CN113257651B - High-precision weak-current electronic beam adjusting device and method - Google Patents
High-precision weak-current electronic beam adjusting device and method Download PDFInfo
- Publication number
- CN113257651B CN113257651B CN202110171278.5A CN202110171278A CN113257651B CN 113257651 B CN113257651 B CN 113257651B CN 202110171278 A CN202110171278 A CN 202110171278A CN 113257651 B CN113257651 B CN 113257651B
- Authority
- CN
- China
- Prior art keywords
- electron beam
- current
- magnetic field
- electron
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims abstract description 18
- 238000010894 electron beam technology Methods 0.000 claims abstract description 125
- 238000009826 distribution Methods 0.000 claims abstract description 40
- 238000007790 scraping Methods 0.000 claims abstract description 40
- 230000000694 effects Effects 0.000 claims abstract description 18
- 230000001105 regulatory effect Effects 0.000 claims abstract description 18
- 230000001276 controlling effect Effects 0.000 claims abstract description 7
- 238000013139 quantization Methods 0.000 abstract description 7
- 238000005516 engineering process Methods 0.000 abstract description 6
- 239000002245 particle Substances 0.000 abstract description 5
- 238000004590 computer program Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- 230000006870 function Effects 0.000 description 5
- 238000005259 measurement Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 230000033001 locomotion Effects 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000008447 perception Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/21—Means for adjusting the focus
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The application discloses a high-precision weak-current electron beam adjusting device and method, and belongs to the technical field of electric metering quantization. The system of the application comprises: the magnetic field regulating and controlling unit is used for setting the size of the energizing current of the electron source, determining the longitudinal magnetic field distribution according to the size of the energizing current of the electron source, and changing the longitudinal magnetic field distribution by regulating the energizing current of the electron source to obtain scattered focusing regulating and controlling electron beam current; the beam scraping unit is used for scraping beams aiming at scattered focusing regulation and control of the electron beam current to obtain target electron beams; and the observation unit is used for capturing a beam spot image of the target electron beam through the fluorescent screen, acquiring beam spot image information, determining the quality of the target electron beam according to the beam spot image information and quantizing the current according to the quality of the target electron beam. The application introduces the particle accelerator technology, breaks through the limitation of the traditional current quantization mode based on single electron tunnel effect, greatly improves the current flow intensity, and improves the stability of the electron beam output by the electron source.
Description
Technical Field
The application relates to the technical field of electric metering quantization, in particular to a high-precision weak-current electron beam adjusting device and method.
Background
The measurement standard is used as a source of the national measurement system value and is an important strategic resource of the country. The capability improvement can directly drive the improvement of the service capability of the national metering system, and provides more accurate measurement technology for various industries, thereby promoting the upgrading and high-quality development of the industry and promoting the improvement of the product quality. Information perception in the electric power Internet of things depends on an intelligent sensor, and the accurate and reliable magnitude of the intelligent sensor is the basis of information application. The traditional real object, step-by-step and long-chain magnitude tracing mode can not meet the large-scale ubiquitous demand, and the ubiquitous reproducible quantum tracing technology and the networked online tracing system become the necessary requirements. Due to the rapid development of modern physics, the electric measurement standard is made to be a major breakthrough, especially the voltage and resistance standard, and the conversion from the real standard to the sub-standard is realized. The 26 th international metering from 11 months 2018 approves a new SI architecture scheme, and changes the definition of current unit ampere (a) into how to establish a current quantum benchmark as a hotspot for the current electricity metering development based on electron charges.
Disclosure of Invention
The application aims to solve the current quantization requirement, introduces the technology in the field of particle accelerators, improves the current intensity and stability by regulating and controlling the electron beam transmission process, and provides a high-precision weak-current electron beam regulating device, which comprises the following components:
the magnetic field regulating and controlling unit is used for setting the size of the energizing current of the electron source, determining the longitudinal magnetic field distribution according to the size of the energizing current of the electron source, and changing the longitudinal magnetic field distribution by regulating the energizing current of the electron source to obtain scattered focusing regulating and controlling electron beam current;
the beam scraping unit is used for scraping beams aiming at scattered focusing regulation and control of the electron beam current to obtain target electron beams;
and the observation unit is used for capturing a beam spot image of the target electron beam through the fluorescent screen, acquiring beam spot image information, determining the quality of the target electron beam according to the beam spot image information and quantizing the current according to the quality of the target electron beam.
Optionally, the energizing current is determined according to the energy of the electron beam current output by the electron source and the magnetic field range and distribution determined by the envelope, and the magnitude is determined according to the ampere-turns, the mechanical dimension and the central position parameter of the magnetic field element.
Optionally, obtaining the scattered focusing regulation electron beam current includes:
and determining defocusing or focusing regulation results of the magnetic field on the electron beam morphology and parameters when the influence of space charge effect is considered according to the determined longitudinal magnetic field distribution, and adjusting the electrified current according to the defocusing or focusing regulation results to obtain scattered focusing regulation electron beam.
Optionally, the beam scraping is specifically:
selecting beam current through holes with preset positions and sizes, and scraping electron beam current outside the through holes;
the preset position and the size are adjusted according to the initial parameters of the electron beam current and the longitudinal magnetic field distribution;
the beam apertures include groups for staged scraping of the electron beam.
Optionally, a beam scraping unit is arranged at the downstream of the beam scraping unit, and a fluorescent screen driven by a motor and inclined by 45 degrees is used for cutting off the target electron beam, so as to capture the beam spots of the target electron beam.
The application also provides a high-precision weak current electron beam adjustment method, which comprises the following steps:
setting the power-on current of an electron source, determining the longitudinal magnetic field distribution according to the power-on current of the electron source, and changing the longitudinal magnetic field distribution by adjusting the power-on current of the electron source to obtain scattered focusing regulation electron beam current;
aiming at scattered focusing regulation and control electron beam current, scraping beams to obtain a target electron beam;
and capturing a beam spot image of the target electron beam through the fluorescent screen, acquiring beam spot image information, determining the quality of the target electron beam according to the beam spot image information, and quantizing the current according to the quality of the target electron beam.
Optionally, the energizing current is determined according to the energy of the electron beam current output by the electron source and the magnetic field range and distribution determined by the envelope, and the magnitude is determined according to the ampere-turns, the mechanical dimension and the central position parameter of the magnetic field element.
Optionally, obtaining the scattered focusing regulation electron beam current includes:
and determining defocusing or focusing regulation results of the magnetic field on the electron beam morphology and parameters when the influence of space charge effect is considered according to the determined longitudinal magnetic field distribution, and adjusting the electrified current according to the defocusing or focusing regulation results to obtain scattered focusing regulation electron beam.
Optionally, the beam scraping is specifically:
selecting beam current through holes with preset positions and sizes, and scraping electron beam current outside the through holes;
the preset position and the size are adjusted according to the initial parameters of the electron beam current and the longitudinal magnetic field distribution;
the beam apertures include groups for staged scraping of the electron beam.
Optionally, the method further comprises: a target electron beam is intercepted by a fluorescent screen driven by a motor and inclined by 45 degrees, and a beam spot of the target electron beam is captured.
The application introduces the particle accelerator technology, breaks through the limitation of the traditional current quantization mode based on single electron tunnel effect, greatly improves the current flow intensity, and improves the stability of the electron beam output by the electron source.
Drawings
FIG. 1 is a block diagram of a high-precision weak-electron beam tuning device according to the present application;
FIG. 2 is a beam envelope under the influence of a magnetic field according to the present application;
FIG. 3 is a graph of the magnitude of the magnetic field strength of a magnetic field element of the present application;
FIG. 4 is a graph showing the final magnetic field profile required by the electron beam current of the present application;
FIG. 5 is a graph of the result of the regulation of the present application;
FIG. 6 is a graph showing the effect of a first group of beam scrapers on electron beam current under charge conditions according to the present application;
FIG. 7 is a schematic view showing the position distribution of the beam scraping unit and the observation unit according to the present application;
FIG. 8 is a view showing the state of beam current after the beam scraper according to the present application;
FIG. 9 is a graph of initial beam transverse dimensions according to the present application;
FIG. 10 is a graph of initial lateral emittance error capacity for the present application;
fig. 11 is a flowchart of a beam tuning method of a high-precision weak-electron beam according to the present application.
Detailed Description
The exemplary embodiments of the present application will now be described with reference to the accompanying drawings, however, the present application may be embodied in many different forms and is not limited to the examples described herein, which are provided to fully and completely disclose the present application and fully convey the scope of the application to those skilled in the art. The terminology used in the exemplary embodiments illustrated in the accompanying drawings is not intended to be limiting of the application. In the drawings, like elements/components are referred to by like reference numerals.
Unless otherwise indicated, terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art. In addition, it will be understood that terms defined in commonly used dictionaries should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and will not be interpreted in an idealized or overly formal sense.
The application provides a high-precision weak-current electron beam adjusting device 200, as shown in fig. 1, comprising:
the magnetic field regulating unit 201 is used for setting the magnitude of the electrifying current of the electron source, determining the longitudinal magnetic field distribution according to the magnitude of the electrifying current of the electron source, and obtaining scattered focusing regulating electron beam current by regulating the electrifying current of the electron source to change the longitudinal magnetic field distribution;
the beam scraping unit 202 performs beam scraping aiming at scattered focusing regulation and control of the electron beam current to obtain a target electron beam;
the observation unit 203 captures a beam spot image of the target electron beam through the phosphor screen, acquires beam spot image information, determines target electron beam quality from the beam spot image information, and quantizes the current according to the target electron beam quality.
The power-on current is determined according to the energy of the electron beam current output by the electron source and the magnetic field range and distribution determined by the envelope, and the size is determined according to the ampere-turns, the mechanical size and the central position parameters of the magnetic field element.
Wherein, acquire scattered focus regulation and control electron beam current, include:
and determining defocusing or focusing regulation results of the magnetic field on the electron beam morphology and parameters when the influence of space charge effect is considered according to the determined longitudinal magnetic field distribution, and adjusting the electrified current according to the defocusing or focusing regulation results to obtain scattered focusing regulation electron beam.
Wherein, scrape the beam, specifically:
selecting beam current through holes with preset positions and sizes, and scraping electron beam current outside the through holes;
the preset position and the size are adjusted according to the initial parameters of the electron beam current and the longitudinal magnetic field distribution;
the beam apertures include groups for staged scraping of the electron beam.
And the downstream of the beam scraping unit is provided with a fluorescent screen which is driven by a motor and inclined by 45 degrees to intercept the target electron beam, and the beam spot of the target electron beam is captured.
The application is described in detail below with reference to examples and figures:
a magnetic field regulating unit: the electron beam current output by the electron source is affected by the initial cathode state, the anode voltage stability, and environmental factors such as vacuum, temperature, etc., and there is inconsistency in initial energy and divergence angle. In addition, the electron beam current also has a tendency of poor quality due to the influence of space charge effect and mirror image charge effect in the transmission process, and finally the stability of the electron beam current is damaged, which is unfavorable for current quantization. To solve this problem, the magnetic field element is specifically designed for electron beam current regulation, and the steps are as follows:
the first step: the target magnetic field range and distribution is defined according to the energy and beam envelope of the electron beam output by the electron source. In the case, the initial current intensity of the beam is 3A, the initial energy is 15keV, and the initial emittance is 5mm & mrad.
The magnetic field element generates a longitudinal magnetic field on the shaft, and the particles do radial movement due to the action of Lorentz force, so that the focusing effect is achieved. Neglecting the axial electric field formed in the beam focusing process and the axial magnetic field caused by the rotation of the electron beam, assuming that the lorentz factor gamma is constant, the transverse motion envelope equation of the beam in the magnetic field can be written as:
wherein r is the transverse envelope of the beam, and the unit is m; z is a longitudinal coordinate, the unit is m, and gamma is electron relative energy; beta is the relative velocity of electrons; e is the electron charge amount; m is m 0 Is electron static mass; c is the speed of light; mu (mu) 0 Is magnetic permeability in vacuum; b (B) (z) The axial magnetic field generated for the solenoid is a function of z, in T; epsilon is the initial emittance of the beam, and the unit is mm & mrad; i is the beam intensity, the unit is A, (1) the right first term is the defocusing term generated by the influence of space charge effect, the second term is the focusing term generated by the existence of longitudinal magnetic field generated by a solenoid, and now we need the focusing magnetic field to overcome the space charge effect and reach the over-focusing state, so that the magnetic field strength B is not considered under the influence of the initial emittance of the beam (z) The minimum value of (2) is required to satisfy the equality of the first two coefficients, namely:
solving to obtain B (z) The minimum value of (2) is 1.296e-04T. If the equation (2) is negative, the solution of the differential equation oscillates, and therefore the magnetic field strength cannot be too large or too small, focusing cannot be performed, and excessive focusing causes oscillation.
Solving differential equation (1) can obtain the beam envelope under the influence of the magnetic field, as shown in fig. 2. The beam current is obviously diverged under the action of space charge effect, focused under the action of axial magnetic field, the magnetic field intensity of different sizes enables the beam current to have different focusing effects, the beam waist position moves forward along with the increase of the magnetic field intensity, when the magnetic field is smaller, the beam current diverges after the first focusing, and if the beam current is too small, the beam current cannot be focused; when the magnetic field is large, the beam current has secondary focusing, and if the magnetic field is too large, the phenomenon of oscillation can occur. Thus, based on theoretical calculations, it is believed that the solenoid coil field strength B was designed (z) The amplitude of (2) is preferably about 0.03T.
And a second step of: according to the magnetic field intensity amplitude obtained by the first step analysis, a magnetic field element shown in fig. 3 is designed, and then in electromagnetic field calculation software Superfish, the power-on current is set according to the ampere turns, the mechanical size, the central position and other design parameters of the magnetic field element, so that the final magnetic field distribution meeting the electron beam current requirements is obtained, as shown in fig. 4.
Fourth step: and then the longitudinal magnetic field distribution shown in fig. 4 is led out, and the magnetic field distribution is combined with beam flow mechanics simulation software to calculate and obtain the regulation and control results of magnetic field on defocusing, focusing and the like of the appointed initial electron beam form and parameters, as shown in fig. 5.
Fifth step: and then, aiming at different forms and parameters of the electron beam which possibly appear, the generated magnetic field distribution can be changed by adjusting the electrifying current of the magnetic field regulating unit, so that a consistent scattered focusing regulating result is obtained.
Beam scraping unit: electrons with different quality in the electron beam flow are regulated by the same magnetic field to change the motion track, then different area distribution is presented on the cross section of the downstream specific position, electrons with poor quality are generally distributed on the periphery of the cross section, and electrons with relatively good quality are concentrated in the central area. Based on the method, proper beam hole size and position can be selected, electrons with poor peripheral quality are scraped, and only the part with good quality of the central area is reserved; considering the difference of the initial beam parameters and the magnetic field regulation error, the beam passing holes are required to be adjustable, and fig. 6 shows the influence of the first group of beam scrapers on the electron beam current under the conditions of not considering space charge and considering space charge respectively.
On the electron beam transmission path, a plurality of groups of beam scraping units can be arranged to be matched with the magnetic field regulation and control units, so that grading beam scraping is realized, and engineering problems of deformation caused by excessive heating of materials, high-power air release and the like caused by too many beam scraping at one time are avoided. The position distribution of the beam scraping unit and the observation unit is schematically shown in fig. 7.
Also using beam flow mechanics simulation, the beam state after passing through the two groups of beam scrapers can be obtained as shown in fig. 8, while the effect of the second group of beam scrapers on beam stability can be represented by the initial beam transverse dimension shown in fig. 9 and the initial transverse emittance error capacity shown in fig. 10.
And an observation unit: after regulation and beam scraping, the quality of the electron beam can be observed by capturing the image information of the beam spots through a fluorescent screen, a motor-driven inclined 45-degree fluorescent screen Flag is arranged at the downstream of each group of beam scraping units and used for cutting off the beam, and the light spots are transmitted to a CCD camera outside the vacuum chamber through a transparent observation window at the side of the vacuum chamber.
The application also provides a high-precision weak current electron beam adjusting method, as shown in fig. 11, comprising the following steps:
setting the power-on current of an electron source, determining the longitudinal magnetic field distribution according to the power-on current of the electron source, and changing the longitudinal magnetic field distribution by adjusting the power-on current of the electron source to obtain scattered focusing regulation electron beam current;
aiming at scattered focusing regulation and control electron beam current, scraping beams to obtain a target electron beam;
and capturing a beam spot image of the target electron beam through the fluorescent screen, acquiring beam spot image information, determining the quality of the target electron beam according to the beam spot image information, and quantizing the current according to the quality of the target electron beam.
Wherein, a fluorescent screen driven by a motor and inclined by 45 degrees is used for intercepting the target electron beam current and capturing the beam spot of the target electron beam current.
Optionally, the energizing current is determined according to the energy of the electron beam current output by the electron source and the magnetic field range and distribution determined by the envelope, and the magnitude is determined according to the ampere-turns, the mechanical dimension and the central position parameter of the magnetic field element.
Optionally, obtaining the scattered focusing regulation electron beam current includes:
and determining defocusing or focusing regulation results of the magnetic field on the electron beam morphology and parameters when the influence of space charge effect is considered according to the determined longitudinal magnetic field distribution, and adjusting the electrified current according to the defocusing or focusing regulation results to obtain scattered focusing regulation electron beam.
Optionally, the beam scraping is specifically:
selecting beam current through holes with preset positions and sizes, and scraping electron beam current outside the through holes;
the preset position and the size are adjusted according to the initial parameters of the electron beam current and the longitudinal magnetic field distribution;
the beam apertures include groups for staged scraping of the electron beam.
The application introduces the particle accelerator technology, breaks through the limitation of the traditional current quantization mode based on single electron tunnel effect, greatly improves the current flow intensity, and improves the stability of the electron beam output by the electron source.
It will be appreciated by those skilled in the art that embodiments of the present application may be provided as a method, system, or computer program product. Accordingly, the present application may take the form of an entirely hardware embodiment, an entirely software embodiment or an embodiment combining software and hardware aspects. Furthermore, the present application may take the form of a computer program product embodied on one or more computer-usable storage media (including, but not limited to, disk storage, CD-ROM, optical storage, and the like) having computer-usable program code embodied therein. The scheme in the embodiment of the application can be realized by adopting various computer languages, such as object-oriented programming language Java, an transliteration script language JavaScript and the like.
The present application is described with reference to flowchart illustrations and/or block diagrams of methods, apparatus (systems) and computer program products according to embodiments of the application. It will be understood that each flow and/or block of the flowchart illustrations and/or block diagrams, and combinations of flows and/or blocks in the flowchart illustrations and/or block diagrams, can be implemented by computer program instructions. These computer program instructions may be provided to a processor of a general purpose computer, special purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, create means for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.
These computer program instructions may also be stored in a computer-readable memory that can direct a computer or other programmable data processing apparatus to function in a particular manner, such that the instructions stored in the computer-readable memory produce an article of manufacture including instruction means which implement the function specified in the flowchart flow or flows and/or block diagram block or blocks.
These computer program instructions may also be loaded onto a computer or other programmable data processing apparatus to cause a series of operational steps to be performed on the computer or other programmable apparatus to produce a computer implemented process such that the instructions which execute on the computer or other programmable apparatus provide steps for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.
While preferred embodiments of the present application have been described, additional variations and modifications in those embodiments may occur to those skilled in the art once they learn of the basic inventive concepts. It is therefore intended that the following claims be interpreted as including the preferred embodiments and all such alterations and modifications as fall within the scope of the application.
It will be apparent to those skilled in the art that various modifications and variations can be made to the present application without departing from the spirit or scope of the application. Thus, it is intended that the present application also include such modifications and alterations insofar as they come within the scope of the appended claims or the equivalents thereof.
Claims (4)
1. A high precision weak current electron beam tuning device, the device comprising:
the magnetic field regulating and controlling unit is used for setting the size of the energizing current of the electron source, determining the longitudinal magnetic field distribution according to the size of the energizing current of the electron source, and changing the longitudinal magnetic field distribution by regulating the energizing current of the electron source to obtain scattered focusing regulating and controlling electron beam current;
the beam scraping unit is used for scraping beams aiming at scattered focusing regulation and control of the electron beam current to obtain target electron beams;
the observation unit captures a beam spot image of the target electron beam through the fluorescent screen, acquires beam spot image information, determines the quality of the target electron beam according to the beam spot image information, and quantizes the current according to the quality of the target electron beam;
the method for obtaining the scattered focusing regulation electron beam current comprises the following steps:
determining defocusing or focusing regulation results of magnetic fields on electron beam morphology and parameters when the influence of space charge effect is considered according to the determined longitudinal magnetic field distribution, and adjusting electrifying current according to the defocusing or focusing regulation results to obtain scattered focusing regulation electron beam;
the beam scraping specifically comprises the following steps:
selecting beam current through holes with preset positions and sizes, and scraping electron beam current outside the through holes;
the preset position and the size are adjusted according to the initial parameters of the electron beam current and the longitudinal magnetic field distribution;
the beam flow holes comprise a plurality of groups and are used for grading scraping of electron beam flow;
and the downstream of the beam scraping unit is provided with a fluorescent screen which is driven by a motor and inclined by 45 degrees to intercept the target electron beam, and the beam spot of the target electron beam is captured.
2. The apparatus of claim 1, wherein the energizing current is sized according to a field range and distribution determined by an energy and an envelope of an electron beam current output by the electron source, and according to ampere-turns, mechanical dimensions, and center position parameters of the magnetic field element.
3. A high precision weak current electron beam tuning method, the method comprising:
setting the power-on current of an electron source, determining the longitudinal magnetic field distribution according to the power-on current of the electron source, and changing the longitudinal magnetic field distribution by adjusting the power-on current of the electron source to obtain scattered focusing regulation electron beam current;
aiming at scattered focusing regulation and control electron beam current, scraping beams to obtain a target electron beam;
capturing a beam spot image of the target electron beam through a fluorescent screen, acquiring beam spot image information, determining the quality of the target electron beam according to the beam spot image information, and quantizing the current according to the quality of the target electron beam;
the method for obtaining the scattered focusing regulation electron beam current comprises the following steps:
determining defocusing or focusing regulation results of magnetic fields on electron beam morphology and parameters when the influence of space charge effect is considered according to the determined longitudinal magnetic field distribution, and adjusting electrifying current according to the defocusing or focusing regulation results to obtain scattered focusing regulation electron beam;
the beam scraping specifically comprises the following steps:
selecting beam current through holes with preset positions and sizes, and scraping electron beam current outside the through holes;
the preset position and the size are adjusted according to the initial parameters of the electron beam current and the longitudinal magnetic field distribution;
the beam flow holes comprise a plurality of groups and are used for grading scraping of electron beam flow;
a target electron beam is intercepted by a fluorescent screen driven by a motor and inclined by 45 degrees, and a beam spot of the target electron beam is captured.
4. The method of claim 3, wherein the energizing current is sized according to the field range and distribution determined by the energy and envelope of the electron beam current output by the electron source, and according to the ampere-turns, mechanical dimensions, and center position parameters of the magnetic field element.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110171278.5A CN113257651B (en) | 2021-02-02 | 2021-02-02 | High-precision weak-current electronic beam adjusting device and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110171278.5A CN113257651B (en) | 2021-02-02 | 2021-02-02 | High-precision weak-current electronic beam adjusting device and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113257651A CN113257651A (en) | 2021-08-13 |
| CN113257651B true CN113257651B (en) | 2023-12-01 |
Family
ID=77180908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110171278.5A Active CN113257651B (en) | 2021-02-02 | 2021-02-02 | High-precision weak-current electronic beam adjusting device and method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113257651B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106970411A (en) * | 2017-05-08 | 2017-07-21 | 中国工程物理研究院流体物理研究所 | A kind of beam divergence angle apparatus for measuring distribution and measuring method |
| CN108627866A (en) * | 2018-04-20 | 2018-10-09 | 华中科技大学 | A kind of beam energy analyzer |
| CN109922591A (en) * | 2019-04-03 | 2019-06-21 | 郭盘林 | A kind of acquisition device of middle energy large beam spot weak current electronics |
| CN111068189A (en) * | 2019-11-27 | 2020-04-28 | 东莞深圳清华大学研究院创新中心 | Medical accelerator, dose monitoring system and dose monitoring method thereof |
-
2021
- 2021-02-02 CN CN202110171278.5A patent/CN113257651B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106970411A (en) * | 2017-05-08 | 2017-07-21 | 中国工程物理研究院流体物理研究所 | A kind of beam divergence angle apparatus for measuring distribution and measuring method |
| CN108627866A (en) * | 2018-04-20 | 2018-10-09 | 华中科技大学 | A kind of beam energy analyzer |
| CN109922591A (en) * | 2019-04-03 | 2019-06-21 | 郭盘林 | A kind of acquisition device of middle energy large beam spot weak current electronics |
| CN111068189A (en) * | 2019-11-27 | 2020-04-28 | 东莞深圳清华大学研究院创新中心 | Medical accelerator, dose monitoring system and dose monitoring method thereof |
Non-Patent Citations (1)
| Title |
|---|
| 应用于电流量子化的弱流电子束装置概念设计;李小飞 等;自动化仪表;第41卷(第8期);第61-65页 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN113257651A (en) | 2021-08-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Cesar et al. | Demonstration of single-shot picosecond time-resolved MeV electron imaging using a compact permanent magnet quadrupole based lens | |
| Weninger et al. | Temporal distortions in magnetic lenses | |
| US10998158B1 (en) | Variable-focus magnetostatic lens | |
| CN113257651B (en) | High-precision weak-current electronic beam adjusting device and method | |
| Gu et al. | The electron lens test bench for the relativistic heavy ion collider at Brookhaven National Laboratory | |
| KR101819972B1 (en) | Optimizing device and optimizing method of the particle accelerator | |
| JP6199561B2 (en) | Determination of emission parameters of field emission sources | |
| US20110168888A1 (en) | Weak-lens coupling of high current electron sources to electron microscope columns | |
| JP2004335320A (en) | Charged particle beam device | |
| US2440640A (en) | Electron microanalyzer | |
| Wijethunga et al. | Simulation study of the magnetized electron beam | |
| Jin et al. | Development of an X-ray tube with two selective targets modulated by a magnetic field | |
| US2849634A (en) | Linear electron accelerators | |
| Bezditko et al. | 100 MeV/100 kW accelerator adjustment for the NSC KIPT neutron source physical start up | |
| CN113205985A (en) | Method and system for leading out quantum current based on photoelectron emission | |
| TWI742223B (en) | Electron beam system and method, and scanning electron microscope | |
| Chung et al. | Reduction of dynamic multipole content in insertion devices using flat wires | |
| Alyackrinskiy et al. | Experiments with EBW setup with possibility of right angle beam turn | |
| CN115758735B (en) | Scanning magnet dynamic identification real-time segmentation slope feedback method and system | |
| JP2014139868A (en) | Charged particle beam device and method for correcting charged particle beam | |
| CN109585244A (en) | The Electron Beam Focusing device of high power density | |
| Krämer et al. | Electron beam final focus system for Thomson scattering at ELBE | |
| Haniel et al. | Ion microscopy with evolutionary-algorithm-based autofocusing | |
| Zheng et al. | Eliminating uncertainty of thermal emittance measurement in solenoid scans due to rf and solenoid fields overlap | |
| Belousov et al. | Methods and tools of transient radiation registration for diagnostics of high-intensity electron beams |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |