CN113578900A - Material box cleaning machine and using method thereof - Google Patents

Material box cleaning machine and using method thereof Download PDF

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Publication number
CN113578900A
CN113578900A CN202110849568.0A CN202110849568A CN113578900A CN 113578900 A CN113578900 A CN 113578900A CN 202110849568 A CN202110849568 A CN 202110849568A CN 113578900 A CN113578900 A CN 113578900A
Authority
CN
China
Prior art keywords
cleaning
drying
blow
air
material box
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202110849568.0A
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Chinese (zh)
Inventor
杨杰
蒋君
孔玉朋
宋昌万
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tuosi Precision Technology Suzhou Co ltd
Original Assignee
Tuosi Precision Technology Suzhou Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tuosi Precision Technology Suzhou Co ltd filed Critical Tuosi Precision Technology Suzhou Co ltd
Priority to CN202110849568.0A priority Critical patent/CN113578900A/en
Publication of CN113578900A publication Critical patent/CN113578900A/en
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08Cleaning containers, e.g. tanks
    • B08B9/20Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
    • B08B9/28Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking
    • B08B9/34Arrangements of conduits or nozzles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08Cleaning containers, e.g. tanks
    • B08B9/20Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
    • B08B9/28Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking
    • B08B9/30Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking and having conveyors
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F26B21/001Drying-air generating units, e.g. movable, independent of drying enclosure
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F26B21/004Nozzle assemblies; Air knives; Air distributors; Blow boxes

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

The invention discloses a material box cleaning machine and a using method thereof, wherein the material box cleaning machine comprises a conveying line body, a cleaning station, a blow-drying station and an air supply assembly, wherein the cleaning station and the blow-drying station are sequentially arranged along the length direction of the conveying line body; a jig frame is arranged on the conveying line body; the cleaning station comprises a cleaning cavity, a liquid inlet pipe for liquid input and a cleaning nozzle positioned in the cleaning cavity, the liquid inlet pipe comprises a medicament pipe and a clear water pipe, and the cleaning nozzle sprays the upper end surface and the lower end surface of the material box respectively; the blow-drying station comprises a blow-drying chamber, an air inlet pipe for inputting air and a blow-drying nozzle positioned in the blow-drying chamber, and the blow-drying nozzle is used for respectively blow-drying the upper end surface and the lower end surface of the material box; the air supply assembly comprises an air storage tank, an air heater and an air filter which are sequentially connected. The wafer material box cleaning and drying device realizes cleaning and drying of the wafer material box and guarantees the particle cleanliness of the wafer.

Description

Material box cleaning machine and using method thereof
Technical Field
The invention belongs to the technical field of wafer magazine cleaning, and particularly relates to a magazine cleaning machine and a using method thereof.
Background
After the semiconductor substrate material is cut, ground, polished and cleaned, the material needs to be loaded to a wafer material box, and as electrostatic friction possibly exists in the wafer material box in the incoming material transportation process, the particle cleanliness of the wafer material box is not up to standard, so that the particle cleanliness of the wafer is influenced, the wafer material box needs to be cleaned before loading, and the particle cleanliness of the wafer is ensured.
At present, the wafer is often loaded by directly using the wafer magazine, and the wafer magazine is not cleaned, so that the particle cleanliness of the wafer is greatly influenced.
Disclosure of Invention
The invention overcomes the defects of the prior art and provides a box cleaning machine and a using method thereof so as to solve the problems in the prior art.
In order to achieve the purpose, the invention adopts the technical scheme that: a material box cleaning machine comprises a conveying line body, a cleaning station, a blow-drying station and a gas supply assembly, wherein the cleaning station and the blow-drying station are sequentially arranged along the length direction of the conveying line body; wherein:
the conveying line body is of a sectional type conveying structure, and a jig frame is arranged on the conveying line body;
the cleaning station comprises a cleaning cavity, a liquid inlet pipe for liquid input and a cleaning nozzle positioned in the cleaning cavity, the liquid inlet pipe comprises a medicament pipe and a clear water pipe, and the cleaning nozzle sprays the upper end surface and the lower end surface of the material box respectively;
The blow-drying station comprises a blow-drying chamber, an air inlet pipe for inputting air and a blow-drying nozzle positioned in the blow-drying chamber, and the blow-drying nozzle is used for respectively blow-drying the upper end surface and the lower end surface of the material box;
the air supply assembly comprises an air storage tank, an air heater and an air filter which are sequentially connected, and the air filter is connected with the air inlet pipe.
Preferably, a water tank and a medicament box are arranged below the conveying line body, the water tank is connected with the clear water pipe, and the medicament box is connected with the medicament pipe.
Preferably, sealing doors are arranged at the inlet end and the outlet end of the cleaning chamber and at the inlet end and the outlet end of the blow-drying chamber.
Preferably, the cleaning nozzle is connected with the liquid inlet pipe through a cleaning air pipe.
Preferably, the cleaning nozzles are distributed at intervals along the length direction of the cleaning air pipes, and the number of the cleaning air pipes is two and the cleaning air pipes are respectively positioned at the top and the bottom of the cleaning chamber.
Preferably, the blow-drying nozzle is connected with the air inlet pipe through a blow-drying air pipe.
Preferably, the blow-drying nozzles are distributed at intervals along the length direction of the blow-drying air pipes, and the blow-drying air pipes are two groups and are respectively positioned at the top and the bottom of the blow-drying chamber.
Preferably, the outlet end of the blow drying chamber is provided with a static eliminator.
The invention also discloses a use method of the box cleaning machine, which comprises the following steps:
s1, feeding: the material box is placed in a jig frame and is conveyed into a cleaning cavity of a cleaning station through a conveying line body;
s2, cleaning: the material box is sequentially cleaned by medicament and clear water through a cleaning nozzle of a cleaning station;
s3, drying: the conveying line body conveys the cleaned material box into a drying chamber of a drying station, and hot air is blown out by a drying nozzle to dry the material box;
s4, discharging: and the dried material box is sent out by the conveying line body.
Preferably, before step S3, the method further includes the following steps: the air supply assembly is adopted to sequentially carry out heating operation and filtering operation on air.
The invention solves the defects in the background technology, and has the following beneficial effects:
(1) according to the invention, under the matching action of the conveying line body, the cleaning station, the blow-drying station and the air supply assembly, the cleaning and blow-drying of the wafer material box are realized, the cleanliness of the wafer material box is ensured, and the particle cleanliness of the wafer is further ensured;
(2) the conveying line body adopts a sectional type conveying structure design, so that the wafer material box can be continuously operated in a sectional type without mutual interference, and the cleaning efficiency of the wafer material box is improved;
(3) The air supply assembly can heat and filter air, so that the wafer material box can be dried better, and the cleanliness of the wafer material box is ensured;
(4) the cleaning air pipe is used for effectively installing and supporting the cleaning nozzle, so that the cleaning nozzle can more comprehensively clean the wafer magazine, and the blow-drying air pipe is used for effectively installing and supporting the blow-drying nozzle, so that the blow-drying nozzle can more comprehensively blow-dry the wafer magazine, and the treatment effect on the wafer magazine is ensured;
(5) the static eliminator can eliminate static of the wafer material box after being cleaned and dried, and influence on loading of the wafer is avoided.
Drawings
In order to more clearly illustrate the embodiments or technical solutions in the prior art of the present invention, the drawings used in the description of the embodiments or prior art will be briefly described below, and it is obvious for those skilled in the art that other drawings can be obtained based on these drawings without creative efforts.
FIG. 1 is a schematic overall structure of a preferred embodiment of the present invention;
FIG. 2 is a front view of FIG. 1;
FIG. 3 is a partial schematic structural view of a preferred embodiment of the present invention;
FIG. 4 is a schematic structural view of a preferred embodiment of a delivery wire body of the present invention;
FIG. 5 is a flow chart of a preferred embodiment of the present invention;
in the figure: 1. a conveyor line body; 2. cleaning a station; 21. cleaning the chamber; 22. a liquid inlet pipe; 221. a drug tube; 222. a clear water pipe; 23. cleaning the nozzle; 3. drying the station; 31. drying the chamber; 32. an air inlet pipe; 33. drying the nozzle; 4. a gas supply assembly; 41. a gas storage tank; 42. an air heater; 43. an air filter; 5. a jig frame; 6. a water tank; 7. a kit; 8. a sealing door; 9. cleaning the air pipe; 10. drying the air pipe; 11. a static eliminator; 101. a first section of conveying line; 102. a second section of conveying line; 103. a third section of conveying line; 104. and a fourth section of conveying line.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1 and 2, a magazine cleaning machine comprises a conveyor line body 1, a cleaning station 2 and a blow-drying station 3 which are sequentially arranged along the length direction of the conveyor line body 1, and an air supply assembly 4 for supplying air to the blow-drying station 3; wherein:
as shown in fig. 4, the conveyor line body 1 is a sectional type conveying structure, a jig frame 5 is arranged on the conveyor line body 1, the conveyor line body 1 is composed of a first section conveyor line 101, a second section conveyor line 102, a third section conveyor line 103 and a fourth section conveyor line 104 which are sequentially arranged, the first section conveyor line 101 is used for feeding and conveying the jig frame 5, the second section conveyor line 102 is used for cleaning and conveying the jig frame 5, the third section conveyor line 103 is used for drying and conveying the jig frame 5, the fourth section conveyor line 104 is used for blanking and conveying the jig frame 5, the sectional type conveying structure is designed, the wafer magazine can be continuously operated in a sectional type, mutual interference is avoided, and the cleaning efficiency of the wafer magazine is improved.
Referring to fig. 2 and 3, the cleaning station 2 includes a cleaning chamber 21, a liquid inlet pipe 22 for inputting liquid, and a cleaning nozzle 23 located in the cleaning chamber 21, the liquid inlet pipe 22 includes a chemical pipe 221 and a clean water pipe 222, the cleaning nozzle 23 sprays the upper end surface and the lower end surface of the material box respectively, the cleaning nozzle 23 is connected with the liquid inlet pipe 22 through a cleaning air pipe 9, the cleaning nozzles 23 are distributed at intervals along the length direction of the cleaning air pipe 9, the cleaning air pipes 9 are two groups and located at the top and the bottom of the cleaning chamber 21 respectively, after the jig frame 5 enters the second section of conveying line 102 from the first section of conveying line 101, the inlet end and the outlet end of the cleaning chamber 21 are sealed, the chemical is introduced into the cleaning air pipe 9 through the chemical pipe 221, the cleaning nozzle 23 cleans the wafer material boxes in the jig frame 5, after the chemical cleaning is completed, the clean water pipe 222 introduces clean water into the cleaning air pipe 9, the cleaning nozzle 23 is used for cleaning the wafer material box in the jig frame 5, the cleaning air pipe 9 is used for effectively installing and supporting the cleaning nozzle 23, so that the cleaning nozzle 23 can more comprehensively clean the wafer material box, and the next step can be carried out after the cleaning is finished.
Referring to fig. 2 and 3, the drying station 3 includes a drying chamber 31, an air inlet pipe 32 for inputting air, and a drying nozzle 33 located in the drying chamber 31, the drying nozzle 33 respectively dries the upper end surface and the lower end surface of the magazine, the drying nozzle 33 is connected to the air inlet pipe 32 through a drying air pipe 10, the drying nozzles 33 are distributed at intervals along the length direction of the drying air pipe 10, the number of the drying air pipes 10 is two, and the drying air pipes are respectively located at the top and the bottom of the drying chamber 31, when the jig frame 5 enters the third section conveying line 103 from the second section conveying line 102, the inlet end and the outlet end of the drying chamber 31 are sealed, the treated air is introduced into the drying chamber 31 through the air inlet pipe 32, the wafer magazine is dried by the drying nozzle 33, the drying air pipe 10 effectively supports the drying nozzle 33, so that the drying nozzle 33 can more comprehensively dry the wafer magazine, the processing effect on the wafer material box is ensured.
Combine fig. 2 and 3 to show, air feed subassembly 4 is including the gas holder 41 that connects gradually the setting, air heater 42 and air cleaner 43, air cleaner 43 and intake pipe 32 connection, the air gets into air heater 42 from gas holder 41 and heats, make the air keep certain temperature, then carry out filtration through air cleaner 43, the air after the filtration lets in the intake pipe 32 of station 3 that weathers, the processing of weathering wafer magazine in tool frame 5, air feed subassembly 4 can heat the filtration to the air, thereby weathers the wafer magazine better, guarantee the cleanliness of wafer magazine.
In this embodiment, the conveying line body 1 below is provided with water tank 6 and chemical tank 7, water tank 6 is connected with clean water pipe 222, chemical tank 7 is connected with chemical pipe 221, wash cavity 21 entry end and exit end and weather cavity 31 entry end and exit end and all be provided with sealing door 8, sealing door 8 can carry out sealing process to washing cavity 21 entry end and exit end and weather cavity 31 entry end and exit end, guarantee the cleaning performance and the stoving effect to the wafer magazine.
Further, in this embodiment, the outlet end of the drying chamber 31 is provided with the static eliminator 11, and the static eliminator 11 can eliminate static of the wafer magazine after cleaning and drying, thereby avoiding the influence on the loading of the wafer.
As shown in fig. 5, a method for using a cartridge cleaning machine includes the following steps:
s1, feeding: the material box is placed in the jig frame 5 and is conveyed into a cleaning cavity 21 of a cleaning station 2 through the conveying line body 1, the jig frame 5 is transferred to the second section of conveying line 102 through the first section of conveying line 101, and the jig frame 5 reaches the cleaning cavity 21;
s2, cleaning: the tool rack 5 is arranged on the second section of the conveying line 102, and the material boxes are sequentially cleaned by the cleaning nozzles 23 of the cleaning station 2;
S3, drying: the conveying line body 1 conveys the cleaned material box into a blow-drying chamber 31 of a blow-drying station 3, hot air is blown out from a blow-drying nozzle 33 to blow-dry the material box, the jig frame 5 is transferred to a third section of conveying line 103 by a second section of conveying line 102, and the jig frame 5 reaches the blow-drying chamber 31;
s4, discharging: the material box dried by blowing is sent out by the conveying line body 1, the jig frame 5 is transferred to the fourth section conveying line 104 by the third section conveying line 103, and discharging of the jig frame 5 is completed.
Specifically, before step S3, the air supply assembly 4 may be further used to sequentially perform heating operation and filtering operation on the air, so as to better dry the wafer magazine and ensure the cleanliness of the wafer magazine.
In summary, under the cooperation of the conveyor line body 1, the cleaning station 2, the blow-drying station 3 and the air supply assembly 4, the wafer magazine is cleaned and blown dry, the cleanliness of the wafer magazine is ensured, and the particle cleanliness of the wafer is further ensured.
In the description herein, references to the description of "one embodiment," "an example," "a specific example" or the like are intended to mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The foregoing shows and describes the general principles, essential features, and advantages of the invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are described in the specification and illustrated only to illustrate the principle of the present invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the present invention, which fall within the scope of the invention as claimed.

Claims (10)

1. The charging box cleaning machine is characterized by comprising a conveying line body, a cleaning station, a blow-drying station and an air supply assembly, wherein the cleaning station and the blow-drying station are sequentially arranged along the length direction of the conveying line body; wherein:
the conveying line body is of a sectional type conveying structure, and a jig frame is arranged on the conveying line body;
the cleaning station comprises a cleaning cavity, a liquid inlet pipe for liquid input and a cleaning nozzle positioned in the cleaning cavity, the liquid inlet pipe comprises a medicament pipe and a clear water pipe, and the cleaning nozzle sprays the upper end surface and the lower end surface of the material box respectively;
the blow-drying station comprises a blow-drying chamber, an air inlet pipe for inputting air and a blow-drying nozzle positioned in the blow-drying chamber, and the blow-drying nozzle is used for respectively blow-drying the upper end surface and the lower end surface of the material box;
The air supply assembly comprises an air storage tank, an air heater and an air filter which are sequentially connected, and the air filter is connected with the air inlet pipe.
2. The cartridge cleaning machine according to claim 1, wherein a water tank and a chemical tank are arranged below the conveyor line body, the water tank is connected with the clean water pipe, and the chemical tank is connected with the chemical pipe.
3. The magazine washing machine according to claim 1, wherein sealing doors are arranged at the inlet end and the outlet end of the washing chamber and at the inlet end and the outlet end of the drying chamber.
4. The cartridge cleaning machine according to claim 1, wherein the cleaning nozzle is connected to the liquid inlet pipe by a cleaning air pipe.
5. The magazine washing machine according to claim 4, wherein the washing nozzles are distributed at intervals along the length direction of the washing air pipes, and the washing air pipes are two groups and are respectively positioned at the top and the bottom of the washing chamber.
6. The cartridge cleaning machine of claim 1, wherein the blow drying nozzle is connected to the air inlet duct by a blow drying duct.
7. The magazine washing machine as claimed in claim 6, wherein the blow-drying nozzles are spaced along the length direction of the blow-drying ducts, and the blow-drying ducts are divided into two groups and located at the top and the bottom of the blow-drying chamber respectively.
8. The cartridge cleaning machine of claim 1, wherein an outlet end of the blow drying chamber is provided with a static eliminator.
9. Use method of a cartridge cleaning machine applied to a cartridge cleaning machine according to any one of claims 1 to 8, characterized by comprising the following steps:
s1, feeding: the material box is placed in a jig frame and is conveyed into a cleaning cavity of a cleaning station through a conveying line body;
s2, cleaning: the material box is sequentially cleaned by medicament and clear water through a cleaning nozzle of a cleaning station;
s3, drying: the conveying line body conveys the cleaned material box into a drying chamber of a drying station, and hot air is blown out by a drying nozzle to dry the material box;
s4, discharging: and the dried material box is sent out by the conveying line body.
10. The use method of the cartridge cleaning machine according to claim 9, characterized in that before the step S3, the method further comprises the following steps: the air supply assembly is adopted to sequentially carry out heating operation and filtering operation on air.
CN202110849568.0A 2021-07-27 2021-07-27 Material box cleaning machine and using method thereof Pending CN113578900A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110849568.0A CN113578900A (en) 2021-07-27 2021-07-27 Material box cleaning machine and using method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110849568.0A CN113578900A (en) 2021-07-27 2021-07-27 Material box cleaning machine and using method thereof

Publications (1)

Publication Number Publication Date
CN113578900A true CN113578900A (en) 2021-11-02

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CN202110849568.0A Pending CN113578900A (en) 2021-07-27 2021-07-27 Material box cleaning machine and using method thereof

Country Status (1)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115020302A (en) * 2022-07-15 2022-09-06 江苏芯梦半导体设备有限公司 Cleaning and drying equipment and cleaning and drying method for wafer storage box

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108554880A (en) * 2017-04-26 2018-09-21 上海旭熠电子技术有限公司 Pass through formula film magazine horse cleaning equipment
CN109396105A (en) * 2018-12-05 2019-03-01 天津开发区合普工贸有限公司 Beaker test tube class glassware decontamination drying device
US20190091735A1 (en) * 2017-09-28 2019-03-28 Boe Technology Group Co., Ltd. Sheet cleaning device and method
CN210279981U (en) * 2019-07-02 2020-04-10 上海东朋科技有限公司 Wafer magazine workbin belt cleaning device
CN111578666A (en) * 2020-05-22 2020-08-25 苏州科牧智能设备有限公司 5G product cleaning and drying equipment
CN111842333A (en) * 2020-06-08 2020-10-30 宿州市灵显电子科技有限公司 Cleaning equipment and cleaning method for mobile phone display outer screen
CN215613915U (en) * 2021-07-27 2022-01-25 拓思精工科技(苏州)有限公司 Material box cleaning machine

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108554880A (en) * 2017-04-26 2018-09-21 上海旭熠电子技术有限公司 Pass through formula film magazine horse cleaning equipment
US20190091735A1 (en) * 2017-09-28 2019-03-28 Boe Technology Group Co., Ltd. Sheet cleaning device and method
CN109396105A (en) * 2018-12-05 2019-03-01 天津开发区合普工贸有限公司 Beaker test tube class glassware decontamination drying device
CN210279981U (en) * 2019-07-02 2020-04-10 上海东朋科技有限公司 Wafer magazine workbin belt cleaning device
CN111578666A (en) * 2020-05-22 2020-08-25 苏州科牧智能设备有限公司 5G product cleaning and drying equipment
CN111842333A (en) * 2020-06-08 2020-10-30 宿州市灵显电子科技有限公司 Cleaning equipment and cleaning method for mobile phone display outer screen
CN215613915U (en) * 2021-07-27 2022-01-25 拓思精工科技(苏州)有限公司 Material box cleaning machine

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115020302A (en) * 2022-07-15 2022-09-06 江苏芯梦半导体设备有限公司 Cleaning and drying equipment and cleaning and drying method for wafer storage box
CN115020302B (en) * 2022-07-15 2022-10-14 江苏芯梦半导体设备有限公司 Cleaning and drying equipment and cleaning and drying method for wafer storage box

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Application publication date: 20211102

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