CN113501727A - Ceramic material and preparation method of plasma-resistant coating thereof - Google Patents
Ceramic material and preparation method of plasma-resistant coating thereof Download PDFInfo
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- CN113501727A CN113501727A CN202110876412.1A CN202110876412A CN113501727A CN 113501727 A CN113501727 A CN 113501727A CN 202110876412 A CN202110876412 A CN 202110876412A CN 113501727 A CN113501727 A CN 113501727A
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/87—Ceramics
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/5025—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with ceramic materials
- C04B41/5045—Rare-earth oxides
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- Coating By Spraying Or Casting (AREA)
Abstract
The invention discloses a ceramic material and a preparation method of a plasma-resistant coating thereof, wherein the ceramic material is formed by mixing oxide powder of the following elements, wherein the elements comprise Y, W, Mg, Si, Al and Zr, and the elements comprise the following components in atomic number: 50-70% of Y, 5-15% of W, 5-10% of Mg, 5-10% of Si, 5-10% of Al and 5-15% of Zr, wherein the diameter of the oxide powder of the elements is 10-100 mu m. The plasma-resistant coating prepared by the ceramic material has better ductility and compactness and stronger plasma erosion resistance, thereby obviously prolonging the service life of equipment parts in the chip and panel processing process and effectively reducing the cost of chip and panel factories on purchasing equipment accessories.
Description
Technical Field
The invention relates to a ceramic material and a preparation method of a coating thereof, in particular to a ceramic material and a preparation method of a plasma-resistant coating thereof.
Background
In the current chip and panel production processes, there are a number of processes that use plasma, such as physical vapor deposition, chemical vapor deposition, dry etching, and the like. These processes are very aggressive to the components of the production equipment due to the high chemical activity of excited molecules, ions, radicals in the plasma. To enhance the plasma erosion resistance of the equipment and its components, the components of existing chip and panel production equipment are typically coated with Al by a thermal spray process2O3Or Y2O3The ceramic coating is used for prolonging the service life of equipment and parts, reducing particles generated in the plasma erosion process and improving the product yield.
With the continuous development of the processing technology of chips and panels, the requirements on the plasma erosion resistance of coatings on equipment parts are continuously increased, and the coatings are also required to have good adhesive force and mechanical property to prevent the coatings from peeling off in the use process, so that the service life of the equipment parts and the product yield are influenced. Al (Al)2O3The coating is relatively poor in plasma erosion resistance, and in some processes, Al2O3The coating has not been satisfactory. Y is2O3Although the coating still can meet the requirements of most processes at present, the plasma erosion resistance of the coating still cannot meet the requirements of long-term use of equipment parts due to the poor compactness of the coating.
Disclosure of Invention
In order to overcome the above disadvantages, the present invention aims to provide a plasma erosion resistant ceramic material for chip and panel processing equipment and components, and a method for preparing a coating layer with higher compactness, better mechanical properties and stronger plasma erosion resistance by using the ceramic material.
In order to achieve the above object, the present invention adopts a technical solution of a ceramic material formed by mixing oxide powders of elements including Y, W, Mg, Si, Al, and Zr.
Preferably, the elements are contained in atomic numbers: 50-70% of Y, 5-15% of W, 5-10% of Mg, 5-10% of Si, 5-10% of Al and 5-15% of Zr.
Preferably, the oxide powder of the element has a diameter of 10 to 100 μm.
The invention provides a preparation method of a plasma-resistant coating, which comprises the following steps:
(1) cleaning and drying the surface of the base material to be sprayed;
(2) carrying out sand blasting treatment on the surface of a base material to be sprayed;
(3) preheating a base material to be sprayed to raise the temperature of the base material to 50-100 ℃;
(4) spraying the ceramic material of claim 3 onto a surface of a substrate to form a ceramic coating.
Preferably, the step (2) adopts 60-150 meshes of white corundum sand to carry out sand blasting; the pressure of the sand blasting is 3-5 kgf.
Preferably, after the sand blasting in the step (2), the surface roughness of the base material is increased to 1-5 μm.
Preferably, the gases used for forming plasma in the step (4) are argon and hydrogen, the flow rate of argon is 30-100 NLPM, the flow rate of hydrogen is 3-10 NLPM, and the total of the flow unit NLPM is named as normal lithium ion per minute.
Preferably, step (4) is carried out by spraying the ceramic material according to any one of claims 1 to 3 onto the surface of the substrate by using an atmospheric plasma spraying device to form a ceramic coating.
Preferably, the distance between a nozzle of the atmosphere plasma spraying equipment and the surface of the base material is 10-20 cm.
Preferably, the ceramic coating has a thickness of 1000 μm or less and a surface roughness of 3 μm or less.
The invention has the beneficial effects that: compared with the prior art, the plasma-resistant coating prepared by the invention has better ductility and compactness and stronger plasma erosion resistance, thereby obviously prolonging the service life of equipment parts in the chip and panel processing process and effectively reducing the cost of chip and panel factories in purchasing equipment accessories. Meanwhile, due to the superior erosion resistance of the ceramic coating, the generation of particles in the chip and panel processing process can be effectively reduced, and the product yield is improved.
Drawings
Fig. 1 shows a plasma-resistant coating formed on an Al substrate using the ceramic material and the preparation method described in the first embodiment.
Detailed Description
The following detailed description of the preferred embodiments of the present invention, taken in conjunction with the accompanying drawings, will make the advantages and features of the invention easier to understand by those skilled in the art, and thus will clearly and clearly define the scope of the invention.
The first embodiment is as follows:
the ceramic material of the present example consists of the following raw materials: oxide powder containing Y, W, Mg, Si and Al, wherein the diameter of the oxide powder is 10-100 mu m, and the oxide powder is uniformly mixed by a powder mixer according to the following atomic number ratio: 50% Y, 10% W, 10% Mg, 10% Si, 10% Al and 10% Zr.
The plasma resistant coating of this example was prepared by the following method:
step (1): cleaning and drying the surface of the substrate Al to be sprayed;
step (2): carrying out sand blasting treatment on the surface of the substrate Al, wherein the sand blasting pressure is 3.5kgf, the sand blasting is 60-mesh white corundum sand, and after the sand blasting, the roughness of the surface of the substrate is increased to 4 mu m;
and (3): the substrate Al was preheated to raise its temperature to 70 ℃.
And (4): and spraying the ceramic powder on the surface of the substrate Al by using an atmospheric plasma spraying device, wherein gases for forming plasma are argon and hydrogen, the flow of the argon is 60NLPM, and the flow of the hydrogen is 6 NLPM. The distance from the nozzle to the substrate surface was 10 cm. The coating thickness formed was 800 μm and the surface roughness was 1 μm or less.
The second embodiment:
the ceramic material of the present example consists of the following raw materials: oxide powder containing Y, W, Mg, Si and Al, wherein the diameter of the oxide powder is 10-100 mu m, and the oxide powder is uniformly mixed by a powder mixer according to the following atomic number ratio: 70% Y, 5% W, 5% Mg, 5% Si, 5% Al and 10% Zr.
The plasma resistant coating of this example was prepared by the following method:
step (1): cleaning and drying a base material to be sprayed;
step (2): carrying out sand blasting treatment on the surface of the base material, wherein the sand blasting pressure is 4kgf, the sand blasting is 80-mesh white corundum sand, and after the sand blasting, the roughness of the surface of the base material is increased to 3.5 microns;
and (3): preheating the base material to raise its temperature to 70 deg.c,
and (4): and spraying the ceramic powder onto the surface of the base material by using an atmospheric plasma spraying device. The gases used for forming plasma are argon and hydrogen, the argon flow is 50NLPM, and the hydrogen flow is 5 NLPM. The distance from the nozzle to the substrate surface was 10 cm. The coating thickness formed was 800 μm and the surface roughness was 1 μm or less.
Example three:
the ceramic material of the present example consists of the following raw materials: oxide powder containing Y, W, Mg, Si and Al, wherein the diameter of the oxide powder is 10-100 mu m, and the oxide powder is uniformly mixed by a powder mixer according to the following atomic number ratio: 60% Y, 15% W, 10% Mg, 5% Si, 5% Al and 5% Zr.
The plasma resistant coating of this example was prepared by the following method:
step (1): cleaning and drying a base material to be sprayed;
step (2): carrying out sand blasting treatment on the surface of the base material, wherein the sand blasting pressure is 5kgf, the sand blasting is 60-mesh white corundum sand, and after the sand blasting, the roughness of the surface of the base material is increased to 5 micrometers;
and (3): preheating the base material to raise its temperature to 100 deg.c,
and (4): and spraying the ceramic powder onto the surface of the base material by using an atmospheric plasma spraying device, wherein the gas for forming plasma is argon gas and hydrogen gas, the flow of the argon gas is 100NLPM, the flow of the hydrogen gas is 10NLPM, the distance from a nozzle to the surface of the base material is 20cm, the thickness of the formed coating is 800 μm, and the surface roughness is less than 1 μm.
Example four
The ceramic material of the present example consists of the following raw materials: oxide powder containing Y, W, Mg, Si and Al, wherein the diameter of the oxide powder is 10-100 mu m, and the oxide powder is uniformly mixed by a powder mixer according to the following atomic number ratio: 50% Y, 10% W, 10% Mg, 10% Si, 5% Al and 15% Zr.
The plasma resistant coating of this example was prepared by the following method:
step (1): cleaning and drying a base material to be sprayed;
step (2): carrying out sand blasting treatment on the surface of the base material, wherein the sand blasting pressure is 3kgf, the sand blasting is 150-mesh white corundum sand, and after the sand blasting, the roughness of the surface of the base material is increased to 2.5 mu m;
and (3): the substrate was preheated to raise its temperature to 50 ℃.
And (4): and spraying the ceramic powder onto the surface of the base material by using an atmospheric plasma spraying device. The gases used for forming plasma were argon and hydrogen, the argon flow rate was 30NLPM, the hydrogen flow rate was 3NLPM, and the distance from the nozzle to the substrate surface was 15 cm. The coating thickness formed was 800 μm and the surface roughness was 1 μm or less.
The above embodiments are merely illustrative of the technical concept and features of the present invention, and the present invention is not limited thereto, and any equivalent changes or modifications made according to the spirit of the present invention should be included in the scope of the present invention.
Claims (10)
1. A ceramic material, characterized in that it is formed by mixing oxide powders of elements including Y, W, Mg, Si, Al and Zr.
2. A ceramic material according to claim 1, characterized in that: the elements comprise the following components in atomic number: 50-70% of Y, 5-15% of W, 5-10% of Mg, 5-10% of Si, 5-10% of Al and 5-15% of Zr.
3. A ceramic material according to claim 2, characterized in that: the diameter of the oxide powder of the element is 10 to 100 μm.
4. A method for preparing a plasma-resistant coating, comprising the steps of:
(1) cleaning and drying the surface of the base material to be sprayed;
(2) carrying out sand blasting treatment on the surface of a base material to be sprayed;
(3) preheating a base material to be sprayed to raise the temperature of the base material to 50-100 ℃;
(4) spraying the ceramic material according to any one of claims 1 to 3 onto a surface of a substrate to form a ceramic coating.
5. The method of claim 4, wherein the plasma-resistant coating is prepared by: carrying out sand blasting by adopting 60-150-mesh white corundum sand; the pressure of the sand blasting is 3-5 kgf.
6. The method of claim 4, wherein the plasma-resistant coating is prepared by: and (3) after sand blasting, increasing the surface roughness of the base material to 1-5 mu m.
7. The method of claim 4, wherein the plasma-resistant coating is prepared by: and (4) the gas for forming plasma is argon and hydrogen, the flow of the argon is 30-100 NLPM, and the flow of the hydrogen is 3-10 NLPM.
8. The method of claim 4, wherein the plasma-resistant coating is prepared by: step (4) spraying the ceramic material according to claim 3 onto the surface of the substrate by using an atmospheric plasma spraying device to form a ceramic coating.
9. The method of claim 8, wherein the plasma resistant coating is prepared by: the distance between a nozzle of the atmosphere plasma spraying equipment and the surface of the base material is 10-20 cm.
10. The method of claim 4, wherein the plasma-resistant coating is prepared by: the thickness of the ceramic coating is below 1000 mu m, and the surface roughness is below 3 mu m.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202110876412.1A CN113501727A (en) | 2021-07-29 | 2021-07-29 | Ceramic material and preparation method of plasma-resistant coating thereof |
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| CN202110876412.1A CN113501727A (en) | 2021-07-29 | 2021-07-29 | Ceramic material and preparation method of plasma-resistant coating thereof |
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| CN113501727A true CN113501727A (en) | 2021-10-15 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115612969A (en) * | 2022-11-01 | 2023-01-17 | 苏州众芯联电子材料有限公司 | Compact yttrium oxide coating and preparation method thereof |
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2021
- 2021-07-29 CN CN202110876412.1A patent/CN113501727A/en not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115612969A (en) * | 2022-11-01 | 2023-01-17 | 苏州众芯联电子材料有限公司 | Compact yttrium oxide coating and preparation method thereof |
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Application publication date: 20211015 |