CN113458729A - Preparation method of planar special-shaped titanium target assembly - Google Patents
Preparation method of planar special-shaped titanium target assembly Download PDFInfo
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- CN113458729A CN113458729A CN202110758415.5A CN202110758415A CN113458729A CN 113458729 A CN113458729 A CN 113458729A CN 202110758415 A CN202110758415 A CN 202110758415A CN 113458729 A CN113458729 A CN 113458729A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
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- B23P15/00—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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Abstract
The invention provides a preparation method of a planar special-shaped titanium target assembly, which comprises the following steps: carrying out thread turning treatment on the end face of a titanium target blank, and processing the titanium target blank to a required shape to obtain a titanium target; processing a groove on the surface of the back plate, wherein the shape of the groove is matched with that of the titanium target; assembling the titanium target material and the back plate, and sequentially performing sheath welding and hot isostatic pressing welding; and leveling the welded titanium target material and the back plate to obtain the planar special-shaped titanium target assembly. The titanium target assembly prepared by the preparation method is high in dimensional accuracy, good in target flatness, high in welding bonding rate and bonding strength, and suitable for targets with different thickness designs.
Description
Technical Field
The invention belongs to the field of target material manufacturing, relates to a preparation method of a titanium target assembly, and particularly relates to a preparation method of a planar special-shaped titanium target assembly.
Background
Sputtering is one of the main techniques for preparing thin film materials: when charged particles bombard the surface of a solid material, surface atom collision occurs and energy and momentum transfer is generated, so that bombarded material atoms escape from the surface and are deposited on a substrate, and the bombarded solid is a raw material for preparing a deposited film by a sputtering method and is generally called a sputtering target material.
Because the strength of the sputtering target material is different, in the practical application process, the sputtering target material meeting the performance requirement and the back plate with certain strength need to be bound to form the target material assembly. The backing plate can provide support for the sputtering target while conducting heat, and the sputtering target and the backing plate are generally bonded by welding. Because the working environment of the target assembly in the sputtering process is severe, if the welding combination degree between the target and the back plate in the target assembly is low, the target deforms, cracks and even falls off from the back plate under the heated condition.
The high-purity titanium target is a common target, the target is generally round and is bound with a back plate by diffusion welding, and CN 111185659A discloses a diffusion welding method of the titanium target and the back plate and a prepared titanium target assembly. However, some sputtering machines use targets with special shapes, such as TSV series targets with shapes similar to triangles, which have large and irregular deformation after diffusion welding and larger subsequent machining difficulty compared with common circular targets, and there is a need to develop an effective method for solving the machining problem of such planar special-shaped titanium target assemblies.
Disclosure of Invention
In order to solve the technical problems in the prior art, the invention provides the preparation method of the plane special-shaped titanium target assembly.
In order to achieve the technical effect, the invention adopts the following technical scheme:
the invention provides a preparation method of a planar special-shaped titanium target assembly, which comprises the following steps:
carrying out thread turning treatment on the end face of a titanium target blank, and processing the titanium target blank to a required shape to obtain a titanium target;
processing a groove on the surface of the back plate, wherein the shape of the groove is matched with that of the titanium target;
assembling the titanium target material and the back plate, and sequentially performing sheath welding and hot isostatic pressing welding;
and leveling the welded titanium target material and the back plate to obtain the planar special-shaped titanium target assembly.
In a preferred embodiment of the present invention, the distance between adjacent crests of the thread is 0.3 to 0.8mm, such as 0.35mm, 0.4mm, 0.45mm, 0.5mm, 0.55mm, 0.6mm, 0.65mm, 0.7mm, or 0.75mm, but is not limited to the above-mentioned values, and other values not listed in the above-mentioned range are also applicable.
Preferably, the thread has a depth of 0.1 to 0.4mm, such as 0.15mm, 0.2mm, 0.25mm, 0.3mm or 0.35mm, but not limited to the recited values, and other values not recited within the range of values are equally applicable.
In the invention, the thread machining can adopt lathe machining, and the machining method of linear cutting or milling and the like can be adopted for machining the titanium target blank into the required shape.
In a preferred embodiment of the present invention, the size of the groove is larger than the size of the target by 0.1-0.5 mm, such as 0.15mm, 0.2mm, 0.25mm, 0.3mm, 0.35mm, 0.4mm, or 0.45mm, but not limited to the above-mentioned values, and other values not listed in the above-mentioned range are also applicable.
Preferably, the depth of the groove is less than the target thickness by 0.2-0.5 mm, such as 0.25mm, 0.3mm, 0.35mm, 0.4mm, or 0.45mm, but not limited to the values listed, and other values not listed in the range are also applicable.
As a preferable technical solution of the present invention, the back plate includes any one of an aluminum alloy back plate, a copper alloy back plate, or an oxygen-free copper back plate.
Preferably, the back surface of the back plate is provided with a positioning blind hole.
In the invention, the positioning blind hole is used as a reference for processing the groove, so that the target material can be determined to have the same relative position on a machine tool as that of the back plate groove during final shape processing, and the dimension error caused by cutter resetting is avoided. A circle of side edge is reserved at the edge of the groove digging surface of the back plate and is matched with the sheath cover plate.
As a preferred technical solution of the present invention, the titanium target and the back plate are cleaned before the assembly.
Preferably, the cleaning solution used for said cleaning comprises any one of IPA, acetone or alcohol or a combination of at least two of the following, typical but non-limiting examples being: combinations of IPA and acetone, acetone and alcohol, alcohol and IPA, or IPA, acetone and alcohol, and the like.
Preferably, after the cleaning, the titanium target and the back plate are dried in vacuum.
Preferably, the vacuum degree of the vacuum drying is less than or equal to 0.01Pa, the temperature is 50-80 ℃, and the time is 40-90 min.
The temperature of the vacuum drying may be 55 ℃, 60 ℃, 65 ℃, 70 ℃ or 75 ℃, and the time may be 45min, 50min, 55min, 60min, 65min, 70min, 75min, 80min or 85min, but the vacuum drying is not limited to the recited values, and other values not recited in the above numerical ranges are also applicable.
As a preferred technical solution of the present invention, the method for welding the sheath includes: and sequentially placing a stainless steel sheet and a sheath cover plate on one side of the titanium target material, and carrying out heat vacuumizing treatment after welding and packaging.
As a preferred technical scheme of the invention, the method for welding the package comprises any one or the combination of at least two of argon arc welding, electron beam welding or laser welding.
Preferably, the temperature of the hot vacuum pumping is lower than 500 ℃, and the vacuum degree is less than or equal to 0.002 Pa.
The temperature may be 100 ℃, 150 ℃, 200 ℃, 250 ℃, 300 ℃, 350 ℃, 400 ℃ or 450 ℃, but is not limited to the recited values, and other values not recited in the range of the values are also applicable.
In a preferred embodiment of the present invention, the hot isostatic pressing temperature is 400 to 600 ℃, for example, 420 ℃, 450 ℃, 480 ℃, 500 ℃, 520 ℃, 550 ℃, or 580 ℃, but the temperature is not limited to the above-mentioned values, and other values not shown in the above-mentioned range are also applicable.
Preferably, the hot isostatic pressure welding is performed at a pressure of 100MPa or more, such as 110MPa, 120MPa, 130MPa, 140MPa, 150MPa, 160MPa, 170MPa, 180MPa, 190MPa or 200MPa, but not limited to the recited values, and other values not recited in the range of values are equally applicable.
Preferably, the hot isostatic pressing welding is performed for a time of 3h or more, such as 4h, 5h, 6h, 7h, 8h, 9h, 10h, 11h or 12h, but not limited to the recited values, and other values not recited in the range of values are also applicable.
As a preferable aspect of the present invention, the leveling method includes: placing a cushion block on the surface of a titanium target material, arranging a gasket between the back plate and the lower template, and maintaining pressure after the upper mold pressing head applies load and the cushion block to the target material to generate concave deformation;
preferably, the shape of the spacer is the same as that of the target, and the ratio of the size of the spacer to the size of the titanium target is 0.6 to 0.8:1, such as 0.62:1, 0.65:1, 0.68:1, 0.7:1, 0.72:1, 0.75:1, or 0.78:1, but not limited to the recited values, and other values not recited within the range of values are equally applicable.
Preferably, the inner diameter of the gasket is more than 10mm larger than the outer diameter of the titanium target and is smaller than the outer diameter of the back plate.
In the invention, the local deformation still existing after the leveling treatment can be adjusted by adopting the flat pressing of the round ingot cushion block.
As a preferable technical scheme of the invention, the preparation method of the planar special-shaped titanium target assembly comprises the following steps:
performing thread turning treatment on the end face of the titanium target blank, wherein the distance between adjacent tooth tips of the threads is 0.3-0.8 mm, and the depth of the threads is 0.1-0.4 mm; processing the titanium target blank to a required shape to obtain a titanium target material;
processing a groove on the surface of the back plate, wherein the shape of the groove is matched with that of the titanium target, the size of the groove is 0.1-0.5 mm larger than that of the target, and the depth of the groove is 0.2-0.5 mm smaller than the thickness of the groove;
cleaning the titanium target and the back plate, and performing vacuum drying, wherein the vacuum degree of the vacuum drying is less than or equal to 0.01Pa, the temperature is 50-80 ℃, and the time is 40-90 min;
assembling the titanium target material and the back plate, and sequentially performing sheath welding and hot isostatic pressing welding, wherein the hot isostatic pressing welding temperature is 400-600 ℃, the pressure is more than or equal to 100MPa, and the time is more than or equal to 3 h;
the method for welding the sheath comprises the following steps: sequentially placing a stainless steel sheet and a sheathing cover plate on one side of the titanium target material, welding and packaging, and then carrying out thermal vacuum pumping treatment, wherein the temperature of the thermal vacuum pumping is lower than 500 ℃, and the vacuum degree is less than or equal to 0.002 Pa;
leveling the welded titanium target material and the back plate to obtain the planar special-shaped titanium target assembly;
the leveling processing method comprises the following steps: placing a cushion block on the surface of a titanium target material, wherein the ratio of the size of the cushion block to the size of the titanium target material is 0.6-0.8: 1, arranging a gasket between the back plate and the lower template, wherein the inner diameter of the gasket is more than 10mm larger than the outer diameter of the titanium target material and less than the outer diameter of the back plate, and maintaining the pressure after the upper mold pressing head applies load and the cushion block to the target material to generate concave deformation.
Compared with the prior art, the invention has at least the following beneficial effects:
the invention provides a preparation method of a plane special-shaped titanium target assembly, the titanium target assembly prepared by the preparation method has high dimensional accuracy, good target flatness, high welding bonding rate and bonding strength, and the welding structure is suitable for targets with different thickness designs.
Drawings
FIG. 1 is a schematic structural view of a titanium target according to an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a backing plate according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of the construction of a jacket assembly according to an embodiment of the present invention;
FIG. 4 is a mechanical schematic diagram of a leveling assembly of an embodiment of the present invention.
The present invention is described in further detail below. The following examples are merely illustrative of the present invention and do not represent or limit the scope of the claims, which are defined by the claims.
Detailed Description
The technical scheme of the invention is further explained by the specific implementation mode in combination with the attached drawings.
To better illustrate the invention and to facilitate the understanding of the technical solutions thereof, typical but non-limiting examples of the invention are as follows:
example 1
The embodiment provides a preparation method of a planar special-shaped titanium target assembly, which comprises the following steps:
performing thread turning treatment on the end surface of the titanium target blank, wherein the distance between adjacent tooth tips of the threads is 0.3mm, and the depth of the threads is 0.1 mm; processing the titanium target blank to a required shape to obtain a titanium target material;
processing a groove on the surface of the back plate, wherein the shape of the groove is matched with that of the titanium target, the size of the groove is larger than that of the target by 0.1mm, and the depth of the groove is smaller than the thickness of the groove by 0.2 mm;
cleaning the titanium target and the back plate, and performing vacuum drying, wherein the vacuum degree of the vacuum drying is less than or equal to 0.01Pa, the temperature is 50 ℃, and the time is 90 min;
assembling the titanium target material and the back plate, and sequentially performing sheath welding and hot isostatic pressing welding at the temperature of 400 ℃, the pressure of 150MPa and the time of 6 h;
the method for welding the sheath comprises the following steps: sequentially placing a stainless steel sheet and a sheathing cover plate on one side of the titanium target material, welding and packaging, and then carrying out hot vacuum pumping treatment, wherein the temperature of the hot vacuum pumping is 300 ℃, and the vacuum degree is less than or equal to 0.002 Pa;
leveling the welded titanium target material and the back plate to obtain the planar special-shaped titanium target assembly;
the leveling processing method comprises the following steps: placing a cushion block on the surface of a titanium target material, wherein the ratio of the size of the cushion block to the size of the titanium target material is 0.6:1, arranging a gasket between the back plate and the lower die plate, wherein the inner diameter of the gasket is larger than the outer diameter of the titanium target material by 12mm and smaller than the outer diameter of the back plate, and maintaining the pressure after the upper die pressing head applies load and the cushion block to the target material to generate concave deformation.
Example 2
The embodiment provides a preparation method of a planar special-shaped titanium target assembly, which comprises the following steps:
performing thread turning treatment on the end surface of the titanium target blank, wherein the distance between adjacent tooth tips of the threads is 0.8mm, and the depth of the threads is 0.4 mm; processing the titanium target blank to a required shape to obtain a titanium target material;
processing a groove on the surface of the back plate, wherein the shape of the groove is matched with that of the titanium target, the size of the groove is larger than that of the target by 0.5mm, and the depth of the groove is smaller than the thickness of the groove by 0.5 mm;
cleaning the titanium target and the back plate, and performing vacuum drying, wherein the vacuum degree of the vacuum drying is less than or equal to 0.01Pa, the temperature is 80 ℃, and the time is 40 min;
assembling the titanium target material and the back plate, and sequentially performing sheath welding and hot isostatic pressing welding at the temperature of 600 ℃, the pressure of 100MPa and the time of 3 h;
the method for welding the sheath comprises the following steps: sequentially placing a stainless steel sheet and a sheath cover plate on one side of the titanium target material, welding and packaging, and then carrying out hot vacuum pumping treatment, wherein the temperature of the hot vacuum pumping is 450 ℃, and the vacuum degree is less than or equal to 0.002 Pa;
leveling the welded titanium target material and the back plate to obtain the planar special-shaped titanium target assembly;
the leveling processing method comprises the following steps: placing a cushion block on the surface of a titanium target material, wherein the ratio of the size of the cushion block to the size of the titanium target material is 0.8:1, arranging a gasket between the back plate and the lower die plate, wherein the inner diameter of the gasket is greater than the outer diameter of the titanium target material by 20mm and smaller than the outer diameter of the back plate, and maintaining the pressure after the upper die pressing head applies load and the cushion block to the target material to generate concave deformation.
