CN113608283A - Anti-reflection film and display device - Google Patents
Anti-reflection film and display device Download PDFInfo
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- CN113608283A CN113608283A CN202110878540.XA CN202110878540A CN113608283A CN 113608283 A CN113608283 A CN 113608283A CN 202110878540 A CN202110878540 A CN 202110878540A CN 113608283 A CN113608283 A CN 113608283A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/858—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
Abstract
The application provides an antireflection film and a display device, and relates to the technical field of display. The antireflection film includes: a first refractive layer and a second refractive layer; the refractive index of the first refraction layer is larger than that of the second refraction layer, and the lattice mismatch degree of the material in the first refraction layer and the material in the second refraction layer is smaller than or equal to a preset value. The antireflection film has low reflectivity, and can reduce the reflectivity of a film layer interface in a display device under the condition of not influencing the transmittance, thereby improving the display effect.
Description
Technical Field
The application relates to the technical field of display, in particular to an antireflection film and a display device.
Background
With the rapid development of display technology, the OLED (Organic Light Emitting diode) display product has attracted much attention because of its characteristics of self-luminescence, low power consumption, fast response, etc. However, the light-emitting side electrode in the OLED is usually made of a metal material, and the metal material has a high reflectivity, which seriously reduces the display effect of the OLED display product.
The reflectivity is reduced by providing antireflection films in OLED display products in the related art, and the antireflection films in the related art are matched with different display products by adjusting the thickness and the refractive index of materials in the antireflection films, however, the adverse effect of the microscopic defects in the antireflection films on the optical characteristics is not considered.
Currently, a new antireflection film is needed to solve the above problems.
Disclosure of Invention
The embodiment of the application provides an antireflection film and a display device, wherein the antireflection film has low reflectivity, and can reduce the reflectivity of a film layer interface in the display device under the condition of not influencing the transmittance, so that the display effect is improved.
In order to achieve the above purpose, the embodiment of the present application adopts the following technical solutions:
in one aspect, there is provided an antireflection film, including: a first refractive layer and a second refractive layer;
the refractive index of the first refraction layer is larger than that of the second refraction layer, and the lattice mismatch degree of the material in the first refraction layer and the material in the second refraction layer is smaller than or equal to a preset value.
In some embodiments, the preset value ranges from 0.6% to 1%.
In some embodiments, the first refractive layer comprises a first sub-layer and a second sub-layer, the second sub-layer being located between the first sub-layer and the second refractive layer;
wherein a lattice constant value of a material of the second refractive layer is between lattice constant values of materials of the first and second sub-layers.
In some embodiments, an absolute value of a difference in lattice constant between each of the materials in the first refractive layer and the second refractive layer is in a range of 0-0.08 nm.
In some embodiments, the material of the first sub-layer comprises zirconium oxide, the material of the second sub-layer comprises titanium oxide, and the material of the second refractive layer comprises silicon oxide or magnesium fluoride.
In some embodiments, in the case where the material of the first refractive layer includes titanium oxide and zirconium oxide, the refractive index of the material of the first refractive layer ranges from 2.11 to 2.25;
in the case where the material of the second refractive layer includes silicon oxide, the refractive index of the material of the second refractive layer ranges from 1.46 to 1.47;
in the case where the material of the second refractive layer includes magnesium fluoride, the refractive index of the material of the second refractive layer ranges from 1.37 to 1.38.
In some embodiments, the lattice constant of the titanium oxide in the first refractive layer is 0.458nm and the lattice constant of the zirconium oxide in the first refractive layer is 0.511 nm.
In some embodiments, in the case where the material of the second refractive layer includes silicon oxide, the lattice constant of the silicon oxide in the second refractive layer is 0.491 nm; in the case where the material of the second refractive layer includes magnesium fluoride, the lattice constant of magnesium fluoride in the second refractive layer is 0.460 nm.
In some embodiments, the first sub-layer has a thickness in the range of 20nm to 60nm, the second sub-layer has a thickness in the range of 10nm to 30nm, and the second refractive layer has a thickness in the range of 70nm to 130 nm.
