CN113074547A - Vacuum sintering device for semiconductor processing - Google Patents
Vacuum sintering device for semiconductor processing Download PDFInfo
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- CN113074547A CN113074547A CN202110296269.9A CN202110296269A CN113074547A CN 113074547 A CN113074547 A CN 113074547A CN 202110296269 A CN202110296269 A CN 202110296269A CN 113074547 A CN113074547 A CN 113074547A
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- guide rail
- vacuum sintering
- support
- preheating
- lead screw
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/02—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity of multiple-track type; of multiple-chamber type; Combinations of furnaces
- F27B9/029—Multicellular type furnaces constructed with add-on modules
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/04—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity adapted for treating the charge in vacuum or special atmosphere
- F27B9/042—Vacuum furnaces
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/12—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity with special arrangements for preheating or cooling the charge
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
- F27B9/3077—Arrangements for treating electronic components, e.g. semiconductors
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D1/00—Casings; Linings; Walls; Roofs
- F27D1/18—Door frames; Doors, lids, removable covers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/12—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity with special arrangements for preheating or cooling the charge
- F27B2009/122—Preheating
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/12—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity with special arrangements for preheating or cooling the charge
- F27B2009/124—Cooling
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- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
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Abstract
The invention provides a vacuum sintering device for semiconductor processing, which comprises a mounting table and a furnace cover hinged on the mounting table, wherein a preheating part, a vacuum sintering part and a cooling part are sequentially arranged in the mounting table from left to right along the transverse direction; the vacuum sintering device also comprises a material tray transfer mechanism for conveying material trays to move among the preheating part, the vacuum sintering part and the cooling part, and the preheating part, the vacuum sintering part and the cooling part are sequentially arranged to finish the continuous work of preheating, vacuum sintering and cooling in an assembly line manner, so that the work period is short, and the efficiency is high; simultaneously, the material tray is transported through the supporting of the supporting rod, so that the rapid circulation and the continuous operation of materials among stations are realized, and compared with the mode of transporting the material tray through the clamping device, the material tray transportation device has the advantages that the space structure above each station is effectively saved, the structure is simple and reliable, and the manufacturing cost is low.
Description
Technical Field
The invention relates to the field of semiconductor manufacturing, in particular to a vacuum sintering device for semiconductor processing.
Background
In the manufacturing process of the semiconductor, the packaged semi-finished product needs to be placed in a vacuum sintering furnace for vacuum sintering, so that the semiconductor becomes a compact, hard, volume-stable and sintered body with certain performance. The vacuum sintering process of the semiconductor comprises a plurality of processes such as heating, vacuum sintering and cooling, the conventional semiconductor vacuum sintering device is generally of an integral structure, the heating and vacuum sintering processes are complex in structure and inconvenient to assemble, disassemble and maintain, and meanwhile, a material tray is generally transferred between stations through a clamping mechanical arm, so that the structure is complex, the space requirement is high, and the manufacturing cost is high.
Disclosure of Invention
The invention aims to solve the technical problems that the conventional semiconductor vacuum sintering device generally has an integral structure, the heating and vacuum sintering processes have complicated structures and are inconvenient to assemble, disassemble and maintain, and a material tray is generally transferred between stations by a clamping mechanical arm, so that the structure is complicated, the space requirement is high, and the manufacturing cost is high.
The technical scheme adopted by the invention for solving the technical problems is as follows: a vacuum sintering device for semiconductor processing comprises a mounting table arranged on a fixed rack and a furnace cover hinged on the mounting table, wherein the furnace cover can be switched between a closed state and an open state, and a preheating part, a vacuum sintering part and a cooling part are sequentially arranged in the mounting table from left to right along the transverse direction; the left side of the mounting table is provided with a feeding mechanism, the right side of the mounting table is provided with a discharging mechanism, the feeding mechanism can convey a material tray of a front station to the mounting table, and the discharging mechanism can convey a processed material tray to a rear station; the vacuum sintering device also comprises a material tray transfer mechanism for conveying the material tray to move among the preheating part, the vacuum sintering part and the cooling part.
Further: the preheating part comprises a plurality of preheating blocks arranged on the mounting table, the plurality of preheating blocks are uniformly distributed from left to right along the transverse direction, and the preheating temperatures of the plurality of preheating blocks are gradually increased from left to right; the vacuum sintering part comprises a housing and a supporting table for placing the charging tray, the supporting table is fixedly arranged on the mounting table and is positioned on the right side of the preheating block, a first driving cylinder is arranged on the furnace cover, the housing is fixedly arranged on a piston rod of the first driving cylinder, the piston rod of the first driving cylinder extends to drive the housing to move towards the supporting table and be attached to the supporting table, and a suction opening is formed in the housing; the cooling part comprises a plurality of cooling tables arranged on the right side of the supporting table; the plurality of preheating blocks, the supporting table and the plurality of cooling tables are uniformly arranged at equal intervals along the transverse direction.
Further: the tray transfer mechanism comprises a first groove, a second groove and a third groove which are arranged in a horizontal collinear manner, the number of the first groove, the number of the second groove and the number of the third groove are all a plurality, and the first grooves are arranged on the preheating block at intervals along the longitudinal direction; the plurality of second grooves are arranged on the supporting platform at intervals along the longitudinal direction; the third grooves are arranged on the cooling table at intervals along the longitudinal direction; the charging tray transferring mechanism further comprises a first support and a support rod, the support rod comprises a left support rod and a right support rod, the left end of the left support rod is fixedly installed on the first support, and the right part of the left support rod is inserted into the first groove; a first guide rail which is transversely arranged is fixedly installed at the right part of the first support, a first sliding block is arranged on the first guide rail in a sliding manner, a connecting frame is fixedly installed on the first sliding block, the right end of the right supporting rod is fixedly installed on the connecting frame, the left part of the right supporting rod is inserted into the third groove, the connecting frame can move transversely to enable the right supporting rod to move between the second groove and the third groove, a first lead screw is installed in the first sliding block, the first lead screw is arranged in parallel with the first guide rail, a first motor is arranged on the first support, an output shaft of the first motor is fixedly connected with one end of the first lead screw, and the first lead screw can drive the first sliding block to slide along the first guide rail by rotating under the driving of the first motor; first support is installed through horizontal adjustment mechanism and vertical adjustment mechanism in the frame, horizontal adjustment mechanism can drive first support is along lateral shifting, and makes the left branch vaulting pole is in remove between first recess and the second recess, first support is in can drive under vertical adjustment mechanism's the bracing piece rebound bearing is played the charging tray.
Further: the transverse adjusting mechanism comprises a third support, a third motor, a third guide rail and a third lead screw, the third guide rail is transversely and fixedly mounted on the rack, the third support is connected with the first support through the vertical adjusting mechanism, the third lead screw is parallel to the third guide rail and is rotatably mounted on the rack, a third slider is mounted on the third lead screw and is fixedly connected with the third support, the third slider is slidably mounted on the third guide rail, the third motor is fixedly mounted on the rack, an output shaft of the third motor is fixedly connected with one end of the third lead screw, and the third lead screw is driven by the third motor to rotate so as to drive the third slider to move transversely.
Further: the vertical adjusting mechanism comprises a fourth motor, a fourth guide rail, a fourth slider and a fourth lead screw, the fourth guide rail is fixedly mounted on the third support along the vertical direction, the fourth slider is slidably mounted on the fourth guide rail and is fixedly connected with the first support, the fourth lead screw is parallel to the fourth guide rail and is rotatably mounted on the third support, the fourth slider is mounted on the fourth lead screw, the fourth motor is fixedly mounted on the third support, an output shaft of the fourth motor is fixedly connected with one end of the fourth lead screw, and the fourth lead screw is driven by the fourth motor to rotate to drive the fourth slider to move along the fourth guide rail.
Further: be provided with the fenestra on the mount table, charging tray transport mechanism still includes the bracket, be equipped with a plurality of on the bracket and support the groove, the bracing piece laminating place in support in the groove, and can horizontal slip in the support groove, be equipped with the guide arm that sets up along vertical direction in the fenestra, the top of guide arm with the bottom fixed connection of bracket, be equipped with on the mount table with guide arm matched with guide pin bushing, the middle part movable mounting of guide arm is in the guide pin bushing, be equipped with on the first support along the second guide rail of horizontal setting, the bottom fixed mounting of guide arm has the second slider, second slider slidable mounting be in on the second guide rail.
Further: the feeding mechanism comprises a feeding arm and clamping jaws arranged on the feeding arm, the front station and the preheating part are arranged on a moving track of the feeding arm, and the clamping jaws can clamp and convey a tray in the front station into the preheating part.
Further: the discharging mechanism comprises a slide way which is arranged along the longitudinal direction, the cooling part is connected with a subsequent station through the slide way, a fourth groove which is arranged in a collinear way with the third groove is arranged on the part, close to the cooling table, of the slide way, and the right supporting rod is inserted into the fourth groove and can move in the fourth groove; discharge mechanism still includes push rod and second and drives actuating cylinder, the cylinder body that the second drove actuating cylinder is installed through vertical actuating mechanism in the frame, the piston rod that the second drove actuating cylinder sets up down along vertical direction, push rod fixed mounting be in the second drives on actuating cylinder's the piston rod, the second drives actuating cylinder and is in along longitudinal movement under vertical actuating mechanism's the drive, can drive the push rod top the charging tray is followed the slide removes.
