.
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| JP2007304629A (en) * | 2007-08-27 | 2007-11-22 | Nec Corp | Structure of anti-reflection film on two or three dimensional photonic crystal and method of forming same |
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