CN113087405A - Tempered glass small-R-angle depth etching liquid and etching method thereof - Google Patents
Tempered glass small-R-angle depth etching liquid and etching method thereof Download PDFInfo
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- CN113087405A CN113087405A CN202110373544.2A CN202110373544A CN113087405A CN 113087405 A CN113087405 A CN 113087405A CN 202110373544 A CN202110373544 A CN 202110373544A CN 113087405 A CN113087405 A CN 113087405A
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- etching
- toughened glass
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
Abstract
The invention discloses a tempered glass small R angle depth etching liquid and an etching method thereof, belonging to the technical field of etching liquids and etching methods thereof, the tempered glass small R angle depth etching liquid comprises 0.8-1.2 parts by weight of hydrofluoric acid solution, 1-2 parts by weight of sulfuric acid solution and 10-20 parts by weight of water, wherein 1-2 parts by weight of sulfuric acid solution is added to increase the inhibition effect of the etching liquid on the etching depth of tempered glass, 0.8-1.2 parts by weight of hydrofluoric acid solution is added to accelerate the etching efficiency of the etching liquid on the tempered glass, and the etching liquid can simultaneously meet the requirement of the depth reduction of the tempered glass, has long service life and high efficiency. Etching the prepared etching solution by adopting the operation steps of cleaning, etching, determining etching depth, cleaning and determining etching amount, and accurately controlling the etching amount: the etching depth is less than or equal to 1:0.5, thereby meeting the requirement of etching toughened glass with the thickness of 499-.
Description
Technical Field
The invention relates to the technical field of etching liquid and an etching method thereof, in particular to small R-angle depth etching liquid for tempered glass and an etching method thereof.
Background
In the existing production process, the ratio of the etching amount to the etching depth of the toughened glass is about 1:1.3, when the thickness of the toughened glass is 499-.
Disclosure of Invention
The embodiment of the invention provides a tempered glass small R angle depth etching liquid and an etching method thereof, aiming at solving the problems that in the prior art, due to large etching amount and large etching depth of tempered glass, the requirement of detaching a product cannot be met, the product is broken, and the subsequent process processing is influenced, wherein the contents of the invention are as follows:
the invention aims to provide a toughened glass small R-angle depth etching liquid, which is technically characterized in that: according to parts by weight, the tempered glass small R-angle depth etching solution comprises 0.8-1.2 parts by weight of hydrofluoric acid solution, 1-2 parts by weight of sulfuric acid solution and 10-20 parts by weight of water.
In some embodiments of the invention, the mass fraction of the hydrofluoric acid solution in the tempered glass small R-angle deep etching solution formula system is 50-60 wt%.
In some embodiments of the invention, the mass fraction of the sulfuric acid solution in the tempered glass small R-angle deep etching solution formula system is 95-99 wt%.
In some embodiments of the invention, the angle of the small R angle of the tempered glass etched by the tempered glass small R angle deep etching liquid is 5-36 degrees.
In some embodiments of the invention, the thickness of the tempered glass etched by the tempered glass small-R-angle depth etching solution is 499-.
The invention also provides a small R-angle depth etching method for tempered glass, which is technically characterized by comprising the following steps of: the method comprises the following steps:
step 1, cleaning: cleaning the toughened glass with a cleaning solution, and then naturally drying;
step 2, etching: placing the toughened glass into a toughened glass small R-angle deep etching solution for etching treatment;
step 3, determining the etching depth: testing the etching depth of the cleaned toughened glass to be 32-37 mu m;
and 4, cleaning: cleaning the etched toughened glass by using a cleaning solution, and then naturally drying;
step 5, measuring the etching amount: the thickness of the toughened glass after being tested and etched is 399-407 μm, and the etching amount is calculated to be 80-120 μm.
In some embodiments of the present invention, the cleaning solution in step 1 and step 4 of the method for etching a tempered glass at a small R-angle depth includes 2 to 5 parts by weight of a nonionic surfactant, 5 to 10 parts by weight of a potassium hydroxide aqueous solution, 1 to 5 parts by weight of a sodium gluconate solution, 1 to 5 parts by weight of a tetraacetic acid ethylene diamine solution, and 70 to 85 parts by weight of water.
In some embodiments of the invention, in the step 2 of the toughened glass small R-angle depth etching method, the etching temperature is 35-40 ℃, the etching rate is 9-10 μm/min, and the etching time is 800-1500 s.
In some embodiments of the present invention, the etching amount (mm) measured in step 5 of the tempered glass small R-angle depth etching method of the present invention is: the etching depth (mm) measured in the step 3 is less than or equal to 1: 0.5.
The embodiment of the invention adopts at least one technical scheme which can achieve the following beneficial effects:
the invention provides a tempered glass small R angle depth etching solution which comprises 0.8-1.2 parts by weight of hydrofluoric acid solution, 1-2 parts by weight of sulfuric acid solution and 10-20 parts by weight of water, wherein the sulfuric acid solution is added by 1-2 parts by weight to increase the inhibition effect of the etching solution on the etching depth of tempered glass, the etching efficiency of the etching solution on the tempered glass is accelerated by adding 0.8-1.2 parts by weight of hydrofluoric acid solution, the requirement of depth reduction of the tempered glass is met, the service life of the etching solution is long, and the efficiency of the etching solution is high. Etching the prepared etching liquid by adopting the operation steps of cleaning, etching, measuring etching depth, cleaning and measuring etching amount, and accurately controlling the etching amount: the etching depth is less than or equal to 1:0.5, thereby meeting the requirement of etching toughened glass with the thickness of 499-.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the technical solutions of the present invention will be clearly and completely described below with reference to the specific embodiments of the present invention. It is to be understood that the described embodiments are merely exemplary of the invention, and not restrictive of the full scope of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example 1
The tempered glass small R-angle deep etching liquid comprises 1kg of hydrofluoric acid solution, 1.5kg of sulfuric acid solution and 15kg of water.
The mass fraction of the hydrofluoric acid solution in the toughened glass small R-angle deep etching solution formula system is 55 wt%.
The mass fraction of the sulfuric acid solution in the toughened glass small R-angle depth etching solution formula system is 99 wt%.
The angle of the small R angle of the toughened glass etched by the toughened glass small R angle depth etching liquid is 18 degrees.
The thickness of the toughened glass etched by the toughened glass small-R-angle depth etching liquid is 503 mu m.
The toughened glass is etched by the toughened glass small R-angle depth etching liquid, and the method comprises the following steps:
step 1, cleaning: cleaning the toughened glass with a cleaning solution, and then naturally drying;
step 2, etching: placing the toughened glass into a toughened glass small R-angle deep etching solution for etching treatment;
step 3, determining the etching depth: testing the etching depth of the cleaned toughened glass to be 35 mu m;
and 4, cleaning: cleaning the etched toughened glass by using a cleaning solution, and then naturally drying;
step 5, measuring the etching amount: the thickness of the toughened glass after the test etching is 403 μm, and the calculated etching amount is 100 μm.
The cleaning solution in the step 1 and the step 4 in the small R angle depth etching method for tempered glass comprises 3.5 parts by weight of nonionic surfactant, 7.5 parts by weight of potassium hydroxide aqueous solution, 3 parts by weight of sodium gluconate solution, 3 parts by weight of tetraacetate ethylene diamine solution and 74 parts by weight of water.
In the step 2 of the toughened glass small R angle depth etching method, the etching temperature is 37.5 ℃, the etching rate is 9.5 mu m/min, and the etching time is 1150 s.
In some embodiments of the present invention, the etching amount (mm) measured in step 5 of the tempered glass small R-angle depth etching method of the present invention is: the etch depth (mm) measured in step 3 was 1: 0.35.
The yield of the toughened glass in the embodiment after etching is more than 99.55%.
Example 2
The toughened glass small R angle depth etching liquid comprises 0.8kg of hydrofluoric acid solution, 1kg of sulfuric acid solution and 10kg of water.
The mass fraction of the hydrofluoric acid solution in the toughened glass small R-angle deep etching solution formula system is 60 wt%.
The mass fraction of the sulfuric acid solution in the toughened glass small R-angle depth etching solution formula system is 99 wt%.
The angle of the small R angle of the toughened glass etched by the toughened glass small R angle depth etching liquid is 5 degrees.
The thickness of the toughened glass etched by the toughened glass small-R-angle depth etching liquid is 499 microns.
The toughened glass is etched by the toughened glass small R-angle depth etching liquid, and the method comprises the following steps:
step 1, cleaning: cleaning the toughened glass with a cleaning solution, and then naturally drying;
step 2, etching: placing the toughened glass into a toughened glass small R-angle deep etching solution for etching treatment;
step 3, determining the etching depth: testing the etching depth of the cleaned toughened glass to be 32 mu m;
and 4, cleaning: cleaning the etched toughened glass by using a cleaning solution, and then naturally drying;
step 5, measuring the etching amount: the thickness of the tempered glass after the test etching is 399 mu m, and the calculated etching amount is 100 mu m.
The cleaning solution in the step 1 and the step 4 in the small R angle depth etching method for tempered glass comprises 2 parts by weight of nonionic surfactant, 5 parts by weight of potassium hydroxide aqueous solution, 1 part by weight of sodium gluconate solution, 1 part by weight of tetraacetate ethylene diamine solution and 70 parts by weight of water.
In the step 2 of the toughened glass small R angle depth etching method, the etching temperature is 35 ℃, the etching rate is 9 mu m/min, and the etching time is 800 s.
In some embodiments of the present invention, the etching amount (mm) measured in step 5 of the tempered glass small R-angle depth etching method of the present invention is: the etch depth (mm) measured in step 3 was 1: 0.32.
The yield of the toughened glass in the embodiment after etching is more than 99.55%.
Example 3
The tempered glass small R-angle depth etching liquid comprises 1.2kg of hydrofluoric acid solution, 2kg of sulfuric acid solution and 20kg of water.
The mass fraction of the hydrofluoric acid solution in the toughened glass small R-angle deep etching solution formula system is 50 wt%.
The mass fraction of the sulfuric acid solution in the toughened glass small R-angle depth etching solution formula system is 95 wt%.
The angle of the small R angle of the toughened glass etched by the toughened glass small R angle depth etching liquid is 9 degrees.
The thickness of the toughened glass etched by the toughened glass small R-angle depth etching liquid is 507 mu m.
The toughened glass is etched by the toughened glass small R-angle depth etching liquid, and the method comprises the following steps:
step 1, cleaning: cleaning the toughened glass with a cleaning solution, and then naturally drying;
step 2, etching: placing the toughened glass into a toughened glass small R-angle deep etching solution for etching treatment;
step 3, determining the etching depth: testing the etching depth of the cleaned toughened glass to be 37 mu m;
and 4, cleaning: cleaning the etched toughened glass by using a cleaning solution, and then naturally drying;
step 5, measuring the etching amount: the thickness of the toughened glass after the test etching is 407 μm, and the calculated etching amount is 100 μm.
The cleaning solution in the step 1 and the step 4 in the small R-angle deep etching method for tempered glass comprises 5 parts by weight of a non-ionic surfactant, 10 parts by weight of a potassium hydroxide aqueous solution, 5 parts by weight of a sodium gluconate solution, 5 parts by weight of a tetraacetic acid ethylene diamine solution and 85 parts by weight of water.
In the step 2 of the toughened glass small R angle depth etching method, the etching temperature is 40 ℃, the etching rate is 10 mu m/min, and the etching time is 1500 s.
In some embodiments of the present invention, the etching amount (mm) measured in step 5 of the tempered glass small R-angle depth etching method of the present invention is: the etch depth (mm) measured in step 3 was 1: 0.37.
The yield of the toughened glass in the embodiment after etching is more than 99.55%.
Example 4
The toughened glass small R angle depth etching liquid comprises 1kg of hydrofluoric acid solution, 1.5kg of sulfuric acid solution and 12kg of water.
The mass fraction of the hydrofluoric acid solution in the toughened glass small R-angle deep etching solution formula system is 52 wt%.
The mass fraction of the sulfuric acid solution in the toughened glass small R-angle depth etching solution formula system is 96 wt%.
The angle of the small R angle of the toughened glass etched by the toughened glass small R angle depth etching liquid is 30 degrees.
The thickness of the toughened glass etched by the toughened glass small-R-angle depth etching liquid is 500 micrometers.
The toughened glass is etched by the toughened glass small R-angle depth etching liquid, and the method comprises the following steps:
step 1, cleaning: cleaning the toughened glass with a cleaning solution, and then naturally drying;
step 2, etching: placing the toughened glass into a toughened glass small R-angle deep etching solution for etching treatment;
step 3, determining the etching depth: testing the etching depth of the cleaned toughened glass to be 33 microns;
and 4, cleaning: cleaning the etched toughened glass by using a cleaning solution, and then naturally drying;
step 5, measuring the etching amount: the thickness of the tempered glass after the test etching is 399 μm, and the calculated etching amount is 101 μm.
The cleaning solution in the step 1 and the step 4 in the small R angle depth etching method for tempered glass comprises 3 parts by weight of nonionic surfactant, 6 parts by weight of potassium hydroxide aqueous solution, 2 parts by weight of sodium gluconate solution, 2 parts by weight of tetraacetic acid ethylene diamine solution and 75 parts by weight of water.
In the step 2 of the toughened glass small R angle depth etching method, the etching temperature is 36 ℃, the etching rate is 9.5 mu m/min, and the etching time is 1000 s.
In some embodiments of the present invention, the etching amount (mm) measured in step 5 of the tempered glass small R-angle depth etching method of the present invention is: the etch depth (mm) measured in step 3 was 1: 0.326.
The yield of the toughened glass in the embodiment after etching is more than 99.55%.
Example 5
The tempered glass small R-angle deep etching liquid comprises 1kg of hydrofluoric acid solution, 1.2kg of sulfuric acid solution and 18kg of water.
The mass fraction of the hydrofluoric acid solution in the toughened glass small R-angle deep etching solution formula system is 53 wt%.
The mass fraction of the sulfuric acid solution in the toughened glass small R-angle depth etching solution formula system is 97 wt%.
The angle of the small R angle of the toughened glass etched by the toughened glass small R angle depth etching liquid is 25 degrees.
The thickness of the toughened glass etched by the toughened glass small-R-angle depth etching liquid is 505 micrometers.
The toughened glass is etched by the toughened glass small R-angle depth etching liquid, and the method comprises the following steps:
step 1, cleaning: cleaning the toughened glass with a cleaning solution, and then naturally drying;
step 2, etching: placing the toughened glass into a toughened glass small R-angle deep etching solution for etching treatment;
step 3, determining the etching depth: testing that the etching depth of the cleaned toughened glass is 36 mu m;
and 4, cleaning: cleaning the etched toughened glass by using a cleaning solution, and then naturally drying;
step 5, measuring the etching amount: the thickness of the toughened glass after the test etching is 400 μm, and the calculated etching amount is 105 μm.
The cleaning solution in the step 1 and the step 4 in the small R-angle deep etching method for tempered glass comprises 3 parts by weight of nonionic surfactant, 7 parts by weight of potassium hydroxide aqueous solution, 3 parts by weight of sodium gluconate solution, 3 parts by weight of tetraacetate ethylene diamine solution and 80 parts by weight of water.
In the step 2 of the toughened glass small R angle depth etching method, the etching temperature is 37 ℃, the etching rate is 9.5 mu m/min, and the etching time is 1200 s.
In some embodiments of the present invention, the etching amount (mm) measured in step 5 of the tempered glass small R-angle depth etching method of the present invention is: the etch depth (mm) measured in step 3 is 1: 0.343.
The yield of the toughened glass in the embodiment after etching is more than 99.55%.
The above description is only an example of the present invention, and is not intended to limit the present invention. Various modifications and alterations to this invention will become apparent to those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention should be included in the scope of the claims of the present invention.
Claims (9)
1. The small R-angle depth etching liquid for tempered glass is characterized in that: according to parts by weight, the tempered glass small R-angle depth etching solution comprises 0.8-1.2 parts by weight of hydrofluoric acid solution, 1-2 parts by weight of sulfuric acid solution and 10-20 parts by weight of water.
2. The toughened glass small R-angle depth etching liquid as claimed in claim 1, wherein: the mass fraction of the hydrofluoric acid solution is 50-60 wt%.
3. The toughened glass small R-angle depth etching liquid as claimed in claim 1, wherein: the mass fraction of the sulfuric acid solution is 95-99 wt%.
4. The toughened glass small R-angle depth etching liquid as claimed in claim 1, wherein: the angle of the small R angle of the toughened glass is 5-36 degrees.
5. The toughened glass small R-angle depth etching liquid as claimed in claim 1, wherein: the thickness of the toughened glass is 499-.
6. A small R angle depth etching method for tempered glass is characterized by comprising the following steps: the method comprises the following steps:
step 1, cleaning: cleaning the toughened glass with a cleaning solution, and then naturally drying;
step 2, etching: placing the toughened glass into a toughened glass small R-angle deep etching solution for etching treatment;
step 3, determining the etching depth: testing the etching depth of the cleaned toughened glass to be 32-37 mu m;
and 4, cleaning: cleaning the etched toughened glass by using a cleaning solution, and then naturally drying;
step 5, measuring the etching amount: the thickness of the toughened glass after being tested and etched is 399-407 μm, and the etching amount is calculated to be 80-120 μm.
7. The small R-angle depth etching method for tempered glass according to claim 6, characterized in that: the cleaning solution in the step 1 and the step 4 comprises 2-5 parts by weight of nonionic surfactant, 5-10 parts by weight of potassium hydroxide aqueous solution, 1-5 parts by weight of sodium gluconate solution, 1-5 parts by weight of tetraacetic acid ethylene diamine solution and 70-85 parts by weight of water.
8. The small R-angle depth etching method for tempered glass according to claim 6, characterized in that: in the step 2, the etching temperature is 35-40 ℃, the etching rate is 9-10 μm/min, and the etching time is 800-1500 s.
9. The small R-angle depth etching method for tempered glass according to claim 6, characterized in that: the etching amount (mm) measured in the step 5: the etching depth (mm) measured in the step 3 is less than or equal to 1: 0.5.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202110373544.2A CN113087405A (en) | 2021-04-07 | 2021-04-07 | Tempered glass small-R-angle depth etching liquid and etching method thereof |
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| CN202110373544.2A CN113087405A (en) | 2021-04-07 | 2021-04-07 | Tempered glass small-R-angle depth etching liquid and etching method thereof |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115385579A (en) * | 2022-08-15 | 2022-11-25 | 惠州市清洋实业有限公司 | Camera lens processing technology |
| CN115385578A (en) * | 2022-07-29 | 2022-11-25 | 惠州市清洋实业有限公司 | Chemical punching manufacturing process for camera lens |
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Application publication date: 20210709 |