CN113257651A - High-precision weak-current electron beam adjusting device and method - Google Patents
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- H—ELECTRICITY
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- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
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Abstract
The invention discloses a high-precision weak-current electron beam adjusting device and method, and belongs to the technical field of electric metering quantization. The system of the invention comprises: the magnetic field regulating and controlling unit is used for setting the magnitude of the energizing current of the electron source, determining the longitudinal magnetic field distribution according to the magnitude of the energizing current of the electron source, and obtaining the defocusing regulating and controlling electron beam current by regulating the energizing current of the electron source to change the longitudinal magnetic field distribution; the beam scraping unit is used for scraping a beam aiming at the defocusing focusing regulation electron beam to obtain a target electron beam; and the observation unit is used for capturing a beam spot image of the target electron beam through the fluorescent screen, acquiring beam spot image information, determining the quality of the target electron beam according to the beam spot image information, and quantizing the current according to the quality of the target electron beam. The invention introduces the particle accelerator technology, breaks through the limitation of the traditional current quantization mode based on the single electron tunnel effect, greatly improves the current intensity, and simultaneously improves the stability of the electron beam output by the electron source.
Description
Technical Field
The invention relates to the technical field of electric metering quantization, in particular to a high-precision weak-current electron beam adjusting device and method.
Background
The measurement benchmark is used as the source of the measurement value of the national measurement system and is an important strategic resource of the country. The capacity improvement directly drives the service capacity improvement of a national metering system, and provides a more accurate measurement technology for various industries, thereby promoting the upgrading and high-quality development of the industries and promoting the improvement of the product quality. The information perception in the power internet of things depends on the intelligent sensor, and the accurate and reliable magnitude is the basis of information application. The traditional physical, step-by-step and long-chain quantity tracing mode cannot meet the ubiquitous requirement of the large scale, and the reproducible quantum tracing technology and the networked online tracing system become necessary requirements. Due to the rapid development of modern physics, the electrical metering base standard makes a major breakthrough, and particularly, voltage and resistance references realize the conversion from a physical reference to a quantum reference. The 26 th international metering council, which was held on 11 months in 2018, approved a new SI system scheme and changed the definition of current unit ampere (a) into how to establish a current quantum reference based on electronic charge, which is a hot spot in the current electrical metering development.
Disclosure of Invention
The invention aims to solve the requirement of current quantization, introduce the technology in the field of particle accelerators, and improve the current intensity and stability by regulating and controlling the electron beam transmission process, and provides a high-precision weak-current electron beam regulating device, which comprises:
the magnetic field regulating and controlling unit is used for setting the magnitude of the energizing current of the electron source, determining the distribution of the longitudinal magnetic field according to the magnitude of the energizing current of the electron source, and obtaining the scattered focusing regulating and controlling electron beam current by regulating the energizing current of the electron source to change the distribution of the longitudinal magnetic field;
the beam scraping unit is used for scraping a beam aiming at the defocusing focusing regulation electron beam to obtain a target electron beam;
and the observation unit is used for capturing a beam spot image of the target electron beam through the fluorescent screen, acquiring beam spot image information, determining the quality of the target electron beam according to the beam spot image information, and quantizing the current according to the quality of the target electron beam.
Optionally, the energizing current is determined according to the magnetic field range and distribution determined by the energy and envelope of the electron beam output by the electron source, and the size of the energizing current is determined according to the ampere-turn number, the mechanical size and the central position parameters of the magnetic field element.
Optionally, obtaining a defocused modulated electron beam current includes:
and determining a defocusing or focusing regulation result of the magnetic field on the electron beam current form and parameters under the influence of the space charge effect according to the determined longitudinal magnetic field distribution, and regulating the current according to the defocusing or focusing regulation result to obtain the defocusing focusing regulation electron beam.
Optionally, the beam scraping specifically comprises:
selecting a beam through hole with a preset position and size, and scraping the electron beam outside the through hole;
adjusting the preset position and size according to the initial parameters of the electron beam and the longitudinal magnetic field distribution;
the beam current through holes comprise a plurality of groups and are used for graded scraping of electron beam currents.
Optionally, a beam scraping unit is arranged downstream of the beam scraping unit, and a screen which is driven by a motor and inclined at 45 ° is used for cutting the target electron beam and capturing the beam spot of the target electron beam.
The invention also provides a high-precision weak-current electron beam adjusting method, which comprises the following steps:
setting the magnitude of the energizing current of the electron source, determining the longitudinal magnetic field distribution according to the magnitude of the energizing current of the electron source, and adjusting the energizing current of the electron source to change the longitudinal magnetic field distribution to obtain a defocusing-focusing-regulated electron beam current;
the method comprises the steps of regulating and controlling electron beam current aiming at defocusing, scraping the beam and obtaining a target electron beam;
capturing a beam spot image of the target electron beam through the fluorescent screen, acquiring beam spot image information, determining the quality of the target electron beam according to the beam spot image information, and carrying out current protonation according to the quality of the target electron beam.
Optionally, the energizing current is determined according to the magnetic field range and distribution determined by the energy and envelope of the electron beam output by the electron source, and the size of the energizing current is determined according to the ampere-turn number, the mechanical size and the central position parameters of the magnetic field element.
Optionally, obtaining a defocused modulated electron beam current includes:
and determining a defocusing or focusing regulation result of the magnetic field on the electron beam current form and parameters under the influence of the space charge effect according to the determined longitudinal magnetic field distribution, and regulating the current according to the defocusing or focusing regulation result to obtain the defocusing focusing regulation electron beam.
Optionally, the beam scraping specifically comprises:
selecting a beam through hole with a preset position and size, and scraping the electron beam outside the through hole;
adjusting the preset position and size according to the initial parameters of the electron beam and the longitudinal magnetic field distribution;
the beam current through holes comprise a plurality of groups and are used for graded scraping of electron beam currents.
Optionally, the method further includes: and cutting off the target electron beam by using a fluorescent screen which is driven by a motor and inclined by 45 degrees, and capturing the beam spot of the target electron beam.
The invention introduces the particle accelerator technology, breaks through the limitation of the traditional electric current electronization mode based on the single electron tunneling effect, greatly improves the current intensity, and simultaneously improves the stability of the electron beam current output by the electron source.
Drawings
FIG. 1 is a structural diagram of a high-precision weak-current electron beam adjusting device according to the present invention;
FIG. 2 is a diagram of the beam envelope under the influence of a magnetic field of the present invention;
FIG. 3 is a graph of field strength magnitudes for a magnetic field element of the present invention;
FIG. 4 is a final field profile for the electron beam current requirements of the present invention;
FIG. 5 is a graph of the regulatory results of the present invention;
FIG. 6 is a graph of the effect of a first set of beam scrapers on electron beam current under charged conditions of the present invention;
FIG. 7 is a schematic diagram of the position distribution of the beam scraping unit and the observation unit according to the present invention;
FIG. 8 is a diagram of the beam current after the beam scraper of the present invention;
FIG. 9 is a diagram of the initial beam current lateral dimensions of the present invention;
FIG. 10 is a graph of initial lateral emittance error capacity for the present invention;
FIG. 11 is a flow chart of a high precision low current electron beam tuning method of the present invention.
Detailed Description
The exemplary embodiments of the present invention will now be described with reference to the accompanying drawings, however, the invention may be embodied in many different forms and is not limited to the embodiments described herein, which are provided for complete and complete disclosure of the invention and to fully convey the scope of the invention to those skilled in the art. The terminology used in the exemplary embodiments illustrated in the accompanying drawings is not intended to be limiting of the invention. In the drawings, the same units/elements are denoted by the same reference numerals.
Unless otherwise defined, terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Further, it will be understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and will not be interpreted in an idealized or overly formal sense.
The invention provides a high-precision weak-current electron beam adjusting device 200, as shown in fig. 1, comprising:
the magnetic field regulating unit 201 is used for setting the magnitude of the energizing current of the electron source, determining the distribution of a longitudinal magnetic field according to the magnitude of the energizing current of the electron source, and obtaining the scattered focusing regulating electron beam current by regulating the energizing current of the electron source to change the distribution of the longitudinal magnetic field;
the beam scraping unit 202 is used for scraping a beam aiming at the defocusing-focusing-regulated electron beam to obtain a target electron beam;
the observation unit 203 captures a beam spot image of the target electron beam through the fluorescent screen, acquires beam spot image information, determines the quality of the target electron beam according to the beam spot image information, and quantizes the current according to the quality of the target electron beam.
The electrified current is determined according to the energy and the magnetic field range and distribution determined by the envelope of the electron beam output by the electron source, and the ampere-turn number, the mechanical size and the central position parameter of the magnetic field element.
Wherein, obtain the scattered focus and regulate and control the electron beam current, include:
and determining a defocusing or focusing regulation result of the magnetic field on the electron beam current form and parameters under the influence of the space charge effect according to the determined longitudinal magnetic field distribution, and regulating the current according to the defocusing or focusing regulation result to obtain the defocusing focusing regulation electron beam.
