CN113235057A - Heat-insulation conductive colorful ITO (indium tin oxide) dimming film and preparation method thereof - Google Patents
Heat-insulation conductive colorful ITO (indium tin oxide) dimming film and preparation method thereof Download PDFInfo
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- 238000009413 insulation Methods 0.000 title claims abstract description 13
- 238000002360 preparation method Methods 0.000 title abstract description 63
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 title description 4
- 239000012528 membrane Substances 0.000 claims abstract description 25
- 239000011159 matrix material Substances 0.000 claims abstract description 12
- 239000011521 glass Substances 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims abstract description 9
- 239000013077 target material Substances 0.000 claims description 26
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 11
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 11
- XOLBLPGZBRYERU-UHFFFAOYSA-N SnO2 Inorganic materials O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 10
- 239000010936 titanium Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 9
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- 229910003437 indium oxide Inorganic materials 0.000 claims description 6
- 229910001887 tin oxide Inorganic materials 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 claims description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 2
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 2
- 238000002834 transmittance Methods 0.000 abstract description 13
- 239000010408 film Substances 0.000 description 90
- 239000000463 material Substances 0.000 description 21
- 230000000052 comparative effect Effects 0.000 description 20
- 230000000694 effects Effects 0.000 description 14
- 239000003086 colorant Substances 0.000 description 8
- 230000007547 defect Effects 0.000 description 4
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- 238000009826 distribution Methods 0.000 description 4
- 150000004767 nitrides Chemical class 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000011056 performance test Methods 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000005253 cladding Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000011017 operating method Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
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- 239000002994 raw material Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
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- 238000000151 deposition Methods 0.000 description 1
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- 238000004134 energy conservation Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 239000004065 semiconductor Substances 0.000 description 1
- 238000011895 specific detection Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C23C14/08—Oxides
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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Abstract
The application relates to the field of ITO films, and particularly discloses a colorful ITO dimming film with heat insulation and conduction types and a preparation method thereof, wherein the colorful ITO dimming film with heat insulation and conduction types comprises the following components: a substrate body formed as a plate-shaped member having a light transmittance of not less than 85%; the colorful layer is arranged on one side of the matrix body and is fixedly connected with the matrix body; one side of the ITO film layer is attached to and fixedly connected with the other side of the colorful layer; the colorful ITO membrane of adjusting luminance of thermal-insulated conduction type of this application can be used to fields such as car glass, building glass etc. need the membrane application of adjusting luminance, and it has excellent conductivity, infrared thermal-insulated and the performance of protection privacy.
Description
Technical Field
The application relates to the field of ITO films, in particular to a heat-insulating conductive colorful ITO dimming film and a preparation method thereof.
Background
The ITO transparent conductive film has excellent transparency and conductivity, and is widely used in the fields of liquid crystal displays, heat mirrors, touch panels, solar cells, and the like, and besides high conductivity and light transmittance, the ITO transparent conductive film also has many other excellent properties, for example: the adhesive force with the glass is strong, and the reflectivity to infrared light is high. Therefore, the ITO transparent conductive film can also be used in products such as building glass, automobile glass and the like, and plays a good role in heat insulation and energy conservation. The cooling effect can be still kept in hot summer indoors or in the automobile, and the energy consumption of cooling in summer is greatly reduced.
However, when the ITO transparent conductive film is directly applied to automobile glass and building glass, the ITO transparent conductive film is slightly deficient in privacy protection due to its excellent transparency, and meanwhile, the conventional scheme of reducing light transmittance by using a multilayer structure also has the problem of reduced conductivity due to the complex structure of the film layer.
Disclosure of Invention
In order to improve the defect that the existing colorful ITO film cannot effectively take high conductivity and high heat-insulating property into consideration, the application provides a heat-insulating conductive colorful ITO light modulation film and a preparation method thereof, and the following technical scheme is adopted:
first aspect, this application provides a colorful ITO membrane of adjusting luminance of thermal-insulated conduction type, adopts following technical scheme:
a multicolor ITO (indium tin oxide) dimming film with heat insulation and conduction types comprises: a base body formed as a light-transmitting sheet profile; the colorful layer is arranged on one side of the matrix body and is fixedly connected with the matrix body; and one side of the ITO film layer is attached to and fixedly connected with the other side of the colorful layer.
By adopting the technical scheme, due to the arrangement of the colorful layers, on one hand, a good color shielding effect can be formed on the surface of the matrix body, light rays behind the film can be well shielded, privacy of a user on the other side of the film is effectively improved, and meanwhile, the colorful layers adopted by the method have different colors, can effectively shield and absorb infrared rays, so that a good blocking effect is formed on heat;
but the setting of colorful layer structure can show the electric conductive property that reduces the ITO membrane, so this application technical scheme chooses for use the ITO rete as the conductive film layer, both can reach effective privacy protection, has good electric conductivity's effect again to effectively improve current ITO membrane and can not effectively compromise high conductivity and high heat-proof quality's defect.
Further, the colorful ITO membrane of adjusting luminance of thermal-insulated conduction type still includes the transition layer, the colorful ITO membrane of adjusting luminance of thermal-insulated conduction type still includes the insulating layer, the insulating layer includes that thickness is 5 ~ 10 nm's silicon oxide layer.
Through adopting above-mentioned technical scheme, because this application is at the in-process of preparation, through this silicon oxide layer of surface deposition at the colorful layer, on the one hand, sedimentary silicon oxide can form good protective structure on the rete surface, in actual processing or use, effectively prevent to appear discharging or strike sparks the phenomenon of ITO membrane of adjusting luminance breakdown in follow-up preparation and the course of working, on the other hand, the effective cladding of silicon oxide, can reduce the phenomenon such as oxidation that ITO membrane of adjusting luminance appears under natural environment in the in-service use process, thereby further improve the life of ITO membrane of adjusting luminance.
Further, the multi-color layer includes titanium oxide TixOxOr titanium nitride TixNxAny one of them.
Through adopting above-mentioned technical scheme, the structure in the colorful layer has been optimized in this application, and the main material of colorful layer is made through the oxynitridation of titanium or oxide, because Ti forms nitride and the oxide of isostructure under oxygen or nitrogen gas environment to form the colorful layer of different colours, through the material of chooseing for use different colours, thereby satisfy the different demands of user in the in-service use process.
Further, the thickness of the colorful layer is 15-25 nm.
Through adopting above-mentioned technical scheme, this application is through optimizing the thickness on colorful layer, and on the one hand, the thickness on colorful layer should not set up the excess thickness, prevents that the structure excess thickness from leading to the luminousness to descend and showing to can not satisfy actual user demand, also prevent that colorful layer thickness is too thin simultaneously, thereby satisfy the demand of the privacy protection of rete opposite side.
Further, the ITO film layer is composed of 92-98% of In percentage by mass2O3And 2-8% of SnO2And (4) forming.
By adopting the technical scheme, the composition of indium oxide and tin oxide in the ITO film layer is optimized, the formed ITO film layer has a good dispersion structure, the dispersion performance of indium oxide and tin oxide in the ITO film layer material is improved, and therefore the prepared ITO material has good conductivity and light transmittance.
Further, the thickness of the ITO film layer is 20-30 nm.
Through adopting above-mentioned technical scheme, the thickness of ITO rete is optimized in this application, because ITO is as semiconductor material, its electric conductive property is relatively poor, and improves the electric conductive property that its thickness can effectively improve the material, so the thickness of ITO rete has further been optimized to this application technical scheme, makes ITO membrane of adjusting luminance pass through and has good electric conductive property.
Further, the matrix body comprises any one of a PET plate, a PMMA plate or a glass substrate with the light transmittance being larger than or equal to 85%.
By adopting the technical scheme, the plate material with high light transmittance is selected, on one hand, due to the adoption of the structural scheme that the light modulation film is prepared by the multilayer film layers, the actual light transmittance of the material is reduced to a certain extent, so that the light-transmitting material with excellent light transmittance is selected, and the prepared light modulation film has good light transmittance; on the other hand, the use requirements of the light-adjusting film material under different scenes are met by adjusting the base body material.
In a second aspect, the application provides a method for preparing a heat-insulating conductive colorful ITO dimming film, which adopts the following technical scheme:
the preparation method of the heat-insulation and conductive colorful ITO dimming film comprises the following steps: s1, taking the matrix body, cleaning and airing, carrying out magnetron sputtering on a layer of colorful layer on the surface of the aired matrix, and adjusting the thickness of the colorful layer; s2, after the multi-color layer is subjected to magnetron sputtering, performing magnetron sputtering on an ITO film layer on the surface of the multi-color layer by taking a mixture of indium oxide and tin oxide as a target material; and S3, after the ITO film layers are sputtered and coated, continuing to perform magnetron sputtering on the insulating layer of silicon oxide, adjusting the magnetron sputtering working gas of each film layer to be a mixture of argon and oxygen with the concentration of 99.99%, and sputtering the surface of the matrix body at room temperature to obtain the heat-insulating conductive colorful ITO light-modulating film.
Through adopting above-mentioned technical scheme, this application adopts magnetron sputtering's scheme, at base member body surface deposit preparation membrane of adjusting luminance, and the operating procedure of integration is passed through to whole scheme, and existing effect has improved the heat-proof quality, the electric conductivity of material, can effectively reduce the cost of preparing colorful ITO membrane material of adjusting luminance again, improves the efficiency of preparation.
In summary, the present application includes at least one of the following beneficial technical effects:
firstly, the application can form a good color shielding effect on the surface of the matrix body through the arrangement of the colorful layers, can well cover light rays behind the film, and effectively improves privacy of a user at the other side of the film;
but the setting of colorful layer structure can show the electric conductive property that reduces the ITO membrane, so this application technical scheme chooses for use the ITO rete as the conductive film layer, both can reach effective privacy protection, has good electric conductivity's effect again to effectively improve current ITO membrane and can not effectively compromise high conductivity and high heat-proof quality's defect.
Second, in the in-process of preparation, through this silicon oxide layer of surface deposit at the colorful layer, on the one hand, the deposited silicon oxide can form good protective structure on the rete surface, in actual processing or use, effectively prevent to appear discharging or strike sparks the phenomenon that the membrane punctures ITO dimming in follow-up preparation and the course of working, on the other hand, the effective cladding of silicon oxide can reduce the phenomenon such as oxidation that the membrane appears under natural environment ITO dimming in the actual use process, thereby further improve the life of ITO dimming membrane.
Third, this application has optimized the structure in the colorful layer, makes the main material on colorful layer through the oxynitridation of titanium or oxide, because Ti forms nitride and the oxide of different structures under oxygen or nitrogen gas environment to form the colorful layer of different colours, through the material of chooseing for use different colours, thereby satisfy the different demands of user in the in-service use process.
Fourth, this application adopts magnetron sputtering's scheme, at the base member body surface deposit preparation membrane of adjusting luminance, and the operating procedure of integration is passed through to whole scheme, and existing effect has improved the heat-proof quality, the electric conductivity of material, can effectively reduce the cost of preparing colorful ITO membrane material of adjusting luminance again, improves the efficiency of preparation.
Drawings
FIG. 1 is a schematic structural diagram of a heat-insulating conductive colorful ITO light modulation film according to an embodiment of the present application;
fig. 2 is a schematic structural view of a heat-insulating conductive multicolor ITO light modulation film according to another embodiment of the present application.
Description of reference numerals: 1. a base body; 2. a multi-color layer; 3. an ITO film layer; 4. an insulating layer.
Detailed Description
The present application will be described in further detail with reference to examples.
In the examples of the present application, the raw materials and the equipment used are as follows, but not limited thereto:
in the application, all raw materials and instruments and equipment can be obtained by market, and the specific models are as follows:
digital four-probe: RTS-9;
multi-target magnetron sputtering instrument: SIV-500 RD;
an ellipsometer: OTSUKA type;
solar energy module tester: prova 200A
Ultraviolet visible spectrophotometer: TU 1810D.
Preparation example
Target material of colorful layer: the target material of the multicolor layer is shown in the following table 1:
TABLE 1 target material with multi-color layer
It should be noted that there are many Ti oxides and Ti nitrides, and only a few of the more common Ti oxides and Ti nitrides were selected in the preparation examples.
The target material for the insulating layer is shown in table 2 below:
TABLE 2 insulating layer target Material
The ITO film layer target material is shown in the following table 3:
TABLE 3 ITO film layer target material
Examples
Example 1
As shown in figure 2, a substrate body 1 is taken and cleaned and dried, the target material prepared in preparation example 1 is selected on the surface of the dried substrate and is placed on the surface of a movable device, the thickness of the membrane is controlled by controlling the speed of a trolley, the speed of the trolley is accurately controlled to 1nm/min, and the ultimate vacuum is adjusted to be 10 multiplied by 10-5Pa, regulating working gas to be argon and oxygen with the concentration of 99.99%, wherein the gas flow is 50mL/min respectively, the sputtering power is 1500W, and carrying out magnetron sputtering on a 15nm colorful layer 2;
after the magnetron sputtering of the colorful layer 2 is finished, performing magnetron sputtering of an ITO film layer 3 with the thickness of 20nm on the surface of the colorful layer 2 by taking the preparation example 10 as a target material;
and after the ITO film layer 3 is sputtered and coated, continuing magnetron sputtering the silicon oxide insulating layer 4 with the thickness of 5nm by using the material prepared in the preparation example 7 as a target material, and sputtering the surface of the substrate body 1 at room temperature to obtain the heat-insulating conductive colorful ITO dimming film.
Example 2: a heat-insulating conductive colorful ITO dimming film, which is different from example 1 in that the colorful layer target material adopted in example 2 is the colorful layer target material prepared in preparation example 2, and the rest of the preparation steps and the preparation environment are the same as those in example 1.
Example 3: a heat-insulating conductive colorful ITO dimming film, which is different from example 1 in that the colorful layer target material adopted in example 3 is the colorful layer target material prepared in preparation example 3, and the rest of the preparation steps and the preparation environment are the same as those in example 1.
Example 4: a heat-insulating conductive colorful ITO dimming film, which is different from example 1 in that the colorful layer target material adopted in example 4 is the colorful layer target material prepared in preparation example 4, and the rest of the preparation steps and the preparation environment are the same as those in example 1.
Example 5: a heat-insulating conductive colorful ITO dimming film, which is different from example 1 in that the colorful layer target material adopted in example 5 is the colorful layer target material prepared in preparation example 5, and the rest of the preparation steps and the preparation environment are the same as those in example 1.
Example 6: a heat-insulating conductive colorful ITO dimming film, which is different from example 1 in that the colorful layer target material adopted in example 6 is the colorful layer target material prepared in preparation example 6, and the rest of the preparation steps and the preparation environment are the same as those in example 1.
Example 7: a heat-insulating conductive multicolor ITO light-adjusting film, which is different from example 1 in that the target material for the insulating layer used in example 7 is the target material for the multicolor layer prepared in preparation example 8, and the rest of the preparation steps and the preparation environment are the same as those in example 1.
Example 8: a heat-insulating conductive multicolor ITO light-adjusting film, which is different from example 1 in that the insulating layer target used in example 8 is the insulating layer target prepared in preparation example 9, and the rest of the preparation steps and the preparation environment are the same as those in example 1.
Example 9: a heat-insulating conductive multicolor ITO light-adjusting film, which is different from example 1 in that the ITO film target used in example 9 is the ITO film target prepared in preparation example 11, and the rest of the preparation steps and the preparation environment are the same as those in example 1.
Example 10: a heat-insulating conductive multicolor ITO light-adjusting film, which is different from example 1 in that the ITO film target used in example 10 is the ITO film target prepared in preparation example 12, and the rest of the preparation steps and the preparation environment are the same as those in example 1.
Example 11: a heat-insulating conductive multicolor ITO light-adjusting film, which is different from example 1 in that the thickness of the multicolor layer 2 prepared in example 11 is 20nm, and the rest of the preparation steps and the preparation environment are the same as those of example 1.
Example 12: a heat-insulating conductive multicolor ITO light-adjusting film, which is different from example 1 in that the thickness of the multicolor layer 2 prepared in example 12 is 25nm, and the rest of the preparation steps and the preparation environment are the same as those of example 1.
Example 13: a heat-insulating conductive multicolor ITO light-adjusting film, which is different from example 1 in that the ITO film layer 3 prepared in example 13 has a thickness of 25nm, and the rest of the preparation steps and the preparation environment are the same as those of example 1.
Example 14: a heat-insulating conductive multicolor ITO light-adjusting film, which is different from example 1 in that the ITO film layer 3 prepared in example 14 has a thickness of 30nm, and the rest of the preparation steps and the preparation environment are the same as those of example 1.
Example 15: a heat-insulating conductive multicolor ITO light-adjusting film, which is different from example 1 in that the insulating layer 4 prepared in example 15 has a thickness of 7nm, and the remaining preparation steps and preparation environment are the same as those of example 1.
Example 16: a heat-insulating conductive multicolor ITO light-adjusting film, which is different from example 1 in that the insulating layer 4 prepared in example 16 has a thickness of 10nm, and the rest of the preparation steps and the preparation environment are the same as those of example 1.
Example 17 as shown in figure 1: a heat-insulating conductive multicolor ITO light-adjusting film, which is different from example 1 in that no insulating layer 4 is provided in example 17, and the remaining manufacturing steps and manufacturing environment are the same as those in example 1.
Comparative example
Comparative example 1: the heat-insulating conductive multicolor ITO light-adjusting film is different from the embodiment 1 in that the ITO film layer 3 is not arranged in the comparative example 1, and the rest preparation conditions and the component distribution ratio are the same as those in the embodiment 1.
Comparative example 2: a heat-insulating conductive multicolor ITO light-adjusting film, which is different from example 1 in that comparative example 2 is not provided with the multicolor layer 2, and the other preparation conditions and the component distribution ratio are the same as those of example 1.
Comparative example 3: a heat-insulating conductive colorful ITO light modulation film is different from the embodiment 1 in that a pure nanometer Ni film layer with the same thickness is adopted in a comparative example 3 to replace a colorful layer 2 in the embodiment 1, and the rest preparation conditions and the component distribution ratio are the same as those in the embodiment 1.
Comparative example 4: a heat-insulating conductive multicolor ITO light-adjusting film is different from the embodiment 1 in that a sodium silicate film layer with the same thickness is adopted in a comparative example 4 to replace an insulating layer 4 in the embodiment 1, and the rest preparation conditions and the component distribution ratio are the same as those in the embodiment 1.
Comparative example 5: a colorful ITO (indium tin oxide) dimming film with heat insulation and conduction type is different from the colorful ITO dimming film In example 1 In the target material of the ITO film layer adopted In the comparison example 52O3And SnO2The components are mixed according to equal mass ratio, and the other preparation conditions and the component ratio are the same as those of the example 1.
Performance test
The heat-insulating and conductive colorful ITO light-adjusting films prepared in examples 1 to 17 and comparative examples 1 to 5 were subjected to performance tests on electric conductivity and light transmittance.
Detection method/test method
(1) The passing digital four-probe test has the measurement type of square resistance and the current-shunting measuring range of 100 mu A-1 mA. Finally, obtaining the resistivity of each experimental group of films according to a formula;
(2) carrying out light transmittance test on each experimental group, wherein the scanning range is 300-900 nm, the scanning speed is medium speed, the scanning speed is 1nm/s, the slit width is 2nm, the incident angle is 0 degree, and the lamp changing position is 290 nm;
(3) the prepared examples or comparisons are sequentially put into a solar simulator, and a probe of a thermocouple thermometer is tightly attached to one side of the film. Setting the solar simulator parameters to be consistent every time, and setting the irradiance to be 900W/m on the other side of the film2. The temperature measuring instrument records the temperature of the component once every 10min, compares the temperature change of the component, and analyzes the heat insulation effect, wherein the specific detection results are shown in the following table 4:
TABLE 4 Performance test Table
Performance analysis was performed from table 4 above:
(1) combine table 2 by embodiment 1 ~ 10 each group proportion to discover, the colorful ITO membrane of adjusting luminance of thermal-insulated conduction type that this application prepared has good electric conductivity and heat-proof quality, this explains that this application technical scheme passes through colorful layer 2's setting, on the one hand, can form the effect that good colour was shielded on base member body 1 surface, can carry out good hiding to the light at the back of film, user's privacy behind the effective improvement film, simultaneously colorful layer 2 that this application adopted is through having different colours, can effectively shield and absorb the infrared ray, thereby form good separation effect to the heat.
(2) The composition ratios of the components in examples 10 to 16 are combined with table 2, and it can be found that the thicknesses of the film layers in examples 10 to 16 are adjusted, and compared with examples 10 to 16, the differences of the light transmittance and the heat insulation performance are not large, which indicates that the adopted colorful layer 2 has different colors, and can effectively shield and absorb infrared rays, so that a good blocking effect is formed on heat, and meanwhile, the thicknesses of the film layers which are preferable in the application can effectively improve the heat insulation performance of the light modulation film.
(3) From the composition ratios of example 17 and comparative example 1 in combination with table 2, it can be seen that, while example 17 has no insulating layer 4, comparative example 4 uses a sodium silicate thin film layer with equal thickness to replace the insulating layer 4 in example 1, since the insulating layer 4 is mainly disposed to prevent the light modulation film from being broken down, but has little influence on the overall scheme, the greatest significance lies in effectively improving the service life of the material.
(4) Compare comparative example 1 and embodiment 1 and carry out the performance, because comparative example 1 does not set up ITO rete 3, can discover by table 2, its electric conductivity is ignored, explains this application technical scheme passes through ITO rete 3 as electrically conductive rete, both can reach effective privacy protection, has good effect of electric conductivity again to effectively improve current ITO membrane and can not effectively compromise high electric conductivity and high heat-proof quality's defect.
(5) Carry out the performance contrast with comparative example 2 ~ 3 and embodiment 1, because comparative example 2 does not set up colorful layer 2, the composition of colorful layer 2 has been adjusted to comparative example 3, can discover by table 2, its luminousness is showing and is rising, the heat-proof quality is showing and reduces, this explains that this application technical scheme adopts the setting that the multilayer was adopted, can form the effect that good colour was shielded on 1 surface of base member, can carry out good hiding to the light behind the film, effectively improve user's privacy behind the film, simultaneously colorful layer 2 that this application adopted is through having different colours, can effectively shield and absorb the infrared ray, thereby form good separation effect to the heat.
(6) The performance of comparative example 5 is compared with that of example 1, and In the ITO film target material is adjusted In the comparative example 42O3And SnO2The mixing proportion of the components leads to the reduction of the electrical conductivity and the heat insulation property, which shows that the technical scheme optimizes the composition of indium oxide and tin oxide in the ITO film layer 3, so that the formed ITO film layer 3 has a good dispersion structure, and the dispersion property of the indium oxide and the tin oxide in the material of the ITO film layer 3 is improved, thereby the prepared ITO material has good electrical conductivity and light transmittance.
The present embodiment is only for explaining the present application, and it is not limited to the present application, and those skilled in the art can make modifications of the present embodiment without inventive contribution as needed after reading the present specification, but all of them are protected by patent law within the scope of the claims of the present application.
Claims (8)
1. The utility model provides a thermal-insulated conduction type colorful ITO membrane of adjusting luminance which characterized in that, thermal-insulated conduction type colorful ITO membrane of adjusting luminance includes:
a base body (1), the base body (1) being formed as a light-transmitting sheet profile;
the colorful layer (2) is arranged on one side of the matrix body (1) and fixedly connected with the matrix body (1);
and one side of the ITO film layer (3) is attached to and fixedly connected with the other side of the colorful layer (2).
2. The multicolor ITO dimming film of claim 1, further comprising an insulating layer (4), wherein the insulating layer (4) comprises a silicon oxide layer with a thickness of 5-10 nm.
3. A thermally insulating conductive multicolored ITO film as claimed in claim 1, wherein said multicolored layer (2) comprises Ti-oxide TixOf Ox or titanium nitride TixNxAny one of them.
4. The multicolor ITO light adjusting film of thermal conductivity type according to claim 3, wherein the thickness of the multicolor layer (2) is 15 to 25 nm.
5. A multicolor ITO dimming film of thermal conductivity type according to claim 1, wherein the ITO film layer (3) is composed of 92-98% by mass of In2O3And 2-8% of SnO2And (4) forming.
6. The multicolor ITO dimming film of thermal insulation conductivity type according to claim 5, wherein the thickness of the ITO film layer (3) is 20 to 30 nm.
7. The multicolor ITO dimming film of thermal conductivity type according to claim 6, wherein the base body (1) comprises any one of PET sheet, PMMA sheet or glass substrate.
8. The multicolor ITO light adjusting film of any one of claims 1 to 7, wherein the method for preparing the multicolor ITO light adjusting film of the thermal conductivity type comprises the following steps:
s1, taking the substrate body (1), cleaning and airing, carrying out magnetron sputtering on a layer of colorful layer (2) on the surface of the aired substrate, and adjusting the thickness of the colorful layer (2);
s2, after the multi-color layer (2) is subjected to magnetron sputtering, performing magnetron sputtering on a layer of ITO film (3) on the surface of the multi-color layer (2) by taking a mixture of indium oxide and tin oxide as a target material;
and S3, after the ITO film layer (3) is sputtered and coated, continuing to perform magnetron sputtering on the insulating layer (4) of silicon oxide, adjusting the magnetron sputtering working gas of each film layer to be a mixture of argon and oxygen with the concentration of 99.99%, and sputtering the surface of the substrate body (1) at room temperature to obtain the heat-insulating conductive colorful ITO light-adjusting film.
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Application publication date: 20210810 |