CN113544419B - Treatment liquid supply device and control method for treatment liquid supply device - Google Patents
Treatment liquid supply device and control method for treatment liquid supply device Download PDFInfo
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- CN113544419B CN113544419B CN202080019247.1A CN202080019247A CN113544419B CN 113544419 B CN113544419 B CN 113544419B CN 202080019247 A CN202080019247 A CN 202080019247A CN 113544419 B CN113544419 B CN 113544419B
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- 239000007788 liquid Substances 0.000 title claims description 94
- 238000000034 method Methods 0.000 title claims description 27
- 238000001514 detection method Methods 0.000 claims abstract description 33
- 230000004044 response Effects 0.000 claims abstract description 23
- 238000012545 processing Methods 0.000 claims description 80
- 239000000758 substrate Substances 0.000 claims description 63
- 230000005856 abnormality Effects 0.000 claims description 18
- 239000012530 fluid Substances 0.000 claims description 4
- 238000004378 air conditioning Methods 0.000 claims 2
- 238000000576 coating method Methods 0.000 description 24
- 239000011248 coating agent Substances 0.000 description 22
- 230000008569 process Effects 0.000 description 11
- 238000003825 pressing Methods 0.000 description 8
- 239000010408 film Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000005401 electroluminescence Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 238000011161 development Methods 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 230000002159 abnormal effect Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 239000013039 cover film Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
- F16K31/04—Actuating devices; Operating means; Releasing devices electric; magnetic using a motor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
- H02P8/00—Arrangements for controlling dynamo-electric motors of the kind having motors rotating step by step
- H02P8/14—Arrangements for controlling speed or speed and torque
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
- H02P8/00—Arrangements for controlling dynamo-electric motors of the kind having motors rotating step by step
- H02P8/24—Arrangements for stopping
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
- H02P8/00—Arrangements for controlling dynamo-electric motors of the kind having motors rotating step by step
- H02P8/36—Protection against faults, e.g. against overheating, step-out; Indicating faults
Abstract
The present invention continuously supplies a drive pulse to a stepping motor when a switching valve is to be switched from an open state to a closed state. The valve body is moved toward the valve seat by the rotation of the stepping motor in response to the driving pulse. A detection pulse is output from the encoder in response to rotation of the stepper motor. When the stepping motor stops rotating and a predetermined number of continuous detection pulses are not output from the encoder, the supply of the driving pulse is stopped. In this state, the switching of the on-off valve from the open state to the closed state is completed.
Description
Technical Field
The present invention relates to a processing liquid supply device for supplying a processing liquid to a substrate and a control method of the processing liquid supply device.
Background
Conventionally, a substrate processing apparatus has been used for various processes on various substrates such as a substrate for FPD (Flat Panel Display ), a semiconductor substrate, a substrate for optical disk, a substrate for magnetic disk, a substrate for magneto-optical disk, a substrate for photomask, a ceramic substrate, and a substrate for solar cell, which are used for a liquid crystal display device, an organic EL (Electro Luminescence ) display device, and the like.
In the substrate processing apparatus, for example, a processing liquid is supplied from a processing liquid supply source to a substrate through a pipe and a nozzle. The piping is provided with an on-off valve. The switching valve is switched between an open state in which the processing liquid is discharged from the nozzle and a closed state in which the processing liquid is not discharged from the nozzle.
Patent document 1 describes a switching valve control device for controlling the switching valve. In this on-off valve control device, the position where the valve body of the on-off valve closes the flow path of the processing liquid is set to the closed position. The valve body is driven by a stepping motor based on the set closing position.
The position suitable as the closing position may be changed by abrasion of various members constituting the switching valve. Therefore, the origin (reference) of the closing position is set periodically and passively. In this setting, first, a drive pulse for driving the valve body in the closing direction is supplied to the stepping motor. Next, after detecting the step-out of the stepping motor, a specific number of driving pulses for driving the valve body in the closing direction are further supplied to the stepping motor. Thereafter, a default number of driving pulses for driving the valve body in the opening direction are supplied to the stepping motor. In this way, the origin of the closing position of the valve body is searched, and the searched origin is set.
[ patent document 1] Japanese patent laid-open No. 2004-348227
Disclosure of Invention
[ problem to be solved by the invention ]
As described above, in the origin searching method of the closed position described in patent document 1, after the step-out occurs, a predetermined number of driving pulses are supplied to the stepping motor. At this time, if the current flowing in the stepping motor is large, the stepping motor generates a large torque, and the valve body is strongly pressed against the valve seat. Therefore, if the contact portion between the valve body and the valve seat is greatly deformed by frequent origin search of the closing position, the service life of the on-off valve is shortened and particles are generated.
In the origin searching method, a long time is required to further move the valve body in the closing direction and the opening direction after the occurrence of the step-out.
Further, the stepping motor rotates until a torque acting on the rotor is stabilized at a stable point when the stepping motor is out of step. However, the rotation amount is not always a fixed amount, and it is difficult to accurately grasp the rotation amount. Therefore, if the stepping motor is operated with a predetermined number of drive pulses only after the occurrence of the step-out, it is difficult to say that an appropriate closing position is necessarily set.
The invention aims to provide a treatment liquid supply device and a control method of the treatment liquid supply device, wherein the service life of an on-off valve is prevented from being shortened, and the on-off valve can be properly closed without a long time.
[ means of solving the problems ]
(1) A processing liquid supply apparatus according to an aspect of the present invention is a processing liquid supply apparatus for supplying a processing liquid to a substrate, and includes: a processing liquid flow path through which a processing liquid supplied to the substrate flows; the switching valve comprises a valve seat and a valve body and is arranged in the treatment fluid flow path; a stepping motor for switching the switching valve between an open state and a closed state; a driving unit for supplying a driving pulse to the stepping motor; an encoder outputting a detection pulse in response to rotation of the stepping motor; and a control unit for controlling the driving unit based on the detection pulse output from the encoder; the switching valve is constructed as follows: when switching from the open state to the closed state, the stepping motor rotates in response to a drive pulse supplied by the drive, whereby the valve body moves toward the valve seat; the control unit controls the drive unit so as to continuously supply the drive pulse to the stepping motor when the switching valve is to be switched from the open state to the closed state, and controls the drive unit so as to stop the supply of the drive pulse if a predetermined number of continuous detection pulses are not output from the encoder in response to the continuous supply of the drive pulse to the stepping motor.
In this treatment liquid supply device, when the switching valve is to be switched from the open state to the closed state, a drive pulse is continuously supplied to the stepping motor. Thus, the valve body is moved toward the valve seat by the stepping motor rotating in response to the driving pulse. At this time, a detection pulse is output from the encoder in response to the rotation of the stepping motor.
Thereafter, if the reaction force from the valve seat to the valve body is equalized with the pressing force from the valve body to the valve seat in a state where the valve body is in contact with the valve seat, the valve body stops operating, and the stepping motor stops rotating. Further, if a predetermined number of consecutive detection pulses to be output from the encoder are not output, the supply of the driving pulse is stopped. This completes the switching of the on/off valve from the open state to the closed state, and the flow of the treatment liquid in the treatment liquid flow path is stopped.
In this case, by stopping the supply of the drive pulse in a range where the stepping motor does not generate a step-out, when the switching valve is switched from the open state to the closed state, a large load is suppressed from being generated inside the switching valve, and deformation inside the switching valve is suppressed.
In addition, according to the above-described operation, the valve body is appropriately positioned with respect to the valve seat in a state in which the valve body is moved in one direction toward the valve seat and stopped. Therefore, there is no need to move the valve body in the one direction and the opposite direction with respect to the valve seat in order to search for the position of the valve body to be positioned in the closed state.
Further, according to the above operation, the stepping motor does not need to be out of step, and therefore, the valve body is prevented from being displaced from the valve seat due to the out of step.
As a result, the reduction in the lifetime of the on-off valve can be suppressed and the on-off valve can be closed appropriately without a long time.
(2) The control section can control the driving section as follows: the current value of the drive pulse supplied from the start of the movement of the valve body in the open state to the current switching time point before the supply stop time point of the drive pulse is larger than the current value of the drive pulse supplied from the current switching time point to the supply stop time point of the drive pulse.
In this case, by increasing the current value of the drive pulse supplied from the time when the valve body starts to move to the current switching time point, the torque required for the movement of the valve body can be generated. This prevents the step-out caused by the characteristics of the processing liquid flowing through the switching valve, the frictional force generated when the valve body is operated, and the like.
Further, by reducing the current value of the drive pulse supplied from the current switching time point to the supply stop time point of the drive pulse, the pressing force from the valve body to the valve seat in the closed state is suppressed from being excessively large. Thus, the contact portion between the valve body and the valve seat is prevented from being greatly deformed, and generation of particles from the contact portion is reduced.
(3) The control unit may determine that an abnormality has occurred if the drive pulse is continuously supplied to the stepping motor for a predetermined time when the switching valve is to be switched from the open state to the closed state.
In this case, replacement or maintenance of the component can be performed at an appropriate time based on determination of occurrence of the abnormality.
(4) Another aspect of the present invention provides a method for controlling a processing liquid supply apparatus for supplying a processing liquid to a substrate, the processing liquid supply apparatus including: a processing liquid flow path through which a processing liquid supplied to the substrate flows; the switching valve comprises a valve seat and a valve body and is arranged in the treatment fluid flow path; a stepping motor for switching the switching valve between an open state and a closed state; a driving unit for supplying a driving pulse to the stepping motor; and an encoder outputting a detection pulse in response to rotation of the stepping motor; the switching valve is constructed as follows: when switching from the open state to the closed state, the stepping motor rotates in response to a driving pulse supplied through the driving section, whereby the valve body moves toward the valve seat, the control method comprising the steps of: when the switch valve is to be switched from the open state to the closed state, the drive unit is controlled to continuously supply the drive pulse to the stepping motor; if a predetermined number of continuous detection pulses are not outputted from the encoder in response to continuous supply of the drive pulses to the stepping motor, the drive unit is controlled so as to stop the supply of the drive pulses.
In the control method of the processing liquid supply device, when the switching valve is switched from the open state to the closed state, the drive pulse is continuously supplied to the stepping motor. Thus, the valve body is moved toward the valve seat by the stepping motor rotating in response to the driving pulse. At this time, a detection pulse is output from the encoder in response to the rotation of the stepping motor.
Thereafter, if the reaction force from the valve seat to the valve body is equalized with the pressing force from the valve body to the valve seat in a state where the valve body is in contact with the valve seat, the valve body stops operating, and the stepping motor stops rotating. Further, if a predetermined number of consecutive detection pulses to be output from the encoder are not output, the supply of the driving pulse is stopped. This completes the switching of the on/off valve from the open state to the closed state, and the flow of the treatment liquid in the treatment liquid flow path is stopped.
In this case, by stopping the supply of the drive pulse in a range where the stepping motor does not generate a step-out, when the switching valve is switched from the open state to the closed state, a large load is suppressed from being generated inside the switching valve, and deformation inside the switching valve is suppressed.
In addition, according to the above-described operation, the valve body is appropriately positioned with respect to the valve seat in a state in which the valve body is moved in one direction toward the valve seat and stopped. Therefore, there is no need to move the valve body in the one direction and the opposite direction with respect to the valve seat in order to search for the position of the valve body to be positioned in the closed state.
Further, according to the above operation, the stepping motor does not need to be out of step, and therefore, the valve body is prevented from being displaced from the valve seat due to the out of step.
As a result, the reduction in the lifetime of the on-off valve can be suppressed and the on-off valve can be closed appropriately without a long time.
(5) The method for controlling the treatment liquid supply device may further include the steps of: the driving unit is controlled such that the current value of the driving pulse supplied from the start of the movement of the valve body in the open state to the current switching time point before the supply stop time point of the driving pulse is larger than the current value of the driving pulse supplied from the current switching time point to the supply stop time point of the driving pulse.
In this case, by increasing the current value of the drive pulse supplied from the time when the valve body starts to move to the current switching time point, the torque required for the movement of the valve body can be generated. This prevents the step-out caused by the characteristics of the processing liquid flowing through the switching valve, the frictional force generated when the valve body is operated, and the like.
Further, by reducing the current value of the drive pulse supplied from the current switching time point to the supply stop time point of the drive pulse, the pressing force from the valve body to the valve seat in the closed state is suppressed from being excessively large. Thus, a large deformation is prevented from occurring in the contact portion between the valve body and the valve seat, and generation of particles from the contact portion is reduced.
(6) The control method of the treatment liquid supply device may further include the steps of: when the switching valve is to be switched from an open state to a closed state, if a drive pulse is continuously supplied to the stepping motor for a predetermined time, it is determined that an abnormality has occurred.
In this case, the replacement or maintenance of the on-off valve can be performed at an appropriate time based on the determination of the abnormality.
[ Effect of the invention ]
According to the present invention, the reduction in the lifetime of the on-off valve can be suppressed and the on-off valve can be closed appropriately without a long time.
Drawings
Fig. 1 is a schematic block diagram showing the configuration of a substrate processing apparatus according to an embodiment of the present invention.
Fig. 2 is a block diagram for explaining the configuration of the processing liquid supply device corresponding to the developing unit of fig. 1.
Fig. 3 is a diagram showing an example of the switching operation of the switching valve of fig. 2.
Fig. 4 is a flowchart showing an example of the opening/closing control process of the opening/closing valve performed by the valve control unit of fig. 2.
Detailed Description
A processing liquid supply device and a control method of the processing liquid supply device according to an embodiment of the present invention will be described below with reference to the drawings. In the following description, the substrate refers to a FPD (Flat Panel Display) substrate, a semiconductor substrate, an optical disk substrate, a magnetic disk substrate, a magneto-optical disk substrate, a photomask substrate, a ceramic substrate, a solar cell substrate, or the like used for a liquid crystal display device, an organic EL (Electro Luminescence) display device, or the like.
(1) Substrate processing apparatus having processing liquid supply device
A substrate processing apparatus including a processing liquid supply device will be described. Fig. 1 is a schematic block diagram showing the configuration of a substrate processing apparatus according to an embodiment of the present invention. As shown in fig. 1, the substrate processing apparatus 100 is provided adjacent to an exposure apparatus 500, and includes a coating processing unit 110, a developing processing unit 120, a heat processing unit 130, a conveying unit 140, a control device 150, and a plurality of on-off valve devices V1 and V2.
The coating processing section 110 includes a plurality of coating units SC. Each coating unit SC includes a spin chuck 91 and a discharge nozzle 92. The spin chuck 91 rotatably holds an unprocessed substrate W in a horizontal posture. The resist liquid is supplied from a coating liquid supply source 1 provided outside the substrate processing apparatus 100 to the discharge nozzle 92 through a pipe p1. The discharge nozzle 92 discharges the supplied resist liquid toward the upper surface of the substrate W held by the spin chuck 91 (coating process). Thereby, a resist film is formed on one surface of the unprocessed substrate W. The substrate W on which the resist film is formed is subjected to exposure processing in the exposure apparatus 500.
In the coating process section 110, an antireflection film may be formed on the substrate W. In this case, the heat treatment section 130 may perform adhesion strengthening treatment for improving adhesion between the substrate W and the antireflection film. In the coating processing section 110, a resist cover film for protecting the resist film may be formed on the substrate W on which the resist film is formed.
The development processing portion 120 includes a plurality of development units SD. Each developing unit SD includes a spin chuck 93 and a discharge nozzle 94, similarly to the coating unit SC. The spin chuck 93 rotatably holds the substrate W subjected to the exposure process by the exposure apparatus 500 in a horizontal posture. The developer is supplied from a developer supply source 2 provided outside the substrate processing apparatus 100 to the discharge nozzle 94 through a pipe p 2. The discharge nozzle 94 discharges the supplied developer toward the upper surface of the substrate W held by the spin chuck 93 (development process).
The heat treatment section 130 performs heat treatment of the substrate W before and after the coating treatment by each coating unit SC of the coating treatment section 110, the developing treatment by the developing treatment section 120, and the exposure treatment by the exposure device 500.
The transport unit 140 includes a transport robot for transporting the substrate W. The transfer robot of the transfer unit 140 transfers the substrate W between another transfer robot provided outside the substrate processing apparatus 100, the coating processing unit 110, the developing processing unit 120, the heat processing unit 130, and the exposure apparatus 500.
The control device 150 includes, for example, a CPU (Central Processing Unit ) and a memory, or a microcomputer, and controls operations of the coating processing unit 110, the developing processing unit 120, the heat processing unit 130, and the conveying unit 140.
An on-off valve device V1 for switching between supply and stop of the resist solution to the substrate W is provided in each of the plurality of coating units SC of the coating processing section 110 and the plurality of pipes p1 of the coating solution supply source 1. Further, a switching valve device V2 for switching between supply and stop of the developer to the substrate W is provided in each of the plurality of developing units SD of the developing unit 120 and the plurality of pipes p2 of the developer supply source 2. Each of the plurality of switching valve devices V1 and V2 is controlled by the valve control unit 200 of the control device 150.
In the substrate processing apparatus 100 of fig. 1, the piping p1, the switching valve device V1, and the valve control unit 200 provided in correspondence with each application unit SC constitute a processing liquid supply device. The piping p2 and the switching valve device V2 provided in correspondence with each developing unit SD and the valve control section 200 constitute a processing liquid supply device.
(2) Specific constitution and operation of treatment liquid supply device
Fig. 2 is a block diagram for explaining the configuration of the treatment liquid supply device corresponding to the coating unit SC in fig. 1. As shown in fig. 2, the treatment liquid supply apparatus 300 includes a pipe p1, a switching valve device V1, and a valve control unit 200.
The switching valve device V1 includes a switching valve 10, a stepping motor 20, a switching mechanism 30, a driving unit 40, and an encoder 50. The on-off valve 10 has a valve housing 11. An internal space is formed in the valve housing 11. A part of the internal space is divided by a diaphragm 12 into a flow path space 11a forming a flow path of a processing liquid (in this example, a resist liquid). The valve housing 11 is provided with an inflow port 11b and an outflow port 11c communicating with the flow path space 11a. The pipe p1 is connected to the inflow port 11b and the outflow port 11c.
The diaphragm 12 is formed of, for example, fluorinated resin or rubber. The central portion of the diaphragm 12 functions as a valve body 12 a. A valve seat 11s is formed in the valve housing 11 so as to face the valve body 12a through the flow path space 11a. The valve seat 11s has an opening 11o for guiding out the processing liquid (resist liquid in this example) in the flow path space 11a to the outflow port 11c. The opening 11o is openable and closable by movement of the valve body 12a in one direction or the opposite direction with respect to the valve seat 11s. Hereinafter, the direction in which the valve body 12a approaches the valve seat 11s from the position away from the valve seat 11s is referred to as a closing direction, and the opposite direction is referred to as an opening direction. A valve rod 13 is further provided in the valve box 11. The valve stem 13 is connected to the valve body 12a, and extends from the valve body 12a in the opening direction.
The stepping motor 20 of the present example is, for example, a two-phase stepping motor, and is used as a power source for switching the on/off state of the on/off valve 10 by moving the valve body 12a through the valve rod 13. As the stepping motor 20, a three-phase type or a five-phase type stepping motor may be used.
The conversion mechanism 30 includes, for example, a rack and pinion mechanism, and converts a rotational force generated by the stepping motor 20 into a force for moving the valve stem 13 in the closing direction or the opening direction. The switching mechanism 30 switches the force acting in the closing direction or the opening direction with respect to the valve stem 13 to a force that rotates the rotation axis of the stepping motor 20 in one direction or the opposite direction.
The driving unit 40 is connected to a direct current power supply, not shown, and supplies driving pulses to the stepping motor 20 based on control of the valve control unit 200, which will be described later. Thus, the stepping motor 20 rotates in one direction or the opposite direction by an angle corresponding to the number of driving pulses supplied.
The encoder 50 is a rotary encoder, detects the rotation amount of a rotor (not shown) of the stepping motor 20, and outputs a pulse signal (hereinafter, referred to as a detection pulse) as a detection signal. For example, if the stepping motor 20 is rotated by an angle amount corresponding to a driving pulse by supplying the driving pulse to the stepping motor 20, the encoder 50 outputs a detection pulse. On the other hand, even if a drive pulse is supplied to the stepping motor 20, the encoder 50 does not output a detection pulse when the stepping motor 20 does not rotate.
The valve control unit 200 includes an abnormality determination unit 210, a switching determination unit 220, a pulse control unit 230, a current adjustment unit 240, and a setting storage unit 250. The functions are realized by, for example, a CPU of the control device 150 of fig. 1 executing a computer program stored in a memory. Part or all of the above-described configuration may be realized by hardware such as an electronic circuit.
The operation of each functional unit of the valve control unit 200 will be described together with the opening and closing operation of the opening and closing valve 10. Fig. 3 is a diagram showing an example of the switching operation of the switching valve 10 of fig. 2. The upper section of fig. 3 shows the position of the valve body 12a with time by a curve. In the upper graph of fig. 3, the vertical axis represents the relative position of the valve body 12a with respect to the valve seat 11s, and the horizontal axis represents time. In the vertical axis, advancing in the direction of the arrow means that the valve body 12a moves in the opening direction, and advancing in the direction opposite to the direction of the arrow means that the valve body 12a moves in the closing direction. The state inside the on-off valve 10 among a plurality of time points t0 to t5 shown in the graph of the upper stage is shown in the schematic cross-sectional view in the lower stage of fig. 3.
In this example, the on-off valve 10 is in the closed state in the initial state at the time point t 0. The initial position of the valve body 12a at this time is denoted by the symbol pp. In the valve control unit 200, when the coating unit SC in fig. 1 starts to supply the resist solution to the substrate W, the switching valve 10 is instructed to switch from the closed state to the open state. When the coating unit SC stops supplying the resist solution to the substrate W, the switching valve 10 is instructed to switch from the open state to the closed state.
The setting storage unit 250 of fig. 2 stores a drive pulse number (hereinafter, referred to as an opening pulse number) m that is set in advance to switch the on/off valve 10 from the closed state to the open state. The number m of the on pulses is 400, for example. In the setting storage unit 250, a 1 st current value of a drive pulse preset to switch the on/off valve 10 from the closed state to the open state is stored. The 1 st current value is set to a large value (for example, 0.2 (a)) so as not to cause step-out of the stepping motor 20, considering the characteristics of the processing liquid (resist liquid in this example) flowing through the switching valve 10 and the frictional force generated when the valve body 12a moves.
If the switching valve 10 is instructed to switch from the closed state to the open state at time t0 in fig. 3, the pulse control unit 230 controls the driving unit 40 so that the driving pulse for moving the valve body 12a in the opening direction is continuously supplied to the stepping motor 20 by the number m of opening pulses. The current adjustment unit 240 controls the driving unit 40 so that the current value of the driving pulse becomes the 1 st current value.
Thus, from time t0 to time t1, valve body 12a moves from initial position pp to position pa corresponding to the open state of switching valve 10. Thus, the resist liquid flows through the pipe p1 by the switching valve 10.
The setting storage unit 250 stores a preset number of drive pulses (hereinafter, referred to as the number of off pulses) n for switching the current value of the drive pulses when the on-off valve 10 is switched from the on state to the off state. The number of closing pulses n is less than or equal to the number of opening pulses m. The difference (difference) between the number of closing pulses n and the number of opening pulses m is preferably 0 or more and 1/2 or less, preferably 0 or more and 10 or less, of the number of opening pulses m. In the case where the number of open pulses m is 400, the number of close pulses n may be 398, for example.
In the setting storage unit 250, the 2 nd and 3 rd current values of the drive pulse preset to switch the on/off valve 10 from the closed state to the open state are stored. The current 2 corresponds to the drive pulse of the off pulse number n, and is set to a large value (for example, 0.2 (a)) in the same manner as the current 1 so as not to cause the step motor 20 to be out of step. The 2 nd current value may be equal to the 1 st current value. On the other hand, the 3 rd current value is set to a value lower than the 1 st and 2 nd current values (for example, 0.07 (a)) so as not to excessively increase the pressing force applied from the valve body 12a to the valve seat 11s when the on-off valve 10 is closed.
If the switching valve 10 is instructed to switch from the open state to the closed state at time t2, the pulse control unit 230 controls the driving unit 40 so that the driving pulse for moving the valve body 12a in the closing direction is continuously supplied to the stepping motor 20 by the closing pulse number n. The current adjustment unit 240 controls the driving unit 40 so that the current value of the driving pulse becomes the 2 nd current value while the driving pulse of the off pulse number n is supplied to the stepping motor 20.
Thus, in the case where the closing pulse number n is smaller than the opening pulse number m, from the time point t2 to the time point t3, the valve body 12a moves to the position pb shifted by the fixed distance in the opening direction from the position pp.
After time t3, the current adjustment unit 240 controls the driving unit 40 so that the current value of the driving pulse becomes the 3 rd current value until the switching valve 10 is in the closed state.
If the reaction force from the valve seat 11s to the valve body 12a is balanced with the pressing force from the valve body 12a to the valve seat 11s when the stepping motor 20 is driven at the 3 rd current value, the valve body 12a stops moving in the closing direction. Thus, even when the drive pulse is supplied from the drive unit 40 to the stepping motor 20, the detection pulse is not output from the encoder 50.
The setting storage unit 250 stores a predetermined number k that is set in advance for determining that the switching valve 10 has completed switching from the open state to the closed state. The switching determination unit 220 monitors the control state of the pulse control unit 230 to the driving unit 40, and monitors the detection pulse output from the stepping motor 20. As a result of the monitoring, the switching determination unit 220 determines that the switching of the on-off valve 10 to the closed state is completed when the continuous detection pulse of the predetermined number k is not output from the encoder 50 in response to the continuous drive pulse supply.
If the pulse control unit 230 determines that the switching of the on-off valve 10 to the closed state is completed by the switching determination unit 220, the supply of the driving pulse from the driving unit 40 to the stepping motor 20 is stopped.
Here, if a predetermined number of driving pulses are further supplied to the stepping motor 20 so that the valve body 12a moves in the closing direction in a state where the valve body 12a is stopped with respect to the rotation of the stepping motor 20, the stepping motor 20 is out of step. When the stepping motor 20 is out of step, the position of the valve body 12a changes. It is difficult to grasp the fluctuation amount. Therefore, the predetermined number k is defined so that the stepping motor 20 does not lose step, and is 2 in this example.
In the example of fig. 3, from time point t3 to time point t4, the valve body 12a moves in the closing direction in response to the supply of the drive pulse, but its movement is stopped at time point t 4. Thereafter, at time t5, it is determined that switching of the on-off valve 10 to the closed state is completed.
As described above, if the switching valve 10 is switched to the closed state, the rotation angle of the stepping motor 20 is maintained, and the position of the valve body 12a is fixed. In the example of fig. 3, the valve body 12a is fixed at a position pc slightly shifted in the closing direction from the initial position pp. This means that the position of the valve body 12a when the on-off valve 10 is in the closed state is changed to a position pc more appropriate than the position pp at the time point t 0. Thus, the flow of the processing liquid (in this example, the resist liquid) through the pipe p1 is appropriately blocked by the on-off valve 10.
In a series of operations when the on-off valve 10 is switched to the closed state, any one of the on-off valve 10, the stepping motor 20, and the encoder 50 may be abnormal, and thus it may not be possible to accurately determine that the on-off valve 10 is switched to the closed state.
For example, in the encoder 50, if it cannot be determined that the switching valve 10 has completed switching to the closed state due to continuous generation of noise having the same waveform as the detection pulse, the supply of the drive pulse to the stepping motor 20 is not stopped. In this case, the stepping motor 20 generates a step-out. Alternatively, if the valve body 12a is deviated from the valve stem 13, the valve stem 13 moves beyond the position where it should be stopped, and collides with the valve seat 11s.
Therefore, the abnormality determination unit 210 determines that an abnormality has occurred when the drive pulse is continuously supplied for a predetermined time period when the switching valve 10 is switched from the open state to the closed state. In the example of fig. 3, the abnormality determination unit 210 determines that an abnormality has occurred, for example, when the drive pulse is continuously supplied from the time point t3 for more than a predetermined time period set in advance. The abnormality determination unit 210 outputs the determination result. In this case, replacement or maintenance of the component can be performed at an appropriate time based on the determination of occurrence of the abnormality.
In addition, a presentation device (a display device, a sound output device, or the like) for presenting the determination result of the abnormality output from the abnormality determination unit 210 to the user may be provided in the processing liquid supply device 300. In this case, the user can easily grasp that the switching valve device V2 is abnormal.
The processing liquid supply device corresponding to the developing unit SD of fig. 1 has substantially the same configuration and operation as the processing liquid supply device 300 of fig. 3 and 4.
(3) Switch control processing of the switch valve 10
Fig. 4 is a flowchart showing an example of the opening/closing control process of the opening/closing valve 10 performed by the valve control unit 200 of fig. 2. The switching control process is started by providing the valve control unit 200 with a switching instruction to switch the on/off state of the switching valve 10. In the following description, a counter is incorporated in the valve control unit 200. Further, a timer is incorporated in the valve control unit 200.
First, the pulse control unit 230 determines whether or not the command provided at the start is a command to switch the on/off valve 10 from the open state to the closed state (step S11).
When the command at the start is a command to switch from the on state to the off state, the pulse control unit 230 and the current adjustment unit 240 control the driving unit 40 as follows: the step motor 20 is continuously supplied with the drive pulse of the off pulse number n at the current value 2 (step S12). At this time, the driving pulse supplied to the stepping motor 20 corresponds to the movement of the valve body 12a in the closing direction. Thereby, the valve body 12a moves in the closing direction with high torque. Further, the switching determination unit 220 resets the value of the counter and resets the timer, and starts time measurement by the timer (step S13).
Next, the abnormality determination unit 210 determines whether or not a predetermined time period has elapsed from the time measurement of the timer (step S14). If a predetermined time period set in advance has not elapsed from the time measurement start time point of the timer, the pulse control unit 230 and the current adjustment unit 240 control the driving unit 40 as follows: a driving pulse is supplied to the stepping motor 20 at the 3 rd current value (step S15). At this time, the driving pulse supplied to the stepping motor 20 corresponds to the movement of the valve body 12a in the closing direction.
Next, the switching determination unit 220 determines whether or not to output a detection pulse from the encoder 50 in response to the drive pulse supplied in step S15 (step S16). In the case of outputting the detection pulse, the process returns from step S12 to step S14. On the other hand, when the detection pulse is not output, the switching determination unit 220 increments the counter value (step S17). The switching determination unit 220 determines whether or not the detection pulse is not output continuously by a predetermined number k based on the value of the counter (step S18).
If the detection pulse is not output, the process returns from step S18 to step S14 without continuously determining the number k. On the other hand, if the detection pulse is not output, the switching control process is terminated in a state where the supply of the drive pulse to the stepping motor 20 is stopped, if the detection pulse is continuously given by the predetermined number k.
In step S11, when the command at the start is a command to switch to the on state, the pulse control unit 230 controls the driving unit 40 as follows: the step motor 20 is continuously supplied with driving pulses of the opening pulse number m at the 1 st current value (step S19). At this time, the driving pulse supplied to the stepping motor 20 corresponds to the movement of the valve body 12a in the opening direction. Thereby, the valve body 12a moves in the opening direction with a high torque. Thereafter, the switching control process ends.
In step S14, when a predetermined time set in advance has elapsed since the start of time measurement by the timer, the abnormality determination unit 210 determines that an abnormality has occurred, and outputs the determination result to the outside of the valve control unit 200 (step S20). Thereafter, the switching control process ends.
(4) Effects of
In the treatment liquid supply apparatus 300, when the switching valve 10 is switched from the open state to the closed state, a driving pulse is continuously supplied to the stepping motor 20. The valve body 12a is moved toward the valve seat 11s by the stepping motor 20 rotating in response to the driving pulse. At this time, a detection pulse is output from the encoder 50 in response to the rotation of the stepping motor 20.
If the reaction force from the valve seat 11s to the valve body 12a is balanced with the pressing force from the valve body 12a to the valve seat 11s in a state where the valve body 12a is in contact with the valve seat 11s, the valve body 12a stops moving in the closing direction, and the stepping motor 20 stops rotating. Next, if a predetermined number k of consecutive detection pulses to be output from the encoder 50 are not output, the supply of the driving pulse is stopped. This completes the switching of the on/off valve 10 from the open state to the closed state, and the flow of the processing liquid in the pipes p1 and p2 is stopped.
In this case, by stopping the supply of the drive pulse in a range where the stepping motor 20 does not generate a step-out, when the switching state of the switching valve 10 is switched, a large load is suppressed from being generated inside the switching valve 10. Thereby, deformation of the inside of the on-off valve 10 is suppressed.
In addition, according to the above operation, the valve body 12a is appropriately positioned with respect to the valve seat 11s in a state where the valve body 12a is moved in the closing direction and stopped. Therefore, it is not necessary to move the valve body 12a in the opening direction and the closing direction with respect to the valve seat 11s, respectively, in order to search for the position of the valve body 12a to be positioned in the closed state.
Further, according to the above operation, the stepping motor 20 does not need to be out of step, and therefore, the valve body 12a is prevented from being displaced relative to the valve seat 11s due to the out of step.
As a result, the lifetime of the on-off valve 10 can be suppressed from being shortened and the on-off valve 10 can be closed appropriately without a long time.
(b) In the treatment liquid supply apparatus 300, when the switching valve 10 is switched from the open state to the closed state, the stepping motor 20 is driven at the 2 nd current value while the driving pulse of the closing pulse number n is supplied to the stepping motor 20. This prevents the step-out from occurring due to the characteristics of the processing liquid flowing through the switching valve, the frictional force generated when the valve body 12a is operated, and the like.
Thereafter, the current value of the drive pulse supplied to the stepping motor 20 is changed to the 3 rd current value until the supply of the drive pulse is stopped. In this case, the pressing force from the valve body 12a to the valve seat 11s in the closed state is suppressed from being excessively large. Thereby, the contact portion between the valve body 12a and the valve seat 11s is prevented from being greatly deformed, and generation of particles from the contact portion is reduced.
(5) Other embodiments
(a) In the above embodiment, the switching of the on/off state of the on/off valve 10 of the processing liquid supply device 300 is performed when the supply and the stop of the processing liquid (resist liquid, developing liquid, or the like) to the substrate W are switched, but the present invention is not limited thereto.
An instruction to switch the on-off state of the on-off valve 10 may be provided to the valve control section 200 by a user operating an operation section of the substrate processing apparatus 100, which is not shown. In this case, the user can instruct the means for supplying the processing liquid to the substrate W (in this example, the coating means SC and the developing means SD) to switch the on-off valve 10 in the same manner as in the example of fig. 3.
As shown in fig. 3, a series of operations for sequentially switching the on/off valve 10 in the closed state to the open state and the closed state may be performed passively every fixed cycle or a predetermined number of batches. Alternatively, the initialization operation of each unit (in this example, the coating unit SC and the developing unit SD) may be performed as follows when the power supply of the substrate processing apparatus 100 is turned on.
(b) In the above embodiment, the processing liquid supply device is applied to the resist liquid supply system for supplying the resist liquid to the substrate W and the developer liquid supply system for supplying the developer liquid to the substrate W, respectively, but the present invention is not limited thereto.
The treatment liquid supply apparatus of the present invention is applicable to a coating liquid supply system for supplying various coating liquids for forming an antireflection film, a resist cover film, and the like on a substrate W. Alternatively, the treatment liquid supply apparatus of the present invention may be applied to a cleaning liquid supply system for supplying a cleaning liquid such as pure water or chemical liquid to the substrate W.
(c) In the above embodiment, a rotary encoder is used as the encoder 50 for detecting the rotation of the stepping motor 20, but the present invention is not limited thereto. The encoder 50 may be a linear encoder that detects movement of the valve stem 13 in the opening direction and the closing direction. In this case, the movement of the valve rod 13 in the opening direction and the closing direction detected by the linear encoder can be detected as the rotation of the stepping motor 20.
(d) In the above embodiment, the current value of the drive pulse supplied to the stepping motor 20 when the switching valve 10 is switched from the open state to the closed state is changed in 2 steps, but the present invention is not limited to this. The current value of the driving pulse supplied to the stepping motor 20 when the switching valve 10 is switched from the open state to the closed state may be fixed. When the torque required to move the valve stem 13 is extremely small due to the low viscosity of the treatment liquid, the low friction generated when the valve stem 13 is operated, or the like, the current value is preferably set to the 3 rd current value.
(6) Correspondence between each constituent element in the claims and each element of the embodiment
In the following, corresponding examples of the respective components in the claims and the respective components of the embodiments will be described. In the above embodiment, the resist solution and the developer solution are examples of the processing solution, the pipes p1 and p2 are examples of the processing solution flow path, the valve control unit 200 is an example of the control unit, and the time point (time point t3 in fig. 3) at which all the drive pulses of the number n of the off pulses are supplied to the stepping motor 20 is an example of the current switching time point.
As each constituent element in the claims, other various elements having the constitution or function described in the claims may be used.
Claims (6)
1. A processing liquid supply device supplies a processing liquid to a substrate, and includes:
a processing liquid flow path through which a processing liquid supplied to the substrate flows;
the switching valve comprises a valve seat and a valve body and is arranged in the treatment fluid flow path;
a stepping motor for switching the switching valve between an open state and a closed state;
a driving unit configured to supply a driving pulse to the stepping motor;
an encoder that outputs a detection pulse in response to rotation of the stepping motor; a kind of electronic device with high-pressure air-conditioning system
A control unit that controls the driving unit based on the detection pulse output from the encoder; and is also provided with
The switching valve is constructed in the following manner: when switching from the open state to the closed state, the stepping motor rotates in response to the driving pulse supplied from the driving section, whereby the valve body moves toward the valve seat,
the control unit controls the drive unit so as to continuously supply the drive pulse to the stepping motor when the switching valve is to be switched from the open state to the closed state, and controls the drive unit so as to stop the supply of the drive pulse if a predetermined number of continuous detection pulses are not output from the encoder in response to the continuous supply of the drive pulse to the stepping motor.
2. The treatment liquid supply apparatus according to claim 1, wherein the control section controls the driving section in such a manner that: the current value of the drive pulse supplied from the start of the movement of the valve body in the open state to a current switching time point before the supply stop time point of the drive pulse is larger than the current value of the drive pulse supplied from the current switching time point to the supply stop time point of the drive pulse.
3. The treatment liquid supply apparatus according to claim 1 or 2, wherein the control section determines that an abnormality is generated if the drive pulse is continuously supplied to the stepping motor for a predetermined time when the switching valve is to be switched from the open state to the closed state.
4. A control method of a processing liquid supply device for supplying a processing liquid to a substrate, and
the treatment liquid supply device includes:
a processing liquid flow path through which a processing liquid supplied to the substrate flows;
the switching valve comprises a valve seat and a valve body and is arranged in the treatment fluid flow path;
a stepping motor for switching the switching valve between an open state and a closed state;
a driving unit configured to supply a driving pulse to the stepping motor; a kind of electronic device with high-pressure air-conditioning system
An encoder that outputs a detection pulse in response to rotation of the stepping motor;
the switching valve is constructed in the following manner: when switching from the open state to the closed state, the stepping motor rotates in response to the driving pulse supplied through the driving section, whereby the valve body moves toward the valve seat,
the control method comprises the following steps:
when the switching valve is to be switched from the open state to the closed state, the driving section is controlled so as to continuously supply the driving pulse to the stepping motor;
the driving section is controlled so as to stop the supply of the driving pulse if a predetermined number of continuous detection pulses are not outputted from the encoder in response to the continuous supply of the driving pulse to the stepping motor.
5. The method for controlling a treatment liquid supply apparatus according to claim 4, further comprising the steps of: the driving unit is controlled such that a current value of the driving pulse supplied from a start of movement of the valve body in the open state to a current switching time point before a supply stop time point of the driving pulse is larger than a current value of the driving pulse supplied from the current switching time point to the supply stop time point of the driving pulse.
6. The control method of a treatment liquid supply apparatus according to claim 4 or 5, further comprising the steps of: when the switching valve is to be switched from the open state to the closed state, if the driving pulse is continuously supplied to the stepping motor for a predetermined time, it is determined that an abnormality is generated.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019053369A JP7223609B2 (en) | 2019-03-20 | 2019-03-20 | Treatment liquid supply device and method of controlling treatment liquid supply device |
| JP2019-053369 | 2019-03-20 | ||
| PCT/JP2020/004186 WO2020189059A1 (en) | 2019-03-20 | 2020-02-04 | Processing liquid supply device and control method for processing liquid supply device |
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| CN113544419A CN113544419A (en) | 2021-10-22 |
| CN113544419B true CN113544419B (en) | 2024-01-23 |
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| CN202080019247.1A Active CN113544419B (en) | 2019-03-20 | 2020-02-04 | Treatment liquid supply device and control method for treatment liquid supply device |
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| JP (1) | JP7223609B2 (en) |
| KR (1) | KR102548556B1 (en) |
| CN (1) | CN113544419B (en) |
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| TWI750579B (en) | 2021-12-21 |
| TW202040632A (en) | 2020-11-01 |
| KR102548556B1 (en) | 2023-06-27 |
| KR20210124449A (en) | 2021-10-14 |
| WO2020189059A1 (en) | 2020-09-24 |
| JP2020155620A (en) | 2020-09-24 |
| JP7223609B2 (en) | 2023-02-16 |
| CN113544419A (en) | 2021-10-22 |
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