Further: the longitudinal driving mechanism comprises a fifth guide rail arranged on the rack and a fifth sliding block arranged on the fifth guide rail in a sliding manner, the fifth guide rail is arranged in parallel to the slide way, and a cylinder body of the second driving cylinder is fixedly arranged on the fifth sliding block; the longitudinal driving mechanism further comprises a fifth driving motor and two driven wheels, the two driven wheels are respectively arranged at the left end and the right end of the fifth guide rail, the fifth driving motor is fixedly mounted on the rack, a driving wheel is fixedly mounted on an output shaft of the fifth driving motor, the driving wheel and the two driven wheels are arranged in parallel, the driving wheel and the two driven wheels are connected through a transmission belt to rotate synchronously, the fifth slider is fixedly connected with the transmission belt, and the transmission belt rotates along with the driving wheel to drive the fifth slider to move along the fifth guide rail.
Further: the furnace cover is also provided with an air inlet and an air outlet.
The vacuum sintering device for semiconductor processing has the advantages that the preheating part, the vacuum sintering part and the cooling part are sequentially arranged to complete continuous preheating, vacuum sintering and cooling in a production line manner, the working period is short, the manufacturing cost is low, and the furnace cover is hinged, so that the assembly and disassembly and the maintenance of a furnace body are facilitated; simultaneously come the bearing through the bracing piece and transport the charging tray, realized quick circulation and the continuity of operation of material between each station, compare in the mode of transporting through clamping device centre gripping charging tray, the effectual space structure who practices thrift each station top is simple reliable, low in manufacturing cost.
Drawings
The invention is further illustrated with reference to the following figures and examples.
FIGS. 1 and 2 are schematic structural views of a vacuum sintering apparatus for semiconductor processing according to the present invention;
FIGS. 3 and 4 are schematic structural views of a preheating section, a vacuum sintering section and a cooling section;
FIG. 5 is a schematic view of the construction of the furnace lid;
FIG. 6 is a schematic structural diagram of the tray transfer mechanism mounted on the mounting table;
FIG. 7 is a schematic structural view of a tray transfer mechanism;
FIG. 8 is a schematic view of the structure in which the connection bracket is mounted on the first bracket;
FIG. 9 is a schematic structural view of the lateral adjustment mechanism and the vertical adjustment mechanism;
FIG. 10 is a schematic view of the guide bar installed in the window;
FIG. 11 is a schematic mechanical view of the carriage;
FIG. 12 is a schematic view of the feed mechanism;
fig. 13 and 14 are schematic structural views of the discharging mechanism.
In the figure, 1, a mounting table, 2, a furnace cover, 3, a preheating part, 30, a preheating block, 4, a vacuum sintering part, 40, a housing, 41, a support table, 42, a first driving cylinder, 43, a suction opening, 5, a cooling part, 50, a cooling table, 6, a feeding mechanism, 61, a clamping jaw, 7, a discharging mechanism, 8, a front station, 9, a tray, 10, a rear station, 11, a first groove, 12, a second groove, 13, a third groove, 14, a first bracket, 15, a left support rod, 16, a right support rod, 17, a first guide rail, 18, a connecting frame, 19, a first lead screw, 20, a third bracket, 21, a third motor, 22, a third guide rail, 23, a third lead screw, 24, a third slide block, 25, a fourth motor, 26, a fourth guide rail, 27, a fourth slide block, 28, a fourth lead screw, 31, a window hole, 32, a bracket, 33, a support groove, 34, a guide rod, 35, Guide sleeve, 36, second guide rail, 37, second slider, 38, first motor, 81, slideway, 82, fourth groove, 83, push rod, 84, second driving cylinder, 86, fifth guide rail, 87, fifth slider, 88, fifth driving motor, 89, driven wheel, 90, driving wheel, 91, air inlet, 92 and air outlet.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the accompanying drawings are illustrative only for the purpose of explaining the present invention, and are not to be construed as limiting the present invention. On the contrary, the embodiments of the invention include all changes, modifications and equivalents coming within the spirit and terms of the claims appended hereto.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "axial", "radial", "circumferential", and the like, indicate orientations and positional relationships based on the orientations and positional relationships shown in the drawings, and are used merely for convenience of description and for simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be considered as limiting the present invention.
Furthermore, the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance. In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "connected" and "connected" are to be interpreted broadly, e.g., as being fixed or detachable or integrally connected; can be mechanically or electrically connected; may be directly connected or indirectly connected through an intermediate. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art. In addition, in the description of the present invention, "a plurality" means two or more unless otherwise specified.
Any process or method descriptions in flow charts or otherwise described herein may be understood as representing modules, segments, or portions of code which include one or more executable instructions for implementing specific logical functions or steps of the process, and alternate implementations are included within the scope of the preferred embodiment of the present invention in which functions may be executed out of order from that shown or discussed, including substantially concurrently or in reverse order, depending on the functionality involved, as would be understood by those reasonably skilled in the art of the present invention.
