CN113089072A - Liquid-phase plasma nano polishing solution for single alpha-phase titanium and preparation method and application thereof - Google Patents
Liquid-phase plasma nano polishing solution for single alpha-phase titanium and preparation method and application thereof Download PDFInfo
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- 238000005498 polishing Methods 0.000 title claims abstract description 126
- 239000007791 liquid phase Substances 0.000 title claims abstract description 42
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 title claims abstract description 28
- 239000010936 titanium Substances 0.000 title claims abstract description 28
- 229910052719 titanium Inorganic materials 0.000 title claims abstract description 27
- 239000012071 phase Substances 0.000 title claims abstract description 19
- 238000002360 preparation method Methods 0.000 title abstract description 6
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 claims abstract description 72
- 229910001069 Ti alloy Inorganic materials 0.000 claims abstract description 70
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims abstract description 68
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 claims abstract description 66
- 239000011698 potassium fluoride Substances 0.000 claims abstract description 36
- 235000003270 potassium fluoride Nutrition 0.000 claims abstract description 36
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 claims abstract description 34
- 235000019270 ammonium chloride Nutrition 0.000 claims abstract description 34
- 239000000176 sodium gluconate Substances 0.000 claims abstract description 34
- 235000012207 sodium gluconate Nutrition 0.000 claims abstract description 34
- 229940005574 sodium gluconate Drugs 0.000 claims abstract description 34
- 235000010288 sodium nitrite Nutrition 0.000 claims abstract description 33
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 33
- 239000008367 deionised water Substances 0.000 claims abstract description 32
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 32
- BEGBSFPALGFMJI-UHFFFAOYSA-N ethene;sodium Chemical group [Na].C=C BEGBSFPALGFMJI-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000002994 raw material Substances 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 22
- 238000010438 heat treatment Methods 0.000 claims description 20
- 238000002156 mixing Methods 0.000 claims description 20
- 238000003756 stirring Methods 0.000 claims description 19
- 230000003746 surface roughness Effects 0.000 abstract description 23
- 230000000694 effects Effects 0.000 abstract description 11
- 239000000243 solution Substances 0.000 description 57
- 238000005259 measurement Methods 0.000 description 22
- 238000010998 test method Methods 0.000 description 11
- 238000007517 polishing process Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000003792 electrolyte Substances 0.000 description 5
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 239000003929 acidic solution Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000003337 fertilizer Substances 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000010431 corundum Substances 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 231100000086 high toxicity Toxicity 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229940037001 sodium edetate Drugs 0.000 description 1
- BAZAXWOYCMUHIX-UHFFFAOYSA-M sodium perchlorate Chemical compound [Na+].[O-]Cl(=O)(=O)=O BAZAXWOYCMUHIX-UHFFFAOYSA-M 0.000 description 1
- 229910001488 sodium perchlorate Inorganic materials 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 230000000638 stimulation Effects 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
- C25F3/26—Polishing of heavy metals of refractory metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a liquid-phase plasma nano-polishing solution for single alpha-phase titanium, which comprises the following raw materials in percentage by mass: 2 to 6 percent of ammonium chloride, 0.01 to 0.1 percent of potassium fluoride, 0.01 to 0.1 percent of sodium ethylene diamine tetracetate, 0.02 to 0.06 percent of sodium nitrite, 0.02 to 0.06 percent of sodium gluconate and the balance of deionized water. The invention also provides a preparation method of the single alpha-phase titanium liquid-phase plasma nano polishing solution, and the prepared polishing solution is used for surface polishing treatment of alpha-titanium alloy parts. According to the invention, ammonium chloride, potassium fluoride, sodium ethylene diamine tetracetate, sodium nitrite, sodium gluconate and deionized water are mixed to prepare the plasma nano polishing solution, and the polishing solution is adopted to polish titanium, so that the surface roughness of an alpha titanium alloy part can be reduced by one time or more, and scratches are fewer; by adding the potassium fluoride, the surface roughness and the glossiness of the alpha titanium alloy part can be greatly reduced, the surface roughness of the alpha titanium alloy part can be reduced by more than 4 times at most, and meanwhile, the glossiness can be improved by 6 times, so that the mirror surface effect is achieved.
Description
Technical Field
The invention relates to the technical field of plasma nanotechnology application, in particular to a liquid-phase plasma nanometer polishing solution for single alpha-phase titanium, and a preparation method and application thereof.
Background
Titanium and titanium alloys are considered to be one of the most difficult metals to polish because of its small thermal conductivity, high coefficient of friction, and strong affinity for oxygen, which makes it susceptible to burning and oxidation during grinding and polishing. Titanium has high melting point (1668 ℃) and active property at high temperature, so that the titanium surface is easily polluted by oxygen and reacts with components such as Si, Al, Mg and the like in the embedding material in the casting process to form a brittle and hard reaction layer. It can be seen that post-treatment of the surface of titanium is very important.
The alpha titanium alloy (TA1, TA2 and TA3) is a single-phase alloy composed of alpha-phase solid solution, is alpha-phase at normal temperature or higher practical application temperature, has stable structure, higher wear resistance than pure titanium and strong oxidation resistance. At 500-600 deg.c, the strength and creep resistance are maintained, but heat treatment strengthening is impossible and the room temperature strength is not high.
Currently, polishing methods are commonly used: electrolytic, mechanical, chemical, ultrasonic, etc.
And (3) mechanically polishing by sequentially adding polishing paste into a rubber wheel, polishing sand (325# white corundum powder) and a cloth wheel to obtain a smooth surface. The known mechanical polishing method is labor-consuming and is suitable for planar materials, and for non-planar materials, dead corners which cannot be polished exist.
The chemical polishing is typically HF and HNO3Mixing the solution at a certain ratio, wherein HF has a dissolving effect on titanium, HNO3The surface of the titanium is passivated to form an oxide film for protection. The chemical polishing has low requirements on equipment and operation, the size and the number of the polished parts are only limited by the size of a polishing groove, and the chemical polishing has large-area polishingAnd multiple treatment cases; but the solubility is not easy to control, and the polishing effect is generally poorer than that of electrolytic polishing. Therefore, most of the chemical polishing methods use a high-concentration acidic solution, which causes problems in recycling or disposal of the waste acid solution and may adversely affect environmental protection.
In the aspect of the electrolytic polishing method, like the chemical polishing method, a high-concentration acidic solution is also used as an electrolyte, for example, an environment-friendly electrochemical polishing process which does not contain toxic substances such as hydrofluoric acid, methanol, chromic anhydride and the like, is low in toxicity and free of stimulation is invented for Ti-10V-2 Fe-3 Al titanium alloy, but perchloric acid contained in the electrochemical polishing process generates a large amount of heat in the actual polishing process and is easy to cause explosion. The method still has various problems of high toxicity, high danger, difficult management of the manufacturing process, waste liquid pollution and the like.
An environment-friendly electrochemical polishing process for titanium alloy (published by university of Beijing technology, 2009, 31 (1): 68-73, in the United states, Xuyongxi, etc.) discloses a titanium alloy polishing solution containing perchloric acid, sodium perchlorate, lactic acid and absolute ethyl alcohol, but when the titanium alloy polishing solution is used for treatment, an oxidation film is easily generated on the surface of a titanium alloy substrate, the oxidation film has high hardness and high polishing difficulty, and the surface of the titanium alloy is easy to generate polishing grains and difficult to achieve mirror surface effect. Patent CN107460534A proposes a polishing solution mainly comprising glycerin, ethylene glycol, and sodium chloride, wherein the glycerin accounts for too large a proportion, and a large amount of bubbles are generated during polishing, which seriously affects the polishing effect.
Disclosure of Invention
The invention aims to solve the technical problem of poor polishing effect of the existing titanium alloy polishing solution.
The invention solves the technical problems through the following technical means:
a single alpha-phase titanium liquid-phase plasma nano polishing solution comprises the following raw materials in percentage by mass: 2 to 6 percent of ammonium chloride, 0.01 to 0.1 percent of potassium fluoride, 0.01 to 0.1 percent of sodium ethylene diamine tetracetate, 0.02 to 0.06 percent of sodium nitrite, 0.02 to 0.06 percent of sodium gluconate and the balance of deionized water.
According to the invention, ammonium chloride, potassium fluoride, sodium ethylene diamine tetracetate, sodium nitrite, sodium gluconate and deionized water are mixed to prepare the plasma nano polishing solution, and the polishing solution is adopted to polish titanium, so that the surface roughness of an alpha titanium alloy part can be reduced by one time or more, and scratches are fewer; the surface roughness and the glossiness of the alpha titanium alloy part can be greatly reduced by adding the potassium fluoride, the surface roughness of the alpha titanium alloy part can be reduced by more than 4 times at most, and the glossiness can be improved by 6 times at the same time, so that the mirror surface effect is achieved.
The ammonium chloride makes the solution wholly present weak acidity, is a basic component of the polishing solution, is beneficial to the generation of a mixed gas layer of water vapor, hydrogen, oxygen and the like in the polishing process, and the mixed gas layer is an important factor influencing the nano polishing quality of the plasma; the sodium gluconate and the sodium ethylene diamine tetracetate are used as complexing agents and can be complexed with metal ions such as calcium, magnesium, iron and the like, so that precipitates in the polishing solution and dirt on the surface of the alpha titanium alloy are effectively prevented from being generated, and the sodium gluconate can also prevent the metal surface from being oxidized to play a corrosion inhibition role; the sodium nitrite improves the ion concentration of the polishing solution, and the ion activity is strong.
A preparation method of single alpha-phase titanium liquid-phase plasma nano polishing solution comprises the following steps:
adding ammonium chloride, potassium fluoride, sodium ethylene diamine tetracetate, sodium nitrite and sodium gluconate into deionized water, fully stirring, uniformly mixing, and heating to 60-90 ℃ to obtain the liquid-phase plasma nano polishing solution for the alpha titanium alloy.
Preferably, 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate are added into every 100g of deionized water, fully stirred, uniformly mixed and then heated to 60 ℃.
Preferably, 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate are added into every 100g of deionized water, fully stirred, uniformly mixed and then heated to 70 ℃.
Preferably, 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate are added into every 100g of deionized water, fully stirred, uniformly mixed and then heated to 80 ℃.
Preferably, 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate are added into every 100g of deionized water, fully stirred, uniformly mixed and then heated to 90 ℃.
Preferably, 6g of ammonium chloride, 0.1g of potassium fluoride, 0.1g of sodium ethylene diamine tetracetate, 0.06g of sodium nitrite and 0.06g of sodium gluconate are added into every 100g of deionized water, fully stirred, uniformly mixed and then heated to 90 ℃.
Preferably, 4g of ammonium chloride, 0.05g of potassium fluoride, 0.05g of sodium edetate, 0.04g of sodium nitrite and 0.04g of sodium gluconate are added to 100g of deionized water, fully stirred, mixed uniformly and then heated to 80 ℃.
The invention also provides application of the single alpha-phase titanium liquid-phase plasma nano polishing solution in surface polishing treatment of an alpha titanium alloy part.
The use method of the liquid-phase plasma nano polishing solution for the alpha titanium alloy comprises the following steps: the polishing solution is placed in a working groove to be heated and electrified as a cathode, the alpha titanium alloy part is clamped by a clamp and electrified as an anode, a motor drives the alpha titanium alloy part to be slowly immersed into the electrolyte, a dense gas layer is formed near the surface of the alpha titanium alloy part after the electrolyte is heated and evaporated, the gas layer component is plasma formed by the electrolyte, a discharge channel is formed in the plasma, the probability of the discharge channel is increased in an unsmooth area of the surface of the alpha titanium alloy part due to the fact that the metal surface is an equipotential surface, extremely large current in a small area generated in the discharge channel is slightly melted on the surface of the alpha titanium alloy part contacted with the electrolyte, the surface of the slightly melted alpha titanium alloy part is changed into a regular plane under the action of an electromagnetic field according to the principle of the equipotential surface, and the polishing effect of the surface of.
The invention has the following beneficial effects:
1. according to the invention, ammonium chloride, potassium fluoride, sodium ethylene diamine tetracetate, sodium nitrite, sodium gluconate and deionized water are mixed to prepare the plasma nano polishing solution, and the polishing solution is adopted to polish titanium, so that the surface roughness of an alpha titanium alloy part can be reduced by one time or more, and scratches are fewer; the surface roughness and the glossiness of the alpha titanium alloy part can be greatly reduced by adding the potassium fluoride, the surface roughness of the alpha titanium alloy part can be reduced by more than 4 times at most, and the glossiness can be improved by 6 times at the same time, so that the mirror surface effect is achieved.
2. The polishing solution disclosed by the invention is simple in preparation method and safe to operate; the consumption of solute in the polishing process is small, and the polishing solution per unit volume can polish more metal surface areas, so that the polishing cost is reduced; the polishing solution mainly comprises weakly acidic ammonium chloride which is an agricultural fertilizer, and the polishing waste liquid can be secondarily used as the fertilizer, so that the polishing solution has the advantages of environmental protection, energy conservation, emission reduction and the like.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the embodiments of the present invention, and it is obvious that the described embodiments are some embodiments of the present invention, but not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Test materials, reagents and the like used in the following examples are commercially available unless otherwise specified.
The specific techniques or conditions not specified in the examples can be performed according to the techniques or conditions described in the literature in the field or according to the product specification.
Example 1
Adding 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 60 ℃ to obtain the liquid-phase plasma nano polishing solution for the alpha titanium alloy.
The original roughness of the surface of the alpha titanium alloy piece without polishing treatment was measured by a roughness meter, and then the surface roughness was measured again after the liquid-phase plasma nano-polishing solution polishing treatment, and the measurement results are shown in table 1.
The glossiness of the alpha titanium alloy piece of the present example before and after the polishing treatment was measured according to the test method of GB/T8807-1988 plastic mirror surface gloss, and the measurement results are shown in Table 1.
Example 2
Adding 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 70 ℃ to obtain the liquid-phase plasma nano polishing solution for the alpha titanium alloy.
The original roughness of the surface of the alpha titanium alloy piece without polishing treatment was measured by a roughness meter, and then the surface roughness was measured again after the liquid-phase plasma nano-polishing solution polishing treatment, and the measurement results are shown in table 1.
The glossiness of the alpha titanium alloy piece of the present example before and after the polishing treatment was measured according to the test method of GB/T8807-1988 plastic mirror surface gloss, and the measurement results are shown in Table 1.
Example 3
Adding 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 80 ℃ to obtain the liquid-phase plasma nano polishing solution for the alpha titanium alloy (TA1, TA2 and TA 3).
The original roughness of the surface of the alpha titanium alloy piece without polishing treatment was measured by a roughness meter, and then the surface roughness was measured again after the liquid-phase plasma nano-polishing solution polishing treatment, and the measurement results are shown in table 1.
The glossiness of the alpha titanium alloy piece of the present example before and after the polishing treatment was measured according to the test method of GB/T8807-1988 plastic mirror surface gloss, and the measurement results are shown in Table 1.
Example 4
Adding 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 90 ℃ to obtain the liquid-phase plasma nano polishing solution for the alpha titanium alloy.
The original roughness of the surface of the alpha titanium alloy piece without polishing treatment was measured by a roughness meter, and then the surface roughness was measured again after the liquid-phase plasma nano-polishing solution polishing treatment, and the measurement results are shown in table 1.
The glossiness of the alpha titanium alloy piece of the present example before and after the polishing treatment was measured according to the test method of GB/T8807-1988 plastic mirror surface gloss, and the measurement results are shown in Table 1.
Example 5
Adding 6g of ammonium chloride, 0.1g of potassium fluoride, 0.1g of sodium ethylene diamine tetracetate, 0.06g of sodium nitrite and 0.06g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 90 ℃ to obtain the liquid-phase plasma nano polishing solution for the alpha titanium alloy.
The original roughness of the surface of the alpha titanium alloy piece without polishing treatment was measured by a roughness meter, and then the surface roughness was measured again after the liquid-phase plasma nano-polishing solution polishing treatment, and the measurement results are shown in table 1.
The glossiness of the alpha titanium alloy piece of the present example before and after the polishing treatment was measured according to the test method of GB/T8807-1988 plastic mirror surface gloss, and the measurement results are shown in Table 1.
Example 6
Adding 4g of ammonium chloride, 0.05g of potassium fluoride, 0.05g of sodium ethylene diamine tetracetate, 0.04g of sodium nitrite and 0.04g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 80 ℃ to obtain the liquid-phase plasma nano polishing solution for the alpha titanium alloy.
The original roughness of the surface of the alpha titanium alloy piece without polishing treatment was measured by a roughness meter, and then the surface roughness was measured again after the liquid-phase plasma nano-polishing solution polishing treatment, and the measurement results are shown in table 1.
The glossiness of the alpha titanium alloy piece of the present example before and after the polishing treatment was measured according to the test method of GB/T8807-1988 plastic mirror surface gloss, and the measurement results are shown in Table 1.
Example 7
Adding 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 60 ℃ to obtain the liquid-phase plasma nano polishing solution for the alpha titanium alloy.
The original roughness of the surface of the alpha titanium alloy piece without polishing treatment was measured by a roughness meter, and then the surface roughness was measured again after the liquid-phase plasma nano-polishing solution polishing treatment, and the measurement results are shown in table 1.
The glossiness of the alpha titanium alloy piece of the present example before and after the polishing treatment was measured according to the test method of GB/T8807-1988 plastic mirror surface gloss, and the measurement results are shown in Table 1.
Example 8
Adding 2g of ammonium chloride, 0.03g of potassium fluoride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 60 ℃ to obtain the liquid-phase plasma nano polishing solution for the alpha titanium alloy.
The original roughness of the surface of the alpha titanium alloy piece without polishing treatment was measured by a roughness meter, and then the surface roughness was measured again after the liquid-phase plasma nano-polishing solution polishing treatment, and the measurement results are shown in table 1.
The glossiness of the alpha titanium alloy piece of the present example before and after the polishing treatment was measured according to the test method of GB/T8807-1988 plastic mirror surface gloss, and the measurement results are shown in Table 1.
Example 9
Adding 2g of ammonium chloride, 0.07g of potassium fluoride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 60 ℃ to obtain the liquid-phase plasma nano polishing solution for the alpha titanium alloy.
The original roughness of the surface of the alpha titanium alloy piece without polishing treatment was measured by a roughness meter, and then the surface roughness was measured again after the liquid-phase plasma nano-polishing solution polishing treatment, and the measurement results are shown in table 1.
The glossiness of the alpha titanium alloy piece of the present example before and after the polishing treatment was measured according to the test method of GB/T8807-1988 plastic mirror surface gloss, and the measurement results are shown in Table 1.
Example 10
Adding 2g of ammonium chloride, 0.1g of potassium fluoride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 60 ℃ to obtain the liquid-phase plasma nano polishing solution for the alpha titanium alloy.
The original roughness of the surface of the alpha titanium alloy piece without polishing treatment was measured by a roughness meter, and then the surface roughness was measured again after the liquid-phase plasma nano-polishing solution polishing treatment, and the measurement results are shown in table 1.
The glossiness of the alpha titanium alloy piece of the present example before and after the polishing treatment was measured according to the test method of GB/T8807-1988 plastic mirror surface gloss, and the measurement results are shown in Table 1.
Comparative example 1
Adding 2g of ammonium chloride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 60 ℃ to obtain the liquid-phase plasma nano polishing solution for the alpha titanium alloy.
The original roughness of the surface of the alpha titanium alloy piece without polishing treatment was measured by a roughness meter, and then the surface roughness was measured again after the liquid-phase plasma nano-polishing solution polishing treatment, and the measurement results are shown in table 1.
The glossiness of the alpha titanium alloy piece of the comparative example before and after polishing treatment was measured according to the test method of GB/T8807-1988 plastic mirror surface gloss, and the measurement results are shown in Table 1.
Table 1 shows the results of comparing the roughness and the gloss before and after the polishing treatment of the alpha titanium alloys of examples 1 to 10 and comparative example 1
According to the results shown in table 1, the invention mixes ammonium chloride, potassium fluoride, sodium ethylene diamine tetracetate, sodium nitrite, sodium gluconate and deionized water to prepare the plasma nano polishing solution, and the polishing solution is adopted to polish titanium, so that the surface roughness of an alpha titanium alloy part can be reduced by one time or more, and scratches are less; from the results of comparing examples 1 to 10 with comparative example 1, it can be seen that the polishing solution prepared in comparative example 1 without adding potassium fluoride not only did not decrease but also increased the roughness of the α titanium alloy member polished by the polishing solution, and the glossiness became lower; the surface roughness and the glossiness of the alpha titanium alloy part can be greatly reduced by adding the potassium fluoride, the surface roughness of the alpha titanium alloy part can be reduced by more than 4 times at most, and the glossiness can be improved by 6 times at the same time, so that the mirror surface effect is achieved.
The above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (9)
1. The single alpha-phase titanium liquid-phase plasma nano polishing solution is characterized by comprising the following raw materials in percentage by mass: 2 to 6 percent of ammonium chloride, 0.01 to 0.1 percent of potassium fluoride, 0.01 to 0.1 percent of sodium ethylene diamine tetracetate, 0.02 to 0.06 percent of sodium nitrite, 0.02 to 0.06 percent of sodium gluconate and the balance of deionized water.
2. The method for preparing the single alpha-phase titanium liquid-phase plasma nano-polishing solution according to claim 1, comprising the steps of:
adding ammonium chloride, potassium fluoride, sodium ethylene diamine tetracetate, sodium nitrite and sodium gluconate into deionized water, fully stirring, uniformly mixing, and heating to 60-90 ℃ to obtain the liquid-phase plasma nano polishing solution for the alpha titanium alloy.
3. The method for preparing the single alpha-phase titanium liquid-phase plasma nano-polishing solution according to claim 2, wherein the method comprises the following steps: adding 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and heating to 60 ℃.
4. The method for preparing the single alpha-phase titanium liquid-phase plasma nano-polishing solution according to claim 2, wherein the method comprises the following steps: adding 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and heating to 70 ℃.
5. The method for preparing the single alpha-phase titanium liquid-phase plasma nano-polishing solution according to claim 2, wherein the method comprises the following steps: adding 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and heating to 80 ℃.
6. The method for preparing the single alpha-phase titanium liquid-phase plasma nano-polishing solution according to claim 2, wherein the method comprises the following steps: adding 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylene diamine tetracetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and heating to 90 ℃.
7. The method for preparing the single alpha-phase titanium liquid-phase plasma nano-polishing solution according to claim 2, wherein the method comprises the following steps: adding 6g of ammonium chloride, 0.1g of potassium fluoride, 0.1g of sodium ethylene diamine tetracetate, 0.06g of sodium nitrite and 0.06g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and heating to 90 ℃.
8. The method for preparing the single alpha-phase titanium liquid-phase plasma nano-polishing solution according to claim 2, wherein the method comprises the following steps: adding 4g of ammonium chloride, 0.05g of potassium fluoride, 0.05g of sodium ethylene diamine tetracetate, 0.04g of sodium nitrite and 0.04g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and heating to 80 ℃.
9. The liquid-phase plasma nano-polishing solution of single alpha-phase titanium as claimed in claim 1, which is used for surface polishing treatment of alpha-titanium alloy parts.
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| CN1534113A (en) * | 2003-04-01 | 2004-10-06 | 环宇真空科技股份有限公司 | Plasma body polishing method of titanium and titanium alloy product |
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| RU2461667C1 (en) * | 2011-04-25 | 2012-09-20 | Общество с ограниченной ответственностью "Научно-производственное предприятие Вакууммаш" | Method of electrolytic-plasma grinding of parts from titanium and its alloys |
| CN106367795A (en) * | 2016-11-02 | 2017-02-01 | 昆明理工大学 | Sodium gluconate anodizing solution and preparation method and application thereof |
| CN107513758A (en) * | 2017-09-30 | 2017-12-26 | 哈工大机器人（合肥）国际创新研究院 | Liquid phase plasma nanometer burnishing liquid, its preparation method and the application of one Albatra metal |
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| CN1534113A (en) * | 2003-04-01 | 2004-10-06 | 环宇真空科技股份有限公司 | Plasma body polishing method of titanium and titanium alloy product |
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| RU2461667C1 (en) * | 2011-04-25 | 2012-09-20 | Общество с ограниченной ответственностью "Научно-производственное предприятие Вакууммаш" | Method of electrolytic-plasma grinding of parts from titanium and its alloys |
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