CN113539896A - Crystal wafer rotary corrosion device of thyristor for smart power grid - Google Patents
Crystal wafer rotary corrosion device of thyristor for smart power grid Download PDFInfo
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- CN113539896A CN113539896A CN202110683374.8A CN202110683374A CN113539896A CN 113539896 A CN113539896 A CN 113539896A CN 202110683374 A CN202110683374 A CN 202110683374A CN 113539896 A CN113539896 A CN 113539896A
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- 239000013078 crystal Substances 0.000 title claims abstract description 104
- 238000005260 corrosion Methods 0.000 title claims abstract description 60
- 230000007797 corrosion Effects 0.000 title claims abstract description 60
- 230000005540 biological transmission Effects 0.000 claims description 185
- 239000000463 material Substances 0.000 claims description 21
- 238000000227 grinding Methods 0.000 claims description 20
- 238000005530 etching Methods 0.000 claims description 12
- 206010044048 Tooth missing Diseases 0.000 claims description 3
- 238000007781 pre-processing Methods 0.000 claims description 2
- 239000007788 liquid Substances 0.000 abstract description 7
- 239000002893 slag Substances 0.000 abstract description 3
- 235000012431 wafers Nutrition 0.000 description 67
- 238000000034 method Methods 0.000 description 22
- 238000007688 edging Methods 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 7
- 230000033001 locomotion Effects 0.000 description 5
- 230000007306 turnover Effects 0.000 description 5
- 239000012535 impurity Substances 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000012858 packaging process Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 241000446313 Lamella Species 0.000 description 1
- 241001465754 Metazoa Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention relates to the field of smart power grids, in particular to a crystal wafer rotary corrosion device of a thyristor for a smart power grid. The technical problem is as follows: a crystal wafer rotary corrosion device of a thyristor for a smart grid is provided. The technical scheme of the invention is as follows: a crystal wafer rotary corrosion device of a thyristor for a smart grid comprises a pretreatment unit, a deburring unit and a circulating corrosion unit; the deburring unit is connected with the circulating corrosion unit. According to the invention, the burr removing operation is carried out on the chamfered crystal wafer, wherein the wafer is clamped in a linear moving manner, so that the residual slag on the chamfered crystal wafer is removed, and then the burr on the wafer is removed in a rotating manner, so that the subsequent oxide removing corrosion of the wafer is mild, the consumption of corrosive liquid can be reduced, and the processing efficiency of the crystal wafer is effectively improved.
Description
Technical Field
The invention relates to the field of smart power grids, in particular to a crystal wafer rotary corrosion device of a thyristor for a smart power grid.
Background
The thyristor is a thyristor, also called silicon controlled rectifier, can work under the conditions of high voltage and large current, and its working process can be controlled, so that it can be extensively used in the electronic circuits of controllable rectification, AC voltage regulation, contactless electronic switch, inversion and frequency conversion, etc..
At present at the in-process of the preparation of crystal disk, need carry out the operation of chamfer and corruption to the disk, but because in the crystal disk manufacture process, need carry out the angle of grind to the crystal disk, this can make the crystal disk produce edging burr etc. at the in-process of angle of grind, the edging burr can make the corrosion process more elongated, and the consumption of etchant is also more, also can make the corruption production serious corrosion pit because the edging burr simultaneously, influence the encapsulation process of crystal disk, secondly, when the crystal disk is carrying out the in-process of corroding, often because the position of crystal wafer and clamping device contact is difficult to accept the corruption, make surperficial oxidation material be difficult to get rid of, cause the result of unable accurate control at the result of using to the crystal disk, can't satisfy the user demand on the daily production life.
In summary, there is a need to develop a crystal wafer rotary etching device for a thyristor for a smart grid to overcome the above problems.
Disclosure of Invention
In order to overcome because in the crystal disk manufacturing process, need carry out the angle grinding to the crystal disk, this can make the crystal disk produce edging burr etc. at the in-process of angle grinding, the edging burr can make the corrosion process more elongated, and the consumption of etchant is also more, also can make the corruption produce serious etch pit because the edging burr simultaneously, influence the packaging process of crystal disk, secondly, when the crystal disk is carrying out the in-process of corroding, often because the position of crystal thin slice and clamping device contact is difficult to corrode and receives, make on the surface oxidation material be difficult to get rid of, result to the unable accurate control is led to the fact in the result of use to the crystal disk, can't satisfy the shortcoming of user demand in the daily production life, the technical problem is: a crystal wafer rotary corrosion device of a thyristor for a smart grid is provided.
The technical scheme of the invention is as follows: a crystal wafer rotary corrosion device of a thyristor for a smart grid comprises a bottom frame, a pretreatment unit, a deburring unit, a circulating corrosion unit, a control screen, a first electric slide rail, an electric slide block, an electric lifting plate, a second electric slide rail, an electric objective table, a collecting barrel, a bearing seat and an anti-skid pad; the underframe is connected with the pretreatment unit; the underframe is connected with the deburring unit; the chassis is connected with the circulating corrosion unit; the chassis is connected with the control screen; the underframe is connected with the first electric slide rail; the underframe is connected with the second electric slide rail; the bottom frame is connected with the bearing seat; the deburring unit is connected with the circulating corrosion unit; the first electric sliding rail is connected with the electric sliding block; the electric sliding block is connected with the electric lifting plate; the second electric slide rail is connected with the electric objective table; the electric objective table is connected with the collecting barrel; the bearing seat is connected with the non-slip mat.
As a preferred technical scheme, the pretreatment unit comprises a first electric sliding support, a second electric sliding support, a material table, a first electric push rod, a baffle, a double-foot sliding frame, a fan, a first electric slide rod, a second electric slide rod, a first electric push plate, a second electric push plate, a first limiting rope, a second limiting rope, an electric conveyor belt, a spring rod and a limiting plate; the first electric sliding support is in sliding connection with the underframe; the second electric sliding support is in sliding connection with the underframe; two sides of the material table are fixedly connected with the first electric sliding support and the second electric sliding support respectively; a baffle is arranged on the side surface of the material table; the baffle is fixedly connected with the first electric push rod; the first electric push rod is fixedly connected with the underframe; a double-foot sliding frame is arranged on the baffle; an electric conveyor belt is arranged on the side surface of the baffle; the double-foot sliding frame is fixedly connected with two groups of symmetrically arranged fans; the double-foot sliding frame is fixedly connected with the first electric sliding rod; the double-foot sliding frame is fixedly connected with the second electric sliding rod; the double-foot sliding frame is respectively connected with the first limiting rope and the second limiting rope; the double-foot sliding frame is in sliding connection with the underframe; two sides of the first electric push plate are respectively connected with the first electric slide bar and the second electric slide bar in a sliding manner; two sides of the second electric push plate are respectively connected with the first electric slide bar and the second electric slide bar in a sliding manner; two groups of the first electric slide bar to the second electric push plate are symmetrically arranged by the center of the double-foot sliding frame; the electric conveyor belt is connected with the spring rod in a sliding manner; the spring rod is fixedly connected with the limiting plate; two groups of spring rods and two groups of limiting plates are symmetrically arranged at the center of the electric conveyor belt; the electric conveyor belt is fixedly connected with the underframe.
As a preferred technical scheme of the invention, the deburring unit comprises a motor, a first transmission rod, a first transmission wheel, a second transmission wheel, a first bevel gear, a second transmission rod, a first gear, a second gear, a third transmission rod, a grinding wheel, a fourth transmission rod, a third transmission wheel, a fourth transmission wheel, a fifth transmission rod, a third gear, a second electric push rod, a turnover seat, a sixth transmission rod, a fourth gear, a spring strip, an arc-shaped clamping plate, a third electric slide rod, a first electric slide plate, a first pneumatic sucker, a second electric slide plate, a second pneumatic sucker, an air pump and a two-leg electric plate; the output shaft of the motor is fixedly connected with the first transmission rod; the outer surface of the first transmission rod is fixedly connected with the first transmission wheel; the outer surface of the first transmission rod is fixedly connected with the first bevel gear; the first transmission rod is rotatably connected with the bottom frame; the outer ring surface of the first driving wheel is in transmission connection with the second driving wheel through a belt; the inner axle center of the second driving wheel is fixedly connected with a fourth driving rod; the first bevel gear is meshed with the second bevel gear; the inner axis of the second bevel gear is fixedly connected with a second transmission rod; the outer surface of the second transmission rod is fixedly connected with the first gear; the second transmission rod is rotatably connected with the underframe; the first gear is meshed with the second gear; the inner axle center of the second gear is fixedly connected with the third transmission rod; the outer surface of the third transmission rod is fixedly connected with the grinding wheel; the third transmission rod is rotatably connected with the double-foot electric plate; the two-leg electric plate is connected with the underframe in a sliding manner; the third transmission rod is connected with the underframe; the outer surface of the fourth transmission rod is fixedly connected with the third transmission wheel; the fourth transmission rod is connected with the circulating corrosion unit; the fourth transmission rod is rotatably connected with the underframe; the outer ring surface of the third driving wheel is in transmission connection with the fourth driving wheel through a belt; the inner axle center of the fourth driving wheel is fixedly connected with the fifth driving rod; the outer surface of the fifth transmission rod is fixedly connected with the third gear; the fifth transmission rod is rotatably connected with the underframe; a second electric push rod is arranged on the side surface of the third gear; the second electric push rod is fixedly connected with the overturning seat; the second electric push rod is fixedly connected with the underframe; the overturning seat is rotationally connected with the sixth transmission rod; the outer surface of the sixth transmission rod is fixedly connected with the fourth gear; the sixth transmission rod is fixedly connected with the arc-shaped clamping plate; two sides of the arc-shaped clamping plate are fixedly connected with a spring strip respectively; two groups of symmetrically arranged spring strips are rotationally connected with the overturning seat; two groups of third electric slide bars which are symmetrically arranged are arranged above the arc-shaped clamping plate; two groups of third electric slide bars which are symmetrically arranged are in sliding connection with the first electric slide plate; two groups of third electric slide bars which are symmetrically arranged are fixedly connected with the underframe; the first electric sliding plate is fixedly connected with the first pneumatic sucker; the first pneumatic sucker is connected with the air pump through a conduit; two groups of third electric slide bars which are symmetrically arranged are in sliding connection with the second electric slide plate; the second electric sliding plate is fixedly connected with the second pneumatic sucker; the second pneumatic sucker is connected with the air pump through a conduit; the air pump is fixedly connected with the underframe; two groups of second electric push rods to the arc-shaped clamping plates are symmetrically arranged at the center of the second electric sliding plate.
As a preferred technical scheme, the circulating corrosion unit comprises a fifth transmission wheel, a sixth transmission wheel, a shaft sleeve, a seventh transmission rod, a connecting plate, a third electric push rod, a tooth-missing gear, an eighth transmission rod, a third bevel gear, a fourth bevel gear, an electric sliding disc, a fourth electric sliding rod, a rotating disc, a limiting rod, a limiting frame, a movable electric rotating shaft, a first friction roller, a fixed electric rotating shaft, a second friction roller, a corrosion pool and a fourth electric push rod; the outer surface of the fourth transmission rod is fixedly connected with the fifth transmission wheel; the outer ring surface of the fifth driving wheel is in transmission connection with the sixth driving wheel through a belt; the inner axis of the sixth transmission wheel is fixedly connected with the shaft sleeve; the shaft sleeve is connected with the seventh transmission rod; the shaft sleeve is rotatably connected with the underframe; the seventh transmission rod is fixedly connected with the connecting plate; the outer surface of the seventh transmission rod is fixedly connected with the gear with missing teeth; the connecting plate is fixedly connected with the third electric push rod; the third electric push rod is fixedly connected with the underframe; an eighth transmission rod is arranged on the side face of the gear with missing teeth; the outer surface of the eighth transmission rod is fixedly connected with the third bevel gear; the outer surface of the eighth transmission rod is fixedly connected with the fourth bevel gear; the eighth transmission rod is rotatably connected with the electric sliding disc; the outer surface of the eighth transmission rod is fixedly connected with the turntable; two sides of the electric sliding disc are respectively connected with a fourth electric sliding rod in a sliding manner; three groups of limiting rods are uniformly arranged on the outer ring surface of the turntable; the eighth transmission rod is rotatably connected with the limiting frame; two groups of symmetrically arranged fourth electric slide bars are fixedly connected with the underframe; the limiting rod is contacted with the movable electric rotating shaft; the limiting frame is fixedly connected with the electric sliding disc through a connecting column; the three groups of mobile electric rotating shafts are in sliding connection with the electric sliding disc through connecting blocks; the three groups of movable electric rotating shafts are in sliding connection with the limiting frame through connecting blocks; the movable electric rotating shaft is fixedly connected with the first friction roller; the limiting frame is fixedly connected with three groups of fixed electric rotating shafts which are uniformly arranged; a corrosion pool is arranged below the limiting frame; the fixed electric rotating shaft is fixedly connected with the second friction roller; the corrosion tank is fixedly connected with the fourth electric push rod; the fourth electric push rod is fixedly connected with the underframe.
As the preferred technical scheme of the invention, the material platform is arranged into a hopper-shaped structure with a notch in the middle.
As a preferred technical scheme of the invention, the grinding wheel is arranged in an inverted conical barrel structure.
As the preferred technical scheme of the invention, the middle part of the arc-shaped clamping plate is provided with a groove structure.
As a preferred technical scheme of the invention, an outer annular surface of the third transmission rod contacting with the underframe is provided with a straight tangent plane; the outer ring surface of the seventh transmission rod, which is contacted with the shaft sleeve, is provided with a straight tangent plane.
As a preferable technical scheme of the invention, the first friction roller and the second friction roller are both provided with an oval structure.
Compared with the prior art, the invention has the following beneficial effects:
first, because in the crystal disk manufacturing process for the solution, need carry out the angle grinding to the crystal disk, this can make the crystal disk produce edging burr etc. at the in-process of angle grinding, the edging burr can make the corrosion processes more elongated, and the consumption of corrosive liquid is also more, also can make the corruption produce serious etch pit because the edging burr simultaneously, influence the packaging process of crystal disk, secondly, in-process when the crystal disk is corroding, often because the position of crystal lamella and clamping device contact is difficult to accept the corruption, make the oxidation material on the surface be difficult to get rid of, result to the unable accurate control is caused to the result of use of crystal disk, can't satisfy the shortcoming of user demand on the daily production life.
Secondly, the invention arranges a pretreatment unit, a deburring unit and a circulating corrosion unit; when the device is used, the crystal wafer rotary corrosion device of the thyristor for the smart grid is placed at a position to be used, the bottom frame on the bearing seat is placed at a stable position through the anti-skid pad, then the device is externally connected with a power supply, and the device is controlled to be started through the control screen; at first place the crystal disk in the preprocessing unit, the crystal disk is handled in advance, detach the impurity detritus that has in the disk, then carry out annular polishing to the chamfer region of crystal disk through unhairing limit unit, avoid causing serious influence to the corrosion process of crystal disk at the burr that the chamfer in-process produced, make the area of corroding increase, the etchant solution of consumption increases, the degree of corrosion of wafer receives the influence of burr, it becomes many influences and uses to corrode the hole, then, shift to the electric lift board, move on first electric slide rail through electric slider, then carry out rotary corrosion to the crystal disk through the circulation corruption unit, further dispel the oxidizing substance on crystal surface, at last shift to the collecting vessel, move on second electric slide rail through electric objective table, shift out the crystal disk.
Thirdly, the method removes burrs of the chamfered crystal wafer by performing the deburring operation on the chamfered crystal wafer, removes residual slag on the chamfered crystal wafer by adopting a linear movable clamping mode on the wafer, removes burrs on the wafer in a rotation mode, can enable the subsequent removal of oxides on the wafer to be mild, can reduce the consumption of corrosive liquid, and effectively improves the processing efficiency of the crystal wafer.
Drawings
FIG. 1 is a schematic perspective view of a first embodiment of the present invention;
FIG. 2 is a schematic perspective view of a second embodiment of the present invention;
FIG. 3 is a schematic perspective view of a pretreatment unit according to the present invention;
FIG. 4 is a schematic perspective view of a deburring unit according to the present invention;
FIG. 5 is a schematic perspective view of a portion of a deburring unit according to the present invention;
FIG. 6 is a schematic perspective view of a cyclic etching unit according to the present invention;
FIG. 7 is a schematic perspective view of a part of a circulating etching unit according to the present invention.
Part names and serial numbers in the figure: 1_ chassis, 2_ pretreatment unit, 3_ deburring unit, 4_ cyclic etching unit, 5_ control panel, 6_ first electric slide, 7_ electric slide, 8_ electric lifter plate, 9_ second electric slide, 10_ electric stage, 11_ collection bucket, 12_ bearing seat, 13_ anti-skid pad, 201_ first electric slide, 202_ second electric slide, 203_ material stage, 204_ first electric push rod, 205_ baffle, 206_ double-foot carriage, 207_ blower, 208_ first electric slide, 209_ second electric slide, 2010_ first electric push plate, 2011_ second electric push plate, 2012_ first limit rope, 2013_ second limit rope, 2014_ electric conveyor belt, 2015_ spring rod, 2016_ limit plate, 301_ motor, 302_ first drive rod, 303_ first drive wheel, 304_ second drive wheel, 305_ first drive wheel, 306_ bevel gear, 307_ second transmission rod, 308_ first gear, 309_ second gear, 3010_ third transmission rod, 3011_ grinding wheel, 3012_ fourth transmission rod, 3013_ third transmission wheel, 3014_ fourth transmission wheel, 3015_ fifth transmission rod, 3016_ third gear, 3017_ second electric push rod, 3018_ roll-over stand, 3019_ sixth transmission rod, 3020_ fourth gear, 3021_ spring bar, 3022_ arc clamp, 3023_ third electric slide rod, 3024_ first electric slide plate, 3025_ first electric suction cup, 3026_ second electric slide plate, 3027_ second electric suction cup, 3028_ air pump, 3029_ two-legged electric plate, 401_ fifth transmission wheel, 402_ sixth transmission wheel, 403_ shaft sleeve, 404_ seventh transmission rod, 405_ link plate, 406_ third electric push rod, 407_ third gear, 408_ eighth transmission rod, 409_ third transmission rod, 4010_ fourth bevel gear, 4011_ electric bevel gear, 4012_ fourth electric slide bar, 4013_ rotary table, 4014_ limit bar, 4015_ limit shelf, 4016_ mobile electric rotating shaft, 4017_ first friction roller, 4018_ fixed electric rotating shaft, 4019_ second friction roller, 4020_ corrosion pool, 4021_ fourth electric push rod.
Detailed Description
The preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.
Example 1
A crystal wafer rotary corrosion device of a thyristor for a smart grid is shown in figures 1-7 and comprises a bottom frame 1, a pretreatment unit 2, a deburring unit 3, a circulating corrosion unit 4, a control screen 5, a first electric slide rail 6, an electric slide block 7, an electric lifting plate 8, a second electric slide rail 9, an electric objective table 10, a collecting barrel 11, a bearing seat 12 and an anti-skid pad 13; the underframe 1 is connected with the pretreatment unit 2; the underframe 1 is connected with the deburring unit 3; the underframe 1 is connected with a circulating corrosion unit 4; the underframe 1 is connected with a control screen 5; the underframe 1 is connected with a first electric slide rail 6; the underframe 1 is connected with a second electric slide rail 9; the underframe 1 is connected with the bearing seat 12; the deburring unit 3 is connected with the circulating corrosion unit 4; the first electric slide rail 6 is connected with an electric slide block 7; the electric slider 7 is connected with the electric lifting plate 8; the second electric slide rail 9 is connected with an electric objective table 10; the electric objective table 10 is connected with the collecting barrel 11; the load-bearing seat 12 is connected with the non-slip mat 13.
The working principle is as follows: when the device is used, the crystal wafer rotary corrosion device of the thyristor for the smart grid is placed at a position to be used, the underframe 1 on the bearing seat 12 is placed at a stable position through the anti-skid pad 13, then the device is externally connected with a power supply, and the device is controlled to be started through the control screen 5; firstly, a crystal wafer is placed in a pretreatment unit 2, the crystal wafer is pretreated to remove impurity particles in the wafer, then a deburring unit 3 is used for polishing a chamfer area of the crystal wafer in an annular mode, so that the serious influence of burrs generated in the chamfering process on the corrosion process of the crystal wafer is avoided, the corrosion area is increased, consumed corrosion liquid is increased, the corrosion degree of the wafer is influenced by the burrs, corrosion pits are changed to be influenced and used more, then the wafer is transferred onto an electric lifting plate 8, the wafer is moved on a first electric sliding rail 6 through an electric sliding block 7, then the crystal wafer is subjected to rotary corrosion through a circulating corrosion unit 4, oxidized substances on the surface of the crystal are further removed, and finally the wafer is transferred onto a collection barrel 11 and moved on a second electric sliding rail 9 through an electric objective table 10 to transfer the crystal wafer out; according to the invention, the burr removing operation is carried out on the chamfered crystal wafer, wherein the wafer is clamped in a linear moving manner, so that the residual slag on the chamfered crystal wafer is removed, and then the burr on the wafer is removed in a rotating manner, so that the subsequent oxide removing corrosion of the wafer is mild, the consumption of corrosive liquid can be reduced, and the processing efficiency of the crystal wafer is effectively improved.
The pretreatment unit 2 comprises a first electric sliding support 201, a second electric sliding support 202, a material table 203, a first electric push rod 204, a baffle plate 205, a double-foot carriage 206, a fan 207, a first electric slide rod 208, a second electric slide rod 209, a first electric push plate 2010, a second electric push plate 2011, a first limit rope 2012, a second limit rope 2013, an electric conveyor belt 2014, a spring rod 2015 and a limit plate 2016; the first electric sliding support 201 is in sliding connection with the underframe 1; the second electric sliding support 202 is in sliding connection with the underframe 1; two sides of the material table 203 are fixedly connected with the first electric sliding support 201 and the second electric sliding support 202 respectively; a baffle 205 is arranged on the side surface of the material table 203; the baffle 205 is fixedly connected with the first electric push rod 204; the first electric push rod 204 is fixedly connected with the underframe 1; a double-foot sliding frame 206 is arranged on the baffle plate 205; the side surface of the baffle 205 is provided with an electric conveyor belt 2014; the double-foot carriage 206 is fixedly connected with two groups of symmetrically arranged fans 207; the double-foot sliding frame 206 is fixedly connected with a first electric sliding rod 208; the double-foot sliding frame 206 is fixedly connected with a second electric sliding rod 209; the double-foot carriage 206 is respectively connected with a first limit rope 2012 and a second limit rope 2013; the double-foot sliding frame 206 is connected with the underframe 1 in a sliding way; the two sides of the first electric push plate 2010 are respectively connected with the first electric sliding rod 208 and the second electric sliding rod 209 in a sliding manner; the two sides of the second electric push plate 2011 are respectively connected with the first electric sliding rod 208 and the second electric sliding rod 209 in a sliding manner; two groups of the first electric slide bar 208 to the second electric push plate 2011 are arranged in a central symmetry way by the double-foot sliding frame 206; the electric conveyor 2014 is in sliding connection with the spring rod 2015; the spring rod 2015 is fixedly connected with the limiting plate 2016; two groups of spring rods 2015 and two groups of limiting plates 2016 are symmetrically arranged in the center of the electric conveyor 2014; the electric conveyor belt 2014 is fixedly connected with the underframe 1;
firstly, a series of chamfered crystal wafers are obliquely placed on a material platform 203 to avoid mutual sliding among the crystal wafers, then, a first electric push rod 204 controls a baffle plate 205 to move upwards until the baffle plate 205 is blocked at a notch structure position of the material platform 203, at the moment, a first electric sliding support 201 and a second electric sliding support 202 are matched with the material platform 203 with animals to move towards the direction close to the baffle plate 205 until the crystal wafers on the material platform 203 are vertical, meanwhile, a double-foot carriage 206 drives two groups of first electric sliding rods 208 and second electric sliding rods 209 which are symmetrically arranged to move together with a first limiting rope 2012 and a second limiting rope 2013, when the first limiting rope 2012 crosses the upper part of the inclined crystal wafers, the crystal wafers stand up to be at a position between the first limiting rope 2012 and the second limiting rope 2013, then a first electric push plate 2010 and a second electric push plate 2011 move towards the directions which are close to each other on the first electric sliding rods 208 and the second electric sliding rods 209, make the position between first spacing rope 2012 and the spacing rope 2013 of second reduce, and clip the crystal wafer, then two foot balladeur train 206 drives first spacing rope 2012 and the spacing rope 2013 of second and shifts, drive the crystal wafer simultaneously and remove, at the in-process that removes, two sets of symmetrical fan 207 that set up blow to the crystal wafer, detach the crushed aggregates impurity on the crystal surface, then, when the crystal wafer reachs electronic conveyer belt 2014, first electronic push pedal 2010 and the electronic push pedal 2011 of second move towards the direction of keeping away from each other, make the crystal wafer loosened, then carry out the position through two sets of symmetrical limiting plate 2016 that set up on the electronic conveyer belt that have a spring beam 2015 respectively, then, after electronic conveyer belt 2014 shifts the crystal wafer to suitable position, stop working, cooperate unhairing unit 3 to the operation of crystal wafer.
The deburring unit 3 comprises a motor 301, a first transmission rod 302, a first transmission wheel 303, a second transmission wheel 304, a first bevel gear 305, a second bevel gear 306, a second transmission rod 307, a first gear 308, a second gear 309, a third transmission rod 3010, a grinding wheel 3011, a fourth transmission rod 3012, a third transmission wheel 3013, a fourth transmission wheel 3014, a fifth transmission rod 3015, a third gear 3016, a second electric push rod 3017, a turnover seat 3018, a sixth transmission rod 3019, a fourth gear 3020, a spring strip 3021, an arc-shaped splint 3022, a third electric slide rod 3023, a first electric slide 3024, a first pneumatic suction cup 3025, a second electric slide 3026, a second pneumatic suction cup 3027, an air pump 3028 and a two-foot electric plate 3029; an output shaft of the motor 301 is fixedly connected with the first transmission rod 302; the outer surface of the first transmission rod 302 is fixedly connected with the first transmission wheel 303; the outer surface of the first transmission rod 302 is fixedly connected with a first bevel gear 305; the first transmission rod 302 is rotatably connected with the underframe 1; the outer ring surface of the first driving wheel 303 is in transmission connection with a second driving wheel 304 through a belt; the inner axis of the second transmission wheel 304 is fixedly connected with the fourth transmission rod 3012; the first bevel gear 305 is meshed with the second bevel gear 306; the inner axis of the second bevel gear 306 is fixedly connected with a second transmission rod 307; the outer surface of the second transmission rod 307 is fixedly connected with the first gear 308; the second transmission rod 307 is rotatably connected with the underframe 1; the first gear 308 is meshed with the second gear 309; the inner axis of the second gear 309 is fixedly connected with the third transmission rod 3010; the outer surface of the third transmission rod 3010 is fixedly connected with a grinding wheel 3011; the third transmission rod 3010 is rotatably connected to the two-pin electric board 3029; the double-foot electric board 3029 is connected with the underframe 1 in a sliding manner; the third transmission rod 3010 is connected to the underframe 1; the outer surface of the fourth transmission rod 3012 is fixedly connected with the third transmission wheel 3013; the fourth transmission rod 3012 is connected with the circulating corrosion unit 4; the fourth transmission rod 3012 is rotatably connected with the underframe 1; the outer ring surface of the third driving wheel 3013 is in transmission connection with the fourth driving wheel 3014 through a belt; the inner axis of the fourth transmission wheel 3014 is fixedly connected with the fifth transmission rod 3015; the outer surface of the fifth transmission rod 3015 is fixedly connected with the third gear 3016; the fifth transmission rod 3015 is rotatably connected with the underframe 1; a second electric push rod 3017 is arranged on the side surface of the third gear 3016; the second electric push rod 3017 is fixedly connected with the turnover seat 3018; the second electric push rod 3017 is fixedly connected with the underframe 1; the overturning seat 3018 is rotatably connected with the sixth transmission rod 3019; the outer surface of the sixth transmission rod 3019 is fixedly connected with a fourth gear 3020; the sixth transmission rod 3019 is fixedly connected with the arc-shaped clamp plate 3022; two sides of the arc-shaped clamping plate 3022 are fixedly connected with a spring strip 3021 respectively; the two groups of symmetrically arranged spring strips 3021 are rotatably connected with the turning seat 3018; two groups of third electric slide bars 3023 which are symmetrically arranged are arranged above the arc-shaped splint 3022; two groups of third electric slide bars 3023 which are symmetrically arranged are in sliding connection with the first electric slide plate 3024; two groups of third electric slide bars 3023 which are symmetrically arranged are fixedly connected with the underframe 1; the first electric sliding plate 3024 is fixedly connected with the first pneumatic suction cup 3025; the first pneumatic suction cup 3025 is connected with the air pump 3028 through a conduit; two groups of third electric slide bars 3023 which are symmetrically arranged are in sliding connection with the second electric slide plate 3026; the second electric sliding plate 3026 is fixedly connected with the second pneumatic suction cup 3027; the second pneumatic suction cup 3027 is connected to the air pump 3028 through a conduit; the air pump 3028 is fixedly connected with the chassis 1; two sets of the second electric push rods 3017 to the arc-shaped splints 3022 are arranged in the center symmetry of the second electric slide plate 3026.
When the wafer arrives at a proper position, at this time, the first electric slide plate 3024 moves on two sets of third electric slide rods 3023 symmetrically arranged, and at the same time, the first electric slide plate 3024 drives the first pneumatic suction cups 3025 to move together, when the first pneumatic suction cups 3025 arrive above the wafer, the air pump 3028 starts to operate, so as to draw air in the first pneumatic suction cups 3025, so that the first pneumatic suction cups 3025 suck the wafer, and then, when the first pneumatic suction cups 3025 arrive right above the grinding wheel 3011 through the first electric slide plate 3024, the air pump 3028 stops moving, at this time, the motor 301 drives the first transmission rod 302 to simultaneously drive the first transmission wheel 303 and the first bevel gear 305 to rotate, the first bevel gear 305 drives the second bevel gear 306 to rotate the second transmission rod 307, the second transmission rod 307 drives the first gear 308 to drive the second gear 309 to rotate the third transmission rod 3010 to drive the grinding wheel 3011 to rotate, at this time, the two-foot electric board 3029 drives the third transmission rod 3010 to drive the second gear 309 and the grinding wheel 3011 to move upward at the same time, when the grinding wheel 3011 is attached under the crystal wafer, the chamfering position of the crystal wafer starts to be deburred by rotating, when the deburring treatment of the chamfer on one side is completed, the two-foot electric board 3029 drives the third transmission rod 3010 to drive the second gear 309 and the grinding wheel 3011 to move downward at the same time, the first electric sliding board 3024 drives the first pneumatic suction cup 3025 to transfer, and drives the crystal wafer to move at the same time, until the crystal wafer reaches the upper part of the two sets of arc-shaped splints 3022, the second electric push rods 3017 respectively control one turnover seat 3018 to move upward, when the crystal wafer is clamped by the two sets of arc-shaped splints 3022, the first pneumatic suction cup 3025 releases the fixation of the crystal wafer, and then, the second electric push rods 3017 respectively control one turnover seat 3018 to move downward, the movement is stopped until the fourth gear 3020 is engaged with the third gear 3016, at this time, the first driving wheel 303 drives the second driving wheel 304 to drive the fourth driving rod 3012 to rotate, the fourth driving rod 3012 simultaneously drives two sets of symmetrically arranged third driving wheels 3013 to rotate, the fourth driving rod 3012 drives the circulating etching unit 4 to rotate, the third driving wheel 3013 drives the fourth driving wheel 3014 to drive the fifth driving rod 3015 to rotate, the fifth driving rod 3015 drives the third gear 3016 to drive the fourth gear 3020 to rotate, the fourth driving rod 3020 drives the sixth driving rod 3019 to drive the arc-shaped clamp 3022 to rotate, the arc-shaped clamp 3022 simultaneously drives the two sets of symmetrically arranged spring strips 3021 to rotate, when the wafer is turned over at a flat angle, the second electric push rods 3017 respectively control one turning seat 3018 to move upwards, at this time, the second electric slide 3026 drives the second pneumatic suction cup 3027 to reach right above the wafer, air pump 3028 moves, make second pneumatic suction cup 3027 absorb the crystal disk, the centre gripping of completion to the crystal disk is fixed, then rethread second electric skateboard 3026 drives second pneumatic suction cup 3027 and shifts, take the crystal disk to remove simultaneously, when the crystal disk reachs the top of electric lift board 8, electric lift board 8 up-wards moves, after being close to the crystal disk, second pneumatic suction cup 3027 loosens the fixed to the crystal disk, make the crystal disk stop on electric lift board 8, then, electric lift board 8 down-wards moves, electric lift board 8 passes through electric slider 7 and moves on first electric slide rail 6, shift the crystal disk to suitable position on, cooperation cycle corrosion unit 4 operates.
The circulating corrosion unit 4 comprises a fifth driving wheel 401, a sixth driving wheel 402, a shaft sleeve 403, a seventh driving rod 404, a connecting plate 405, a third electric push rod 406, a tooth-missing gear 407, an eighth driving rod 408, a third bevel gear 409, a fourth bevel gear 4010, an electric sliding disc 4011, a fourth electric sliding bar 4012, a rotary disc 4013, a limiting rod 4014, a limiting frame 4015, a movable electric rotating shaft 4016, a first friction roller 4017, a fixed electric rotating shaft 4018, a second friction roller 4019, a corrosion cell 4020 and a fourth electric push rod 4021; the outer surface of the fourth transmission rod 3012 is fixedly connected with the fifth transmission wheel 401; the outer annular surface of the fifth driving wheel 401 is in transmission connection with a sixth driving wheel 402 through a belt; the inner axis of the sixth transmission wheel 402 is fixedly connected with the shaft sleeve 403; the bushing 403 is connected with a seventh transmission rod 404; the shaft sleeve 403 is rotatably connected with the underframe 1; the seventh transmission rod 404 is fixedly connected with the connecting plate 405; the outer surface of the seventh transmission rod 404 is fixedly connected with the gear with missing teeth 407; the connecting plate 405 is fixedly connected with a third electric push rod 406; the third electric push rod 406 is fixedly connected with the underframe 1; an eighth transmission rod 408 is arranged on the side surface of the gear 407 with missing teeth; the outer surface of the eighth transmission rod 408 is fixedly connected with a third bevel gear 409; the outer surface of the eighth transmission rod 408 is fixedly connected with a fourth bevel gear 4010; the eighth transmission rod 408 is rotatably connected to the electric sliding disk 4011; the outer surface of the eighth transmission rod 408 is fixedly connected with the turntable 4013; two sides of the electric sliding disc 4011 are respectively connected with a fourth electric sliding rod 4012 in a sliding way; three groups of limiting rods 4014 are uniformly arranged on the outer annular surface of the turntable 4013; the eighth transmission rod 408 is rotatably connected with the limiting frame 4015; two groups of symmetrically arranged fourth electric slide bars 4012 are fixedly connected with the underframe 1; the limiting rod 4014 is in contact with the movable electric rotating shaft 4016; the limiting frame 4015 is fixedly connected with the electric sliding disc 4011 through a connecting column; the three groups of mobile electric rotating shafts 4016 are in sliding connection with the electric sliding disk 4011 through connecting blocks; the three groups of mobile electric rotating shafts 4016 are in sliding connection with the limiting frame 4015 through connecting blocks; the movable electric rotating shaft 4016 is fixedly connected with a first friction roller 4017; the limiting frame 4015 is fixedly connected with three groups of fixed electric rotating shafts 4018 which are uniformly arranged; a corrosion pool 4020 is arranged below the limiting frame 4015; the fixed electric rotating shaft 4018 is fixedly connected with a second friction roller 4019; the corrosion pool 4020 is fixedly connected with the fourth electric push rod 4021; the fourth electric push rod 4021 is fixedly connected with the underframe 1.
When the crystal wafer reaches the position right below the electric sliding disk 4011, the electric lifting plate 8 moves upwards until the crystal wafer is positioned at the middle position of the three groups of second friction rollers 4019, the movement is stopped, at this time, the three groups of fixed electric rotating shafts 4018 respectively drive one second friction roller 4019 to enable the second friction roller 4019 to clamp and fix the crystal wafer, then, the electric sliding disk 4011 transfers on the two groups of fourth electric sliding rods 4012 which are symmetrically arranged, when the electric sliding disk 4011 reaches the position right above the corrosion pool 4020 filled with corrosive liquid, the movement is stopped, the fourth electric push rod 4021 controls the corrosion pool 4020 to move upwards to enable the corrosive liquid to stop moving when the crystal wafer passes through, at this time, the fourth transmission rod 3012 drives the fifth transmission rod 401 to drive the sixth transmission rod 402 to rotate, the sixth transmission rod 402 drives the shaft sleeve 403 to drive the seventh transmission rod 404 to rotate, the seventh transmission rod 404 drives the tooth-lacking gear 407 to rotate, at this time, the third electric push rod 406 controls the connecting plate 405 to drive the seventh transmission rod 404 to drive the gear 407 to move, the gear 407 stops moving when the gear 407 is close to the eighth transmission rod 408, when the gear 407 is engaged with the third bevel gear 409, the gear 407 drives the third bevel gear 409 to drive the eighth transmission rod 408 to rotate, when the gear 407 is engaged with the fourth bevel gear 4010, the gear 407 drives the fourth bevel gear 4010 to drive the eighth transmission rod 408 to rotate, the third bevel gear 409 and the fourth bevel gear 4010 respectively drive the eighth transmission rod 408 to rotate in the forward and reverse directions, the eighth transmission rod 408 drives the rotary table 4013 to rotate, the rotary table 4013 drives a plurality of sets of limit rods 4014 to rotate, at this time, the limit rods 4014 will move the electric rotating shaft 4016 on the limit frame 4015, at this time, when the electric rotating shaft 4016 moves, the electric rotating shaft 4018 is fixed to drive the second friction roller 4019 to rotate, make three group's second friction roller 4019 loosen the centre gripping to the crystal disk, and simultaneously, remove electronic pivot 4016 and drive first friction roller 4017 and rotate, three group's first friction roller 4017 presss from both sides tight crystal disk, can realize when removing electronic pivot 4016 in the pivoted, it rotates to drive the crystal disk, then when removing electronic pivot 4016 stop motion, fixed electronic pivot 4018 drives second friction roller 4019 and rotates, three group's second friction roller 4019 is to the centre gripping of crystal disk, make the crystal disk can rotate with intermittent type mode, avoid the condition emergence that can't corrode on the contact site.
The material table 203 is configured into a hopper-shaped structure with a gap in the middle.
The crystal wafer can naturally lean against the hopper-shaped structure of the material table 203 in a certain inclined state, and the crystal wafer can be blocked and stand up in the moving process through the middle gap.
The grinding wheel 3011 is provided in an inverted conical barrel configuration.
The burr on the wafer can be finely processed by the inverted conical barrel structure by controlling the up-and-down movement of the grinding wheel 3011.
The middle part of the arc-shaped clamping plate 3022 is provided with a groove structure.
The wafer can not easily fall off when the arc-shaped clamping plate 3022 clamps the wafer during the overturning process.
The outer ring surface of the third transmission rod 3010 contacting with the underframe 1 is provided with a straight tangent plane; the outer annular surface of the seventh transmission rod 404 contacting the sleeve 403 is provided with a straight tangent plane.
The third driving rod 3010 can be made to slide on the chassis 1 and also to rotate on the chassis 1, so that the seventh driving rod 404 can slide on the bushing 403 and can also be made to rotate by the bushing 403.
The first rubbing roller 4017 and the second rubbing roller 4019 are each provided in an elliptical structure.
The first rubbing roller 4017 and the second rubbing roller 4019 can be made to fix and loosen the wafer while rotating.
The present application is described in detail above, and the principles and embodiments of the present application are described herein by using specific examples, which are only used to help understand the method and the core idea of the present application; meanwhile, for a person skilled in the art, according to the idea of the present application, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present application.
Claims (9)
1. The utility model provides a rotatory corrosion unit of crystal disk of thyristor for smart power grids, including chassis (1), control panel (5), first electronic slide rail (6), electronic slider (7), electric lift board (8), electronic slide rail of second (9), electronic objective table (10), collecting vessel (11), bearing seat (12) and slipmat (13), its characterized in that: the device also comprises a pretreatment unit (2), a deburring unit (3) and a circulating corrosion unit (4); the underframe (1) is connected with the pretreatment unit (2); the underframe (1) is connected with the deburring unit (3); the underframe (1) is connected with the circulating corrosion unit (4); the underframe (1) is connected with the control screen (5); the underframe (1) is connected with a first electric slide rail (6); the underframe (1) is connected with a second electric slide rail (9); the underframe (1) is connected with the bearing seat (12); the deburring unit (3) is connected with the circulating corrosion unit (4); the first electric slide rail (6) is connected with the electric slide block (7); the electric sliding block (7) is connected with the electric lifting plate (8); the second electric slide rail (9) is connected with the electric objective table (10); the electric objective table (10) is connected with the collecting barrel (11); the bearing seat (12) is connected with the non-slip mat (13).
2. The crystal wafer rotary etching device of the thyristor for the smart grid as claimed in claim 1, wherein the preprocessing unit (2) comprises a first electric sliding support (201), a second electric sliding support (202), a material table (203), a first electric push rod (204), a baffle (205), a two-leg carriage (206), a blower (207), a first electric slide rod (208), a second electric slide rod (209), a first electric push plate (2010), a second electric push plate (2011), a first limiting rope (2012), a second limiting rope (2013), an electric conveyor belt (2014), a spring rod (2015) and a limiting plate (2016); the first electric sliding support (201) is in sliding connection with the underframe (1); the second electric sliding support (202) is in sliding connection with the bottom frame (1); two sides of the material platform (203) are fixedly connected with a first electric sliding support (201) and a second electric sliding support (202) respectively; a baffle (205) is arranged on the side surface of the material platform (203); the baffle (205) is fixedly connected with the first electric push rod (204); the first electric push rod (204) is fixedly connected with the underframe (1); a double-foot sliding frame (206) is arranged on the baffle plate (205); an electric conveyor belt (2014) is arranged on the side surface of the baffle plate (205); the double-foot sliding frame (206) is fixedly connected with two groups of fans (207) which are symmetrically arranged; the double-foot sliding frame (206) is fixedly connected with a first electric sliding rod (208); the double-foot sliding frame (206) is fixedly connected with a second electric sliding rod (209); the double-foot sliding frame (206) is respectively connected with a first limiting rope (2012) and a second limiting rope (2013); the double-foot sliding frame (206) is connected with the underframe (1) in a sliding way; two sides of the first electric push plate (2010) are respectively connected with the first electric sliding rod (208) and the second electric sliding rod (209) in a sliding way; two sides of the second electric push plate (2011) are respectively connected with the first electric sliding rod (208) and the second electric sliding rod (209) in a sliding manner; two groups of first electric sliding rods (208) to second electric push plates (2011) are arranged in a central symmetry mode through a double-foot sliding frame (206); the electric conveyor belt (2014) is in sliding connection with the spring rod (2015); the spring rod (2015) is fixedly connected with the limit plate (2016); two groups of spring rods (2015) and two groups of limiting plates (2016) are arranged in a centrosymmetric manner on the electric conveyor belt (2014); the electric conveyor belt (2014) is fixedly connected with the bottom frame (1).
3. The crystal wafer rotary etching device of the thyristor for the smart grid as claimed in claim 2, wherein the deburring unit (3) comprises a motor (301), a first transmission rod (302), a first transmission wheel (303), a second transmission wheel (304), a first bevel gear (305), a second bevel gear (306), a second transmission rod (307), a first gear (308), a second gear (309), a third transmission rod (3010), a grinding wheel (3011), a fourth transmission rod (3012), a third transmission wheel (3013), a fourth transmission wheel (3014), a fifth transmission rod (3015), a third gear (3016), a second electric push rod (3017), a turning seat (3018), a sixth transmission rod (3019), a fourth gear (3020), a spring strip (3021), an arc-shaped clamping plate (3022), a third electric slide rod (3023), a first electric slide plate (3024), a first pneumatic suction cup (3025), A second electric skateboard (3026), a second pneumatic suction cup (3027), an air pump (3028) and a two-foot electric board (3029); an output shaft of the motor (301) is fixedly connected with the first transmission rod (302); the outer surface of the first transmission rod (302) is fixedly connected with the first transmission wheel (303); the outer surface of the first transmission rod (302) is fixedly connected with a first bevel gear (305); the first transmission rod (302) is rotationally connected with the underframe (1); the outer ring surface of the first driving wheel (303) is in transmission connection with a second driving wheel (304) through a belt; the inner axle center of the second driving wheel (304) is fixedly connected with a fourth driving rod (3012); the first bevel gear (305) is meshed with the second bevel gear (306); the inner axis of the second bevel gear (306) is fixedly connected with a second transmission rod (307); the outer surface of the second transmission rod (307) is fixedly connected with the first gear (308); the second transmission rod (307) is rotationally connected with the underframe (1); the first gear (308) is meshed with the second gear (309); the inner axis of the second gear (309) is fixedly connected with a third transmission rod (3010); the outer surface of the third transmission rod (3010) is fixedly connected with a grinding wheel (3011); the third transmission rod (3010) is connected with the double-foot electric board (3029) in a rotating way; the double-foot electric board (3029) is connected with the underframe (1) in a sliding way; the third transmission rod (3010) is connected with the underframe (1); the outer surface of the fourth transmission rod (3012) is fixedly connected with the third transmission wheel (3013); the fourth transmission rod (3012) is connected with the circulating corrosion unit (4); the fourth transmission rod (3012) is rotatably connected with the underframe (1); the outer ring surface of the third driving wheel (3013) is in transmission connection with a fourth driving wheel (3014) through a belt; the inner axis of the fourth transmission wheel (3014) is fixedly connected with a fifth transmission rod (3015); the outer surface of the fifth transmission rod (3015) is fixedly connected with a third gear (3016); the fifth transmission rod (3015) is rotatably connected with the underframe (1); a second electric push rod (3017) is arranged on the side surface of the third gear (3016); the second electric push rod (3017) is fixedly connected with the overturning seat (3018); the second electric push rod (3017) is fixedly connected with the underframe (1); the overturning seat (3018) is rotatably connected with a sixth transmission rod (3019); the outer surface of the sixth transmission rod (3019) is fixedly connected with a fourth gear (3020); the sixth transmission rod (3019) is fixedly connected with the arc-shaped clamp plate (3022); two sides of the arc-shaped splint (3022) are fixedly connected with a spring bar (3021) respectively; two groups of spring strips (3021) which are symmetrically arranged are rotatably connected with the overturning seat (3018); two groups of third electric slide bars (3023) which are symmetrically arranged are arranged above the arc-shaped splint (3022); two groups of third electric slide bars (3023) which are symmetrically arranged are in sliding connection with the first electric slide plate (3024); two groups of third electric slide bars (3023) which are symmetrically arranged are fixedly connected with the underframe (1); the first electric sliding plate (3024) is fixedly connected with the first pneumatic sucker (3025); the first pneumatic sucker (3025) is connected with the air pump (3028) through a conduit; two groups of third electric slide bars (3023) which are symmetrically arranged are in sliding connection with the second electric slide plate (3026); the second electric sliding plate (3026) is fixedly connected with the second pneumatic sucker (3027); the second pneumatic sucker (3027) is connected with the air pump (3028) through a conduit; the air pump (3028) is fixedly connected with the chassis (1); two groups of the second electric push rods (3017) to the arc-shaped splints (3022) are arranged in a central symmetry way by the second electric sliding plate (3026).
4. The crystal wafer rotary corrosion device of the thyristor for the smart grid as claimed in claim 3, wherein the circulating corrosion unit (4) comprises a fifth driving wheel (401), a sixth driving wheel (402), a shaft sleeve (403), a seventh driving rod (404), a connecting plate (405), a third electric push rod (406), a tooth-missing gear (407), an eighth driving rod (408), a third bevel gear (409), a fourth bevel gear (4010), an electric sliding disc (4011), a fourth electric sliding rod (4012), a rotary disc (4013), a limiting rod (4014), a limiting frame (4015), a movable electric rotating shaft (4016), a first friction roller (4017), a fixed electric rotating shaft (4018), a second friction roller (4019), a corrosion pool (4020) and a fourth electric push rod 4021; the outer surface of the fourth transmission rod (3012) is fixedly connected with the fifth transmission wheel (401); the outer annular surface of the fifth driving wheel (401) is in transmission connection with a sixth driving wheel (402) through a belt; the inner axis of the sixth transmission wheel (402) is fixedly connected with the shaft sleeve (403); the shaft sleeve (403) is connected with a seventh transmission rod (404); the shaft sleeve (403) is rotationally connected with the chassis (1); the seventh transmission rod (404) is fixedly connected with the connecting plate (405); the outer surface of the seventh transmission rod (404) is fixedly connected with the gear with missing teeth (407); the connecting plate (405) is fixedly connected with a third electric push rod (406); the third electric push rod (406) is fixedly connected with the chassis (1); an eighth transmission rod (408) is arranged on the side surface of the gear with missing teeth (407); the outer surface of the eighth transmission rod (408) is fixedly connected with a third bevel gear (409); the outer surface of the eighth transmission rod (408) is fixedly connected with a fourth bevel gear (4010); the eighth transmission rod (408) is rotatably connected with the electric sliding disc (4011); the outer surface of the eighth transmission rod (408) is fixedly connected with the turntable (4013); two sides of the electric sliding disc (4011) are respectively connected with a fourth electric sliding rod (4012) in a sliding way; three groups of limiting rods (4014) are uniformly arranged on the outer annular surface of the turntable (4013); the eighth transmission rod (408) is rotatably connected with the limiting frame (4015); two groups of fourth electric slide bars (4012) which are symmetrically arranged are fixedly connected with the underframe (1); the limiting rod (4014) is in contact with the movable electric rotating shaft (4016); the limiting frame (4015) is fixedly connected with the electric sliding disc (4011) through a connecting column; the three groups of mobile electric rotating shafts (4016) are in sliding connection with the electric sliding disk (4011) through connecting blocks; the three groups of mobile electric rotating shafts (4016) are in sliding connection with the limiting frame (4015) through connecting blocks; the movable electric rotating shaft (4016) is fixedly connected with the first friction roller (4017); the limiting frame (4015) is fixedly connected with three groups of fixed electric rotating shafts (4018) which are uniformly arranged; a corrosion pool (4020) is arranged below the limiting frame (4015); the fixed electric rotating shaft (4018) is fixedly connected with a second friction roller (4019); the corrosion pool (4020) is fixedly connected with the fourth electric push rod (4021); the fourth electric push rod (4021) is fixedly connected with the bottom frame (1).
5. The crystal wafer rotary etching device of the thyristor for the smart grid as claimed in claim 2, wherein the material platform (203) is configured as a hopper-shaped structure with a notch in the middle.
6. The crystal wafer rotary etching device of the thyristor for the smart grid as claimed in claim 3, wherein the grinding wheel (3011) is set to be an inverted cone structure.
7. The crystal wafer rotary etching device of the thyristor for the smart grid as claimed in claim 3, wherein the arc clamping plate (3022) is provided with a groove structure in the middle.
8. The crystal wafer rotary etching device of the thyristor for the smart grid as claimed in claim 4, wherein the outer annular surface of the third transmission rod (3010) contacting with the chassis (1) is provided with a straight tangent plane; the outer ring surface of the seventh transmission rod (404) contacted with the shaft sleeve (403) is provided with a straight tangent plane.
9. The wafer rotary etching device for the thyristors of the smart grid as claimed in claim 4, wherein the first rubbing roller (4017) and the second rubbing roller (4019) are both provided with an elliptical structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110683374.8A CN113539896B (en) | 2021-06-21 | 2021-06-21 | Crystal wafer rotary corrosion device of thyristor for intelligent power grid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110683374.8A CN113539896B (en) | 2021-06-21 | 2021-06-21 | Crystal wafer rotary corrosion device of thyristor for intelligent power grid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113539896A true CN113539896A (en) | 2021-10-22 |
| CN113539896B CN113539896B (en) | 2024-05-24 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117457549A (en) * | 2023-12-25 | 2024-01-26 | 富芯微电子有限公司 | Surface corrosion equipment for thyristor tube core production |
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| CN113539896B (en) | 2024-05-24 |
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