CN113089072B - Single alpha-phase titanium liquid phase plasma nano polishing solution and preparation method and application thereof - Google Patents
Single alpha-phase titanium liquid phase plasma nano polishing solution and preparation method and application thereof Download PDFInfo
- Publication number
- CN113089072B CN113089072B CN202110367481.XA CN202110367481A CN113089072B CN 113089072 B CN113089072 B CN 113089072B CN 202110367481 A CN202110367481 A CN 202110367481A CN 113089072 B CN113089072 B CN 113089072B
- Authority
- CN
- China
- Prior art keywords
- sodium
- alpha
- polishing solution
- liquid phase
- titanium alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 103
- 239000007791 liquid phase Substances 0.000 title claims abstract description 42
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 title claims abstract description 28
- 239000010936 titanium Substances 0.000 title claims abstract description 28
- 229910052719 titanium Inorganic materials 0.000 title claims abstract description 27
- 239000012071 phase Substances 0.000 title claims abstract description 19
- 238000002360 preparation method Methods 0.000 title abstract description 6
- 229910001069 Ti alloy Inorganic materials 0.000 claims abstract description 80
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 claims abstract description 72
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims abstract description 70
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 claims abstract description 66
- 239000011698 potassium fluoride Substances 0.000 claims abstract description 36
- 235000003270 potassium fluoride Nutrition 0.000 claims abstract description 36
- 235000019270 ammonium chloride Nutrition 0.000 claims abstract description 35
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 claims abstract description 34
- 239000000176 sodium gluconate Substances 0.000 claims abstract description 34
- 235000012207 sodium gluconate Nutrition 0.000 claims abstract description 34
- 229940005574 sodium gluconate Drugs 0.000 claims abstract description 34
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 claims abstract description 33
- 235000010288 sodium nitrite Nutrition 0.000 claims abstract description 33
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 33
- 239000008367 deionised water Substances 0.000 claims abstract description 32
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 32
- 229960000819 sodium nitrite Drugs 0.000 claims abstract description 6
- 239000002994 raw material Substances 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 19
- 238000002156 mixing Methods 0.000 claims description 15
- 238000010438 heat treatment Methods 0.000 claims description 13
- 238000003756 stirring Methods 0.000 claims description 13
- 239000002002 slurry Substances 0.000 claims 1
- 230000003746 surface roughness Effects 0.000 abstract description 34
- 230000000694 effects Effects 0.000 abstract description 11
- 239000000243 solution Substances 0.000 description 43
- 238000005259 measurement Methods 0.000 description 22
- 239000007788 liquid Substances 0.000 description 15
- 238000010998 test method Methods 0.000 description 11
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 238000007517 polishing process Methods 0.000 description 5
- 239000003792 electrolyte Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 239000003929 acidic solution Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000003337 fertilizer Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000010431 corundum Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 231100000086 high toxicity Toxicity 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 231100000344 non-irritating Toxicity 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- BAZAXWOYCMUHIX-UHFFFAOYSA-M sodium perchlorate Chemical compound [Na+].[O-]Cl(=O)(=O)=O BAZAXWOYCMUHIX-UHFFFAOYSA-M 0.000 description 1
- 229910001488 sodium perchlorate Inorganic materials 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
- C25F3/26—Polishing of heavy metals of refractory metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a single alpha-phase titanium liquid phase plasma nano polishing solution, which comprises the following raw materials in percentage by mass: 2-6% of ammonium chloride, 0.01-0.1% of potassium fluoride, 0.01-0.1% of sodium ethylenediamine tetraacetate, 0.02-0.06% of sodium nitrite, 0.02-0.06% of sodium gluconate and the balance of deionized water. The invention also provides a preparation method of the single alpha-phase titanium liquid phase plasma nano polishing solution, and the prepared polishing solution is used for polishing the surface of the alpha-titanium alloy piece. According to the invention, ammonium chloride, potassium fluoride, sodium ethylenediamine tetraacetate, sodium nitrite and sodium gluconate are mixed with deionized water to prepare the plasma nano polishing solution, and the polishing solution is adopted to polish titanium, so that the surface roughness of an alpha titanium alloy piece can be reduced by one time or more, and scratches are less; by adding potassium fluoride, the surface roughness and glossiness of the alpha titanium alloy piece can be greatly reduced, the surface roughness of the alpha titanium alloy piece can be reduced by more than 4 times at the highest, and meanwhile, the glossiness can be improved by 6 times, so that the mirror surface effect is achieved.
Description
Technical Field
The invention relates to the technical field of application of plasma nanotechnology, in particular to a single alpha-phase titanium liquid phase plasma nano polishing solution, a preparation method and application thereof.
Background
Titanium and titanium alloys are considered to be one of the most difficult metals to polish because of its low thermal conductivity, high coefficient of friction, and extremely high oxygen affinity, which makes it susceptible to burns and oxidation during grinding and polishing. Titanium has a high melting point (1668 ℃) and is active at high temperatures, so that the titanium surface is easily contaminated with oxygen and reacts with Si, al, mg and other components in the investment, forming a brittle and hard reaction layer during casting. It can be seen that the post-surface treatment of titanium is important.
The alpha titanium alloy (TA 1, TA2 and TA 3) is a single-phase alloy composed of alpha-phase solid solutions, is alpha-phase at a common temperature or at a higher practical application temperature, has stable structure, higher wear resistance than pure titanium and strong oxidation resistance. The strength and creep resistance of the alloy are still maintained at the temperature of 500-600 ℃, but the alloy cannot be heat-treated and strengthened, and the strength at room temperature is not high.
The polishing methods commonly used at present are as follows: electrolytic, mechanical, chemical, ultrasonic, and the like.
The mechanical polishing is carried out by using a rubber wheel, polishing sand (325 # white corundum powder) and a cloth wheel to obtain the smooth surface. The known mechanical polishing method is labor-consuming and is more suitable for planar materials, and for non-planar materials there will be dead corners that cannot be polished.
Chemical polishing is typically HF and HNO 3 Mixing the solutions in a certain proportion, wherein HF has a dissolution effect on titanium and HNO 3 The surface of titanium is passivated to form an oxide film, so as to play a role in protection. The chemical polishing has low requirements on equipment and operation, the size and the number of parts which can be polished are limited only by the size of a polishing groove, and the chemical polishing is beneficial to the conditions of large-area polishing and multi-piece treatment; but the solubility is not easy to control, and the polishing effect is generally poorer than that of electrolytic polishing. It is known that the chemical polishing method uses a high concentration acidic solution in many cases, and thus, there is a problem in recovery or treatment of the waste acid solution, and there is a possibility that the method may adversely affect the environmental protection.
As for the electrolytic polishing method, as with the chemical polishing method, a high-concentration acidic solution is also required to be used as an electrolyte, for example, a low-toxicity and non-irritating environment-friendly electrochemical polishing process which does not contain toxic substances such as hydrofluoric acid, methanol, chromic anhydride and the like is invented for Ti-10V-2Fe-3Al titanium alloy, but a large amount of heat is generated in the actual polishing process due to the perchloric acid contained in the process, and explosion is easy to cause. The method still has various problems of high toxicity, high risk, difficult management of the manufacturing process, pollution of waste liquid and the like.
An environment-friendly electrochemical polishing process for titanium alloy (U.S. Pat. No. 5, xu Yongzhen, university of Beijing and technology, 2009, 31 (1): 68-73) discloses a titanium alloy polishing solution containing perchloric acid, sodium perchlorate, lactic acid and absolute ethyl alcohol, but when the polishing solution is used for treatment, an oxide film is easily generated on the surface of a titanium alloy substrate, the oxide film has high hardness, great polishing difficulty, polishing lines are easily generated on the surface of the titanium alloy, and the mirror effect is difficult to achieve. The patent CN107460534A proposes a polishing solution with glycerol, glycol and sodium chloride as main components, wherein the glycerol accounts for too much, a large amount of bubbles are generated during polishing, and the polishing effect is seriously affected.
Disclosure of Invention
The invention aims to solve the technical problem that the polishing effect of the conventional titanium alloy polishing solution is poor.
The invention solves the technical problems by the following technical means:
the liquid phase plasma nano polishing solution for single alpha-phase titanium comprises the following raw materials in percentage by mass: 2-6% of ammonium chloride, 0.01-0.1% of potassium fluoride, 0.01-0.1% of sodium ethylenediamine tetraacetate, 0.02-0.06% of sodium nitrite, 0.02-0.06% of sodium gluconate and the balance of deionized water.
According to the invention, ammonium chloride, potassium fluoride, sodium ethylenediamine tetraacetate, sodium nitrite and sodium gluconate are mixed with deionized water to prepare the plasma nano polishing solution, and the polishing solution is adopted to polish titanium, so that the surface roughness of an alpha titanium alloy piece can be reduced by one time or more, and scratches are less; according to the invention, by adding potassium fluoride, the surface roughness and glossiness of the alpha titanium alloy piece can be greatly reduced, the surface roughness of the alpha titanium alloy piece can be reduced by more than 4 times at most, and meanwhile, the glossiness can be improved by 6 times, so that the mirror surface effect is achieved.
The ammonium chloride makes the whole solution show weak acidity, is a basic component of the polishing solution, is favorable for generating a mixed gas layer of water vapor, hydrogen, oxygen and the like in the polishing process, and the mixed gas layer is an important factor affecting the quality of the plasma nano polishing; sodium gluconate and sodium ethylenediamine tetraacetate are used as complexing agents, can be complexed with metal ions such as calcium, magnesium, iron and the like, effectively prevent sediment in polishing solution and the generation of dirt on the surface of alpha titanium alloy, and secondly, sodium gluconate can also prevent the oxidation of the metal surface to play a role in corrosion inhibition; the sodium nitrite improves the ion concentration of the polishing solution and has strong ion activity.
The preparation method of the liquid phase plasma nano polishing solution of single alpha-phase titanium comprises the following steps:
adding ammonium chloride, potassium fluoride, sodium ethylenediamine tetraacetate, sodium nitrite and sodium gluconate into deionized water, fully stirring, uniformly mixing, and heating to 60-90 ℃ to obtain the liquid phase plasma nano polishing solution of the alpha titanium alloy.
Preferably, 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylenediamine tetraacetate, 0.02g of sodium nitrite, 0.02g of sodium gluconate are added to every 100g of deionized water, stirred well, mixed well, and then heated to 60 ℃.
Preferably, 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylenediamine tetraacetate, 0.02g of sodium nitrite, 0.02g of sodium gluconate are added to every 100g of deionized water, stirred well, mixed well, and then heated to 70 ℃.
Preferably, 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylenediamine tetraacetate, 0.02g of sodium nitrite, 0.02g of sodium gluconate are added to every 100g of deionized water, stirred well, mixed well, and then heated to 80 ℃.
Preferably, 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylenediamine tetraacetate, 0.02g of sodium nitrite, 0.02g of sodium gluconate are added to every 100g of deionized water, stirred well, mixed well, and then heated to 90 ℃.
Preferably, 6g of ammonium chloride, 0.1g of potassium fluoride, 0.1g of sodium ethylenediamine tetraacetate, 0.06g of sodium nitrite, 0.06g of sodium gluconate are added to every 100g of deionized water, stirred well, mixed well, and then heated to 90 ℃.
Preferably, 4g of ammonium chloride, 0.05g of potassium fluoride, 0.05g of sodium ethylenediamine tetraacetate, 0.04g of sodium nitrite, 0.04g of sodium gluconate are added to every 100g of deionized water, stirred well, mixed well, and then heated to 80 ℃.
The invention also provides application of the single alpha-phase titanium liquid phase plasma nano polishing solution in alpha-titanium alloy piece surface polishing treatment.
The application method of the liquid phase plasma nano polishing solution of the alpha titanium alloy comprises the following steps: the polishing solution is placed in a working groove to be heated and electrified to be a cathode, the alpha titanium alloy piece is clamped by a clamp and electrified to be an anode, the motor drives the alpha titanium alloy piece to be slowly immersed in the electrolyte, a compact gas layer is formed near the surface of the alpha titanium alloy piece after the electrolyte is heated and evaporated, the gas layer is plasma formed by the electrolyte, a discharge channel appears in the plasma, the occurrence probability of the discharge channel can be increased in a non-smooth area of the surface of the alpha titanium alloy piece because the metal surface is an equipotential surface, the extremely large current in a small area is generated in the discharge channel, the surface of the alpha titanium alloy piece in contact is micro-melted, the micro-melted alpha titanium alloy piece surface is changed into a regular plane under the action of an electromagnetic field according to the principle of the equipotential surface, and the alpha titanium alloy piece surface realizes the polishing effect through the process.
The invention has the following beneficial effects:
1. according to the invention, ammonium chloride, potassium fluoride, sodium ethylenediamine tetraacetate, sodium nitrite and sodium gluconate are mixed with deionized water to prepare the plasma nano polishing solution, and the polishing solution is adopted to polish titanium, so that the surface roughness of an alpha titanium alloy piece can be reduced by one time or more, and scratches are less; according to the invention, by adding potassium fluoride, the surface roughness and glossiness of the alpha titanium alloy piece can be greatly reduced, the surface roughness of the alpha titanium alloy piece can be reduced by more than 4 times at most, and meanwhile, the glossiness can be improved by 6 times, so that the mirror surface effect is achieved.
2. The preparation method of the polishing solution is simple and safe to operate; the consumption of solute in the polishing process is small, and the unit volume of polishing solution can polish more metal surface area, so that the polishing cost is reduced; the polishing solution is mainly weak acidic ammonium chloride, and the ammonium chloride is also an agricultural fertilizer, and the polishing waste liquid can be used as a fertilizer for secondary use, so that the polishing solution has the advantages of environmental protection, energy conservation, emission reduction and the like.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions in the embodiments of the present invention will be clearly and completely described in the following in conjunction with the embodiments of the present invention, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The test materials, reagents and the like used in the examples described below are commercially available unless otherwise specified.
Those of skill in the art, without any particular mention of the techniques or conditions, may follow the techniques or conditions described in the literature in this field or follow the product specifications.
Example 1
Adding 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylenediamine tetraacetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 60 ℃ to prepare the liquid phase plasma nano polishing solution of the alpha titanium alloy.
The surface roughness of the alpha titanium alloy piece which is not polished was measured by a roughness meter, and after the alpha titanium alloy piece was polished by the liquid phase plasma nano polishing liquid, the surface roughness was measured again, and the measurement results are shown in table 1.
The gloss of the alpha titanium alloy piece of this example before and after the polishing treatment was measured according to the GB/T8807-1988 plastic specular gloss test method, and the measurement results are shown in Table 1.
Example 2
Adding 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylenediamine tetraacetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 70 ℃ to prepare the liquid phase plasma nano polishing solution of the alpha titanium alloy.
The surface roughness of the alpha titanium alloy piece which is not polished was measured by a roughness meter, and after the alpha titanium alloy piece was polished by the liquid phase plasma nano polishing liquid, the surface roughness was measured again, and the measurement results are shown in table 1.
The gloss of the alpha titanium alloy piece of this example before and after the polishing treatment was measured according to the GB/T8807-1988 plastic specular gloss test method, and the measurement results are shown in Table 1.
Example 3
Adding 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylenediamine tetraacetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 80 ℃ to prepare the liquid phase plasma nano polishing solution of the alpha titanium alloy (TA 1, TA2 and TA 3).
The surface roughness of the alpha titanium alloy piece which is not polished was measured by a roughness meter, and after the alpha titanium alloy piece was polished by the liquid phase plasma nano polishing liquid, the surface roughness was measured again, and the measurement results are shown in table 1.
The gloss of the alpha titanium alloy piece of this example before and after the polishing treatment was measured according to the GB/T8807-1988 plastic specular gloss test method, and the measurement results are shown in Table 1.
Example 4
Adding 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylenediamine tetraacetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 90 ℃ to prepare the liquid phase plasma nano polishing solution of the alpha titanium alloy.
The surface roughness of the alpha titanium alloy piece which is not polished was measured by a roughness meter, and after the alpha titanium alloy piece was polished by the liquid phase plasma nano polishing liquid, the surface roughness was measured again, and the measurement results are shown in table 1.
The gloss of the alpha titanium alloy piece of this example before and after the polishing treatment was measured according to the GB/T8807-1988 plastic specular gloss test method, and the measurement results are shown in Table 1.
Example 5
Adding 6g of ammonium chloride, 0.1g of potassium fluoride, 0.1g of sodium ethylenediamine tetraacetate, 0.06g of sodium nitrite and 0.06g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 90 ℃ to prepare the liquid phase plasma nano polishing solution of the alpha titanium alloy.
The surface roughness of the alpha titanium alloy piece which is not polished was measured by a roughness meter, and after the alpha titanium alloy piece was polished by the liquid phase plasma nano polishing liquid, the surface roughness was measured again, and the measurement results are shown in table 1.
The gloss of the alpha titanium alloy piece of this example before and after the polishing treatment was measured according to the GB/T8807-1988 plastic specular gloss test method, and the measurement results are shown in Table 1.
Example 6
Adding 4g of ammonium chloride, 0.05g of potassium fluoride, 0.05g of sodium ethylenediamine tetraacetate, 0.04g of sodium nitrite and 0.04g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 80 ℃ to prepare the liquid phase plasma nano polishing solution of the alpha titanium alloy.
The surface roughness of the alpha titanium alloy piece which is not polished was measured by a roughness meter, and after the alpha titanium alloy piece was polished by the liquid phase plasma nano polishing liquid, the surface roughness was measured again, and the measurement results are shown in table 1.
The gloss of the alpha titanium alloy piece of this example before and after the polishing treatment was measured according to the GB/T8807-1988 plastic specular gloss test method, and the measurement results are shown in Table 1.
Example 7
Adding 2g of ammonium chloride, 0.01g of potassium fluoride, 0.01g of sodium ethylenediamine tetraacetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 60 ℃ to prepare the liquid phase plasma nano polishing solution of the alpha titanium alloy.
The surface roughness of the alpha titanium alloy piece which is not polished was measured by a roughness meter, and after the alpha titanium alloy piece was polished by the liquid phase plasma nano polishing liquid, the surface roughness was measured again, and the measurement results are shown in table 1.
The gloss of the alpha titanium alloy piece of this example before and after the polishing treatment was measured according to the GB/T8807-1988 plastic specular gloss test method, and the measurement results are shown in Table 1.
Example 8
Adding 2g of ammonium chloride, 0.03g of potassium fluoride, 0.01g of sodium ethylenediamine tetraacetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 60 ℃ to prepare the liquid phase plasma nano polishing solution of the alpha titanium alloy.
The surface roughness of the alpha titanium alloy piece which is not polished was measured by a roughness meter, and after the alpha titanium alloy piece was polished by the liquid phase plasma nano polishing liquid, the surface roughness was measured again, and the measurement results are shown in table 1.
The gloss of the alpha titanium alloy piece of this example before and after the polishing treatment was measured according to the GB/T8807-1988 plastic specular gloss test method, and the measurement results are shown in Table 1.
Example 9
Adding 2g of ammonium chloride, 0.07g of potassium fluoride, 0.01g of sodium ethylenediamine tetraacetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 60 ℃ to prepare the liquid phase plasma nano polishing solution of the alpha titanium alloy.
The surface roughness of the alpha titanium alloy piece which is not polished was measured by a roughness meter, and after the alpha titanium alloy piece was polished by the liquid phase plasma nano polishing liquid, the surface roughness was measured again, and the measurement results are shown in table 1.
The gloss of the alpha titanium alloy piece of this example before and after the polishing treatment was measured according to the GB/T8807-1988 plastic specular gloss test method, and the measurement results are shown in Table 1.
Example 10
Adding 2g of ammonium chloride, 0.1g of potassium fluoride, 0.01g of sodium ethylenediamine tetraacetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 60 ℃ to prepare the liquid phase plasma nano polishing solution of the alpha titanium alloy.
The surface roughness of the alpha titanium alloy piece which is not polished was measured by a roughness meter, and after the alpha titanium alloy piece was polished by the liquid phase plasma nano polishing liquid, the surface roughness was measured again, and the measurement results are shown in table 1.
The gloss of the alpha titanium alloy piece of this example before and after the polishing treatment was measured according to the GB/T8807-1988 plastic specular gloss test method, and the measurement results are shown in Table 1.
Comparative example 1
Adding 2g of ammonium chloride, 0.01g of sodium ethylenediamine tetraacetate, 0.02g of sodium nitrite and 0.02g of sodium gluconate into 100g of deionized water, fully stirring, uniformly mixing, and then heating to 60 ℃ to prepare the liquid phase plasma nano polishing solution of the alpha titanium alloy.
The surface roughness of the alpha titanium alloy piece which is not polished was measured by a roughness meter, and after the alpha titanium alloy piece was polished by the liquid phase plasma nano polishing liquid, the surface roughness was measured again, and the measurement results are shown in table 1.
The gloss of the comparative example was measured before and after the polishing treatment according to the GB/T8807-1988 plastic specular gloss test method, and the measurement results are shown in Table 1.
Table 1 shows the results of comparing the roughness and the glossiness of the alpha titanium alloys of examples 1 to 10 and comparative example 1 before and after the polishing treatment
According to the results in Table 1, the plasma nano polishing solution is prepared by mixing ammonium chloride, potassium fluoride, sodium ethylenediamine tetraacetate, sodium nitrite and sodium gluconate with deionized water, and the polishing solution is adopted to polish titanium, so that the surface roughness of an alpha titanium alloy piece can be reduced by one time or more, and scratches are fewer; as can be seen from the results of comparative examples 1 to 10 and comparative example 1, the polishing liquid prepared without adding potassium fluoride in comparative example 1, the roughness of the alpha titanium alloy piece polished by the polishing liquid was not reduced but increased, and the glossiness became lower; the invention can greatly reduce the surface roughness and glossiness of the alpha titanium alloy piece by adding the potassium fluoride, the surface roughness of the alpha titanium alloy piece can be reduced by more than 4 times at most, and meanwhile, the glossiness can be improved by 6 times, thereby achieving the mirror effect.
The above embodiments are only for illustrating the technical solution of the present invention, and are not limiting; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present invention.
Claims (9)
1. The liquid phase plasma nano polishing solution of single alpha-phase titanium is characterized by comprising the following raw materials in percentage by mass: 2-6% of ammonium chloride, 0.01-0.1% of potassium fluoride, 0.01-0.1% of sodium ethylenediamine tetraacetate, 0.02-0.06% of sodium nitrite, 0.02-0.06% of sodium gluconate and the balance of deionized water.
2. A method for preparing a single alpha phase titanium liquid phase plasma nano-slurry according to claim 1, comprising the steps of:
adding ammonium chloride, potassium fluoride, sodium ethylenediamine tetraacetate, sodium nitrite and sodium gluconate into deionized water, fully stirring, uniformly mixing, and heating to 60-90 ℃ to obtain the liquid phase plasma nano polishing solution of the alpha titanium alloy.
3. The method for preparing the single alpha-phase titanium liquid phase plasma nano polishing solution according to claim 2, which is characterized in that: to 100g deionized water was added 2g ammonium chloride, 0.01g potassium fluoride, 0.01g sodium ethylenediamine tetraacetate, 0.02g sodium nitrite, 0.02g sodium gluconate, thoroughly stirred, mixed well, and then heated to 60 ℃.
4. The method for preparing the single alpha-phase titanium liquid phase plasma nano polishing solution according to claim 2, which is characterized in that: to 100g deionized water was added 2g ammonium chloride, 0.01g potassium fluoride, 0.01g sodium ethylenediamine tetraacetate, 0.02g sodium nitrite, 0.02g sodium gluconate, thoroughly stirred, mixed well, and then heated to 70 ℃.
5. The method for preparing the single alpha-phase titanium liquid phase plasma nano polishing solution according to claim 2, which is characterized in that: to 100g deionized water was added 2g ammonium chloride, 0.01g potassium fluoride, 0.01g sodium ethylenediamine tetraacetate, 0.02g sodium nitrite, 0.02g sodium gluconate, thoroughly stirred, mixed well and then heated to 80 ℃.
6. The method for preparing the single alpha-phase titanium liquid phase plasma nano polishing solution according to claim 2, which is characterized in that: to 100g deionized water was added 2g ammonium chloride, 0.01g potassium fluoride, 0.01g sodium ethylenediamine tetraacetate, 0.02g sodium nitrite, 0.02g sodium gluconate, thoroughly stirred, mixed well, and then heated to 90 ℃.
7. The method for preparing the single alpha-phase titanium liquid phase plasma nano polishing solution according to claim 2, which is characterized in that: to 100g deionized water was added 6g ammonium chloride, 0.1g potassium fluoride, 0.1g sodium ethylenediamine tetraacetate, 0.06g sodium nitrite, 0.06g sodium gluconate, thoroughly stirred, mixed well, and then heated to 90 ℃.
8. The method for preparing the single alpha-phase titanium liquid phase plasma nano polishing solution according to claim 2, which is characterized in that: to 100g deionized water, 4g ammonium chloride, 0.05g potassium fluoride, 0.05g sodium ethylenediamine tetraacetate, 0.04g sodium nitrite, 0.04g sodium gluconate were added, stirred well, mixed well, and then heated to 80 ℃.
9. The liquid phase plasma nano-polishing solution of single alpha-phase titanium according to claim 1 is used for the surface polishing treatment of alpha-titanium alloy pieces.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110367481.XA CN113089072B (en) | 2021-04-06 | 2021-04-06 | Single alpha-phase titanium liquid phase plasma nano polishing solution and preparation method and application thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110367481.XA CN113089072B (en) | 2021-04-06 | 2021-04-06 | Single alpha-phase titanium liquid phase plasma nano polishing solution and preparation method and application thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113089072A CN113089072A (en) | 2021-07-09 |
| CN113089072B true CN113089072B (en) | 2024-03-26 |
Family
ID=76674178
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110367481.XA Active CN113089072B (en) | 2021-04-06 | 2021-04-06 | Single alpha-phase titanium liquid phase plasma nano polishing solution and preparation method and application thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113089072B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1534113A (en) * | 2003-04-01 | 2004-10-06 | 环宇真空科技股份有限公司 | Plasma body polishing method of titanium and titanium alloy product |
| CN101994148A (en) * | 2009-08-22 | 2011-03-30 | 比亚迪股份有限公司 | Titanium and titanium alloy polishing solution and polishing method |
| RU2461667C1 (en) * | 2011-04-25 | 2012-09-20 | Общество с ограниченной ответственностью "Научно-производственное предприятие Вакууммаш" | Method of electrolytic-plasma grinding of parts from titanium and its alloys |
| CN106367795A (en) * | 2016-11-02 | 2017-02-01 | 昆明理工大学 | Sodium gluconate anodizing solution and preparation method and application thereof |
| CN107513758A (en) * | 2017-09-30 | 2017-12-26 | 哈工大机器人（合肥）国际创新研究院 | Liquid phase plasma nanometer burnishing liquid, its preparation method and the application of one Albatra metal |
-
2021
- 2021-04-06 CN CN202110367481.XA patent/CN113089072B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1534113A (en) * | 2003-04-01 | 2004-10-06 | 环宇真空科技股份有限公司 | Plasma body polishing method of titanium and titanium alloy product |
| CN101994148A (en) * | 2009-08-22 | 2011-03-30 | 比亚迪股份有限公司 | Titanium and titanium alloy polishing solution and polishing method |
| RU2461667C1 (en) * | 2011-04-25 | 2012-09-20 | Общество с ограниченной ответственностью "Научно-производственное предприятие Вакууммаш" | Method of electrolytic-plasma grinding of parts from titanium and its alloys |
| CN106367795A (en) * | 2016-11-02 | 2017-02-01 | 昆明理工大学 | Sodium gluconate anodizing solution and preparation method and application thereof |
| CN107513758A (en) * | 2017-09-30 | 2017-12-26 | 哈工大机器人（合肥）国际创新研究院 | Liquid phase plasma nanometer burnishing liquid, its preparation method and the application of one Albatra metal |
Also Published As
| Publication number | Publication date |
|---|---|
| CN113089072A (en) | 2021-07-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN112680774B (en) | Electrochemical corrosive agent for heat treatment of metallographic structure of high-temperature alloy and application method thereof | |
| CN102428213A (en) | Method for treating the surface of a metal | |
| CN107299348B (en) | A kind of environment-friendly type brightening solution for stainless steel and preparation method thereof and polishing process | |
| CN107502894B (en) | A kind of environment-friendly type brightening solution for stainless steel and preparation method thereof and polishing process | |
| Lin et al. | Improvement of the Current Efficiency of an Al‐Zn‐In Anode by Heat‐Treatment | |
| CN101892487B (en) | Corrosion resistance processing method for composite structure layer formed on surface of cold-rolling mild steel plate | |
| JP5311334B2 (en) | Hydrogen production method using sponge iron | |
| CN113089072B (en) | Single alpha-phase titanium liquid phase plasma nano polishing solution and preparation method and application thereof | |
| CN114214717A (en) | Aluminum alloy processing solution and preparation method thereof | |
| CN107513758B (en) | Liquid phase plasma nanometer burnishing liquid, preparation method and the application of one Albatra metal | |
| CN110042458A (en) | A kind of stainless steel electrochemical polishing fluid and polishing process | |
| CN109652853A (en) | The method of matte surface is prepared on a kind of Zr base large amorphous alloy | |
| JP2011140711A (en) | Electrolytic manganese dioxide, method for producing the same and use of the same | |
| CA1046387A (en) | Method and composition for cleaning the surface of ferrous metal | |
| CN107164720B (en) | A kind of cupric zincizing agent and its method for metal material zincizing | |
| CN106811609B (en) | A kind of method of bastnasite production rare earth fluoride | |
| CN105385988B (en) | A kind of preparation method of molybdenum or molybdenum alloy surface rare earth metal boron binary co-penetration layer | |
| CN108193111B (en) | A kind of magnesium-rare earth anode material and preparation method thereof | |
| Batra et al. | Hydride embrittlement and oxidation resistance of some Zr–Nb–Y alloys | |
| Shengxue et al. | Preparation and performance of rare earths chemical conversion film on magnesium alloy | |
| CN106834850B (en) | A kind of high-strength anticorrosion magnesium alloy and preparation method thereof | |
| CN115449891A (en) | Liquid-phase plasma nano polishing solution for kovar alloy 4j29, and preparation method and application thereof | |
| CN104846360B (en) | One kind is using the modified AB in fluorination treatment surface3The method of type hydrogen storage alloy | |
| CN110380045A (en) | A kind of magnesium-alloy anode material and its preparation method and application, magnesium air battery | |
| CN102864406B (en) | Catalytic oxidizer and process method for preparing corrosion resistant ceramic membranes |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |