CN113185516A - 一种新型电子受体材料的制备及其应用 - Google Patents
一种新型电子受体材料的制备及其应用 Download PDFInfo
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- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
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Abstract
Description
技术领域
本发明涉及有机光电器件技术领域,特别涉及一种新型电子受体材料制备及应用。
背景技术
有机电致发光器件(OLED)作为新一代的平板显示技术应运而生并逐渐进入了人们的视野。最初的OLED结构非常简单,就是阳极/发光层(包含一种发光材料)EML/阴极,这种简单结构的器件性能较差,所需的启亮电压高,且发光效率低。此后,多种器件结构被相继提出,例如现在的OLED的基本器件结构为:阳极/空穴注入层HIL/空穴传输层HTL/EML发光层(主客体掺杂体系)/ETL电子传输层/电子注入层EIL/阴极。在这样的多层器件结构中,各个功能层负责单一的功能,从而使OLED的性能有了很大的提升。
在上述OLED器件的多层结构中,作为发光层的客体材料,其化学结构、热稳定性,光物理性质、量子产率(PLQY)等直接决定了最终器件效率。分子内、分子间电荷转移发光作为常见的发光材料的设计思路,其需要一个缺电核心作为电子受体,一个富电基团作为电子给体,通过分子内、分子间的电荷转移发出荧光。传统的基于TADF材料的OLED器件中,发光材料性能往往不能令人满意,大大的制约了其实用化的进程。
发明内容
本发明的目的在于提供一种新型的电子受体,构建有机光电材料。该种材料用于OLED器件中表现出十分优秀的性能。
为解决上述技术问题,本发明的实施方式提供了一种TADF材料,具有通式(Ⅰ)所示的结构:一种新型缺电受体材料,其具有通式(I)、(II)所示的结构:
其中X、Y可分别为C原子或N原子;B1、B2、B3各自独立地为烷基、氨基、亚胺基、氘代物、未取代或取代的五元芳香环、六元芳香环或稠环、苯胺、苯胺衍生物、二苯胺及二苯胺衍生物。
其中B1、B2、B3可具有如下通式结构:
R1、R2、R3、R4、R5、R6、R7、R8、R9、R10、R11、R12、R13、R14各自独立地为氢原子、氘原子、烷基、氘代物、芳香环、稠环、苯胺、苯胺衍生物、二苯胺及二苯胺衍生物。
根据权利要求1所述材料,其特征在于,包括但不限于下列之一的结构:
本发明的实施方式还提供上述TADF材料在器件中的应用。
具体地,本发明的实施方式提供一种器件,其包含上述TADF材料,并为器件中的发光材料、空穴传输材料或电子传输材料。
附图说明
图1为化合物M3的核磁图谱H谱。
图2为化合物M3的核磁图谱C谱。
图3为化合物M4的核磁图谱H谱。
图4为化合物M4的核磁图谱C谱。
图5为化合物M5的核磁图谱H谱。
图6为化合物M5的核磁图谱C谱。
图7为化合物M6的核磁图谱H谱。
图8为化合物M6的核磁图谱C谱。
具体实施方式
为使本发明的目的、技术方案和优点更加清楚,下面将对本发明的各实施方式进行详细的阐述。为了使读者更好地理解本发明而提出了许多技术细节。但是,即使没有这些技术细节和基于以下各实施方式的种种变化和修改,也可以实现本发明各权利要求所要求保护的技术方案。
以下提供在本发明公开化合物的制备方法。但是本公开内容意图不限于本文中所叙述的方法的任一种。所属领域的技术人员可容易地修改所叙述的方法或者利用不同的方法来制备所公开的化合物的一种或多种。下列方面仅是示例性的,且不意图限制本公开内容的范围。温度、催化剂、浓度、反应物组成、以及其它工艺条件可改变,并且对于期望的化合物,本公开内容所属领域的技术人员可以容易的选择合适的反应物和条件。
在Agilent 400-MR DD2仪器上于CDCl3或DMS0-d6溶液中以400MHz记录1H NMR图谱,以100MHz记录13C NMR图谱,化学位移参照残留的氘代(Protiated)溶剂。如果CDCl3用作溶剂,则采用四甲基硅烷(δ=0.00ppm)作为内标记录1H NMR图谱;采用DMSO-d6(δ=77.00ppm)作为内标记录13CNMR图谱。如果将H2O(δ=3.33ppm)用作溶剂,则采用残留的H2O(δ=3.33ppm)作为内标记录1H NMR图谱;采用DMSO-d6(δ=39.52ppm)作为内标记录13C NMR图谱。使用下列缩写(或其组合)来解释1H NMR的多重性:s=单重,d=双重,t=三重,q=四重,p=五重,m=多重,br=宽峰。在Shimadzu LCMS-IT-TOF(ESI)上记录质谱。
本发明中所披露化合物的通用性合成路线如下所示:
中间体M1的合成:
具体实施:在预干燥的三颈瓶中放入磁力搅拌子,并放入三聚氯氰1.8g(10mmol),苯硼酸1.2g(10mmol),二(三苯基膦)二氯化钯350mg,碳酸钾5.5g(40mmol)随后置换氮气三次以上,加入已经脱气干燥的甲苯20mL,磁力搅拌、回流反应10小时。反应结束后抽滤、重结晶、柱层析得产品M1 1.8g,产品收率80%,质谱ESI+:224.986。
中间体M2的合成:
具体实施:在预干燥的三颈瓶中放入磁力搅拌子,并放入中间体M1 1.8g(8mmol),苯硼酸1.2g(10mmol),二(三苯基膦)二氯化钯350mg,碳酸钾5.5g(40mmol)后置换氮气三次以上,加入脱气甲苯20mL,脱气后的去离子水5mL,磁力搅拌、回流反应10小时。反应结束后抽滤、重结晶、柱层得产品M2 1.6g,产品收率75%,质谱ESI+:267.056。
中间体M3的合成:
具体实施:在预干燥的三颈瓶中放入磁力搅拌子,放入中间体M2 1.6g(7mmol),水合联氨10mL,60摄氏度下反应6小时,冷却,过滤,不用后处理,直接下一步。
中间体M3的表征:1H NMR(400MHz,CDCl3)δ(ppm)=8.58(s,4H),7.57-7.50(m,6H),6.70(s,1H),4.21(s,2H).13C NMR(100MHz,CDCl3)δ(ppm)=168.70,136.39,132.32,128.85,128.60.HRMS(ESI)m/z:[M+H]+Calcd.for C15H14N5 +:264.1244;found,264.1242。
中间体M4的合成:
具体实施:在预干燥的三颈瓶中放入磁力搅拌子,放入中间体M3 1.3g(5mmol),对溴苯甲醛925mg(5mmol),乙醇20mL,磁力搅拌、回流反应10小时,冷却,减压蒸馏出溶剂,不用后处理,直接进入下一步。
中间体M4的表征:1H NMR(400MHz,CDCl3)δ(ppm)=8.94(s,1H),8.65(s,4H),7.90(s,1H),7.69-7.65(m,2H),7.60-7.52(m,8H).13C NMR(100MHz,CDCl3)δ(ppm)=164.86,143.59,136.13,132.90,132.62,132.10,129.07,128.93,128.68,124.49.HRMS(ESI)m/z:[M+Na]+Calcd.for C22H16 79BrN5Na+:452.0481;found,452.0479.Calcd.for C22H16 81BrN5Na+:454.0461;found,452.0447。
中间体M5的合成:
具体实施:在预干燥的三颈瓶中放入磁力搅拌子,放入中间体M4 2.1g(5mmol),醋酸碘苯1.6g(5mmol),二氯甲烷做溶剂,磁力搅拌、常温反应6小时,反应结束后减压蒸馏溶剂,重结晶得中间体M5 1.9g(4.5mmol),产品收率90%。
中间体M4的表征:1H NMR(400MHz,CDCl3)δ(ppm)=8.69-8.66(m,2H),7.63-7.49(m,4H),7.46-7.44(m,2H),7.32-7.27(m,4H),7.09-7.06(m,2H).13C NMR(100MHz,CDCl3)δ(ppm)=161.65,156.06,155.84,144.87,134.62,133.04,132.76,131.36,130.74,130.37,129.72,129.45,128.99,128.35,126.33,124.51.HRMS(ESI)m/z:[M+Na]+Calcd.forC22H14 79BrN5Na+:450.0325;found,450.0321.Calcd.for C22H14 81BrN5Na+:452.0304;found,450.0283。
中间体M6的合成:
具体实施:在预干燥三颈瓶中放入磁力搅拌子,放入中间体M5 1.7g(4mmol),碳酸钾2.7g(20mmol),领二氯苯10mL,190摄氏度反应48小时,减压蒸馏溶剂得中间体M6,不用后处理,直接下一步。
中间体M4的表征:1H NMR(400MHz,CDCl3)δ(ppm)=9.08-9.05(m,2H),8.75-8.72(m,2H),8.33-8.30(m,2H),7.78-7.67(m,5H),7.63-7.55(m,3H).13C NMR(100MHz,CDCl3)δ(ppm)=166.45,163.71,159.74,154.37,135.37,134.22,132.75,132.22,131.67,129.67,129.60,129.53,128.99,128.94,128.92,126.09.HRMS(ESI)m/z:[M+Na]+Calcd.forC22H14 79BrN5Na+:450.0325;found,450.0318.Calcd.for C22H14 81BrN5Na+:452.0304;found,450.0347。
材料L1–L144使用中间体M5或者M6通过Buchwald-Hartwig胺化反应(布赫瓦尔德-哈特维希反应)或者乌尔曼反应得到目标化合物。
具体实施举例:
通过Buchwald-Hartwig胺化反应合成材料L1:
在预干燥的三颈瓶中放入磁力搅拌子,放入中间体M5 427mg(1mmol),3甲基-9氢咔唑181mg(1mmol),碳酸钾552mg(4mmol),醋酸钯11.2mg(0.05mmol),三叔丁基膦四氟硼酸盐29mg(0.1mmol),氮气置换3次以上,加入干燥脱气的甲苯5mL,磁力搅拌、回流反应24小时,反应结束后,抽滤,减压蒸馏,柱层析分离纯化得化合物L1 422mg,产品收率80%,ESI+:528.206。
通过乌尔曼反应合成材料L1:
在预干燥三颈瓶中放入磁力搅拌子,放入中间体M5 427mg(1mmol),3甲基-9氢咔唑181mg(1mmol),碳酸钾552mg(4mmol),铜64mg(1mmol),DMF5mL,回流反应24小时抽滤,减压蒸馏,柱层析分离纯化得化合物L1 397mg,产品收率70%,ESI+:528.206。
通过Buchwald-Hartwig胺化反应合成材料L73:
在三颈瓶中放入磁力搅拌子,放入中间体M6 427mg(1mmol),3甲基-9氢咔唑181mg(1mmol),碳酸钾552mg(4mmol),醋酸钯11.2mg(0.05mmol),三叔丁基膦四氟硼酸盐29mg(0.1mmol),氮气置换3次以上,加入甲苯5mL,回流反应24小时,反应结束后,抽滤,减压蒸馏,柱层析分离纯化得化合物L1422mg,产品收率80%,ESI+:528.206。
通过乌尔曼反应合成材料L73:
在预干燥三颈瓶中放入磁力搅拌子,放入中间体M6 427mg(1mmol),3甲基-9氢咔唑181mg(1mmol),碳酸钾552mg(4mmol),铜64mg(1mmol),DMF5mL,回流反应24小时抽滤,减压蒸馏,柱层析分离纯化得化合物L1 397mg,产品收率70%,ESI+:528.206。
在本发明的一些具体实施例中,所提供的有机发光二极管器件包含:第一电极、在第一电极上形成的空穴传输层、在空穴传输层上形成的发光层、在发光层上形成的电子传输层,以及覆盖在电子传输层上的第二电极,且发光层、空穴传输层或电子传输层包含本发明中的TADF材料。
器件制备示例:
取ITO基板,30mm*30mm尺寸的底发射玻璃,有四个发光区域,发光面积为3mm*3mm,ITO薄膜的透光率为90%@550nm,表面粗糙度Ra<1nm,ITO膜厚为1300A,方电阻为10欧姆每平方米。
ITO基板的进行清洗:首先放置在盛有丙酮溶液的容器中,将该容器放置于在超声波清洗机进行超声清洗,清洗时间为30分钟,主要是将附着在ITO表面的有机物进行溶解和去除;然后将清洗完毕的ITO基板取出放置在热板上进行高温120℃烘烤半个小时,主要是移除ITO基板表面的有机溶剂和水汽;然后将烘烤完毕的ITO基板迅速转移到UV-ZONE设备中进行O3等离子体处理,将ITO表面难以除尽的有机物或异物进一步使用等离子处理15分钟,处理完毕的ITO迅速转移到OLED蒸镀设备成膜室中。
OLED蒸镀前准备:首先对OLED蒸镀设备进行洁净处理,使用异丙醇进行擦拭成膜室的腔体内壁,保证整个成膜腔体没有异物或粉尘。然后,将装有OLED有机材料的坩埚和装有金属铝粒的坩埚依次放置在有机蒸发源和无机蒸发源位置上。关闭腔体,进行初抽真空和抽高真空步骤,使得OLED蒸镀设备内部蒸镀度达到10E-7Torr。
OLED蒸镀成膜:打开OLED有机蒸发源,对OLED有机材料进行100℃预热,预热时间为15分钟,保证进一步移除OLED有机材料中的水汽。然后对需要蒸镀的有机材料进行快速升温加热处理,并打开蒸发源上方的挡板,直到该材料的蒸发源有有机材料跑出,同时晶振片检测器检测到蒸发速率时,然后进行缓慢升温,升温幅度为1-5℃,直到蒸发速率稳定在1A/秒时,打开掩膜板板正下方的挡板,进行OLED成膜,当电脑端观测到ITO基板上的有机膜达到预设膜厚时,关闭掩膜板挡板和蒸发源正上方挡板,关闭该有机材料的蒸发源加热器。其它有机材料和阴极金属材料的蒸镀工艺如上所述。
OLED封装流程:30mm*30mm的封装盖的清洁处理方式如ITO基板前处理方式。在清洁完毕的封装盖外延四周进行UV胶材涂覆或点胶,然后,将点完UV胶材的封装盖转移到真空贴合设备中,与成膜OLED有机膜的ITO基板进行真空贴合,然后,转移到UV固化腔体中,使用365nm波段的紫外光进行光固化。光固化的ITO器件,还需要进行80℃半小时的后热处理,使得UV胶材完全固化。
器件示例:
以下提供ITO/HIL/HTL/光取向发光层/ETL/EIL/阴极的多层有机发光二极管器件示例。该示例不应看作是对本发明的限定,为了方便技术人员理解本发明的技术优势和器件原理,本发明中的示例均是以最简单的器件结构来说明。
器件结构:ITO/HAT-CN 5nm/NPB 30nm/TCTA 10nm/L77:mCBP 15%30nm/DPEPO10nm/Tmpypb 30nm/LiF/Al
OLED器件制作示例:
预清洗ITO玻璃基板。干燥结束后保存于洁净台内,使用前用氧等离子体处理10分钟。
将有机化合物、金属、无机盐放入蒸镀槽内,同时放置好氧等离子体处理的ITO玻璃。
首先开启真空泵等待压力低于10Pa后开启分子泵,等待腔体压力小于10-6Pa。
打开基本旋转按钮,使其匀速旋转。
打开HAT-CN对应的加热源,观察晶振片报道的蒸发速率,当速率稳定在0.5A/s后打开ITO玻璃前的挡板,并清零厚度计数,等待膜厚达到5nm后关闭挡板。
关闭HAT-CN对应的加热源。
打开NPB对应的加热源,观察晶振片报道的蒸发速率,当速率稳定在1A/s后打开ITO玻璃前的挡板,并清零厚度计数,等待膜厚达到30nm后关闭挡板。
关闭NPB对应的加热源。
打开TCTA对应的加热源,观察晶振片报道的蒸发速率,当速率稳定在1A/s后打开ITO玻璃前的挡板,并清零厚度计数,等待膜厚达到10nm后关闭挡板。
关闭TCTA对应的加热源。
打开L77和mCBP对应的加热源,观察晶振片报道的蒸发速率,当L77速率稳定在0.15A/s并且mCBP速率稳定在1A/s时打开ITO玻璃前的挡板,并清零厚度计数,等待膜厚达到30nm后关闭挡板。
关闭L77和mCBP对应的加热源。
打开DPEPO对应的加热源,观察晶振片报道的蒸发速率,当速率稳定在1A/s后打开ITO玻璃前的挡板,并清零厚度计数,等待膜厚达到10nm后关闭挡板。
关闭DPEPO对应的加热源。
打开Tmpypb对应的加热源,观察晶振片报道的蒸发速率,当速率稳定在1A/s后打开ITO玻璃前的挡板,并清零厚度计数,等待膜厚达到30nm后关闭挡板。
关闭Tmpypb对应的加热源。
切换为金属掩膜版。
打开LiF对应的加热源,观察晶振片报道的蒸发速率,当速率稳定在0.1A/s后打开ITO玻璃前的挡板,并清零厚度计数,等待膜厚达到1nm后关闭挡板。
关闭LiF对应的加热源。
打开Al对应的加热源,观察晶振片报道的蒸发速率,当速率稳定在1A/s后打开ITO玻璃前的挡板,并清零厚度计数,等待膜厚达到100nm后关闭挡板。
关闭Al对应的加热源。
关闭机械泵、分子泵,取出制备好的OLED器件。
其中,采用HAT-CN作为空穴注入层,采用NPB、TCTA作为空穴传输层,采用mCBP作为主体材料,L作为客体材料,采用DPEPO作为空穴阻挡层材料,Tmpypb为电子传输层,LiF(氟化锂)作为电子注入层材料,Al(金属铝)作为阴极。
部分有机材料的化学结构式如下:
表1.本发明器件1器件效率。
器件编号 | 客体材料 | 外量子效率 |
1 | L53 | 9% |
2 | L58 | 12% |
3 | L77 | 21% |
4 | L93 | 18% |
由表1可知,本公开技术的OLED器件性能非常好,可以用于OLED器件的制备使用中。
Claims (7)
3.权利要求1至2中任一项所述的材料在OLED器件中的应用。
4.一种器件,其特征在于,包含权利要求1至2中任一项所述的TADF材料。
5.根据权利要求4所述的器件,其特征在于,所述器件为有机发光二极管、有机薄膜晶体管、有机光伏电池或量子点有机二极管。
6.根据权利要求5所述的器件,其特征在于,所述TADF材料为所述器件中的发光材料、空穴传输材料或电子传输材料。
7.一种有机发光二极管器件,其特征在于,包含:第一电极、在所述第一电极上形成的空穴传输层、在所述空穴传输层上形成的发光层、在所述发光层上形成的电子传输层,以及覆盖在所述电子传输层上的第二电极,且所述发光层、空穴传输层或电子传输层包含所述材料。
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CN109071555A (zh) * | 2016-04-29 | 2018-12-21 | 株式会社斗山 | 有机发光化合物及利用其的有机电致发光元件 |
CN109824671A (zh) * | 2017-11-23 | 2019-05-31 | 北京鼎材科技有限公司 | 一种喹唑啉并三氮唑衍生物及其在有机电致发光领域的应用 |
CN110452689A (zh) * | 2019-08-22 | 2019-11-15 | 武汉尚赛光电科技有限公司 | 一种基于三唑并吡啶的有机电致发光材料及有机电致发光器件 |
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CN114426544A (zh) * | 2022-01-18 | 2022-05-03 | 川北医学院 | 一种有机光电材料、光电装置 |
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