Example 3
The embodiment provides a preparation method of a planar special-shaped titanium target assembly, which comprises the following steps:
performing thread turning treatment on the end surface of the titanium target blank, wherein the distance between adjacent tooth tips of the threads is 0.4mm, and the depth of the threads is 0.2 mm; processing the titanium target blank to a required shape to obtain a titanium target material;
processing a groove on the surface of the back plate, wherein the shape of the groove is matched with that of the titanium target, the size of the groove is larger than that of the target by 0.2mm, and the depth of the groove is smaller than the thickness of the groove by 0.23 mm;
cleaning the titanium target and the back plate, and performing vacuum drying, wherein the vacuum degree of the vacuum drying is less than or equal to 0.01Pa, the temperature is 60 ℃, and the time is 80 min;
assembling the titanium target material and the back plate, and sequentially performing sheath welding and hot isostatic pressing welding at the temperature of 450 ℃, the pressure of 150MPa and the time of 5 h;
the method for welding the sheath comprises the following steps: sequentially placing a stainless steel sheet and a sheathing cover plate on one side of the titanium target material, welding and packaging, and then carrying out hot vacuum pumping treatment, wherein the temperature of the hot vacuum pumping is 300 ℃, and the vacuum degree is less than or equal to 0.002 Pa;
leveling the welded titanium target material and the back plate to obtain the planar special-shaped titanium target assembly;
the leveling processing method comprises the following steps: placing a cushion block on the surface of a titanium target material, wherein the ratio of the size of the cushion block to the size of the titanium target material is 0.65:1, arranging a gasket between the back plate and the lower die plate, wherein the inner diameter of the gasket is larger than the outer diameter of the titanium target material by 13mm and smaller than the outer diameter of the back plate, and maintaining the pressure after the upper die pressing head applies load and the cushion block to the target material to generate concave deformation.
Example 4
The embodiment provides a preparation method of a planar special-shaped titanium target assembly, which comprises the following steps:
performing thread turning treatment on the end surface of the titanium target blank, wherein the distance between adjacent tooth tips of the threads is 0.75mm, and the depth of the threads is 0.35 mm; processing the titanium target blank to a required shape to obtain a titanium target material;
processing a groove on the surface of the back plate, wherein the shape of the groove is matched with that of the titanium target, the size of the groove is larger than that of the target by 0.4mm, and the depth of the groove is smaller than the thickness of the groove by 0.45 mm;
cleaning the titanium target and the back plate, and performing vacuum drying, wherein the vacuum degree of the vacuum drying is less than or equal to 0.01Pa, the temperature is 75 ℃, and the time is 45 min;
assembling the titanium target material and the back plate, and sequentially performing sheath welding and hot isostatic pressing welding at the temperature of 550 ℃, the pressure of 110MPa and the time of 4 h;
the method for welding the sheath comprises the following steps: sequentially placing a stainless steel sheet and a sheath cover plate on one side of the titanium target material, welding and packaging, and then carrying out hot vacuum pumping treatment, wherein the temperature of the hot vacuum pumping is 420 ℃, and the vacuum degree is less than or equal to 0.002 Pa;
leveling the welded titanium target material and the back plate to obtain the planar special-shaped titanium target assembly;
the leveling processing method comprises the following steps: placing a cushion block on the surface of a titanium target material, wherein the ratio of the size of the cushion block to the size of the titanium target material is 0.75:1, arranging a gasket between the back plate and the lower die plate, wherein the inner diameter of the gasket is larger than the outer diameter of the titanium target material by 18mm and smaller than the outer diameter of the back plate, and maintaining the pressure after the upper die pressing head applies load and the cushion block to the target material to generate concave deformation.
Example 5
The embodiment provides a preparation method of a planar special-shaped titanium target assembly, which comprises the following steps:
performing thread turning treatment on the end surface of the titanium target blank, wherein the distance between adjacent tooth tips of the threads is 0.5mm, and the depth of the threads is 0.25 mm; processing the titanium target blank to a required shape to obtain a titanium target material;
processing a groove on the surface of the back plate, wherein the shape of the groove is matched with that of the titanium target, the size of the groove is larger than that of the target by 0.3mm, and the depth of the groove is smaller than the thickness of the groove by 0.35 mm;
cleaning the titanium target and the back plate, and performing vacuum drying, wherein the vacuum degree of the vacuum drying is less than or equal to 0.01Pa, the temperature is 65 ℃, and the time is 60 min;
assembling the titanium target material and the back plate, and sequentially performing sheath welding and hot isostatic pressing welding at the temperature of 500 ℃, under the pressure of 125MPa for 5 h;
the method for welding the sheath comprises the following steps: sequentially placing a stainless steel sheet and a sheathing cover plate on one side of the titanium target material, welding and packaging, and then carrying out hot vacuum pumping treatment, wherein the temperature of the hot vacuum pumping is 350 ℃, and the vacuum degree is less than or equal to 0.002 Pa;
leveling the welded titanium target material and the back plate to obtain the planar special-shaped titanium target assembly;
the leveling processing method comprises the following steps: placing a cushion block on the surface of a titanium target material, wherein the ratio of the size of the cushion block to the size of the titanium target material is 0.7:1, arranging a gasket between the back plate and the lower die plate, wherein the inner diameter of the gasket is larger than the outer diameter of the titanium target material by 12mm and smaller than the outer diameter of the back plate, and maintaining the pressure after the upper die pressing head applies load and the cushion block to the target material to generate concave deformation.
Comparative example 1
This comparative example was conducted under the same conditions as example 5 except that no thread was formed on the titanium target.
Comparative example 2
The comparative example was conducted under the same conditions as in example 5 except that the welded titanium target assembly was not leveled.
The titanium targets used in examples 1 to 5 and comparative examples 1 to 2 had a purity of 5N, and the processed shapes were triangular, and the structure is shown in fig. 1, the backing plate was an oxygen-free copper backing plate, the structure is shown in fig. 2, the jacket assembly manner was shown in fig. 3, and the leveling assembly manner was shown in fig. 4. The welding effect is verified by adopting C-SCAN detection, the detection conditions are shown in table 1, and the results are shown in table 2.
TABLE 1
| Detection conditions | Product(s) |
| Probe head | 5MHz |
| Sensitivity of the device | 50dB |
| Acoustic velocity of material | 5600m/s |
| Distance between X-axis | 1.5mm |
| Distance between Y-axis | 1.5mm |
| Scanning speed | 450mm/s |
| Scanning range | / |
| Scanning direction | Y-X |
| Threshold value | TH＝60 |
TABLE 2
| Overall binding rate/%) | |
| Example 1 | 99.4％ |
| Example 2 | 99.8％ |
| Example 3 | 99.9％ |
| Example 4 | 99.9％ |
| Example 5 | 99.7％ |
| Comparative example 1 | 93.2％ |
| Comparative example 2 | 92.1％ |
The applicant declares that the present invention illustrates the detailed structural features of the present invention through the above embodiments, but the present invention is not limited to the above detailed structural features, that is, it does not mean that the present invention must be implemented depending on the above detailed structural features. It should be understood by those skilled in the art that any modifications of the present invention, equivalent substitutions of selected components of the present invention, additions of auxiliary components, selection of specific modes, etc., are within the scope and disclosure of the present invention.
The preferred embodiments of the present invention have been described in detail, however, the present invention is not limited to the specific details of the above embodiments, and various simple modifications may be made to the technical solution of the present invention within the technical idea of the present invention, and these simple modifications are within the protective scope of the present invention.
It should be noted that the various technical features described in the above embodiments can be combined in any suitable manner without contradiction, and the invention is not described in any way for the possible combinations in order to avoid unnecessary repetition.
In addition, any combination of the various embodiments of the present invention is also possible, and the same should be considered as the disclosure of the present invention as long as it does not depart from the spirit of the present invention.
Claims (10)
1. The preparation method of the planar special-shaped titanium target assembly is characterized by comprising the following steps of:
carrying out thread turning treatment on the end face of a titanium target blank, and processing the titanium target blank to a required shape to obtain a titanium target;
processing a groove on the surface of the back plate, wherein the shape of the groove is matched with that of the titanium target;
assembling the titanium target material and the back plate, and sequentially performing sheath welding and hot isostatic pressing welding;
and leveling the welded titanium target material and the back plate to obtain the planar special-shaped titanium target assembly.
2. The method for preparing the thread of claim 1, wherein the distance between adjacent crests of the thread is 0.3 to 0.8 mm;
preferably, the depth of the thread is 0.1-0.4 mm.
3. The manufacturing method according to claim 1 or 2, wherein the size of the groove is 0.1-0.5 mm larger than the size of the target;
preferably, the depth of the groove is 0.2-0.5 mm smaller than the thickness of the groove.
4. The production method according to any one of claims 1 to 3, wherein the back sheet comprises any one of an aluminum alloy back sheet, a copper alloy back sheet, or an oxygen-free copper back sheet;
preferably, the back surface of the back plate is provided with a positioning blind hole.
5. The method according to any one of claims 1 to 4, wherein the titanium target and the backing plate are cleaned before the assembling;
preferably, the cleaning solution used for cleaning comprises any one or a combination of at least two of IPA, acetone or alcohol;
preferably, after the cleaning, the titanium target and the back plate are dried in vacuum;
preferably, the vacuum degree of the vacuum drying is less than or equal to 0.01Pa, the temperature is 50-80 ℃, and the time is 40-90 min.
6. The manufacturing method according to any one of claims 1 to 5, wherein the method of can welding includes: and sequentially placing a stainless steel sheet and a sheath cover plate on one side of the titanium target material, and carrying out heat vacuumizing treatment after welding and packaging.
7. The method for manufacturing the optical fiber package according to claim 6, wherein the method for welding the package comprises any one or a combination of at least two of argon arc welding, electron beam welding or laser welding;
preferably, the temperature of the hot vacuum pumping is lower than 500 ℃, and the vacuum degree is less than or equal to 0.002 Pa.
8. The production method according to any one of claims 1 to 7, wherein the temperature of the hot isostatic pressing welding is 400 to 600 ℃;
preferably, the pressure of the hot isostatic pressing welding is more than or equal to 100 MPa;
preferably, the time of the hot isostatic pressing welding is more than or equal to 3 h.
9. The production method according to any one of claims 1 to 8, wherein the leveling process includes: placing a cushion block on the surface of a titanium target material, arranging a gasket between the back plate and the lower template, and maintaining pressure after the upper mold pressing head applies load and the cushion block to the target material to generate concave deformation;
preferably, the shape of the cushion block is the same as that of the target, and the ratio of the size of the cushion block to that of the titanium target is 0.6-0.8: 1;
preferably, the inner diameter of the gasket is more than 10mm larger than the outer diameter of the titanium target and is smaller than the outer diameter of the back plate.
10. The method of any one of claims 1 to 9, comprising the steps of:
performing thread turning treatment on the end face of the titanium target blank, wherein the distance between adjacent tooth tips of the threads is 0.3-0.8 mm, and the depth of the threads is 0.1-0.4 mm; processing the titanium target blank to a required shape to obtain a titanium target material;
processing a groove on the surface of the back plate, wherein the shape of the groove is matched with that of the titanium target, the size of the groove is 0.1-0.5 mm larger than that of the target, and the depth of the groove is 0.2-0.5 mm smaller than the thickness of the groove;
cleaning the titanium target and the back plate, and performing vacuum drying, wherein the vacuum degree of the vacuum drying is less than or equal to 0.01Pa, the temperature is 50-80 ℃, and the time is 40-90 min;
assembling the titanium target material and the back plate, and sequentially performing sheath welding and hot isostatic pressing welding, wherein the hot isostatic pressing welding temperature is 400-600 ℃, the pressure is more than or equal to 100MPa, and the time is more than or equal to 3 h;
the method for welding the sheath comprises the following steps: sequentially placing a stainless steel sheet and a sheathing cover plate on one side of the titanium target material, welding and packaging, and then carrying out thermal vacuum pumping treatment, wherein the temperature of the thermal vacuum pumping is lower than 500 ℃, and the vacuum degree is less than or equal to 0.002 Pa;
leveling the welded titanium target material and the back plate to obtain the planar special-shaped titanium target assembly;
the leveling processing method comprises the following steps: placing a cushion block on the surface of a titanium target material, wherein the ratio of the size of the cushion block to the size of the titanium target material is 0.6-0.8: 1, arranging a gasket between the back plate and the lower template, wherein the inner diameter of the gasket is more than 10mm larger than the outer diameter of the titanium target material and less than the outer diameter of the back plate, and maintaining the pressure after the upper mold pressing head applies load and the cushion block to the target material to generate concave deformation.
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