CN113135671A - 调色玻璃及其制备方法 - Google Patents
调色玻璃及其制备方法 Download PDFInfo
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- CN113135671A CN113135671A CN202010066010.0A CN202010066010A CN113135671A CN 113135671 A CN113135671 A CN 113135671A CN 202010066010 A CN202010066010 A CN 202010066010A CN 113135671 A CN113135671 A CN 113135671A
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- 239000011521 glass Substances 0.000 title claims abstract description 67
- 238000002360 preparation method Methods 0.000 title abstract description 10
- 239000010410 layer Substances 0.000 claims abstract description 368
- 239000010416 ion conductor Substances 0.000 claims abstract description 60
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- 239000000463 material Substances 0.000 claims description 31
- 239000010955 niobium Substances 0.000 claims description 13
- 239000010936 titanium Substances 0.000 claims description 13
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 11
- 229910052758 niobium Inorganic materials 0.000 claims description 11
- 229910052715 tantalum Inorganic materials 0.000 claims description 11
- 229910052719 titanium Inorganic materials 0.000 claims description 11
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 9
- JAONJTDQXUSBGG-UHFFFAOYSA-N dialuminum;dizinc;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Al+3].[Zn+2].[Zn+2] JAONJTDQXUSBGG-UHFFFAOYSA-N 0.000 claims description 9
- 239000011734 sodium Substances 0.000 claims description 9
- 239000011777 magnesium Substances 0.000 claims description 8
- 239000011572 manganese Substances 0.000 claims description 8
- 229910052708 sodium Inorganic materials 0.000 claims description 8
- 229910052741 iridium Inorganic materials 0.000 claims description 7
- 229910052744 lithium Inorganic materials 0.000 claims description 7
- 229910052749 magnesium Inorganic materials 0.000 claims description 7
- 229910052748 manganese Inorganic materials 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 229910052750 molybdenum Inorganic materials 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- 229910052700 potassium Inorganic materials 0.000 claims description 7
- 229910052721 tungsten Inorganic materials 0.000 claims description 7
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- 229910052733 gallium Inorganic materials 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 229910052742 iron Inorganic materials 0.000 claims description 6
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 6
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 6
- 229910052720 vanadium Inorganic materials 0.000 claims description 6
- 239000011787 zinc oxide Substances 0.000 claims description 6
- 150000004767 nitrides Chemical class 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
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- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 3
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 239000011591 potassium Substances 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 239000011135 tin Substances 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 239000011701 zinc Substances 0.000 claims description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 230000033228 biological regulation Effects 0.000 abstract description 8
- 239000003086 colorant Substances 0.000 abstract description 6
- 239000013077 target material Substances 0.000 description 28
- 238000004544 sputter deposition Methods 0.000 description 15
- 238000000151 deposition Methods 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 7
- 230000001105 regulatory effect Effects 0.000 description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
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- 238000001228 spectrum Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- GDMRBHLKSYSMLJ-UHFFFAOYSA-N [F].O=[Si] Chemical compound [F].O=[Si] GDMRBHLKSYSMLJ-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
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- 238000010586 diagram Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
Abstract
本实施例公开的一种调色玻璃及制备方法。调色玻璃例如包括基材玻璃层和在基材玻璃层一侧依次形成的第一调色功能膜层、第二调色功能膜层、第三调色功能膜层、第四导电层以及顶层保护层;其中,第一调色功能膜层依次包括第一导电层、第一辅助调色层、第一离子导体层、第一主调色层,第一导电层与基材玻璃层相邻;第二调色功能膜层依次包括第二导电层、第二辅助调色层、第二离子导体层、第二主调色层,第二导电层与第一主调色层相邻;第三调色功能膜层依次包括第三导电层、第三辅助调色层、第三离子导体层、第三主调色层,第三导电层与第二主调色层相邻,第三主调色层与第四导电层相邻。本发明实施例可增大玻璃的颜色调控范围,实现更多颜色的调控。
Description
技术领域
本发明涉及一种玻璃技术领域,尤其是一种调色玻璃及其制备方法。
背景技术
由于其低碳、节能、颜色可调等特性,调色玻璃已逐渐应用在建筑等诸多行业。调色玻璃可在外加电场作用下,材料的光学性能发生连续可逆变化,使得玻璃的颜色和透明度发生可逆变化,达到了可实现多个颜色的调控和变化。但是目前的调色玻璃的颜色调控范围较单一,难以满足行业发展的需求。
发明内容
针对上述问题,本发明实施例提供了一种调色玻璃及其制备方法,可以增大玻璃的颜色调控范围,实现更多颜色的调控。
具体地,本发明实施例提供一种调色玻璃,包括基材玻璃层和在所述基材玻璃层一侧依次形成的第一调色功能膜层、第二调色功能膜层、第三调色功能膜层、第四导电层以及顶层保护层;其中,所述第一调色功能膜层依次包括第一导电层、第一辅助调色层、第一离子导体层、第一主调色层,所述第一导电层与所述基材玻璃层相邻;所述第二调色功能膜层依次包括第二导电层、第二辅助调色层、第二离子导体层、第二主调色层,所述第二导电层与所述第一主调色层相邻;所述第三调色功能膜层依次包括第三导电层、第三辅助调色层、第三离子导体层、第三主调色层,所述第三导电层与所述第二主调色层相邻,所述第三主调色层与所述第四导电层相邻。
在本发明的一个实施例中,所述第一主调色层、所述第二主调色层、所述第三主调色层的材料分别选自于钨、钼、铌、钛、钽中至少两种组合的氧化物;所述第一主调色层、所述第二主调色层、所述第三主调色层的厚度范围分别为30nm-500nm。
在本发明的一个实施例中,所述第一主调色层、所述第二主调色层、所述第三主调色层中至少两者的材料相同;所述第一主调色层、所述第二主调色层中至少两者的厚度相等。
在本发明的一个实施例中,所述第一辅助调色层、所述第二辅助调色层、所述第三辅助调色层的材料分别选自于镍、钒、钴、铱、铁、锰中至少两种元素组合的氧化物;所述第一辅助调色层、所述第二辅助调色层、所述第三辅助调色层的厚度范围分别为20nm-500nm。
在本发明的一个实施例中,所述第一辅助调色层、所述第二辅助调色层、所述第三辅助调色层的材料相同;所述第一辅助调色层、所述第二辅助调色层、所述第三辅助调色层的厚度相等。
在本发明的一个实施例中,所述第一导电层、所述第二导电层、所述第三导电层、所述第四导电层的材料分别选自于氟硅氧化物、铟锡氧化物、铟镓锌氧化物、铝锌氧化物、镓锌氧化物、银中的一种或至少两种的组合。
在本发明的一个实施例中,所述第一导电层、所述第二导电层、所述第三导电层的厚度范围分别为1-1100nm;所述第四导电层的厚度范围为10-1000nm。
在本发明的一个实施例中,所述第一离子导体层、所述第二离子导体层、所述第三离子导体层的材料分别选自于氢、锂、钠、钾、镁中的一种或至少两种的组合;所述第一离子导体层、所述第二离子导体层、所述第三离子导体层的厚度范围分别为10nm-100nm。
在本发明的一个实施例中,所述顶层保护层的材料选自于硅、钛、锌、锡、铌、钽之一的氧化物或氮化物或氮氧化物。
另一方面,本发明实施例提供的一种调色玻璃制备方法,包括:提供基材玻璃层;在所述基材玻璃层上形成第一导电层;在所述第一导电层上形成第一辅助调色层;在所述第一辅助调色层上形成第一离子导体层;在所述第一离子导体层上形成第一主调色层;在所述第一主调色层上形成第二导电层;在所述第二导电层上形成第二辅助调色层;在所述第二辅助调色层上形成第二离子导体层;在所述第二离子导体层上形成第二主调色层;在所述第二主调色层上形成第三导电层;在所述第三导电层上形成第三辅助调色层;在所述第三辅助调色层上形成第三离子导体层;在所述第三离子导体层上形成第三主调色层;在所述第三主调色层上形成第四导电层;以及在所述第四导电层上形成顶层保护层。
上述一个或多个技术方案可以具有如下优点或有益效果:本发明实施例提供的调色玻璃采用分别独立调控且相同的三个调色功能膜层(辅助调色层+主调色层)相结合的特定膜层结构,增大了调色玻璃的颜色调控范围,实现更多颜色的调控,调色玻璃的颜色坐标范围更广泛。本发明实施例提供的调色玻璃制备方法简化了生产工艺,降低了生产成本,提高了生产效率。
附图说明
为了更清楚地说明本发明实施例的技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。
图1为本发明实施例提供的一种调色玻璃的结构示意图。
图2为本发明实施例提供的一种调色玻璃制备方法的流程示意图。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明护的范围。
如图1所示,本发明一实施例提供了一种调色玻璃600。调色玻璃600例如包括基材玻璃层10和依次形成于基材玻璃层10同一侧的第一导电层11、第一辅助调色层12、第一离子导体层13、第一主调色层14、第二导电层21、第二辅助调色层22、第二离子导体层23、第二主调色层24、第三导电层31、第三辅助调色层32、第三离子导体层33、第三主调色层34、第四导电层50以及顶层保护层60。其中,第一导电层11、第一辅助调色层12、第一离子导体层13、第一主调色层14形成第一调色功能膜层;第二导电层21、第二辅助调色层22、第二离子导体层23、第二主调色层24形成第二调色功能膜层;第三导电层31、第三辅助调色层32、第三离子导体层33、第三主调色层34形成第三调色功能膜层。第一调色功能膜层、第二调色功能膜层以及第三调色功能膜层可分别独立调控以增大颜色调控范围,且提升了颜色的均匀性和稳定性。
本发明实施例提供的调色玻璃采用分别独立调控且相同的三个调色功能膜层(辅助调色层+主调色层)相结合的特定膜层结构,可增大玻璃的颜色调控范围,实现更多颜色的调控。
具体地,基材玻璃层10可例如为浮法玻璃、超白玻璃、高铝玻璃、中铝玻璃材等。基材玻璃层10的厚度范围可例如为0.05-25mm。
第一导电层11、第二导电层21、第三导电层31和第四导电层50的材料分别为无机调色材料。无机调色材料选自于氟硅氧化物(FTO)、铟锡氧化物(ITO)、铟镓锌氧化物(IGZO)、铝锌氧化物(AZO)、镓锌氧化物(GZO)、银(Ag)中的一种或至少两种的组合。此处的至少两种的组合可例如为两者组合比如AZO和GZO,或其中三个组合比如FTO、ITO、GZO,甚至更多种的组合等。优选地,第一导电层11、第二导电层21、第三导电层31、第四导电层50中至少两种的材料相同。第一导电层11、第二导电层21、第三导电层31的厚度范围分别为1-1100nm。第四导电层50的厚度范围为10-1000nm。优选地,第一导电层11、第二导电层21的厚度、第四导电层50的厚度范围分别为10-300nm。进一步优选地,第一导电层11、第二导电层21的厚度、第三导电层31、第四导电层50的厚度相等。
第一辅助调色层12、第二辅助调色层22、第三辅助调色层32为光谱辅助调节功能层。第一辅助调色层12、第二辅助调色层22、第三辅助调色层32的材料分别选自于镍(Ni)、钒(V)、钴(Co)、铱(Ir)、铁(Fe)、锰(Mn)中至少两种组合的氧化物。具体地,第一辅助调色层12、第二辅助调色层22、第三辅助调色层32的材料分别可例如为Ni、V、Co、Ir、Fe、Mn中两种的组合的氧化物比如NiVOx、NiCoOx、NiIrOx、NiFeOx,或者三种的组合的氧化物,甚至更多种的组合的氧化物。优选地,第一辅助调色层12、第二辅助调色层22、第三辅助调色层32的材料相同。第一辅助调色层12、第二辅助调色层22、第三辅助调色层32的厚度范围分别为20nm-500nm。优选地,第一辅助调色层12、第二辅助调色层22、第三辅助调色层32的厚度相等。
第一离子导体层13、第二离子导体层23、第三离子导体层33的材料分别选自于氢(H)、锂(Li)、钠(Na)、钾(K)、镁(Mg)中的一种或者至少两种的组合,例如包括其中的两者组合比如Li、Na,三者组合比如Na、K、Mg,甚至更多的组合等。优选地,第一离子导体层13、第二离子导体层23、第三离子导体层33的材料相同。第一离子导体层13、第二离子导体层23、第三离子导体层33的厚度范围分别为10nm-100nm。优选地,第一离子导体层13、第二离子导体层23、第三离子导体层33的厚度相等。
第一主调色层14、第二主调色层24、第三主调色层34为光谱主调节功能层。第一主调色层12、第二主调色层24、第三主调色层34的材料分别为无机调色材料。无机调色材料可例如选自于钨(W)、钼(Mo)、铌(Nb)、钛(Ti)、钽(Ta)中至少两种元素组合的氧化物,例如W、Mo、Nb、Ti、Ta中任意两者组合的氧化物比如WMoOx、WNbOx,或者三者组合的氧化物WMoTiOx、WNbTaOx,甚至更多种的组合的氧化物。优选地,第一主调色层12、第二主调色层24、第三主调色层34的材料相同。第一主调色层12、第二主调色层24、第三主调色层34的厚度范围分别为30-500nm。优选地,第一主调色层12、第二主调色层24、第三主调色层34的厚度相等。
顶层保护层60的材料选自于硅(Si)、钛(Ti)、锌(Zn)、锡(Sn)、铌(Nb)、钽(Ta)中之一的氧化物或氮化物或氮氧化物。例如顶层保护层60的材料为Si3N4,其具有很强的抗腐蚀、抗机械划伤、抗高温氧化性能,可以对玻璃起到很好的保护作用。顶层保护层的厚度为0.2-100nm。
此外,本发明实施例还提供了一种调色玻璃制备方法,例如用于制备前述的调色玻璃600。如图2所示,调色玻璃制备方法例如包括步骤:
S11:提供基材玻璃层。
S12:在基材玻璃层上形成第一导电层。具体地,将基材玻璃层升温至预设温度,所述预设温度的范围例如280-300℃,以FTO、ITO、IGZO、AZO、GZO、Ag中的一种或至少两种的组合为靶材材料,在预设真空溅射气压下沉积得到第一导电层。预设真空溅射气压例如为1.0E-3~9.0E-3mbar。
S13:在第一导电层上形成第一辅助调色层。具体地,以Ni、V、Co、Ir、Fe、Mn中至少两种组合的氧化物为靶材材料,将靶材材料置于预设真空溅射气压条件下沉积得到第一辅助调色层。靶材材料中的氧化物的化学计量比,可以是足氧也可以是不足氧的化学计量比。
S14:在第一辅助调色层上形成第一离子导体层。以H、Li、Na、K、Mg元素的一种或者至少两种的组合为靶材材料,并将靶材材料置于预设真空溅射气压条件下沉积得到第一离子导体层。
S15:在第一离子导体层上形成第一主调色层。以W、Mo、Nb、Ti、Ta中至少两种组合的氧化物为靶材材料。将靶材材料置于预设真空溅射气压下沉积,得到第一主调色层。
S16:在第一主调色层上形成第二导电层。具体地,以FTO、ITO、IGZO、AZO、GZO、Ag中的一种或至少两种的组合为靶材材料,将靶材材料置于预设真空溅射气压条件下沉积得到第二导电层。
S17:在第二导电层上形成第二辅助调色层。具体地,以Ni、V、Co、Ir、Fe、Mn中至少两种组合的氧化物为靶材材料,将靶材材料置于预设真空溅射气压条件下沉积得到第二辅助调色层。
S18:在第二辅助调色层上形成第二离子导体层。以H、Li、Na、K、Mg元素的一种或者至少两种的组合为靶材材料,并将靶材材料置于预设真空溅射气压条件下沉积得到第二离子导体层。
S19:在第二离子导体层上形成第二主调色层。以W、Mo、Nb、Ti、Ta中至少两种组合的氧化物为靶材材料。将靶材材料置于预设真空溅射气压下沉积,得到第二主调色层。
S20:在第二主调色层上形成第三导电层。以FTO、ITO、IGZO、AZO、GZO、Ag中的一种或至少两种的组合为靶材材料,将靶材材料置于预设真空溅射气压下沉积得到第三导电层。
S21:在第三导电层上形成第三辅助调色层。具体地,以Ni、V、Co、Ir、Fe、Mn中至少两种组合的氧化物为靶材材料,将靶材材料置于预设真空溅射气压条件下沉积得到第三辅助调色层。
S22:在第三辅助调色层上形成第三离子导体层。以H、Li、Na、K、Mg元素的一种或者至少两种的组合为靶材材料,并将靶材材料置于预设真空溅射气压条件下沉积得到第三离子导体层。
S23:在第三离子导体层上形成第三主调色层。以W、Mo、Nb、Ti、Ta中至少两种组合的氧化物为靶材材料。将靶材材料置于预设真空溅射气压下沉积,得到第三主调色层。
S24:在第三主调色层上形成第四导电层。以FTO、ITO、IGZO、AZO、GZO、Ag中的一种或至少两种的组合为靶材材料,将靶材材料置于预设真空溅射气压下沉积得到第三导电层。
S25:在第四导电层上形成顶层保护层。以Si、Ti、Zn、Sn、Nb、Ta之一的氧化物或氮化物或氮氧化物为靶材材料,并将靶材材料置于预设真空溅射气压下沉积得到顶层保护层。
此外,本发明实施例提供的调色玻璃制备方法还可以包括热处理、预真空过渡并接电极等,以完成调色玻璃的制备,其可采用现有技术中的方法完成,此处不再赘述。
综上所述,本发明实施例提供的调色玻璃采用分别独立调控且相同的三个调色功能膜层(辅助调色层+主调色层)相结合的特定膜层结构,增大了电致调色玻璃的颜色调控范围,实现更多颜色的调控,其颜色坐标区域更广泛,而且颜色更为稳定,大面积颜色均匀性更好,一次激励调色后颜色保持的时间更长,其可广泛应用于各种场合。另外,本发明实施例提供的电致调色玻璃制备方法采用磁控反应溅射沉积法形成各膜层,避免了生产过程中多次进出镀膜设备,简化了生产工艺,提高生产效率。
此外,可以理解的是,前述各个实施例仅为本发明的示例性说明,在技术特征不冲突、结构不矛盾、不违背本发明的发明目的前提下,各个实施例的技术方案可以任意组合、搭配使用。
最后应说明的是:以上实施例仅用以说明本发明的技术方案,而非对其限制;尽管参照前述实施例对本发明进行了详细的说明,本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本发明各实施例技术方案的精神和范围。
Claims (10)
1.一种调色玻璃,其特征在于,包括基材玻璃层和在所述基材玻璃层一侧依次形成的第一调色功能膜层、第二调色功能膜层、第三调色功能膜层、第四导电层以及顶层保护层;其中,所述第一调色功能膜层依次包括第一导电层、第一辅助调色层、第一离子导体层、第一主调色层,所述第一导电层与所述基材玻璃层相邻;所述第二调色功能膜层依次包括第二导电层、第二辅助调色层、第二离子导体层、第二主调色层,所述第二导电层与所述第一主调色层相邻;所述第三调色功能膜层依次包括第三导电层、第三辅助调色层、第三离子导体层、第三主调色层,所述第三导电层与所述第二主调色层相邻,所述第三主调色层与所述第四导电层相邻。
2.根据权利要求1所述的调色玻璃,其特征在于,所述第一主调色层、所述第二主调色层、所述第三主调色层的材料分别选自于钨、钼、铌、钛、钽中至少两种组合的氧化物;所述第一主调色层、所述第二主调色层、所述第三主调色层的厚度范围分别为30nm-500nm。
3.根据权利要求2所述的调色玻璃,其特征在于,所述第一主调色层、所述第二主调色层、所述第三主调色层中至少两者的材料相同;所述第一主调色层、所述第二主调色层中至少两者的厚度相等。
4.根据权利要求1所述的调色玻璃,其特征在于,所述第一辅助调色层、所述第二辅助调色层、所述第三辅助调色层的材料分别选自于镍、钒、钴、铱、铁、锰中至少两种元素组合的氧化物;所述第一辅助调色层、所述第二辅助调色层、所述第三辅助调色层的厚度范围分别为20nm-500nm。
5.根据权利要求4所述的调色玻璃,其特征在于,所述第一辅助调色层、所述第二辅助调色层、所述第三辅助调色层的材料相同;所述第一辅助调色层、所述第二辅助调色层、所述第三辅助调色层的厚度相等。
6.根据权利要求1所述的调色玻璃,其特征在于,所述第一导电层、所述第二导电层、所述第三导电层、所述第四导电层的材料分别选自于氟硅氧化物、铟锡氧化物、铟镓锌氧化物、铝锌氧化物、镓锌氧化物、银中的一种或至少两种的组合。
7.根据权利要求1所述的调色玻璃,其特征在于,所述第一导电层、所述第二导电层、所述第三导电层的厚度范围分别为1-1100nm;所述第四导电层的厚度范围为10-1000nm。
8.根据权利要求1所述的调色玻璃,其特征在于,所述第一离子导体层、所述第二离子导体层、所述第三离子导体层的材料分别选自于氢、锂、钠、钾、镁中的一种或至少两种的组合;所述第一离子导体层、所述第二离子导体层、所述第三离子导体层的厚度范围分别为10nm-100nm。
9.根据权利要求1所述的调色玻璃,其特征在于,所述顶层保护层的材料选自于硅、钛、锌、锡、铌、钽之一的氧化物或氮化物或氮氧化物。
10.一种调色玻璃制备方法,其特征在于,包括:
提供基材玻璃层;
在所述基材玻璃层上形成第一导电层;
在所述第一导电层上形成第一辅助调色层;
在所述第一辅助调色层上形成第一离子导体层;
在所述第一离子导体层上形成第一主调色层;
在所述第一主调色层上形成第二导电层;
在所述第二导电层上形成第二辅助调色层;
在所述第二辅助调色层上形成第二离子导体层;
在所述第二离子导体层上形成第二主调色层;
在所述第二主调色层上形成第三导电层;
在所述第三导电层上形成第三辅助调色层;
在所述第三辅助调色层上形成第三离子导体层;
在所述第三离子导体层上形成第三主调色层;
在所述第三主调色层上形成第四导电层;以及
在所述第四导电层上形成顶层保护层。
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