CN113158602B - Single-particle transient current source modeling method aiming at incidence of different inclination angles - Google Patents
Single-particle transient current source modeling method aiming at incidence of different inclination angles Download PDFInfo
- Publication number
- CN113158602B CN113158602B CN202110460172.7A CN202110460172A CN113158602B CN 113158602 B CN113158602 B CN 113158602B CN 202110460172 A CN202110460172 A CN 202110460172A CN 113158602 B CN113158602 B CN 113158602B
- Authority
- CN
- China
- Prior art keywords
- incidence
- transient current
- current source
- layout
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/30—Circuit design
- G06F30/32—Circuit design at the digital level
- G06F30/33—Design verification, e.g. functional simulation or model checking
- G06F30/3308—Design verification, e.g. functional simulation or model checking using simulation
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Evolutionary Computation (AREA)
- Geometry (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Management, Administration, Business Operations System, And Electronic Commerce (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Abstract
The invention provides a single-particle transient current source modeling method aiming at different incidence angles, and solves the problems that the traditional current source modeling method is complex in parameter extraction and inaccurate in total injected charge estimation when the traditional current source modeling method is popularized to the incidence condition of the incidence angles. The method comprehensively considers the incident position, the incident angle and the shape and the size of the active region, and can more reasonably and accurately research the single event effect of the circuit and predict the anti-irradiation capability of the circuit. It includes: step one, obtaining a layout of a device to be researched; determining a linear energy transmission value of ions in the material, and setting an incident position and an incident azimuth angle of the ions to be evaluated on the layout; extracting the sensitive node outline in the layout, and recording the coordinates of the sensitive node outline on the layout; step four, obtaining single-particle transient current under the incident conditions of different inclination angles; and step five, calling the single-particle transient current obtained through calculation, executing circuit-level simulation calculation to obtain the voltage waveform of the sensitive node, and analyzing a radiation effect result.
Description
Technical Field
The invention belongs to the field of single event effect simulation and emulation of integrated circuit reliability, and particularly relates to a single event transient current source modeling method aiming at different inclination angles.
Background
A single energetic particle striking a sensitive region of a semiconductor device creates a large number of ionized electron-hole pairs in the material. Transient carrier collection will cause the abnormal voltage of the device node, and further cause the temporary or permanent functional failure of the circuit, and the radiation ionization damage is called single event effect. Circuit logic errors and functional failures caused by the single event effect pose serious threats to the reliability of the in-orbit spacecraft.
When the heavy ion accelerator ground simulation test is used for researching and evaluating the single event effect, a vertical incidence heavy ion irradiation device is adopted, and the relation between the single event effect section and the heavy ion energy is obtained, which is a common experimental means. However, heavy ions in the actual space are incident on the device from different directions, and particularly in an anisotropic device, particles incident along different inclination angles can generate single-particle transient pulses with larger differences in the device, so that the single-particle effect cross section obtained through experiments is influenced, and therefore, the research on the single-particle transient modeling method under the incidence of different inclination angles is valuable.
Currently, an equivalent Linear Energy Transfer (LET) method is mainly adopted for single-particle transient modeling of incidence at different inclination angles, and when the inclination angle is θ, the equivalent LET value can be expressed as:
LET eff =LET 0 /cos(θ)
wherein, LET 0 Representing the linear energy transfer value of the particle at normal incidence.
Therefore, at an oblique angle θ incidence, the total amount of charge collected by the sensitive node increases by a factor of 1/cos (θ). However, the method is not suitable for small-size devices, and a large number of experimental results show that the method has large errors and cannot accurately estimate the influence caused by inclination incidence.
The existing single event effect circuit level simulation method mainly adds a current source item in a circuit to replace sensitive node charge collection caused by high-energy particle incidence. G.c. messenger derives a double exponential analytic version of the current pulse under ideal p-n junction conditions at fixed bias. Chinese patent 201510386358.7 discloses a single event transient effect injection method based on a surrogate model, which implements a double-exponential current source method in a specific circuit. However, as the characteristic size of the circuit is reduced to below nanometer and the response time of the circuit is as low as hundreds of picoseconds, the process of collecting charges by the p-n junction is coupled with the dynamic response of the surrounding circuit, and the error caused by the double-exponential pulse injection form is gradually unacceptable. Meanwhile, the dependency relationship between the time parameter of the double-exponential pulse and the incident angle cannot be directly derived, and difficulty is brought to application and popularization of the method. Chinese patent 201210551771.0 discloses a method for establishing a current source model based on injection distance, which establishes a current source model based on a diffusion mechanism, introduces injection distance in an analytical expression, and represents the influence of an incident position on a single-particle transient state, but the method still adopts an equivalent LET value method aiming at different inclination angle incident situations, and has a large estimation error on the total amount of injected charges. Chinese patent 201911058784.2 discloses a modeling method considering the shape and size of an active region in single event effect circuit simulation, the method adopts two double-exponential current sources to respectively represent drift collection and diffusion collection processes, but the physical significance of model parameters is not clear, and the method depends on TCAD simulation and test data calibration and is not convenient to popularize to the condition of dip incidence.
Disclosure of Invention
In order to accurately obtain the influence of incidence at different inclination angles on a single-particle transient state and solve the problems of complex parameter extraction and inaccurate estimation of total injected charge amount when the traditional current source modeling method is popularized to the incidence situation of the inclination angles, the invention provides a single-particle transient current source modeling method aiming at the incidence at different inclination angles, which comprehensively considers the incidence position, the incidence angle and the shape and the size of an active area and can more reasonably and accurately research the single-particle effect of a circuit and predict the radiation resistance of the circuit.
In order to solve the problems, the invention adopts the following technical scheme:
a single-particle transient current source modeling method aiming at incidence of different dip angles comprises the following steps:
step one, selecting a device to be researched and obtaining a layout of the device;
step two, acquiring a linear energy transmission value LET (l) of ions in the material according to the types and the energies of the implanted ions, and acquiring the incidence position (x) of the ions to be evaluated on the layout at the same time 0 ,y 0 0) and azimuth angle of incidence (cosx, cosy, cosz);
step three, extracting the sensitive node outline in the layout, and recording the coordinate (x) of the sensitive node outline on the layout s ,y s 0) and (x) e ,y e ,0);
Step four, acquiring the injected single-particle transient current according to the information acquired in the step two and the step three;
the number of carriers n (t) diffusing to the sensitive node at time t is expressed in the form of a multiple integral:
where dx represents the discrete step size in the x-direction, dy represents the discrete step size in the y-direction, and dl represents the discrete step size in the incident track direction; q a The average energy required to generate an excess of carriers; d α Is the equivalent diffusivity of the carrier; d is a radical of ijk Is the distance from the infinitesimal of the ion track to the infinitesimal of the sensitive electrical port; d z An equivalent depth to collect charge; τ represents the lifetime of the carriers; i. j and k are circulation parameters; m represents the total discrete step size in the x direction, N represents the total discrete step size in the y direction, and G represents the total discrete step size in the incident track direction;
depending on the average speed of the carriers through the sensitive node electrical port, the single-event transient current I (t) can be expressed as:
I(t)=n(t)×q×V (3)
wherein q is an amount of electric charge carried by one electron; v is the average speed of carrier migration;
and step five, adding a sub-circuit model representing the single event effect in the circuit netlist, calling the single event transient current obtained by calculation in the step four, executing circuit-level simulation calculation to obtain the voltage waveform of the sensitive node, and analyzing a radiation effect result.
Further, in the fifth step, a sub-circuit model of the single event effect is written by adopting Verilog-A language.
Further, in the fifth step, a simulation tool specifically used for executing circuit-level simulation calculation to obtain the voltage waveform of the sensitive node is SPICE.
Further, in step three, the software tool used for coordinate extraction is Calibre.
Further, in step four, the N-channel MOS transistor has carriers of electrons, D α The value is 3cm 2 (s) for a P-channel MOS transistor, the carriers are holes, D α Value of 18cm 2 /s。
Further, in step four, Q a Is 3.6eV; d is a radical of z The value for the equivalent depth of collected charge is 0.15 μm.
Compared with the prior art, the method has the following beneficial effects:
1. the invention provides a single-particle transient current source modeling method aiming at different incidence angles, which is used for obtaining single-particle transient current by calculation based on a physical principle, wherein the obtained model comprehensively reflects the characteristics of the area, range, incident ion energy, incident position and the like of an active region and can represent the influence of an inclination angle on the single-particle transient current.
2. The tools adopted by the method are EDA standard tools, the compiled Verilog-A sub-circuit model can be conveniently called by SPICE, the implementation is simple and convenient, the calculation speed is high, and the injection of the current source can be accurately realized by combining the layout characteristics of the device.
Drawings
FIG. 1 is a flow chart of a single-particle transient current source modeling method for incidence at different inclination angles according to the present invention;
FIG. 2 is a schematic diagram illustrating the calculation principle of transient current of single particle in the method of the present invention;
FIG. 3 is a diagram of layout structure and simulation setup of 65nm SRAM in the method of the present invention;
FIG. 4 is a schematic diagram of a storage node voltage detection waveform incident at different positions in the method of the present invention;
FIG. 5 is a schematic diagram of a multi-bit flip-flop distribution hotspot under normal incidence in the method of the present invention;
FIG. 6 is a schematic diagram of a (60) multi-bit flip distribution hot spot under oblique incidence in the method of the present invention;
fig. 7 is a comparison graph of ground test and simulation results of a (60 °) flip section under vertical and oblique incidence conditions in the prior art.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention.
The invention provides a single-particle transient current source modeling method aiming at different dip angles, which comprehensively considers the incident position, the incident angle and the shape size of an active area, and can more reasonably and accurately research the single-particle effect of a circuit and predict the anti-irradiation capability of the circuit.
As shown in fig. 1, the method for modeling a single-particle transient current source for incidence at different tilt angles specifically includes the following steps:
step one, selecting a device to be researched and obtaining a layout of the device;
step two, determining a linear energy transmission value LET (l) of ions in the material according to the types and energies of the implanted ions, and simultaneously setting the incidence position (x) of the ions to be evaluated on the layout 0 ,y 0 0) and angle of incidence (cos x, cos y, cos z);
step three, extracting the sensitive node outline in the layout, and recording the coordinate (x) of the sensitive node outline on the layout s ,y s 0) and (x) e ,y e ,0);
Taking a rectangular active area as an example, the recording coordinates are two diagonal vertex coordinates (x) s ,y s 0) and (x) e ,y e 0), for a polygon, splitting the polygon into a plurality of rectangular splicing forms and respectively recording diagonal vertex coordinates;
in the step, the software tool adopted for coordinate extraction can adopt Calibre to realize automatic coordinate extraction, and certainly, the software tool can not be adopted for extraction, and other modes can also be adopted;
step four, obtaining single-particle transient current under different incidence conditions of the inclination angle according to the information obtained in the step two and the step three, wherein the single-particle transient current is an injected current source;
as shown in fig. 2, the number of carriers n (t) diffusing to the sensitive node at time t can be expressed in the form of a multiple integral:
wherein dx represents the discrete step size in the x-direction, dy represents the discrete step size in the y-direction, and dl represents the discrete step size in the incident track direction; LET (l) is the linear energy transmission value obtained in the second step; q a The average energy required to generate an excess of carriers, 3.6eV; d α Is the equivalent diffusivity of a carrier, for NMOS carriers are electrons, D α The value is 3cm 2 S, holes for PMOS carriers, D α Value of 18cm 2 /s;d ijk Is the distance from the infinitesimal of the ion track to the infinitesimal of the sensitive electrical port; d z The equivalent depth for collecting charges is generally set to 0.15 μm; τ represents the lifetime of the carrier, typically around 1 ns;
dx, dy, dl are quantities characterizing the degree of dispersion, it is clearly shown in fig. 2 that the triple integral performs discretization on the active area and the incident particle track respectively, i, j, k are cyclic parameters, and M, N, G are quantities related to discretization; m represents the total discrete step size in the x direction, N represents the total discrete step size in the y direction, and G represents the total discrete step size in the incident track direction;
to balance the calculation accuracy and calculation speed, dx, dy, and dl may be set to 0.1 μ M, and M, N, and G may be calculated by the following equations:
M×dx=x e -x s
N×dy=y e -y s
G×dl=S range
wherein S is range Indicating incident ions in siliconA range in the material;
according to the average speed of the current carrier passing through the sensitive node electric port, the single-event transient current I (t) can be expressed as:
I(t)=n(t)×q×V (3)
wherein q is the amount of charge of one electron, and is 1.60218X 10 -19 C; for an NMOS (N-channel MOS transistor), V is the average speed of carrier migration, about 11000m/s; for a PMOS (P-channel MOS transistor), V is the average speed of carrier migration, about 5000m/s;
step five, writing a single-event-effect sub-circuit model by adopting a Verilog-A language, calling the single-event transient current obtained by calculation in the step four according to a lookup table mode, executing circuit-level simulation calculation to obtain a voltage waveform of a sensitive node, and analyzing a radiation effect result; in the step, the voltage change of the sensitive node is obtained, and after the equivalent current of the single event effect is injected, the voltage of the node can change, namely the single event effect.