As shown in fig. 1 and fig. 2, the present invention provides a vacuum sintering apparatus for semiconductor processing, comprising a mounting table 1 mounted on a fixed frame and a furnace cover 2 hinged on the mounting table 1, wherein the furnace cover 2 can be switched between a closed state and an open state, and a preheating part 3, a vacuum sintering part 4 and a cooling part 5 are sequentially arranged in the mounting table 1 from left to right along the transverse direction; a feeding mechanism 6 is arranged on the left side of the mounting table 1, a discharging mechanism 7 is arranged on the right side of the mounting table, the feeding mechanism 6 can convey a material tray 9 of a front station 8 to the mounting table 1, and the discharging mechanism 7 can convey the processed material tray 9 to a rear station 10; the vacuum sintering device also comprises a tray transfer mechanism for conveying the trays 9 to move among the preheating part 3, the vacuum sintering part 4 and the cooling part 5.
During operation, the feeding mechanism 6 conveys the material tray 9 with the semiconductors in the front station 8 to the mounting table 1, the material tray transfer mechanism works to drive the material tray 9 to sequentially pass through the preheating part 3, the vacuum sintering part 4 and the cooling part 5, the preheating part 3 preheats the semiconductors in the material tray 9 to a set temperature, the vacuum sintering part 4 carries out vacuum sintering on the semiconductors, then the semiconductors in the material tray 9 are cooled in the cooling part 5, the cooled material tray 9 is conveyed to the rear station 10 through the discharging mechanism 7, and therefore continuous preheating, vacuum sintering and cooling in a production line mode are completed, and the furnace cover 2 is designed in a hinged mode and is convenient to assemble and disassemble and maintain a furnace body.
As shown in fig. 3 and 4, the preheating part 3 includes a plurality of preheating blocks 30 disposed on the mounting table 1, the plurality of preheating blocks 30 are uniformly distributed from left to right in the transverse direction, and the preheating temperatures of the plurality of preheating blocks 30 gradually increase from left to right; the vacuum sintering part 4 comprises a cover shell 40 and a supporting platform 41 for placing the charging tray 9, the supporting platform 41 is fixedly arranged on the mounting platform 1 and is positioned at the right side of the preheating block 30, a first driving air cylinder 42 is arranged on the furnace cover 2, the cover shell 40 is fixedly arranged on a piston rod of the first driving air cylinder 42, the piston rod of the first driving air cylinder 42 extends to drive the cover shell 40 to move towards the supporting platform 41 and be attached to the supporting platform 41, and a suction opening 43 is arranged in the cover shell 40; the cooling unit 5 includes a plurality of cooling stages 50 provided on the right side of the support stage 41; the preheating blocks 30, the supporting table 41 and the cooling tables 50 are arranged uniformly and transversely at equal intervals.
By setting the plurality of preheating blocks 30 whose temperature gradually increases, each preheating block 30 can set the preheating temperature, the temperature-raising speed, and the temperature-raising time according to the process requirements. When the tray 9 moves to the support platform 41, the first driving cylinder 42 drives the cover shell 40 to be attached to the support platform 41 to form a sealed space, and then gas is pumped outwards through the suction port 43 to form a certain vacuum degree for vacuum sintering; after the vacuum sintering is completed, the housing 40 is driven away from the support table 41 so that the tray transfer mechanism moves the tray 9 into the cooling table 50.
As shown in fig. 6, 7 and 8, the tray transfer mechanism includes a first groove 11, a second groove 12 and a third groove 13 which are arranged in a horizontal collinear manner, the number of the first groove 11, the second groove 12 and the third groove 13 is several, and the several first grooves 11 are arranged on the preheating block 30 at intervals along the longitudinal direction; a plurality of second grooves 12 are arranged on the support table 41 at intervals along the longitudinal direction; a plurality of third grooves 13 are arranged on the cooling table 50 at intervals along the longitudinal direction; the tray transfer mechanism further comprises a first support 14 and a support rod, the support rod comprises a left support rod 15 and a right support rod 16, the left end of the left support rod 15 is fixedly mounted on the first support 14, and the right part of the left support rod 15 is inserted into the first groove 11; a first guide rail 17 transversely arranged is fixedly arranged at the right part of the first bracket 14, a first sliding block is arranged on the first guide rail 17 in a sliding manner, the first sliding block is fixedly provided with a connecting frame 18, the right end of the right supporting rod 16 is fixedly arranged on the connecting frame 18, the left portion of the right support bar 16 is inserted into the third groove 13, the connecting frame 18 is moved in the lateral direction to move the right support bar 16 between the second groove 12 and the third groove 13, a first lead screw 19 is arranged in the first sliding block, the first lead screw 19 is arranged in parallel with the first guide rail 17, a first motor 38 is arranged on the first bracket 14, an output shaft of the first motor 38 is fixedly connected with one end of the first lead screw 19, the first lead screw 19 is driven by the first motor 38 to rotate so as to drive the first slide block to slide along the first guide rail 17; first support 14 is installed through horizontal adjustment mechanism and vertical adjustment mechanism in the frame, horizontal adjustment mechanism can drive first support 14 is along lateral shifting, and makes left branch vaulting pole 15 is in remove between first recess 11 and the second recess 12, first support 14 is in can drive under vertical adjustment mechanism's the bracing piece rebound bearing is played charging tray 9.
The preheating blocks 30, the supporting table 41 and the cooling table 50 are uniformly arranged at equal intervals, and when the device works, S1 drives the supporting rod to ascend through the vertical adjusting mechanism to support the material tray 9 to be far away from the supporting table 41; s2 the horizontal adjusting mechanism drives the supporting rod to move rightwards; s3, driving the supporting rod to descend into the groove by the vertical adjusting mechanism; and S4, the horizontal adjusting mechanism drives the supporting rod to move left, and S1-S4 are repeated to finish the transferring work of the tray 9. This scheme carries out the mode of transporting of charging tray 9 through a plurality of bracing piece bearing charging trays 9, compares in the mode of transporting through complicated clamping device centre gripping charging tray 9, and the effectual space of having practiced thrift each station top, simple structure is reliable simultaneously, low in manufacturing cost.
Because vacuum sintering needs to place charging tray 9 in a sealed space, if left bracing piece 15 and right bracing piece 16 link to each other into a bracing piece, then can lead to the bracing piece to cause the interference to the vacuum sintering station, influence sealed effect, this scheme has then avoided this problem through the independent mode of setting up of left bracing piece 15 and right bracing piece 16 mutually. The left support rod 15 moves between the preheating part 3 and the vacuum sintering part 4, the right support rod 16 moves between the vacuum sintering part 4 and the cooling part 5, after the material tray 9 is transported, the left support rod 15 is driven by the transverse adjusting mechanism to move leftwards away from the vacuum sintering part 4, and the right support rod 16 moves rightwards under the action of the first motor 38, the first lead screw 19 and the like to move rightwards away from the vacuum sintering part 4.
As shown in fig. 9, the lateral adjustment mechanism includes a third bracket 20, a third motor 21, a third guide rail 22 and a third lead screw 23, the third guide rail 22 is fixedly installed on the rack along the transverse direction, the third bracket 20 is connected with the first bracket 14 through the vertical adjusting mechanism, the third lead screw 23 is arranged in parallel with the third guide rail 22, and is rotatably mounted on the frame, a third slide block 24 is mounted on the third lead screw 23, the third slide block 24 is fixedly connected with the third bracket 20, and is slidably mounted on the third guide rail 22, the third motor 21 is fixedly mounted on the frame, an output shaft of the third motor 21 is fixedly connected with one end of the third lead screw 23, and the third lead screw 23 is driven by the third motor 21 to rotate so as to drive the third slider 24 to move along the transverse direction.
The vertical adjusting mechanism comprises a fourth motor 25, a fourth guide rail 26, a fourth slider 27 and a fourth lead screw 28, the fourth guide rail 26 is fixedly installed on the third bracket 20 along the vertical direction, the fourth slider 27 is slidably installed on the fourth guide rail 26 and is fixedly connected with the first bracket 14, the fourth lead screw 28 is arranged in parallel with the fourth guide rail 26 and is rotatably installed on the third bracket 20, the fourth slider 27 is installed on the fourth lead screw 28, the fourth motor 25 is fixedly installed on the third bracket 20, an output shaft of the fourth motor 25 is fixedly connected with one end of the fourth lead screw 28, and the fourth lead screw 28 is driven by the fourth motor 25 to rotate so as to drive the fourth slider 27 to move along the fourth guide rail 26.
Thereby third motor 21 rotates and drives third lead screw 23 and rotate and drive third support 20 along the position of lateral motion regulation bracing piece, thereby fourth motor 25 rotates and drives fourth lead screw 28 and rotate and drive first support 14 and reciprocate the position of regulation bracing piece, the displacement parameter that can accurate control slider through the rotation volume of control motor to can realize the accurate transportation to charging tray 9 between each station, realize the automated control that charging tray 9 transported. Meanwhile, the adjusting mechanism of the screw rod sliding block is stable and reliable, the adjusting step is small, the adjusting precision is high, the self-locking performance is good, and the current position can be effectively kept to avoid shifting after the adjustment is finished.
Referring to fig. 10 and 11, a window hole 31 is formed in the mounting table 1, the tray transfer mechanism further includes a bracket 32, a plurality of support grooves 33 are formed in the bracket 32, the support rods are attached to the support grooves 33 and can slide transversely in the support grooves 33, a guide rod 34 is arranged in the window hole 31 in the vertical direction, the top of the guide rod 34 is fixedly connected with the bottom of the bracket 32, a guide sleeve 35 matched with the guide rod 34 is arranged on the mounting table 1, the middle of the guide rod 34 is movably arranged in the guide sleeve 35, a second guide rail 36 is arranged on the first support 14 in the transverse direction, a second slider 37 is fixedly arranged at the bottom of the guide rod 34, and the second slider 37 is slidably arranged on the second guide rail 36. Through the setting of supporting groove 33 on bracket 32 and the bracket 32, can play effective support to the bracing piece, avoid the one end of bracing piece flagging, the life of extension bracing piece, the setting of second guide rail 36 and second slider 37 can then avoid bracket 32 to follow first support 14 and remove when first support 14 lateral shifting.
As shown in fig. 12, the feeding mechanism 6 includes a feeding arm and a clamping jaw 61 disposed on the feeding arm, the front station 8 and the preheating section 3 are disposed on a moving track of the feeding arm, and the clamping jaw 61 can clamp and convey the tray 9 in the front station 8 to the preheating section 3.
As shown in fig. 13 and 14, the discharging mechanism 7 includes a slide rail 81 arranged along the longitudinal direction, the cooling unit 5 and the subsequent station 10 are connected by the slide rail 81, a fourth groove 82 arranged in line with the third groove 13 is provided on a portion of the slide rail 81 near the cooling table 50, and the right support bar 16 is inserted into the fourth groove 82 and can move in the fourth groove 82; the discharging mechanism 7 further comprises a push rod 83 and a second driving cylinder 84, the cylinder body of the second driving cylinder 84 is mounted on the frame through a longitudinal driving mechanism, the piston rod of the second driving cylinder 84 is arranged downwards along the vertical direction, the push rod 83 is fixedly mounted on the piston rod of the second driving cylinder 84, the second driving cylinder 84 is driven by the longitudinal driving mechanism to move along the longitudinal direction, and the push rod 83 can be driven to push the charging tray 9 to move along the slideway 81.
During operation, the tray transfer mechanism moves the tray 9 on the cooling part 5 to the slide 81, the piston rod of the second driving cylinder 84 extends to drive the push rod 83 to move downwards to be close to one side of the tray 9, then the longitudinal driving mechanism works to drive the push rod 83 to work to push the tray 9 to the next station 10, then the longitudinal driving mechanism works to drive the push rod 83 to return to the previous station 8, and meanwhile, the piston rod of the second driving cylinder 84 contracts to drive the push rod 83 to move upwards to be far away from the slide 81, so that the push rod 83 is prevented from mistakenly touching the newly-fed tray 9 on the slide 81.
The longitudinal driving mechanism comprises a fifth guide rail 86 mounted on the rack and a fifth sliding block 87 slidably mounted on the fifth guide rail 86, the fifth guide rail 86 is arranged in parallel with the slideway 81, and a cylinder body of the second driving air cylinder 84 is fixedly mounted on the fifth sliding block 87; the longitudinal driving mechanism further comprises a fifth driving motor 88 and two driven wheels 89, the two driven wheels 89 are respectively arranged at the left end and the right end of the fifth guide rail 86, the fifth driving motor 88 is fixedly mounted on the rack, a driving wheel 90 is fixedly mounted on an output shaft of the fifth driving motor 88, the driving wheel 90 and the rotating axes of the two driven wheels 89 are arranged in parallel, the driving wheel 90 and the two driven wheels 89 are connected through a transmission belt to rotate synchronously, the fifth slider 87 is fixedly connected with the transmission belt, and the transmission belt rotates along with the driving wheel 90 to drive the fifth slider 87 to move along the fifth guide rail 86.
During operation, the fifth driving motor 88 drives the driving wheel 90, the driven wheel 89 and the transmission belt to synchronously rotate, the transmission belt drives the fifth sliding block 87 to longitudinally move along the fifth guide rail 86 to drive the push rod 83 to move, the adjustment precision of the adjustment mode through the transmission belt is high, the moving parameter of the fifth sliding block 87 can be accurately controlled by controlling the rotation amount of the fifth driving motor 88, and therefore automatic control over the movement of the push rod 83 is achieved.
Referring to fig. 5, an air inlet 91 and an air outlet 92 are further formed on the furnace cover 2. Steam and oxygen etc. that produce in the working process are discharged through gas vent 92, and accessible inlet port 91 lets in protective gas simultaneously, and gas such as better extrusion steam and oxygen, and then avoid gas such as steam and oxygen to form the gas pocket in the products in process, influence the quality.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, a schematic representation of the term does not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
In light of the foregoing description of the preferred embodiment of the present invention, many modifications and variations will be apparent to those skilled in the art without departing from the spirit and scope of the invention. The technical scope of the present invention is not limited to the content of the specification, and must be determined according to the scope of the claims.
Claims (10)
1. A vacuum sintering device for semiconductor processing is characterized in that: the furnace cover (2) can be switched between a covering state and an opening state, and a preheating part (3), a vacuum sintering part (4) and a cooling part (5) are sequentially arranged in the mounting table (1) from left to right along the transverse direction;
a feeding mechanism (6) is arranged on the left side of the mounting table (1), a discharging mechanism (7) is arranged on the right side of the mounting table, the feeding mechanism (6) can convey a material tray (9) of a front station (8) onto the mounting table (1), and the discharging mechanism (7) can convey the processed material tray (9) to a rear station (10);
the vacuum sintering device also comprises a material tray transfer mechanism for conveying the material tray (9) to move among the preheating part (3), the vacuum sintering part (4) and the cooling part (5).
2. The vacuum sintering apparatus for semiconductor processing according to claim 1, wherein: the preheating part (3) comprises a plurality of preheating blocks (30) arranged on the mounting table (1), the plurality of preheating blocks (30) are uniformly distributed from left to right along the transverse direction, and the preheating temperatures of the plurality of preheating blocks (30) are gradually increased from left to right;
the vacuum sintering part (4) comprises a cover shell (40) and a supporting platform (41) for placing the material tray (9), the supporting platform (41) is fixedly arranged on the mounting platform (1) and is positioned on the right side of the preheating block (30), a first driving air cylinder (42) is arranged on the furnace cover (2), the cover shell (40) is fixedly arranged on a piston rod of the first driving air cylinder (42), the piston rod of the first driving air cylinder (42) extends to drive the cover shell (40) to move towards the supporting platform (41) and be attached to the supporting platform (41), and a suction opening (43) is formed in the cover shell (40);
the cooling part (5) comprises a plurality of cooling tables (50) arranged on the right side of the support table (41);
the preheating blocks (30), the supporting tables (41) and the cooling tables (50) are uniformly arranged at equal intervals along the transverse direction.
3. The vacuum sintering apparatus for semiconductor processing according to claim 2, wherein: the tray transfer mechanism comprises a first groove (11), a second groove (12) and a third groove (13) which are arranged in a horizontal collinear manner, the number of the first groove (11), the number of the second groove (12) and the number of the third groove (13) are all a plurality, and the first grooves (11) are longitudinally arranged on the preheating block (30) at intervals; the second grooves (12) are arranged on the supporting platform (41) at intervals along the longitudinal direction; a plurality of third grooves (13) are arranged on the cooling table (50) at intervals along the longitudinal direction;
the material tray transferring mechanism further comprises a first support (14) and a support rod, the support rod comprises a left support rod (15) and a right support rod (16), the left end of the left support rod (15) is fixedly installed on the first support (14), and the right part of the left support rod (15) is inserted into the first groove (11);
the right part fixed mounting of first support (14) has first guide rail (17) of horizontal setting, it is provided with first slider to slide on first guide rail (17), fixed mounting has link (18) on the first slider, the right-hand member fixed mounting of right branch vaulting pole (16) is in on link (18), the left part of right branch vaulting pole (16) is inserted in third recess (13), link (18) can make along lateral shifting right branch vaulting pole (16) are in move between second recess (12) and third recess (13), install first lead screw (19) in the first slider, first lead screw (19) are on a parallel with first guide rail (17) sets up, be equipped with first motor (38) on first support (14), the output shaft of first motor (38) with the one end fixed connection of first lead screw (19), the first lead screw (19) is driven by the first motor (38) to rotate so as to drive the first sliding block to slide along the first guide rail (17);
first support (14) are installed through horizontal adjustment mechanism and vertical adjustment mechanism in the frame, horizontal adjustment mechanism can drive first support (14) are along lateral shifting, and make left branch vaulting pole (15) are in remove between first recess (11) and second recess (12), first support (14) are in can drive under vertical adjustment mechanism's the bracing piece upwards removes and holds up charging tray (9).
4. A vacuum sintering apparatus for semiconductor processing according to claim 3, wherein: the transverse adjusting mechanism comprises a third support (20), a third motor (21), a third guide rail (22) and a third lead screw (23), the third guide rail (22) is transversely and fixedly installed on the rack, the third support (20) is connected with the first support (14) through the vertical adjusting mechanism, the third lead screw (23) is parallel to the third guide rail (22) and is rotatably installed on the rack, a third sliding block (24) is installed on the third lead screw (23), the third sliding block (24) is fixedly connected with the third support (20) and is slidably installed on the third guide rail (22), the third motor (21) is fixedly installed on the rack, an output shaft of the third motor (21) is fixedly connected with one end of the third lead screw (23), and the third lead screw (23) is driven by the third motor (21) to rotate to drive the third sliding block (24) to transversely move And (6) moving.
5. The vacuum sintering apparatus for semiconductor processing according to claim 4, wherein: the vertical adjusting mechanism comprises a fourth motor (25), a fourth guide rail (26), a fourth sliding block (27) and a fourth lead screw (28), the fourth guide rail (26) is fixedly arranged on the third bracket (20) along the vertical direction, the fourth sliding block (27) is arranged on the fourth guide rail (26) in a sliding way, and is fixedly connected with the first bracket (14), the fourth lead screw (28) is arranged in parallel with the fourth guide rail (26), and is rotatably arranged on the third bracket (20), the fourth slide block (27) is arranged on the fourth lead screw (28), the fourth motor (25) is fixedly arranged on the third bracket (20), an output shaft of the fourth motor (25) is fixedly connected with one end of a fourth screw rod (28), the fourth lead screw (28) is driven by the fourth motor (25) to rotate so as to drive the fourth sliding block (27) to move along the fourth guide rail (26).
6. A vacuum sintering apparatus for semiconductor processing according to claim 3, wherein: the mounting table (1) is provided with a window hole (31), the tray transfer mechanism also comprises a bracket (32), a plurality of supporting grooves (33) are arranged on the bracket (32), the supporting rods are arranged in the supporting grooves (33) in a fitting manner, and can transversely slide in the supporting groove (33), a guide rod (34) arranged along the vertical direction is arranged in the window hole (31), the top of the guide rod (34) is fixedly connected with the bottom of the bracket (32), a guide sleeve (35) matched with the guide rod (34) is arranged on the mounting table (1), the middle part of the guide rod (34) is movably arranged in the guide sleeve (35), the first bracket (14) is provided with a second guide rail (36) which is arranged along the transverse direction, and a second sliding block (37) is fixedly mounted at the bottom of the guide rod (34), and the second sliding block (37) is slidably mounted on the second guide rail (36).
7. The vacuum sintering apparatus for semiconductor processing according to claim 1, wherein: the feeding mechanism (6) comprises a feeding arm and clamping jaws (61) arranged on the feeding arm, the front station (8) and the preheating part (3) are arranged on a moving track of the feeding arm, and the clamping jaws (61) can clamp and convey the material trays (9) in the front station (8) to the preheating part (3).
8. A vacuum sintering apparatus for semiconductor processing according to claim 3, wherein: the discharging mechanism (7) comprises a slide way (81) arranged along the longitudinal direction, the cooling part (5) and a subsequent station (10) are connected through the slide way (81), a fourth groove (82) which is arranged in line with the third groove (13) is arranged on the part, close to the cooling table (50), of the slide way (81), and the right supporting rod (16) is inserted into the fourth groove (82) and can move in the fourth groove (82);
discharge mechanism (7) still include push rod (83) and second and drive actuating cylinder (84), the cylinder body that second drove actuating cylinder (84) is installed through vertical actuating mechanism in the frame, the piston rod that second drove actuating cylinder (84) sets up down along vertical direction, push rod (83) fixed mounting be in on the piston rod that second drove actuating cylinder (84), second drive actuating cylinder (84) is in along longitudinal movement under vertical actuating mechanism's the drive, can drive push rod (83) top push charging tray (9) are followed slide (81) remove.
9. The vacuum sintering apparatus for semiconductor processing according to claim 8, wherein: the longitudinal driving mechanism comprises a fifth guide rail (86) installed on the rack and a fifth sliding block (87) installed on the fifth guide rail (86) in a sliding mode, the fifth guide rail (86) is arranged in parallel to the sliding way (81), and a cylinder body of the second driving air cylinder (84) is fixedly installed on the fifth sliding block (87);
the longitudinal driving mechanism further comprises a fifth driving motor (88) and two driven wheels (89), the two driven wheels (89) are respectively arranged at the left end and the right end of the fifth guide rail (86), the fifth driving motor (88) is fixedly arranged on the rack, a driving wheel (90) is fixedly arranged on an output shaft of the fifth driving motor (88), the driving wheel (90) and the rotating axes of the two driven wheels (89) are arranged in parallel, the driving wheel (90) and the two driven wheels (89) are connected through a transmission belt to rotate synchronously, a fifth sliding block (87) is fixedly connected with the transmission belt, and the transmission belt rotates along with the driving wheel (90) and can drive the fifth sliding block (87) to move along the fifth guide rail (86).
10. The vacuum sintering apparatus for semiconductor processing according to claim 1, wherein: the furnace cover (2) is also provided with an air inlet (91) and an air outlet (92).
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