In another aspect, there is provided a display device including: a substrate, and a light emitting device and the antireflection film as described above on the substrate; the antireflection film is positioned on one side of the light-emitting device far away from the substrate;
the second refraction layer of the antireflection film is positioned on one side, far away from the light-emitting device, of the first refraction layer of the antireflection film.
Embodiments of the present application provide an antireflection film, a display device, the antireflection film including a first refractive layer and a second refractive layer; the refractive index of the material of the first refraction layer is larger than that of the material of the second refraction layer, and the lattice mismatch degree of the material of the first refraction layer and the material of the second refraction layer is smaller than or equal to a preset value.
The antireflection film provided by the embodiment of the application has the advantages that the refractive index of the material of the first refraction layer is larger than that of the material of the second refraction layer, and the lattice mismatch degree of the material of the first refraction layer and the material of the second refraction layer is smaller than or equal to a preset value. Due to the fact that the lattice mismatch degree of the materials of the first refraction layer and the second refraction layer is small, the probability of dislocation of the crystal materials near the interface positions of the two adjacent film layers is very small, internal microscopic defects of the crystal materials near the interface of the first refraction layer and the second refraction layer are improved to a great extent, and the effect of reducing the reflectivity of the antireflection film is further improved.
Drawings
In order to more clearly illustrate the embodiments of the present application or technical solutions in the related art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of an antireflection film provided in an embodiment of the present application;
fig. 2 is a schematic structural diagram of a display device according to an embodiment of the present disclosure;
FIG. 3 is a graph of refractive index provided by an embodiment of the present application;
FIG. 4 is a graph illustrating reflectivity of a display device according to an embodiment of the present disclosure;
FIG. 5 is a graph of reflectivity of another display device provided by embodiments of the present application;
fig. 6 is a schematic diagram of a light refraction path according to an embodiment of the present application.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
In the embodiments of the present application, unless otherwise specified, the terms "on" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience in describing the present application and simplifying the description, and do not indicate or imply that the structures or elements referred to must have a specific orientation, be configured in a specific orientation, and operate, and thus, should not be construed as limiting the present application.
For the convenience of clearly describing the technical solutions of the embodiments of the present application, in the embodiments of the present application, the terms "first" and "second" are used to distinguish the same items or similar items with basically the same functions and actions, and those skilled in the art can understand that the terms "first" and "second" are not limited to numbers.
Throughout the specification and claims, the term "comprising" is to be interpreted in an open, inclusive sense, i.e., as "including, but not limited to," unless the context requires otherwise. In the description herein, the terms "one embodiment," "some embodiments," "example," "particular example" or "some examples" or the like are intended to indicate that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the disclosure. The schematic representations of the above terms are not necessarily referring to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be included in any suitable manner in any one or more embodiments or examples.
In the related art, in order to improve the performance of the antireflection film and make it have wider applications, an antireflection film of a multilayer film system is developed on the basis of an antireflection film of a single-layer structure, and the target requirements are met by adjusting the matching of materials and thicknesses among a plurality of laminated structures in the antireflection film.
However, while studies on the antireflection film to reduce the reflectance by adjusting the refractive index through different kinds of materials and film thicknesses have been made, studies on the antireflection film in the related art have largely ignored the influence of micro defects existing between the interfaces of the film layers on the optical characteristics of the antireflection film.
Based on this, embodiments of the present application provide a light emitting substrate, as shown in fig. 1, including: a first refractive layer 1 and a second refractive layer 2; the refractive index of the first refraction layer 1 is greater than that of the second refraction layer 2, and the lattice mismatch degree of the material in the first refraction layer 1 and the material in the second refraction layer 2 is smaller than or equal to a preset value.
In some embodiments, the first refractive layer may be a single film layer structure; or the first refractive layer may be a multi-film layer structure having a laminated structure. In some embodiments, the second refractive layer may be a single film layer structure; or the second refractive layer may be a multi-film layer structure having a laminated structure.
Exemplarily, referring to fig. 1, the first refractive layer 1 is a multi-film structure, and the second refractive layer 2 is a single-film structure.
The refractive index of the first refractive layer 1 means a refractive index of the first refractive layer 1 obtained by testing after forming the first refractive layer 1 of a predetermined thickness on a substrate (e.g., glass), rather than a theoretical refractive index of a material of the first refractive layer 1. Since the first refraction layer 1 provided by the embodiment of the present application is a multi-film layer structure, in practical applications, the refractive index of the first refraction layer 1 is different from that of the material of the multi-film layer structure, and is determined according to practical situations, and is not limited herein.
The meaning of the refractive index of the second refractive layer 2 is similar to that of the refractive index of the first refractive layer 1 and is not described herein.
Lattice mismatch means a mismatch phenomenon caused when a crystalline material layer is formed, in which the lattice constant of a substrate material is different from that of the crystalline material layer. Due to the different lattice constants of these two materials, stress is generated near the growth interface of the two films, which in turn generates crystal defects.
The degree of lattice mismatch, i.e., the degree of lattice mismatch, is a parameter used to measure the lattice match between two adjacent film layers. The lattice mismatch is generally related to the lattice constant between two adjacent film layers, and is expressed by the following formula:
A＝(a1-a2)*100％/a2；
wherein A is the lattice mismatch degree, a1 and a2 are the average lattice constants of two adjacent film layers respectively, and a1 is more than or equal to a 2. In the case where the film structure is a single layer, the average lattice constant of the film is the lattice constant of the material of the single layer film. In the case where the film layer structure is a multilayer film, the average lattice constant of the film layer is related to the thickness of each sub-layer in the multilayer film.
Embodiments of the present application provide that a lattice mismatch degree of a material in the first refractive layer 1 and a material in the second refractive layer 2 is less than or equal to a preset value.
In some embodiments, the preset value ranges from 0.6% to 1%. Illustratively, the preset value may be 0.6%, 0.7%, 0.8%, or 1%.
In some embodiments, the root mean square roughness parameter RMS of the antireflective film is ≦ 8 nm.
Between the interfaces of two adjacent film layers, because the lattice constants (referring to the side length a of the unit cell) of the crystal materials in the two film layers are different, when the antireflection film is prepared, the crystal material with the large lattice constant near the film layer interface generates a tensile stress to the crystal material with the small lattice constant, the tensile stress enables microscopic defects to be generated in the crystal material with the small lattice constant, and the larger the difference of the lattice constants of the crystal materials of the two adjacent film layers is, the larger the tensile stress is, and the more the microscopic defects are generated.
The antireflection film provided by the embodiment of the application has the advantages that the refractive index of the material of the first refraction layer 1 is larger than that of the material of the second refraction layer 2, and the lattice mismatch degree of the material of the first refraction layer 1 and the material of the second refraction layer 2 is smaller than or equal to a preset value. Because the lattice mismatch degree of the materials of the first refraction layer 1 and the second refraction layer 2 is small, the probability that the crystal material near the interface position of the two adjacent film layers generates dislocation (the dislocation is a micro defect generated due to stress) is very small, so that the internal micro defect of the crystal material near the interface of the first refraction layer and the second refraction layer is improved to a great extent, and the effect of reducing the reflectivity of the antireflection film is further improved.
In some embodiments, referring to fig. 1, the first refractive layer 1 includes a first sub-layer 11 and a second sub-layer 12, the second sub-layer 12 being located between the first sub-layer 11 and the second refractive layer 2;
wherein the value of the lattice constant of the material of the second refractive layer 2 lies between the values of the lattice constants of the materials of the first and second sub-layers 11, 12.
In the embodiment of the present application, in the case where the first refractive layer 1 is a multilayer film including the first and second sub-layers 11 and 12, and the second refractive layer 2 is a single-layer film, by controlling the lattice constant value of the material of the second refractive layer 2 to be located between the lattice constant values of the materials of the first and second sub-layers 11 and 12, the average lattice constant value of the first refractive layer 1 and the average lattice constant value of the second refractive layer 2 can be made closer.
Specifically, since the first refractive layer 1 includes the first sub-layer 11 and the second sub-layer 12, the average lattice constant value of the first refractive layer 1 is located between the lattice constant values of the material of the first sub-layer 11 and the material of the second sub-layer 12, and the lattice constant value of the material of the second refractive layer 2 is also located between the lattice constant values of the materials of the first sub-layer 11 and the second sub-layer 12, the lattice constant values of the first refractive layer 1 and the second refractive layer 2 are made closer.
Thus, the lattice mismatch of the materials of the first refraction layer 1 and the second refraction layer 2 is small, and the probability of dislocation (dislocation is a micro defect generated due to stress) of the crystal material near the interface position of the two adjacent film layers is very small, so that the internal micro defect of the crystal material near the interface of the first refraction layer 1 and the second refraction layer 2 is improved to a great extent, and the effect of reducing the reflectivity of the antireflection film is further improved.
In some embodiments, the absolute value of the difference in lattice constant between each two materials of the materials in the first refractive layer 1 and the materials in the second refractive layer 2 ranges from 0 to 0.08 nm.
Illustratively, the absolute value of the difference in lattice constant between the material of the first sub-layer 11 and the material of the second sub-layer 12 falls within the range of 0-0.08nm, the absolute value of the difference in lattice constant between the material of the first sub-layer 11 and the material of the second refractive layer 2 falls within the range of 0-0.08nm, and the absolute value of the difference in lattice constant between the material of the second sub-layer 12 and the material of the second refractive layer 2 falls within the range of 0-0.08 nm.
In practical applications, when the absolute value of the difference between the lattice constants of the two film layers exceeds the above range, a large amount of dislocations will appear at the film layer interface, and at this time, a new material layer (having a lattice constant between the two previous materials) needs to be inserted between the layers, and the lattice constant matching is realized through thickness adjustment.
In some embodiments, the material of the first sub-layer 11 comprises zirconium oxide, the material of the second sub-layer 12 comprises titanium oxide, and the material of the second refractive layer 2 comprises silicon oxide or magnesium fluoride.
In some embodiments, the lattice constant of titanium oxide in the first refractive layer 1 is 0.458nm, and the lattice constant of zirconium oxide in the first refractive layer 1 is 0.511 nm.
In some embodiments, in the case where the material of the second refractive layer includes silicon oxide, the lattice constant of the silicon oxide in the second refractive layer is 0.491 nm; in the case where the material of the second refractive layer includes magnesium fluoride, the lattice constant of magnesium fluoride in the second refractive layer is 0.460 nm.
In some embodiments, the thickness of the first sub-layer 11 is in the range of 20nm to 60nm, for example: 20nm, 30nm, 40nm, 50nm or 60 nm.
The thickness of the second sub-layer 12 ranges from 10nm to 30nm, for example: 10nm, 15nm, 20nm, 25nm or 30 nm.
The thickness of the second refraction layer 2 ranges from 70nm to 130nm, for example: 70nm, 80nm, 90nm, 100nm, 110nm, 120nm or 130 nm.
In the case where the lattice constant of titanium oxide, which is a material of the second sub-layer 12 in the first refractive layer 1, is 0.458nm, the lattice constant of zirconium oxide, which is a material of the first sub-layer 11 in the first refractive layer 1, is 0.511nm, the lattice constant of silicon oxide in the second refractive layer is 0.491nm, the thickness of the first sub-layer 11 is 40nm, the thickness of the second sub-layer 12 is 20nm, and the thickness of the second refractive layer 2 is 100nm, the calculation procedure of the lattice mismatch between the material of the first refractive layer 1 and the material of the second refractive layer 2 is as follows:
first, an average lattice constant of the first refractive layer 1 is calculated, specifically, as follows:
the second refractive layer 2 is a single-layer film structure, and has an average lattice constant of 0.491nm, which is the lattice constant a2 of silicon oxide in the second refractive layer;
secondly, calculating the lattice mismatch degree of the material of the first refraction layer 1 and the material of the second refraction layer 2 according to a lattice mismatch degree formula, wherein the calculation is as follows:
A＝(a1-a2)*100％/a2＝(0.493-0.491)*100％/0.491＝0.4％；
obviously, the lattice mismatch of the material of the first refractive layer 1 and the material of the second refractive layer 2 is 0.4%, falling within a range of less than or equal to a preset value, wherein the preset value ranges from 0.6% to 1%.
In practical applications, when the material of the first sub-layer 11 in the first refractive layer 1 is zirconia, the material of the second sub-layer 12 is titania, and the material of the second refractive layer 2 is magnesium fluoride, the thicknesses of the first sub-layer 11 and the second sub-layer 12 need to be determined again through simulation calculation, so that lattice matching between two film layers of the first refractive layer 1 and the second refractive layer 2 is achieved.
It should be noted that, in the first refractive layer 1 (high refractive layer), since the film formation process between the two sub-layers included therein is affected by the interfacial stress of the two sub-layers, when the film thicknesses of the two sub-layers are both small, an atom exchange effect occurs near the interface position of the sub-layers, and the probability of the atom exchange effect occurring is higher as the position is closer to the interface position, so that the cell size of the crystal material in the two sub-layers is affected, and further the lattice constant value is affected, and thus the average lattice constant value of the first refractive layer 1 is related to the film thicknesses of the two sub-layers.
In some embodiments, in the case where the material of the first refractive layer 1 includes titanium oxide and zirconium oxide, the refractive index of the material of the first refractive layer 1 ranges from 2.11 to 2.25;
the refractive index of the material of the first refractive layer 1 is refractive index data in the visible light range obtained by simulation or test after sequentially forming a sub-layer of zirconium oxide and a sub-layer of titanium oxide on a substrate (e.g., glass).
Illustratively, in the case where the material of the first refractive layer 1 includes titanium oxide and zirconium oxide, the range of the light transmission wavelength thereof is 250-7000 nm.
In some embodiments, in the case where the material of the second refractive layer 2 includes silicon oxide, the refractive index of the material of the second refractive layer ranges from 1.46 to 1.47;
the refractive index of the material of the second refraction layer 2 is data of refractive index in the visible light range obtained by simulation or test after forming the first refraction layer of silicon oxide on the substrate.
Illustratively, in the case where the material of the second refraction layer 2 includes silicon oxide, the light transmission wavelength thereof is in the range of 200-2000 nm.
In some embodiments, in the case where the material of the second refractive layer 2 includes magnesium fluoride, the refractive index of the material of the second refractive layer ranges from 1.37 to 1.38.
The refractive index of the material of the second refractive layer 2 is refractive index data in the visible light range obtained by simulation or test after forming the first refractive layer of magnesium fluoride as a material on a substrate (e.g., glass).
Illustratively, in the case where the material of the second refractive layer 2 includes magnesium fluoride, the light transmission wavelength thereof is in the range of 120-7000 nm.
When the second refraction layer is actually formed by using magnesium fluoride (MgF), magnesium fluoride (MgF) is used2) The hardness, durability and density of the film change with temperature, and the refractive index changes in close to direct proportion to the density, thereforeWhen the magnesium fluoride is used for coating, an IAD technology is additionally used for plating assistance. The IAD technology is a plasma particle-assisted coating technology, a coating material is evaporated from an electron beam heating evaporation source and converted into a gas-phase material, and the gas-phase material is further condensed on a substrate.
An embodiment of the present application also provides a display device, as shown in fig. 2, including: a substrate 100, and a light emitting device 6 and the antireflection film 10 described above on the substrate 100; the antireflection film 10 is located on the side of the light-emitting device 6 away from the substrate 100;
wherein the second refraction layer 2 of the antireflection film 10 is located on the side of the first refraction layer 1 of the antireflection film 10 far away from the light-emitting device 6.
In some embodiments, the display device may further include an encapsulation layer 7 as shown in fig. 2, wherein the encapsulation layer 7 is located on a side of the anti-reflection film 10 away from the light emitting device 6.
In some embodiments, the light emitting device 6 includes a first electrode 3, a light emitting layer 4, and a second electrode 5 stacked on the substrate 100, and the second electrode 5 is a light exit side electrode.
Wherein the first pole may be an anode and the second pole may be a cathode; alternatively, the first pole may be a cathode and the second pole may be an anode.
In some embodiments, the light emitting device 6 includes a reflective layer, an anode, a hole injection layer, a hole transport layer, a blocking layer, a light emitting layer, an electron transport layer, an electron injection layer, and a cathode, which are stacked on the substrate 100, wherein the first refractive layer 1 of the antireflection film is in direct contact with the cathode.
Referring to FIG. 3, the material is shown as zirconia (ZrO)2) Of titanium oxide (TiO)2) Of the second sub-layer 12, is (SiO)2) And the refractive index profile of the light emitting device 6 and the second refractive layer 2.
The wavelength is integrated according to the refractive indexes of different wavelengths in the curve data, and the refractive index of each film layer can be calculated.
Specifically, the refractive index of the light emitting device 6 ranges from 1.7 to 2.0 depending on the thickness of the film layer and/or the manufacturing process, and in the case where the material of the first refractive layer 1 includes titanium oxide and zirconium oxide, the refractive index of the material of the first refractive layer 1 ranges from 2.11 to 2.25, and the refractive index of the material of the second refractive layer ranges from 1.46 to 1.47.
In some embodiments of the present application, referring to fig. 4, a reflectance curve of a display device is shown, specifically, a light emitting device 6 is disposed on a substrate, and then reflectance (R%) curves at different wavelengths are tested, and it can be seen that the reflectance in the vicinity of wavelengths of 450nm, 500nm, 600nm, 700nm exceeds 20%.
By arranging the antireflection film 10 provided in the embodiment of the present application on the side of the light emitting device 6 away from the substrate, and performing a reflectivity test without arranging the encapsulation layer 7, a reflectivity curve as shown in fig. 5 is obtained, and as can be seen from fig. 5, the reflectivity R is less than 10% in the wavelength range of 400 to 780nm, and the reflectivity R is even less than 4% in the wavelength range of 440 to 550nm, which indicates that the antireflection film provided in the embodiment of the present application has an excellent antireflection effect.
The base 100 includes at least a substrate, and further includes a driving circuit formed by a conductive pattern on the substrate. The specific structure of the substrate 100 may refer to the related art and will not be described here.
Embodiments of the present application provide a method for determining an antireflective parameter (including film thickness, refractive index, and lattice mismatch degree) of an antireflective film, which is as follows:
first, assuming that the antireflection film has a two-layer film structure as shown in fig. 6, the refraction angle δ is calculated by software simulation calculation according to the following formula when R is 01、δ2；
Wherein R is a refractive index, n0Is the refractive index of air, n1Is a second refractionRefractive index of layer 2, n2Is the refractive index of the first refractive layer 1, ngIn order to refractive index of the light emitting device 6, d1 is a thickness of the second refractive layer 2 in a direction perpendicular to the substrate 100, d2 is a thickness of the first refractive layer 1 in a direction perpendicular to the substrate 100, δ1、δ2Two refraction angles as shown in fig. 6, respectively.
When R is 0, the following formula (2) and formula (3) can be obtained from the above formula (1):
at n0And ngIn the known case, two refraction angles δ can be calculated1And delta2。
Secondly, according to the following refractive index formula (4), n is calculated1D1 and n2Value of d 2.
2 pi nd/λ equation (4)
Third step, in n1D1 and n2The material of the two layers is chosen, depending on the refractive index of the material and n, given the value of d21D1 and n2D2, the film thickness was preliminarily determined so that n1D1 and n2The numerical relationship of d2 approximately matched.
And fourthly, forming an antireflection film on the substrate according to the determined material and the thickness of the material, testing the antireflection film to obtain a lattice constant of the antireflection film, and calculating to obtain the lattice mismatch degree of two sublayers in the antireflection film.
Generally, the crystal structure of the thin film material is tested by using an XRD (X-Ray Diffraction) device, the degree of lattice mismatch is calculated, and in addition, the surface morphology of the material can be characterized by using an Atomic Force Microscope (AFM) to obtain a root-mean-square roughness parameter RMS.
And optimizing the thickness, the film forming quality and the like of the antireflection film according to the lattice mismatch degree obtained by testing and calculation, so that the finally calculated range of the lattice mismatch degree falls within a range smaller than or equal to a preset value, wherein the range of the preset value is 0.6-1%.
Further, in order to further optimize the optical characteristics of the antireflection film, the film formation quality may be further optimized (for example, the degree of vacuum during film formation of the antireflection film is increased) based on the root-mean-square roughness parameter RMS so that the root-mean-square roughness parameter RMS is less than or equal to 8 nm.
And fifthly, according to the lattice mismatch degree obtained by testing in the fourth step, if the calculated range of the lattice mismatch degree falls outside the range smaller than or equal to a preset value, wherein the range of the preset value is 0.6% -1%, further optimizing the film thickness parameter and the film forming condition according to the simulation structure and the actual test result.
The above description is only for the specific embodiments of the present application, but the scope of the present application is not limited thereto, and any person skilled in the art can easily conceive of the changes or substitutions within the technical scope of the present application, and shall be covered by the scope of the present application. Therefore, the protection scope of the present application shall be subject to the protection scope of the claims.
Claims (10)
1. An antireflection film, comprising: a first refractive layer and a second refractive layer;
the refractive index of the first refraction layer is larger than that of the second refraction layer, and the lattice mismatch degree of the material in the first refraction layer and the material in the second refraction layer is smaller than or equal to a preset value.
2. The antireflection film of claim 1 wherein the predetermined value is in the range of 0.6% to 1%.
3. The antireflection film of claim 1 wherein the first refractive layer comprises a first sublayer and a second sublayer, the second sublayer being between the first sublayer and the second refractive layer;
wherein a lattice constant value of a material of the second refractive layer is between lattice constant values of materials of the first and second sub-layers.
4. The antireflection film according to claim 1, wherein an absolute value of a difference in lattice constant between each of the material in the first refractive layer and the material in the second refractive layer is in a range of 0 to 0.08 nm.
5. The antireflection film according to claim 3,
the material of the first sub-layer comprises zirconium oxide and the material of the second sub-layer comprises titanium oxide;
the material of the second refraction layer comprises silicon oxide or magnesium fluoride.
6. The antireflection film as claimed in claim 5,
in the case where the material of the first refractive layer includes titanium oxide and zirconium oxide, the refractive index of the material of the first refractive layer ranges from 2.11 to 2.25;
in the case where the material of the second refractive layer includes silicon oxide, the refractive index of the material of the second refractive layer ranges from 1.46 to 1.47;
in the case where the material of the second refractive layer includes magnesium fluoride, the refractive index of the material of the second refractive layer ranges from 1.37 to 1.38.
7. The antireflection film of claim 5 wherein the lattice constant of titanium oxide in the first refractive layer is 0.458nm and the lattice constant of zirconium oxide in the first refractive layer is 0.511 nm.
8. An antireflection film according to claim 5, characterized in that in the case where the material of the second refractive layer includes silicon oxide, the lattice constant of silicon oxide in the second refractive layer is 0.491 nm; in the case where the material of the second refractive layer includes magnesium fluoride, the lattice constant of magnesium fluoride in the second refractive layer is 0.460 nm.
9. An antireflection film as claimed in claim 3 wherein the first sub-layer has a thickness in the range of 20nm to 60nm, the second sub-layer has a thickness in the range of 10nm to 30nm, and the second refractive layer has a thickness in the range of 70nm to 130 nm.
10. A display device comprising a substrate, and a light-emitting device and the antireflection film according to any one of claims 1 to 9 over the substrate; the antireflection film is positioned on one side of the light-emitting device far away from the substrate;
the second refraction layer of the antireflection film is positioned on one side, far away from the light-emitting device, of the first refraction layer of the antireflection film.
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