The simulation tool adopted in the step is SPICE, and the single-event transient effect circuit level simulation method specifically comprises the following steps: describing a device to be researched by using a circuit-level netlist, wherein a transistor adopts a BSIM model and comprises a source port, a drain port, a grid port and a substrate port; inserting a Verilog-A module into the drain of the sensitive node, reading the current simulation time t by the Verilog-A module, acquiring a current value I (t) from the single-particle transient current constructed in the step four through a built-in search function, and injecting the transient current into the drain of the transistor, wherein the bias voltage of the drain of the transistor changes along with time and is recorded as V (t); the module can continuously search the single-particle transient current at the next simulated time t 'to obtain the current value I (t'), and the drain voltage V (t ') at the current time is obtained through calculation according to the V (t) at the previous time and the I (t') at the current time; and the complete waveform curve of the drain bias voltage influenced by the single event effect can be obtained after the iteration is carried out until the simulation is finished.
The research object selected by the embodiment of the invention is a commercial 65nm non-reinforced static random access memory (6T-SRAM) with the working voltage of 1.2V. The SRAM single event effect sensitive area is the drain electrode of the NMOS tube and the PMOS tube which are symmetrical, the test pattern is filled, and the layout structure and the corresponding sensitive node distribution are shown in figure 3. The specific application process when the single event effect analysis of the SRAM unit is carried out is as follows:
selecting a commercial 65nm non-reinforced static random access memory as a device to be researched, and acquiring a layout of the device;
setting incident ion information, and extracting a sensitive node outline in the layout; the LET value of the incident ions was set to 30 MeV-cm 2 The incident layout coordinates are (2856 μm,3454 μm), the incident ion position is used as the center, the sensitive nodes within the coverage range of 2 μm in radius are required to be added with current source items, and the outline of the sensitive nodes extracted by the method is shown in table 1 (x is x in the table) s ,y s ) And (x) e ,y e ) Two vertices of a rectangle. The incidence inclination angle takes the two cases of vertical incidence and inclination incidence into consideration. For normal incidence, its azimuthal angle is (0, -1); for oblique incidence, an inclination of 60 ° in the well direction and an azimuth angle of (0, -0.866, -0.5) are set.
TABLE 1 sensitive node coordinate extraction
And step three, calculating the single-event transient current of each node according to the formulas (1), (2) and (3), storing, modifying a network table of a circuit structure, adding a sub-circuit model at the node influenced by irradiation, and connecting a current source to the Drain (Drain) and substrate (Body) ports in a bridging manner to inject current. For the NMOS tube, the current direction flows from the drain electrode to the substrate; for the PMOS tube, the current direction flows from the substrate to the drain electrode;
step four, performing simulation, monitoring the node voltage change influenced by irradiation, and if the logic state of the SRAM unit is overturned, indicating that a single event upset effect is generated, as shown by a circular curve in FIG. 4; if the logic state of the SRAM unit is turned over and then turned back, the single-event transient state is generated, as shown by a rectangular curve in FIG. 4; if the logic state of the SRAM cell is not affected, it indicates that the single event effect does not occur, as shown by the triangular curve in FIG. 4.
According to the steps, the layout is scanned and analyzed, and a single-event upset hotspot graph can be obtained, as shown in fig. 5 and 6. Fig. 5 shows a single-particle upset hot spot statistical diagram caused by vertical incidence, and fig. 6 shows a single-particle upset hot spot diagram under the condition of oblique incidence. It can be seen from the figure that under the condition of oblique incidence, the single-event upset section is increased, and the multi-bit upset caused by charge sharing is also obviously increased.
Heavy ion tests are carried out on a ground accelerator for the device, single-particle upset sections under a plurality of LET value points are obtained under the condition of vertical incidence, and Weibull fitting is carried out, as shown in FIG. 7. The irradiation test is also carried out under the condition of incidence at an inclination angle of 60 degrees along the trap direction, and as can be seen from fig. 7, the test result is obviously higher than the result of fitting by adopting an equivalent LET value method, and the result calculated by adopting the method is well matched with the test result, so that the model can reflect the transient characteristics of single particles under incidence at the inclination angle.
Claims (6)
1. A single-particle transient current source modeling method aiming at incidence of different dip angles is characterized by comprising the following steps:
step one, selecting a device to be researched and obtaining a layout of the device;
step two, acquiring a linear energy transmission value LET (l) of ions in the material according to the types and the energies of the implanted ions, and acquiring the incidence position (x) of the ions to be evaluated on the layout at the same time 0 ,y 0 0) and azimuth angle of incidence (cosx, cosy, cosz);
step three, extracting the sensitive node outline in the layout, and recording the coordinate (x) of the sensitive node outline on the layout s ,y s 0) and (x) e ,y e ,0);
Step four, acquiring injected single-particle transient current according to the information acquired in the step two and the step three;
the number of carriers n (t) that diffuse to the sensitive node at time t is expressed in the form of a double integral:
wherein dx represents the discrete step size in the x-direction, dy represents the discrete step size in the y-direction, and dl represents the discrete step size in the incident track direction; q a The average energy required to generate an excess of carriers; d α Is the equivalent diffusivity of carriers; d ijk Is the distance from the infinitesimal of the ion track to the infinitesimal of the sensitive electrical port; d z Is the equivalent depth to collect charge; τ represents the lifetime of the carriers; i. j and k are circulation parameters; m represents the total discrete step size in the x direction, N represents the total discrete step size in the y direction, and G represents the total discrete step size in the incident track direction;
depending on the average speed of the carriers through the sensitive node electrical port, the single-event transient current I (t) can be expressed as:
I(t)=n(t)×q×V (3)
wherein q is the amount of charge carried by one electron; v is the average speed of carrier migration;
and step five, adding a sub-circuit model representing the single event effect in the circuit netlist, calling the single event transient current obtained by calculation in the step four, executing circuit-level simulation calculation to obtain the voltage waveform of the sensitive node, and analyzing a radiation effect result.
2. The single-event transient current source modeling method for different incidence angles according to claim 1, characterized in that: and fifthly, writing a sub-circuit model of the single event effect by adopting a Verilog-A language.
3. The single-event transient current source modeling method for different incidence angles according to claim 2, characterized in that: in the fifth step, a simulation tool specifically adopted for obtaining the voltage waveform of the sensitive node by executing circuit-level simulation calculation is SPICE.
4. The method for modeling a single-event transient current source for different tilt angles incidence according to claim 1, 2 or 3, wherein: in the third step, the software tool used for coordinate extraction is Calibre.
5. The method according to claim 4, wherein the method comprises the following steps: in step four, N-channel MOS transistor, the carrier is electron, D α The value is 3cm 2 (s) for a P-channel MOS transistor, the carriers are holes, D α Value of 18cm 2 /s。
6. The method according to claim 5, wherein the method comprises the following steps: in step four, Q a Is 3.6eV; d z The value for the equivalent depth of charge collection is 0.15 μm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110460172.7A CN113158602B (en) | 2021-04-27 | 2021-04-27 | Single-particle transient current source modeling method aiming at incidence of different inclination angles |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110460172.7A CN113158602B (en) | 2021-04-27 | 2021-04-27 | Single-particle transient current source modeling method aiming at incidence of different inclination angles |
Publications (2)
Publication Number | Publication Date |
---|---|
CN113158602A CN113158602A (en) | 2021-07-23 |
CN113158602B true CN113158602B (en) | 2023-01-17 |
Family
ID=76871512
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202110460172.7A Active CN113158602B (en) | 2021-04-27 | 2021-04-27 | Single-particle transient current source modeling method aiming at incidence of different inclination angles |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN113158602B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114460440B (en) * | 2022-01-26 | 2023-09-12 | 中国科学院近代物理研究所 | Integrated circuit single event effect positioning system |
CN114611456B (en) * | 2022-04-20 | 2024-08-16 | 西北核技术研究所 | Method for simulating single-particle transient response of nano device under particle incidence |
CN114818566B (en) * | 2022-05-26 | 2024-06-11 | 西北核技术研究所 | Modeling method for well potential modulation caused by single event effect |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105740555A (en) * | 2016-02-02 | 2016-07-06 | 中国科学院上海微系统与信息技术研究所 | Modeling method of single-event transient pulse current source |
CN108363893A (en) * | 2018-05-04 | 2018-08-03 | 西安电子科技大学 | A kind of single-particle pulse current source modeling method of complex condition |
CN108508351A (en) * | 2018-03-30 | 2018-09-07 | 西北核技术研究所 | A kind of single-particle direct fault location emulation mode based on double-two fingers number current source |
CN110909517A (en) * | 2019-11-01 | 2020-03-24 | 西北核技术研究院 | Modeling method considering node voltage dynamic change in single event effect circuit simulation |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080077376A1 (en) * | 2006-09-25 | 2008-03-27 | Iroc Technologies | Apparatus and method for the determination of SEU and SET disruptions in a circuit caused by ionizing particle strikes |
-
2021
- 2021-04-27 CN CN202110460172.7A patent/CN113158602B/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105740555A (en) * | 2016-02-02 | 2016-07-06 | 中国科学院上海微系统与信息技术研究所 | Modeling method of single-event transient pulse current source |
CN108508351A (en) * | 2018-03-30 | 2018-09-07 | 西北核技术研究所 | A kind of single-particle direct fault location emulation mode based on double-two fingers number current source |
CN108363893A (en) * | 2018-05-04 | 2018-08-03 | 西安电子科技大学 | A kind of single-particle pulse current source modeling method of complex condition |
CN110909517A (en) * | 2019-11-01 | 2020-03-24 | 西北核技术研究院 | Modeling method considering node voltage dynamic change in single event effect circuit simulation |
Non-Patent Citations (1)
Title |
---|
基于双双指数电流源法的CMOS电路单粒子效应电路级仿真;王坦等;《现代应用物理》;20191226(第04期);全文 * |
Also Published As
Publication number | Publication date |
---|---|
CN113158602A (en) | 2021-07-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN113158602B (en) | Single-particle transient current source modeling method aiming at incidence of different inclination angles | |
Palau et al. | Device simulation study of the SEU sensitivity of SRAMs to internal ion tracks generated by nuclear reactions | |
Naseer et al. | Critical charge characterization for soft error rate modeling in 90nm SRAM | |
Uznanski et al. | Single event upset and multiple cell upset modeling in commercial bulk 65-nm CMOS SRAMs and flip-flops | |
CN106503392B (en) | A kind of more transient state soft-error sensitivity appraisal procedures of single-particle for the combinational logic circuit considering laying out pattern information | |
CN109918723A (en) | A kind of single-particle fault filling method based on particle incidence randomness | |
CN108363893B (en) | Single-particle pulse current source modeling method under complex condition | |
CN111737935B (en) | Power device failure rate assessment method, computer equipment and storage medium | |
CN110991072B (en) | SRAM single-particle transient effect simulation analysis method and system | |
Song et al. | Experimental and analytical investigation of single event, multiple bit upsets in poly-silicon load, 64 K* 1 NMOS SRAMs | |
Srinivasan et al. | Parameter-free, predictive modeling of single event upsets due to protons, neutrons, and pions in terrestrial cosmic rays | |
Castellani-Coulié et al. | Various SEU conditions in SRAM studied by 3-D device simulation | |
Thery et al. | TIARA: Industrial platform for Monte Carlo single-event simulations in planar bulk, FD-SOI, and FinFET | |
Fulkerson et al. | Prediction of SOI single-event effects using a simple physics-based SPICE model | |
Leveugle et al. | Laser-induced fault effects in security-dedicated circuits | |
CN109446590B (en) | Method for acquiring single-particle upset critical charge of nano static random access memory | |
CN106649920A (en) | IBIS-based integrated circuit total dose effect modeling method | |
Shin | Modeling of alpha-particle-induced soft error rate in DRAM | |
Kauppila | Layout-aware modeling and analysis methodologies for transient radiation effects on integrated circuit electronics | |
Montes et al. | Single event upset mechanisms for low-energy-deposition events in SiGe HBTs | |
CN104731995A (en) | Semiconductor circuit based single-particle resistance effect verification method and system | |
Fulkerson et al. | A charge-control SPICE engineering model for the parasitic bipolar transistor action in SOI CMOS single-event upsets | |
Hazucha et al. | Optimized test circuits for SER characterization of a manufacturing process | |
Do et al. | Layout-oriented simulation of non-destructive single event effects in CMOS IC blocks | |
Franks | Design and characterisation of High-Voltage CMOS (HV-CMOS) detectors for particle physics experiments |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |