CN113087404A - Toughened glass large-R-angle depth etching liquid and etching method thereof - Google Patents
Toughened glass large-R-angle depth etching liquid and etching method thereof Download PDFInfo
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- CN113087404A CN113087404A CN202110372415.1A CN202110372415A CN113087404A CN 113087404 A CN113087404 A CN 113087404A CN 202110372415 A CN202110372415 A CN 202110372415A CN 113087404 A CN113087404 A CN 113087404A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Abstract
The invention discloses a toughened glass large R angle depth etching liquid and an etching method thereof, belonging to the technical field of etching liquids and etching methods thereof, the toughened glass large R angle depth etching liquid comprises 1.5-2.5 parts by weight of hydrofluoric acid solution, 0.5-1.5 parts by weight of sulfuric acid solution and 50-70 parts by weight of water, wherein 0.5-1.5 parts by weight of sulfuric acid solution is added to reduce the inhibition effect of the etching liquid on the etching depth of toughened glass, 1.5-2.5 parts by weight of hydrofluoric acid solution is added to reduce the etching efficiency of the etching liquid on the toughened glass, and simultaneously the depth of the toughened glass is increased, the cost of the etching liquid is low, and the preparation method is simple. Etching the prepared etching liquid by adopting the operation steps of cleaning, etching, measuring etching depth, cleaning and measuring etching amount, and accurately controlling the etching amount: the etching depth is more than or equal to 1:1.5, so that the etching of the toughened glass with the thickness of 598-.
Description
Technical Field
The invention relates to the technical field of etching liquid and an etching method thereof, in particular to toughened glass large-R-angle depth etching liquid and an etching method thereof.
Background
In the existing production process, the ratio of the etching amount to the etching depth of the toughened glass is about 1:1.3, when the thickness of the toughened glass is 598-.
Disclosure of Invention
The embodiment of the invention provides a toughened glass large R angle depth etching liquid and an etching method thereof, which aim to solve the problems that in the prior art, when the thickness of toughened glass is 598-:
the invention provides a toughened glass large R-angle depth etching liquid, which is technically characterized in that: according to parts by weight, the toughened glass large R angle depth etching liquid comprises 1.5-2.5 parts by weight of hydrofluoric acid solution, 0.5-1.5 parts by weight of sulfuric acid solution and 50-70 parts by weight of water.
In some embodiments of the invention, the mass fraction of the hydrofluoric acid solution in the toughened glass large-R-angle deep etching solution formula system is 50-60 wt%.
In some embodiments of the invention, the mass fraction of the sulfuric acid solution in the toughened glass large R-angle deep etching solution formula system is 95-99 wt%.
In some embodiments of the invention, the angle of the large R angle of the tempered glass etched by the large R angle deep etching liquid of the tempered glass is 5-36 degrees.
In some embodiments of the invention, the thickness of the tempered glass etched by the tempered glass large-R-angle deep etching solution is 598-605 μm.
The invention provides a method for etching the depth of a large R angle of toughened glass, which has the technical points that: the method comprises the following steps:
step 1, cleaning: cleaning the toughened glass with a cleaning solution, and then naturally drying;
step 2, etching: placing the toughened glass into a toughened glass large-R-angle deep etching solution for etching treatment;
step 3, determining the etching depth: testing the etching depth of the cleaned toughened glass to be 180-320 mu m;
and 4, cleaning: cleaning the etched toughened glass by using a cleaning solution, and then naturally drying;
step 5, measuring the etching amount: the thickness of the toughened glass after being tested and etched is 498-505 μm, and the etching amount is 80-120 μm.
In some embodiments of the present invention, the cleaning solution in step 1 and step 4 of the method for etching a tempered glass with a large R-angle depth includes 2 to 5 parts by weight of a nonionic surfactant, 5 to 10 parts by weight of a potassium hydroxide aqueous solution, 1 to 5 parts by weight of a sodium gluconate solution, 1 to 5 parts by weight of a tetraacetic acid ethylene diamine solution, and 70 to 85 parts by weight of water.
In some embodiments of the invention, in the step 2 of the toughened glass large R angle depth etching method, the etching temperature is 35-40 ℃, the etching rate is 5-6 μm/min, and the etching time is 4500-7000 s.
In some embodiments of the present invention, the etching amount (mm) measured in step 5 of the method for etching a tempered glass with a large R-angle depth according to the present invention is: and (3) the etching depth (mm) measured in the step 3 is more than or equal to 1: 1.5.
The embodiment of the invention adopts at least one technical scheme which can achieve the following beneficial effects:
the invention provides a toughened glass large R angle depth etching liquid which comprises 1.5-2.5 parts by weight of hydrofluoric acid solution, 0.5-1.5 parts by weight of sulfuric acid solution and 50-70 parts by weight of water, wherein the sulfuric acid solution with 0.5-1.5 parts by weight is added to reduce the inhibition effect of the etching liquid on the etching depth of toughened glass, the hydrofluoric acid solution with 1.5-2.5 parts by weight is added to reduce the etching efficiency of the etching liquid on the toughened glass, the requirement of increasing the depth of the toughened glass is met, the cost of the etching liquid is low, and the preparation method is simple. Etching the prepared etching liquid by adopting the operation steps of cleaning, etching, measuring etching depth, cleaning and measuring etching amount, and accurately controlling the etching amount: the etching depth is more than or equal to 1:1.5, so that the etching of the toughened glass with the thickness of 598-.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the technical solutions of the present invention will be clearly and completely described below with reference to the specific embodiments of the present invention. It is to be understood that the described embodiments are merely exemplary of the invention, and not restrictive of the full scope of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example 1
The toughened glass large-R-angle deep etching liquid comprises 2kg of hydrofluoric acid solution, 1kg of sulfuric acid solution and 60kg of water.
The mass fraction of the hydrofluoric acid solution in the toughened glass large R-angle deep etching solution formula system is 55 wt%.
The mass fraction of the sulfuric acid solution in the toughened glass large R-angle depth etching solution formula system is 99 wt%.
The angle of the large R angle of the toughened glass etched by the toughened glass large R angle depth etching liquid is 20 degrees.
The thickness of the toughened glass etched by the toughened glass large-R-angle depth etching liquid is 600 micrometers.
The toughened glass provided by the invention is etched by using the toughened glass large-R-angle depth etching liquid, and the method comprises the following steps:
step 1, cleaning: cleaning the toughened glass with a cleaning solution, and then naturally drying;
step 2, etching: placing the toughened glass into a toughened glass large-R-angle deep etching solution for etching treatment;
step 3, determining the etching depth: testing the etching depth of the cleaned toughened glass to be 305 mu m;
and 4, cleaning: cleaning the etched toughened glass by using a cleaning solution, and then naturally drying;
step 5, measuring the etching amount: the thickness of the toughened glass after the test etching is 500 μm, and the calculated etching amount is 100 μm.
The cleaning solution in the step 1 and the step 4 in the toughened glass large R angle depth etching method comprises 3.5 parts by weight of a nonionic surfactant, 7.5 parts by weight of a potassium hydroxide aqueous solution, 3 parts by weight of a sodium gluconate solution, 3 parts by weight of a tetraacetic acid ethylene diamine solution and 73 parts by weight of water.
In the step 2 of the toughened glass large R angle depth etching method, the etching temperature is 37.5 ℃, the etching rate is 5.5 mu m/min, and the etching time is 6000 s.
The etching amount (mm) measured in step 5 in the toughened glass large R angle depth etching method is as follows: the etch depth (mm) measured in step 3 was 1: 3.05.
The yield of the toughened glass in the embodiment after etching is more than 99.75%.
Example 2
The toughened glass large R angle depth etching liquid comprises 1.5kg of hydrofluoric acid solution, 0.5kg of sulfuric acid solution and 50kg of water.
The mass fraction of the hydrofluoric acid solution in the toughened glass large R-angle deep etching solution formula system is 50 wt%.
The mass fraction of the sulfuric acid solution in the toughened glass large R-angle depth etching solution formula system is 95 wt%.
The angle of the large R angle of the toughened glass etched by the toughened glass large R angle depth etching liquid is 5 degrees.
The thickness of the toughened glass etched by the toughened glass large-R-angle depth etching liquid is 598 mu m.
The toughened glass provided by the invention is etched by using the toughened glass large-R-angle depth etching liquid, and the method comprises the following steps:
step 1, cleaning: cleaning the toughened glass with a cleaning solution, and then naturally drying;
step 2, etching: placing the toughened glass into a toughened glass large-R-angle deep etching solution for etching treatment;
step 3, determining the etching depth: testing the etching depth of the cleaned toughened glass to be 180 mu m;
and 4, cleaning: cleaning the etched toughened glass by using a cleaning solution, and then naturally drying;
step 5, measuring the etching amount: the thickness of the toughened glass after the test etching is 498 mu m, and the calculated etching amount is 100 mu m.
The cleaning solution in the step 1 and the step 4 in the toughened glass large R angle depth etching method comprises 3 parts by weight of nonionic surfactant, 7 parts by weight of potassium hydroxide aqueous solution, 4 parts by weight of sodium gluconate solution, 4 parts by weight of tetraacetate ethylene diamine solution and 72 parts by weight of water.
In the step 2 of the toughened glass large R angle depth etching method, the etching temperature is 35 ℃, the etching rate is 5 mu m/min, and the etching time is 4500 s.
The etching amount (mm) measured in step 5 in the toughened glass large R angle depth etching method is as follows: the etch depth (mm) measured in step 3 is 1: 1.8.
The yield of the toughened glass in the embodiment after etching is more than 99.75%.
Example 3
The toughened glass large R angle depth etching liquid comprises 2.5kg of hydrofluoric acid solution, 1.5kg of sulfuric acid solution and 70kg of water.
The mass fraction of the hydrofluoric acid solution in the toughened glass large R-angle deep etching solution formula system is 60 wt%.
The mass fraction of the sulfuric acid solution in the toughened glass large R-angle depth etching solution formula system is 99 wt%.
The angle of the large R angle of the toughened glass etched by the toughened glass large R angle depth etching liquid is 36 degrees.
The thickness of the toughened glass etched by the toughened glass large-R-angle depth etching liquid is 605 m.
The toughened glass provided by the invention is etched by using the toughened glass large-R-angle depth etching liquid, and the method comprises the following steps:
step 1, cleaning: cleaning the toughened glass with a cleaning solution, and then naturally drying;
step 2, etching: placing the toughened glass into a toughened glass large-R-angle deep etching solution for etching treatment;
step 3, determining the etching depth: testing the etching depth of the cleaned toughened glass to be 320 mu m;
and 4, cleaning: cleaning the etched toughened glass by using a cleaning solution, and then naturally drying;
step 5, measuring the etching amount: the thickness of the toughened glass after the test etching is 505 μm, and the calculated etching amount is 100 μm.
The cleaning solution in the step 1 and the step 4 in the toughened glass large R angle depth etching method comprises 5 parts by weight of a nonionic surfactant, 10 parts by weight of a potassium hydroxide aqueous solution, 5 parts by weight of a sodium gluconate solution, 5 parts by weight of a tetraacetic acid ethylene diamine solution and 85 parts by weight of water.
In the step 2 of the toughened glass large R angle depth etching method, the etching temperature is 40 ℃, the etching rate is 6 mu m/min, and the etching time is 7000 s.
The etching amount (mm) measured in step 5 in the toughened glass large R angle depth etching method is as follows: the etch depth (mm) measured in step 3 is 1: 3.2.
The yield of the toughened glass in the embodiment after etching is more than 99.75%.
Example 4
The toughened glass large-R-angle deep etching liquid comprises 1.5kg of hydrofluoric acid solution, 0.8kg of sulfuric acid solution and 55kg of water.
The mass fraction of the hydrofluoric acid solution in the toughened glass large R-angle deep etching solution formula system is 55 wt%.
The mass fraction of the sulfuric acid solution in the toughened glass large R-angle depth etching solution formula system is 96 wt%.
The angle of the large R angle of the toughened glass etched by the toughened glass large R angle depth etching liquid is 20 degrees.
The thickness of the toughened glass etched by the toughened glass large-R-angle depth etching liquid is 598 mu m.
The toughened glass provided by the invention is etched by using the toughened glass large-R-angle depth etching liquid, and the method comprises the following steps:
step 1, cleaning: cleaning the toughened glass with a cleaning solution, and then naturally drying;
step 2, etching: placing the toughened glass into a toughened glass large-R-angle deep etching solution for etching treatment;
step 3, determining the etching depth: testing the etching depth of the cleaned toughened glass to be 200 mu m;
and 4, cleaning: cleaning the etched toughened glass by using a cleaning solution, and then naturally drying;
step 5, measuring the etching amount: the thickness of the toughened glass after the test etching is 505 μm, and the calculated etching amount is 93 μm.
The cleaning solution in the step 1 and the step 4 in the toughened glass large R angle depth etching method comprises 3 parts by weight of nonionic surfactant, 6 parts by weight of potassium hydroxide aqueous solution, 2 parts by weight of sodium gluconate solution, 2 parts by weight of tetraacetic acid ethylene diamine solution and 75 parts by weight of water.
In the step 2 of the toughened glass large R angle depth etching method, the etching temperature is 37 ℃, the etching rate is 5 mu m/min, and the etching time is 7000 s.
The etching amount (mm) measured in step 5 in the toughened glass large R angle depth etching method is as follows: the etch depth (mm) measured in step 3 was 1: 2.15.
The yield of the toughened glass in the embodiment after etching is more than 99.75%.
Example 5
The toughened glass large-R-angle deep etching liquid comprises 2.3kg of hydrofluoric acid solution, 1.2kg of sulfuric acid solution and 65kg of water.
The mass fraction of the hydrofluoric acid solution in the toughened glass large R-angle deep etching solution formula system is 58 wt%.
The mass fraction of the sulfuric acid solution in the toughened glass large R-angle depth etching solution formula system is 98 wt%.
The angle of the large R angle of the toughened glass etched by the toughened glass large R angle depth etching liquid is 9 degrees.
The thickness of the toughened glass etched by the toughened glass large-R-angle depth etching liquid is 605 mu m.
The toughened glass provided by the invention is etched by using the toughened glass large-R-angle depth etching liquid, and the method comprises the following steps:
step 1, cleaning: cleaning the toughened glass with a cleaning solution, and then naturally drying;
step 2, etching: placing the toughened glass into a toughened glass large-R-angle deep etching solution for etching treatment;
step 3, determining the etching depth: testing the etching depth of the cleaned toughened glass to be 250 micrometers;
and 4, cleaning: cleaning the etched toughened glass by using a cleaning solution, and then naturally drying;
step 5, measuring the etching amount: the thickness of the toughened glass after the test etching is 498 mu m, and the calculated etching amount is 107 mu m.
The cleaning solution in the step 1 and the step 4 in the toughened glass large R angle depth etching method comprises 4 parts by weight of a nonionic surfactant, 8 parts by weight of a potassium hydroxide aqueous solution, 4 parts by weight of a sodium gluconate solution, 4 parts by weight of a tetraacetic acid ethylene diamine solution and 80 parts by weight of water.
In the step 2 of the toughened glass large R angle depth etching method, the etching temperature is 40 ℃, the etching rate is 5 mu m/min, and the etching time is 5000 s.
The etching amount (mm) measured in step 5 in the toughened glass large R angle depth etching method is as follows: the etch depth (mm) measured in step 3 is 1: 2.34.
The yield of the toughened glass in the embodiment after etching is more than 99.75%.
The above description is only an example of the present invention, and is not intended to limit the present invention. Various modifications and alterations to this invention will become apparent to those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention should be included in the scope of the claims of the present invention.
Claims (9)
1. The large R angle depth etching liquid for tempered glass is characterized in that: according to parts by weight, the toughened glass large R angle depth etching liquid comprises 1.5-2.5 parts by weight of hydrofluoric acid solution, 0.5-1.5 parts by weight of sulfuric acid solution and 50-70 parts by weight of water.
2. The toughened glass large R-angle depth etching liquid as claimed in claim 1, wherein: the mass fraction of the hydrofluoric acid solution is 50-60 wt%.
3. The toughened glass large R-angle depth etching liquid as claimed in claim 1, wherein: the mass fraction of the sulfuric acid solution is 95-99 wt%.
4. The toughened glass large R-angle depth etching liquid as claimed in claim 1, wherein: the angle of the large R angle of the toughened glass is 5-36 degrees.
5. The toughened glass large R-angle depth etching liquid as claimed in claim 1, wherein: the thickness of the toughened glass is 598-605 mu m.
6. A method for etching the depth of a large R angle of toughened glass is characterized by comprising the following steps: the method comprises the following steps:
step 1, cleaning: cleaning the toughened glass with a cleaning solution, and then naturally drying;
step 2, etching: placing the toughened glass into a toughened glass large-R-angle deep etching solution for etching treatment;
step 3, determining the etching depth: testing the etching depth of the cleaned toughened glass to be 180-320 mu m;
and 4, cleaning: cleaning the etched toughened glass by using a cleaning solution, and then naturally drying;
step 5, measuring the etching amount: the thickness of the toughened glass after being tested and etched is 498-505 μm, and the etching amount is 80-120 μm.
7. The method for etching the large R-angle depth of the tempered glass according to claim 6, wherein the method comprises the following steps: the cleaning solution in the step 1 and the step 4 comprises 2-5 parts by weight of nonionic surfactant, 5-10 parts by weight of potassium hydroxide aqueous solution, 1-5 parts by weight of sodium gluconate solution, 1-5 parts by weight of tetraacetic acid ethylene diamine solution and 70-85 parts by weight of water.
8. The method for etching the large R-angle depth of the tempered glass according to claim 6, wherein the method comprises the following steps: in the step 2, the etching temperature is 35-40 ℃, the etching rate is 5-6 μm/min, and the etching time is 4500-7000 s.
9. The method for etching the large R-angle depth of the tempered glass according to claim 6, wherein the method comprises the following steps: the etching amount (mm) measured in the step 5: and (3) the etching depth (mm) measured in the step 3 is more than or equal to 1: 1.5.
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| JPH11126771A (en) * | 1997-10-24 | 1999-05-11 | Shin Etsu Handotai Co Ltd | Etching process of semiconductor wafer and manufacture thereof having process thereof |
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| US20130299452A1 (en) * | 2012-05-10 | 2013-11-14 | Corning Incorporated | Glass Etching Media And Methods |
| US20140339194A1 (en) * | 2011-12-30 | 2014-11-20 | Corning Incorporated | Media and methods for etching glass |
| JP2016028002A (en) * | 2014-07-11 | 2016-02-25 | 東京応化工業株式会社 | Method for processing glass, glass etching solution, and glass substrate |
| CN110156338A (en) * | 2019-04-17 | 2019-08-23 | 蚌埠国显科技有限公司 | A kind of glass microlithography processes |
| US20200333593A1 (en) * | 2017-10-10 | 2020-10-22 | Central Glass Co., Ltd. | Head-up display with improved anti-reflection functional coating on windshield |
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|---|---|---|---|---|
| CN87108379A (en) * | 1986-12-23 | 1988-07-13 | 格拉沃贝尔公司 | Etched glass and method for producing same |
| EP0618178A1 (en) * | 1993-03-27 | 1994-10-05 | Pilkington Aerospace Limited | Method for strengthening a glass ply |
| JPH11126771A (en) * | 1997-10-24 | 1999-05-11 | Shin Etsu Handotai Co Ltd | Etching process of semiconductor wafer and manufacture thereof having process thereof |
| CN1686887A (en) * | 2005-05-10 | 2005-10-26 | 李守进 | Method for fabricating deep etching glass capable of changing patterns along with visual angles |
| US20100224589A1 (en) * | 2007-11-19 | 2010-09-09 | Asahi Glass Company, Limited | Method for etching glass substrate |
| US20090186483A1 (en) * | 2008-01-17 | 2009-07-23 | Tokyo Electron Limited | Etching amount calculating method, storage medium, and etching amount calculating apparatus |
| US20140339194A1 (en) * | 2011-12-30 | 2014-11-20 | Corning Incorporated | Media and methods for etching glass |
| US20130299452A1 (en) * | 2012-05-10 | 2013-11-14 | Corning Incorporated | Glass Etching Media And Methods |
| JP2016028002A (en) * | 2014-07-11 | 2016-02-25 | 東京応化工業株式会社 | Method for processing glass, glass etching solution, and glass substrate |
| US20200333593A1 (en) * | 2017-10-10 | 2020-10-22 | Central Glass Co., Ltd. | Head-up display with improved anti-reflection functional coating on windshield |
| CN110156338A (en) * | 2019-04-17 | 2019-08-23 | 蚌埠国显科技有限公司 | A kind of glass microlithography processes |
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Application publication date: 20210709 |