CN113131312A - Sum frequency generator of deep ultraviolet laser - Google Patents
Sum frequency generator of deep ultraviolet laser Download PDFInfo
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- CN113131312A CN113131312A CN202010045103.5A CN202010045103A CN113131312A CN 113131312 A CN113131312 A CN 113131312A CN 202010045103 A CN202010045103 A CN 202010045103A CN 113131312 A CN113131312 A CN 113131312A
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- frequency
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- doubling
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0092—Nonlinear frequency conversion, e.g. second harmonic generation [SHG] or sum- or difference-frequency generation outside the laser cavity
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
- H01S3/109—Frequency multiplication, e.g. harmonic generation
Abstract
The embodiment of the invention provides a sum frequency generator of a deep ultraviolet laser, which comprises: an electromagnetic source generating a fundamental field emitted along a propagation path; the frequency doubling device is used for enabling the passing basic field to generate a frequency doubling field, the first sum frequency device is used for enabling the passing basic field and the frequency doubling field to sum to generate a frequency tripling field, the second sum frequency device is used for enabling the passing frequency doubling field and the frequency tripling field to sum to generate a frequency quintuple field, and the frequency doubling device and the first sum frequency device are formed by the same crystal body. The sum frequency generator system of the embodiment of the invention ensures the frequency quintupling and sum frequency effect.
Description
Technical Field
The invention relates to the technical field of optics, in particular to a sum frequency generator of a deep ultraviolet laser.
Background
Nowadays, in the field of laser technology, 213nm deep ultraviolet solid laser is used for on-line monitoring equipment of wafer defects, and is generated by multiple frequency doubling and sum frequency of 1064nm wavelength laser. The sum frequency scheme of the sum frequency 213nm laser is various, and the quintuple frequency field can use the fundamental frequency light and the quadruple frequency to sum frequency, or use the double frequency light and the triple frequency light to sum frequency. Each solution has its own advantages and disadvantages.
The ultraviolet frequency doubling crystal comprises barium borate BBO, lithium triborate LBO, PPLN, CLBO, KBBF and the like, and each crystal has respective advantages and disadvantages in the frequency doubling process. Therefore, in view of the above, it is necessary to design a superior quintupling sum frequency scheme.
Disclosure of Invention
The invention aims to provide a sum frequency generator system which can ensure the effect of quintuple frequency sum frequency. The sum frequency generator system provided by the embodiment of the invention comprises: an electromagnetic source generating a fundamental field emitted along a propagation path;
the frequency doubling device, the first sum frequency device, the dual-wavelength wave plate and the second sum frequency device are sequentially arranged along the propagation path;
wherein the frequency doubling means is used for making the passed basic field generate a frequency doubled field, the first sum frequency means is used for making the passed basic field and the frequency doubled field sum frequency to generate a frequency tripled field, the second sum frequency means is used for making the passed frequency doubled field and the frequency tripled field sum frequency to generate a frequency quintuplet field, and the frequency doubling means and the first sum frequency means are composed of the same crystal.
Preferably, the frequency doubling means and the first sum frequency means are constituted by lithium triborate LBO crystals, the frequency doubling means being set to 145 ℃ -155 ℃ and the first sum frequency means being set to 45 ℃ -55 ℃.
Preferably, said frequency doubling means is arranged to employ a class I phase matching of said LBO crystal and said first sum frequency means is arranged to employ a class II phase matching of said LBO crystal.
Preferably, the end faces of the first sum frequency crystals have cut angles.
Preferably, the cutting angle of the end faces of the first sum frequency crystal is not coated with a film.
Preferably, the second sum frequency device is composed of barium borate BBO crystal, and the second sum frequency device is set to 45-55 ℃.
Preferably, the second sum frequency device is arranged to employ class I phase matching of the BBO crystal.
Preferably, the output power of the sum frequency generator is controlled by adjusting the angle of the dual-wavelength wave plate.
Preferably, the dual wavelength wave plate is made of quartz.
Preferably, the method further comprises the following steps: a dichroic mirror disposed along the propagation path between the first sum frequency device and the dual wavelength wave plate.
The sum frequency generator system of the embodiment of the invention comprises an electromagnetic source, a frequency doubling device, a first sum frequency device, a dual-wavelength wave plate and a second sum frequency device. The electromagnetic source generates a basic field emitted along a propagation path, the frequency doubling device, the first sum frequency device, the dual-wavelength wave plate and the second sum frequency device are sequentially arranged along the propagation path, the frequency doubling device is used for enabling the passed basic field to generate a second frequency doubling field, the first sum frequency device is used for enabling the passed basic field and the second frequency doubling field to sum to generate a third frequency doubling field, the second sum frequency device is used for enabling the passed second frequency doubling field and the third frequency doubling field to sum to generate a fifth frequency doubling field, and the frequency doubling device and the first sum frequency device are formed by the same crystal body, so that a quintuple frequency sum frequency effect is guaranteed.
Drawings
Fig. 1 is a schematic diagram of a sum frequency generator according to an embodiment of the present invention.
Fig. 2 is a schematic diagram of a sum frequency generator according to another embodiment of the present invention.
Reference numerals:
10. an electromagnetic source; 11. a frequency doubling device; 12. a first summing means; 13. a second sum frequency device;
14. a dual wavelength wave plate; 15. a dichroic mirror.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or intervening elements may also be present.
In addition, it should be noted that the terms of orientation such as left, right, up and down in the embodiments of the present invention are only relative concepts or reference to the normal use state of the product, and should not be considered as limiting. The following describes the implementation of the present invention in detail with reference to specific embodiments.
Fig. 1 is a schematic diagram of a sum frequency generator according to an embodiment of the present invention.
The sum frequency generator of fig. 1 comprises:
an electromagnetic source 10 generates a fundamental field that is emitted along a propagation path. The frequency doubler 11, the first sum frequency device 12, the dual wavelength wave plate 14 and the second sum frequency device 13 are arranged in sequence along the propagation path.
In general, the electromagnetic source may be any electromagnetic source that generates a fundamental field emitted along the propagation path, such as a laser. Preferably, the laser is a high-repetition-frequency fiber laser or a picosecond laser. More preferably, the laser is a picosecond laser.
The high-repetition-frequency fiber laser or the picosecond laser is beneficial to the final light emitting index repetition frequency reaching 1 MHz. In addition, the pulse width ratio of the high-repetition-frequency fiber laser is wide, and convergence is required to achieve the same frequency doubling efficiency. A picosecond laser is adopted as a seed source to carry out quintupling design, so that the corresponding frequency doubling efficiency is improved.
The frequency doubling means 11 are used to generate a frequency doubled field from the passing basic field. The frequency doubling device 11 is used as a beam shrinking system of an electromagnetic source of the laser to converge the laser.
In order to prevent the appearance of singular points in light spots, the damage resistance power of a corresponding beam-shrinking system is higher, and the peak power of a coating film is usually required to be more than 3 times larger than the peak power, so that the peak power of a light-emitting lens of the beam-shrinking system is required to be more than 1.5GW/cm ^ 2.
In general, the frequency doubling means may be constituted by any non-linear crystal for generating a frequency doubled field from the passing elementary field. For example, the frequency doubling means may be constituted by an LBO crystal. In a preferred embodiment, the frequency doubling means is arranged to employ class I phase matching of the LBO crystal. In another embodiment according to the invention the frequency doubling means is set to 145-155 ℃, preferably 148-150 ℃ and more preferably the frequency doubling means is set to 149 ℃, so that the fundamental and doubled light does not walk away through the LBO crystal.
The first sum frequency means 12 is used to sum the passed fundamental field and the double frequency field to produce a triple frequency field. In general, the first summing means can be constituted by any nonlinear crystal for summing the passed fundamental field and the double frequency field to generate a triple frequency field, while the frequency multiplying means are constituted by the same crystal as the first summing means, i.e. the first summing means can also be constituted by an LBO crystal. Due to the particular nature of the LBO crystal, better reliability can be achieved with sum frequency tripled (i.e., 354.7nm) lasers using LBO crystals as well. In addition, the variety of crystals employed by the generator system of embodiments of the present invention is also reduced overall. Because the front stage is the fundamental frequency light and the frequency doubling light without walk-off, the sum frequency of the two beams can be realized by directly inputting the two beams into the LBO crystal.
In one embodiment, the first sum frequency device is arranged to employ class II phase matching of the LBO crystal. In another embodiment, the first summation frequency device is set at 45-55 ℃ and sealed to prevent deliquescence of the crystals.
The 1064nm fundamental frequency light generated by the laser passes through the frequency doubling crystal to generate 532nm frequency doubling light, and the rest 1064nm fundamental frequency light and the 532nm frequency doubling light pass through the first sum frequency crystal 12 and sum frequency to generate 354.7nm frequency tripling light.
The laser used has a walk-off in the first sum frequency device 12, so that a small cutting angle is made on the end face of the first sum frequency crystal 12, the laser can be coated or not coated, the damage resistance of the laser can be improved, and the walk-off is properly compensated, so that the beam quality of the laser with the wavelength of 354.7nm and 532nm is ensured.
When the first sum frequency device 12 is an LBO crystal and the length is an appropriate value, the output power of 532nm laser is 30W, which satisfies the matching power of the later stage.
A dual wavelength wave plate 14, the dual wavelength wave plate 14 being arranged along the propagation path between the first sum frequency device 12 and the second sum frequency device 13. The polarization directions of 354.7nm laser and 532nm laser input at the front stage are mutually vertical, and when the second sum frequency device is a BBO crystal, the BBO crystal can only use I-type phase matching in the process of frequency doubling of second frequency tripled and frequency doubling of fifth frequency, so that a dual-wavelength wave plate is adopted, and the polarization direction of one wavelength in the two wavelengths is rotated by 90 degrees to meet the phase matching condition. The polarization directions of 532nm laser and 354.7nm laser are the same by the dual-wavelength wave plate, and then sum frequency is carried out through the BBO crystal.
The dual wavelength wave plate of the present embodiment may be made of quartz, and the optical rotation property of quartz is utilized to change the corresponding polarization direction. Before the laser beam enters the quintuple frequency crystal, the polarization direction of 532nm is rotated by using the dual-wavelength wave plate, so that corresponding quintuple frequency sum can be carried out after the polarization directions of the 532nm laser wavelength and the 354.7nm laser wavelength are consistent.
A second sum frequency means 13 is used to sum the passed frequency doubled and frequency tripled fields to produce a frequency penta-doubled field.
In general, the second sum frequency means 13 may be constituted by any non-linear crystal for summing the passed frequency doubled and tripled fields to generate a frequency penta-doubled field. In one embodiment, the second summation device is comprised of barium borate BBO. In another embodiment, the second sum frequency device 13 is set to 45 deg.C-55 deg.C and sealed to prevent deliquescence of the BBO crystals. The 354.7nm tripled frequency light and the remaining 532nm doubled frequency light exiting from the first sum frequency device 12 are neutralized in the second sum frequency device 13 to obtain 212.8nm quintupled frequency light.
Fig. 2 is a schematic diagram of a sum frequency generator according to another embodiment of the present invention, the sum frequency generator includes:
an electromagnetic source 10 generates a fundamental field that is emitted along a propagation path. The frequency doubler 11, the first sum frequency device 12, the dual wavelength wave plate 14 and the second sum frequency device 13 are arranged in sequence along the propagation path. The frequency doubling means 11 are used to generate a frequency doubled field from the passing basic field. The first sum frequency means 12 is used to sum the passed fundamental field and the double frequency field to produce a triple frequency field. A second sum frequency means 13 is used to sum the passed frequency doubled and frequency tripled fields to produce a frequency penta-doubled field. The frequency doubler 11 and the first sum frequency device 12 are the same crystal. The sum frequency generator system of the embodiment of fig. 2 further comprises: a dichroic mirror 15, the dichroic mirror 15 being arranged along said propagation path between the first sum frequency device 12 and the dual wavelength wave plate 14 for reflecting the unwanted fundamental light out of the optical path.
When the total incident power is not changed, the temperature or the wave plate angle of the first sum frequency LBO crystal is properly adjusted, and the light emitting power of the laser can be controlled.
Therefore, the sum frequency generator of the embodiment of the present invention includes an electromagnetic source, a frequency doubling device, a first sum frequency device dual-wavelength wave plate and a second sum frequency device, and the electromagnetic source generates a basic field emitted along a propagation path, the frequency doubling device, the first sum frequency device, the dual-wavelength wave plate and the second sum frequency device are sequentially arranged along the propagation path, the frequency doubling device is used for enabling the passing basic field to generate a second frequency doubling field, the first sum frequency device is used for enabling the passing basic field and the double frequency field to sum frequency to generate a third frequency doubling field, and the second sum frequency device is used for enabling the passing double frequency field and the third frequency field to sum frequency to generate a fifth frequency doubling field. In addition, the frequency doubling means and the first sum frequency means are formed from the same crystal. Thus, the quintupling frequency and sum frequency effect is guaranteed.
In addition, for quintupling frequency and sum frequency, compared with 266nm quadruple light laser, the 355nm triple frequency light coating process and level are more mature and reliable, and the selectable coating products are wider. In addition, compared with the generation of 266nm quadruple light laser, the sum frequency scheme of 355nm triple frequency light is more mature, the selectable crystal range is wider, and the frequency doubling efficiency is relatively higher. Therefore, the sum frequency of the frequency-doubled light and the frequency-tripled light is more advantageous to generate the frequency-doubled laser than the sum frequency of the fundamental frequency light and the frequency-quadrupled light.
The above-mentioned embodiments are only specific embodiments of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art can easily conceive various equivalent modifications, substitutions and improvements within the technical scope of the present invention, and these modifications, substitutions and improvements should be covered within the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (10)
1. A sum frequency generator for a deep ultraviolet laser, comprising:
an electromagnetic source generating a fundamental field emitted along a propagation path;
the frequency doubling device, the first sum frequency device, the dual-wavelength wave plate and the second sum frequency device are sequentially arranged along the propagation path;
wherein the frequency doubling means is used for making the passed basic field generate a frequency doubled field, the first sum frequency means is used for making the passed basic field and the frequency doubled field sum frequency to generate a frequency tripled field, the second sum frequency means is used for making the passed frequency doubled field and the frequency tripled field sum frequency to generate a frequency quintuplet field, and the frequency doubling means and the first sum frequency means are composed of the same crystal.
2. Sum frequency generator according to claim 1, characterized in that the frequency doubler and the first sum frequency device are constituted by lithium triborate LBO crystals, the frequency doubler being set to 145-155 ℃ and the first sum frequency device being set to 45-55 ℃.
3. Sum frequency generator according to claim 2, characterized in that the frequency doubling means are arranged to employ a class I phase matching of the LBO crystal and the first sum frequency means are arranged to employ a class II phase matching of the LBO crystal.
4. Sum frequency generator according to claim 1, characterized in that the end face of the first sum frequency device is provided with a cut angle.
5. Sum frequency generator according to claim 4, characterized in that the cut angle of the end face of the first sum frequency device is not coated.
6. Sum frequency generator according to claim 1, characterized in that the second sum frequency device consists of a barium borate BBO crystal, which is set to 45-55 ℃.
7. Sum frequency generator according to claim 6, characterized in that the second sum frequency means are arranged to employ class I phase matching of the BBO crystal.
8. Sum frequency generator according to claim 1, characterized in that the output power of the sum frequency generator is controlled by adjusting the angle of the dual wavelength wave plate.
9. Sum frequency generator according to claim 1, characterized in that the dual wavelength wave plate is made of quartz.
10. Sum frequency generator according to claim 1, characterized in that it further comprises: a dichroic mirror disposed along the propagation path between the first sum frequency device and the dual wavelength wave plate.
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| CN202010045103.5A CN113131312A (en) | 2020-01-16 | 2020-01-16 | Sum frequency generator of deep ultraviolet laser |
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| CN202010045103.5A CN113131312A (en) | 2020-01-16 | 2020-01-16 | Sum frequency generator of deep ultraviolet laser |
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| CN101732127A (en) * | 2009-11-23 | 2010-06-16 | 上海康奥医疗科技有限公司 | Integral system of laser cornea operations |
| CN104201556A (en) * | 2014-09-17 | 2014-12-10 | 南京中科神光科技有限公司 | High-power single-longitudinal-mode ultraviolet all-solid-state laser |
| CN104577693A (en) * | 2010-04-16 | 2015-04-29 | 青岛海信电器股份有限公司 | Laser processing device, laser processing method and laser display light source |
| CN109196737A (en) * | 2016-03-30 | 2019-01-11 | Ipg光子公司 | The efficient laser system generated for triple-frequency harmonics |
| US20190326721A1 (en) * | 2018-04-24 | 2019-10-24 | Toptica Photonics Ag | Generation of Frequency-Tripled Laser Radiation |
| CN110571640A (en) * | 2019-10-16 | 2019-12-13 | 富通尼激光科技（东莞）有限公司 | Method for improving generation efficiency of third harmonic |
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2020
- 2020-01-16 CN CN202010045103.5A patent/CN113131312A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101106252A (en) * | 2006-07-14 | 2008-01-16 | 北京国科世纪激光技术有限公司 | A coaxial light output multi-wave length laser device |
| CN101732127A (en) * | 2009-11-23 | 2010-06-16 | 上海康奥医疗科技有限公司 | Integral system of laser cornea operations |
| CN104577693A (en) * | 2010-04-16 | 2015-04-29 | 青岛海信电器股份有限公司 | Laser processing device, laser processing method and laser display light source |
| CN104201556A (en) * | 2014-09-17 | 2014-12-10 | 南京中科神光科技有限公司 | High-power single-longitudinal-mode ultraviolet all-solid-state laser |
| CN109196737A (en) * | 2016-03-30 | 2019-01-11 | Ipg光子公司 | The efficient laser system generated for triple-frequency harmonics |
| US20190326721A1 (en) * | 2018-04-24 | 2019-10-24 | Toptica Photonics Ag | Generation of Frequency-Tripled Laser Radiation |
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