Wherein, scrape the bundle, specifically do:
selecting a beam through hole with a preset position and size, and scraping the electron beam outside the through hole;
adjusting the preset position and size according to the initial parameters of the electron beam and the longitudinal magnetic field distribution;
the beam current through holes comprise a plurality of groups and are used for graded scraping of electron beam currents.
The beam scraping unit is arranged at the downstream and used for cutting off a target electron beam by using a fluorescent screen which is driven by a motor and inclines by 45 degrees and capturing beam spots of the target electron beam.
The invention is explained in detail below with reference to the examples and the figures:
a magnetic field regulation and control unit: the electron beam current output by the electron source is influenced by the initial cathode state, the anode voltage stability, environmental factors such as vacuum and temperature, and the like, so that the initial energy and the divergence angle are inconsistent. In addition, due to the influence of space charge effect and mirror charge effect in the transmission process, the electron beam current also tends to have poor quality, and finally the strong stability of the electron beam current is damaged, which is not beneficial to current quantization. To solve this problem, a magnetic field element is specially designed for electron beam current regulation, and the steps are as follows:
the first step is as follows: the target magnetic field range and distribution are defined according to the energy of the electron beam output by the electron source and the beam envelope. In this case, the beam current is 3A, the initial energy is 15keV, and the initial emittance is 5 mm-mrad.
The magnetic field element generates a longitudinal magnetic field on the shaft, and the particles move in the radial direction under the action of Lorentz force, so that the focusing effect is achieved. Neglecting an axial electric field formed in the beam focusing process and an axial magnetic field caused by the rotation of the electron beam, assuming that the lorentz factor gamma is a constant, the transverse motion envelope equation of the beam in the magnetic field can be written as follows:
wherein r is the transverse envelope of the beam, and the unit is m; z is a longitudinal coordinate with the unit of m and gamma is the relative energy of electrons; beta is the electron relative velocity; e is the electron charge amount; m is0Is the electron static mass; c is the speed of light; mu.s0Magnetic permeability in vacuum; b is(z)The axial magnetic field generated by the solenoid is a function of z, in units of T; epsilon is the initial beam emittance, and the unit is mm-mrad; i is beam current intensity, the unit is A, the first term on the right of the formula (1) is a defocusing term generated due to the influence of space charge effect, the second term is a focusing term generated due to the existence of a longitudinal magnetic field generated by a solenoid, and now the focusing magnetic field is required to overcome the space charge effect and achieve an over-focusing state, so that the magnetic field intensity B does not consider the influence of beam initial emittance(z)The minimum value of (c) is required to satisfy that the first two coefficients are equal, namely:
get B by solution(z)Has a minimum value of 1.296 e-04T. If equation (2) is negative, the solution of the differential equation oscillates, and therefore the magnetic field strength cannot be too large or too small, too small cannot be focused, and too large generates oscillation by being over focused.
Solving differential equation (1) can obtain the beam envelope under the influence of the magnetic field, as shown in fig. 2. The beam obviously diverges under the action of a space charge effect and focuses under the action of an axial magnetic field, the focusing effect of the beam is different due to different magnetic field strengths, the beam waist position moves forwards along with the increase of the magnetic field strength, when the magnetic field is small, the beam diverges after the first focusing, and if the magnetic field is too small, the beam cannot be focused; when the magnetic field is large, the beam current can be focused secondarily, and if the magnetic field is too large, the phenomenon of oscillation can occur. Therefore, according to theoretical calculation, the designed magnetic field intensity B of the solenoid coil is considered(z)The amplitude of (A) is preferably about 0.03T.
The second step is that: designing a magnetic field element shown in fig. 3 according to the magnetic field intensity obtained by the first-step analysis, and setting the size of the electrified current according to design parameters such as the ampere-turn number, the mechanical size and the central position of the magnetic field element in electromagnetic field calculation software Superfish, so as to obtain the final magnetic field distribution meeting the electron beam current requirement, as shown in fig. 4.
The fourth step: then, the longitudinal magnetic field distribution shown in fig. 4 is derived and combined with beam dynamics simulation software, and the results of controlling defocusing or focusing of the magnetic field on the specified initial electron beam form and parameters can be calculated, as shown in fig. 5.
The fifth step: and aiming at different forms and parameters of the electron beam which possibly occurs, the distribution of the generated magnetic field can be changed by adjusting the electrifying current of the magnetic field regulation and control unit, so that a consistent defocusing regulation and control result is obtained.
A beam scraping unit: electrons with different qualities in the electron beam flow can change the motion trail after being regulated and controlled by the same magnetic field, then different area distributions are presented on the cross section of a specific downstream position, the electrons with poor qualities are generally distributed on the periphery of the cross section, and the electrons with better relative qualities are concentrated in the central area. Based on the method, the size and the position of a beam current through hole can be selected to scrape electrons with poor peripheral quality, and only a part with better quality in a central area is reserved; considering the difference of initial beam parameters and the magnetic field regulation error, the beam through hole is required to be adjustable, and fig. 6 respectively shows the influence of the first group of beam scrapers on the electron beam under the conditions of not considering space charge and considering space charge.
On the electron beam transmission path, a plurality of groups of beam scraping units can be arranged to be matched with the magnetic field regulation and control unit, so that graded beam scraping is realized, and the problems of deformation caused by too much material heating and high-power deflation and the like caused by too many beam scraping at one time are avoided. The position distribution of the beam scraping unit and the observation unit is schematically shown in FIG. 7.
Similarly, by using beam dynamics simulation, the beam state after passing through the two groups of beam scrapers can be obtained as shown in fig. 8, and the effect of the second group of beam scrapers on the beam stability can be reflected by the initial beam lateral size shown in fig. 9 and the initial lateral emittance error capacity shown in fig. 10.
An observation unit: after regulation and control and beam scraping, the quality of the electron beam can be observed by capturing beam spot image information through a fluorescent screen, a motor-driven inclined 45-degree fluorescent screen Flag is arranged at the downstream of each beam scraping unit for cutting off the beam, and light spots are transmitted to a CCD camera outside a vacuum chamber through a transparent observation window at the side of the vacuum chamber.
The invention also provides a high-precision weak-current electron beam modulation method, as shown in fig. 11, comprising:
setting the magnitude of the energizing current of the electron source, determining the longitudinal magnetic field distribution according to the magnitude of the energizing current of the electron source, and adjusting the energizing current of the electron source to change the longitudinal magnetic field distribution to obtain a defocusing-focusing-regulated electron beam current;
the method comprises the steps of regulating and controlling electron beam current aiming at defocusing, scraping the beam and obtaining a target electron beam;
capturing a beam spot image of the target electron beam through the fluorescent screen, acquiring beam spot image information, determining the quality of the target electron beam according to the beam spot image information, and carrying out current protonation according to the quality of the target electron beam.
Wherein, a fluorescent screen which is driven by a motor and is inclined by 45 degrees is used for cutting off the target electron beam and capturing the beam spot of the target electron beam.
Optionally, the energizing current is determined according to the magnetic field range and distribution determined by the energy and envelope of the electron beam output by the electron source, and the size of the energizing current is determined according to the ampere-turn number, the mechanical size and the central position parameters of the magnetic field element.
Optionally, obtaining a defocused modulated electron beam current includes:
and determining a defocusing or focusing regulation result of the magnetic field on the electron beam current form and parameters under the influence of the space charge effect according to the determined longitudinal magnetic field distribution, and regulating the current according to the defocusing or focusing regulation result to obtain the defocusing focusing regulation electron beam.
Optionally, the beam scraping specifically comprises:
selecting a beam through hole with a preset position and size, and scraping the electron beam outside the through hole;
adjusting the preset position and size according to the initial parameters of the electron beam and the longitudinal magnetic field distribution;
the beam current through holes comprise a plurality of groups and are used for graded scraping of electron beam currents.
The invention introduces the particle accelerator technology, breaks through the limitation of the traditional electric current electronization mode based on the single electron tunneling effect, greatly improves the current intensity, and simultaneously improves the stability of the electron beam current output by the electron source.
As will be appreciated by one skilled in the art, embodiments of the present application may be provided as a method, system, or computer program product. Accordingly, the present application may take the form of an entirely hardware embodiment, an entirely software embodiment or an embodiment combining software and hardware aspects. Furthermore, the present application may take the form of a computer program product embodied on one or more computer-usable storage media (including, but not limited to, disk storage, CD-ROM, optical storage, and the like) having computer-usable program code embodied therein. The scheme in the embodiment of the application can be implemented by adopting various computer languages, such as object-oriented programming language Java and transliterated scripting language JavaScript.
The present application is described with reference to flowchart illustrations and/or block diagrams of methods, apparatus (systems), and computer program products according to embodiments of the application. It will be understood that each flow and/or block of the flow diagrams and/or block diagrams, and combinations of flows and/or blocks in the flow diagrams and/or block diagrams, can be implemented by computer program instructions. These computer program instructions may be provided to a processor of a general purpose computer, special purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, create means for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.
These computer program instructions may also be stored in a computer-readable memory that can direct a computer or other programmable data processing apparatus to function in a particular manner, such that the instructions stored in the computer-readable memory produce an article of manufacture including instruction means which implement the function specified in the flowchart flow or flows and/or block diagram block or blocks.
These computer program instructions may also be loaded onto a computer or other programmable data processing apparatus to cause a series of operational steps to be performed on the computer or other programmable apparatus to produce a computer implemented process such that the instructions which execute on the computer or other programmable apparatus provide steps for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.
While the preferred embodiments of the present application have been described, additional variations and modifications in those embodiments may occur to those skilled in the art once they learn of the basic inventive concepts. Therefore, it is intended that the appended claims be interpreted as including preferred embodiments and all alterations and modifications as fall within the scope of the application.
It will be apparent to those skilled in the art that various changes and modifications may be made in the present application without departing from the spirit and scope of the application. Thus, if such modifications and variations of the present application fall within the scope of the claims of the present application and their equivalents, the present application is also intended to encompass such modifications and variations.
Claims (10)
1. A high precision, low current electron beam conditioning apparatus, the system comprising:
the magnetic field regulating and controlling unit is used for setting the magnitude of the energizing current of the electron source, determining the longitudinal magnetic field distribution according to the magnitude of the energizing current of the electron source, and obtaining the defocusing regulating and controlling electron beam current by regulating the energizing current of the electron source to change the longitudinal magnetic field distribution;
the beam scraping unit is used for scraping a beam aiming at the defocusing focusing regulation electron beam to obtain a target electron beam;
and the observation unit is used for capturing a beam spot image of the target electron beam through the fluorescent screen, acquiring beam spot image information, determining the quality of the target electron beam according to the beam spot image information, and quantizing the current according to the quality of the target electron beam.
2. The apparatus of claim 1, wherein the energizing current is sized according to the magnetic field range and distribution determined by the energy and envelope of the electron beam output by the electron source, and according to the ampere-turns, mechanical dimensions and center position parameters of the magnetic field element.
3. The apparatus of claim 1, the obtaining a defocused modulated electron beam current, comprising:
and determining a defocusing or focusing regulation result of the magnetic field on the electron beam shape and parameters when the influence of the space charge effect is considered according to the determined longitudinal magnetic field distribution, and regulating the energizing current according to the defocusing or focusing regulation result to obtain the defocusing focusing regulation electron beam.
4. The device according to claim 1, the scraping beam being in particular:
selecting a beam through hole with a preset position and size, and scraping the electron beam outside the through hole;
the preset position and the size are adjusted according to the initial parameters of the electron beam and the longitudinal magnetic field distribution;
the beam current through holes comprise a plurality of groups and are used for graded scraping of electron beam currents.
5. The apparatus of claim 1, wherein the beam scraping unit is arranged downstream to intercept the target electron beam stream using a motor-driven phosphor screen tilted by 45 ° to capture a beam spot of the target electron beam stream.
6. A high precision, low current electron beam conditioning method, the method comprising:
setting the magnitude of the energizing current of the electron source, determining the longitudinal magnetic field distribution according to the magnitude of the energizing current of the electron source, and adjusting the energizing current of the electron source to change the longitudinal magnetic field distribution to obtain a defocusing-focusing-regulated electron beam current;
the method comprises the steps of regulating and controlling electron beam current aiming at defocusing, scraping the beam and obtaining a target electron beam;
capturing a beam spot image of the target electron beam through the fluorescent screen, acquiring beam spot image information, determining the quality of the target electron beam according to the beam spot image information, and quantizing the current according to the quality of the target electron beam.
7. The method of claim 6, wherein the energizing current is sized according to the magnetic field range and distribution determined by the energy and envelope of the electron beam output by the electron source, and according to ampere-turns, mechanical dimensions and center position parameters of the magnetic field elements.
8. The method of claim 6, the obtaining a defocused modulated electron beam current, comprising:
and determining a defocusing or focusing regulation result of the magnetic field on the electron beam shape and parameters when the influence of the space charge effect is considered according to the determined longitudinal magnetic field distribution, and regulating the energizing current according to the defocusing or focusing regulation result to obtain the defocusing focusing regulation electron beam.
9. The method according to claim 6, wherein said scraping is in particular:
selecting a beam through hole with a preset position and size, and scraping the electron beam outside the through hole;
the preset position and the size are adjusted according to the initial parameters of the electron beam and the longitudinal magnetic field distribution;
the beam current through holes comprise a plurality of groups and are used for graded scraping of electron beam currents.
10. The method of claim 6, further comprising: and cutting off the target electron beam by using a fluorescent screen which is driven by a motor and inclined by 45 degrees, and capturing the beam spot of the target electron beam.
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李小飞 等: "应用于电流量子化的弱流电子束装置概念设计", 自动化仪表, vol. 41, no. 8, pages 61 - 65 * |
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