CN113544419A - Processing liquid supply device and control method of processing liquid supply device - Google Patents
Processing liquid supply device and control method of processing liquid supply device Download PDFInfo
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- CN113544419A CN113544419A CN202080019247.1A CN202080019247A CN113544419A CN 113544419 A CN113544419 A CN 113544419A CN 202080019247 A CN202080019247 A CN 202080019247A CN 113544419 A CN113544419 A CN 113544419A
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- 239000007788 liquid Substances 0.000 title claims description 103
- 238000012545 processing Methods 0.000 title claims description 87
- 238000000034 method Methods 0.000 title claims description 31
- 238000001514 detection method Methods 0.000 claims abstract description 32
- 230000004044 response Effects 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims description 63
- 230000005856 abnormality Effects 0.000 claims description 20
- 238000000576 coating method Methods 0.000 description 25
- 239000011248 coating agent Substances 0.000 description 22
- 230000008569 process Effects 0.000 description 15
- 239000010408 film Substances 0.000 description 8
- 238000003825 pressing Methods 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000005401 electroluminescence Methods 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 239000013039 cover film Substances 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
- F16K31/04—Actuating devices; Operating means; Releasing devices electric; magnetic using a motor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
- H02P8/00—Arrangements for controlling dynamo-electric motors of the kind having motors rotating step by step
- H02P8/14—Arrangements for controlling speed or speed and torque
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
- H02P8/00—Arrangements for controlling dynamo-electric motors of the kind having motors rotating step by step
- H02P8/24—Arrangements for stopping
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
- H02P8/00—Arrangements for controlling dynamo-electric motors of the kind having motors rotating step by step
- H02P8/36—Protection against faults, e.g. against overheating, step-out; Indicating faults
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mechanical Engineering (AREA)
- Electrically Driven Valve-Operating Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Stepping Motors (AREA)
Abstract
The present invention is to continuously supply a drive pulse to a stepping motor when an on-off valve is to be switched from an open state to a closed state. The valve body is moved toward the valve seat by the rotation of the stepping motor in response to the drive pulse. The detection pulse is output from the encoder in response to the rotation of the stepping motor. When the stepping motor stops rotating and a predetermined number of consecutive detection pulses are not output from the encoder, the supply of the drive pulse is stopped. In this state, the switching of the on-off valve from the open state to the closed state is completed.
Description
Technical Field
The present invention relates to a processing liquid supply apparatus for supplying a processing liquid to a substrate and a method of controlling the processing liquid supply apparatus.
Background
Conventionally, a substrate processing apparatus has been used for performing various processes on various substrates such as a substrate for FPD (Flat Panel Display), a semiconductor substrate, a substrate for optical disc, a substrate for magnetic disc, a substrate for magneto-optical disc, a substrate for photomask, a ceramic substrate, and a substrate for solar cell, which are used in a liquid crystal Display device, an organic EL (Electro Luminescence) Display device, and the like.
In a substrate processing apparatus, a processing liquid is supplied to a substrate from a processing liquid supply source through a pipe and a nozzle, for example. The piping is provided with an on-off valve. The on-off valve switches between an open state in which the treatment liquid is discharged from the nozzle and a closed state in which the treatment liquid is not discharged from the nozzle.
Patent document 1 describes an on-off valve control device for controlling the on-off valve. In this switching valve control device, the position at which the valve body of the switching valve closes the flow path of the processing liquid is set to the closing position. The valve body is driven by a stepping motor based on the set closed-end position.
The position suitable as the closed position may be changed by abrasion of various members constituting the on-off valve. Therefore, the origin (reference) of the closed-end position is set periodically and in a driven manner. In this setting, first, a drive pulse for driving the valve body in the closing direction is supplied to the stepping motor. Next, after detecting the step loss of the stepping motor, a specific number of drive pulses for driving the valve body in the closing direction are supplied to the stepping motor. Thereafter, a predetermined number of drive pulses for driving the valve body in the opening direction are supplied to the stepping motor. In this way, the origin of the closed position of the valve body is searched, and the searched origin is set.
[ patent document 1] Japanese patent application laid-open No. 2004-348227
Disclosure of Invention
[ problems to be solved by the invention ]
As described above, in the origin point search method for a closed position described in patent document 1, after a step-out occurs, a predetermined number of drive pulses are supplied to the stepping motor. At this time, if the current flowing through the stepping motor is large, the stepping motor generates a large torque, and the valve body is strongly pressed against the valve seat. Therefore, if the contact portion between the valve body and the valve seat is largely deformed due to frequent origin search of the closed position, the service life of the on-off valve is shortened, and particles are generated.
In the above-described origin retrieval method, since the valve body is further moved in the closing direction and the opening direction after the step-out occurs, a long time is required.
Further, the stepping motor rotates to a stable point where the torque acting on the rotor is stable when the stepping motor is out of step. However, the rotation amount is not always a fixed amount, and it is difficult to accurately grasp the rotation amount. Therefore, if the stepping motor is operated with a predetermined number of drive pulses only after step-out occurs, it is difficult to say that an appropriate closing position is always set.
The invention aims to provide a processing liquid supply device and a control method of the processing liquid supply device, which can restrain the service life of an on-off valve from shortening and can properly close the on-off valve without needing a long time.
[ means for solving problems ]
(1) A processing liquid supply apparatus according to an aspect of the present invention is a processing liquid supply apparatus for supplying a processing liquid to a substrate, and includes: a processing liquid flow path through which a processing liquid to be supplied to the substrate flows; a switching valve including a valve seat and a valve body and disposed in the treatment liquid flow path; a stepping motor that switches the on-off valve between an open state and a closed state; a drive unit which supplies a drive pulse to the stepping motor; an encoder that outputs a detection pulse in response to rotation of the stepping motor; and a control unit for controlling the drive unit based on the detection pulse output by the encoder; the switching valve is constructed in the following manner: when switching from the open state to the closed state is to be made, the stepping motor rotates in response to a drive pulse supplied by the drive, whereby the valve body moves toward the valve seat; the control unit controls the drive unit to continuously supply the drive pulse to the stepping motor when the on-off valve is to be switched from the open state to the closed state, and stops supplying the drive pulse if a predetermined number of consecutive detection pulses are not output from the encoder in response to the continuous supply of the drive pulse to the stepping motor.
In this processing liquid supply apparatus, when the on-off valve is to be switched from the open state to the closed state, the drive pulse is continuously supplied to the stepping motor. Thus, the valve body is moved toward the valve seat by the rotation of the stepping motor in response to the drive pulse. At this time, a detection pulse is output from the encoder in response to the rotation of the stepping motor.
Thereafter, if the reaction force acting on the valve body from the valve seat and the pressing force acting on the valve seat from the valve body are balanced in a state where the valve body is in contact with the valve seat, the valve body stops operating, and the stepping motor stops rotating. Further, if a predetermined number of consecutive detection pulses to be output from the encoder are not output, the supply of the drive pulse is stopped. This completes the switching of the on-off valve from the open state to the closed state, and stops the flow of the treatment liquid in the treatment liquid flow path.
In this case, by stopping the supply of the drive pulse in a range in which the stepping motor does not step out, when the open-close valve is switched from the open state to the closed state, the generation of a large load in the open-close valve is suppressed, and the deformation in the open-close valve is suppressed.
Further, according to the above operation, the valve body is appropriately positioned with respect to the valve seat in a state where the valve body is moved in one direction toward the valve seat and stopped. Therefore, it is not necessary to move the valve body in the one direction and the opposite direction with respect to the valve seat in order to search for the position of the valve body to be positioned in the closed state.
Further, according to the above operation, since it is not necessary to step out the stepping motor, the positional deviation of the valve body with respect to the valve seat due to the step out is prevented.
As a result, the life of the on-off valve can be suppressed from being shortened and the on-off valve can be appropriately closed without a long time.
(2) The control section can control the drive section in the following manner: the current value of the drive pulse supplied from the time when the valve body in the open state starts moving to the current switching time point before the supply stop time point of the drive pulse is larger than the current value of the drive pulse supplied from the current switching time point to the supply stop time point of the drive pulse.
In this case, by increasing the current value of the drive pulse supplied from the time when the valve body starts to move to the current switching time point, the torque required for the movement of the valve body can be generated. This prevents step-out due to the characteristics of the processing liquid flowing through the on-off valve, frictional force generated when the valve body operates, and the like.
Further, by reducing the current value of the drive pulse supplied from the current switching time point to the supply stop time point of the drive pulse, the pressing force from the valve body acting on the valve seat in the closed state is suppressed from being excessive. This prevents a contact portion between the valve body and the valve seat from being largely deformed, and reduces generation of particles from the contact portion.
(3) The control portion may determine that an abnormality occurs if the drive pulse is continuously supplied to the stepping motor for a predetermined time period when the on-off valve is to be switched from the open state to the closed state.
In this case, replacement or maintenance of the parts can be performed at an appropriate time based on the determination of the occurrence of the abnormality.
(4) Another aspect of the present invention is a method of controlling a processing liquid supply apparatus that supplies a processing liquid to a substrate, the processing liquid supply apparatus including: a processing liquid flow path through which a processing liquid to be supplied to the substrate flows; a switching valve including a valve seat and a valve body and disposed in the treatment liquid flow path; a stepping motor that switches the on-off valve between an open state and a closed state; a drive unit for supplying a drive pulse to the stepping motor; and an encoder outputting a detection pulse in response to rotation of the stepping motor; the switching valve is constructed in the following manner: when switching from the open state to the closed state is to be made, the stepping motor rotates in response to a drive pulse supplied through the drive section, whereby the valve body moves toward the valve seat, the control method comprising the steps of: controlling the driving part in a manner of continuously supplying driving pulses to the stepping motor when the switching valve is switched from an open state to a closed state; if a predetermined number of consecutive detection pulses are not output from the encoder in response to the continuous supply of the drive pulses to the stepping motor, the drive section is controlled so as to stop the supply of the drive pulses.
In the method of controlling the treatment liquid supply apparatus, when the on-off valve is switched from the open state to the closed state, the drive pulse is continuously supplied to the stepping motor. Thus, the valve body is moved toward the valve seat by the rotation of the stepping motor in response to the drive pulse. At this time, a detection pulse is output from the encoder in response to the rotation of the stepping motor.
Thereafter, if the reaction force acting on the valve body from the valve seat and the pressing force acting on the valve seat from the valve body are balanced in a state where the valve body is in contact with the valve seat, the valve body stops operating, and the stepping motor stops rotating. Further, if a predetermined number of consecutive detection pulses to be output from the encoder are not output, the supply of the drive pulse is stopped. This completes the switching of the on-off valve from the open state to the closed state, and stops the flow of the treatment liquid in the treatment liquid flow path.
In this case, by stopping the supply of the drive pulse in a range in which the stepping motor does not step out, when the open-close valve is switched from the open state to the closed state, the generation of a large load in the open-close valve is suppressed, and the deformation in the open-close valve is suppressed.
Further, according to the above operation, the valve body is appropriately positioned with respect to the valve seat in a state where the valve body is moved in one direction toward the valve seat and stopped. Therefore, it is not necessary to move the valve body in the one direction and the opposite direction with respect to the valve seat in order to search for the position of the valve body to be positioned in the closed state.
Further, according to the above operation, since it is not necessary to step out the stepping motor, the positional deviation of the valve body with respect to the valve seat due to the step out is prevented.
As a result, the life of the on-off valve can be suppressed from being shortened and the on-off valve can be appropriately closed without a long time.
(5) The method of controlling the treatment liquid supply apparatus may further include the steps of: the drive unit is controlled so that the current value of the drive pulse supplied from the time when the valve body in the open state starts moving to the current switching time point before the supply stop time point of the drive pulse is larger than the current value of the drive pulse supplied from the current switching time point to the supply stop time point of the drive pulse.
In this case, by increasing the current value of the drive pulse supplied from the time when the valve body starts to move to the current switching time point, the torque required for the movement of the valve body can be generated. This prevents step-out due to the characteristics of the processing liquid flowing through the on-off valve, frictional force generated when the valve body operates, and the like.
Further, by reducing the current value of the drive pulse supplied from the current switching time point to the supply stop time point of the drive pulse, the pressing force from the valve body acting on the valve seat in the closed state is suppressed from being excessive. This prevents a large deformation from occurring at the contact portion between the valve body and the valve seat, and reduces the generation of particles from the contact portion.
(6) The control method of the treatment liquid supply apparatus may further include the steps of: when the on-off valve is to be switched from the open state to the closed state, if the drive pulse is continuously supplied to the stepping motor for a predetermined time, it is determined that an abnormality occurs.
In this case, replacement or maintenance of the on-off valve can be performed at an appropriate timing based on the determination of the abnormality.
[ Effect of the invention ]
According to the present invention, it is possible to suppress a reduction in the life of the on-off valve and to appropriately close the on-off valve without a long time.
Drawings
Fig. 1 is a schematic block diagram showing a configuration of a substrate processing apparatus according to an embodiment of the present invention.
Fig. 2 is a block diagram for explaining the configuration of the processing liquid supply apparatus corresponding to the developing unit of fig. 1.
Fig. 3 is a diagram showing an example of an opening and closing operation of the on-off valve of fig. 2.
Fig. 4 is a flowchart showing an example of an opening/closing control process of the opening/closing valve executed in the valve control unit of fig. 2.
Detailed Description
Hereinafter, a processing liquid supply apparatus and a method for controlling the processing liquid supply apparatus according to an embodiment of the present invention will be described with reference to the drawings. In the following description, the substrate refers to a substrate for fpd (flat Panel display), a semiconductor substrate, an optical disc substrate, a magnetic disc substrate, a magneto-optical disc substrate, a photomask substrate, a ceramic substrate, a solar cell substrate, or the like used in a liquid crystal display device, an organic el (electro luminescence) display device, or the like.
(1) Substrate processing apparatus with processing liquid supply device
A substrate processing apparatus including a processing liquid supply device will be described. Fig. 1 is a schematic block diagram showing a configuration of a substrate processing apparatus according to an embodiment of the present invention. As shown in fig. 1, the substrate processing apparatus 100 is provided adjacent to the exposure apparatus 500, and includes a coating processing section 110, a developing processing section 120, a heat treatment section 130, a transport section 140, a control device 150, and a plurality of switching valve devices V1 and V2.
The coating processing section 110 includes a plurality of coating cells SC. Each coating unit SC includes a spin chuck 91 and a discharge nozzle 92. The spin chuck 91 rotatably holds an unprocessed substrate W in a horizontal posture. The resist liquid is supplied from a coating liquid supply source 1 provided outside the substrate processing apparatus 100 to the discharge nozzle 92 through a pipe p 1. The discharge nozzle 92 discharges the supplied resist solution toward the upper surface of the substrate W held by the spin chuck 91 (coating process). Thereby, a resist film is formed on one surface of the untreated substrate W. The substrate W on which the resist film is formed is subjected to exposure processing in the exposure apparatus 500.
In the coating processing section 110, an antireflection film may be formed on the substrate W. In this case, the heat treatment unit 130 may perform adhesion strengthening treatment for improving adhesion between the substrate W and the antireflection film. In the coating processing section 110, a resist cover film for protecting the resist film may be formed on the substrate W on which the resist film is formed.
The developing process portion 120 includes a plurality of developing units SD. Each developing unit SD includes a spin chuck 93 and a discharge nozzle 94, as in the case of the coating unit SC. The spin chuck 93 rotatably holds the substrate W subjected to the exposure processing by the exposure apparatus 500 in a horizontal posture. The developer is supplied from a developer supply source 2 provided outside the substrate processing apparatus 100 to the discharge nozzle 94 through a pipe p 2. The discharge nozzle 94 discharges the supplied developer toward the upper surface of the substrate W held by the spin chuck 93 (development process).
The heat treatment unit 130 performs heat treatment of the substrate W before and after the coating process performed by each coating cell SC of the coating process unit 110, the developing process performed by the developing process unit 120, and the exposure process performed by the exposure apparatus 500.
The transfer unit 140 includes a transfer robot that transfers the substrate W. The conveyance robot of the conveyance section 140 conveys the substrate W between another conveyance robot provided outside the substrate processing apparatus 100, the coating processing section 110, the developing processing section 120, the heat treatment section 130, and the exposure apparatus 500.
The control device 150 includes, for example, a CPU (Central Processing Unit), a memory, or a microcomputer, and controls the operations of the coating Processing Unit 110, the developing Processing Unit 120, the heat Processing Unit 130, and the conveying Unit 140.
A switching valve device V1 for switching supply and stop of the resist liquid to the substrate W is provided in each of a plurality of pipes p1 connecting the plurality of coating units SC of the coating processing section 110 and the coating liquid supply source 1. Further, a switching valve device V2 for switching supply and stop of the developer to the substrate W is provided in each of the plurality of pipes p2 connecting the plurality of developing units SD of the developing unit 120 and the developer supply source 2. Each of the plurality of opening/closing valve devices V1 and V2 is controlled by the valve control unit 200 of the control device 150.
In the substrate processing apparatus 100 of fig. 1, the pipe p1 and the open/close valve device V1 provided corresponding to each coating cell SC constitute a processing liquid supply device together with the valve control unit 200. The pipe p2 and the open/close valve device V2 provided corresponding to each developing unit SD and the valve control unit 200 constitute a processing liquid supply device.
(2) Concrete constitution and operation of processing liquid supply device
Fig. 2 is a block diagram for explaining the configuration of the treatment liquid supply device corresponding to the coating unit SC of fig. 1. As shown in fig. 2, the processing liquid supply apparatus 300 includes a pipe p1, a valve opening and closing device V1, and a valve control unit 200.
The on-off valve device V1 includes an on-off valve 10, a stepping motor 20, a conversion mechanism 30, a drive unit 40, and an encoder 50. The on-off valve 10 has a valve box 11. An inner space is formed in the valve box 11. A part of the internal space is divided by the diaphragm 12 into a flow path space 11a forming a flow path for the processing liquid (resist liquid in this example). The valve box 11 is provided with an inflow port 11b and an outflow port 11c communicating with the flow path space 11 a. The inflow port 11b and the outflow port 11c are connected to a pipe p 1.
The diaphragm 12 is formed, for example, by a fluorinated resin or rubber. The central portion of the diaphragm 12 functions as a valve body 12 a. A valve seat 11s is formed inside the valve housing 11 so as to face the valve element 12a with the flow path space 11a therebetween. The valve seat 11s has an opening 11o for leading out the processing liquid (resist liquid in this example) in the flow path space 11a to the outlet port 11 c. The opening 11o is opened and closed by moving the valve body 12a in one direction or the opposite direction to the valve seat 11 s. Hereinafter, a direction in which the valve element 12a approaches the valve seat 11s from a position away from the valve seat 11s is referred to as a closing direction, and a direction opposite thereto is referred to as an opening direction. Further, a valve stem 13 is provided inside the valve box 11. The stem 13 is connected to the valve body 12a and extends from the valve body 12a in the opening direction.
The stepping motor 20 of this example is, for example, a two-phase stepping motor, and serves as a power source for switching the open/close state of the on-off valve 10 by moving the valve body 12a by the valve stem 13. Further, as the stepping motor 20, a three-phase type or a five-phase type stepping motor may be used.
The conversion mechanism 30 includes, for example, a rack and pinion mechanism, and converts a rotational force generated by the stepping motor 20 into a force for moving the valve rod 13 in the closing direction or the opening direction. The conversion mechanism 30 converts a force acting in the closing direction or the opening direction with respect to the valve rod 13 into a force that rotates the rotation shaft of the stepping motor 20 in one direction or the opposite direction.
The driving unit 40 is connected to a dc power supply, not shown, and supplies a driving pulse to the stepping motor 20 based on control by a valve control unit 200, which will be described later. Thereby, the stepping motor 20 rotates in one direction or the opposite direction by an angular amount corresponding to the number of driving pulses supplied.
The encoder 50 is a rotary encoder, detects the amount of rotation of a rotor (not shown) of the stepping motor 20, and outputs a pulse signal (hereinafter referred to as a detection pulse) as a detection signal. For example, if the stepping motor 20 is rotated by an angular amount corresponding to a driving pulse by supplying the stepping motor 20 with the driving pulse, the encoder 50 outputs a detection pulse. On the other hand, even if a drive pulse is supplied to the stepping motor 20, the encoder 50 does not output a detection pulse when the stepping motor 20 does not rotate.
The valve control unit 200 includes an abnormality determination unit 210, a switching determination unit 220, a pulse control unit 230, a current adjustment unit 240, and a setting storage unit 250. These functional units are realized, for example, by the CPU of the control device 150 shown in fig. 1 executing a computer program stored in a memory. A part or all of the above-described configuration may be implemented by hardware such as an electronic circuit.
The operation of each functional unit of the valve control unit 200 will be described together with the opening and closing operation of the on-off valve 10. Fig. 3 is a diagram showing an example of the opening and closing operation of the on-off valve 10 of fig. 2. The upper section of fig. 3 shows the temporal change in the position of the valve body 12a by a curve. In the upper graph of fig. 3, the vertical axis represents the relative position of the valve body 12a with respect to the valve seat 11s, and the horizontal axis represents time. In the vertical axis, advancing in the direction of the arrow means that the valve body 12a moves in the opening direction, and advancing in the direction opposite to the direction of the arrow means that the valve body 12a moves in the closing direction. The state of the inside of the on-off valve 10 in a plurality of time points t0 to t5 shown by the upper-stage graph is shown in a schematic sectional view in the lower stage of fig. 3.
In this example, the on-off valve 10 is in the closed state in the initial state at the time point t 0. The initial position of the valve body 12a at this time is indicated by a symbol pp. When the coating unit SC of fig. 1 starts to supply the resist liquid to the substrate W, the valve control unit 200 instructs the on-off valve 10 to switch from the closed state to the open state. When the application unit SC stops supplying the resist solution to the substrate W, the on-off valve 10 is instructed to switch from the open state to the closed state.
The setting storage unit 250 in fig. 2 stores a preset number of drive pulses (hereinafter, referred to as the number of open pulses) m for switching the on-off valve 10 from the closed state to the open state. The number m of opening pulses is, for example, 400. The setting storage unit 250 stores the 1 st current value of the drive pulse set in advance for switching the on-off valve 10 from the closed state to the open state. The 1 st current value is set to a large value (for example, 0.2(a)) so as not to cause step-out of the stepping motor 20, taking into consideration the characteristics of the processing liquid (in this example, the resist liquid) flowing through the on-off valve 10 and the frictional force generated when the valve body 12a moves.
When the switching of the on-off valve 10 from the closed state to the open state is instructed at time t0 in fig. 3, the pulse control section 230 controls the drive section 40 so that the number of open pulses m is continuously supplied to the stepping motor 20 by a drive pulse for moving the valve element 12a in the opening direction. The current adjusting unit 240 controls the driving unit 40 so that the current value of the driving pulse becomes the 1 st current value.
Thereby, from the time point t0 to the time point t1, the valve body 12a moves from the initial position pp to the position pa corresponding to the open state of the on-off valve 10. Thereby, the resist solution is flowed through the pipe p1 through the on-off valve 10.
The setting storage unit 250 stores a preset number of drive pulses (hereinafter referred to as the number of off pulses) n for switching the current value of the drive pulse when the on-off valve 10 is switched from the open state to the closed state. The number of closing pulses n is the number of opening pulses m or less. The difference (difference) between the number of closing pulses n and the number of opening pulses m is preferably 0 or more and 1/2 or less, and preferably 0 or more and 10 or less. When the number of opening pulses m is 400, the number of closing pulses n may be 398, for example.
In the setting storage unit 250, the 2 nd and 3 rd current values of the drive pulse preset for switching the on-off valve 10 from the closed state to the open state are stored. The 2 nd current value corresponds to the number of off pulses n of the drive pulse, and is set to a large value (for example, 0.2(a)) so as not to cause step-out of the stepping motor 20, as in the 1 st current value. The 2 nd current value may be equal to the 1 st current value. On the other hand, the 3 rd current value is set to a value (for example, 0.07(a)) lower than the 1 st and 2 nd current values so that the pressing force applied from the valve body 12a to the valve seat 11s when the open/close valve 10 is closed is not excessively increased.
When the switching of the on-off valve 10 from the open state to the closed state is instructed at time t2, the pulse control section 230 controls the drive section 40 so that the number of closing pulses n is continuously supplied to the stepping motor 20 by a drive pulse for moving the valve element 12a in the closing direction. The current adjusting unit 240 controls the driving unit 40 so that the current value of the driving pulse becomes the 2 nd current value while the driving pulse of the number n of off pulses is supplied to the stepping motor 20.
Thus, when the number of closing pulses n is smaller than the number of opening pulses m, the valve body 12a moves from time t2 to time t3 to position pb shifted by a fixed distance in the opening direction from position pp.
After time t3, the current adjustment unit 240 controls the drive unit 40 so that the current value of the drive pulse becomes the 3 rd current value until the on-off valve 10 is in the closed state.
When the stepping motor 20 is driven at the 3 rd current value, if the reaction force acting on the valve body 12a from the valve seat 11s and the pressing force acting on the valve seat 11s from the valve body 12a are balanced, the valve body 12a stops moving in the closing direction. Thus, even when the drive pulse is supplied from the drive unit 40 to the stepping motor 20, the detection pulse is not output from the encoder 50.
The setting storage unit 250 stores, as a predetermined number, a number k that is preset for determining that the on-off valve 10 has completed switching from the open state to the closed state. The switching determination unit 220 monitors the control state of the pulse control unit 230 on the driving unit 40, and monitors the detection pulse output from the stepping motor 20. As a result of the monitoring, the switching determination unit 220 determines that the switching of the open/close valve 10 to the closed state is completed when the encoder 50 does not output a predetermined number k of continuous detection pulses in response to the continuous supply of the driving pulses.
If the pulse control unit 230 determines that the switching of the on-off valve 10 to the closed state is completed by the switching determination unit 220, the supply of the drive pulse from the drive unit 40 to the stepping motor 20 is stopped.
Here, if a certain number of drive pulses are further supplied to the stepping motor 20 so that the valve body 12a moves in the closing direction in a state where the valve body 12a is stopped with respect to the rotation of the stepping motor 20, the stepping motor 20 steps out. When the stepping motor 20 is out of step, the position of the valve body 12a is changed. It is difficult to grasp the fluctuation amount. Therefore, the predetermined number k is 2 in this example so that the stepping motor 20 does not step out.
In the example of fig. 3, from time t3 to time t4, the valve body 12a moves in the closing direction in response to the supply of the drive pulse, but its movement stops at time t 4. Thereafter, at a time point t5, it is determined that the switching valve 10 has completed switching to the closed state.
As described above, if the on-off valve 10 completes the switching to the closed state, the position of the valve body 12a is fixed while maintaining the rotation angle of the stepping motor 20. In the example of fig. 3, the valve body 12a is fixed at a position pc slightly shifted in the closing direction from the initial position pp. This means that the position of the valve body 12a when the on-off valve 10 is in the closed state is changed to the position pc more appropriate than the position pp at the time point t 0. Thereby, the flow of the processing liquid (resist liquid in this example) in the pipe p1 is appropriately blocked by the on-off valve 10.
In a series of operations when the on-off valve 10 is switched to the closed state, an abnormality occurs in any one of the on-off valve 10, the stepping motor 20, and the encoder 50, and therefore it may not be possible to accurately determine that the on-off valve 10 has completed switching to the closed state.
For example, in the encoder 50, if it cannot be determined that the switching of the on-off valve 10 to the closed state is completed because noise having the same waveform as the detection pulse continues to be generated, the supply of the drive pulse to the stepping motor 20 is not stopped. In this case, the stepping motor 20 generates step-out. Alternatively, if the valve element 12a is displaced from the stem 13, the stem 13 moves beyond the position where it should originally stop, and collides with the valve seat 11 s.
Therefore, the abnormality determination unit 210 determines that an abnormality occurs when the drive pulse is continuously supplied for a predetermined time period when the open/close valve 10 is switched from the open state to the closed state. In the example of fig. 3, the abnormality determination unit 210 determines that an abnormality has occurred when the drive pulse is continuously supplied for a predetermined time period exceeding a predetermined time period from time t3, for example. The abnormality determination unit 210 outputs the determination result. In this case, replacement or maintenance of the parts can be performed at an appropriate time based on the determination of the occurrence of the abnormality.
The treatment liquid supply device 300 may be provided with a presentation device (a display device, an audio output device, or the like) for presenting the determination result of the abnormality output from the abnormality determination unit 210 to the user. In this case, the user can easily recognize that an abnormality has occurred in the open/close valve device V2.
The processing liquid supply device corresponding to the developing unit SD of fig. 1 has basically the same configuration and operation as the processing liquid supply device 300 of fig. 3 and 4.
(3) On-off control process of on-off valve 10
Fig. 4 is a flowchart showing an example of the opening/closing control process of the on/off valve 10 executed by the valve control unit 200 of fig. 2. The on-off control process is started by providing a switching command of the on-off state of the on-off valve 10 to the valve control unit 200. In the following description, the valve control unit 200 incorporates a counter. The valve control unit 200 incorporates a timer.
First, the pulse control unit 230 determines whether or not the command provided at the start is a command to switch the on-off valve 10 from the open state to the closed state (step S11).
When the start command is a command to switch from the on state to the off state, the pulse control unit 230 and the current adjustment unit 240 control the drive unit 40 as follows: the stepping motor 20 is continuously supplied with the driving pulse of the number n of off pulses at the 2 nd current value (step S12). At this time, the drive pulse supplied to the stepping motor 20 corresponds to the movement of the valve body 12a in the closing direction. Thereby, the valve body 12a moves in the closing direction with a high torque. The switching determination unit 220 resets the counter value and resets the timer, and starts time measurement by the timer (step S13).
Next, the abnormality determination unit 210 determines whether or not a predetermined time set in advance has elapsed since the time measurement of the timer (step S14). If a predetermined time set in advance has not elapsed from the time measurement start time point of the timer, the pulse control unit 230 and the current adjustment unit 240 control the drive unit 40 as follows: a drive pulse is supplied to the stepping motor 20 at the 3 rd current value (step S15). At this time, the drive pulse supplied to the stepping motor 20 corresponds to the movement of the valve body 12a in the closing direction.
Next, the switching determination unit 220 determines whether or not the detection pulse is output from the encoder 50 in response to the drive pulse supplied at step S15 (step S16). In the case where the detection pulse is output, the process returns from step S12 to step S14. On the other hand, when the detection pulse is not output, the switching determination unit 220 increments the counter value (step S17). The switching determination unit 220 determines whether or not the detection pulse is not output for a predetermined number k based on the value of the counter (step S18).
If the detection pulse is not output for a predetermined number k, the process returns from step S18 to step S14. On the other hand, when the detection pulse is not output and the predetermined number k continues, the switching control process is ended in a state where the supply of the drive pulse to the stepping motor 20 is stopped.
In step S11, when the command at the start is a command to switch to the on state, the pulse control unit 230 controls the drive unit 40 as follows: the stepping motor 20 is continuously supplied with the driving pulse of the number m of opening pulses at the 1 st current value (step S19). At this time, the drive pulse supplied to the stepping motor 20 corresponds to the movement of the valve body 12a in the opening direction. Thereby, the valve body 12a moves in the opening direction with a high torque. Thereafter, the switching control process ends.
In step S14, when a predetermined time set in advance has elapsed since the start of time measurement by the timer, the abnormality determination unit 210 determines that an abnormality has occurred, and outputs the determination result to the outside of the valve control unit 200 (step S20). Thereafter, the switching control process ends.
(4) Effect
In the treatment liquid supply apparatus 300, when the on-off valve 10 is switched from the open state to the closed state, the drive pulse is continuously supplied to the stepping motor 20. The valve body 12a is moved toward the valve seat 11s by the rotation of the stepping motor 20 in response to the driving pulse. At this time, a detection pulse is output from the encoder 50 in response to the rotation of the stepping motor 20.
If the reaction force acting on the valve body 12a from the valve seat 11s and the pressing force acting on the valve seat 11s from the valve body 12a are balanced in a state where the valve body 12a is in contact with the valve seat 11s, the valve body 12a stops moving in the closing direction, and the stepping motor 20 stops rotating. Next, if the detection pulses of the predetermined number k of consecutive pulses to be output from the encoder 50 are not output, the supply of the drive pulses is stopped. Thereby, the switching of the on-off valve 10 from the open state to the closed state is completed, and the flow of the treatment liquid in the pipes p1 and p2 is stopped.
In this case, by stopping the supply of the drive pulse in a range where step-out of the stepping motor 20 does not occur, when the switching state of the on-off valve 10 is switched, the generation of a large load in the inside of the on-off valve 10 is suppressed. This suppresses deformation of the inside of the on-off valve 10.
In addition, according to the above operation, the valve element 12a is appropriately positioned with respect to the valve seat 11s in a state where the valve element 12a is moved in the closing direction and stopped. Therefore, it is not necessary to move the valve element 12a in the opening direction and the closing direction with respect to the valve seat 11s in order to search for the position of the valve element 12a to be positioned in the closed state.
Further, according to the above operation, since it is not necessary to step out the stepping motor 20, the positional displacement of the valve body 12a with respect to the valve seat 11s due to the step out is prevented.
As a result, the life of the on-off valve 10 can be suppressed from being shortened and the on-off valve 10 can be appropriately closed without a long time.
(b) In the treatment liquid supply apparatus 300, when the on-off valve 10 is switched from the open state to the closed state, the stepping motor 20 is driven at the 2 nd current value while the stepping motor 20 is supplied with the driving pulse having the number n of closing pulses. This prevents step-out due to the characteristics of the processing liquid flowing through the on-off valve, frictional force generated when the valve body 12a operates, and the like.
Thereafter, the current value of the drive pulse supplied to the stepping motor 20 is changed to the 3 rd current value until the supply of the drive pulse is stopped. In this case, the pressing force acting on the valve seat 11s from the valve body 12a in the closed state is suppressed from being excessive. This prevents a contact portion between the valve body 12a and the valve seat 11s from being largely deformed, and reduces generation of particles from the contact portion.
(5) Other embodiments
(a) In the above-described embodiment, the switching of the open/close state of the open/close valve 10 of the processing liquid supply apparatus 300 is performed when the supply and stop of the processing liquid (resist liquid, developing liquid, or the like) to the substrate W are switched, but the present invention is not limited thereto.
The instruction for switching the on-off state of the on-off valve 10 may be provided to the valve control section 200 by a user operating an operation section of the substrate processing apparatus 100, which is not shown. In this case, the user can instruct the units (the coating unit SC and the developing unit SD in the above example) for supplying the processing liquid to the substrate W to switch the on-off valve 10 in the same manner as in the example of fig. 3.
As shown in fig. 3, a series of operations for sequentially switching the on-off valve 10 in the closed state to the open state and the closed state may be performed in a driven manner for every fixed cycle or a specific number of batches. Alternatively, the initialization operation of each unit (in the above example, the coating unit SC and the developing unit SD) may be performed in a slave manner when the substrate processing apparatus 100 is powered on.
(b) In the above-described embodiment, the processing liquid supply device is applied to each of the resist liquid supply system for supplying the resist liquid to the substrate W and the developer liquid supply system for supplying the developer liquid to the substrate W, but the present invention is not limited thereto.
The treatment liquid supply apparatus of the present invention is applicable to a coating liquid supply system for supplying various coating liquids for forming an antireflection film, a resist coating film, or the like on a substrate W. Alternatively, the treatment liquid supply apparatus of the present invention may be applied to a cleaning liquid supply system for supplying a cleaning liquid such as deionized water or a chemical liquid to the substrate W.
(c) In the above embodiment, a rotary encoder is used as the encoder 50 for detecting the rotation of the stepping motor 20, but the present invention is not limited thereto. The encoder 50 may be a linear encoder that detects the movement of the valve rod 13 in the opening direction and the closing direction. In this case, the movement of the valve rod 13 in the opening direction and the closing direction detected by the linear encoder can be detected as the rotation of the stepping motor 20.
(d) In the above embodiment, the current value of the drive pulse supplied to the stepping motor 20 when the on-off valve 10 is switched from the open state to the closed state is changed in 2 steps, but the present invention is not limited to this. The current value of the drive pulse supplied to the stepping motor 20 when the on-off valve 10 is switched from the open state to the closed state may be fixed. When the torque required to move the valve rod 13 is very small due to a low viscosity of the processing liquid, a low frictional force generated when the valve rod 13 is operated, or the like, the current value is preferably set to the 3 rd current value.
(6) Correspondence between each component in claims and each element of the embodiment
Hereinafter, examples of correspondence between each component in the claims and each component of the embodiments will be described. In the above embodiment, the resist liquid and the developer liquid are the processing liquids, the pipes p1 and p2 are the processing liquid flow paths, the valve control unit 200 is the control unit, and the time point (time point t3 in fig. 3) at which all the driving pulses having the number of closing pulses n are supplied to the stepping motor 20 is the current switching time point.
As each component in the claims, various other components having the structures or functions described in the claims may be used.
Claims (6)
1. A processing liquid supply apparatus for supplying a processing liquid to a substrate, comprising:
a processing liquid flow path through which a processing liquid to be supplied to the substrate flows;
an on-off valve including a valve seat and a valve body and disposed in the treatment liquid flow path;
a stepping motor that switches the on-off valve between an open state and a closed state;
a drive unit configured to supply a drive pulse to the stepping motor;
an encoder that outputs a detection pulse in response to rotation of the stepping motor; and
a control unit that controls the drive unit based on a detection pulse output by the encoder; and is
The switching valve is constructed in the following manner: when switching from the open state to the closed state is to be made, the stepping motor rotates in response to the drive pulse supplied from the drive section, whereby the valve body moves toward the valve seat,
the control unit controls the drive unit to continuously supply the drive pulse to the stepping motor when the on-off valve is to be switched from the open state to the closed state, and stops supplying the drive pulse if a predetermined number of consecutive detection pulses are not output from the encoder in response to the continuous supply of the drive pulse to the stepping motor.
2. The processing liquid supply apparatus according to claim 1, wherein the control portion controls the drive portion in such a manner that: the current value of the drive pulse supplied from the time when the movement of the valve body in the open state is started to the current switching time point before the supply stop time point of the drive pulse is larger than the current value of the drive pulse supplied from the current switching time point to the supply stop time point of the drive pulse.
3. The treatment liquid supply apparatus according to claim 1 or 2, wherein the control portion determines that an abnormality occurs if the drive pulse is continuously supplied to the stepping motor for a preset time period when the on-off valve is to be switched from the open state to the closed state.
4. A method for controlling a processing liquid supply apparatus for supplying a processing liquid to a substrate, and
the processing liquid supply device includes:
a processing liquid flow path through which a processing liquid to be supplied to the substrate flows;
an on-off valve including a valve seat and a valve body and disposed in the treatment liquid flow path;
a stepping motor that switches the on-off valve between an open state and a closed state;
a drive unit configured to supply a drive pulse to the stepping motor; and
an encoder that outputs a detection pulse in response to rotation of the stepping motor;
the switching valve is constructed in the following manner: when switching from the open state to the closed state is to be made, the stepping motor rotates in response to the drive pulse supplied by the drive section, whereby the valve body moves toward the valve seat,
the control method comprises the following steps:
controlling the driving section to continuously supply the driving pulse to the stepping motor when the on-off valve is to be switched from the open state to the closed state;
and controlling the driving part in such a manner that the supply of the driving pulse is stopped if a predetermined number of consecutive detection pulses are not output from the encoder in response to the continuous supply of the driving pulse to the stepping motor.
5. The method of controlling a processing liquid supply apparatus according to claim 4, further comprising the steps of: the drive unit is controlled so that a current value of the drive pulse supplied from a time when the valve body starts moving in the open state to a current switching time point before a supply stop time point of the drive pulse is larger than a current value of the drive pulse supplied from the current switching time point to the supply stop time point of the drive pulse.
6. The method of controlling a processing liquid supply apparatus according to claim 4 or 5, further comprising the steps of: when the on-off valve is to be switched from the open state to the closed state, it is determined that an abnormality occurs if the drive pulse is continuously supplied to the stepping motor for a preset time.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019053369A JP7223609B2 (en) | 2019-03-20 | 2019-03-20 | Treatment liquid supply device and method of controlling treatment liquid supply device |
| JP2019-053369 | 2019-03-20 | ||
| PCT/JP2020/004186 WO2020189059A1 (en) | 2019-03-20 | 2020-02-04 | Processing liquid supply device and control method for processing liquid supply device |
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| CN113544419A true CN113544419A (en) | 2021-10-22 |
| CN113544419B CN113544419B (en) | 2024-01-23 |
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| CN202080019247.1A Active CN113544419B (en) | 2019-03-20 | 2020-02-04 | Treatment liquid supply device and control method for treatment liquid supply device |
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| JP (1) | JP7223609B2 (en) |
| KR (1) | KR102548556B1 (en) |
| CN (1) | CN113544419B (en) |
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| WO (1) | WO2020189059A1 (en) |
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| Publication number | Publication date |
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| TWI750579B (en) | 2021-12-21 |
| TW202040632A (en) | 2020-11-01 |
| KR102548556B1 (en) | 2023-06-27 |
| KR20210124449A (en) | 2021-10-14 |
| WO2020189059A1 (en) | 2020-09-24 |
| CN113544419B (en) | 2024-01-23 |
| JP7223609B2 (en) | 2023-02-16 |
| JP2020155620A (en) | 2020-09-24 |
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